WO2003002995A3 - Device for and method of material analysis using a shutter comprising a calibration sample - Google Patents

Device for and method of material analysis using a shutter comprising a calibration sample Download PDF

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Publication number
WO2003002995A3
WO2003002995A3 PCT/IB2002/002402 IB0202402W WO03002995A3 WO 2003002995 A3 WO2003002995 A3 WO 2003002995A3 IB 0202402 W IB0202402 W IB 0202402W WO 03002995 A3 WO03002995 A3 WO 03002995A3
Authority
WO
WIPO (PCT)
Prior art keywords
sample
shutter
calibration sample
material analysis
rays
Prior art date
Application number
PCT/IB2002/002402
Other languages
French (fr)
Other versions
WO2003002995A2 (en
Inventor
Lange Roelof De
Bruno A R Vrebos
Original Assignee
Panalytical Bv
Lange Roelof De
Bruno A R Vrebos
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panalytical Bv, Lange Roelof De, Bruno A R Vrebos filed Critical Panalytical Bv
Priority to JP2003509129A priority Critical patent/JP2004530912A/en
Priority to US10/482,562 priority patent/US7042978B2/en
Priority to EP02738492A priority patent/EP1405060A2/en
Publication of WO2003002995A2 publication Critical patent/WO2003002995A2/en
Publication of WO2003002995A3 publication Critical patent/WO2003002995A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

A device (1; 1a) for the examination of at least one material sample (3; 3a, 3b, 3c) which can be inserted into the device (1; 1a) and is irradiated by means of electromagnetic waves (4), notably X-rays; in the measuring position the material sample (3; 3a, 3b, 3c) can be subjected to irradiation by means of the electromagnetic waves (4) and during a change of sample the beam path (4) can be interrupted by means of a closure element (8) which can be moved into the beam path. The device is constructed in such a manner that the closure element (8) is provided with a reference sample (9) on its side which faces the rays (4) in a manner such that a reference measurement can be performed thereon during a change of sample.
PCT/IB2002/002402 2001-06-29 2002-06-20 Device for and method of material analysis using a shutter comprising a calibration sample WO2003002995A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003509129A JP2004530912A (en) 2001-06-29 2002-06-20 Examination of material samples
US10/482,562 US7042978B2 (en) 2001-06-29 2002-06-20 Examination of material samples
EP02738492A EP1405060A2 (en) 2001-06-29 2002-06-20 Device for and method of material analysis using a shutter comprising a calibration sample

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01202511.0 2001-06-29
EP01202511 2001-06-29

Publications (2)

Publication Number Publication Date
WO2003002995A2 WO2003002995A2 (en) 2003-01-09
WO2003002995A3 true WO2003002995A3 (en) 2003-05-01

Family

ID=8180565

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2002/002402 WO2003002995A2 (en) 2001-06-29 2002-06-20 Device for and method of material analysis using a shutter comprising a calibration sample

Country Status (4)

Country Link
US (1) US7042978B2 (en)
EP (1) EP1405060A2 (en)
JP (1) JP2004530912A (en)
WO (1) WO2003002995A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4468400B2 (en) * 2007-03-30 2010-05-26 株式会社日立ハイテクノロジーズ Inspection apparatus and inspection method
JP5307503B2 (en) * 2008-07-01 2013-10-02 株式会社日立ハイテクサイエンス X-ray analyzer and X-ray analysis method
WO2011100437A2 (en) * 2010-02-10 2011-08-18 Schlumberger Norge As X-ray fluorescence analyzer
US9244026B2 (en) * 2010-02-10 2016-01-26 Schlumberger Norge As X-ray fluorescence analyzer
US11892421B2 (en) 2021-12-06 2024-02-06 Schlumberger Technology Corporation System and method for cleaning electrical stability probe

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014580A1 (en) * 1979-02-09 1980-08-20 Martin Marietta Corporation Element analysis unit
JPS57131042A (en) * 1981-02-06 1982-08-13 Yokogawa Hokushin Electric Corp X rays analyzer with automatic calibration apparatus
JPS62177845A (en) * 1986-01-31 1987-08-04 Shimadzu Corp System calibration device
US4962517A (en) * 1982-06-03 1990-10-09 Seiko Instruments Inc. Automatic X-ray correction device
US5060247A (en) * 1988-11-17 1991-10-22 Seiko Instruments, Inc. Fluorescent x-ray film thickness gauge

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3919548A (en) * 1974-07-24 1975-11-11 David E Porter X-Ray energy spectrometer system
US4959848A (en) * 1987-12-16 1990-09-25 Axic Inc. Apparatus for the measurement of the thickness and concentration of elements in thin films by means of X-ray analysis
US4961502A (en) * 1988-01-21 1990-10-09 Griffiths Gerald R Reusable sterile x-ray cassette holder
US5754621A (en) * 1993-03-15 1998-05-19 Hitachi, Ltd. X-ray inspection method and apparatus, prepreg inspecting method, and method for fabricating multi-layer printed circuit board
JP2642907B2 (en) * 1995-06-14 1997-08-20 工業技術院長 X-ray exposure equipment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014580A1 (en) * 1979-02-09 1980-08-20 Martin Marietta Corporation Element analysis unit
JPS57131042A (en) * 1981-02-06 1982-08-13 Yokogawa Hokushin Electric Corp X rays analyzer with automatic calibration apparatus
US4962517A (en) * 1982-06-03 1990-10-09 Seiko Instruments Inc. Automatic X-ray correction device
JPS62177845A (en) * 1986-01-31 1987-08-04 Shimadzu Corp System calibration device
US5060247A (en) * 1988-11-17 1991-10-22 Seiko Instruments, Inc. Fluorescent x-ray film thickness gauge

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 006, no. 229 (P - 155) 16 November 1982 (1982-11-16) *
PATENT ABSTRACTS OF JAPAN vol. 012, no. 020 (E - 575) 21 January 1988 (1988-01-21) *

Also Published As

Publication number Publication date
US20040234029A1 (en) 2004-11-25
EP1405060A2 (en) 2004-04-07
US7042978B2 (en) 2006-05-09
JP2004530912A (en) 2004-10-07
WO2003002995A2 (en) 2003-01-09

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