WO2002099160A1 - Gas port sealing for cvd/cvi furnace hearth plates - Google Patents

Gas port sealing for cvd/cvi furnace hearth plates Download PDF

Info

Publication number
WO2002099160A1
WO2002099160A1 PCT/US2002/017576 US0217576W WO02099160A1 WO 2002099160 A1 WO2002099160 A1 WO 2002099160A1 US 0217576 W US0217576 W US 0217576W WO 02099160 A1 WO02099160 A1 WO 02099160A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas inlet
flow direction
cvd
inlet port
cvi
Prior art date
Application number
PCT/US2002/017576
Other languages
French (fr)
Inventor
Rajanikant Jonnalagadda
Brian J. Miller
Original Assignee
Honeywell International Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc. filed Critical Honeywell International Inc.
Priority to EP02756119A priority Critical patent/EP1392885A1/en
Publication of WO2002099160A1 publication Critical patent/WO2002099160A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

Definitions

  • Vapor Deposition/Infiltration (CVD/CVI) apparatus and processes and more particularly to a method and apparatus utilizing a flow direction nozzle in a CVD/CVI furnace for improving CVD/CVI process time and reducing gas leakage.
  • CVD/CVI Vapor Deposition/Infiltration
  • Chemical vapor deposition and infiltration is a well-known process for depositing a binding matrix within a porous structure.
  • the term "chemical vapor deposition” (CVD) generally implies deposition of a surface coating, but the term is also used to refer to infiltration and deposition of a matrix within a porous structure.
  • the term CVD/CVl is intended to refer to infiltration and deposition of a matrix within a porous structure.
  • CVD/CVI is particularly suitable for fabricating high temperature structural composites by depositing a carbonaceous or ceramic matrix within a carbonaceous or ceramic porous structure resulting in very useful structures such as carbon/carbon aircraft brake disks, and ceramic combustor or turbine components.
  • the generally known CVD/CVI processes may be classified into four general categories: isothermal, thermal gradient, pressure gradient, and pulsed flow. The specific process times and steps, reactant gas and CVD/CVI furnaces and associated apparatus may vary depending on which of these four general categories is utilized.
  • U.S. Patent No. 6, 1 62,298 and corresponding European Patent Application EP 0 997 553 A1 to Rudolph describe these and other CVD/CVI processes and apparatus in further detail.
  • FIG. 1 is a side cross-sectional view of a furnace according to U.S. Patent No. 6, 1 62,298.
  • a generally cylindrical furnace 1 0 configured to be employed with a high temperature process is shown.
  • the furnace includes a steel shell 12 and a steel lid 14.
  • the shell 12 includes a flange 1 6 and the lid 14 includes a mating flange 1 8 that seals against flange 1 6 when the lid 14 is installed upon the shell 1 2, as shown in FIG. 1 .
  • the lid also includes a vacuum port 20.
  • the shell 1 2 and lid 14 together define a furnace volume 22 that is reduced to vacuum pressure by a steam vacuum generator (not shown) in fluid communication with the vacuum port 20.
  • the shell 12 rests upon a multitude of legs 62.
  • the furnace 10 also includes a cylindrical induction coil 24 adjacent a cylindrical susceptor 26.
  • the induction coil 24 includes coiled conductors 23 encapsulated by electrical insulation 27.
  • the induction coil 24 develops an electromagnetic field that couples with the susceptor 26 and generates heat within the susceptor 26.
  • the induction coil 24 may be cooled, typically by integral water passages 25 within the coil 24.
  • the susceptor 26 rests upon a susceptor floor 28 and is covered by a susceptor lid 30.
  • a cylindrical insulation wall 32 is disposed in between the susceptor 26 and the induction coil 24.
  • a lid insulation layer 34 and a floor insulation layer 36 are disposed over the susceptor lid 30 and beneath the susceptor floor 28, respectively.
  • the furnace floor 38 is attached to the shell 1 2 by a floor support structure 40 that includes a multitude of vertical web structures 42.
  • a reactant gas is supplied to the furnace 10 by a main gas supply line 44.
  • a plurality of individual gas supply lines 46 are connected in fluid communication with a plurality of gas ports 48 that pass through the furnace shell , 1 2.
  • a plurality of flexible gas supply lines 50 are connected in fluid communication with the gas ports 48 and a multitude of gas inlets 52 that pass through holes 54 in the furnace floor 38, the floor insulation layer 36, and the susceptor floor 28.
  • U.S. Patent No. 6, 1 62,298 further describes a gas preheater 56 resting on the susceptor floor 28 and including a multitude of stacked perforated plates 58 that are spaced from other by a spacing structure 60.
  • Each plate 58 is provided with an array of perforations that are horizontally shifted from the array of perforations of the adjacent plate 58. This causes the reactant gas to pass back and forth through the plates, which diffuses the reactant gas within the preheater 56 and increases convective heat transfer to the gas from the perforated plates 58.
  • a multitude of porous substrates 62 for example brake disks, are stacked within the furnace 10 inside the susceptor 26 on fixtures (not shown).
  • U.S. Patent No. 6, 162,298 is directed toward preventing gas leakage around the gas inlet 52 extending through the hole 54 in the susceptor floor 28 in the CVD/CVI furnace 10.
  • the method and apparatus seal the gas inlet 52 to the susceptor floor 28 with sufficient intimacy to block leakage of gas through the hole 54 around the gas inlet 52 while allowing the gas inlet 52 to cyclically translate through the hole 54, as indicated by arrow 55, due to thermal expansion and contraction induced by thermal cycles in the CVD/CVI furnace 10.
  • Reactant gas entry through the gas inlets 52 is diffused within the preheater 56 and eventually reaches the porous substrates 62. However, reactant gas leaving the gas inlets 52 follows a tortuous path as it travels back and forth through the plates 58.
  • the present invention overcomes the shortcomings associated with the background art and achieves other advantages not realized by the background art.
  • the present invention in part, is a recognition that current CVD/CVI process time is lengthy and results in considerable expense.
  • the present invention provides a CVD/CVI method and apparatus that reduces process time, ensures efficient use of reactant gases, and permits an increase in process output.
  • the present invention in part, is a recognition that reactant gas, such as densification gas, delivered directly to target carbon parts, will greatly improve process time.
  • the present invention in part, provides a gas inlet port assembly for a CVD/CVI furnace having a furnace compartment and a CVD/CVI process apparatus with a plurality of holes, the gas inlet port assembly comprising a plurality of gas inlet ports delivering process gas to the furnace compartment; and a plurality of flow direction nozzles positioned between the holes of the CVD/CVI process apparatus and the gas inlet ports.
  • the present invention also in part, provides a flow direction nozzle assembly for a CVD/CVI furnace, the flow direction nozzle assembly comp ⁇ sing a flow direction nozzle including a gas inlet port sealing portion; a support shoulder; and a nozzle portion.
  • the present invention also in part, provides a method for sealing gas inlet ports for delivering a process gas in a CVD/CVI furnace, the method comprising positioning flow direction nozzles along upper lips of the gas inlet ports; loading a CVD/CVI process apparatus having a plurality of gas inlet holes into the furnace; sealingly engaging the flow direction nozzles to the gas inlet holes of the process apparatus to create a gas path-directing, fluid seal.
  • FIG. 1 is a side cross-sectional view of a furnace according to the background art
  • FIG. 2 is a side cross-sectional view of a furnace incorporating an embodiment of the present invention
  • FIG. 3 is an enlarged, side cross-sectional view of hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention
  • FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention.
  • FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention.
  • FIG. 2 is a side cross-sectional view of a furnace incorporating an embodiment of the present invention.
  • Fig. 3 is an enlarged, side cross-sectional view of the hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention, currently provided for resistively heated furnaces. However, the present invention is similarly applicable to inductively heated furnaces.
  • FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention.
  • FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention.
  • FIG. 2 is a side cross-sectional view of an exemplary furnace incorporating an embodiment of the present invention.
  • a generally cylindrical furnace 10 configured to be employed in a densification process for carbon fiber based brakes is shown in FIG. 2.
  • the furnace includes a steel shell 1 2 and a steel lid 14.
  • the shell 12 includes a flange 1 6 and the lid 14 includes a mating flange 1 8 that seals against flange 1 6 when the lid 14 is installed upon the shell 1 2, as shown in FIG. 1 .
  • the lid may also include a vacuum port 20.
  • the shell 12 and lid 14 together define a furnace volume 22 that may be reduced to vacuum pressure by a steam vacuum generator (not shown) in fluid communication with the vacuum port 20.
  • the shell 12 rests upon a multitude of legs 62.
  • the furnace 10 may also be provided with a cylindrical induction coil 24 adjacent a cylindrical susceptor 26.
  • the induction coil 24 includes coiled conductors 23 encapsulated by electrical insulation 27.
  • induction cooling is not necessary in a preferred embodiment of the present invention.
  • the induction coil 24 develops an electromagnetic field that couples with the susceptor 26 and generates heat within the susceptor 26.
  • the induction coil 24 may be cooled, typically by integral water passages 25 within the coil 24.
  • the susceptor 26 rests upon a susceptor floor 28 and is covered by a susceptor lid 30.
  • a cylindrical insulation wall 32 is disposed in between the susceptor 26 and the induction coil 24.
  • a lid insulation layer 34 and a floor insulation layer 36 are disposed over the susceptor lid 30 and beneath the susceptor floor 28, respectively.
  • the susceptor floor 28 rests upon the insulation layer 36, which, in turn, rests upon a furnace floor 38.
  • the furnace floor 38 is attached to the shell 12 by a floor support structure 40 that includes a multitude of vertical web structures 42.
  • a reactant gas G is supplied to the furnace 10 by a main gas supply line 44.
  • a plurality of individual gas supply lines 46 are connected in fluid communication with a plurality of gas ports 48 that pass through the furnace shell 12.
  • a plurality of flexible gas supply lines 50 are connected in fluid communication with the gas ports 48 and a multitude of gas inlet ports 100 that pass through holes 54 in the furnace floor 38, the floor insulation layer 36, and the susceptor floor 28.
  • the carbon parts are first stacked on a hearth plate 150.
  • the hearth plate 150 is then loaded into the furnace 10.
  • the gas G that is intended to densify the carbon parts enters the furnace compartment 200 through the gas inlet ports 100.
  • the reactant gas G would eventually travel through holes formed in the bottom of the hearth plate 150, or whatever mating apparatus is otherwise loaded within the furnace compartment 200.
  • the CVD/CVI processes, particularly CVD processes are often time-consuming processes. Accordingly, it is important that all of the gas G that is fed to the furnace compartment 200 reaches the parts for densification directly.
  • FIG. 3 is an enlarged, side cross-sectional view of hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention.
  • a hearth plate 150 having a plurality of holes 151 is arranged above the furnace floor 38 and gas inlet ports 100.
  • the gas G exiting the gas inlet ports 100 would eventually flow to the adjacent holes 151 of the hearth plate in conventional applications of the background art.
  • the present inventors have found that this lack of complete sealing between gas inlet port top lips 101 and the hearth plate bottom holes 151 in these conventional applications can be prevented by the present invention.
  • a plurality of flow direction nozzles 160 are employed in positions between the gas inlet port top lips 101 and the hearth plate holes 151 .
  • flow direction nozzles 160 perform both a sealing function and a fluid directing function.
  • the flow direction nozzles 160 produce a direct flow alignment between the gas inlet port 100 and the corresponding inlet holes 151 of the mating apparatus.
  • the flow direction nozzles 160 prevent the gas G from leaking and becoming misdirected away from the corresponding holes 151 of the hearth plate 150 (or other apparatus placed within the furnace , compartment 200).
  • the flow direction nozzles 160 thereby improve process times and a smooth transition of gas direction from the gas inlet ports 100 to the hearth plate/apparatus holes 151 . Accordingly, all of the process/reactant gas G is directed toward the holes 151 of the hearth plate 150 and the carbon parts positioned thereon.
  • FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention.
  • FIG. 4 shows a single hearth plate hole 1 51 sealingly engaged with a gas inlet port upper lip 101 of a corresponding gas inlet port 100.
  • a flow direction nozzle 160 is provided between the gas inlet port 100 and the hearth plate hole 150.
  • a GRAFOIL ® brand of sealing disc 130 is provided between the flow direction nozzle 160 and the hearth plate 150 (or other mating apparatus) on an outlet side of the flow direction nozzle 160.
  • a ceramic protection tube material 1 10, such as a mullite tube, may be provided along an interior of the gas inlet port 100, the interior defined by the region located within the internal diameter 107 of the gas inlet port 100.
  • An additional GRAFOIL ® sealing disc 120 may be incorporated between an upper edge of the ceramic protection tube material 1 10 and the internal diameter 107 of the gas inlet port 100 on an inlet side of the flow direction nozzle 160.
  • nozzles 160 are essentially annular shaped collars that can molded, cast or machined. Although one of skill in the art will appreciate that there are several suitable materials for the flow direction nozzles 160 and the potentially high temperature, pressure and severe operating environment of CVD/CVI processes, a preferred embodiment includes nozzles 160 constructed of graphite. One of skill in the art will further appreciate that graphite includes and is not limited to molded graphite, crystalline graphite, recrystallized graphite, graphite fiber-reinforced graphite composites and graphite-graphite composites.
  • GRAFOIL ® brand of flexible graphite is desirable for its superior sealing ability particular with respect to fluids/gases, ability to withstand severe temperature and pressure environments, corrosion resistance, easy removal and installation, and resiliency.
  • the Grafoil ® sealing discs 120, 130 are used to compensate for dimensional distortion between the apparatus' bottom surface, e.g. hearth plate 1 50 and the flow direction nozzle 160.
  • the sealing discs 120, 130 are annular sealing discs or rings.
  • FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention. As seen in FIG. 4 and FIG. 5, the annular flow direction nozzle 160 is designed to fit into the gas inlet port 100.
  • the flow direction nozzle 160 includes a gas inlet port sealing portion 161 matingly engaging the corresponding internal diameter 107 of the gas inlet port 100 and defining an inlet region of the flow direction nozzle 160.
  • the gas inlet port sealing portion 161 ensures admission of gas G into an interior of the flow direction nozzle 160.
  • the flow direction nozzle also include a machined support shoulder 163 resting on the gas inlet port top lip 101 .
  • the machined support shoulder 163 designed to support a corresponding lower surface of an apparatus being loaded above the gas inlet ports 100, such as the hearth plate 150.
  • a nozzle portion 162 of the flow direction nozzle 160 extends into the apparatus being loaded, e.g. hearth plate hole 151.
  • the gas inlet ports 100 can be cut to a length of approximately 3.5 inches.
  • a gas inlet port outer diameter 106 can be approximately 1 inch larger, e.g. have a tube thickness 105 of 1 inch.
  • d 0.50 inches
  • e 0.00 to 0.75 inches
  • f 1.25 inches.
  • these values will be routinely modified to suit the particular size of mating components such as varying gas inlet port size and varying hearth plate hole diameters.
  • FIG. 1 through FIG. 5 are not necessarily drawn to scale.
  • the present invention is directed toward a method of providing a fluid seal between a gas inlet port and a CVD/CVI process apparatus, such as a hearth plate 1 50.
  • the method includes positioning flow direction nozzles 160 along each gas inlet port top lip 101 of a plurality of gas inlet ports 100.
  • Corresponding process apparatus holes, such as hearth plate holes 1 51 are sealingly engaged with the flow direction nozzles 160 to create a fluid/gas seal.
  • reactant gas G is prevented from being misdirected away from corresponding process apparatus holes and from leaking away from the targeted, CVD/CVI process apparatus.
  • the flow direction nozzles 160 can be reused and easily replaced as they become worn, damaged or lost.
  • the type of CVD/CVI processes and furnaces employed may vary substantially depending upon the targeted products, e.g. aircraft brakes, internal combustion engine components, gas or steam turbine parts, etc. . .
  • the furnace configuration of FIG. 2 is presented by way of example, and is not intended to limit the invention to the specific arrangement presented.
  • annular flow direction nozzle 160 has been described, one of skill in the art will appreciate that the geometry of the flow direction nozzle can be varied to effect changes in pressure, flow path, and/or gas velocity, particularly with respect to well known characteristics of affecting nozzle/venturi flow paths.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A method and apparatus for sealing gas ports in CVD/CVI furnaces and processes is disclosed. A fluid direction nozzle (160) is positioned between a top lip (101) of a gas inlet port (100) delivering a reactant gas (G) to a furnace compartment (200) in a CVD/CVI furnace (10) and corresponding holes (151) of a CVD/CVI process apparatus such as a hearth plate (150). The fluid direction nozzle (160) reduces leakage of reactant gases (G) and ensures a smooth transition of gas flow direction between the gas inlet port (100) and the corresponding holes (151). CVD/CVI process times are significantly reduced with the use of the reusable/replaceable flow direction nozzles (160).

Description

GAS PORT SEALING FOR CVD/CVI FURNACE HEARTH PLATES
TECHNICAL FIELD AND INDUSTRIAL APPLICABILITY OF THE INVENTION [0001 ] The present invention is generally directed to Chemical
Vapor Deposition/Infiltration (CVD/CVI) apparatus and processes, and more particularly to a method and apparatus utilizing a flow direction nozzle in a CVD/CVI furnace for improving CVD/CVI process time and reducing gas leakage.
BACKGROUND OF THE INVENTION [0002] Chemical vapor deposition and infiltration (CVD/CVI) is a well-known process for depositing a binding matrix within a porous structure. The term "chemical vapor deposition" (CVD) generally implies deposition of a surface coating, but the term is also used to refer to infiltration and deposition of a matrix within a porous structure. The term CVD/CVl is intended to refer to infiltration and deposition of a matrix within a porous structure. [0003] CVD/CVI is particularly suitable for fabricating high temperature structural composites by depositing a carbonaceous or ceramic matrix within a carbonaceous or ceramic porous structure resulting in very useful structures such as carbon/carbon aircraft brake disks, and ceramic combustor or turbine components. The generally known CVD/CVI processes may be classified into four general categories: isothermal, thermal gradient, pressure gradient, and pulsed flow. The specific process times and steps, reactant gas and CVD/CVI furnaces and associated apparatus may vary depending on which of these four general categories is utilized. [0004] U.S. Patent No. 6, 1 62,298 and corresponding European Patent Application EP 0 997 553 A1 to Rudolph describe these and other CVD/CVI processes and apparatus in further detail. Rudolph particularly describes a sealed reactant gas inlet for a CVD/CVI furnace. [0005] FIG. 1 is a side cross-sectional view of a furnace according to U.S. Patent No. 6, 1 62,298. A generally cylindrical furnace 1 0 configured to be employed with a high temperature process is shown. The furnace includes a steel shell 12 and a steel lid 14. The shell 12 includes a flange 1 6 and the lid 14 includes a mating flange 1 8 that seals against flange 1 6 when the lid 14 is installed upon the shell 1 2, as shown in FIG. 1 . The lid also includes a vacuum port 20.
[0006] The shell 1 2 and lid 14 together define a furnace volume 22 that is reduced to vacuum pressure by a steam vacuum generator (not shown) in fluid communication with the vacuum port 20. The shell 12 rests upon a multitude of legs 62. The furnace 10 also includes a cylindrical induction coil 24 adjacent a cylindrical susceptor 26. The induction coil 24 includes coiled conductors 23 encapsulated by electrical insulation 27.
[0007] During operation, the induction coil 24 develops an electromagnetic field that couples with the susceptor 26 and generates heat within the susceptor 26. The induction coil 24 may be cooled, typically by integral water passages 25 within the coil 24. The susceptor 26 rests upon a susceptor floor 28 and is covered by a susceptor lid 30. A cylindrical insulation wall 32 is disposed in between the susceptor 26 and the induction coil 24. A lid insulation layer 34 and a floor insulation layer 36 are disposed over the susceptor lid 30 and beneath the susceptor floor 28, respectively.
[0008] The susceptor floor 28 rests upon the insulation layer
36, which, in turn, rests upon a furnace floor 38. The furnace floor 38 is attached to the shell 1 2 by a floor support structure 40 that includes a multitude of vertical web structures 42.
[0009] A reactant gas is supplied to the furnace 10 by a main gas supply line 44. A plurality of individual gas supply lines 46 are connected in fluid communication with a plurality of gas ports 48 that pass through the furnace shell , 1 2. A plurality of flexible gas supply lines 50 are connected in fluid communication with the gas ports 48 and a multitude of gas inlets 52 that pass through holes 54 in the furnace floor 38, the floor insulation layer 36, and the susceptor floor 28. [0010] U.S. Patent No. 6, 1 62,298 further describes a gas preheater 56 resting on the susceptor floor 28 and including a multitude of stacked perforated plates 58 that are spaced from other by a spacing structure 60. Each plate 58 is provided with an array of perforations that are horizontally shifted from the array of perforations of the adjacent plate 58. This causes the reactant gas to pass back and forth through the plates, which diffuses the reactant gas within the preheater 56 and increases convective heat transfer to the gas from the perforated plates 58. A multitude of porous substrates 62, for example brake disks, are stacked within the furnace 10 inside the susceptor 26 on fixtures (not shown). [001 1] Further, U.S. Patent No. 6, 162,298 is directed toward preventing gas leakage around the gas inlet 52 extending through the hole 54 in the susceptor floor 28 in the CVD/CVI furnace 10. The method and apparatus seal the gas inlet 52 to the susceptor floor 28 with sufficient intimacy to block leakage of gas through the hole 54 around the gas inlet 52 while allowing the gas inlet 52 to cyclically translate through the hole 54, as indicated by arrow 55, due to thermal expansion and contraction induced by thermal cycles in the CVD/CVI furnace 10. [0012] Reactant gas entry through the gas inlets 52 is diffused within the preheater 56 and eventually reaches the porous substrates 62. However, reactant gas leaving the gas inlets 52 follows a tortuous path as it travels back and forth through the plates 58.
SUMMARY OF THE PRESENT INVENTION [0013] The present invention overcomes the shortcomings associated with the background art and achieves other advantages not realized by the background art. [0014] The present invention, in part, is a recognition that current CVD/CVI process time is lengthy and results in considerable expense. The present invention provides a CVD/CVI method and apparatus that reduces process time, ensures efficient use of reactant gases, and permits an increase in process output. [0015] The present invention, in part, is a recognition that reactant gas, such as densification gas, delivered directly to target carbon parts, will greatly improve process time.
[0016] The present invention, in part, provides a gas inlet port assembly for a CVD/CVI furnace having a furnace compartment and a CVD/CVI process apparatus with a plurality of holes, the gas inlet port assembly comprising a plurality of gas inlet ports delivering process gas to the furnace compartment; and a plurality of flow direction nozzles positioned between the holes of the CVD/CVI process apparatus and the gas inlet ports. [0017] The present invention, also in part, provides a flow direction nozzle assembly for a CVD/CVI furnace, the flow direction nozzle assembly compπsing a flow direction nozzle including a gas inlet port sealing portion; a support shoulder; and a nozzle portion. [0018] The present invention, also in part, provides a method for sealing gas inlet ports for delivering a process gas in a CVD/CVI furnace, the method comprising positioning flow direction nozzles along upper lips of the gas inlet ports; loading a CVD/CVI process apparatus having a plurality of gas inlet holes into the furnace; sealingly engaging the flow direction nozzles to the gas inlet holes of the process apparatus to create a gas path-directing, fluid seal. [0019] Advantages of the present invention will become more apparent from the detailed description given hereinafter. However, it should be understood that the detailed description and specific examples, while indicating preferred embodiments of the present invention, are given by way of illustration only, since various changes and modifications within the spirit and scope of the present invention will become apparent to those skilled in the art from this detailed description. BRIEF DESCRIPTION OF THE DRAWINGS [0020] The present invention will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only, and thus do not limit the present invention.
[0021] FIG. 1 is a side cross-sectional view of a furnace according to the background art;
[0022] FIG. 2 is a side cross-sectional view of a furnace incorporating an embodiment of the present invention; [0023] FIG. 3 is an enlarged, side cross-sectional view of hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention;
[0024] FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention; and
[0025] FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [0026] The present invention will now be described in detail with reference to the accompanying drawings.
[0027] FIG. 2 is a side cross-sectional view of a furnace incorporating an embodiment of the present invention. Fig. 3 is an enlarged, side cross-sectional view of the hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention, currently provided for resistively heated furnaces. However, the present invention is similarly applicable to inductively heated furnaces. FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention. FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention. [0028] FIG. 2 is a side cross-sectional view of an exemplary furnace incorporating an embodiment of the present invention. One of skill in the art will appreciate that the actual furnace construction and CVD/CVI processes implemented will vary according to the products undergoing treatment within the furnace compartment 200. Accordingly, the CVD/CVI furnace 1 0 shown in FIG. 2 simply indicates one type of application of the present invention.
[0029] A generally cylindrical furnace 10 configured to be employed in a densification process for carbon fiber based brakes is shown in FIG. 2. The furnace includes a steel shell 1 2 and a steel lid 14. The shell 12 includes a flange 1 6 and the lid 14 includes a mating flange 1 8 that seals against flange 1 6 when the lid 14 is installed upon the shell 1 2, as shown in FIG. 1 . The lid may also include a vacuum port 20. [0030] The shell 12 and lid 14 together define a furnace volume 22 that may be reduced to vacuum pressure by a steam vacuum generator (not shown) in fluid communication with the vacuum port 20. The shell 12 rests upon a multitude of legs 62. The furnace 10 may also be provided with a cylindrical induction coil 24 adjacent a cylindrical susceptor 26. The induction coil 24 includes coiled conductors 23 encapsulated by electrical insulation 27. However, induction cooling is not necessary in a preferred embodiment of the present invention. [0031 ] During operation, the induction coil 24 develops an electromagnetic field that couples with the susceptor 26 and generates heat within the susceptor 26. The induction coil 24 may be cooled, typically by integral water passages 25 within the coil 24. The susceptor 26 rests upon a susceptor floor 28 and is covered by a susceptor lid 30. [0032] A cylindrical insulation wall 32 is disposed in between the susceptor 26 and the induction coil 24. A lid insulation layer 34 and a floor insulation layer 36 are disposed over the susceptor lid 30 and beneath the susceptor floor 28, respectively. The susceptor floor 28 rests upon the insulation layer 36, which, in turn, rests upon a furnace floor 38. The furnace floor 38 is attached to the shell 12 by a floor support structure 40 that includes a multitude of vertical web structures 42.
[00331 As seen in FIG. 2, a reactant gas G is supplied to the furnace 10 by a main gas supply line 44. A plurality of individual gas supply lines 46 are connected in fluid communication with a plurality of gas ports 48 that pass through the furnace shell 12. A plurality of flexible gas supply lines 50 are connected in fluid communication with the gas ports 48 and a multitude of gas inlet ports 100 that pass through holes 54 in the furnace floor 38, the floor insulation layer 36, and the susceptor floor 28.
[0034] When the aforementioned CVD/CVI furnace 10 is used for densifying fiber-based brakes, the carbon parts are first stacked on a hearth plate 150. The hearth plate 150 is then loaded into the furnace 10. The gas G that is intended to densify the carbon parts enters the furnace compartment 200 through the gas inlet ports 100. [0035] Prior to the present invention, the reactant gas G would eventually travel through holes formed in the bottom of the hearth plate 150, or whatever mating apparatus is otherwise loaded within the furnace compartment 200. However, the CVD/CVI processes, particularly CVD processes, are often time-consuming processes. Accordingly, it is important that all of the gas G that is fed to the furnace compartment 200 reaches the parts for densification directly. [0036] FIG. 3 is an enlarged, side cross-sectional view of hearth plate and flow direction nozzle assemblies according to an embodiment of the present invention. As seen in FIG. 3, a hearth plate 150 having a plurality of holes 151 is arranged above the furnace floor 38 and gas inlet ports 100. [0037] The gas G exiting the gas inlet ports 100 would eventually flow to the adjacent holes 151 of the hearth plate in conventional applications of the background art. However, the present inventors have found that this lack of complete sealing between gas inlet port top lips 101 and the hearth plate bottom holes 151 in these conventional applications can be prevented by the present invention. [0038] Accordingly, a plurality of flow direction nozzles 160 are employed in positions between the gas inlet port top lips 101 and the hearth plate holes 151 . These flow direction nozzles 160 perform both a sealing function and a fluid directing function. The flow direction nozzles 160 produce a direct flow alignment between the gas inlet port 100 and the corresponding inlet holes 151 of the mating apparatus. [0039] The flow direction nozzles 160 prevent the gas G from leaking and becoming misdirected away from the corresponding holes 151 of the hearth plate 150 (or other apparatus placed within the furnace , compartment 200). The flow direction nozzles 160 thereby improve process times and a smooth transition of gas direction from the gas inlet ports 100 to the hearth plate/apparatus holes 151 . Accordingly, all of the process/reactant gas G is directed toward the holes 151 of the hearth plate 150 and the carbon parts positioned thereon. [0040] FIG. 4 is an enlarged, side cross-sectional view of a flow direction nozzle assembly and gas inlet port according to an embodiment of the present invention. FIG. 4 shows a single hearth plate hole 1 51 sealingly engaged with a gas inlet port upper lip 101 of a corresponding gas inlet port 100. A flow direction nozzle 160 is provided between the gas inlet port 100 and the hearth plate hole 150. [0041] A GRAFOIL ® brand of sealing disc 130 is provided between the flow direction nozzle 160 and the hearth plate 150 (or other mating apparatus) on an outlet side of the flow direction nozzle 160. A ceramic protection tube material 1 10, such as a mullite tube, may be provided along an interior of the gas inlet port 100, the interior defined by the region located within the internal diameter 107 of the gas inlet port 100. An additional GRAFOIL ® sealing disc 120 may be incorporated between an upper edge of the ceramic protection tube material 1 10 and the internal diameter 107 of the gas inlet port 100 on an inlet side of the flow direction nozzle 160.
[0042] In a preferred embodiment, the flow direction nozzles
160 are essentially annular shaped collars that can molded, cast or machined. Although one of skill in the art will appreciate that there are several suitable materials for the flow direction nozzles 160 and the potentially high temperature, pressure and severe operating environment of CVD/CVI processes, a preferred embodiment includes nozzles 160 constructed of graphite. One of skill in the art will further appreciate that graphite includes and is not limited to molded graphite, crystalline graphite, recrystallized graphite, graphite fiber-reinforced graphite composites and graphite-graphite composites. [0043] As aforementioned, GRAFOIL ® brand of flexible graphite, is desirable for its superior sealing ability particular with respect to fluids/gases, ability to withstand severe temperature and pressure environments, corrosion resistance, easy removal and installation, and resiliency. The Grafoil ® sealing discs 120, 130 are used to compensate for dimensional distortion between the apparatus' bottom surface, e.g. hearth plate 1 50 and the flow direction nozzle 160. In an exemplary embodiment, the sealing discs 120, 130 are annular sealing discs or rings. [0044] Further, mullite, utilized in a tube 1 10 of an embodiment of the present invention, is particularly advantageous due to its common use as a refractory material for firebrick and furnace linings, flame resistance, low, uniform coefficient of thermal expansion, and heat conductivity. However, one of skill in the art will appreciate that alternative materials can be incorporated into the present invention, particularly those showing common properties with those specifically listed in the foregoing embodiments. [0045] FIG. 5 is a side, partial cross sectional view of a flow direction nozzle according to an embodiment of the present invention. As seen in FIG. 4 and FIG. 5, the annular flow direction nozzle 160 is designed to fit into the gas inlet port 100. The flow direction nozzle 160 includes a gas inlet port sealing portion 161 matingly engaging the corresponding internal diameter 107 of the gas inlet port 100 and defining an inlet region of the flow direction nozzle 160. The gas inlet port sealing portion 161 ensures admission of gas G into an interior of the flow direction nozzle 160. The flow direction nozzle also include a machined support shoulder 163 resting on the gas inlet port top lip 101 . The machined support shoulder 163 designed to support a corresponding lower surface of an apparatus being loaded above the gas inlet ports 100, such as the hearth plate 150. A nozzle portion 162 of the flow direction nozzle 160 extends into the apparatus being loaded, e.g. hearth plate hole 151.
[0046] As seen in FIG. 4 and FIG. 5, the flow direction nozzle
160 and hearth plate holes 151 can also be provided with chamfered surfaces. A chamfered surface 165 of the flow direction nozzle 160 additionally provides smooth, fluid flow. The hearth plate 150 or other apparatus being loaded into the furnace compartment 200 is supported by the flow direction nozzles 160. [0047] In an exemplary embodiment, the gas inlet ports 100 can be cut to a length of approximately 3.5 inches. A gas inlet port outer diameter 106 can be approximately 1 inch larger, e.g. have a tube thickness 105 of 1 inch. As seen in FIG. 5, the flow direction nozzle 1 60 may have vertical dimensions of approximately a = 1.50 to 2.00 inches, b = 0.50 inches, and c = 0.50 inches. Approximate horizontal dimensions of the flow direction nozzle 160 may include d = 0.50 inches, e = 0.00 to 0.75 inches, and f = 1.25 inches. However, one of ordinary skill in the art will appreciate that these values will be routinely modified to suit the particular size of mating components such as varying gas inlet port size and varying hearth plate hole diameters. Further, although relative sizes have been depicted in the accompanying drawings, one of skill in the art will appreciate that FIG. 1 through FIG. 5 are not necessarily drawn to scale.
[0048] A method according to the present invention will now be described with reference to the accompanying drawings and foregoing description of FIGS. 2-5. The present invention is directed toward a method of providing a fluid seal between a gas inlet port and a CVD/CVI process apparatus, such as a hearth plate 1 50. The method includes positioning flow direction nozzles 160 along each gas inlet port top lip 101 of a plurality of gas inlet ports 100. [0049] A CVD/CVI process apparatus to be loaded within a furnace compartment 200, such as a hearth plate 150, is then positioned above the flow direction nozzles 160. Corresponding process apparatus holes, such as hearth plate holes 1 51 , are sealingly engaged with the flow direction nozzles 160 to create a fluid/gas seal. Accordingly, reactant gas G is prevented from being misdirected away from corresponding process apparatus holes and from leaking away from the targeted, CVD/CVI process apparatus. The flow direction nozzles 160 can be reused and easily replaced as they become worn, damaged or lost. [0050] Further examples of suitable materials, CVD/CVI process steps and apparatus, and potential applications of the present invention are described in U.S. Patent No. 6, 162,298 to Rudolph; the entirety of which is hereby incorporated by reference. Further, one of skill in the art will appreciate that the specific furnace and fixture configurations listed in the foregoing description are merely exemplary of some of the many applications of the present invention.
[0051] Accordingly, the type of CVD/CVI processes and furnaces employed may vary substantially depending upon the targeted products, e.g. aircraft brakes, internal combustion engine components, gas or steam turbine parts, etc. . . As such, the furnace configuration of FIG. 2 is presented by way of example, and is not intended to limit the invention to the specific arrangement presented. Further, although an annular flow direction nozzle 160 has been described, one of skill in the art will appreciate that the geometry of the flow direction nozzle can be varied to effect changes in pressure, flow path, and/or gas velocity, particularly with respect to well known characteristics of affecting nozzle/venturi flow paths.

Claims

WHAT IS CLAIMED IS:
1 . A gas inlet port assembly for a CVD/CVI furnace (10) having a furnace compartment (200) and a CVD/CVI process apparatus ( 1 50) with a plurality of holes ( 1 51 ), said gas inlet port assembly comprising: a plurality of gas inlet ports (100) delivering process gas (G) to said furnace compartment (200); and a plurality of flow direction nozzles (1 60) positioned between said holes (1 51 ) of said CVD/CVI process apparatus (1 50) and said gas inlet ports ( 1 00).
2. The gas inlet port assembly according to claim 1 , further comprising: a gas inlet port upper lip ( 1 01 ) respectively provided on each of said gas inlet ports (100); and a pair of annular sealing discs (1 20, 1 30) respectively provided for each of said flow direction nozzles ( 1 60), said flow direction nozzles (1 60) sealingly engaging said gas inlet port upper lip (101 ) with a corresponding hole (1 51 ) of said CVD/CVI process apparatus (1 50).
3. The gas inlet port assembly according to claim 2, wherein a first sealing disc (1 30) of said pair of annular sealing discs is positioned adjacent to an outlet side of each flow direction nozzle (1 60) and a second sealing disc (1 20) is positioned adjacent to an inlet side of said flow direction nozzle (1 60).
4. The gas inlet port assembly according to claim 3, wherein said sealing discs (1 20, 1 30) are flexible graphite sealing discs.
5. The gas inlet port assembly according to claim 1 , wherein said holes are located in a hearth plate of said CVD/CVI process apparatus (1 50), and said holes (1 51 ) are chamfered holes formed on a bottom of said hearth plate.
6. The gas inlet port assembly according to claim 1, wherein each of said flow direction nozzles (160) includes: a gas inlet port sealing portion (161), said gas inlet port sealing portion (161) extending into said respective gas inlet ports (100); a support shoulder (163); and a nozzle portion (162).
7. The gas inlet port assembly according to claim 6, wherein said nozzle portion (162) extends into said holes (151) of said CVD/CVI process apparatus (150).
8. The gas inlet port assembly according to claim 1, wherein said flow direction nozzles (160) are made of graphite.
9. A flow direction nozzle assembly for a CVD/CVI furnace (10), said flow direction nozzle assembly comprising: a flow direction nozzle (160) including a gas inlet port sealing portion (161); a support shoulder(163); and a nozzle portion (162).
10. The flow direction nozzle assembly according to claim 9, further comprising a pair of sealing discs (120,130).
11. The flow direction nozzle assembly according to claim 10, wherein said pair of sealing discs (120,130) includes a first sealing disc (130) positioned adjacent to said flow direction nozzle (130) and a second sealing disc positioned adjacent to said gas inlet sealing portion (161) of said flow direction nozzle (160).
12. The flow direction nozzle assembly according to claim 9, further comprising a chamfered surface (165) along said gas inlet sealing portion (161).
13. A method for sealing gas inlet ports (100) for delivering a process gas (G) in a CVD/CVI furnace (10), said method comprising: positioning flow direction nozzles (160) along upper lips (101) of said gas inlet ports (100); loading a CVD/CVI process apparatus (150) having a plurality of gas inlet holes (151) into said furnace (10); sealingly engaging the flow direction nozzles (160) to said gas inlet holes (151) of said process apparatus (150) to create a gas-path directing, fluid seal.
14. The method according to claim 13, wherein the CVD/CVI process apparatus (150) is a hearth plate (150) having hearth plate holes (151), and the CVD/CVI process is a densification process for carbon fiber based brakes.
PCT/US2002/017576 2001-06-05 2002-06-04 Gas port sealing for cvd/cvi furnace hearth plates WO2002099160A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP02756119A EP1392885A1 (en) 2001-06-05 2002-06-04 Gas port sealing for cvd/cvi furnace hearth plates

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/874,653 US6758909B2 (en) 2001-06-05 2001-06-05 Gas port sealing for CVD/CVI furnace hearth plates
US09/874,653 2001-06-05

Publications (1)

Publication Number Publication Date
WO2002099160A1 true WO2002099160A1 (en) 2002-12-12

Family

ID=25364257

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/017576 WO2002099160A1 (en) 2001-06-05 2002-06-04 Gas port sealing for cvd/cvi furnace hearth plates

Country Status (3)

Country Link
US (2) US6758909B2 (en)
EP (1) EP1392885A1 (en)
WO (1) WO2002099160A1 (en)

Families Citing this family (341)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6758909B2 (en) * 2001-06-05 2004-07-06 Honeywell International Inc. Gas port sealing for CVD/CVI furnace hearth plates
US7727588B2 (en) * 2003-09-05 2010-06-01 Yield Engineering Systems, Inc. Apparatus for the efficient coating of substrates
US20050098106A1 (en) * 2003-11-12 2005-05-12 Tokyo Electron Limited Method and apparatus for improved electrode plate
US7644712B2 (en) * 2005-11-09 2010-01-12 Honeywell International Inc. Negative pressure conditioning device and forced air furnace employing same
US7748375B2 (en) * 2005-11-09 2010-07-06 Honeywell International Inc. Negative pressure conditioning device with low pressure cut-off
US7811085B2 (en) * 2006-05-04 2010-10-12 Honeywell International Inc. Gas preheater for chemical vapor processing furnace
US20070269597A1 (en) * 2006-05-17 2007-11-22 Honeywell International Inc. Modified CVD cooling loop
US7771194B2 (en) * 2006-05-26 2010-08-10 Honeywell International Inc. Gas preheater for chemical vapor processing furnace having circuitous passages
US20080124667A1 (en) * 2006-10-18 2008-05-29 Honeywell International Inc. Gas pressure control for warm air furnaces
US8591221B2 (en) * 2006-10-18 2013-11-26 Honeywell International Inc. Combustion blower control for modulating furnace
US20110159210A1 (en) * 2007-03-14 2011-06-30 Hubert Patrovsky Metal halide reactor deposition method
US20080232424A1 (en) * 2007-03-23 2008-09-25 Honeywell International Inc. Hearth plate including side walls defining a processing volume
US8070481B2 (en) 2008-05-27 2011-12-06 Honeywell International Inc. Combustion blower control for modulating furnace
US9316413B2 (en) * 2008-06-11 2016-04-19 Honeywell International Inc. Selectable efficiency versus comfort for modulating furnace
US8123518B2 (en) * 2008-07-10 2012-02-28 Honeywell International Inc. Burner firing rate determination for modulating furnace
US10378106B2 (en) 2008-11-14 2019-08-13 Asm Ip Holding B.V. Method of forming insulation film by modified PEALD
US8372482B2 (en) * 2009-02-27 2013-02-12 Goodrich Corporation Methods and apparatus for controlled chemical vapor deposition
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
US8802201B2 (en) 2009-08-14 2014-08-12 Asm America, Inc. Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
US20110064891A1 (en) * 2009-09-16 2011-03-17 Honeywell International Inc. Methods of rapidly densifying complex-shaped, asymmetrical porous structures
DE102009048405A1 (en) 2009-10-06 2011-04-07 Honeywell Technologies S.A.R.L. Control device for gas burners
DE102010010791A1 (en) * 2010-03-09 2011-09-15 Honeywell Technologies Sarl Mixing device for a gas burner
CN105689177A (en) 2010-04-02 2016-06-22 斯得-莱特工业有限责任公司 Air aspiration device
US8560127B2 (en) 2011-01-13 2013-10-15 Honeywell International Inc. HVAC control with comfort/economy management
US9312155B2 (en) 2011-06-06 2016-04-12 Asm Japan K.K. High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
US10364496B2 (en) 2011-06-27 2019-07-30 Asm Ip Holding B.V. Dual section module having shared and unshared mass flow controllers
US10854498B2 (en) 2011-07-15 2020-12-01 Asm Ip Holding B.V. Wafer-supporting device and method for producing same
US20130023129A1 (en) 2011-07-20 2013-01-24 Asm America, Inc. Pressure transmitter for a semiconductor processing environment
US9017481B1 (en) 2011-10-28 2015-04-28 Asm America, Inc. Process feed management for semiconductor substrate processing
US8876524B2 (en) 2012-03-02 2014-11-04 Honeywell International Inc. Furnace with modulating firing rate adaptation
US9659799B2 (en) 2012-08-28 2017-05-23 Asm Ip Holding B.V. Systems and methods for dynamic semiconductor process scheduling
US9021985B2 (en) 2012-09-12 2015-05-05 Asm Ip Holdings B.V. Process gas management for an inductively-coupled plasma deposition reactor
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
US20160376700A1 (en) 2013-02-01 2016-12-29 Asm Ip Holding B.V. System for treatment of deposition reactor
US9484191B2 (en) 2013-03-08 2016-11-01 Asm Ip Holding B.V. Pulsed remote plasma method and system
US9589770B2 (en) 2013-03-08 2017-03-07 Asm Ip Holding B.V. Method and systems for in-situ formation of intermediate reactive species
US9240412B2 (en) 2013-09-27 2016-01-19 Asm Ip Holding B.V. Semiconductor structure and device and methods of forming same using selective epitaxial process
US10683571B2 (en) 2014-02-25 2020-06-16 Asm Ip Holding B.V. Gas supply manifold and method of supplying gases to chamber using same
US10167557B2 (en) 2014-03-18 2019-01-01 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
US10858737B2 (en) 2014-07-28 2020-12-08 Asm Ip Holding B.V. Showerhead assembly and components thereof
US9890456B2 (en) 2014-08-21 2018-02-13 Asm Ip Holding B.V. Method and system for in situ formation of gas-phase compounds
US9657845B2 (en) 2014-10-07 2017-05-23 Asm Ip Holding B.V. Variable conductance gas distribution apparatus and method
US10941490B2 (en) 2014-10-07 2021-03-09 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
KR102263121B1 (en) 2014-12-22 2021-06-09 에이에스엠 아이피 홀딩 비.브이. Semiconductor device and manufacuring method thereof
US10529542B2 (en) 2015-03-11 2020-01-07 Asm Ip Holdings B.V. Cross-flow reactor and method
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US10802459B2 (en) 2015-04-27 2020-10-13 Ademco Inc. Geo-fencing with advanced intelligent recovery
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
US10600673B2 (en) 2015-07-07 2020-03-24 Asm Ip Holding B.V. Magnetic susceptor to baseplate seal
US10083836B2 (en) 2015-07-24 2018-09-25 Asm Ip Holding B.V. Formation of boron-doped titanium metal films with high work function
US9960072B2 (en) 2015-09-29 2018-05-01 Asm Ip Holding B.V. Variable adjustment for precise matching of multiple chamber cavity housings
US10211308B2 (en) 2015-10-21 2019-02-19 Asm Ip Holding B.V. NbMC layers
US10322384B2 (en) 2015-11-09 2019-06-18 Asm Ip Holding B.V. Counter flow mixer for process chamber
US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10468251B2 (en) 2016-02-19 2019-11-05 Asm Ip Holding B.V. Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
US9963779B2 (en) 2016-02-29 2018-05-08 Goodrich Corporation Methods for modifying pressure differential in a chemical vapor process
US10501866B2 (en) 2016-03-09 2019-12-10 Asm Ip Holding B.V. Gas distribution apparatus for improved film uniformity in an epitaxial system
US10343920B2 (en) 2016-03-18 2019-07-09 Asm Ip Holding B.V. Aligned carbon nanotubes
US9892913B2 (en) 2016-03-24 2018-02-13 Asm Ip Holding B.V. Radial and thickness control via biased multi-port injection settings
US10865475B2 (en) 2016-04-21 2020-12-15 Asm Ip Holding B.V. Deposition of metal borides and silicides
US10190213B2 (en) 2016-04-21 2019-01-29 Asm Ip Holding B.V. Deposition of metal borides
US10032628B2 (en) 2016-05-02 2018-07-24 Asm Ip Holding B.V. Source/drain performance through conformal solid state doping
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
KR102592471B1 (en) 2016-05-17 2023-10-20 에이에스엠 아이피 홀딩 비.브이. Method of forming metal interconnection and method of fabricating semiconductor device using the same
US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
US10388509B2 (en) 2016-06-28 2019-08-20 Asm Ip Holding B.V. Formation of epitaxial layers via dislocation filtering
US9859151B1 (en) 2016-07-08 2018-01-02 Asm Ip Holding B.V. Selective film deposition method to form air gaps
US10612137B2 (en) 2016-07-08 2020-04-07 Asm Ip Holdings B.V. Organic reactants for atomic layer deposition
US10714385B2 (en) 2016-07-19 2020-07-14 Asm Ip Holding B.V. Selective deposition of tungsten
KR102354490B1 (en) 2016-07-27 2022-01-21 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate
US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR102532607B1 (en) 2016-07-28 2023-05-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and method of operating the same
US9812320B1 (en) 2016-07-28 2017-11-07 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10395919B2 (en) 2016-07-28 2019-08-27 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10410943B2 (en) 2016-10-13 2019-09-10 Asm Ip Holding B.V. Method for passivating a surface of a semiconductor and related systems
US10643826B2 (en) 2016-10-26 2020-05-05 Asm Ip Holdings B.V. Methods for thermally calibrating reaction chambers
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US10714350B2 (en) 2016-11-01 2020-07-14 ASM IP Holdings, B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10229833B2 (en) 2016-11-01 2019-03-12 Asm Ip Holding B.V. Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10643904B2 (en) 2016-11-01 2020-05-05 Asm Ip Holdings B.V. Methods for forming a semiconductor device and related semiconductor device structures
US10435790B2 (en) 2016-11-01 2019-10-08 Asm Ip Holding B.V. Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
US10134757B2 (en) 2016-11-07 2018-11-20 Asm Ip Holding B.V. Method of processing a substrate and a device manufactured by using the method
KR102546317B1 (en) 2016-11-15 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Gas supply unit and substrate processing apparatus including the same
US10340135B2 (en) 2016-11-28 2019-07-02 Asm Ip Holding B.V. Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
KR20180068582A (en) 2016-12-14 2018-06-22 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
KR102700194B1 (en) 2016-12-19 2024-08-28 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10867788B2 (en) 2016-12-28 2020-12-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US10655221B2 (en) 2017-02-09 2020-05-19 Asm Ip Holding B.V. Method for depositing oxide film by thermal ALD and PEALD
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10283353B2 (en) 2017-03-29 2019-05-07 Asm Ip Holding B.V. Method of reforming insulating film deposited on substrate with recess pattern
KR102457289B1 (en) 2017-04-25 2022-10-21 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10892156B2 (en) 2017-05-08 2021-01-12 Asm Ip Holding B.V. Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US10446393B2 (en) 2017-05-08 2019-10-15 Asm Ip Holding B.V. Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
US10504742B2 (en) 2017-05-31 2019-12-10 Asm Ip Holding B.V. Method of atomic layer etching using hydrogen plasma
US10886123B2 (en) 2017-06-02 2021-01-05 Asm Ip Holding B.V. Methods for forming low temperature semiconductor layers and related semiconductor device structures
US12040200B2 (en) 2017-06-20 2024-07-16 Asm Ip Holding B.V. Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US10685834B2 (en) 2017-07-05 2020-06-16 Asm Ip Holdings B.V. Methods for forming a silicon germanium tin layer and related semiconductor device structures
KR20190009245A (en) 2017-07-18 2019-01-28 에이에스엠 아이피 홀딩 비.브이. Methods for forming a semiconductor device structure and related semiconductor device structures
US10541333B2 (en) 2017-07-19 2020-01-21 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11018002B2 (en) 2017-07-19 2021-05-25 Asm Ip Holding B.V. Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US10605530B2 (en) 2017-07-26 2020-03-31 Asm Ip Holding B.V. Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace
US10590535B2 (en) 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10312055B2 (en) 2017-07-26 2019-06-04 Asm Ip Holding B.V. Method of depositing film by PEALD using negative bias
US10692741B2 (en) 2017-08-08 2020-06-23 Asm Ip Holdings B.V. Radiation shield
US10770336B2 (en) 2017-08-08 2020-09-08 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11139191B2 (en) 2017-08-09 2021-10-05 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US10236177B1 (en) 2017-08-22 2019-03-19 ASM IP Holding B.V.. Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures
USD900036S1 (en) 2017-08-24 2020-10-27 Asm Ip Holding B.V. Heater electrical connector and adapter
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
KR102491945B1 (en) 2017-08-30 2023-01-26 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11056344B2 (en) 2017-08-30 2021-07-06 Asm Ip Holding B.V. Layer forming method
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
KR102401446B1 (en) 2017-08-31 2022-05-24 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US10607895B2 (en) 2017-09-18 2020-03-31 Asm Ip Holdings B.V. Method for forming a semiconductor device structure comprising a gate fill metal
KR102630301B1 (en) 2017-09-21 2024-01-29 에이에스엠 아이피 홀딩 비.브이. Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10844484B2 (en) 2017-09-22 2020-11-24 Asm Ip Holding B.V. Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10658205B2 (en) 2017-09-28 2020-05-19 Asm Ip Holdings B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10319588B2 (en) 2017-10-10 2019-06-11 Asm Ip Holding B.V. Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10910262B2 (en) 2017-11-16 2021-02-02 Asm Ip Holding B.V. Method of selectively depositing a capping layer structure on a semiconductor device structure
KR102443047B1 (en) 2017-11-16 2022-09-14 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11022879B2 (en) 2017-11-24 2021-06-01 Asm Ip Holding B.V. Method of forming an enhanced unexposed photoresist layer
KR102597978B1 (en) 2017-11-27 2023-11-06 에이에스엠 아이피 홀딩 비.브이. Storage device for storing wafer cassettes for use with batch furnaces
CN111344522B (en) 2017-11-27 2022-04-12 阿斯莫Ip控股公司 Including clean mini-environment device
US10290508B1 (en) 2017-12-05 2019-05-14 Asm Ip Holding B.V. Method for forming vertical spacers for spacer-defined patterning
US10872771B2 (en) 2018-01-16 2020-12-22 Asm Ip Holding B. V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
CN111630203A (en) 2018-01-19 2020-09-04 Asm Ip私人控股有限公司 Method for depositing gap filling layer by plasma auxiliary deposition
TWI799494B (en) 2018-01-19 2023-04-21 荷蘭商Ａｓｍ 智慧財產控股公司 Deposition method
USD903477S1 (en) 2018-01-24 2020-12-01 Asm Ip Holdings B.V. Metal clamp
US11018047B2 (en) 2018-01-25 2021-05-25 Asm Ip Holding B.V. Hybrid lift pin
US10535516B2 (en) 2018-02-01 2020-01-14 Asm Ip Holdings B.V. Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US11081345B2 (en) 2018-02-06 2021-08-03 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
US10896820B2 (en) 2018-02-14 2021-01-19 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US11685991B2 (en) 2018-02-14 2023-06-27 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10731249B2 (en) 2018-02-15 2020-08-04 Asm Ip Holding B.V. Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
KR102636427B1 (en) 2018-02-20 2024-02-13 에이에스엠 아이피 홀딩 비.브이. Substrate processing method and apparatus
US10658181B2 (en) 2018-02-20 2020-05-19 Asm Ip Holding B.V. Method of spacer-defined direct patterning in semiconductor fabrication
US10975470B2 (en) 2018-02-23 2021-04-13 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en) 2018-03-16 2021-09-07 Asm Ip Holding B.V. Reactor, system including the reactor, and methods of manufacturing and using same
KR102646467B1 (en) 2018-03-27 2024-03-11 에이에스엠 아이피 홀딩 비.브이. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US10510536B2 (en) 2018-03-29 2019-12-17 Asm Ip Holding B.V. Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
US11088002B2 (en) 2018-03-29 2021-08-10 Asm Ip Holding B.V. Substrate rack and a substrate processing system and method
KR102501472B1 (en) 2018-03-30 2023-02-20 에이에스엠 아이피 홀딩 비.브이. Substrate processing method
TWI811348B (en) 2018-05-08 2023-08-11 荷蘭商Ａｓｍ 智慧財產控股公司 Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
US12025484B2 (en) 2018-05-08 2024-07-02 Asm Ip Holding B.V. Thin film forming method
KR20190129718A (en) 2018-05-11 2019-11-20 에이에스엠 아이피 홀딩 비.브이. Methods for forming a doped metal carbide film on a substrate and related semiconductor device structures
KR102596988B1 (en) 2018-05-28 2023-10-31 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
TWI840362B (en) 2018-06-04 2024-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Wafer handling chamber with moisture reduction
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
US10797133B2 (en) 2018-06-21 2020-10-06 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
KR102568797B1 (en) 2018-06-21 2023-08-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing system
TWI815915B (en) 2018-06-27 2023-09-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
JP2021529254A (en) 2018-06-27 2021-10-28 エーエスエム・アイピー・ホールディング・ベー・フェー Periodic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials
US10612136B2 (en) 2018-06-29 2020-04-07 ASM IP Holding, B.V. Temperature-controlled flange and reactor system including same
KR102686758B1 (en) 2018-06-29 2024-07-18 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10755922B2 (en) 2018-07-03 2020-08-25 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10767789B2 (en) 2018-07-16 2020-09-08 Asm Ip Holding B.V. Diaphragm valves, valve components, and methods for forming valve components
US10483099B1 (en) 2018-07-26 2019-11-19 Asm Ip Holding B.V. Method for forming thermally stable organosilicon polymer film
US11053591B2 (en) 2018-08-06 2021-07-06 Asm Ip Holding B.V. Multi-port gas injection system and reactor system including same
US10883175B2 (en) 2018-08-09 2021-01-05 Asm Ip Holding B.V. Vertical furnace for processing substrates and a liner for use therein
US10829852B2 (en) 2018-08-16 2020-11-10 Asm Ip Holding B.V. Gas distribution device for a wafer processing apparatus
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11024523B2 (en) 2018-09-11 2021-06-01 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102707956B1 (en) 2018-09-11 2024-09-19 에이에스엠 아이피 홀딩 비.브이. Method for deposition of a thin film
US11049751B2 (en) 2018-09-14 2021-06-29 Asm Ip Holding B.V. Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
KR20200038184A (en) 2018-10-01 2020-04-10 에이에스엠 아이피 홀딩 비.브이. Substrate retaining apparatus, system including the apparatus, and method of using same
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102592699B1 (en) 2018-10-08 2023-10-23 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and apparatuses for depositing thin film and processing the substrate including the same
US10847365B2 (en) 2018-10-11 2020-11-24 Asm Ip Holding B.V. Method of forming conformal silicon carbide film by cyclic CVD
US10811256B2 (en) 2018-10-16 2020-10-20 Asm Ip Holding B.V. Method for etching a carbon-containing feature
KR102605121B1 (en) 2018-10-19 2023-11-23 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
KR102546322B1 (en) 2018-10-19 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
USD948463S1 (en) 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US10381219B1 (en) 2018-10-25 2019-08-13 Asm Ip Holding B.V. Methods for forming a silicon nitride film
US11087997B2 (en) 2018-10-31 2021-08-10 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
KR20200051105A (en) 2018-11-02 2020-05-13 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and substrate processing apparatus including the same
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
US10837109B2 (en) 2018-11-15 2020-11-17 United Technologies Corporation CVI/CVD matrix densification process and apparatus
US10818758B2 (en) 2018-11-16 2020-10-27 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10847366B2 (en) 2018-11-16 2020-11-24 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10559458B1 (en) 2018-11-26 2020-02-11 Asm Ip Holding B.V. Method of forming oxynitride film
US12040199B2 (en) 2018-11-28 2024-07-16 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
KR102636428B1 (en) 2018-12-04 2024-02-13 에이에스엠 아이피 홀딩 비.브이. A method for cleaning a substrate processing apparatus
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
TW202037745A (en) 2018-12-14 2020-10-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming device structure, structure formed by the method and system for performing the method
TW202405220A (en) 2019-01-17 2024-02-01 荷蘭商Ａｓｍ Ｉｐ 私人控股有限公司 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
KR20200091543A (en) 2019-01-22 2020-07-31 에이에스엠 아이피 홀딩 비.브이. Semiconductor processing device
CN111524788B (en) 2019-02-01 2023-11-24 Asm Ip私人控股有限公司 Method for topologically selective film formation of silicon oxide
US11482533B2 (en) 2019-02-20 2022-10-25 Asm Ip Holding B.V. Apparatus and methods for plug fill deposition in 3-D NAND applications
KR102626263B1 (en) 2019-02-20 2024-01-16 에이에스엠 아이피 홀딩 비.브이. Cyclical deposition method including treatment step and apparatus for same
TW202044325A (en) 2019-02-20 2020-12-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of filling a recess formed within a surface of a substrate, semiconductor structure formed according to the method, and semiconductor processing apparatus
TWI845607B (en) 2019-02-20 2024-06-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
TWI842826B (en) 2019-02-22 2024-05-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Substrate processing apparatus and method for processing substrate
KR20200108248A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. STRUCTURE INCLUDING SiOCN LAYER AND METHOD OF FORMING SAME
KR20200108243A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Structure Including SiOC Layer and Method of Forming Same
KR20200108242A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Method for Selective Deposition of Silicon Nitride Layer and Structure Including Selectively-Deposited Silicon Nitride Layer
JP2020167398A (en) 2019-03-28 2020-10-08 エーエスエム・アイピー・ホールディング・ベー・フェー Door opener and substrate processing apparatus provided therewith
KR20200116855A (en) 2019-04-01 2020-10-13 에이에스엠 아이피 홀딩 비.브이. Method of manufacturing semiconductor device
US11447864B2 (en) 2019-04-19 2022-09-20 Asm Ip Holding B.V. Layer forming method and apparatus
KR20200125453A (en) 2019-04-24 2020-11-04 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system and method of using same
KR20200130118A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Method for Reforming Amorphous Carbon Polymer Film
KR20200130121A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Chemical source vessel with dip tube
KR20200130652A (en) 2019-05-10 2020-11-19 에이에스엠 아이피 홀딩 비.브이. Method of depositing material onto a surface and structure formed according to the method
JP2020188254A (en) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー．ブイ． Wafer boat handling device, vertical batch furnace, and method
JP2020188255A (en) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー．ブイ． Wafer boat handling device, vertical batch furnace, and method
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD922229S1 (en) 2019-06-05 2021-06-15 Asm Ip Holding B.V. Device for controlling a temperature of a gas supply unit
KR20200141002A (en) 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. Method of using a gas-phase reactor system including analyzing exhausted gas
KR20200143254A (en) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
USD931978S1 (en) 2019-06-27 2021-09-28 Asm Ip Holding B.V. Showerhead vacuum transport
KR20210005515A (en) 2019-07-03 2021-01-14 에이에스엠 아이피 홀딩 비.브이. Temperature control assembly for substrate processing apparatus and method of using same
JP7499079B2 (en) 2019-07-09 2024-06-13 エーエスエム・アイピー・ホールディング・ベー・フェー Plasma device using coaxial waveguide and substrate processing method
CN112216646A (en) 2019-07-10 2021-01-12 Asm Ip私人控股有限公司 Substrate supporting assembly and substrate processing device comprising same
KR20210010307A (en) 2019-07-16 2021-01-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210010816A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Radical assist ignition plasma system and method
KR20210010820A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Methods of forming silicon germanium structures
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
KR20210010817A (en) 2019-07-19 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Method of Forming Topology-Controlled Amorphous Carbon Polymer Film
TWI839544B (en) 2019-07-19 2024-04-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming topology-controlled amorphous carbon polymer film
CN112309843A (en) 2019-07-29 2021-02-02 Asm Ip私人控股有限公司 Selective deposition method for achieving high dopant doping
CN112309899A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112309900A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
KR20210018759A (en) 2019-08-05 2021-02-18 에이에스엠 아이피 홀딩 비.브이. Liquid level sensor for a chemical source vessel
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
JP2021031769A (en) 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー．ブイ． Production apparatus of mixed gas of film deposition raw material and film deposition apparatus
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
KR20210024423A (en) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for forming a structure with a hole
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
USD930782S1 (en) 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
KR20210024420A (en) 2019-08-23 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
KR20210029090A (en) 2019-09-04 2021-03-15 에이에스엠 아이피 홀딩 비.브이. Methods for selective deposition using a sacrificial capping layer
KR20210029663A (en) 2019-09-05 2021-03-16 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
CN112593212B (en) 2019-10-02 2023-12-22 Asm Ip私人控股有限公司 Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process
KR20210042810A (en) 2019-10-08 2021-04-20 에이에스엠 아이피 홀딩 비.브이. Reactor system including a gas distribution assembly for use with activated species and method of using same
TWI846953B (en) 2019-10-08 2024-07-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Substrate processing device
TWI846966B (en) 2019-10-10 2024-07-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming a photoresist underlayer and structure including same
US12009241B2 (en) 2019-10-14 2024-06-11 Asm Ip Holding B.V. Vertical batch furnace assembly with detector to detect cassette
TWI834919B (en) 2019-10-16 2024-03-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of topology-selective film formation of silicon oxide
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
KR20210047808A (en) 2019-10-21 2021-04-30 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for selectively etching films
KR20210050453A (en) 2019-10-25 2021-05-07 에이에스엠 아이피 홀딩 비.브이. Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
KR20210054983A (en) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. Structures with doped semiconductor layers and methods and systems for forming same
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
KR20210062561A (en) 2019-11-20 2021-05-31 에이에스엠 아이피 홀딩 비.브이. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
CN112951697A (en) 2019-11-26 2021-06-11 Asm Ip私人控股有限公司 Substrate processing apparatus
US11450529B2 (en) 2019-11-26 2022-09-20 Asm Ip Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
CN112885693A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885692A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
JP7527928B2 (en) 2019-12-02 2024-08-05 エーエスエム・アイピー・ホールディング・ベー・フェー Substrate processing apparatus and substrate processing method
KR20210070898A (en) 2019-12-04 2021-06-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
TW202125596A (en) 2019-12-17 2021-07-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming vanadium nitride layer and structure including the vanadium nitride layer
KR20210080214A (en) 2019-12-19 2021-06-30 에이에스엠 아이피 홀딩 비.브이. Methods for filling a gap feature on a substrate and related semiconductor structures
JP2021109175A (en) 2020-01-06 2021-08-02 エーエスエム・アイピー・ホールディング・ベー・フェー Gas supply assembly, components thereof, and reactor system including the same
TW202142733A (en) 2020-01-06 2021-11-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Reactor system, lift pin, and processing method
US11993847B2 (en) 2020-01-08 2024-05-28 Asm Ip Holding B.V. Injector
KR102675856B1 (en) 2020-01-20 2024-06-17 에이에스엠 아이피 홀딩 비.브이. Method of forming thin film and method of modifying surface of thin film
TW202130846A (en) 2020-02-03 2021-08-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming structures including a vanadium or indium layer
TW202146882A (en) 2020-02-04 2021-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of verifying an article, apparatus for verifying an article, and system for verifying a reaction chamber
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
US11781243B2 (en) 2020-02-17 2023-10-10 Asm Ip Holding B.V. Method for depositing low temperature phosphorous-doped silicon
TW202203344A (en) 2020-02-28 2022-01-16 荷蘭商Ａｓｍ Ｉｐ控股公司 System dedicated for parts cleaning
US11876356B2 (en) 2020-03-11 2024-01-16 Asm Ip Holding B.V. Lockout tagout assembly and system and method of using same
KR20210116240A (en) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. Substrate handling device with adjustable joints
KR20210117157A (en) 2020-03-12 2021-09-28 에이에스엠 아이피 홀딩 비.브이. Method for Fabricating Layer Structure Having Target Topological Profile
KR20210124042A (en) 2020-04-02 2021-10-14 에이에스엠 아이피 홀딩 비.브이. Thin film forming method
TW202146689A (en) 2020-04-03 2021-12-16 荷蘭商Ａｓｍ Ｉｐ控股公司 Method for forming barrier layer and method for manufacturing semiconductor device
TW202145344A (en) 2020-04-08 2021-12-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Apparatus and methods for selectively etching silcon oxide films
KR20210128343A (en) 2020-04-15 2021-10-26 에이에스엠 아이피 홀딩 비.브이. Method of forming chromium nitride layer and structure including the chromium nitride layer
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
US11996289B2 (en) 2020-04-16 2024-05-28 Asm Ip Holding B.V. Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
KR20210132576A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Method of forming vanadium nitride-containing layer and structure comprising the same
TW202146831A (en) 2020-04-24 2021-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Vertical batch furnace assembly, and method for cooling vertical batch furnace
KR20210132600A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
KR20210134226A (en) 2020-04-29 2021-11-09 에이에스엠 아이피 홀딩 비.브이. Solid source precursor vessel
KR20210134869A (en) 2020-05-01 2021-11-11 에이에스엠 아이피 홀딩 비.브이. Fast FOUP swapping with a FOUP handler
TW202147543A (en) 2020-05-04 2021-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Semiconductor processing system
KR20210141379A (en) 2020-05-13 2021-11-23 에이에스엠 아이피 홀딩 비.브이. Laser alignment fixture for a reactor system
TW202146699A (en) 2020-05-15 2021-12-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming a silicon germanium layer, semiconductor structure, semiconductor device, method of forming a deposition layer, and deposition system
KR20210143653A (en) 2020-05-19 2021-11-29 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210145078A (en) 2020-05-21 2021-12-01 에이에스엠 아이피 홀딩 비.브이. Structures including multiple carbon layers and methods of forming and using same
KR102702526B1 (en) 2020-05-22 2024-09-03 에이에스엠 아이피 홀딩 비.브이. Apparatus for depositing thin films using hydrogen peroxide
TW202201602A (en) 2020-05-29 2022-01-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Substrate processing device
TW202212620A (en) 2020-06-02 2022-04-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Apparatus for processing substrate, method of forming film, and method of controlling apparatus for processing substrate
TW202218133A (en) 2020-06-24 2022-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method for forming a layer provided with silicon
TW202217953A (en) 2020-06-30 2022-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Substrate processing method
TW202202649A (en) 2020-07-08 2022-01-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Substrate processing method
KR20220010438A (en) 2020-07-17 2022-01-25 에이에스엠 아이피 홀딩 비.브이. Structures and methods for use in photolithography
TW202204662A (en) 2020-07-20 2022-02-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method and system for depositing molybdenum layers
US12040177B2 (en) 2020-08-18 2024-07-16 Asm Ip Holding B.V. Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
KR20220027026A (en) 2020-08-26 2022-03-07 에이에스엠 아이피 홀딩 비.브이. Method and system for forming metal silicon oxide and metal silicon oxynitride
TW202229601A (en) 2020-08-27 2022-08-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of forming patterned structures, method of manipulating mechanical property, device structure, and substrate processing system
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
US12009224B2 (en) 2020-09-29 2024-06-11 Asm Ip Holding B.V. Apparatus and method for etching metal nitrides
KR20220045900A (en) 2020-10-06 2022-04-13 에이에스엠 아이피 홀딩 비.브이. Deposition method and an apparatus for depositing a silicon-containing material
CN114293174A (en) 2020-10-07 2022-04-08 Asm Ip私人控股有限公司 Gas supply unit and substrate processing apparatus including the same
TW202229613A (en) 2020-10-14 2022-08-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of depositing material on stepped structure
TW202217037A (en) 2020-10-22 2022-05-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method of depositing vanadium metal, structure, device and a deposition assembly
TW202223136A (en) 2020-10-28 2022-06-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Method for forming layer on substrate, and semiconductor processing system
TW202235649A (en) 2020-11-24 2022-09-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Methods for filling a gap and related systems and devices
TW202235675A (en) 2020-11-30 2022-09-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Injector, and substrate processing apparatus
US11946137B2 (en) 2020-12-16 2024-04-02 Asm Ip Holding B.V. Runout and wobble measurement fixtures
TW202231903A (en) 2020-12-22 2022-08-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Transition metal deposition method, transition metal layer, and deposition assembly for depositing transition metal on substrate
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
USD1023959S1 (en) 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0768702A1 (en) * 1995-10-16 1997-04-16 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
EP0995814A2 (en) * 1998-10-23 2000-04-26 The B.F.Goodrich Co. Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
US20020059904A1 (en) * 2000-11-20 2002-05-23 Applied Epi, Inc. Surface sealing showerhead for vapor deposition reactor having integrated flow diverters

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62155511A (en) * 1985-12-27 1987-07-10 Sharp Corp Vapor growth device
JP3106172B2 (en) 1991-02-26 2000-11-06 東京エレクトロン株式会社 Sealing structure of heat treatment equipment
JPH0653149A (en) 1992-07-31 1994-02-25 Tokyo Electron Ltd Seal material for semiconductor manufacturing device
GB2275209B (en) * 1992-10-16 1996-02-07 Richard Pierpont Moore Rapid gravity filter backwash system and filters relative thereto
US5562947A (en) 1994-11-09 1996-10-08 Sony Corporation Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment
KR100389502B1 (en) * 1994-11-16 2003-10-22 굿리치 코포레이션 Pressure gradient cvi/cvd apparatus, process and product
US5480678A (en) 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
US5916633A (en) * 1995-05-19 1999-06-29 Georgia Tech Research Corporation Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration
TW356554B (en) * 1995-10-23 1999-04-21 Watkins Johnson Co Gas injection system for semiconductor processing
US5746834A (en) * 1996-01-04 1998-05-05 Memc Electronics Materials, Inc. Method and apparatus for purging barrel reactors
TW506620U (en) 1996-03-15 2002-10-11 Asahi Glass Co Ltd Low pressure CVD apparatus
US5885358A (en) * 1996-07-09 1999-03-23 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
US5645343A (en) * 1996-09-13 1997-07-08 Rinehimer; John C. Light-string holder
US5879458A (en) * 1996-09-13 1999-03-09 Semifab Incorporated Molecular contamination control system
JPH10158020A (en) * 1996-11-25 1998-06-16 Fuji Photo Optical Co Ltd Nozzle for injection molding of glass
US5846330A (en) 1997-06-26 1998-12-08 Celestech, Inc. Gas injection disc assembly for CVD applications
US6062851A (en) 1998-10-23 2000-05-16 The B. F. Goodrich Company Combination CVI/CVD and heat treat susceptor lid
US6669988B2 (en) * 2001-08-20 2003-12-30 Goodrich Corporation Hardware assembly for CVI/CVD processes
US6162298A (en) * 1998-10-28 2000-12-19 The B. F. Goodrich Company Sealed reactant gas inlet for a CVI/CVD furnace
US6143078A (en) * 1998-11-13 2000-11-07 Applied Materials, Inc. Gas distribution system for a CVD processing chamber
US6230651B1 (en) * 1998-12-30 2001-05-15 Lam Research Corporation Gas injection system for plasma processing
US6257881B1 (en) * 1999-06-04 2001-07-10 The B.F. Goodrich Company Combination CVI/CVD and heat treat susceptor lid
EP1065294B1 (en) * 1999-06-04 2003-10-15 Goodrich Corporation Method and apparatus for pressure measurement in a CVI/CVD furnace
JP2002341099A (en) * 2001-05-17 2002-11-27 Seiko Instruments Inc Gas gun capable of lifting and driving one of a plurality of nozzles selectively
US6758909B2 (en) * 2001-06-05 2004-07-06 Honeywell International Inc. Gas port sealing for CVD/CVI furnace hearth plates
US6953605B2 (en) * 2001-12-26 2005-10-11 Messier-Bugatti Method for densifying porous substrates by chemical vapour infiltration with preheated gas
US6572371B1 (en) * 2002-05-06 2003-06-03 Messier-Bugatti Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5746875A (en) * 1994-09-16 1998-05-05 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
EP0768702A1 (en) * 1995-10-16 1997-04-16 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
EP0995814A2 (en) * 1998-10-23 2000-04-26 The B.F.Goodrich Co. Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
US20020059904A1 (en) * 2000-11-20 2002-05-23 Applied Epi, Inc. Surface sealing showerhead for vapor deposition reactor having integrated flow diverters

Also Published As

Publication number Publication date
EP1392885A1 (en) 2004-03-03
US6758909B2 (en) 2004-07-06
US20020179011A1 (en) 2002-12-05
US20040211364A1 (en) 2004-10-28
US6846514B2 (en) 2005-01-25

Similar Documents

Publication Publication Date Title
US6758909B2 (en) Gas port sealing for CVD/CVI furnace hearth plates
KR102179965B1 (en) Hot wall reactor with cooled vacuum containment
EP1718783B1 (en) Pressure gradient cvi/cvd apparatus and method
AU2002364339B2 (en) Method and installation for densifying porous substrate by gas-phase chemical infiltration
EP0846787B1 (en) Apparatus for use with CVI/CVD processes
RU2421544C2 (en) Process furnace or similar equipment
KR101124901B1 (en) An oven for cvi/cvd
JP2002506963A (en) Combustor wall segments and combustors
EP0995960B1 (en) Method and apparatus for cooling a cvi/cvd furnace
US7875119B2 (en) Apparatus and method for coating an article
EP0997553B1 (en) Sealed reactant gas inlet for a cvi/cvd furnace
US6257881B1 (en) Combination CVI/CVD and heat treat susceptor lid
US6440220B1 (en) Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
MX2008010491A (en) A sealing device for a gas inlet to an oven or the like

Legal Events

Date Code Title Description
AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2002756119

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2002756119

Country of ref document: EP

WWW Wipo information: withdrawn in national office

Ref document number: 2002756119

Country of ref document: EP