WO2004010226A3 - Machine d'exposition de panneaux de circuit imprime - Google Patents

Machine d'exposition de panneaux de circuit imprime Download PDF

Info

Publication number
WO2004010226A3
WO2004010226A3 PCT/FR2003/002256 FR0302256W WO2004010226A3 WO 2004010226 A3 WO2004010226 A3 WO 2004010226A3 FR 0302256 W FR0302256 W FR 0302256W WO 2004010226 A3 WO2004010226 A3 WO 2004010226A3
Authority
WO
WIPO (PCT)
Prior art keywords
printed circuit
machine
vacuum
circuit boards
support
Prior art date
Application number
PCT/FR2003/002256
Other languages
English (en)
Other versions
WO2004010226A2 (fr
Inventor
Gilles Vibet
Boucher Arnaud Le
Original Assignee
Automa Tech Sa
Gilles Vibet
Boucher Arnaud Le
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Automa Tech Sa, Gilles Vibet, Boucher Arnaud Le filed Critical Automa Tech Sa
Priority to AU2003269030A priority Critical patent/AU2003269030A1/en
Priority to US10/521,408 priority patent/US7253883B2/en
Priority to CA002492514A priority patent/CA2492514A1/fr
Priority to JP2004522248A priority patent/JP2005533284A/ja
Priority to EP03750814A priority patent/EP1521998A2/fr
Publication of WO2004010226A2 publication Critical patent/WO2004010226A2/fr
Publication of WO2004010226A3 publication Critical patent/WO2004010226A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08—Treatments involving gases
    • H05K2203/085—Using vacuum or low pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne une machine d'exposition pour panneau de circuit imprimé. Elle comprend : - un support (26) pour ledit panneau (24) ; - un support de cliché mobile (10) comprenant un cadre (12) sensiblement rectangulaire et une plaque transparente (14) apte á recevoir led it cliché ; - des moyens (22) pour réaliser une étanchéité périphérique ; - des moyens pour creer une dépression dans le volume ; - au moins une enveloppe (30, 32) étanche déformable disposée entre ledit support et ladite plaque transparente autour d'au moins une partie dudit panneau ; - une source de gaz sous pression a une pression supérieure á la valeur de ladite dépression pour alimenter ladite enveloppe par quoi, lorsqu'une dépression est créée dans ledit volume, la périphérie de ladite plaque transparente s'applique sur ladite enveloppe.
PCT/FR2003/002256 2002-07-17 2003-07-17 Machine d'exposition de panneaux de circuit imprime WO2004010226A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2003269030A AU2003269030A1 (en) 2002-07-17 2003-07-17 Machine for exposing printed circuit boards
US10/521,408 US7253883B2 (en) 2002-07-17 2003-07-17 Machine for exposing printed circuit panels with gas balloons and mechanical spacers
CA002492514A CA2492514A1 (fr) 2002-07-17 2003-07-17 Machine d'exposition de panneaux de circuit imprime
JP2004522248A JP2005533284A (ja) 2002-07-17 2003-07-17 印刷回路板の露光装置
EP03750814A EP1521998A2 (fr) 2002-07-17 2003-07-17 Machine d exposition de panneaux de circuit imprime

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR02/09030 2002-07-17
FR0209030A FR2842617B1 (fr) 2002-07-17 2002-07-17 Machine d'exposition de panneaux de circuit imprime

Publications (2)

Publication Number Publication Date
WO2004010226A2 WO2004010226A2 (fr) 2004-01-29
WO2004010226A3 true WO2004010226A3 (fr) 2004-06-24

Family

ID=29797489

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2003/002256 WO2004010226A2 (fr) 2002-07-17 2003-07-17 Machine d'exposition de panneaux de circuit imprime

Country Status (9)

Country Link
US (1) US7253883B2 (fr)
EP (1) EP1521998A2 (fr)
JP (1) JP2005533284A (fr)
KR (1) KR20060015438A (fr)
CN (1) CN1668983A (fr)
AU (1) AU2003269030A1 (fr)
CA (1) CA2492514A1 (fr)
FR (1) FR2842617B1 (fr)
WO (1) WO2004010226A2 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board
JP2007171621A (ja) * 2005-12-22 2007-07-05 Adtec Engineeng Co Ltd 密着型露光装置
US7830498B2 (en) * 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
KR100900218B1 (ko) * 2007-05-17 2009-06-02 이병용 자외선 노광장치용 진공흡착프레임
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime
FR2968097B1 (fr) * 2010-11-30 2013-08-16 Altix Machine d'exposition de panneaux.
CN102395250B (zh) * 2011-11-01 2013-08-21 深南电路有限公司 一种电路板抽真空的装置和方法
CN103092007B (zh) 2013-02-06 2015-06-17 京东方科技集团股份有限公司 曝光机掩膜版安装装置
KR101902133B1 (ko) * 2014-09-22 2018-09-27 후지필름 가부시키가이샤 패턴 형상 피도금층 함유 적층체의 제조 방법, 금속층 함유 적층체의 제조 방법, 터치 패널 센서, 터치 패널, 패턴 형상 피도금층 함유 적층체, 금속층 함유 적층체
CN107438334A (zh) * 2017-07-12 2017-12-05 奥士康精密电路（惠州）有限公司 一种减少pcb板曝光不良的方法
US11681143B2 (en) 2019-07-29 2023-06-20 Digilens Inc. Methods and apparatus for multiplying the image resolution and field-of-view of a pixelated display
CN110376853A (zh) * 2019-08-27 2019-10-25 爱司凯科技股份有限公司 高精度全自动双面曝光机

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5164284A (en) * 1988-02-26 1992-11-17 Morton International, Inc. Method of application of a conforming mask to a printed circuit board
EP0618505A1 (fr) * 1993-03-31 1994-10-05 Automa-Tech Installation d'exposition à la lumière d'une plaque de circuit imprimé double face à travers des clichés
GB2281980A (en) * 1993-08-26 1995-03-22 Adtec Eng Co Ltd Printing frame
US5907230A (en) * 1996-05-15 1999-05-25 Automa-Tech Device for aligning and supporting an artwork during light exposure installation of a printed circuit board
DE19851575A1 (de) * 1998-11-09 2000-05-11 Mania Gmbh Verfahren und Vorrichtung zum Ausrichten zweier Fotomasken zueinander und gegebenenfalls eines unbelichteten Leiterplatten-Rohlings und zum anschließenden simultanen Belichten bei der Herstellung von doppelseitigen Leiterplatten
US6157441A (en) * 1999-03-11 2000-12-05 Olec Corporation Film on glass imaging fixtures and method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5164284A (en) * 1988-02-26 1992-11-17 Morton International, Inc. Method of application of a conforming mask to a printed circuit board
EP0618505A1 (fr) * 1993-03-31 1994-10-05 Automa-Tech Installation d'exposition à la lumière d'une plaque de circuit imprimé double face à travers des clichés
GB2281980A (en) * 1993-08-26 1995-03-22 Adtec Eng Co Ltd Printing frame
US5907230A (en) * 1996-05-15 1999-05-25 Automa-Tech Device for aligning and supporting an artwork during light exposure installation of a printed circuit board
DE19851575A1 (de) * 1998-11-09 2000-05-11 Mania Gmbh Verfahren und Vorrichtung zum Ausrichten zweier Fotomasken zueinander und gegebenenfalls eines unbelichteten Leiterplatten-Rohlings und zum anschließenden simultanen Belichten bei der Herstellung von doppelseitigen Leiterplatten
US6157441A (en) * 1999-03-11 2000-12-05 Olec Corporation Film on glass imaging fixtures and method

Also Published As

Publication number Publication date
US20050213073A1 (en) 2005-09-29
AU2003269030A1 (en) 2004-02-09
FR2842617B1 (fr) 2005-01-21
CN1668983A (zh) 2005-09-14
AU2003269030A8 (en) 2004-02-09
FR2842617A1 (fr) 2004-01-23
JP2005533284A (ja) 2005-11-04
KR20060015438A (ko) 2006-02-17
WO2004010226A2 (fr) 2004-01-29
US7253883B2 (en) 2007-08-07
EP1521998A2 (fr) 2005-04-13
CA2492514A1 (fr) 2004-01-29

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