WO2003093897A1 - A polymeric substrate for display and light emitting devices - Google Patents
A polymeric substrate for display and light emitting devices Download PDFInfo
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- WO2003093897A1 WO2003093897A1 PCT/US2003/009615 US0309615W WO03093897A1 WO 2003093897 A1 WO2003093897 A1 WO 2003093897A1 US 0309615 W US0309615 W US 0309615W WO 03093897 A1 WO03093897 A1 WO 03093897A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/04—Aromatic polycarbonates
- C08G64/06—Aromatic polycarbonates not containing aliphatic unsaturation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/04—Aromatic polycarbonates
- C08G64/06—Aromatic polycarbonates not containing aliphatic unsaturation
- C08G64/08—Aromatic polycarbonates not containing aliphatic unsaturation containing atoms other than carbon, hydrogen or oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/16—Aliphatic-aromatic or araliphatic polycarbonates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/06—Substrate layer characterised by chemical composition
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133305—Flexible substrates, e.g. plastics, organic film
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
Definitions
- the present invention relates generally to a polymeric substrate. More particularly, the present invention relates to a polymeric substrate for flat-panel displays and next generation lighting applications.
- Optical displays such as active-matrix liquid-crystal displays (LCDs) and light emitting devices such as organic electroluminescent devices (OELDs) are widely used for different applications.
- LCDs are widely used as displays for applications such as high-end laptop computers.
- OELDs offer significant potential for use in general illumination applications such as graphic display and imaging art.
- many liquid crystal materials and organic electroluminescent materials undergo detrimental reactions with oxygen and moisture.
- the LCD device and OELD were typically built on glass substrates because of the low permeability of glass to oxygen and water vapor.
- glass substrates are not suitable for certain applications in which flexibility is desired.
- the attractive design opportunities offered by flat and flexible displays as well as their low-cost manufacturing potential have led to significant interest in polymer-based displays.
- a number of layers are typically present on the LCD and the OELD.
- the material to be deposited, the density of the deposited material, and the deposition temperature typically determines the deposition of the various layers.
- a method for deposition can be a high temperature sputtering process. This results in the need for a plastic substrate having a high glass transition temperature to maintain its integrity during high temperature deposition.
- the present invention provides a polymeric substrate comprising formula (I):
- R and R are independently selected from the group consisting of C*-C 6 alkyl and hydrogen
- n is an integer in a range between about 1 and about 4;
- q is an integer in a range between about 1 and about 4.
- polymeric substrate is used in an optical display device or light emitting device.
- the present invention further provides a method for using a polymeric substrate comprising disposing said polymeric substrate in an optical display device or a light emitting device, wherein said polymeric substrate comprises formula (I).
- the present invention further provides a liquid crystal display comprising:
- each polymeric substrate comprises formula (I);
- a transparent conductive layer disposed on a surface of each of said polymeric substrate; and c) a liquid crystal material, said liquid crystal material being disposed between said two polymeric substrates, such that said liquid crystal material contacts said transparent conductive layer on each of said two substrates.
- the present invention provides an organic electroluminescent device comprising
- organic electroluminescent layer disposed on the polymeric substrate, wherein the organic electroluminescent layer comprises an organic electroluminescent material disposed between two electrodes.
- Figure 1 is a gi'aphic depiction of the % transmission of BHPM-PC versus wavelength.
- substrates are the base material on which subsequent layers are situated.
- an isotropic polymeric substrate comprising a polycarbonate disclosed herein exhibits a high glass transition temperature, favorable haze, and uniform thickness which make the polycarbonate ideal for optical display devices and light emitting devices.
- the polycarbonate is ideal for high temperature display and light emitting applications, for example, for use in liquid crystal displays (LCDs) or organic electroluminescent devices (OELDs).
- favorable haze as used herein refers to an average haze percent less than about 4%.
- Uniform thickness as used herein refers to a thickness that does not vary by more than ⁇ 3%.
- the isotropic polymeric substrate of the present invention has the formula (I):
- R and R are independently selected from the group consisting of C*-C 6 alkyl and hydrogen
- n is an integer in a range between about 1 and about 4;
- q is an integer in a range between about 1 and about 4.
- the molecular weight of the polymer of the present invention is typically in a range between about 30,000 and about 100,000.
- the substrate typically has a thickness less than about 0.5 millimeters (mm), more typically less than about 0.2 mm, and most typically, less than about 0.1 mm.
- Polymeric substrates of formula (I) typically have sufficient optical clarity and a retardation of about ⁇ 100 nm or less.
- the polymeric substrates of formula (I) are also substantially transparent. "Substantially transparent” as used herein refers to a transparency of at least 80% in the visible light range of the spectrum.
- the plastic is capable of withstanding subsequent processing parameters (e.g., application of subsequent layers) such as sputtering temperatures of about room temperature (about 25°C or lower) to 200°C, and subsequent storage conditions (e.g., in a hot car having temperatures up to about 70°C). That is, the plastic has sufficient thermal stability to prevent deformation during the various layer deposition steps as well as during storage by the end-user.
- subsequent processing parameters e.g., application of subsequent layers
- subsequent storage conditions e.g., in a hot car having temperatures up to about 70°C. That is, the plastic has sufficient thermal stability to prevent deformation during the various layer deposition steps as well as during storage by the end-user.
- a liquid ciystal display comprises a center liquid crystal layer, a first and a second conductive layer, a first and second barrier coating layer, and a first and a second polymeric substrate.
- the barrier layer may be present on at least one surface of the polymeric substrate or on both surfaces of the polymeric substrate, h an exemplary liquid crystal display, first polymeric substrate, first barrier layer and first conductive layer combine to form a first plate and second polymeric substrate, second barrier layer, and second conductive layer combine to form a second plate.
- First and second plates are disposed substantially parallel to one another and the liquid crystal layer is interposed therebetween.
- the first and second polymeric substrates are typically the outermost layers.
- each polymeric substrate has a thickness less than about 0.5 millimeters (mm), more typically less than about 0.2 mm, and most typically, less than about 0.1 mm.
- the liquid crystal layer is typically comprised of nematic liquid crystals (NLCs), thermochromic liquid crystals (TLCs), liotropic liquid crystals (LLCs), ferroelectric liquid crystals (FLCs), twisted nematic liquid crystals (TNLCs), super-twisted nematic liquid crystals (STNLCs), polymer-dispersed liquid crystals (PDLCs), cholesteric liquid crystals (CTLC), or the like.
- NLCs nematic liquid crystals
- TLCs thermochromic liquid crystals
- LLCs liotropic liquid crystals
- FLCs ferroelectric liquid crystals
- TNLCs twisted nematic liquid crystals
- STNLCs super-twisted nematic liquid crystals
- PDLCs polymer-dispersed liquid crystals
- CTLC cholesteric liquid crystals
- the conductive layers should be made of a substantially transparent conductive material, typically a class II or class III oxide.
- the conductive layers comprise indium tin oxide (ITO).
- the conductive layers may comprise at least one of tin oxides, cadmium oxides, indium oxides, magnesium oxides, gallium oxides, zinc oxides, germanium oxides, and combinations thereof.
- the oxides that may be used in conductive layers include, but are not limited to: (GaIn) 2 O 3 ; CdSn 2 O 4 ; CdGa 2 O 4 ; CdInO 4 ; CdSb 2 O 6 ; CdGeO 4 ; In 2 O 3 , MgIn 2 O ; MgIn 2 O 4 ; ZnO; ZnSnO 3 ; Zn SnO 4 ; Zn rnO 5 ; and ZnIn 2 O 6 .
- the oxides may also contain small amounts of at least one dopant.
- (GaIn) 2 O may be doped with either Sn or Ge
- In 2 O 3 may be doped with Ga
- ZnO may be doped with either aluminum or gallium.
- the conductive layers may comprise thin transparent metallic films of at least one of Al, Cu, Pt, Pd, and alloys thereof.
- the conductive layers have a thickness in the range between about 10 nm to about 200 nm.
- the conductive layers are deposited using, for example, sputtering, evaporation, ion beam assisted deposition (IBAD), plasma enhanced chemical vapor deposition (PEVCD), expanding thermal plasma CVD (ETPCVD), high intensity plasma chemical vapor deposition (HIPCVD) using either an inductively coupled plasma (ICP) or electron cyclotron resonance (ECR), combinations thereof, or the like.
- IBAD ion beam assisted deposition
- PEVCD plasma enhanced chemical vapor deposition
- EPCVD expanding thermal plasma CVD
- HPCVD high intensity plasma chemical vapor deposition
- ICP inductively coupled plasma
- ECR electron cyclotron resonance
- the barrier layer When the barrier layer is a single layer, it is constructed of either a substantially transparent organic material or a substantially transparent inorganic material. When the barrier layer is multilayer, the barrier layer is constructed of at least one layer of a substantially transparent organic material and at least one layer of a substantially transparent inorganic material having low permeability of oxygen, water vapor, and other reactive materials present in the environment.
- low permeability it is meant that the permeability of oxygen or other reactive gases is less than about 1 cm ' (at standard temperature and pressure)/m 2 /day/atm, and the permeability of water vapor is less than about 1 g/m 2 /day.
- the permeation rates of moisture, oxygen, and other reactive materials decrease as the number of alternating layers increases.
- the organic layers reduce the permeation rates of gases through barrier by reducing the number of straight-through paths resulting from defects in the inorganic layers upon which or under which the organic layer is formed.
- the barrier layer includes more than one organic layer and more than one inorganic layer, different organic and inorganic materials may be advantageously used for the individual layers.
- the thickness of each inorganic layer is typically in the range from about 1 to about 500 nm, preferably from about 10 nm to about 100 nm, and that of an organic layer typically about 1 to about 10000 nm, preferably from about 10 nm to about 5000 nm.
- the organic layer may be formed, for example, by physical vapor deposition, chemical vapor deposition (CVD), deposition from flash-evaporated materials, dip coating, or spray coating of the monomer, followed by polymerization, and the like.
- Physical or chemical vapor deposition may be desirably conducted under a subatmospheric pressure, for example, to minimize an introduction of unwanted molecules in the growing layers.
- the inorganic layer may be formed, for example, by physical vapor deposition, chemical vapor deposition, ion beam-assisted deposition (IBAD), sputtering, evaporation, plasma-enhanced chemical vapor deposition (PECVD), expanding thermal plasma CVD (ETPCVD), high intensity plasma chemical vapor deposition (HIPCVD) using either an inductively coupled plasma (ICP) or electron cyclotron resonance (ECR), combinations thereof, and the like.
- metallic layers may be deposited by an electroplating process. The choice of deposition technique for the barrier layer is based on the material to be deposited, density of the deposited material, and deposition temperature.
- polyacrylates such as polymers or copolymers of acrylic acid, methacrylic acid, esters of these acids, or acylonitrile
- the polymeric material is one of polyacrylates.
- Examples of materials suitable for forming the inorganic layers are metals (the thickness of such metallic films being small enough to render the film substantially transparent), metal carbides, metal oxides, metal nitrides, metal oxycarbides, metal oxynitrides, and carbonitride.
- metals are aluminum, silver, copper, gold, platinum, palladium, and alloys thereof.
- Preferred metals are aluminum and silver.
- metal oxides are ITO, tin oxide, silicon oxides, indium oxide, zinc oxide, aluminum oxide, magnesium oxide, composites thereof, and solutions thereof.
- Preferred metal oxides are ITO, tin oxide, aluminum oxide, and silicon dioxide.
- metal nitrides are nitrides of Groups IVA, VA, VIA, IIIB, and IVB of the Periodic Table.
- Preferred metal compounds are silicon nitride, silicon oxynitride, silicon oxycarbide, aluminum nitride, and aluminum oxynitride.
- the OELD module of the present invention may comprise any type of organic light emitting device.
- the term "light” includes visible light as well as UV and IR radiation.
- the OELD module includes an organic electroluminescent (EL) layer disposed on a polymeric substrate of formula (I).
- EL organic electroluminescent
- the term OELD module generally refers to the combination which includes an organic electroluminescent material, the cathode, the anode, and the device substrate and which may also include other elements such as at least one barrier layer, at least one substantially transparent conductive layer, the device electrical contacts, and a photoluminescent layer.
- the organic electroluminescent layer includes the organic electroluminescent material sandwiched between two electrodes, e.g., a cathode and an anode.
- the organic light emitting layer emits light upon application of a voltage across the anode and cathode from the voltage source.
- the anode and cathode inject charge carriers, i.e., holes (positive charge) and electrons (negative charge), into the organic light emitting layer where they recombine to form excited molecules or excitons which emit light when the molecules or excitons decay.
- the color of light emitted by the molecules depends on the energy difference between the excited state and the ground state ' of the molecules or excitons.
- the applied voltage is about 3-10 volts but can be up to 30 volts or more, and the external quantum efficiency (photons out/electrons in) is between 0.01% and 5%, but could be up to 10%, 20%, 30%, or more.
- the organic electroluminescent layer typically has a thickness in a range between about 50 nanometers and about 500 nanometers, and the anode and cathode each typically have a thickness in a range between about 10 nanometers and about 1000 nanometers.
- the polymeric substrate of the present invention is first provided.
- a barrier layer may be present on at least one surface of the substrate.
- a first electrically conducting material is deposited on one surface of the substrate to form a first electrode.
- the first electrode may be an anode or a cathode.
- the first electrode material is preferably sputter-deposited on the substrate.
- the first electrode may be patterned to a desired configuration by, for example, etching.
- At least one organic electroluminescent material is deposited on the first electrode by physical or chemical vapor deposition, spin coating, dip coating, spraying, ink-jet printing, or casting, followed by polymerization, if necessary, or curing of the material.
- the organic electroluminescent material may be diluted in a solvent to adjust its viscosity or mixed with another polymeric material that serves as a film-forming vehicle.
- a second electrically conducting material is deposited on the at least one organic electroluminescent material to form a second electrode which is a counter-electrode to the first electrode.
- the second electrode may be deposited on the entire area of the organic electroluminescent material or patterned into a desired shape or configuration.
- At least one of the electrodes is substantially transparent.
- a substantially transparent conductive layer may be present and is typically disposed between the polymeric substrate and the organic electromagnetic layer.
- the cathode generally comprises a material having a low work function value such that a relatively small voltage causes emission of electrons from the cathode.
- the cathode may comprise, for example, potassium lithium, sodium, magnesium, lanthanum, cesium, calcium, strontium, barium, aluminum, silver, indium, tin, zinc, zirconium, samarium, europium, alloys thereof, or mixtures thereof.
- Preferred materials for the manufacture of cathode layer are Ag-Mg, Al-Li, In-Mg, and Al-Ca alloys.
- Layered non-alloy structures are also possible, such as a thin layer of a metal such as Ca (thickness from about 1 to about 10 nm) or a non-metal such as LiF, covered by a thicker layer of some other metal, such as aluminum or silver.
- the cathode can be made of two layers to enhance electron injection. Examples include a thin inner layer of lithium fluoride (LiF) followed by a thicker outer layer of aluminum or silver, or a thin inner layer of calcium followed by a thicker outer layer of aluminum or silver.
- the anode typically comprises a material having a high work function value.
- the anode is preferably transparent so that light generated in the organic light emitting layer can propagate out of the OELD module.
- the anode may comprise, for example, indium tin oxide (ITO), tin oxide, indium oxide, zinc oxide, indium zinc oxide, cadmium tin oxide, nickel, gold, or combinations thereof.
- ITO indium tin oxide
- the electrodes can be formed by conventional vapor deposition techniques, such as evaporation or sputtering, for example.
- the organic electroluminescent layer serves as the transport medium for both holes and electrons. In this layer these excited species combine and drop to a lower energy level, concurrently emitting EM radiation in the visible range.
- Organic electroluminescent materials are chosen to electroluminesce in the desired wavelength range.
- the organic EL material may be a polymer, a copolymer, a mixture of polymers, or lower molecular-weight organic molecules having unsaturated bonds. Such materials possess a delocalized ⁇ -electron system, which gives the polymer chains or organic molecules the ability to support positive and negative charge carriers with high mobility.
- Suitable electroluminescent polymers are poly(n-vinylcarbazole) ("PVK", emitting violet-to-blue light in the wavelengths of about 380-500 nm); poly(alkylfluorene) such as poly(9,9-dihexylfluorene) (410-550 nm), poly(dioctylfluorene) (wavelength at peak EL emission of 436 nm), or poly ⁇ 9,9- bis(3,6-dioxaheptyl)-fluorene-2,7-diyl ⁇ (400-550 nm); poly(praraphenylene) derivatives such as poly(2-decyloxy-l ,4-phenylene) (400-550 nm). Mixtures of these polymers or copolymers based on one or more of these polymers and others may be used to tune the color of emitted light.
- PVK poly(n-vinylcarbazole)
- PVK poly
- polysilanes are linear silicon-backbone polymers substituted with a variety of alkyl and/or aryl side groups. They are quasi one-dimensional materials with delocalized ⁇ -conjugated electrons along polymer backbone chains. Examples of polysilanes are poly(di-n-butylsilane), poly(di-n-pentylsilane), poly(di-n-hexylsilane), poly(methylphenylsilane), and poly ⁇ bis(p-butylphenyl)silane ⁇ which are disclosed in H.
- Organic materials having molecular weight less than about 5000 that are made of a large number of aromatic units are also applicable.
- An example of such materials is l,3,5-tris ⁇ n-(4-diphenylaminophenyl) phenylamino ⁇ benzene, which emits light in the wavelength range of 380-500 nm.
- the organic EL layer also may be prepared from lower molecular weight organic molecules, such as phenylanthracene, tetraarylethene, coumarin, rubrene, tetraphenylbutadiene, anthracene, perylene, coronene, or their derivatives. These materials generally emit light having maximum wavelength of about 520 nm.
- Still other suitable materials are the low molecular-weight metal organic complexes such as aluminum-, gallium-, and indium-acetylacetonate, which emit light in the wavelength range of 415-457 nm, aluminum-(picolymethylketone)- bis ⁇ 2,6-di(t-butyl)phenoxide ⁇ or scandium-(4-methoxy-picolylmethylketone)- bis(acetylacetonate), which emits in the range of 420-433 nm.
- the preferred organic EL materials are those emit light in the blue-green wavelengths.
- More than one organic electroluminescent material may be disposed successively on top of one another, each layer comprising a different organic electroluminescent material that emits in a different wavelength range. Such a construction can facilitate a tuning of the color of the light emitted from the overall light-emitting device.
- one or more additional layers may be included to increase the efficiency of the overall device.
- these additional layers can serve to improve the injection (electron or hole injection enhancement layers) or transport (electron or hole transport layers) of charges into the organic electroluminescent layer.
- the thickness of each of these layers is kept to below 500 nm, preferably below 100 nm.
- Materials for these additional layers are typically low-to-intermediate molecular weight (less than about 2000) organic molecules. They may be applied during the manufacture of the device by conventional methods such as spray coating, dip coating, or physical or chemical vapor deposition.
- a hole injection enhancement layer is formed between the anode layer and the organic electroluminescent material to provide a higher injected current at a given forward bias and/or a higher maximum current before the failure of the device.
- the hole injection enhancement layer facilitates the injection of holes from the anode.
- Suitable materials for the hole injection enhancement layer are arylene-based compounds disclosed in US Patent 5,998,803; such as 3,4,9,10-perylenetetra-carboxylic dianhydride or bis(l ,2,5-thiadiazolo)-p-quinobis(l ,3-dithiole).
- a hole transport layer may be disposed between the hole injection enhancement layer and the organic electroluminescent material.
- the hole transport layer has the functions of transporting holes and blocking the transportation of electrons so that holes and electrons are optimally combined in the organic electroluminescent material.
- Materials suitable for the hole transport layer are triaryldiamine, tetraphenyldiamine, aromatic tertiary amines, hydrazone derivatives, carbazole derivatives, triazole derivatives, imidazole derivatives, oxadiazole derivatives having an amino group, and polythiophenes as disclosed in US Patent 6,023,371.
- an additional layer may be disposed between the cathode layer and the organic electroluminescent material.
- the additional layer has the combined function of injecting and transporting electrons to the organic electroluminescent material.
- Materials suitable for the electron injecting and transporting layer are metal organic complexes such as tris(8- quinolinolato)aluminum, oxadiazole derivatives, perylene derivatives, pyridine derivatives, pyrimidine derivatives, quinoline derivatives, quinoxaline derivatives, diphenylquinone derivatives, and nitro-substituted fluorene derivatives, as disclosed in US Patent 6,023,371.
- organic light emitting layers can be used to design an organic light emitting device which emits in one or more desired colors.
- the OELD module can emit ultraviolet, blue, green, or red light.
- the optional barrier layer of the organic electroluminescent device may be a single layer or multilayered.
- the barrier layer serves as a protective layer to prevent or substantially reduce the diffusion of oxygen and water vapor through the polymeric substrate.
- the barrier coating may be disposed on either surface of the polymeric substrate or it may completely surround the polymeric substrate.
- the barrier coating is disposed on a surface of the polymeric substrate adjacent to the organic electroluminescent member.
- a barrier coating may be advantageously formed so to cover substantially all edges of the polymeric substrate.
- at least one barrier coating can be disposed on either surface of the organic electroluminescent layer. Materials suitable for the barrier layer of the organic electroluminescent device are described above.
- substantially transparent conductive layer and materials for such optional additional layers for organic electroluminescent devices are described above.
- a polycarbonate with the following monomer repeat unit of formula (I), l,3-bis(4- hydroxyphenyl)menthane was manufactured into a film resin material.
- the aliphatic and isotropic nature of the monomer results in a material with an anisotropy lower than BPA-polycarbonate. Results can be seen in Table 1.
- BHPM-PC is substantially transparent, as evidence in the % transmission trace seen in Figure 1.
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2004-7017402A KR20050006210A (ko) | 2002-04-29 | 2003-03-31 | 디스플레이 및 발광 소자용 중합체 기판 |
| JP2004502057A JP2005525443A (ja) | 2002-04-29 | 2003-03-31 | ディスプレイ及び発光装置用のポリマー基板 |
| EP03714451A EP1504302A1 (en) | 2002-04-29 | 2003-03-31 | A polymeric substrate for display and light emitting devices |
| AU2003218449A AU2003218449A1 (en) | 2002-04-29 | 2003-03-31 | A polymeric substrate for display and light emitting devices |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/134,050 | 2002-04-29 | ||
| US10/134,050 US20030207050A1 (en) | 2002-04-29 | 2002-04-29 | Polymeric substrate for display and light emitting devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2003093897A1 true WO2003093897A1 (en) | 2003-11-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2003/009615 Ceased WO2003093897A1 (en) | 2002-04-29 | 2003-03-31 | A polymeric substrate for display and light emitting devices |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US20030207050A1 (https=) |
| EP (1) | EP1504302A1 (https=) |
| JP (1) | JP2005525443A (https=) |
| KR (1) | KR20050006210A (https=) |
| CN (1) | CN1666140A (https=) |
| AU (1) | AU2003218449A1 (https=) |
| TW (1) | TW200401790A (https=) |
| WO (1) | WO2003093897A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9958736B2 (en) | 2006-04-06 | 2018-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004361732A (ja) * | 2003-06-05 | 2004-12-24 | Fuji Photo Film Co Ltd | プラスチック製光学素子 |
| JP4631316B2 (ja) * | 2004-06-07 | 2011-02-16 | パナソニック株式会社 | エレクトロルミネセンス素子 |
| CN101142499A (zh) * | 2004-09-28 | 2008-03-12 | 布鲁尔科技公司 | 用于光电子用途的可固化的高折射率树脂 |
| US20070176539A1 (en) * | 2006-02-01 | 2007-08-02 | Osram Opto Semiconductors Gmbh | OLED with area defined multicolor emission within a single lighting element |
| EP2026107A4 (en) * | 2006-06-05 | 2011-01-05 | Teijin Chemicals Ltd | POLYCARBONATE RESIN FILM AND MANUFACTURING METHOD THEREFOR |
| JP2008256736A (ja) * | 2007-03-30 | 2008-10-23 | Dainippon Printing Co Ltd | 液晶表示装置用フレキシブル基板 |
| KR100875099B1 (ko) * | 2007-06-05 | 2008-12-19 | 삼성모바일디스플레이주식회사 | 유기 발광 장치 및 이의 제조 방법 |
| CN102987663B (zh) * | 2012-12-19 | 2015-01-28 | 深圳市利勇安硅橡胶制品有限公司 | 制作硅胶环的方法及硅胶环 |
| KR101642589B1 (ko) * | 2013-09-30 | 2016-07-29 | 주식회사 엘지화학 | 유기전자소자용 기판 및 이의 제조방법 |
| KR102392914B1 (ko) * | 2020-08-24 | 2022-04-29 | 고려대학교 산학협력단 | 유기발광소자용 전극 및 그 전극을 포함하는 유기발광소자 |
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| DE3105855A1 (de) * | 1981-02-18 | 1982-09-09 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Fluessigkristallzelle aus kunststoff und verfahren zu ihrer herstellung |
| JPH04101391A (ja) * | 1990-08-21 | 1992-04-02 | Ricoh Co Ltd | 発光素子 |
| JPH08198791A (ja) * | 1995-01-26 | 1996-08-06 | Yasuhara Chem Kk | 新規テルペンジフェノール化合物 |
| EP0747749A1 (en) * | 1994-02-24 | 1996-12-11 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Electrode plate for liquid crystal |
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| US4640583A (en) * | 1983-07-22 | 1987-02-03 | Kabushiki Kaisha Seiko Epson | Display panel having an inner and an outer seal and process for the production thereof |
| EP0406762B1 (en) * | 1989-07-04 | 1994-09-28 | Mitsubishi Chemical Corporation | Organic electroluminescent device |
| JP3069139B2 (ja) * | 1990-03-16 | 2000-07-24 | 旭化成工業株式会社 | 分散型電界発光素子 |
| US5414069A (en) * | 1993-02-01 | 1995-05-09 | Polaroid Corporation | Electroluminescent polymers, processes for their use, and electroluminescent devices containing these polymers |
| JP3584139B2 (ja) * | 1996-10-04 | 2004-11-04 | セイコーエプソン株式会社 | 液晶パネルの梱包方法及びその梱包物 |
| AU744969B2 (en) * | 1997-06-23 | 2002-03-07 | Teijin Chemicals Ltd | Optical films and process for producing the same |
| US6270863B1 (en) * | 1997-11-07 | 2001-08-07 | Rohm And Haas Company | Process and apparatus for forming plastic sheet |
| TW553977B (en) * | 2000-03-10 | 2003-09-21 | Idemitsu Petrochemical Co | Processes for producing raw polycarbonate resin material and producing polycarbonate resin |
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2002
- 2002-04-29 US US10/134,050 patent/US20030207050A1/en not_active Abandoned
-
2003
- 2003-03-31 KR KR10-2004-7017402A patent/KR20050006210A/ko not_active Withdrawn
- 2003-03-31 EP EP03714451A patent/EP1504302A1/en not_active Withdrawn
- 2003-03-31 WO PCT/US2003/009615 patent/WO2003093897A1/en not_active Ceased
- 2003-03-31 CN CN038154633A patent/CN1666140A/zh active Pending
- 2003-03-31 JP JP2004502057A patent/JP2005525443A/ja not_active Withdrawn
- 2003-03-31 AU AU2003218449A patent/AU2003218449A1/en not_active Abandoned
- 2003-04-16 TW TW092108828A patent/TW200401790A/zh unknown
- 2003-12-22 US US10/743,240 patent/US20040137269A1/en not_active Abandoned
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| DE3105855A1 (de) * | 1981-02-18 | 1982-09-09 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Fluessigkristallzelle aus kunststoff und verfahren zu ihrer herstellung |
| JPH04101391A (ja) * | 1990-08-21 | 1992-04-02 | Ricoh Co Ltd | 発光素子 |
| EP0747749A1 (en) * | 1994-02-24 | 1996-12-11 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Electrode plate for liquid crystal |
| JPH08198791A (ja) * | 1995-01-26 | 1996-08-06 | Yasuhara Chem Kk | 新規テルペンジフェノール化合物 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9958736B2 (en) | 2006-04-06 | 2018-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
| US10684517B2 (en) | 2006-04-06 | 2020-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
| US11073729B2 (en) | 2006-04-06 | 2021-07-27 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
| US11442317B2 (en) | 2006-04-06 | 2022-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
| US11644720B2 (en) | 2006-04-06 | 2023-05-09 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
| US11921382B2 (en) | 2006-04-06 | 2024-03-05 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device, semiconductor device, and electronic appliance |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040137269A1 (en) | 2004-07-15 |
| JP2005525443A (ja) | 2005-08-25 |
| CN1666140A (zh) | 2005-09-07 |
| EP1504302A1 (en) | 2005-02-09 |
| US20030207050A1 (en) | 2003-11-06 |
| KR20050006210A (ko) | 2005-01-15 |
| AU2003218449A1 (en) | 2003-11-17 |
| TW200401790A (en) | 2004-02-01 |
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