WO2001007939A1 - Collimateur et optique de focalisation - Google Patents

Collimateur et optique de focalisation Download PDF

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Publication number
WO2001007939A1
WO2001007939A1 PCT/US2000/040443 US0040443W WO0107939A1 WO 2001007939 A1 WO2001007939 A1 WO 2001007939A1 US 0040443 W US0040443 W US 0040443W WO 0107939 A1 WO0107939 A1 WO 0107939A1
Authority
WO
WIPO (PCT)
Prior art keywords
collimator
guide channel
light
optic
reflector
Prior art date
Application number
PCT/US2000/040443
Other languages
English (en)
Inventor
Richard M. Foster
I. C. Edmond Turcu
Stephen M. Lane
Troy W. Barbee, Jr.
Original Assignee
Jmar Research, Inc.
The Regents Of The University Of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jmar Research, Inc., The Regents Of The University Of California filed Critical Jmar Research, Inc.
Priority to AU71373/00A priority Critical patent/AU7137300A/en
Priority to JP2001512975A priority patent/JP2003528333A/ja
Priority to EP00960174A priority patent/EP1204888A1/fr
Publication of WO2001007939A1 publication Critical patent/WO2001007939A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Definitions

  • This invention relates to an apparatus and method for collecting emitted light, preferably in the x-ray emission spectrum. More particularly, this invention provides a collimator and focusing optic that can collect and direct emitted light, such as in short wavelength radiation lithography and non-lithography operations.
  • X-ray collimators are used in proximity x-ray lithography to transform the spherical radiation field typically produced by a point-like x-ray source into a planar radiation field such as used for x-ray lithography.
  • the baseline x-ray source is a synchrotron.
  • the synchrotron ultimately produces a collimated x- ray beam from x-rays generated from an accelerated electron beam.
  • an advanced x-ray stepper which includes a mask, resist and wafer such an apparatus, has produced sub-tenth micron transistor gates. Since the synchrotron can produce high power, and high wafer throughput has been possible.
  • synchrotron based apparatus there are several disadvantages associated with the use of such a synchrotron based apparatus.
  • known synchotrons are very large, taking up a relatively large amount of space. They also are expensive. Generally the use of a number of steppers is necessary to make them cost effective.
  • one of the steps is the patterning of features in a resist by the illumination through a mask by radiation capable of producing chemical changes in the resist. The use of shorter wavelengths is necessary, as smaller device feature sizes are desired.
  • the x-rays are emitted radially from the point-like source, but a near parallel beam is typically required to correctly illuminate a lithographic mask. Otherwise, compensation for the image distortion produced by the rays passing through the lithographic mask on to the resist layer is typically required, such as by using a special mask to compensate for the distortion.
  • synchrotrons also have been used as the x-ray radiation source.
  • the synchrotron suffers the disadvantages of high cost and inconvenience.
  • a point x-ray source could be used, but a large collection angle collimator/ focusing optic is needed.
  • an x-ray source that can be cost effectively used with a single stepper and is similar in size to the current advanced optical stepper light sources, such as a deep ultraviolet excimer laser.
  • Several attempts have been made to develop such a x-ray source including laser plasma, dense plasma focus, and electron beam systems. Although significant x-ray power can be generated from these x-ray point sources, they suffer a disadvantage in that the radiation is emitted into angles of 2 ⁇ to 4 ⁇ steradians.
  • Various apparatus have been used to attempt to redirect a point source radiation emission field using x-ray optics to redirect x-rays emitted into a uniform intensity and collimated beam.
  • One example is a polycapillary glass tubes and another is a microchannel plate.
  • Solid angles of 0.048 steradian of 1.1 nanometers laser-plasma radiation have been collimated with polycapillary tubes and produced uniform intensities.
  • these apparatus have collimated only a relatively small solid angle of the emitted x-ray field.
  • the solid angle that can be collected and collimated also can be enhanced by using a grazing incidence x-ray reflector or a variable thickness x-ray resonance coating reflector.
  • Resonance coatings have been developed to increase the x-ray critical reflection angle and for 1.1 nanometer radiation, solid angles of 0.21 steradians can be collimated. This solid angle is approximately four times greater than the polycapillary collimator alone. Collimation is achieved with a conical or parabolic reflector with a variable thickness multi-layer x-ray reflective coating.
  • this apparatus suffers a disadvantage in that it does not achieve a highly collimated x-ray beam in the region of the axis of the collimator.
  • a beam block typically is used in the central portion of the collimator and consequently a toroidal x-ray beam is produced.
  • a further disadvantage of this apparatus is that during operation, the collimator must be scanned across the wafer to achieve uniform x- ray exposure on the wafer. Scanning is an added complication and reduces the efficiency of the process and increases the cost of the system.
  • the present invention alleviates to a great extent the disadvantages of the known apparatus and methods for collimating short wavelength light, such as radiation in the x-ray spectrum or light with wavelengths less than about 13 nanometers or other wavelengths that can be suitably reflected and collimated in accordance with the present invention.
  • the present invention provides a high gain x-ray collimator producing a generally uniform intensity profile.
  • a hybrid reflector such as a grazing incidence reflector or resonance reflective optic
  • guide channel such as using polycapillary tubes or microchannel plates
  • a focusing optic is also provided for use in non-lithography applications, such as tomography, x-ray photoelectron spectroscopy, x-ray diffraction, x-ray microscopy and x- ray flourescence.
  • the focusing optic is located at the front (i.e. upstream end) of the collimator to focus the incident light upstream of the reflector and/or guide channel.
  • One such focusing optic is a multi-layer polynomial lens.
  • the guide channel can be made of polycapillary tubes, microchannel plates or a combination of polycapillary tubes and microchannel plates. The guide channel collimates or focuses the central portion of the x-ray beam in a desired shape, such as circular, elliptic, square, or rectangular shape.
  • the reflector can be made of any suitable reflective optic that can reflect the particular light (such as x-rays or ultraviolet) in the desired fashion.
  • parabolic resonance reflector with a shape similar to the polycapillary collimator is used to increase the solid angle collected and produce a circular, square, etc. annular x-ray beam whose inside dimensions are approximately equal to the exit dimensions of the polycapillary collimator.
  • the annular beam shape, intensity profile and collimation angle is adjusted, if necessary, by an absorber, or polycapillary tubes to provide the desired intensity profile at the exit aperture of the hybrid x-ray collimator optic.
  • the reflector may optionally be a focusing optic in order to focus the collimated light to a desired spot.
  • a focusing optic is obtained by placing two generally parabolic reflector optics arranged end-to-end, although the reflector optics need not be identical.
  • the solid angle of the collected radiation is increased.
  • the amount of collimated power delivered by the collimator is increased due to increasing the solid angle in which radiation is collected (i.e. the collection angle).
  • a further advantage of the present invention is that the throughput of exposed wafers in an x-ray lithography process can be increased in that that there is a greater collimated power delivery and that the need for scanning the collimator is reduced because of the greater power delivery.
  • FIG. 1 is a partial cross-sectional side view of an embodiment of a collimator in accordance with the present invention
  • FIG. 2 is a partial cross-sectional side view of another embodiment of a collimator in accordance with the present invention.
  • FIG. 3 is a partial cross-sectional side view of an embodiment of a collimator and focusing optic combination, in accordance with the present invention
  • FIG. 4 is a partial cross-sectional end view of a collimator in accordance with the present invention
  • FIG. 5 is a cross-sectional side view of an embodiment of a collimator in accordance with the present invention
  • FIG. 6 is a cross-sectional side view of another embodiment of a collimator in accordance with the present invention.
  • FIG. 7 is a cross-sectional side view of another embodiment of a collimator in accordance with the present invention.
  • a system for collimating and optionally focusing light, such as preferably light in the x-ray spectrum or light with wavelengths less than about 13 nanometers.
  • Other wavelengths of light also can be collimated or optionally focussed in accordance with the present invention, as well, so long as the light is within the reflective or collimating range of the reflector or guide channel.
  • the term "light” will be used synonymously with the term “radiation” to refer to the wavelengths that are collimated and/or focused in the present invention, for example, in the x-ray spectrum or in wavelengths less than about 13 nanometers.
  • a source 10 such as an x-ray or other light source is provided.
  • the figures illustrate an x-ray source, such as would be used in an x-ray lithography system in which a plasma target, located approximately at the point indicated by source 10 is excited by a beam source, such as a high energy laser, electron beam, proton beam or photon beam.
  • the source 10 emits light in the desired wavelengths.
  • the emitted light is depicted diagrammatically with arrows 20.
  • the collimator 30 includes an optic 40 (which also will be referred to as a reflector apparatus 40) and a guide channel apparatus 50.
  • the reflector serves to gather and reflect in a desired fashion the light 20 from the source 10 that is outside the guide channel 50, but still within the reflector 40, such in the region between the guide channel 50 and the reflector 40, as illustrated in FIGS. 1-3.
  • Any suitable reflector can be used that can reflect the light 20 from the source 10.
  • the reflector 40 is adapted to reflect x-rays.
  • a conical, parabolic resonance reflector or grazing incidence reflector with a shape similar to the guide channel 50 is used to increase the solid angle collected and produce a circular, square, etc. annular x-ray beam whose inside dimensions are approximately equal to the exit dimensions of the polycapillary collimator.
  • any shaped reflector 40 (for example parabolic resonance reflector or grazing incidence reflector) can be used that can achieve collimating and/or focusing the portions of the incoming light that are received and reflected by it.
  • the shape of the exit beam generated can be any shape and does not necessarily need to match the shape of the guide channel 50, although in the preferred embodiment, the exit beam from the reflector 40 does generally match that of the guide channel 50.
  • a grazing incidence reflector or resonance reflective optic can be used as the reflector 40.
  • the reflector 40 is shaped to reflect light into a collimated orientation. In operation, a portion of the incident light 20 hits the reflective inner surface 45 of the reflector 40 and is reflected in a more linear fashion, i.e.
  • the collimated light exiting collimator 30 is illustrated with arrows 60 in FIG. 1.
  • the exiting light 60 preferably has a substantially collimated and uniform intensity profile.
  • the exiting light preferably includes parallel or near parallel beams arranged in any desired pattern, such as an annular, circular, square or ring pattern. This desired pattern optionally may be scanned across the desired location or print field (illustrated as element 220 in FIGS. 6 and 7).
  • the output beam shape, intensity profile and/or collimation angle can be adjusted, if desired, using an absorber 65.
  • an absorber 65 positioned towards the exit end 140 of the collimator 30 can adjust the intensity profile.
  • the intensity of the light exiting the collimator 30 close to the reflector 40 at the exit 140 is less intense than that slightly further away from the reflector 40 at the exit 140, but still outside the guide channel 50. Accordingly, in this embodiment, the light intensity gradually increases with distance from the reflector 40.
  • a graduated absorber may be used.
  • the absorber 65 absorbs less light close to the reflector. The use of such an absorber 65 is particularly beneficial where it is desired to have a uniform intensity profile in the exiting light 60.
  • the guide channel apparatus 50 serves to gather and transmit in a collimated fashion light 20 from the light source 10 that reaches the beginning 70 of the guide channel 50.
  • Any suitable guide channel 50 can be used that gather the incoming light 20 and transmit it in a collimated fashion.
  • the guide channel 50 is adapted to gather and transmit x-rays.
  • plural guide channel elements 80 are in the guide channel 50.
  • the guide channel elements 80 preferably include polycapillary tubes, or microchannel plates, or a combination of polycapillary tubes and microchannel plates are used in the guide channel apparatus 50.
  • the guide channel collimates or focuses the central portion of the x-ray beam in a desired shape, such as circular, elliptic, square, or rectangular shape.
  • the individual guide channel elements i.e. polycapillary tubes and/or microchannel plates
  • the polycapillary tubes or microchannel plates 80 are arranged in any pattern to collect incoming light 80 and transmit it to a desired location.
  • the individual polycapillary tubes 80 within the guide channel 50 can optionally be tapered, such as having a changing width over the length of the tube.
  • the polycapillary tubes 80 can be monolithic such as by being bonded or melted together, or formed within a matrix. As illustrated in FIG. 1, the light 60 exiting the collimator 30 is collimated by the guide channel apparatus 50.
  • the guide channel elements 80 such as polycapillary tubes or microchannel plates 80
  • a portion of the exit beam 60 comes from the reflector and a portion from the guide channel 50.
  • the elements 80 of the guide channel 50 extend to the reflector 40.
  • the exit beam 60 comes from the guide channel 50.
  • a portion of the incoming light 20 is reflected off the reflector 40 and is received in one or more of the guide channel elements 80, i.e. those which are closer to the reflector 40 and oriented to receive light reflected by the reflector 40.
  • Any geometry of the polycapillary tubes or microchannel plates 80 can be used.
  • a half of a generally square cross-sectional arrangement of polycapillary tubes 80 is provided.
  • a circular arrangement can be used as indicated by arc 90 in FIG. 4.
  • One exemplary application of the collimator 30 of the present invention is in x-ray lithography or microlithography.
  • the collimated light 60 exiting from the collimator 30 is received by a mask/photoresist on a wafer or other substrate to be processed.
  • the collimated light 60 is directed using directing optics and/or focusing optics to a desired location.
  • it is desired to focus the emitted light This embodiment is illustrated in FIG. 3.
  • the reflector is shaped as a focusing optic and will be referred to as a "focusing optic 42". Any shape can be selected for the focusing optic 42, which will receive the incoming light and reflect it to a focus location 120. In one embodiment, a generally elliptical cross-sectional shape is used for the focusing optic 42.
  • the focusing optic 42 includes two generally parabolic reflectors 40 linearly arranged. In the embodiment where two reflectors 40 are used, the reflectors optionally may have the same profile, or alternatively may have different profiles.
  • the upstream reflector portion 46 preferably has the same profile as the downstream reflector portion 48, resulting in a reflection of the light towards a focus point 120.
  • FIGS. 1-4 illustrate a cross-section of a top portion of collimators in accordance with the present invention. A full cross-section of the embodiment illustrated in FIG. 1 is shown in FIG. 5.
  • the collimator 30 includes an optic 40 located upstream of the guide channel 50.
  • the optic 40 preferably is a multilayer optic and also preferably is polynomial shaped, although other suitable optics may be used for directing the emitted light 20 in a desired fashion.
  • the optic 40 may be a grazing incidence reflector.
  • straight through light is blocked or filtered in the optic 40 such as by positioning an absorber or filter 230 in the center of the front end 212 of the optic 40 (as illustrated in FIG. 7).
  • the absorber or filter 230 transmits a portion of the x-rays.
  • the optic 40 is selected to preferably illuminate the entire front face of the guide channel 50.
  • the guide channel 50 preferably includes plural guide channel elements 80, such as polycapillary tubes or microchannel plates.
  • the guide channel elements 80 optionally may be straight, or may be curved within the guide channel 50.
  • the optic 40 turns the x-rays through required large angles to orient them generally in a desired direction, enhancing the gain of the collimator 30.
  • the guide channel 50 in this embodiment provides for example adjustment in direction, local divergence and intensity.
  • the exiting light 60 optionally is directed further and ultimately reaches the desired location 220 such as at a mask, imager or a crystalline structure.
  • the exiting light 60 is oriented in a quasi-parallel beam capable of illuminating the location 220 with desired angular characteristics.
  • another optic may be oriented to surround the guide channel 50, as in the configuration illustrated in FIGS. 1-5.
  • an absorber 65 and other elements may also be incorporated in the apparatus of this embodiment, such as discussed elsewhere in this description.
  • the front diameter is 3.148 cm
  • the back diameter is 6.792 cm. and the length is 18.3 cm.
  • the angle from the source 10 to the front 212 of the optic 40 is 14.23° and the angle from the source to the back 214 of the optic 40 is 8.223°.
  • the reflection angle at the optic front is 10.14° and at the optic back is 3.66°.
  • a polynomial shaped reflector optic 40 is used in which a full field illumination pattern having a negative global divergence near its center and a positive global divergence at its outer edge is produced.
  • a beam block absorber 230 is positioned at the center of the front end, so that a region in the center is not illuminated.
  • a guide channel 50 including plural capillary tubes is used, with the capillary tubes having slight curvatures matched to the angles of the incident rays. Rays entering the capillary tubes are reflected multiple times by the smooth interior surfaces and they exit as a parallel or quasi-parallel beam, as discussed in greater detail above.
  • the uniformity of the emitted x-rays 60 can further be enhanced by adjusting the optic 40.
  • incident light 20 such as x-rays
  • the collimator such as optimally through an aperture 130 at the front end 212.
  • a portion of the incident light 20 is reflected off reflector 40 and exits via exit aperture 140.
  • Another portion of the incident light 20 is received within and guided through the guide channel and exits via exit aperture 140.
  • the intensity of the exiting light 60 can be adjusted such as by absorber 65, which preferably is positioned at or near the exit aperture 140.
  • the exit light can be used for x-ray lithography, such as in the manufacture of integrated circuits and other electronic components.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

La présente invention concerne un collimateur (30) à gain élevé qui produit des profils d'intensité globalement uniformes utilisés en lithographie et dans d'autres applications. Le collimateur comprend une optique (42) et un canal (50) de guidage situé en aval de l'optique. Le canal de guidage contient de préférence des tubes (80) à capillaires multiples et/ou des plaques à microcanaux. Les tubes (80) à capillaires multiples servent à collimater ou à concentrer la partie centrale du faisceau à rayons X pour qu'elle présente une forme circulaire, elliptique, carrée ou rectangulaire. Un réflecteur (40) à résonance parabolique, conique ou un réflecteur à incidence rasante présentant une forme similaire à celle du collimateur (30) à capillaires multiples est utilisé pour augmenter l'angle solide collecté et pour produire un faisceau de rayons X circulaire, carré, elliptique, annulaire dont les dimensions utiles sont approximativement égales aux dimensions de sortie du collimateur (30) à capillaires multiples. La forme du faisceau annulaire, le profil d'intensité et l'angle de collimation sont ajustés si besoin par un absorbeur (230) ou par des tubes (80) à capillaires multiples pour obtenir le profil de densité désiré au niveau de l'ouverture de sortie de l'optique du collimateur à rayons X hybride.
PCT/US2000/040443 1999-07-21 2000-07-21 Collimateur et optique de focalisation WO2001007939A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU71373/00A AU7137300A (en) 1999-07-21 2000-07-21 Collimator and focusing optic
JP2001512975A JP2003528333A (ja) 1999-07-21 2000-07-21 コリメータ及びフォーカス光学系
EP00960174A EP1204888A1 (fr) 1999-07-21 2000-07-21 Collimateur et optique de focalisation

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US14548999P 1999-07-21 1999-07-21
US60/145,489 1999-07-21
US20943800P 2000-06-08 2000-06-08
US60/209,438 2000-06-08

Publications (1)

Publication Number Publication Date
WO2001007939A1 true WO2001007939A1 (fr) 2001-02-01

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EP (1) EP1204888A1 (fr)
JP (1) JP2003528333A (fr)
AU (1) AU7137300A (fr)
WO (1) WO2001007939A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1306713A2 (fr) * 2001-10-23 2003-05-02 Nireco Corporation Collimateur et spectrophotomètre
EP1347461A1 (fr) * 2000-12-29 2003-09-24 Muradin Abubekirovich Kumakhov Dispositif de lithographie a rayons x
WO2004095140A2 (fr) * 2003-03-20 2004-11-04 Intel Corporation (A Delaware Corporation) Collecteurs hemispheriques doubles
EP1918697A2 (fr) * 2006-10-10 2008-05-07 Oxford Instruments Analytical Oy Irradiation sélective d'une petite région cible dans la spectroscopie fluorescente par rayons X
CN106371293A (zh) * 2016-11-08 2017-02-01 东莞市北科电子科技有限公司 一种改善led曝光机平行光射出机构

Families Citing this family (2)

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Publication number Priority date Publication date Assignee Title
JP2006126045A (ja) * 2004-10-29 2006-05-18 Rigaku Industrial Co ポリキャピラリ
CN103125010A (zh) * 2010-05-19 2013-05-29 埃里克·H·西尔弗 混合型x射线光学装置和方法

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US3947687A (en) * 1974-10-23 1976-03-30 The United States Of America As Represented By The Secretary Of The Air Force Collimated x-ray source for x-ray lithographic system
US4300055A (en) * 1979-07-03 1981-11-10 Siemens Medical Laboratories, Inc. Radiation filter
US5682415A (en) * 1995-10-13 1997-10-28 O'hara; David B. Collimator for x-ray spectroscopy
US5744813A (en) * 1994-07-08 1998-04-28 Kumakhov; Muradin Abubekirovich Method and device for controlling beams of neutral and charged particles

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3947687A (en) * 1974-10-23 1976-03-30 The United States Of America As Represented By The Secretary Of The Air Force Collimated x-ray source for x-ray lithographic system
US4300055A (en) * 1979-07-03 1981-11-10 Siemens Medical Laboratories, Inc. Radiation filter
US5744813A (en) * 1994-07-08 1998-04-28 Kumakhov; Muradin Abubekirovich Method and device for controlling beams of neutral and charged particles
US5682415A (en) * 1995-10-13 1997-10-28 O'hara; David B. Collimator for x-ray spectroscopy

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1347461A4 (fr) * 2000-12-29 2004-10-13 Muradin Abubekirovich Kumakhov Dispositif de lithographie a rayons x
EP1347461A1 (fr) * 2000-12-29 2003-09-24 Muradin Abubekirovich Kumakhov Dispositif de lithographie a rayons x
US6972845B2 (en) 2001-10-23 2005-12-06 Nireco Corporation Collimator and spectrophotometer
EP1306713A3 (fr) * 2001-10-23 2004-01-21 Nireco Corporation Collimateur et spectrophotomètre
EP1306713A2 (fr) * 2001-10-23 2003-05-02 Nireco Corporation Collimateur et spectrophotomètre
US7114232B2 (en) 2001-10-23 2006-10-03 Nireco Corporation Collimator and spectrophotometer
WO2004095140A2 (fr) * 2003-03-20 2004-11-04 Intel Corporation (A Delaware Corporation) Collecteurs hemispheriques doubles
WO2004095140A3 (fr) * 2003-03-20 2005-05-19 Intel Corp Collecteurs hemispheriques doubles
US7034320B2 (en) 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
US7501641B2 (en) 2003-03-20 2009-03-10 Intel Corporation Dual hemispherical collectors
EP1918697A2 (fr) * 2006-10-10 2008-05-07 Oxford Instruments Analytical Oy Irradiation sélective d'une petite région cible dans la spectroscopie fluorescente par rayons X
EP1918697A3 (fr) * 2006-10-10 2014-01-01 Oxford Instruments Analytical Oy Irradiation sélective d'une petite région cible dans la spectroscopie fluorescente par rayons X
CN106371293A (zh) * 2016-11-08 2017-02-01 东莞市北科电子科技有限公司 一种改善led曝光机平行光射出机构

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EP1204888A1 (fr) 2002-05-15
JP2003528333A (ja) 2003-09-24

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