WO2002099534A3 - Beleuchtungssystem mit einer vielzahl von einzelgittern - Google Patents

Beleuchtungssystem mit einer vielzahl von einzelgittern Download PDF

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Publication number
WO2002099534A3
WO2002099534A3 PCT/EP2002/005688 EP0205688W WO02099534A3 WO 2002099534 A3 WO2002099534 A3 WO 2002099534A3 EP 0205688 W EP0205688 W EP 0205688W WO 02099534 A3 WO02099534 A3 WO 02099534A3
Authority
WO
WIPO (PCT)
Prior art keywords
lighting system
plane
individual grids
grid element
diaphragm
Prior art date
Application number
PCT/EP2002/005688
Other languages
English (en)
French (fr)
Other versions
WO2002099534A9 (de
WO2002099534A2 (de
Inventor
Markus Weiss
Bernd Kleemann
Karlfried Osterried
Wolfgang Singer
Johannes Wangler
Frank Melzer
Andreas Heisler
Vadim Yevgenyevich Banine
Original Assignee
Carl Zeiss Semiconductor
Asml Netherlands
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Semiconductor, Asml Netherlands filed Critical Carl Zeiss Semiconductor
Priority to EP02743087A priority Critical patent/EP1393134A2/de
Priority to JP2003502587A priority patent/JP2004528726A/ja
Publication of WO2002099534A2 publication Critical patent/WO2002099534A2/de
Publication of WO2002099534A9 publication Critical patent/WO2002099534A9/de
Publication of WO2002099534A3 publication Critical patent/WO2002099534A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Abstract

Die Erfindung betrifft ein Beleuchtungssystem für Wellenlängen 100 nm mit einer Objektebene und einer Feldebene. Die Erfindung ist dadurch gekennzeichnet, dass das Beleuchtungssystem umfasst: mindestens ein Gitterelement (1), das eine Vielzahl von Einzelgittern (9) aufweist mindestens einer physikalischen Blende (7.3) in einer Blendenebene, die dem Gitterelement (1) im Strahlengang von der Objektebene zur Bildebene nachgeordnet ist.
PCT/EP2002/005688 2001-06-07 2002-05-24 Beleuchtungssystem mit einer vielzahl von einzelgittern WO2002099534A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02743087A EP1393134A2 (de) 2001-06-07 2002-05-24 Beleuchtungssystem mit einer vielzahl von einzelgittern
JP2003502587A JP2004528726A (ja) 2001-06-07 2002-05-24 複数の単一回折格子を有する照明光学系

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10127449A DE10127449A1 (de) 2001-06-07 2001-06-07 Beleuchtungssystem mit einer Vielzahl von Einzelgittern
DE10127449.1 2001-06-07

Publications (3)

Publication Number Publication Date
WO2002099534A2 WO2002099534A2 (de) 2002-12-12
WO2002099534A9 WO2002099534A9 (de) 2003-03-20
WO2002099534A3 true WO2002099534A3 (de) 2003-10-02

Family

ID=7687371

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/005688 WO2002099534A2 (de) 2001-06-07 2002-05-24 Beleuchtungssystem mit einer vielzahl von einzelgittern

Country Status (5)

Country Link
US (1) US6836530B2 (de)
EP (1) EP1393134A2 (de)
JP (1) JP2004528726A (de)
DE (1) DE10127449A1 (de)
WO (1) WO2002099534A2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7248667B2 (en) * 1999-05-04 2007-07-24 Carl Zeiss Smt Ag Illumination system with a grating element
US7080257B1 (en) * 2000-03-27 2006-07-18 Microsoft Corporation Protecting digital goods using oblivious checking
US20050180013A1 (en) * 2002-03-21 2005-08-18 Carl Zeiss Smt Ag Grating element for filtering wavelengths < 100 nm
US7084412B2 (en) 2002-03-28 2006-08-01 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
DE10214259A1 (de) * 2002-03-28 2003-10-23 Zeiss Carl Semiconductor Mfg Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm
EP1510869A3 (de) * 2003-08-29 2009-07-29 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und damit erzeugte Vorrichtung
EP1517183A1 (de) * 2003-08-29 2005-03-23 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
JP4500996B2 (ja) * 2004-04-30 2010-07-14 国立大学法人 千葉大学 基盤に固着した貴金属膜からなるホログラフィック光学素子
WO2006021419A2 (en) * 2004-08-23 2006-03-02 Carl Zeiss Smt Ag Illumination system of a microlithographic exposure apparatus
JP4710406B2 (ja) 2005-04-28 2011-06-29 ウシオ電機株式会社 極端紫外光露光装置および極端紫外光光源装置
JP5815197B2 (ja) * 2006-01-24 2015-11-17 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルＴｈｅ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｎｏｒｔｈ Ｃａｒｏｌｉｎａ Ａｔ Ｃｈａｐｅｌ Ｈｉｌｌ 多色性分布を持つｘ線ビームを用いて対象物の画像を検知するシステムと方法
ES2311409A1 (es) 2007-07-13 2009-02-01 Samcla-Esic, S.L. Sistema de riego automatizado, remoto y centralizado.
JP5611223B2 (ja) 2008-12-01 2014-10-22 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルＴｈｅ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｎｏｒｔｈ Ｃａｒｏｌｉｎａ Ａｔ Ｃｈａｐｅｌ Ｈｉｌｌ 多色分布を持つｘ線ビームからのマルチビームイメージングを用いる対象の画像の検出システム及び方法
US8204174B2 (en) 2009-06-04 2012-06-19 Nextray, Inc. Systems and methods for detecting an image of an object by use of X-ray beams generated by multiple small area sources and by use of facing sides of adjacent monochromator crystals
WO2010141735A2 (en) * 2009-06-04 2010-12-09 Nextray, Inc. Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods
DE102017204312A1 (de) 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optische Wellenlängen-Filterkomponente für ein Lichtbündel
DE102016212361A1 (de) * 2016-07-06 2018-01-11 Carl Zeiss Smt Gmbh Optisches Gitter und optische Anordnung damit

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5920380A (en) * 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
WO2000008526A1 (en) * 1998-08-06 2000-02-17 Euv Limited Liability Corporation Diffractive element in extreme-uv lithography condenser

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798446A (en) * 1987-09-14 1989-01-17 The United States Of America As Represented By The United States Department Of Energy Aplanatic and quasi-aplanatic diffraction gratings
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
US5905571A (en) * 1995-08-30 1999-05-18 Sandia Corporation Optical apparatus for forming correlation spectrometers and optical processors
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
US20020105725A1 (en) * 2000-12-18 2002-08-08 Sweatt William C. Electrically-programmable optical processor with enhanced resolution

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5920380A (en) * 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
WO2000008526A1 (en) * 1998-08-06 2000-02-17 Euv Limited Liability Corporation Diffractive element in extreme-uv lithography condenser

Also Published As

Publication number Publication date
US20030099040A1 (en) 2003-05-29
WO2002099534A9 (de) 2003-03-20
JP2004528726A (ja) 2004-09-16
DE10127449A1 (de) 2002-12-12
US6836530B2 (en) 2004-12-28
EP1393134A2 (de) 2004-03-03
WO2002099534A2 (de) 2002-12-12

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