WO2003010802A1 - Appareil a etage, systeme et procede d'exposition et procede de production de dispositif - Google Patents
Appareil a etage, systeme et procede d'exposition et procede de production de dispositif Download PDFInfo
- Publication number
- WO2003010802A1 WO2003010802A1 PCT/JP2002/007555 JP0207555W WO03010802A1 WO 2003010802 A1 WO2003010802 A1 WO 2003010802A1 JP 0207555 W JP0207555 W JP 0207555W WO 03010802 A1 WO03010802 A1 WO 03010802A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stage
- exposure
- stage apparatus
- device production
- production method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003516090A JPWO2003010802A1 (ja) | 2001-07-26 | 2002-07-25 | ステージ装置、露光装置及び露光方法、並びにデバイス製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001225235 | 2001-07-26 | ||
JP2001-225235 | 2001-07-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003010802A1 true WO2003010802A1 (fr) | 2003-02-06 |
Family
ID=19058255
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/007555 WO2003010802A1 (fr) | 2001-07-26 | 2002-07-25 | Appareil a etage, systeme et procede d'exposition et procede de production de dispositif |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2003010802A1 (fr) |
TW (1) | TW550668B (fr) |
WO (1) | WO2003010802A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006179920A (ja) * | 2004-12-22 | 2006-07-06 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
KR20140098165A (ko) * | 2004-02-02 | 2014-08-07 | 가부시키가이샤 니콘 | 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998024115A1 (fr) * | 1996-11-28 | 1998-06-04 | Nikon Corporation | Dispositif d'alignement et procede d'exposition |
EP1052550A2 (fr) * | 1999-04-19 | 2000-11-15 | Asm Lithography B.V. | Systèmes d' entraínement d' une pluralité de porte-objets et leur application dans appareils de projection lithographique |
US20010004105A1 (en) * | 1999-12-21 | 2001-06-21 | Kwan Yim Bun P. | Crash prevention in positioning apparatus for use in lithographic projection apparatus |
JP2001203140A (ja) * | 2000-01-20 | 2001-07-27 | Nikon Corp | ステージ装置、露光装置及びデバイス製造方法 |
JP2002246287A (ja) * | 2001-02-16 | 2002-08-30 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
-
2002
- 2002-07-25 JP JP2003516090A patent/JPWO2003010802A1/ja not_active Withdrawn
- 2002-07-25 WO PCT/JP2002/007555 patent/WO2003010802A1/fr active Application Filing
- 2002-07-26 TW TW091116668A patent/TW550668B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998024115A1 (fr) * | 1996-11-28 | 1998-06-04 | Nikon Corporation | Dispositif d'alignement et procede d'exposition |
EP1052550A2 (fr) * | 1999-04-19 | 2000-11-15 | Asm Lithography B.V. | Systèmes d' entraínement d' une pluralité de porte-objets et leur application dans appareils de projection lithographique |
US20010004105A1 (en) * | 1999-12-21 | 2001-06-21 | Kwan Yim Bun P. | Crash prevention in positioning apparatus for use in lithographic projection apparatus |
JP2001203140A (ja) * | 2000-01-20 | 2001-07-27 | Nikon Corp | ステージ装置、露光装置及びデバイス製造方法 |
JP2002246287A (ja) * | 2001-02-16 | 2002-08-30 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140098165A (ko) * | 2004-02-02 | 2014-08-07 | 가부시키가이샤 니콘 | 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법 |
KR101590742B1 (ko) * | 2004-02-02 | 2016-02-01 | 가부시키가이샤 니콘 | 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법 |
JP2006179920A (ja) * | 2004-12-22 | 2006-07-06 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
JP4509924B2 (ja) * | 2004-12-22 | 2010-07-21 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、円形コンベヤ、及びデバイス製造方法 |
JP2010192905A (ja) * | 2004-12-22 | 2010-09-02 | Asml Netherlands Bv | リソグラフィ装置、円形コンベヤ、及びデバイス製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2003010802A1 (ja) | 2004-11-18 |
TW550668B (en) | 2003-09-01 |
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