WO2003011696A1 - Dispositif permettant de former un film carbone sur une surface interieure d'un recipient en plastique, et procede de production d'un recipient en plastique recouvert d'un film carbone sur sa surface interieure - Google Patents

Dispositif permettant de former un film carbone sur une surface interieure d'un recipient en plastique, et procede de production d'un recipient en plastique recouvert d'un film carbone sur sa surface interieure Download PDF

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Publication number
WO2003011696A1
WO2003011696A1 PCT/JP2002/007496 JP0207496W WO03011696A1 WO 2003011696 A1 WO2003011696 A1 WO 2003011696A1 JP 0207496 W JP0207496 W JP 0207496W WO 03011696 A1 WO03011696 A1 WO 03011696A1
Authority
WO
WIPO (PCT)
Prior art keywords
plastic vessel
carbon film
external electrode
gas
internal electrode
Prior art date
Application number
PCT/JP2002/007496
Other languages
English (en)
French (fr)
Inventor
Takao Abe
Hideo Yamakoshi
Mitsuo Katoh
Yuuji Asahara
Original Assignee
Mitsubishi Heavy Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries, Ltd. filed Critical Mitsubishi Heavy Industries, Ltd.
Publication of WO2003011696A1 publication Critical patent/WO2003011696A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
PCT/JP2002/007496 2001-07-31 2002-07-24 Dispositif permettant de former un film carbone sur une surface interieure d'un recipient en plastique, et procede de production d'un recipient en plastique recouvert d'un film carbone sur sa surface interieure WO2003011696A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001-232301 2001-07-31
JP2001232301 2001-07-31
JP2001-358133 2001-11-22
JP2001358133A JP3653035B2 (ja) 2001-07-31 2001-11-22 プラスチック容器内面への炭素膜形成装置および内面炭素膜被覆プラスチック容器の製造方法

Publications (1)

Publication Number Publication Date
WO2003011696A1 true WO2003011696A1 (fr) 2003-02-13

Family

ID=26619698

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007496 WO2003011696A1 (fr) 2001-07-31 2002-07-24 Dispositif permettant de former un film carbone sur une surface interieure d'un recipient en plastique, et procede de production d'un recipient en plastique recouvert d'un film carbone sur sa surface interieure

Country Status (3)

Country Link
JP (1) JP3653035B2 (ja)
TW (1) TW548338B (ja)
WO (1) WO2003011696A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009127294A1 (de) * 2008-04-14 2009-10-22 Iplas Innovative Plasma Systems Gmbh Vorrichtung und verfahren zur inneren oberflächenbehandlung von hohlkörpern
DE102012103425A1 (de) * 2012-04-19 2013-10-24 Roth & Rau Ag Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb
CN105551923A (zh) * 2014-10-24 2016-05-04 松下知识产权经营株式会社 等离子体生成装置及等离子体生成方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260425A (ja) * 1993-03-02 1994-09-16 Anelva Corp プラズマ処理装置
JPH0853117A (ja) * 1994-08-11 1996-02-27 Kirin Brewery Co Ltd 炭素膜コーティングプラスチック容器の製造装置および製造方法
JP2000185997A (ja) * 1998-12-24 2000-07-04 Daiei Seiko Kk ダイヤモンドライクカーボン膜形成装置およびダイヤモンドライクカーボン膜形成方法
JP2000256859A (ja) * 1999-03-04 2000-09-19 Toppan Printing Co Ltd プラスチック容器の成膜装置
JP2000353690A (ja) * 1999-06-11 2000-12-19 Sharp Corp プラズマリアクタ装置
JP2001220679A (ja) * 2000-02-01 2001-08-14 Toppan Printing Co Ltd 成膜装置及び成膜方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260425A (ja) * 1993-03-02 1994-09-16 Anelva Corp プラズマ処理装置
JPH0853117A (ja) * 1994-08-11 1996-02-27 Kirin Brewery Co Ltd 炭素膜コーティングプラスチック容器の製造装置および製造方法
JP2000185997A (ja) * 1998-12-24 2000-07-04 Daiei Seiko Kk ダイヤモンドライクカーボン膜形成装置およびダイヤモンドライクカーボン膜形成方法
JP2000256859A (ja) * 1999-03-04 2000-09-19 Toppan Printing Co Ltd プラスチック容器の成膜装置
JP2000353690A (ja) * 1999-06-11 2000-12-19 Sharp Corp プラズマリアクタ装置
JP2001220679A (ja) * 2000-02-01 2001-08-14 Toppan Printing Co Ltd 成膜装置及び成膜方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009127294A1 (de) * 2008-04-14 2009-10-22 Iplas Innovative Plasma Systems Gmbh Vorrichtung und verfahren zur inneren oberflächenbehandlung von hohlkörpern
DE102012103425A1 (de) * 2012-04-19 2013-10-24 Roth & Rau Ag Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb
US9431217B2 (en) 2012-04-19 2016-08-30 Meyer Burger (Germany) Ag Microwave plasma generating device and method for operating same
CN105551923A (zh) * 2014-10-24 2016-05-04 松下知识产权经营株式会社 等离子体生成装置及等离子体生成方法

Also Published As

Publication number Publication date
TW548338B (en) 2003-08-21
JP2003113469A (ja) 2003-04-18
JP3653035B2 (ja) 2005-05-25

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