WO2003012548A3 - System zum vermessen eines optischen systems, insbesondere eines objektives - Google Patents

System zum vermessen eines optischen systems, insbesondere eines objektives Download PDF

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Publication number
WO2003012548A3
WO2003012548A3 PCT/EP2002/008111 EP0208111W WO03012548A3 WO 2003012548 A3 WO2003012548 A3 WO 2003012548A3 EP 0208111 W EP0208111 W EP 0208111W WO 03012548 A3 WO03012548 A3 WO 03012548A3
Authority
WO
WIPO (PCT)
Prior art keywords
measuring
objective
optical system
determining
measuring element
Prior art date
Application number
PCT/EP2002/008111
Other languages
English (en)
French (fr)
Other versions
WO2003012548A2 (de
Inventor
Alexander Kohl
Hubert Holderer
Werner Lang
Hartmut Brandenburg
Johannes Rau
Bernhard Gellrich
Armin Schoeppach
Original Assignee
Zeiss Carl Semiconductor Mfg
Alexander Kohl
Hubert Holderer
Werner Lang
Hartmut Brandenburg
Johannes Rau
Bernhard Gellrich
Armin Schoeppach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Semiconductor Mfg, Alexander Kohl, Hubert Holderer, Werner Lang, Hartmut Brandenburg, Johannes Rau, Bernhard Gellrich, Armin Schoeppach filed Critical Zeiss Carl Semiconductor Mfg
Priority to JP2003517671A priority Critical patent/JP2004537058A/ja
Publication of WO2003012548A2 publication Critical patent/WO2003012548A2/de
Publication of WO2003012548A3 publication Critical patent/WO2003012548A3/de
Priority to US10/757,189 priority patent/US20040257675A1/en
Priority to US12/002,694 priority patent/US20080100930A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Ein System zum Vermessen eines optischen Systems, insbesondere eines Objektives, ist mit einer Messmaschine versehen, die wenigstens ein Messglied für Ortsbestimmungen und wenigstens ein Messglied für Winkelbestimmungen aufweist, wobei für das ortsbestimmende Messglied und das winkelbestimmende Messglied wenigstens eine gemeinsame Referenzfläche vorgesehen ist.
PCT/EP2002/008111 2001-07-26 2002-07-20 System zum vermessen eines optischen systems, insbesondere eines objektives WO2003012548A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003517671A JP2004537058A (ja) 2001-07-26 2002-07-20 光学系、特に対物レンズ光学系を測定するためのシステム
US10/757,189 US20040257675A1 (en) 2001-07-26 2004-01-14 Optical measuring system, and a projection objective
US12/002,694 US20080100930A1 (en) 2001-07-26 2007-12-17 Optical measuring system, and a projection objective

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10136388A DE10136388A1 (de) 2001-07-26 2001-07-26 System zum Vermessen eines optischen Systems, insbesondere eines Objektives
DE10136388.5 2001-07-26

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/757,189 Continuation-In-Part US20040257675A1 (en) 2001-07-26 2004-01-14 Optical measuring system, and a projection objective

Publications (2)

Publication Number Publication Date
WO2003012548A2 WO2003012548A2 (de) 2003-02-13
WO2003012548A3 true WO2003012548A3 (de) 2003-04-17

Family

ID=7693147

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008111 WO2003012548A2 (de) 2001-07-26 2002-07-20 System zum vermessen eines optischen systems, insbesondere eines objektives

Country Status (4)

Country Link
US (2) US20040257675A1 (de)
JP (1) JP2004537058A (de)
DE (1) DE10136388A1 (de)
WO (1) WO2003012548A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006037651A1 (en) 2004-10-08 2006-04-13 Carl Zeiss Smt Ag Optical projection system
DE102016212019A1 (de) * 2016-07-01 2018-01-04 Carl Zeiss Microscopy Gmbh Neigungsmessung und -korrektur des Deckglases im Strahlengang eines Mikroskops
DE102016212853B3 (de) * 2016-07-14 2017-11-09 Carl Zeiss Smt Gmbh Verfahren zum Justieren einer optischen Einrichtung
CN109297680B (zh) * 2018-08-14 2021-07-06 奥比中光科技集团股份有限公司 光轴偏移误差值的检测方法及装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117601A (en) * 1976-02-10 1978-10-03 Firma Dr. Johannes Heidenhain Gmbh. Longitudinal measuring instrument
US4537473A (en) * 1982-11-05 1985-08-27 Corning Glass Works Fiducial surfaces
US4953306A (en) * 1987-05-05 1990-09-04 Mauser-Werke Oberndorf Gmbh Flexible CNC-multiposition measuring installation
DE4107299A1 (de) * 1991-03-07 1992-09-10 Olaf Dipl Ing Mollenhauer Verfahren und anordnung zur beruehrungslosen erfassung und/oder justierung des zentrierungsfehlers optisch wirksamer flaechen
US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
US6195213B1 (en) * 1998-06-08 2001-02-27 Nikon Corporation Projection exposure apparatus and method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4177601A (en) * 1978-02-21 1979-12-11 Morton Roger H Floated bag trap
US4165178A (en) * 1978-06-29 1979-08-21 International Business Machines Corporation Gap measurement tool

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117601A (en) * 1976-02-10 1978-10-03 Firma Dr. Johannes Heidenhain Gmbh. Longitudinal measuring instrument
US4537473A (en) * 1982-11-05 1985-08-27 Corning Glass Works Fiducial surfaces
US4953306A (en) * 1987-05-05 1990-09-04 Mauser-Werke Oberndorf Gmbh Flexible CNC-multiposition measuring installation
DE4107299A1 (de) * 1991-03-07 1992-09-10 Olaf Dipl Ing Mollenhauer Verfahren und anordnung zur beruehrungslosen erfassung und/oder justierung des zentrierungsfehlers optisch wirksamer flaechen
US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
US6195213B1 (en) * 1998-06-08 2001-02-27 Nikon Corporation Projection exposure apparatus and method

Also Published As

Publication number Publication date
US20040257675A1 (en) 2004-12-23
JP2004537058A (ja) 2004-12-09
US20080100930A1 (en) 2008-05-01
DE10136388A1 (de) 2003-02-13
WO2003012548A2 (de) 2003-02-13

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