WO2003034482A3 - Method for selecting faulty dielectrics of a semiconductor component - Google Patents
Method for selecting faulty dielectrics of a semiconductor component Download PDFInfo
- Publication number
- WO2003034482A3 WO2003034482A3 PCT/DE2002/003781 DE0203781W WO03034482A3 WO 2003034482 A3 WO2003034482 A3 WO 2003034482A3 DE 0203781 W DE0203781 W DE 0203781W WO 03034482 A3 WO03034482 A3 WO 03034482A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- dielectrics
- component
- control layer
- semiconductor component
- faulty
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02776786A EP1438742A2 (en) | 2001-10-09 | 2002-10-07 | Method for selecting faulty dielectrics of a semiconductor component |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2001149773 DE10149773A1 (en) | 2001-10-09 | 2001-10-09 | Process for selecting faulty dielectrics of a semiconductor component comprises forming a testing layer during production of component above the dielectrics, testing functionality of the dielectrics, and removing or structuring |
DE10149773.3 | 2001-10-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003034482A2 WO2003034482A2 (en) | 2003-04-24 |
WO2003034482A3 true WO2003034482A3 (en) | 2004-01-29 |
Family
ID=7701909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2002/003781 WO2003034482A2 (en) | 2001-10-09 | 2002-10-07 | Method for selecting faulty dielectrics of a semiconductor component |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1438742A2 (en) |
DE (1) | DE10149773A1 (en) |
TW (1) | TW563220B (en) |
WO (1) | WO2003034482A2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0294259A2 (en) * | 1987-05-29 | 1988-12-07 | STMicroelectronics, Inc. | Screening of gate oxides on semiconductors |
US5391502A (en) * | 1993-08-27 | 1995-02-21 | Vlsi Technology, Inc. | Per-wafer method for globally stressing gate oxide during device fabrication |
US5543334A (en) * | 1993-12-15 | 1996-08-06 | Kabushiki Kaisha Toshiba | Method of screening semiconductor device |
US5798281A (en) * | 1995-11-08 | 1998-08-25 | Texas Instruments Incorporated | Method for stressing oxide in MOS devices during fabrication using first and second opposite potentials |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19936321C2 (en) * | 1999-08-02 | 2003-12-24 | Infineon Technologies Ag | Arrangement and method for testing a plurality of semiconductor chips at the wafer level |
-
2001
- 2001-10-09 DE DE2001149773 patent/DE10149773A1/en not_active Ceased
-
2002
- 2002-10-04 TW TW91122928A patent/TW563220B/en active
- 2002-10-07 WO PCT/DE2002/003781 patent/WO2003034482A2/en not_active Application Discontinuation
- 2002-10-07 EP EP02776786A patent/EP1438742A2/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0294259A2 (en) * | 1987-05-29 | 1988-12-07 | STMicroelectronics, Inc. | Screening of gate oxides on semiconductors |
US5391502A (en) * | 1993-08-27 | 1995-02-21 | Vlsi Technology, Inc. | Per-wafer method for globally stressing gate oxide during device fabrication |
US5543334A (en) * | 1993-12-15 | 1996-08-06 | Kabushiki Kaisha Toshiba | Method of screening semiconductor device |
US5798281A (en) * | 1995-11-08 | 1998-08-25 | Texas Instruments Incorporated | Method for stressing oxide in MOS devices during fabrication using first and second opposite potentials |
Also Published As
Publication number | Publication date |
---|---|
DE10149773A1 (en) | 2003-04-24 |
WO2003034482A2 (en) | 2003-04-24 |
TW563220B (en) | 2003-11-21 |
EP1438742A2 (en) | 2004-07-21 |
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