WO2003077011A1 - Systeme optique a elements optiques birefringents - Google Patents

Systeme optique a elements optiques birefringents Download PDF

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Publication number
WO2003077011A1
WO2003077011A1 PCT/EP2002/012446 EP0212446W WO03077011A1 WO 2003077011 A1 WO2003077011 A1 WO 2003077011A1 EP 0212446 W EP0212446 W EP 0212446W WO 03077011 A1 WO03077011 A1 WO 03077011A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical
subsystem
retarding
birefringent
polarization
Prior art date
Application number
PCT/EP2002/012446
Other languages
English (en)
Inventor
Damian Fiolka
Olaf Dittman
Michael Totzeck
Nils Dieckmann
Jess Köhler
Toralf Gruner
Daniel KRÄHMER
Original Assignee
Carl Zeiss Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Ag filed Critical Carl Zeiss Smt Ag
Priority to EP02779537A priority Critical patent/EP1483616A1/fr
Priority to AU2002342890A priority patent/AU2002342890A1/en
Publication of WO2003077011A1 publication Critical patent/WO2003077011A1/fr
Priority to US10/922,380 priority patent/US20050094268A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/288—Filters employing polarising elements, e.g. Lyot or Solc filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Definitions

  • the invention relates to an optical system with birefringent optical elements .
  • a projection objective with birefringent optical elements is known from DE 19807120 Al (US 6,252,712).
  • the birefringent optical elements cause optical path differences for two mutually orthogonal states of polarization in a bundle of light rays, where the path differences vary locally within the bundle of light rays.
  • DE 19807120 Al proposes the use of a birefringent element with an irregularly varying thickness.
  • possibilities for compensating and thereby reducing the detrimental influence of birefringence are presented which include rotating the lenses relative to each other in the case of projection objectives with fluoride crystal lenses.
  • the patent application just mentioned shall hereby be incorporated by reference in the present application.
  • the birefringent phenomenon also has an undesirable effect in illumination systems of projection systems.
  • the illumination systems may have a light homogenizer in the form of an integrator rod, as described for example in DE 195 48 805 (US 5,982,558).
  • Figure 2 of the patent application just mentioned illustrates an illumination system with an integrator rod in combination with a laser light source and a catadioptric projection objective.
  • the catadioptric projection objective in this arrangement includes a polarization beam splitter which should be illuminated with linearly polarized light.
  • claim 1 proposes to build an optical system from two subsystems with an optical retarding system arranged between the subsystems .
  • a light ray traversing the birefringent elements in the two subsystems would be subject to an optical path difference for two mutually orthogonal states of polarization.
  • the effects of the two optical subsystems would in this case be cumulative.
  • the retarding system now has the advantageous effect that the two states of polarization are exchanged with respect to each other. As a consequence, the optical path difference caused in the light ray by the first subsystem can be at least partially canceled in the second subsystem.
  • the state of polarization of a bundle of rays is altered inside the integrator unit.
  • the integrator unit is used in an illumination system for a catadioptric projection objective with a polarization beam splitter, it is desirable if the integrator unit changes the state of polarization of a bundle of light rays only within narrow limits. By inserting the retarding system between the two integrator rods, it is possible to significantly reduce the unwanted influence of birefringence.
  • the optical retarding system in the integrator unit consists of only a single optical retarding element, it is advantageous if the fast axis of the optical retarding element encloses an angle of 45 a ⁇ 5 - with one of the edges of a rod-integrator surface facing the optical retarding system.
  • integrator rods consisting of fluoride crystal material whose ⁇ 100> axis is aligned in the direction of the longitudinal axes of the integrator rods, this arrangement provides a high degree of compensation of the unwanted effects of intrinsic birefringence.
  • first and second optical devici portions themselves include birefringent optical elements, it is advantageous if the optical path difference for two mutually orthogonal states of polarization in a light ray traversing the first optical device portion is of nearly equal magnitude as for the same light ray traversing the second optical device portion.
  • the compensation leads to a noticeable reduction of the unwanted effects caused by birefringence, if the optical path differences for two mutually orthogonal states of polarization are calculated for an entire bundle of light rays in the first and second optical subsystem.
  • the light rays of the bundle will pass through the diaphragm plane of the objective for example in an even distribution.
  • the calculated path differences for each optical subsystem will follow a respective distribution profile whose respective maximum absolute value can be determined.
  • the optical retarding system is advantageously arranged at a position within the objective where the maximum absolute value of the first distribution profile deviates by no more than 40% from the maximum absolute value of the second distribution profile.
  • each of the two optical subsystems contains a fluoride crystal lens in a given orientation, the unwanted influence of one lens can be compensated by the other lens, because the optical retarding system exchanges the two states of polarization against each other. It is particularly favorable if the two lenses consist of the same fluoride crystal material and the lens axes are oriented in the same crystallographic direction or in equivalent crystallographic directions.
  • a retarding element of the retarding system can be realized by applying a retardant coating to an optical element that belongs to the first or second subsystem where the retardant coating is designed to effect a retardation by one-half of a wavelength.
  • This is possible, e.g., with a magnesium fluoride coating in which the birefringent effect is achieved through the vapor-deposition angle in the production process of the coating.
  • the retarding element belongs therefore to the first or second subsystem and to the retarding system.
  • the numerical aperture of the objective on the image side is larger than on the object side, it is advantageous to place the optical retarding system between the diaphragm plane of the objective and the image plane of the objective.
  • This arrangement is preferred is that large angles of incidence at air/glass interfaces and large angles of the light rays inside the lenses, which occur in the optical elements near the image plane, lead to large optical path differences between two mutually orthogonal states of polarization.
  • it is therefore necessary to also include in the first subsystem some of the lenses that are positioned in the light path after the diaphragm plane, i.e., lenses that are between the diaphragm plane and the image plane .

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un système optique (1) comprenant: un premier sous-système optique (3) qui comporte au moins un premier élément optique biréfringent (7); et un deuxième sous-système optique (5) qui comporte au moins un deuxième élément optique biréfringent (9). Un système à retard optique (13) présentant au moins un premier élément à retard optique (15) est disposé entre ledit premier sous-système optique et ledit deuxième sous-système optique, et introduit un retard d'au moins une demi longueur d'onde entre deux états de polarisation mutuellement orthogonaux.
PCT/EP2002/012446 2002-03-14 2002-11-07 Systeme optique a elements optiques birefringents WO2003077011A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02779537A EP1483616A1 (fr) 2002-03-14 2002-11-07 Systeme optique a elements optiques birefringents
AU2002342890A AU2002342890A1 (en) 2002-03-14 2002-11-07 Optical system with birefringent optical elements
US10/922,380 US20050094268A1 (en) 2002-03-14 2004-08-19 Optical system with birefringent optical elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10211762 2002-03-14
DE10211762.4 2002-03-14

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/922,380 Continuation US20050094268A1 (en) 2002-03-14 2004-08-19 Optical system with birefringent optical elements

Publications (1)

Publication Number Publication Date
WO2003077011A1 true WO2003077011A1 (fr) 2003-09-18

Family

ID=27797847

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/012446 WO2003077011A1 (fr) 2002-03-14 2002-11-07 Systeme optique a elements optiques birefringents

Country Status (4)

Country Link
EP (1) EP1483616A1 (fr)
AU (1) AU2002342890A1 (fr)
DE (1) DE10311809A1 (fr)
WO (1) WO2003077011A1 (fr)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004001480A2 (fr) * 2002-06-25 2003-12-31 Carl Zeiss Smt Ag Objectif de reduction catadioptrique
EP1496398A1 (fr) * 2003-07-05 2005-01-12 Carl Zeiss SMT AG Appareil d'inspection quant à la polarisation, système de projection optique et méthode d'étalonnage
US6844982B2 (en) 2002-04-26 2005-01-18 Nikon Corporation Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system
US6917458B2 (en) 2001-06-01 2005-07-12 Asml Netherlands B.V. Correction of birefringence in cubic crystalline optical systems
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
EP1726994A2 (fr) 2005-05-25 2006-11-29 Carl Zeiss SMT AG Intégrateur de lumière pour un système d'éclairage, en particulier pour une installation d'éclairage de projection microlithographique
US7277182B2 (en) 2003-07-05 2007-10-02 Carl Zeiss Smt Ag Apparatus for polarization-specific examination, optical imaging system, and calibration method
WO2008074673A2 (fr) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Système optique, en particulier un système d'éclairage ou un objectif de projection d'un appareil d'exposition par projection microlithographique
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
DE102007055063A1 (de) 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
US8035803B2 (en) 2006-09-06 2011-10-11 Carl Zeiss Smt Gmbh Subsystem of an illumination system of a microlithographic projection exposure apparatus
US8077289B2 (en) 2005-10-04 2011-12-13 Carl Zeiss Smt Gmbh Device and method for influencing the polarization distribution in an optical system
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012223230A1 (de) 2012-12-14 2014-02-13 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US8891060B2 (en) 2012-04-16 2014-11-18 Carl Zeiss Smt Gmbh Optical system, in particular of a microlithographic projection exposure apparatus
WO2015044182A3 (fr) * 2013-09-25 2015-09-24 Asml Netherlands B.V. Appareil d'acheminement de faisceau et procédé associé
US9519093B2 (en) 2013-08-23 2016-12-13 Kla-Tencor Corporation Broadband and wide field angle compensator

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004010569A1 (de) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
DE102011079837A1 (de) * 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Belichtungsverfahren
WO2013013947A2 (fr) 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Système optique d'un appareil d'exposition pour projection micro-lithographique, et procédé d'exposition micro-lithographique
DE102022209869A1 (de) 2022-09-20 2024-03-21 Carl Zeiss Smt Gmbh Haltevorrichtung für eine optische Komponente mit polygonal berandeter optischer Fläche und zylindrischem Substratkörper

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
US5652745A (en) * 1990-07-09 1997-07-29 Asahi Kogaku Kogyo Kabushiki Kaisha Optical system using polarized light with prevention of effect of birefringence
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
WO2001001182A1 (fr) * 1999-06-25 2001-01-04 Corning Incorporated Lentille optique pour microlithographie vuv a cristaux de fluorure qui minimise l'effet birefringent, et paraisons optiques de celle-ci
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator
US20010036330A1 (en) * 2000-04-20 2001-11-01 Vincent Delisle Polarization beam splitter or combiner

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
US5652745A (en) * 1990-07-09 1997-07-29 Asahi Kogaku Kogyo Kabushiki Kaisha Optical system using polarized light with prevention of effect of birefringence
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator
WO2001001182A1 (fr) * 1999-06-25 2001-01-04 Corning Incorporated Lentille optique pour microlithographie vuv a cristaux de fluorure qui minimise l'effet birefringent, et paraisons optiques de celle-ci
US20010036330A1 (en) * 2000-04-20 2001-11-01 Vincent Delisle Polarization beam splitter or combiner

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6917458B2 (en) 2001-06-01 2005-07-12 Asml Netherlands B.V. Correction of birefringence in cubic crystalline optical systems
US7075696B2 (en) 2001-06-01 2006-07-11 Asml Netherlands B.V. Correction of birefringence in cubic crystalline optical systems
US7009769B2 (en) 2001-06-01 2006-03-07 Asml Netherlands B.V. Correction of birefringence in cubic crystalline optical systems
US6947192B2 (en) 2001-06-01 2005-09-20 Asml Netherlands B.V. Correction of birefringence in cubic crystalline optical systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7738172B2 (en) 2001-10-30 2010-06-15 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6844982B2 (en) 2002-04-26 2005-01-18 Nikon Corporation Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system
WO2004001480A3 (fr) * 2002-06-25 2004-05-13 Zeiss Carl Smt Ag Objectif de reduction catadioptrique
WO2004001480A2 (fr) * 2002-06-25 2003-12-31 Carl Zeiss Smt Ag Objectif de reduction catadioptrique
US7072102B2 (en) 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
US7075720B2 (en) 2002-08-22 2006-07-11 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in optical systems
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
EP1496398A1 (fr) * 2003-07-05 2005-01-12 Carl Zeiss SMT AG Appareil d'inspection quant à la polarisation, système de projection optique et méthode d'étalonnage
US7277182B2 (en) 2003-07-05 2007-10-02 Carl Zeiss Smt Ag Apparatus for polarization-specific examination, optical imaging system, and calibration method
EP1726994A2 (fr) 2005-05-25 2006-11-29 Carl Zeiss SMT AG Intégrateur de lumière pour un système d'éclairage, en particulier pour une installation d'éclairage de projection microlithographique
US8077289B2 (en) 2005-10-04 2011-12-13 Carl Zeiss Smt Gmbh Device and method for influencing the polarization distribution in an optical system
US8035803B2 (en) 2006-09-06 2011-10-11 Carl Zeiss Smt Gmbh Subsystem of an illumination system of a microlithographic projection exposure apparatus
WO2008074673A3 (fr) * 2006-12-21 2008-09-12 Zeiss Carl Smt Ag Système optique, en particulier un système d'éclairage ou un objectif de projection d'un appareil d'exposition par projection microlithographique
WO2008074673A2 (fr) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Système optique, en particulier un système d'éclairage ou un objectif de projection d'un appareil d'exposition par projection microlithographique
US9274435B2 (en) 2006-12-21 2016-03-01 Carl Zeiss Smt Gmbh Illumination system or projection objective of a microlithographic projection exposure apparatus
US8319945B2 (en) 2007-11-16 2012-11-27 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
DE102007055063A1 (de) 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
US8891060B2 (en) 2012-04-16 2014-11-18 Carl Zeiss Smt Gmbh Optical system, in particular of a microlithographic projection exposure apparatus
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
WO2013156335A1 (fr) 2012-04-17 2013-10-24 Carl Zeiss Smt Gmbh Système optique, en particulier d'un appareil d'exposition par projection microlithographique
US9588433B2 (en) 2012-04-17 2017-03-07 Carl Zeiss Smt Gmbh Optical system, in particular of a microlithographic projection exposure apparatus
DE102012223230A1 (de) 2012-12-14 2014-02-13 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US9519093B2 (en) 2013-08-23 2016-12-13 Kla-Tencor Corporation Broadband and wide field angle compensator
US9857292B2 (en) 2013-08-23 2018-01-02 Kla-Tencor Corporation Broadband and wide field angle compensator
WO2015044182A3 (fr) * 2013-09-25 2015-09-24 Asml Netherlands B.V. Appareil d'acheminement de faisceau et procédé associé
US10580545B2 (en) 2013-09-25 2020-03-03 Asml Netherlands B.V. Beam delivery apparatus and method

Also Published As

Publication number Publication date
EP1483616A1 (fr) 2004-12-08
AU2002342890A1 (en) 2003-09-22
DE10311809A1 (de) 2003-10-02

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