WO2001094039A1 - Cleaning solvent circulating and condensating system for continuous cleaning device - Google Patents

Cleaning solvent circulating and condensating system for continuous cleaning device Download PDF

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Publication number
WO2001094039A1
WO2001094039A1 PCT/JP2001/004762 JP0104762W WO0194039A1 WO 2001094039 A1 WO2001094039 A1 WO 2001094039A1 JP 0104762 W JP0104762 W JP 0104762W WO 0194039 A1 WO0194039 A1 WO 0194039A1
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WO
WIPO (PCT)
Prior art keywords
liquid
cleaning
tank
washing
tanks
Prior art date
Application number
PCT/JP2001/004762
Other languages
French (fr)
Japanese (ja)
Inventor
Yoshiteru Yagishita
Original Assignee
Yagishita, Kazuhiko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yagishita, Kazuhiko filed Critical Yagishita, Kazuhiko
Priority to AU2001262700A priority Critical patent/AU2001262700A1/en
Publication of WO2001094039A1 publication Critical patent/WO2001094039A1/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00Actuating devices; Operating means; Releasing devices
    • F16K31/44Mechanical actuating means
    • F16K31/53Mechanical actuating means with toothed gearing
    • F16K31/535Mechanical actuating means with toothed gearing for rotating valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/06Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
    • F16K11/072Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with pivoted closure members
    • F16K11/074Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with pivoted closure members with flat sealing faces
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00Actuating devices; Operating means; Releasing devices
    • F16K31/02Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/04Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
    • F16K31/041Actuating devices; Operating means; Releasing devices electric; magnetic using a motor for rotating valves

Definitions

  • a cleaning liquid stored in a plurality of cleaning liquid tanks, each having a different degree of contamination is sprayed on an injection nozzle installed toward a cleaning article suspended in a cleaning chamber according to the prior application of the present invention, and
  • the amount of the cleaning liquid used is remarkably reduced, and the concentration of the dirt component in the tank with a higher degree of dirt is further increased, thereby increasing the dirt concentration That is, regarding a washing liquid circulating concentration system that facilitates the recovery of reusable useful components,
  • the present invention relates to a cleaning liquid distribution system for a continuous cleaning device that has achieved compactness, maintenance-free operation, and simplified configuration of the entire device.
  • the articles to be cleaned are sequentially passed through a plurality of cleaning tanks filled with the cleaning liquid. And a method of passing through a plurality of washing nozzle groups arranged in tandem.
  • Japanese Patent Publication No. 2-4 9 7 3 9 Japanese Patent Publication No. 3-4 4830
  • Japanese Patent Publication No. 3-4 4830 Japanese Patent Publication No. 3-4 4830
  • FIG. 5 1a is a drain port provided at the bottom, and 52 is a fresh This is an immersion type cleaning tank that stores the cleaning liquid.
  • cleaning liquid tanks 53 and 54 are cleaning liquid tanks which store cleaning liquid discharged from the cleaning chamber, each having a different degree of contamination according to the degree of progress of the cleaning, and sequentially circulate them to the injection nozzles 60 in a predetermined order. It is for.
  • 5 5 is a waste liquid reservoir for washing and draining which is very dirty at the beginning of cleaning
  • 70 is a cleaning article
  • 80 is a flow path switching valve for cleaning liquid
  • 81 is a valve control device
  • 82 is a flow meter
  • Reference numerals 3 and 84 denote a liquid feed pump
  • a to f denote a liquid feed piping system.
  • the operation of the cleaning system is as follows. First, the cleaning liquid in the cleaning liquid tank 53 is supplied to the injection nozzle 60 suspended from the cleaning chamber 51 ⁇ through the pipe a by the pump 83 and injected for a predetermined time.
  • the highly contaminated washing wastewater at the beginning of the injection is stored in the wastewater reservoir 55 through the pipes b and c by operating the flow path switching valve 80. Thereafter, the flow switching valve 80 is switched to return the cleaning waste liquid to the cleaning liquid tank 53 via the pipe d, and circulate and supply the cleaning liquid to the spray nozzle 60 until a predetermined time has elapsed.
  • the cleaning liquid in the cleaning liquid tank 54 is supplied to the injection nozzle 60 'by the pump 84 and the pipe a' to perform secondary cleaning.
  • the washing waste liquid is returned to the washing tank 53 via the pipes b and d at the beginning of the washing period, and after a predetermined time has elapsed, the washing liquid is passed through the pipes b and d 'by operating the flow path switching valve 80. Return to tank 54 and use for circulation.
  • the cleaning article 70 is transferred to an immersion-type cleaning tank 52 to which fresh cleaning liquid is supplied, and is immersed for a predetermined time to completely remove dirt.
  • the intended purpose of reducing the amount of the cleaning liquid used and concentrating the cleaning liquid to facilitate the recovery and reuse of useful components is remarkably achieved.
  • the use of the flow path switching valve 80 composed of a multi-way solenoid valve as the cleaning liquid flow path switching mechanism has caused a new problem to be improved. That is, (a) Since the height of the mounting part of the multi-way switching type solenoid valve including the piping system is high, the installation space for the cleaning device is required accordingly.
  • the height of the device can be improved by using a slide valve instead of a solenoid valve.However, the structure is not durable and costs are reduced, including the cost of piping systems. The effect cannot be expected very much.
  • the applicant of the present application has created a new type of cleaning liquid circulation / concentration system for a continuous cleaning apparatus that does not use a solenoid valve having many disadvantages as described above, and has previously described “Japanese Patent Application No. 7-333992. 2 ”as a patent application.
  • the cleaning liquid circulation / concentration system includes a plurality of cleaning liquid tanks 53 to 56 surrounding the drain port 51 a of the cleaning chamber 51. And it is installed underneath.
  • the drainage port 51a is connected to a horizontally rotatable liquid guide gutter 57 by a rotating means using a motor, a belt and a pulley to form a cleaning liquid flow path switching mechanism C.
  • the effluent discharged from the cleaning chamber 51 can be selectively flown into any of the cleaning liquid tanks 53 to 56 by appropriately rotating the liquid guide gutter 57.
  • Reference numeral 58 in the figure denotes a group of rotation position sensors for the liquid guide gutter 57.
  • an object of the present invention is to significantly reduce the required amount of a cleaning solution and to concentrate useful components in the cleaning solution, which are extremely excellent features of the method for cleaning an article according to the prior application of the present applicant.
  • An object of the present invention is to provide a cleaning liquid circulating and concentrating system for a continuous cleaning apparatus, in which, in addition to the advantage of facilitating recovery, the cleaning apparatus used in this method has also been made more compact, maintenance-free, and simplified in structure. Disclosure of the invention
  • a cleaning solution circulating concentration system for a continuous cleaning device comprises:
  • a cleaning chamber 51 a plurality of cleaning liquid tanks arranged below the drainage port 51a of the cleaning chamber so as to surround the drainage port 51a, and a discharge liquid from the drainage port to the plurality of cleaning liquid tanks. It is equipped with a flow path switching mechanism A that successively flows in the order from a tank with a high concentration of dirt components in a liquid to a tank with a low concentration,
  • the channel switching mechanism A is
  • a rotary distribution plate 1 provided with a liquid inlet 4 slidably in contact with the lower surface of the drainage port 5 1a at the center of the upper surface, and its rotating means and a rotating control unit;
  • a rotating plate supporting member 2 attached to the lower surface of the washing chamber 51 to rotatably support the rotating distribution plate 1;
  • the liquid outlet 5 of the liquid flow passage 6 formed from the liquid inlet 4 on the upper surface of the rotary distribution plate 1 to the peripheral edge of the bottom surface, and the rotation of the rotary distribution plate 1 causes the concentration of each of the plurality of cleaning liquid tanks to be reduced. It is characterized in that it is constructed so as to sequentially face from a thick tank to a thin tank.
  • the rotating means may be configured to include a ring gear provided on the outer peripheral surface of the rotation distribution board 1, a pinion that matches the gear, and a motor that rotates the pinion via a set of bevel gears. .
  • the rotation means may be configured to include a worm wheel provided on the outer peripheral surface of the rotation distribution board 1 and a motor for rotating the worm combined with the worm wheel.
  • a rotating means composed of a combination of a sprocket provided on the outer peripheral surface of the rotation distributor 1 and a motor and a chain for rotating the sprocket may be used.
  • the discharged liquid that falls from the liquid outlet 5 of the rotary distribution board 1 is guided to each liquid surface of a plurality of washing liquid tanks immediately below the liquid outlet 5 to prevent the falling liquid from bouncing on the liquid surface.
  • the drainage guide member B includes a hole opening plate 41 having a plurality of liquid passage holes 42 arranged so as to be able to sequentially communicate with the liquid outlet 5 with the rotation of the rotation distribution plate 1,
  • liquid guide cylinder 45 connected to the lower end of each liquid passage hole 42 and guiding the discharged liquid to the liquid surface of each of the plurality of cleaning liquids.
  • Each of the liquid guide cylinders 45 is provided with an extension pipe 46 that reaches each liquid level of a plurality of cleaning liquid tanks, which is installed in an arbitrary spatial arrangement according to the installation space condition.
  • FIG. 1 shows an embodiment of the present invention, and is a longitudinal sectional view of a flow path switching mechanism in a state where the flow path switching mechanism is attached to a cleaning chamber.
  • FIG. View, Fig. 3 is the same as above.
  • Fig. 4 is the same as above.
  • Fig. 3 is a plan view of the same with the washing chamber omitted.
  • FIG. 6 is a vertical cross-sectional view showing another embodiment in which the drainage guide member is connected to the lower surface, showing the connected state, FIG. 6 is the same as above, FIG. , A bottom view of the drainage guide member, and FIG.
  • FIG. 8 is a partially cutaway side view showing the state in which an extension pipe is attached to each guide cylinder together with the cleaning liquid tank group
  • FIG. FIG. 10 is a schematic diagram illustrating the overall configuration of an apparatus used in the cleaning method of “Japanese Patent Application Laid-Open No. 3-44830”.
  • FIG. FIG. 11 is a side view of a main part of the cleaning liquid circulation / concentration system of “Japanese Patent Application Laid-Open No. 7-33932”, and
  • FIG. 11 is a plan view of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIGS. 3 and 4 show a side view and a plan view of the configuration of the main part of the cleaning liquid circulation / concentration system of this embodiment.
  • reference numeral 51 denotes a cleaning chamber
  • a cleaning liquid flow path switching mechanism A is connected directly below the drain port 51a via a mounting member 59.
  • tanks 3 1 to 3 4 are arranged so as to surround the drain port 51 a. They are installed close to the shape.
  • tank 31 is a storage tank that is discharged at the beginning of cleaning and stores the heaviest cleaning liquid without circulating it.
  • the present invention is different from the above-mentioned prior application “Japanese Patent Application No. 7-333972” in the configuration of the flow path switching mechanism A.
  • the flow path switching mechanism A is attached to the flat bottom surface of an attachment member 59 fixed to the lower surface of the cleaning chamber 51 by using a connection bolt 90 in a tightly contacted state.
  • the schematic configuration of the flow path switching mechanism A is, as shown in FIGS. 1 and 2, rotatable in a horizontal direction around the drain port 51a, so that the liquid discharged from the drain port 51a is discharged.
  • the four distribution tanks 3:! ⁇ 3 4 are equipped with a rotating distribution plate 1 which plays the role of successively flowing from the tank with the higher concentration of dirt components in the liquid to the tank with the lower concentration. , It is freely rotatable.
  • a motor 3 serving as a driving source of the spin distribution board 1 is mounted on a side surface of the turntable support member 2.
  • the rotary distribution board 1 of this embodiment is made of a metal or synthetic resin, and is made of a thick disk-shaped block. The center of the upper surface is slidably connected to the drain port 51 a of the cleaning chamber 51. A liquid inlet 4 is opened, and a liquid outlet 5 is provided at one location on the lower peripheral edge. The liquid inlet 4 and the liquid outlet 5 communicate with each other via a liquid flow passage 6 provided so as to hollow out the rotary distribution board 1.
  • a ring gear 7 is fitted on the outer peripheral surface of the rotary distribution board 1.
  • An annular packing 8 slidably in contact with the flat lower surface of the mounting member 59 is provided on the upper surface of the rotary distribution board 1 so as to surround the liquid inlet 4.
  • the turntable 1 is rotatably supported by the turntable support member 2 via a bearing 10 fitted in an inner space provided in the upper half 2A.
  • the rotary plate supporting member 2 has a shape in which one portion of the outer peripheral surface of the circular disk is bulged as shown in FIG. 2, and this bulging portion is used as a gear box portion 2C. Yes.
  • variable speed motor 3 is mounted on the side end face of the gear box 2C.
  • the gearbox section 2C incorporates a pair of upper and lower bearings 15 and 15 that support the gear shaft 14 of the pinion 13 that is coupled to the ring gear 7.
  • a bevel gear 16 is fitted on the gear shaft 14.
  • This bevel gear 16 has another bevel gear 1 fitted on the output shaft 17 of the motor 3.
  • a rotation position display section 21 for detecting the rotation position of the rotary distribution board 1 is attached at a total of four locations corresponding to the arrangement of the four tanks 31 to 34. I have.
  • rotation position sensors 22 are mounted at respective positions corresponding to the respective rotation position display sections 21.
  • each rotation position sensor 22 is attached to a displaceable arc-shaped strip 23 along the circumferential direction of the annular casing 2.
  • the arc-shaped strip 23 is provided with a long hole 24 arranged along the arc.
  • the principle of operation of the washing solution circulating concentration system according to the present invention is characterized in that, at the beginning, the amount of washing solution used can be significantly reduced, and the washing solution is concentrated to facilitate recovery and reuse of useful components. It is equivalent to that of the prior application of the present applicant.
  • the feature of the present invention resides in the flow path switching mechanism A as described above.
  • the liquid distributor 5 of the rotation distribution board 1 is brought directly above the tank 31 by the motor 3 that operates in response to an instruction from the rotation control unit.
  • the cleaning liquid in the tank 32 is circulated and supplied to the injection nozzle 60.
  • the very dirty cleaning liquid at the beginning of the cleaning is stored in the tank 31.
  • the supply of the cleaning liquid is temporarily stopped, and the motor 3 is started in accordance with an instruction from the rotation control unit.
  • the rotation position sensor 22 for the cleaning liquid tank 32 attached to the lower surface of the turntable support member 2 detects the corresponding rotation position display section 21 on the rotation distribution plate 1, the detection signal indicates that the motor 3 stops.
  • the liquid outlet 5 of the rotary distribution board 1 is located above the tank 32, and the cleaning liquid in the tank 33 with a lower degree of contamination is supplied to the spray nozzle 60 in a circulating manner.
  • the liquid outlet 5 of the rotary distribution board 1 is placed on the tank 33. After being moved, the cleaning is continued with the cleaning liquid in the tank 33 for a predetermined time, and the secondary cleaning process is completed.
  • a tertiary cleaning step using a cleaning liquid with a lower degree of contamination in the tank 34 is performed in the same manner as in the second cleaning step.
  • the flow path switching mechanism A has a structure in which the height dimension can be kept as low as possible.
  • the overall height of the washing solution circulating and concentrating system can be considerably reduced, and the system can be easily installed in a limited space.
  • the flow path switching mechanism A has a complete liquid-tight structure as a whole. Therefore, even when using a corrosive cleaning solution, the maintenance and management of the cleaning solution can be reduced in labor and cost, and sufficient durability can be ensured.
  • the thickness and diameter of the rotary distribution board 1 and the shape and arrangement of the liquid flow-down passage 6 are determined by the scale of the entire washing liquid circulation / concentration system and the shape and arrangement of each component thereof. The design may be changed as appropriate.
  • the rotation of the motor 3 is transmitted through the pinion and the ring gear as the rotation means of the rotation distribution board 1.
  • a combination of a worm wheel and a worm may be used instead of a combination of a ring gear and a pinion.
  • a combination of a sprocket and a chain may be used.
  • FIGS. 5 to 8 show another embodiment of the present invention, which is different from the above embodiment in that the drainage guide member B is connected to the lower side of the flow path switching mechanism A. I have.
  • the discharged liquid guide member B guides the cleaning liquid discharged from the liquid outlet 5 of the rotary distribution board 1 to each liquid surface of the plurality of tanks 31 to 34 immediately below, so that the falling liquid flows on the liquid surface. It serves to prevent bouncing.
  • the discharge guide member B includes a plurality of discharge guide members B arranged so as to be able to communicate sequentially with the liquid outlet 5 as the rotary distributor 1 of the flow path switching mechanism A rotates.
  • a hole opening plate 41 having four liquid passage holes 42 is used as its main body.
  • the perforated plate 41 is connected to the lower surface of the turntable support member 2 by fastening ports 43 disposed at a plurality of locations on the periphery.
  • a liquid-tight packing 44 is provided at a portion where the hole opening plate 41 comes into sliding contact with the rotary distribution plate 1.
  • An elbow-shaped liquid guide cylinder 45 is connected to the lower end of each liquid passage hole 42 for guiding the liquid discharged from the liquid outlet 5 to the liquid surface of each of the plurality of tanks 31 to 34. are doing.
  • an extension pipe 46 having a length reaching the liquid level of each of the tanks 31 to 34 is connected to each of the liquid guide cylinders 45, respectively.
  • the length of the extension pipe 46 is set so that the lower end of the extension pipe 46 is in contact with the liquid level even when the liquid level drops to the lowest level. . And, when the lower end of the extension pipe 46 is submerged below the liquid level, the air trapped in the pipe does not prevent the drainage liquid from flowing down. Air vent holes 46a are provided.
  • the washing liquid tank can be freely installed in a place separated from the washing room 51 without restriction on the distance.
  • the cleaning liquid circulation / concentration system for the continuous cleaning apparatus can significantly reduce the required amount of the cleaning liquid, By increasing the concentration of useful components, the cost of wastewater treatment as a countermeasure against pollution and the effect of greatly reducing the cost of recovering useful components in the wastewater are greatly reduced. As described below, more excellent effects can be obtained.
  • (a) The remarkable reduction in the height of the flow path switching mechanism makes it possible to fit the entire cleaning liquid circulating and concentrating system in a limited space.
  • the extension pipe can be used to freely install the tank even at a location away from the washing room.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Gear Transmission (AREA)
  • Devices For Conveying Motion By Means Of Endless Flexible Members (AREA)

Abstract

A cleaning solvent circulating and condensating system capable of achieving such features that the sizes of the devices used therein are reduced, a maintenance is eliminated, and a structure is simplified in addition to such excellent features of a conventional system that cleaning solvent can be saved remarkably and effective components contained in the cleaning solvent can be recovered easily, wherein a flow path switching mechanism (A) allowing the delivered fluid from a drainage port (51a) to flow in order into a tank containing rich contaminant component fluid to a tank containing lean contaminant component fluid is provided in a plurality of cleaning solvent tanks installed on the underside of a cleaning chamber (51), the mechanism comprising a rotary distribution panel (1) having a fluid inlet (4) in contact slidably with the drainage port provided on the upper surface thereof, a rotating means and a rotating control part, and a rotary panel supporting member (2), a fluid outlet (5) in a fluid downflow path (6) provided aslant from the fluid inlet toward the bottom surface peripheral part of the panel is formed so as to face the upper side of each cleaning solvent tank in order according to the rotation of the rotary distribution panel, and a drainage guide member (B) preventing the drainage fallen from the fluid outlet (5) from jumping on the surface of the fluid inside the tanks may be connected to the lower surface of the flow path switching mechanism.

Description

明 細 書 連続洗浄装置用の洗浄液循環濃縮システム 技術分野  Description Circulating and concentrating system for washing liquid for continuous washing equipment
本発明は、 本願の先願発明に成る、 洗浄室内に垂支した洗浄物品に向けて設置 した噴射ノズルに、 複数の洗浄液タンクに蓄えられた、 夫々汚れ度合いが異なる 洗浄液を、 その液中の汚れ成分濃度の濃いタンクから薄いタンクの順に逐次切替 供給することにより、 洗浄液の使用量を顕著に節減すると共に、 汚れ度合いが大 きい側のタンクの汚れ成分濃度をより高まらせて、 この汚れ成分、 即ち、 再利用 可能な有用成分を回収し易くした、 洗浄液循環濃縮システムに就いて、  According to the present invention, a cleaning liquid stored in a plurality of cleaning liquid tanks, each having a different degree of contamination, is sprayed on an injection nozzle installed toward a cleaning article suspended in a cleaning chamber according to the prior application of the present invention, and By sequentially switching and supplying the tank from a tank having a high concentration of dirt to a tank having a low concentration of dirt, the amount of the cleaning liquid used is remarkably reduced, and the concentration of the dirt component in the tank with a higher degree of dirt is further increased, thereby increasing the dirt concentration That is, regarding a washing liquid circulating concentration system that facilitates the recovery of reusable useful components,
装置全体のコンパク ト化、 メンテナンスフリー化、 構成の簡素化等を達成した 連続洗浄装置用の洗浄液分配システムに関する。 背景技術  The present invention relates to a cleaning liquid distribution system for a continuous cleaning device that has achieved compactness, maintenance-free operation, and simplified configuration of the entire device. Background art
従来、 例えば、 メツキ直後の製品に付着したメツキ液や、 切削加工直後の製品 に付着した切削油等を洗い落とすには、 被洗浄物品を、 洗浄液を満たした複数基 の洗浄槽に順次通入させて行く方法や、 縦列状に配置した複数の洗浄ノズル群の 中を通過させる方法等が採られて来た。  Conventionally, for example, in order to wash off the plating liquid adhering to the product immediately after plating and the cutting oil adhering to the product immediately after cutting, the articles to be cleaned are sequentially passed through a plurality of cleaning tanks filled with the cleaning liquid. And a method of passing through a plurality of washing nozzle groups arranged in tandem.
然し、 この従来方式は、 大量の洗浄液を必要とするので、 殊に、 高価なうえに、 毒性の強い薬剤を含むメツキ液を洗い落とす場合等には、 洗浄廃液の処理費が嵩 み、 然も、 装置の設置スペースを多く要する難点があった。  However, this conventional method requires a large amount of cleaning solution, so the cost of processing the cleaning waste solution is high, especially when washing away the plating solution containing a highly toxic chemical, which is expensive. However, there was a problem that a large installation space for the device was required.
そこで、 本願出願人は、 洗浄液の使用量を極力抑制出来る洗浄方法に就いて、 様々に考究を重ねた末、 何件かの発明に就いて特許出願を行って来た。  Therefore, the applicant of the present application has applied for patents for some inventions after various studies on a cleaning method that can minimize the amount of the cleaning liquid used.
「特公平 2— 4 9 7 3 9」 、 及ぴ 「特公平 3— 4 4 8 3 0」 として開示され、 特許権取得済みの洗浄方法等がそれである。  These are disclosed as "Japanese Patent Publication No. 2-4 9 7 3 9" and "Japanese Patent Publication No. 3-4 4830", and the patented cleaning methods are such.
そのうち、 「特公平 3— 4 4 8 3 0」 の洗浄方法に用いる洗浄システムの概要 を、 図 9によって説明すると、 図中の 5 1は、 洗浄液 (例えば、 水) の噴射ノズ ル 6 0を備えた洗浄室であり、 5 1 aはその底部に設けた排液口、 5 2は新鮮な 洗浄液を蓄えた侵漬式の洗浄槽である。 Among them, the outline of the cleaning system used for the cleaning method of “Japanese Patent Publication No. 3-4 4 8 3 0” will be described with reference to FIG. 9. In FIG. 5 1a is a drain port provided at the bottom, and 52 is a fresh This is an immersion type cleaning tank that stores the cleaning liquid.
5 3及び 5 4は洗浄液タンクで、 洗浄室から排出される、 洗浄の進行度合いに 応じて夫々汚れ度合いが異なる洗浄排液を蓄えて、 所定の順序で噴射ノズル 6 0 に逐次、 循環供給する為のものである。  53 and 54 are cleaning liquid tanks which store cleaning liquid discharged from the cleaning chamber, each having a different degree of contamination according to the degree of progress of the cleaning, and sequentially circulate them to the injection nozzles 60 in a predetermined order. It is for.
そして、 5 5は洗浄開始当初の汚れのひどい洗浄排液用の廃液溜、 7 0は洗浄 物品、 8 0は洗浄液の流路切替弁、 8 1は弁制御装置、 8 2は流量計、 8 3, 8 4は送液ポンプ、 a〜 f は送液配管系である。  5 5 is a waste liquid reservoir for washing and draining which is very dirty at the beginning of cleaning, 70 is a cleaning article, 80 is a flow path switching valve for cleaning liquid, 81 is a valve control device, 82 is a flow meter, Reference numerals 3 and 84 denote a liquid feed pump, and a to f denote a liquid feed piping system.
この洗浄システムの作用は、 先ず、 洗浄室 5 1內に垂支した噴射ノズル 6 0に、 洗浄液タンク 5 3内の洗浄液を、 ポンプ 8 3により配管 aを介して供給し所定時 間噴射する。  The operation of the cleaning system is as follows. First, the cleaning liquid in the cleaning liquid tank 53 is supplied to the injection nozzle 60 suspended from the cleaning chamber 51 內 through the pipe a by the pump 83 and injected for a predetermined time.
噴射開始当初の汚れのひどい洗浄排液は、 流路切替弁 8 0の操作により、 配管 b, cを経て廃液溜 5 5に貯留する。 その後は、 流路切替弁 8 0を切替操作して、 洗浄排液を配管 dを介して洗浄液タンク 5 3に戻し、 所定時間が経過する迄嘖射 ノズル 6 0に循環供給する。  The highly contaminated washing wastewater at the beginning of the injection is stored in the wastewater reservoir 55 through the pipes b and c by operating the flow path switching valve 80. Thereafter, the flow switching valve 80 is switched to return the cleaning waste liquid to the cleaning liquid tank 53 via the pipe d, and circulate and supply the cleaning liquid to the spray nozzle 60 until a predetermined time has elapsed.
洗浄液タンク 5 3內の洗浄液を使って洗浄を終えた後、 洗浄液タンク 5 4内の 洗浄液を、 ポンプ 8 4、 配管 a 'により、 噴射ノズル 6 0 'に供給し、 二次洗浄 を行う。  After the cleaning is completed using the cleaning liquid in the cleaning liquid tank 53, the cleaning liquid in the cleaning liquid tank 54 is supplied to the injection nozzle 60 'by the pump 84 and the pipe a' to perform secondary cleaning.
その場合の洗浄排液は、 洗浄期間の初期では、 配管 b, dを経て洗浄タンク 5 3に戻し、 所定時間が経過したら、 流路切替弁 8 0の操作により配管 b, d 'を 経て洗浄液タンク 5 4に戻して循環使用する。  In this case, the washing waste liquid is returned to the washing tank 53 via the pipes b and d at the beginning of the washing period, and after a predetermined time has elapsed, the washing liquid is passed through the pipes b and d 'by operating the flow path switching valve 80. Return to tank 54 and use for circulation.
次いで、 洗浄物品 7 0を、 新鮮な洗浄液が補給される侵漬式の洗浄槽 5 2に移 して所定時間侵漬し、 汚れを完全に洗い落とす。  Next, the cleaning article 70 is transferred to an immersion-type cleaning tank 52 to which fresh cleaning liquid is supplied, and is immersed for a predetermined time to completely remove dirt.
この間に、 廃液溜 5 5に捨てられて減った洗浄液の不足分は、 洗浄槽 5 2内の 殆ど汚れていない新しい洗浄液を、 配管 eを介して洗浄液タンク 5 4に供給する ことにより補う。  During this time, the shortage of the cleaning liquid that has been discarded by the waste liquid reservoir 55 and reduced is compensated for by supplying a new cleaning liquid that is almost clean in the cleaning tank 52 to the cleaning liquid tank 54 via the pipe e.
上記の洗浄方法によれば、 洗浄液の使用量を減らし、 同時に、 洗浄液を濃縮し て有用成分を回収 ·再利用し易くするという、 所期の目的が顕著に達成される。 然しながら、 洗浄液の流路切替機構として、 多方電磁弁から成る流路切替弁 8 0を使用したことによって、 新たな要改善課題が発生した。 即ち、 ( a ) 多方切替式電磁弁の取付部分は、 配管系を含めて背丈が高くなるので、 その分、 洗浄装置の設置スペースを多く要する。 According to the above-described cleaning method, the intended purpose of reducing the amount of the cleaning liquid used and concentrating the cleaning liquid to facilitate the recovery and reuse of useful components is remarkably achieved. However, the use of the flow path switching valve 80 composed of a multi-way solenoid valve as the cleaning liquid flow path switching mechanism has caused a new problem to be improved. That is, (a) Since the height of the mounting part of the multi-way switching type solenoid valve including the piping system is high, the installation space for the cleaning device is required accordingly.
( b ) その為、 この装置を既存工場に導入したくても、 実行出来ない場合が少 なくない。  (b) For this reason, there are many cases where this equipment cannot be implemented even if it is desired to introduce it into an existing factory.
( c ) 流路切替弁は、 その制御機構も含めて、 製作 ·取付コスト及ぴ保守 ·点 検費が嵩み過ぎる。  (c) The flow path switching valve, including its control mechanism, is too expensive to manufacture, install, maintain, and inspect.
( d ) 流路切替弁に接続された複雑な配管系に就いても同様である。 洗浄液タ ンクの数を増すに連れて、 この欠点は更に顕著になる。  (d) The same applies to a complicated piping system connected to the flow switching valve. This drawback becomes more pronounced as the number of wash tanks increases.
( e ) 弁の構造上、 その内部には洗浄排液の残留空間がどうしても生ずるので、 弁の切替操作の都度、 汚れのひどい洗浄排液が洗浄液タンクに流入して、 その汚 れの度合いが増す。  (e) Due to the structure of the valve, a residual space for washing waste liquid is inevitably generated inside the valve.Every time the valve is switched, the dirty washing waste liquid flows into the washing liquid tank and the degree of contamination is reduced. Increase.
上記の欠点のうち、 装置の背丈に就いては、 電磁弁に代えてスライド弁を使え ば改善されるが、 その構造上耐久性に欠けるうえに、 配管系に要する経費も含め て、 コスト低減効果はあまり期待出来ない。  Among the drawbacks mentioned above, the height of the device can be improved by using a slide valve instead of a solenoid valve.However, the structure is not durable and costs are reduced, including the cost of piping systems. The effect cannot be expected very much.
そこで、 本願出願人は、 上記の如く欠点の多い電磁弁を使わない、 連続洗浄装 置用の新しいタイプの洗浄液循環濃縮システムを創案し、 先に、 「特願平 7— 3 3 9 2 7 2」 として特許出願した。  Accordingly, the applicant of the present application has created a new type of cleaning liquid circulation / concentration system for a continuous cleaning apparatus that does not use a solenoid valve having many disadvantages as described above, and has previously described “Japanese Patent Application No. 7-333992. 2 ”as a patent application.
この先願発明になる洗浄液循環濃縮システムは、 図 1 0及び図 1 1に示した様 に、 複数の洗浄液タンク 5 3〜5 6を、 洗浄室 5 1の排液口 5 1 aを取囲む様に して、 その下側に設置している。  As shown in FIGS. 10 and 11, the cleaning liquid circulation / concentration system according to the invention of the prior application includes a plurality of cleaning liquid tanks 53 to 56 surrounding the drain port 51 a of the cleaning chamber 51. And it is installed underneath.
排液口 5 1 aには、 モータ及びベルト ·プーリ一を用いた回動手段によって、 水平向きに回転自在の導液樋 5 7を連結して、 洗浄液の流路切替機構 Cとしてい る。  The drainage port 51a is connected to a horizontally rotatable liquid guide gutter 57 by a rotating means using a motor, a belt and a pulley to form a cleaning liquid flow path switching mechanism C.
即ち、 洗浄室 5 1からの流出排液は、 導液樋 5 7を適宜に回動させることによ つて、 洗浄液タンク 5 3〜5 6のいずれかに選択的に流入させることが出来る。 図中の符号 5 8は、 導液樋 5 7の回動位置センサ群である。  That is, the effluent discharged from the cleaning chamber 51 can be selectively flown into any of the cleaning liquid tanks 53 to 56 by appropriately rotating the liquid guide gutter 57. Reference numeral 58 in the figure denotes a group of rotation position sensors for the liquid guide gutter 57.
ところが、 洗浄液循環濃縮システム全体を、 極力コンパク ト化することを目的 としてなされた、 この 「特願平 7— 3 3 9 2 7 2」 の発明にも、 尚、 改良の余地 が残されていた。 即ち、 流路切替機構 Cは、 その背丈を更に低く抑えることが望ましい。 ベルト -プーリーによる伝動機構は、 保守の手間と経費が嵩む。 又、 腐蝕性洗浄液への 防護対策が欠如している。 等々である。 However, there was still room for improvement in the invention of Japanese Patent Application No. 7-339392, which was aimed at making the entire washing liquid circulation / concentration system as compact as possible. . That is, it is desirable that the height of the flow path switching mechanism C be further reduced. The belt-pulley transmission mechanism requires a lot of labor and cost for maintenance. Lack of protective measures against corrosive cleaning solutions is also lacking. And so on.
そこで、 本発明の目的は、 前記した本願出願人の先願発明になる物品の洗浄方 法の極めて優れた特長である、 洗浄液の必要量の大幅節減、 及び洗浄液中の有用 成分を濃縮して回収し易くする利点に加えて、 この方法に用いる洗浄装置の、 よ りコンパクト化、 メンテナンスフリー化、 構造の簡素化等も達成した、 連続洗浄 装置用の洗浄液循環濃縮システムを提供するにある。 発明の開示  Therefore, an object of the present invention is to significantly reduce the required amount of a cleaning solution and to concentrate useful components in the cleaning solution, which are extremely excellent features of the method for cleaning an article according to the prior application of the present applicant. An object of the present invention is to provide a cleaning liquid circulating and concentrating system for a continuous cleaning apparatus, in which, in addition to the advantage of facilitating recovery, the cleaning apparatus used in this method has also been made more compact, maintenance-free, and simplified in structure. Disclosure of the invention
上記の目的を達成する為の、 本発明による連続洗浄装置用の洗浄液循環濃縮シ ステムは、  In order to achieve the above-mentioned object, a cleaning solution circulating concentration system for a continuous cleaning device according to the present invention comprises:
洗浄室 5 1と、 該洗浄室の排液口 5 1 aを取巻く配置を以てその下側に設置し た複数の洗浄液タンクと、 前記排液口からの排出液を前記複数の洗浄液タンクに、 その液中の汚れ成分濃度が濃いタンクから薄いタンクの順に逐次流入させる流路 切替機構 Aとを備えており、  A cleaning chamber 51, a plurality of cleaning liquid tanks arranged below the drainage port 51a of the cleaning chamber so as to surround the drainage port 51a, and a discharge liquid from the drainage port to the plurality of cleaning liquid tanks. It is equipped with a flow path switching mechanism A that successively flows in the order from a tank with a high concentration of dirt components in a liquid to a tank with a low concentration,
該流路切替機構 Aは、  The channel switching mechanism A is
排液口 5 1 aの下面に摺接する液入口 4をその上面中央部に設けた回転分配盤 1、 及びその回動手段並びに回動制御部と、  A rotary distribution plate 1 provided with a liquid inlet 4 slidably in contact with the lower surface of the drainage port 5 1a at the center of the upper surface, and its rotating means and a rotating control unit;
洗浄室 5 1の下面に取着されて、 回転分配盤 1を回動自在に支持する回転盤支 持部材 2とを備えており、  A rotating plate supporting member 2 attached to the lower surface of the washing chamber 51 to rotatably support the rotating distribution plate 1;
回転分配盤 1の上面の液入口 4から底面周縁部に向けて形成した液流下路 6の 液出口 5が、 回転分配盤 1の回動に伴って、 複数の洗浄液タンクの夫々に、 濃度 の濃いタンクから薄いタンクに向けて順次臨む様に構成したことを特徴とする。 そして、 回動手段は、 回転分配盤 1の外周面に設けたリングギア、 及びこのギ ァに嚙合するピニオンと、 このピニオンを 1組のベベルギアを介して回転させる モータとを備える構成にするとよい。  The liquid outlet 5 of the liquid flow passage 6 formed from the liquid inlet 4 on the upper surface of the rotary distribution plate 1 to the peripheral edge of the bottom surface, and the rotation of the rotary distribution plate 1 causes the concentration of each of the plurality of cleaning liquid tanks to be reduced. It is characterized in that it is constructed so as to sequentially face from a thick tank to a thin tank. The rotating means may be configured to include a ring gear provided on the outer peripheral surface of the rotation distribution board 1, a pinion that matches the gear, and a motor that rotates the pinion via a set of bevel gears. .
回動手段は、 回転分配盤 1の外周面に設けたウォームホイールと、 これに嚙合 させたウォームを回転させるモータとを備える構成にしてもよレ、。 或いは、 回転分配盤 1の外周面に設けたスプロケットと、 このスプロケットを 回転駆動するモータ及びチェーン等との組合わせから成る回動手段を用いてもよ レ、。 The rotation means may be configured to include a worm wheel provided on the outer peripheral surface of the rotation distribution board 1 and a motor for rotating the worm combined with the worm wheel. Alternatively, a rotating means composed of a combination of a sprocket provided on the outer peripheral surface of the rotation distributor 1 and a motor and a chain for rotating the sprocket may be used.
更に、 回転分配盤 1の液出口 5からの落下する排出液を、 その直下の複数の洗 浄液タンクの各液面迄に誘導して、 落下液が液面上で跳ね返るのを防ぐ排出液誘 導部材 Bを、 回転盤支持部材 2の下面に連結し、  Furthermore, the discharged liquid that falls from the liquid outlet 5 of the rotary distribution board 1 is guided to each liquid surface of a plurality of washing liquid tanks immediately below the liquid outlet 5 to prevent the falling liquid from bouncing on the liquid surface. Connecting the guide member B to the lower surface of the turntable support member 2,
この排出液誘導部材 Bは、 回転分配盤 1の回転に伴って、 その液出口 5に順次 連通させ得る様に配設した複数の通液孔 4 2を備える孔開板 4 1と、  The drainage guide member B includes a hole opening plate 41 having a plurality of liquid passage holes 42 arranged so as to be able to sequentially communicate with the liquid outlet 5 with the rotation of the rotation distribution plate 1,
各通液孔 4 2の下端に夫々連結されて、 排出液を複数の洗浄液の夫々の液面に 導く導液筒 4 5とを備える構成にするとよい。  It is preferable to provide a liquid guide cylinder 45 connected to the lower end of each liquid passage hole 42 and guiding the discharged liquid to the liquid surface of each of the plurality of cleaning liquids.
そして、 各導液筒 4 5には、 その設置スペースの状況に応じて任意の空間的配 置を以て設置された、 複数の洗浄液タンクの夫々の液面に達する延長パイプ 4 6 を取付けるとよレ、。 図面の簡単な説明  Each of the liquid guide cylinders 45 is provided with an extension pipe 46 that reaches each liquid level of a plurality of cleaning liquid tanks, which is installed in an arbitrary spatial arrangement according to the installation space condition. ,. BRIEF DESCRIPTION OF THE FIGURES
図 1は、 本発明の一実施例を示すもので、 洗浄室に取付けた状態での、 流路切 替機構の縦断面図、 図 2は、 同上、 流路切替機構の一半側部分の底面視図、 図 3 は、 同上、 洗浄液循環濃縮システムの要部を示す側面図、 図 4は、 同上、 洗浄室 を省いて示す、 図 3の平面視図、 図 5は、 流路切替機構の下面に、 排出液誘導部 材を連結した他の実施例を示すもので、 その連結状態を示す縦断面図、 図 6は、 同上、 排出液誘導部材の半縦断面図、 図 7は、 同上、 排出液誘導部材の底面図、 図 8は、 同上、 各誘導筒に、 延長パイプを取付た状態を、 洗浄液タンク群と共に 示した部分破断側面図、 図 9は、 本発明の先願発明 「特開平 3— 4 4 8 3 0」 の 洗浄方法に用いる装置の、 全体構成を説明した見取図、 図 1 0は、 本発明の先願 発明 「特開平 7— 3 3 9 2 7 2」 の洗浄液循環濃縮システムの、 要部の側面図、 図 1 1は、 同上、 図 1 0の平面視図である。 発明を実施するための最良の形態  FIG. 1 shows an embodiment of the present invention, and is a longitudinal sectional view of a flow path switching mechanism in a state where the flow path switching mechanism is attached to a cleaning chamber. FIG. View, Fig. 3 is the same as above. Side view showing the main part of the washing liquid circulating and concentrating system. Fig. 4 is the same as above. Fig. 3 is a plan view of the same with the washing chamber omitted. FIG. 6 is a vertical cross-sectional view showing another embodiment in which the drainage guide member is connected to the lower surface, showing the connected state, FIG. 6 is the same as above, FIG. , A bottom view of the drainage guide member, and FIG. 8 is a partially cutaway side view showing the state in which an extension pipe is attached to each guide cylinder together with the cleaning liquid tank group, and FIG. FIG. 10 is a schematic diagram illustrating the overall configuration of an apparatus used in the cleaning method of “Japanese Patent Application Laid-Open No. 3-44830”. FIG. FIG. 11 is a side view of a main part of the cleaning liquid circulation / concentration system of “Japanese Patent Application Laid-Open No. 7-33932”, and FIG. 11 is a plan view of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
以下に、 本発明の一実施例に就いて、 囱1〜図 4を参照しながら説明する。 図 3及び図 4に、 この実施例の洗浄液循環濃縮システムの要部の構成を、 側面 図及び平面図として示した。 An embodiment of the present invention will be described below with reference to FIGS. 3 and 4 show a side view and a plan view of the configuration of the main part of the cleaning liquid circulation / concentration system of this embodiment.
即ち、 図中の 5 1は洗浄室で、 その排液口 5 1 aの直下に、 洗浄液の流路切替 機構 Aを、 取付用部材 5 9を介して連結させている。  That is, in the drawing, reference numeral 51 denotes a cleaning chamber, and a cleaning liquid flow path switching mechanism A is connected directly below the drain port 51a via a mounting member 59.
そして、 流路切替機構 Aの下側には、 直方体形をした 4つの洗浄液タンク 3 1 ~ 3 4 (以後、 単にタンクと言う) を、 排液口 5 1 aを取巻く様にして、 田の字 形に近接させた配置で設置している。  On the lower side of the flow path switching mechanism A, four rectangular parallelepiped cleaning liquid tanks 3 1 to 3 4 (hereinafter simply referred to as tanks) are arranged so as to surround the drain port 51 a. They are installed close to the shape.
この 4つのタンクのうち、 タンク 3 1は、 洗浄開始当初に排出されて、 汚れ度 合いが最もひどい洗浄液を、 循環させずに溜めて置く貯留タンクとなる。  Of these four tanks, tank 31 is a storage tank that is discharged at the beginning of cleaning and stores the heaviest cleaning liquid without circulating it.
本発明が、 前記の先願発明 「特願平 7— 3 3 9 2 7 2」 と異なる点は、 流路切 替機構 Aの構成にある。  The present invention is different from the above-mentioned prior application “Japanese Patent Application No. 7-333972” in the configuration of the flow path switching mechanism A.
そこで、 以下は、 主として、 流路切替機構 Aの構成に限って説明する。  Therefore, the following description will be mainly limited to the configuration of the flow path switching mechanism A.
図 1に示した様に、 流路切替機構 Aは、 洗浄室 5 1の下面に固着された取付用 部材 5 9の平坦な底面に、 連結ボルト 9 0を用いて密着状態で取付けている。 流路切替機構 Aの概略の構成は、 図 1及び図 2に示した様に、 排液口 5 1 aの 周りに水平向きに回転自在で、 排液口 5 1 aからの流出排液を、 4つのタンク 3 :!〜 3 4に、 その液中の汚れ成分濃度が濃いタンクから薄いタンクの順に逐次流 入させる役割を果たす回転分配盤 1を、 回転盤支持部材 2の内空部に、 回転自在 に組込んでいる。  As shown in FIG. 1, the flow path switching mechanism A is attached to the flat bottom surface of an attachment member 59 fixed to the lower surface of the cleaning chamber 51 by using a connection bolt 90 in a tightly contacted state. The schematic configuration of the flow path switching mechanism A is, as shown in FIGS. 1 and 2, rotatable in a horizontal direction around the drain port 51a, so that the liquid discharged from the drain port 51a is discharged. The four distribution tanks 3:! ~ 3 4 are equipped with a rotating distribution plate 1 which plays the role of successively flowing from the tank with the higher concentration of dirt components in the liquid to the tank with the lower concentration. , It is freely rotatable.
回転盤支持部材 2の側面には、 回 ί云分配盤 1の駆動源となるモータ 3を取付け ている。  A motor 3 serving as a driving source of the spin distribution board 1 is mounted on a side surface of the turntable support member 2.
この実施例の回転分配盤 1は金属又は合成樹脂製で、 厚手の円盤状プロックか ら成り、 その上面中央部には、 洗浄室 5 1の排液口 5 1 aに摺接状態で連通させ る、 液入口 4を開口させ、 下面周縁部の 1個所には、 液出口 5を設けている。 そして、 液入口 4と液出口 5とは、 回転分配盤 1を刳り抜く様に設けた液流下 路 6を介して連通させている。  The rotary distribution board 1 of this embodiment is made of a metal or synthetic resin, and is made of a thick disk-shaped block. The center of the upper surface is slidably connected to the drain port 51 a of the cleaning chamber 51. A liquid inlet 4 is opened, and a liquid outlet 5 is provided at one location on the lower peripheral edge. The liquid inlet 4 and the liquid outlet 5 communicate with each other via a liquid flow passage 6 provided so as to hollow out the rotary distribution board 1.
回転分配盤 1の外周面には、 リングギア 7を嵌着させている。  A ring gear 7 is fitted on the outer peripheral surface of the rotary distribution board 1.
又、 回転分配盤 1の上面には、 取付用部材 5 9の平坦な下面に摺接する環状パ ッキン 8を、 液入口 4を包囲する配置で設けている。 回転盤支持部材 2は、 上半部 2 Aと下半部 2 Bとを、 連結ボルト 9により合体 させた構成を備えている。 An annular packing 8 slidably in contact with the flat lower surface of the mounting member 59 is provided on the upper surface of the rotary distribution board 1 so as to surround the liquid inlet 4. Rotary disc supporting member 2, the upper half 2 A and the lower half 2 B, and a structure in which is united by a connecting bolt 9.
回転分配盤 1は、 この上半部 2 Aに設けた内空部に内嵌させたベアリング 1 0 を介して、 回転盤支持部材 2に回動自在に支持されている。  The turntable 1 is rotatably supported by the turntable support member 2 via a bearing 10 fitted in an inner space provided in the upper half 2A.
環状ケーシング状の回転盤支持部材 2の、 上半部 2 Aの上面と、 取付用部材 5 9との当接面、 及び上半部 2 Aの內周面と回転分配盤 1の外周面との間に設けた 環状空隙 aには、 夫々液密保持用の環状パッキン 1 1及び 1 2を配設している。 回転盤支持部材 2の平面視形状は、 図 2に示した様に、 円形盤の外周面の 1個 所を膨出させた形態を備えており、 この膨出個所をギアボックス部 2 Cとしてい る。  The upper surface of the upper half 2 A of the annular casing-shaped turntable support member 2, the contact surface between the mounting member 59, and the outer peripheral surface of the upper half 2 A and the outer peripheral surface of the rotary distribution plate 1. Annular packings 11 and 12 for maintaining the liquid tightness are disposed in the annular gaps a provided between them. As shown in FIG. 2, the rotary plate supporting member 2 has a shape in which one portion of the outer peripheral surface of the circular disk is bulged as shown in FIG. 2, and this bulging portion is used as a gear box portion 2C. Yes.
ギアボックス部 2 Cの側端面には、 可変速のモータ 3を取付けている。  The variable speed motor 3 is mounted on the side end face of the gear box 2C.
ギアボックス部 2 Cには、 リングギア 7に嚙合するピニオン 1 3のギア軸 1 4 を支承する、 上下 1組の軸受 1 5 , 1 5を組込んでいる。 ギア軸 1 4,には、 ベべ ルギア 1 6を軸嵌させている。  The gearbox section 2C incorporates a pair of upper and lower bearings 15 and 15 that support the gear shaft 14 of the pinion 13 that is coupled to the ring gear 7. A bevel gear 16 is fitted on the gear shaft 14.
このへベルギア 1 6には、 モータ 3の出力軸 1 7に軸嵌した別のベベルギア 1 This bevel gear 16 has another bevel gear 1 fitted on the output shaft 17 of the motor 3.
8が嚙合される。 8 is combined.
更に、 回転分配盤 1の外周面には、 4つのタンク 3 1〜3 4の配置に対応した 計 4個所に、 回転分配盤 1の回転位置検知用の、 回転位置表示部 2 1を取付けて いる。  Furthermore, on the outer peripheral surface of the rotary distribution board 1, a rotation position display section 21 for detecting the rotation position of the rotary distribution board 1 is attached at a total of four locations corresponding to the arrangement of the four tanks 31 to 34. I have.
一方、 環状ケーシング 2の下半部 2 Bの下面には、 各回転位置表示部 2 1に対 応した夫々の位置に、 回転位置センサ 2 2を取付けている。  On the other hand, on the lower surface of the lower half 2 B of the annular casing 2, rotation position sensors 22 are mounted at respective positions corresponding to the respective rotation position display sections 21.
各回転位置センサ 2 2は、 図 2に示した様に、 環状ケーシング 2の周方向に沿 つて、 変位可能な円弧状帯板 2 3に取付けている。  As shown in FIG. 2, each rotation position sensor 22 is attached to a displaceable arc-shaped strip 23 along the circumferential direction of the annular casing 2.
円弧状帯板 2 3には、 その円弧に沿う配置で長孔 2 4を設けてある。  The arc-shaped strip 23 is provided with a long hole 24 arranged along the arc.
そして、 この長孔 2 4に揷通させたボルト 2 5を、 環状ケーシング 2の螺孔に 螺止することによって、 回転位置センサ 2 2の固定位置を微調整可能にしている c 流路切替機構 Aには、 既述の如く、 洗浄室 5 1内の洗浄物品 7 0の洗浄過程で、 排液口 5 1 aから排出させた洗浄排液を、 複繫のタンク 3 1〜3 4に順次切替え て流入させる為に、 回転分配盤 1の回転動を制御するモータ 3の、 回動制御部 (図示略) を付属させている。 Then, the bolt 2 5 was揷通in the elongated hole 2 4, by Nishitome the threaded hole of the annular casing 2, c passage switching mechanism fixed position of the rotational position sensor 2 2 which enables fine adjustment In A, as described above, during the cleaning process of the cleaning articles 70 in the cleaning chamber 51, the cleaning liquid discharged from the liquid discharging port 51a is sequentially transferred to the multiple tanks 31 to 34. Rotation control unit of motor 3 that controls the rotation of rotation distribution board 1 (Not shown) is attached.
次に、 上記実施例の作用に就いて説明する。  Next, the operation of the above embodiment will be described.
本発明による洗浄液循環濃縮システムの作動原理は、 冒頭に記した、 洗浄液の 使用量を顕著に節減出来ると共に、 洗浄液を濃縮して有用成分の回収 ·再利用を 容易にすることを特徴とする、 本願出願人の先願発明のそれに準ずる。  The principle of operation of the washing solution circulating concentration system according to the present invention is characterized in that, at the beginning, the amount of washing solution used can be significantly reduced, and the washing solution is concentrated to facilitate recovery and reuse of useful components. It is equivalent to that of the prior application of the present applicant.
尚、 本発明の特徴部分は、 既述の如く流路切替機構 Aにある。  The feature of the present invention resides in the flow path switching mechanism A as described above.
今、 洗浄液循環濃縮システムが運転中で、 洗浄室 5 1内の噴射ノズル 6 0に、 タンク 3 2内の洗浄液を供給する、 一次洗浄工程にあるとする。  Now, it is assumed that the cleaning liquid circulation / concentration system is in operation, and that the cleaning liquid in the tank 32 is supplied to the injection nozzle 60 in the cleaning chamber 51 in the primary cleaning step.
この時、 回転分配盤 1は、 回動制御部からの指示を受けて作動するモータ 3に よって、 その液出口 5を、 タンク 3 1の直上にもたらされている。  At this time, the liquid distributor 5 of the rotation distribution board 1 is brought directly above the tank 31 by the motor 3 that operates in response to an instruction from the rotation control unit.
この状態で、 タンク 3 2内の洗浄液を、 噴射ノズル 6 0に循環供給する。  In this state, the cleaning liquid in the tank 32 is circulated and supplied to the injection nozzle 60.
この間に、 洗浄開始当初の汚れのひどい洗浄液は、 タンク 3 1内に貯留される。 所定時間が経過すると、 洗浄液の供給が一旦停止されたうえ、 回動制御部から の指示に従ってモータ 3が起動される。 During this time, the very dirty cleaning liquid at the beginning of the cleaning is stored in the tank 31. When the predetermined time has elapsed, the supply of the cleaning liquid is temporarily stopped, and the motor 3 is started in accordance with an instruction from the rotation control unit.
すると、 モータ 3の回転動を、 1組のベベルギア 1 6, 1 8、 ピニオン 1 3及 びリングギア 7を介して伝えられた回転分配盤 1が回動し始める。  Then, the rotation of the motor 3 is transmitted through the set of bevel gears 16 and 18, the pinion 13 and the ring gear 7, and the rotation distributor 1 starts rotating.
そして、 回転盤支持部材 2の下面に取付けてある、 洗浄液タンク 3 2用の回転 位置センサ 2 2が、 回転分配盤 1側の対応した回転位置表示部 2 1を検知すると、 この検知信号によりモータ 3は停止する。  When the rotation position sensor 22 for the cleaning liquid tank 32 attached to the lower surface of the turntable support member 2 detects the corresponding rotation position display section 21 on the rotation distribution plate 1, the detection signal indicates that the motor 3 stops.
この時、 回転分配盤 1の液出口 5は、 タンク 3 2の直上位置にもたらされてい る。  At this time, the liquid outlet 5 of the rotary distribution board 1 is brought to a position immediately above the tank 32.
そこで、 タンク 3 2からの、 噴射ノズル 6 0へ洗浄液の循環供給が再開される そして、 所定時間が経過すると、 噴射ノズル 6 0への洗浄液の供給は停止されて、 一次洗浄工程を終える。  Then, the circulation supply of the cleaning liquid from the tank 32 to the injection nozzle 60 is restarted. When a predetermined time has elapsed, the supply of the cleaning liquid to the injection nozzle 60 is stopped, and the primary cleaning step is completed.
次に、 二次洗浄工程に移る。  Next, the process proceeds to the secondary cleaning step.
この工程の当初期間は、 回転分配盤 1の液出口 5は、 タンク 3 2上位置し、 噴 射ノズル 6 0には、 より汚れ度合いの少ないタンク 3 3内の洗浄液が循環供給さ れる。  In the initial period of this process, the liquid outlet 5 of the rotary distribution board 1 is located above the tank 32, and the cleaning liquid in the tank 33 with a lower degree of contamination is supplied to the spray nozzle 60 in a circulating manner.
そして、 所定時間が経過すると、 回転分配盤 1の液出口 5を、 タンク 3 3上に 移動させたうえ、 引き継き、 タンク 3 3内の洗浄液による洗浄が所定時間継続さ れて、 二次洗浄工程を終える。 Then, when a predetermined time has elapsed, the liquid outlet 5 of the rotary distribution board 1 is placed on the tank 33. After being moved, the cleaning is continued with the cleaning liquid in the tank 33 for a predetermined time, and the secondary cleaning process is completed.
続いて、 タンク 3 4内の更に汚れ度合いの少ない洗浄液を用いた、 三次洗浄ェ 程を、 第二次洗浄工程と同様にして進行させる。  Subsequently, a tertiary cleaning step using a cleaning liquid with a lower degree of contamination in the tank 34 is performed in the same manner as in the second cleaning step.
流路切替機構 Aは、 図 1から容易に理解される様に、 その高さ寸法を、 極力低 く抑えられる構造になっている。  As is easily understood from FIG. 1, the flow path switching mechanism A has a structure in which the height dimension can be kept as low as possible.
その分、 洗浄液循環濃縮システム全体の背丈をかなり低くすることが出来、 限 られたスペースの設置場所にも、 このシステムを無理なく納められる様になる。 又、 流路切替機構 Aは、 図 1に示した様に、 その全体が完全な液密構造になつ ている。 その為、 腐食性のある洗浄液を扱う場合でも、 その保守 ·管理の為の手 間と経費を殆ど省け、 且つ、 十分な耐久性を確保出来る。  As a result, the overall height of the washing solution circulating and concentrating system can be considerably reduced, and the system can be easily installed in a limited space. Further, as shown in FIG. 1, the flow path switching mechanism A has a complete liquid-tight structure as a whole. Therefore, even when using a corrosive cleaning solution, the maintenance and management of the cleaning solution can be reduced in labor and cost, and sufficient durability can be ensured.
上記実施例に於いて、 回転分配盤 1の厚さや直径寸法、 そして、 液流下路 6の 形状や設け方等は、 洗浄液循環濃縮システム全体の規模や、 その各構成要素の形 状 ·配置の如何に応じて、 適宜に設計変更すればよい。  In the above embodiment, the thickness and diameter of the rotary distribution board 1 and the shape and arrangement of the liquid flow-down passage 6 are determined by the scale of the entire washing liquid circulation / concentration system and the shape and arrangement of each component thereof. The design may be changed as appropriate.
又、 上記実施例では、 回転分配盤 1の回動手段として、 モータ 3の回転動を、 ピニオンとリングギアを介して伝える様にしている。  Further, in the above-described embodiment, the rotation of the motor 3 is transmitted through the pinion and the ring gear as the rotation means of the rotation distribution board 1.
然し、 リングギアとピニオンの組合わせに代えて、 ウォームホイールとウォー ムとの組合わせを採ってもよい。  However, a combination of a worm wheel and a worm may be used instead of a combination of a ring gear and a pinion.
或いは、 スプロケットとチェーンとの組合わせ等によってもよい。  Alternatively, a combination of a sprocket and a chain may be used.
次に、 図 5〜図 8は、 流路切替機構 Aの下側に、 排出液誘導部材 Bを連結した 点が、 上記実施例とは相異する、 本発明の他の実施例を示している。  Next, FIGS. 5 to 8 show another embodiment of the present invention, which is different from the above embodiment in that the drainage guide member B is connected to the lower side of the flow path switching mechanism A. I have.
この排出液誘導部材 Bは、 回転分配盤 1の液出口 5から排出された洗浄液を、 その直下の複数のタンク 3 1〜3 4の各液面まで誘導して、 落下液が液面上で跳 ね返るのを防ぐ役割を果たすものである。  The discharged liquid guide member B guides the cleaning liquid discharged from the liquid outlet 5 of the rotary distribution board 1 to each liquid surface of the plurality of tanks 31 to 34 immediately below, so that the falling liquid flows on the liquid surface. It serves to prevent bouncing.
排出液誘導部材 Bは、 図 5に示した様に、 流路切替機構 Aの回転分配盤 1の回 転に伴って、 その液出口 5に順次連通させ得る様に配設した複数の、 この場合は 4つの通液孔 4 2を備えた孔開板 4 1を、 その本体部としている。  As shown in FIG. 5, the discharge guide member B includes a plurality of discharge guide members B arranged so as to be able to communicate sequentially with the liquid outlet 5 as the rotary distributor 1 of the flow path switching mechanism A rotates. In this case, a hole opening plate 41 having four liquid passage holes 42 is used as its main body.
この孔開板 4 1は、 その周縁部の複数箇所に配置した締結ポルト 4 3によって、 回転盤支持部材 2の下面に連結させている。 孔開板 4 1が回転分配盤 1に摺接する部分には、 液密用のパッキン 4 4を配設 している。 The perforated plate 41 is connected to the lower surface of the turntable support member 2 by fastening ports 43 disposed at a plurality of locations on the periphery. A liquid-tight packing 44 is provided at a portion where the hole opening plate 41 comes into sliding contact with the rotary distribution plate 1.
そして、 各通液孔 4 2の下端には、 液出口 5からの排出液を、 複数のタンク 3 1〜3 4の夫々の液面に導く為の、 エルボ状の導液筒 4 5を連結している。  An elbow-shaped liquid guide cylinder 45 is connected to the lower end of each liquid passage hole 42 for guiding the liquid discharged from the liquid outlet 5 to the liquid surface of each of the plurality of tanks 31 to 34. are doing.
更に、 各導液筒 4 5には、 図 8に示した様に、 夫々に対応した各タンク 3 1〜 3 4の液面迄達する長さの、 延長パイプ 4 6を夫々連結している。  Further, as shown in FIG. 8, an extension pipe 46 having a length reaching the liquid level of each of the tanks 31 to 34 is connected to each of the liquid guide cylinders 45, respectively.
この液面の高さは、 洗浄装置の運転中に経時変動するので、 延長パイプ 4 6の 長さは、 液面が最も下がった時でも、 その下端が液面に接する様に設定している。 そして、 延長パイプ 4 6の下端部が液面下に没している時に、 パイプ内に閉じ 込められた空気が、 排出液の流下を妨げない様に、 延長パイプ 4 6の上端側には、 空気抜孔 4 6 aを設けている。  Since the height of this liquid level fluctuates with time during operation of the cleaning device, the length of the extension pipe 46 is set so that the lower end of the extension pipe 46 is in contact with the liquid level even when the liquid level drops to the lowest level. . And, when the lower end of the extension pipe 46 is submerged below the liquid level, the air trapped in the pipe does not prevent the drainage liquid from flowing down. Air vent holes 46a are provided.
この様にすれば、 流路切替機構 Aの液出口 5から洗浄液タンク 3 1〜3 4内の 液面に向けて落下した排出液が、 液面上で跳ね返ることによって、 夫々汚れ度合 いが異なる瞵接タンクの洗浄液同士が混じり合ってしまう不都合を確実に防げる 又、 流路切替機構 Aの下側に、 跳ね返り液が付着する不具合も解消出来る。 ところで、 本発明システムを使用するメツキ工場等では、 過去の、 相次ぐ設備 増設によって、 新たに洗浄液タンクを設置するスペースを確保するのに苦労する 場合も少なぐない。  In this way, the discharged liquid that has fallen from the liquid outlet 5 of the flow path switching mechanism A toward the liquid surface in the cleaning liquid tanks 31 to 34 rebounds on the liquid surface, and thus the degree of contamination differs, respectively. (5) The inconvenience that the cleaning liquids in the contact tank are mixed with each other can be reliably prevented. Also, the problem that the rebound liquid adheres to the lower side of the flow path switching mechanism A can be solved. By the way, in a plating factory or the like using the system of the present invention, it is often difficult to secure a space for newly installing a cleaning liquid tank due to a series of additional facilities in the past.
その様な場合に、 延長パイプ 4 6を有効活用すれば、 洗浄室 5 1から隔たった 場所にも、 距離的制約を受けずに、 自由に洗浄液タンクを設置することが可能に なる。 産業上の利用可能性  In such a case, if the extension pipe 46 is effectively used, the washing liquid tank can be freely installed in a place separated from the washing room 51 without restriction on the distance. Industrial applicability
以上の説明によって明らかな様に、 本発明による連続洗浄装置用の洗浄液循環 濃縮システムは、 冒頭に記した先願発明と同様に、 洗浄液の必要量を顕著に減ら せ、 且つ、 洗浄排液中の有用成分濃度を高めることによって、 公害対策としての 排液処理費や、 排液中の有用成分の回収費を大幅に節減出来る効果に加えて、 流路切替機構の構造を改良したことによって、 以下に列挙した如き、 より優れ た効果が得られる。 (a) 流路切替機構の高さ寸法を顕著に短縮させ得たことによって、 洗浄液循 環濃縮システム全体を、 限られた広さの設置場所に無理なく納められる様になる。 As is clear from the above description, the cleaning liquid circulation / concentration system for the continuous cleaning apparatus according to the present invention can significantly reduce the required amount of the cleaning liquid, By increasing the concentration of useful components, the cost of wastewater treatment as a countermeasure against pollution and the effect of greatly reducing the cost of recovering useful components in the wastewater are greatly reduced. As described below, more excellent effects can be obtained. (a) The remarkable reduction in the height of the flow path switching mechanism makes it possible to fit the entire cleaning liquid circulating and concentrating system in a limited space.
(b) 従って、 既存工場での、 洗浄設備の更新や改造等も行い易くなる。  (b) Therefore, it is easy to upgrade or remodel the cleaning equipment at the existing factory.
(c) 流路切替機構は、 完全な液密構造になっているので、 殊に、 腐食性のあ る洗浄液を扱う場合でも、 部品交換等の保守 ·管理の為の手間と経費が省ける。  (c) Since the flow path switching mechanism has a completely liquid-tight structure, the labor and cost for maintenance and management of parts replacement and the like can be saved, especially when handling corrosive cleaning liquids.
(d) 又、 十分な耐久性を備えるので、 その分、 洗浄液循環濃縮システムへの 投資を顕著に節減出来る。  (d) Also, since it has sufficient durability, the investment in the washing liquid circulation and concentration system can be significantly reduced.
(e) 更に、 流路切替機構の下面に、 排出液誘導部材を連結することによって、 各洗浄液タンクの液面上に落下した排出液が跳ね返ることによる、 様々な不都合 を、 確実に解消出来る。  (e) Further, by connecting the drainage guide member to the lower surface of the flow path switching mechanism, various inconveniences caused by the drainage that has fallen on the liquid surface of each washing liquid tank can be reliably eliminated.
( f ) 洗浄液タンクの設置スペースに制約がある場合でも、 延長パイプを活用 すれば、 洗浄室から離れた場所でもタンクを自由に設置出来る。  (f) Even if the installation space for the washing liquid tank is limited, the extension pipe can be used to freely install the tank even at a location away from the washing room.

Claims

請 求 の 範 囲 The scope of the claims
1 . 洗浄室 5 1と、 該洗浄室の排液口 5 1 aを取卷く配置を以てその下側に設 置した複数の洗浄液タンクと、 前記排液口からの排出液を前記複数の洗浄液タン クに、 その液中の汚れ成分濃度が濃いタンクから薄いタンクの順に逐次流入させ る流路切替機構 Aとを備えており、 1. A washing chamber 51, a plurality of washing liquid tanks disposed below the washing chamber 51 with a layout surrounding the drain port 51a of the washing chamber, and a plurality of washing liquids discharged from the drain port. The tank is provided with a flow path switching mechanism A for successively flowing the tank from the tank with the higher concentration of the dirt component in the liquid to the tank with the lower concentration.
該流路切替機構 Aは、  The channel switching mechanism A is
排液口 5 1 aの下面に摺接する液入口 4をその上面中央部に設けた回転分配盤 Drainage port 5 1 Rotary distribution panel with liquid inlet 4 sliding in contact with the lower surface of a at the center of the upper surface
1 . 及ぴその回動手段並びに回動制御部と、 1. and its turning means and turning control unit;
洗浄室 5 1の下面に取着されて、 回転分配盤 1を回動自在に支持する回転盤支 持部材 2とを備えており、  A rotating plate supporting member 2 attached to the lower surface of the washing chamber 51 to rotatably support the rotating distribution plate 1;
回転分配盤 1の上面の液入口 4から底面周縁部に向けて形成した液流下路 6の 液出口 5が、 回転分配盤 1の回動に伴って濃度の濃い順に複数の洗浄液タンクに 臨む様に構成したことを特徴とする連続洗浄装置用の洗浄液循環濃縮システム。 The liquid outlet 5 of the liquid flow path 6 formed from the liquid inlet 4 on the upper surface of the rotary distributor 1 to the peripheral edge of the bottom faces multiple washing liquid tanks in order of increasing concentration as the rotary distributor 1 rotates. A cleaning liquid circulating concentration system for a continuous cleaning device, characterized in that:
2 . 前記回動手段は、 回転分配盤 1の外周面に設けたリングギア、 及びこのギ ァに嚙合するピニオンと、 このピニオンを 1組のベベルギアを介して回転させる モータとを備えることを特徴とする請求の範囲 1記載の連続洗浄装置用の洗浄液 循環濃縮システム。 2. The rotating means includes a ring gear provided on the outer peripheral surface of the rotary distribution board 1, a pinion that fits the gear, and a motor that rotates the pinion via a set of bevel gears. A cleaning liquid circulating concentration system for a continuous cleaning device according to claim 1.
3 . 前記回動手段は、 回転分配盤 1の外周面に設けたウォームホイールと、 こ れに嚙合させたウォームを回転させるモータとを備えることを特徴とする請求の 範囲 1記載の連続洗浄装置用の洗浄液循環濃縮システム。  3. The continuous cleaning apparatus according to claim 1, wherein the rotating means includes a worm wheel provided on an outer peripheral surface of the rotary distribution board 1 and a motor for rotating the worm combined with the worm wheel. Cleaning fluid circulation and concentration system.
4 . 前記回動手段は、 回転分配盤 1の外周面に設けたスプロケットと、 このス プロケットを回転駆動するモータ及びチェーン等との組合わせから成ることを特 徴とする請求の範囲 1記載の連続洗浄装置用の洗浄液循環濃縮システム。  4. The method according to claim 1, wherein the rotating means comprises a combination of a sprocket provided on the outer peripheral surface of the rotary distribution board 1, a motor for rotating the sprocket, a chain, and the like. A cleaning liquid circulating concentration system for continuous cleaning equipment.
5 . 前記回転分配盤 1の液出口 5からの落下する排出液を、 その直下の複数の 洗浄液タンクの各液面迄に誘導して、 落下液が液面上で跳ね返るのを防ぐ排出液 誘導部材 Bが、 回転盤支持部材 2の下面に連結されており、  5. Drained liquid from the liquid outlet 5 of the rotary distribution board 1 is guided to each liquid surface of a plurality of cleaning liquid tanks immediately below the liquid outlet to prevent the falling liquid from bouncing on the liquid surface. The member B is connected to the lower surface of the turntable support member 2,
排出液誘導部材 Bは、 回転分配盤 1の回転に伴って、 その液出口 5に順次連通 させ得る様に配設した複数の通液孔 4 2を備える孔開板 4 1と、 各通液孔 4 2の下端に夫々連結されて、 排出液を複数の洗浄液の夫々の液面に 導く導液筒 4 5とを備えることを特徴とする請求の範囲 1記載の連続洗浄装置用 の洗浄液循環濃縮システム。 The drainage guide member B is provided with a hole opening plate 41 having a plurality of liquid passage holes 42 arranged so as to be able to communicate with the liquid outlet 5 sequentially with the rotation of the rotary distribution board 1; 2. The continuous cleaning apparatus according to claim 1, further comprising a liquid guide cylinder 45 connected to a lower end of each liquid passage hole 42 and guiding the discharged liquid to each of the plurality of cleaning liquids. Washing liquid circulation concentration system.
6 . 前記回転分配盤 1の液出口 5からの落下する排出液を、 その直下の複数の 洗浄液タンクの各液面迄に誘導して、 落下液が液面上で跳ね返るのを防ぐ排出液 誘導部材 Bが、 回転盤支持部材 2の下面に連結されており、  6. Drained liquid from the liquid outlet 5 of the rotary distribution board 1 is guided to each liquid level of a plurality of cleaning liquid tanks directly under the liquid outlet 5 to prevent the falling liquid from bouncing on the liquid level. The member B is connected to the lower surface of the turntable support member 2,
排出液誘導部材 Bは、 回転分配盤 1の回転に伴つて、 その液出口 5に順次連通 させ得る様に配設した複数の通液孔 4 2を備える孔開板 4 1と、  The drainage guide member B is provided with a hole opening plate 41 having a plurality of liquid passage holes 42 arranged so as to be able to communicate with the liquid outlet 5 sequentially with the rotation of the rotation distribution board 1;
各通液孔 4 2の下端に夫々連結されて、 排出液を複数の洗浄液の夫々の液面に 導く導液筒 4 5とを備え、  A liquid guide cylinder 45 connected to the lower end of each liquid passage hole 42 and guiding the discharged liquid to each of the plurality of cleaning liquids;
前記各導液筒 4 5には、 その設置スペースの状況に応じて任意の空間的配置を 以て設置された、 複数の洗浄液タンクの夫々の液面に達する延長パイプ 4 6を取 付けたことを特徵とする請求の範囲 1記載の連続洗浄装置用の洗浄液循環濃縮シ ステム。  Each of the liquid guide cylinders 45 is provided with an extension pipe 46 that is installed in an arbitrary spatial arrangement according to the installation space and reaches the liquid level of each of the plurality of cleaning liquid tanks. The cleaning liquid circulation / concentration system for a continuous cleaning apparatus according to claim 1, which is characterized in that:
PCT/JP2001/004762 2000-06-06 2001-06-06 Cleaning solvent circulating and condensating system for continuous cleaning device WO2001094039A1 (en)

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JP2000-168938 2000-06-06
JP2000168938A JP2001347235A (en) 2000-06-06 2000-06-06 Washing liquid circulating and concentrating system for continuously washing apparatus

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EP2397203A4 (en) * 2009-06-03 2017-11-15 Aisin AW Co., Ltd. Method for recovering component of solution, device for recovering component of solution, and system for impregnation and for recovering impregnant
WO2018048634A1 (en) * 2016-09-08 2018-03-15 Illinois Tool Works, Inc. Clog resistant appliance diverter valve

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GB2027749A (en) * 1978-03-30 1980-02-27 Price Bros Ltd Cleaning and Degreasing Apparatus
JPS6218227B2 (en) * 1976-07-26 1987-04-22 Trinity Ind Corp
JPH0249793B2 (en) * 1983-12-28 1990-10-31 Aizaburo Yagishita
JPH0344830B2 (en) * 1985-03-29 1991-07-09 Aizaburo Yagishita
JPH09174004A (en) * 1995-12-26 1997-07-08 Yagishita:Goushi Flow path switching mechanism for continuous cleaning device
JPH10291160A (en) * 1997-04-21 1998-11-04 Fuji Oozx Inc Recovering device for grinding liquid in grinding device
JP2000091294A (en) * 1998-09-09 2000-03-31 Dainippon Screen Mfg Co Ltd Wafer treatment device

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JPS6218227B2 (en) * 1976-07-26 1987-04-22 Trinity Ind Corp
GB2027749A (en) * 1978-03-30 1980-02-27 Price Bros Ltd Cleaning and Degreasing Apparatus
JPH0249793B2 (en) * 1983-12-28 1990-10-31 Aizaburo Yagishita
JPH0344830B2 (en) * 1985-03-29 1991-07-09 Aizaburo Yagishita
JPH09174004A (en) * 1995-12-26 1997-07-08 Yagishita:Goushi Flow path switching mechanism for continuous cleaning device
JPH10291160A (en) * 1997-04-21 1998-11-04 Fuji Oozx Inc Recovering device for grinding liquid in grinding device
JP2000091294A (en) * 1998-09-09 2000-03-31 Dainippon Screen Mfg Co Ltd Wafer treatment device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2397203A4 (en) * 2009-06-03 2017-11-15 Aisin AW Co., Ltd. Method for recovering component of solution, device for recovering component of solution, and system for impregnation and for recovering impregnant
WO2018048634A1 (en) * 2016-09-08 2018-03-15 Illinois Tool Works, Inc. Clog resistant appliance diverter valve
US11739851B2 (en) 2016-09-08 2023-08-29 Illinois Tool Works Inc. Clog resistant appliance diverter valve

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AU2001262700A1 (en) 2001-12-17

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