WO2001004924A1 - Accelerateur de faisceau d'electrons - Google Patents

Accelerateur de faisceau d'electrons Download PDF

Info

Publication number
WO2001004924A1
WO2001004924A1 PCT/US2000/017816 US0017816W WO0104924A1 WO 2001004924 A1 WO2001004924 A1 WO 2001004924A1 US 0017816 W US0017816 W US 0017816W WO 0104924 A1 WO0104924 A1 WO 0104924A1
Authority
WO
WIPO (PCT)
Prior art keywords
exit window
electron
accelerator
housing
vacuum chamber
Prior art date
Application number
PCT/US2000/017816
Other languages
English (en)
Inventor
Tzvi Avnery
Kenneth P. Felis
Original Assignee
Advanced Electron Beams, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23373097&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2001004924(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US09/349,592 external-priority patent/US6407492B1/en
Application filed by Advanced Electron Beams, Inc. filed Critical Advanced Electron Beams, Inc.
Priority to EP00943252A priority Critical patent/EP1194944B1/fr
Priority to JP2001509058A priority patent/JP4808879B2/ja
Priority to AU57748/00A priority patent/AU5774800A/en
Priority to BR0013191-1A priority patent/BR0013191A/pt
Priority to DE60045551T priority patent/DE60045551D1/de
Priority to AT00943252T priority patent/ATE496387T1/de
Publication of WO2001004924A1 publication Critical patent/WO2001004924A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/06—Vessels or containers specially adapted for operation at high tension, e.g. by improved potential distribution over surface of vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
    • B65B55/02—Sterilising, e.g. of complete packages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
    • B65B55/02—Sterilising, e.g. of complete packages
    • B65B55/04—Sterilising wrappers or receptacles prior to, or during, packaging
    • B65B55/10—Sterilising wrappers or receptacles prior to, or during, packaging by liquids or gases
    • B65B55/103—Sterilising flat or tubular webs

Definitions

  • Electron beams are used in many industrial processes such as for drying or curing inks, adhesives, paints and coatings. Electron beams are also used for liquid, gas and surface sterilization as well as to clean up hazardous waste.
  • Conventional electron beam machines employed for industrial purposes include an electron beam accelerator which directs an electron beam onto the material to be processed.
  • the accelerator has a large lead encased vacuum chamber containing an electron generating filament or filaments powered by a filament power supply. During operation, the vacuum chamber is continuously evacuated by vacuum pumps.
  • the filaments are surrounded by a housing having a grid of openings which face a metallic foil electron beam exit window positioned on one side of the vacuum chamber.
  • a high voltage potential is imposed between the filament housing and the exit window with a high voltage power supply. Electrons generated by the filaments accelerate from the filaments in an electron beam through the grid of openings in the housing and out through the exit window.
  • An extractor power supply is typically included for flattening electric field lines in the region between the filaments and the exit window. This prevents the electrons in the electron beam from concentrating in the center of the beam as depicted in graph 1 of FIG. 1, and instead, evenly disperses the electrons across the width of the beam as depicted in graph 2 of FIG. 1.
  • Conditioning requires the power from the high voltage power supply to be gradually raised over time to burn off contaminants within the vacuum chamber and on the surface of the exit window which entered when the vacuum chamber was opened. This procedure can take anywhere between two hours and ten hours depending on the extent of the contamination. Half the time, leaks in the exit window occur which must be remedied, causing the time of the procedure to be further lengthened. Finally, every one or two years, a high voltage insulator in the accelerator is replaced, requiring disassembly of the entire accelerator. The time required for this procedure is about 2 to 4 days. As a result, manufacturing processes requiring electron beam radiation can be greatly disrupted when filaments, electron beam exit window foils and high voltage insulators need to be replaced.
  • the present invention provides a compact, less complex electron accelerator for an electron beam machine which allows the electron beam machine to be more easily maintained and does not require maintenance by personnel highly trained in vacuum technology and accelerator technology.
  • a preferred embodiment of the present invention is directed to an electron accelerator including a vacuum chamber having an electron beam exit window.
  • the exit window is formed of metallic foil bonded in metal to metal contact with the vacuum chamber to provide a gas tight seal therebetween.
  • the exit window is less than about 12.5 microns thick.
  • the vacuum chamber is hermetically sealed to preserve a permanent self sustained vacuum therein.
  • An electron generator is positioned within the vacuum chamber for generating electrons.
  • a housing surrounds the electron generator.
  • the housing has an electron permeable region formed in the housing between the electron generator and the exit window for allowing electrons to accelerate from the electron generator out the exit window in an electron beam when a voltage potential is applied between the housing and the exit window.
  • a series of openings in the housing forms the electron permeable region.
  • the exit window is preferably formed of titanium foil between about 8 to 10 microns thick and is supported by a support plate having a series of holes therethrough which allow the electrons to pass through.
  • the configuration of the holes in the support plate are arrangable to vary electron permeability across the support plate for providing the electron beam with a desired variable intensity profile.
  • the exit window has an outer edge which is either brazed, welded or bonded to the vacuum chamber to provide a gas tight seal therebetween.
  • the vacuum chamber preferably includes an elongate ceramic member.
  • the elongate ceramic member is corrugated which allows higher voltages to be used.
  • An annular spring member is coupled between the exit window and the corrugated ceramic member to compensate for different rates of expansion.
  • the elongate ceramic member has a smooth surface and a metallic shell surrounds the ceramic member.
  • the ceramic member includes a frustoconical hole which allows an electrical lead to extend through the frustoconical hole for supplying power to the electron generator.
  • a flexible insulating plug surrounds the electrical lead and includes a frustoconical surface for sealing with the frustoconical hole.
  • a retaining cap is secured to the shell for retaining the plug within the frustoconical hole.
  • the present invention also provides an electron accelerator including a vacuum chamber having an electron beam exit window.
  • An electron generator is positioned within the vacuum chamber for generating electrons.
  • a housing surrounds the electron generator and has an electron permeable region formed in the housing between the electron generator and the exit window for allowing electrons to accelerate from the electron generator out the exit window in an electron beam when a voltage potential is applied between the housing and the exit window.
  • the housing also has a passive electrical field line shaper for causing electrons to be uniformly distributed across the electron beam by flattening electrical field lines between the electron generator and the exit window.
  • the electron permeable region includes a first series of openings in the housing between the electron generator and the exit window while the passive electrical field line shaper includes a second and third series of openings formed in the housing on opposite sides of the electron generator.
  • the present invention provides a compact replaceable modular electron beam accelerator. The entire accelerator is replaced when the filaments or the electron beam exit window require replacing, thus drastically reducing the down time of an electron beam machine. This also eliminates the need for personnel skilled in vacuum technology and electron accelerator technology for maintaining the machine. In addition, high voltage insulators do not need to be replaced on site. Furthermore, the inventive electron beam accelerator has less components and requires less power than conventional electron beam accelerators, making it less expensive, simpler, smaller and more efficient.
  • the compact size of the accelerator makes it suitable for use in machines where space is limited such as in small printing presses, or for in line web sterilization and interstation curing.
  • FIG. 1 is a graph depicting the distribution of electrons in a focused electron beam superimposed over a graph depicting the distribution of electrons in an electron beam where the electrons are uniformly distributed across the width of the beam.
  • FIG. 2 is a side sectional schematic drawing of the present invention electron beam accelerator.
  • FIG. 3 is a schematic drawing showing the power connections of the accelerator of FIG. 2.
  • FIG. 4 is an end sectional view of the filament housing showing electric field lines.
  • FIG. 5 is an end sectional view of the filament housing showing electric field lines if the side openings 35 are omitted.
  • FIG. 6 is a plan view of a system incorporating more than one electron beam accelerator.
  • FIG. 7 is a side sectional schematic drawing of the filament housing showing another preferred method of electrically connecting the filaments.
  • FIG. 8 is a bottom sectional schematic drawing of FIG. 7.
  • FIG. 9 is a schematic drawing of another preferred filament arrangement.
  • FIG. 10 is another schematic drawing of still another preferred filament arrangement.
  • FIG. 11 is a side sectional view of another preferred electron beam accelerator.
  • FIG. 12 is a side-sectional view of yet another preferred electron beam accelerator.
  • FIG. 13 is a side-sectional view of still another preferred electron beam accelerator.
  • FIG. 14 is a bottom view of yet another preferred filament arrangement.
  • FIG. 15 is a plan view of a support plate with a pattern of holes filled to produce an electron beam with a variable intensity profile across the beam.
  • FIG. 16 is a side view of an extension nozzle.
  • electron beam accelerator 10 is a replaceable modular accelerator which is installed in an electron beam machine housing (not shown).
  • Accelerator 10 includes an elongate generally cylindrical two piece outer shell 14 which is sealed at both ends. The proximal end of outer shell 14 is enclosed by a proximal end cap 16 which is welded to outer shell 14.
  • Outer shell 14 and end cap 16 are each preferably made from stainless steel but alternatively can be made of other suitable metals.
  • an electron beam exit window membrane 24 made of titanium foil which is brazed along edge 23 to a stainless steel distal end cap 20.
  • End cap 20 is welded to outer shell 14.
  • Exit window 24 is typically between about 6 to 12 microns thick with about 8 to 10 microns being the more preferred range.
  • exit window 24 can be made of other suitable metallic foils such as magnesium, aluminum, beryllium or suitable non-metallic low density materials such as ceramics.
  • exit window 24 can be welded or bonded to end cap 20.
  • a rectangular support plate 22 having holes or openings 22a for the passage of electrons therethrough is bolted to end cap 20 with bolts 22b and helps support exit window 24.
  • Support plate 22 is preferably made of copper for dissipating heat but alternatively can be made of other suitable metals such as stainless steel, aluminum or titanium.
  • the holes 22a within support plate 22 are about 1/8 inch in diameter and provide about an 80% opening for electrons to pass through exit window 24.
  • End cap 20 includes a cooling passage 27 through which cooling fluid is pumped for cooling the end cap 20, support plate 22 and exit window 24.
  • the cooling fluid enters inlet port 25a and exits outlet port 25b.
  • the inlet 25a and outlet 25b ports mate with coolant supply and return ports on the electron beam machine housing.
  • the coolant supply and return ports include "0" ring seals for sealing to the inlet 25a and outlet 25b ports.
  • Accelerator 10 is about 12 inches in diameter by 20 inches long and about 50 pounds in weight.
  • a high voltage electrical connecting receptacle 18 for accepting the connector 12 of a high voltage power cable is mounted to end cap 16.
  • the high voltage cable supplies accelerator 10 with power from a high voltage power supply 48 and a filament power supply 50.
  • High voltage power supply 48 preferably provides about 100 kv but alternatively can be higher or lower depending upon the thickness of exit window 24.
  • Filament power supply 50 preferably provides about 15 volts.
  • Two electrical leads 26a/26b extend downwardly from receptacle 18 through a disk-shaped high voltage ceramic insulator 28 which divides accelerator 10 into an upper insulating chamber 44 and a lower vacuum chamber 46.
  • Insulator 28 is bonded to outer shell 14 by first being brazed to an intermediate ring 29 made of material having an expansion coefficient similar to that of insulator 28 such as KOVAR®.
  • the intermediate ring 29 can then be brazed to the outer shell 14.
  • the upper chamber 44 is evacuated and then filled with an insulating medium such as SF 6 gas but alternatively can be filled with oil or a solid insulating medium.
  • the gaseous and liquid insulating media can be filled and drained through shut off valve 42.
  • An electron generator 31 is positioned within vacuum chamber 46 and preferably consists of three 8 inch long filaments 32 (FIG. 4) made of tungsten which are electrically connected together in parallel. Alternatively, two filaments 32 can be employed.
  • the electron generator 31 is surrounded by a stainless steel filament housing 30.
  • Filament housing 30 has a series of grid like openings 34 along a planar bottom 33 and a series of openings 35 along the four sides of housing 30.
  • the filaments are preferably positioned within housing 30 about midway between bottom 33 and the top of housing 30. Openings 35 do not extend substantially above filaments 32.
  • Electrical lead 26a and line 52 electrically connect filament housing 30 to high voltage power supply 48.
  • Electrical lead 26b passes through a hole 30a in filament housing 30 to electrically connect filaments 32 to filament power supply 50.
  • the exit window 24 is electrically grounded to impose a high voltage potential between filament housing 30 and exit window 24.
  • An inlet 39 is provided on vacuum chamber 46 for evacuating vacuum chamber 46.
  • Inlet 39 includes a stainless steel outer pipe 36 which is welded to outer shell 14 and a sealable copper tube 38 which is brazed to pipe 36. Once vacuum chamber 46 is evacuated, pipe 38 is cold welded under pressure to form a seal 40 for hermetically sealing vacuum chamber 46.
  • accelerator 10 is mounted to an electron beam machine, and electrically connected to connector 12.
  • the housing of the electron beam machine includes a lead enclosure which surrounds accelerator 10.
  • Filaments 32 are heated up to about 4200°F by electrical power from filament power supply 50 (AC or DC) which causes free electrons to form on filaments 32.
  • filament power supply 50 AC or DC
  • the high voltage potential between the filament housing 30 and exit window 24 imposed by high voltage power supply 48 causes the free electrons 56 on filaments 32 to accelerate from the filaments 32 in an electron beam 58 out through openings 34 in housing 30 and the exit window 24 (FIG. 4).
  • the side openings 35 create small electric fields around the openings 35 which flatten the high voltage electric field lines 54 between the filaments 32 and the exit window 24 relative to the plane of the bottom 33 of housing 30.
  • By flattening electric field lines 54 electrons 56 of electron beam 58 exit housing 30 through openings 34 in a relatively straight manner rather than focusing towards a central location as depicted by graph 1 of FIG. 1.
  • the narrower higher density electron beam of graph 1 of FIG. 1 is undesirable because it will burn a hole through exit window 24.
  • FIG. 5 depicts housing 30 with side openings 35 omitted.
  • the new accelerator 10 is already preconditioned for high voltage operation and, therefore, the down time of the electron beam machine is merely minutes. Since only one part needs to be replaced, the operator of the electron beam machine does not need to be highly trained in vacuum technology and accelerator technology maintenance. In addition, accelerator 10 is small enough and light enough in weight to be replaced by one person.
  • the old accelerator is preferably sent to another location such as a company specializing in vacuum technology.
  • the vacuum chamber 46 is opened by removing the exit window 24 and support plate 22.
  • housing 30 is removed from vacuum chamber 46 and the filaments 32 are replaced. If needed, the insulating medium within upper chamber 44 is removed through valve 42. The housing 30 is then remounted back in vacuum chamber 46.
  • Support plate 22 is bolted to end cap 20 and exit window 24 is replaced.
  • the edge 23 of the new exit window 24 is brazed to end cap 20 to form a gas tight seal therebetween. Since exit window 24 covers the support plate 22, bolts 22b and bolt holes, it serves the secondary function of sealing over the support plate 22 without any leaks, "O"-rings or the like.
  • Copper tube 38 is removed and a new copper tube 38 is brazed to pipe 36.
  • the exit window 24 can be easily made 8 to 10 microns thick or even as low as 6 microns thick. The reason for this is that dust or other contaminants are prevented from accumulating on exit window 24 between the exit window 24 and the support plate 22. Such contaminants will poke holes through an exit window 24 having a thickness under 12.5 microns.
  • electron beam exit windows in conventional accelerators must be 12.5 to 15 microns thick because they are assembled at the site in dusty conditions during maintenance. An exit window 12.5 to 15 microns thick is thick enough to prevent dust from perforating the exit window. Since the present invention exit window 24 is typically thinner than exit windows on conventional accelerators, the power required for accelerating electrons through the exit window 24 is considerably less.
  • accelerator 10 is more efficient than conventional accelerators.
  • the lower voltage also allows the accelerator 10 to be more compact in size and allows a disk-shaped insulator 28 to be used which is smaller than the cylindrical or conical insulators employed in conventional accelerators.
  • the reason accelerator 10 can be more compact then conventional accelerators is that the components of accelerator 10 can be closer together due to the lower voltage.
  • the controlled clean environment within vacuum chamber 46 allows the components to be even closer together.
  • Conventional accelerators operate at higher voltages and have more contaminants within the accelerator which requires greater distances between components to prevent electrical arcing therebetween. In fact, contaminants from the vacuum pumps in conventional accelerators migrate into the accelerator during use.
  • the vacuum chamber 46 is then evacuated through inlet 39 and tube 38 is hermetically sealed by cold welding. Once vacuum chamber 46 is sealed, vacuum chamber 46 remains under a permanent vacuum without requiring the use of an active vacuum pump. This reduces the complexity and cost of operating the present invention accelerator 10.
  • the accelerator 10 is then preconditioned for high voltage operation by connecting the accelerator 10 to an electron beam machine and gradually increasing the voltage to burn off any contaminants within vacuum chamber 46 and on exit window 24. Any molecules remaining within the vacuum chamber 46 are ionized by the high voltage and/or electron beam and are accelerated towards housing 30. The ionized molecules collide with housing 30 and become trapped on the surfaces of housing 30, thereby further improving the vacuum.
  • the vacuum chamber 46 can also be evacuated while the accelerator 10 is preconditioned for high voltage operation. The accelerator 10 is disconnected from the electron beam machine and stored for later use.
  • FIG. 6 depicts a system 64 including three accelerators 10a, 10b and 10c which are staggered relative to each other to radiate the entire width of a moving product 62 with electron beams 60. Since the electron beam 60 of each accelerator 10a, 10b, 10c is narrower than the outer diameter of an accelerator, the accelerators cannot be positioned side-by-side. Instead, accelerator 10b is staggered slightly to the side and backwards relative to accelerators 10a and 10c along the line of movement of the product 62 such that the ends of each electron beam 60 will line up with each other in the lateral direction. As a result, the moving product 62 can be accumulatively radiated by the electron beams 60 in a step-like configuration as shown. Although three accelerators have been shown, alternatively, more than three accelerators 10 can be staggered to radiate wider products or only two accelerators 10 can be staggered to radiate narrower products.
  • FIGs. 7 and 8 depict another preferred method of electrically connecting leads 26a and 26b to filament housing 30 and filaments 32.
  • Lead 26a is fixed to the top of filament housing 30.
  • Three filament brackets 102 extend downwardly from the top of filament housing 30.
  • a filament mount 104 is mounted to each bracket 102.
  • An insulation block 110 and a filament mount 108 are mounted to the opposite side of filament housing 30.
  • the filaments 32 are mounted to and extend between filament mounts 104 and 108.
  • a flexible lead 106 electrically connects lead 26b to filament mount 108.
  • Filament brackets 102 have a spring-like action which compensate for the expansion and contraction of filaments 32 during use.
  • a cylindrical bracket 112 supports housing 30 instead of leads 26a/26b.
  • filament arrangement 90 is another preferred method of electrically connecting multiple filaments together in order to increase the width of the electron beam over that provided by a single filament.
  • Filaments 92 are positioned side- by-side and electrically connected in series to each other by electrical leads 94.
  • filament arrangement 98 depicts a series of filaments 97 which are positioned side-by-side and electrically connected together in parallel by two electrical leads 96. Filament arrangement 98 is also employed to increase the width of the electron beam.
  • accelerator 70 is another preferred embodiment of the present invention. Accelerator 70 produces an electron beam which is directed at a 90° angle to the electron beam produced by accelerator 10. Accelerator 70 differs from accelerator 10 in that filaments 78 are parallel to the longitudinal axis A of the vacuum chamber 88 rather than perpendicular to the longitudinal axis A.
  • exit window 82 is positioned on the outer shell 72 of the vacuum chamber 88 and is parallel to the longitudinal axis A. Exit window 82 is supported by support plate 80 which is mounted to the side of outer shell 72.
  • An elongated filament housing 75 surrounds filaments 78 and includes a side 76 having grid openings 34 which are perpendicular to longitudinal axis A.
  • Accelerator 70 is suitable for radiating wide areas with an electron beam without employing multiple staggered accelerators and is suitable for use in narrow environments. Accelerator 70 can be made up to about 3 to 4 feet long and can be staggered to provide even wider coverage.
  • accelerator 100 is yet another preferred embodiment of the present invention.
  • Accelerator 100 includes a generally cylindrical outer shell 102 formed of ceramic material having a vacuum chamber 104 therein.
  • Outer shell 102 has a closed proximal end 106 and an open distal end 118 opposite thereof.
  • the external surface of outer shell 102 includes a series of corrugations 102a which allows accelerator 100 to run at higher voltages than if outer shell 102 were smooth.
  • the open end 118 has a region with a smooth outer surface.
  • a metallic end cap 110 surrounds and covers the smooth open distal end 118 of outer shell 102 to enclose vacuum chamber 104.
  • End cap 110 is brazed to an intermediate annular metallic spring 108 which in turn is brazed to outer shell 102, thereby sealing vacuum chamber 104.
  • Spring 108 allows the ceramic outer shell 102 and end cap 110 to expand and contract at different rates in radial as well axial directions while maintaining a gas tight seal therebetween. Spring 108 accomplishes this by spacing the end cap 110 slightly apart from outer shell 102 as well as being formed of resilient material.
  • Spring 108 includes an annular inner V-shaped ridge 108a, the inner leg thereof brazed to outer shell 102.
  • An annular outer flange 108b extends radially outward from the V-shaped ridge 108a and is brazed to end cap 110.
  • End cap 110 includes an outer annular wall 112 and an inner annular wall 114 with an annular gap 116 formed therebetween into which the open distal end 118 of outer shell 102 extends. Gap 116 is larger than the wall thickness of end 118 allowing end 118 to be spaced apart from the sides and bottom of gap 116, thereby forming a space or passageway around end 118 as depicted by gaps 116a, 116b and 116c to connect vacuum chamber 104 with inlet 39. This allows vacuum chamber 104 to be evacuated via inlet 39. Inlet 39 is brazed or welded to, and extends through the outer annular wall 112 of end cap 110. End cap 110 also includes a support plate 22 with holes 22a extending therethrough.
  • An exit window 24 is bonded over support plate 22 to end cap 112 typically under heat and pressure or brazing or welding.
  • a cover plate 120 having a central opening 120a covers and protects exit window 24.
  • End cap 110 has a cooling passage 27 which is similar to that depicted in FIG. 2. Although end cap 110 is depicted as a single piece, end cap 110 can alternatively be formed of multiple pieces. For example, support plate 22 and annular wall 114 can be separate components. In addition, if desired, annular wall 114 can be omitted.
  • Filament housing 30 is positioned within vacuum chamber 104 just below the closed proximal end 106 of outer shell 102. Electrical leads 26a/26b extend through and are sealed to end 106 of outer shell 102. Filament housing 30 and electron generator 31 are similar to that depicted in FIG. 2. Although openings 35 are depicted in filament housing 30, alternatively openings 35 can be omitted.
  • accelerator 130 is still another preferred accelerator.
  • Accelerator 130 includes a metallic outer shell 122 surrounding a ceramic inner shell 124 having a smooth external surface.
  • the open end 118 of inner shell 124 preferably extends to support plate 22 thereby forming an annular wall 136 of ceramic material between the vacuum chamber 134 and outer shell 122.
  • distal end 118 can terminate before reaching support plate 22.
  • Inner shell 124 has a frustoconical opening 124a extending through proximal end 119 opposite to distal end 118.
  • An electrical lead 128 having a connector 138 extends through frustoconical hole 124a for providing power to filament housing 30 and electron generator 31 via electrical leads 26a/26b.
  • Filament housing 30 and electron generator 31 are similar to that in accelerator 100 (FIG. 12).
  • Electrical lead 128 also extends through the central opening 126a of a flexible polymeric insulating plug 126.
  • Insulating plug 126 includes a mating frustoconical outer surface 126b for sealing with the frustoconical hole 124a.
  • a retaining cap 140 secured to outer shell 122 exerts a compressive axial force on plug 126 which compresses plug 126 against the converging surfaces of frustoconical hole 124a and squeezes plug 126 around electrical lead 128 for sealing between electrical lead 128 and inner shell 124.
  • plug 126 is made of ethylene propylene rubber with an electrical resistance of 10 14 to 10 15 ohms-cm.
  • inner shell 124 preferably has an electrical resistance of 10 14 ohms-cm.
  • FIG. 14 depicts a preferred filament 32 for the electron generator 31 employed in accelerators 100 and 130 (FIGs. 12 and 13).
  • Filament 32 is formed with a series of curves into a generally W shape. This allows filament 32 to expand and contract during operation without requiring the support of resilient or spring-loaded components.
  • the ends of filament 32 can be bent in a hair pin turn as shown in FIG. 14 for insertion through openings or slots within electrical leads 26a and 26b. If desired, more than one filament 32 can be employed.
  • the holes 22a of support plate 22 within accelerators 100 and 130 can have a pattern of holes 142 that is filled or plugged such that the resultant electron beam emitted has a variable intensity profile across the beam.
  • the holes 22a can be arranged within support plate 22 during manufacture to produce the desired pattern.
  • a particular pattern 142 has been depicted, any desirable pattern can be formed.
  • an extension nozzle 144 can be secured to accelerators 100 and 130 (FIGs. 12 and 13). In such a situation, the exit window 24 would be positioned at the far end of nozzle 144.
  • Nozzle 144 allows insertion within narrow openings such as cups and bottles for sterilization therein.
  • the present invention electron accelerator is suitable for liquid, gas (such as air), or surface sterilization as well as for sterilizing medical products, food products, hazardous medical wastes and cleanup of hazardous wastes. Other applications include ozone production, fuel atomization and chemically bonding or grafting materials together.
  • the present invention electron accelerator can be employed for curing inks, coatings, adhesives and sealants.
  • materials such as polymers can be cross linked under the electron beam to improve structural properties.
  • the series of openings 35 in the filament housings form a passive electrical field line shaper for shaping electrical field lines, in particular, a flattener for flattening electrical field lines.
  • the term "passive" meaning that the electrical field lines are shaped without a separate extractor power supply.
  • electrical field lines can be shaped by employing multiple filaments.
  • partitions or passive electrodes can be positioned between the filaments for further shaping electrical field lines. Multiple filaments, partitions or passive electrodes can be employed as flatteners for flattening electrical field lines as well as other shapes.
  • end caps and filament housings are preferably made of stainless steel, alternatively, other suitable metals can be employed such as titanium, copper or KOVAR®.
  • End caps 16 and 20 are usually welded to outer shell 14 but alternatively can be brazed.
  • the holes 22a in support plate 22 can be non-circular in shape such as slots.
  • filaments 32 and the outer diameter of accelerator 10 can be varied depending upon the application at hand. Also, other suitable materials can be used for insulator 28 such as glass. Although the thickness of a titanium exit window is preferably under 12.5 microns (between 6 and 12 microns), the thickness of the exit window can be greater than 12.5 microns for certain applications if desired. For exit windows having a thickness above 12.5 microns, high voltage power supply 49 should provide about 100 kv to 150 kv. If exit windows made of materials which are lighter than titanium such as aluminum are employed, the thickness of the exit window can be made thicker than a corresponding titanium exit window while achieving the same electron beam characteristics.
  • the accelerators are preferably cylindrical in shape but can have other suitable shapes such as rectangular or oval cross sections.
  • accelerator is made in large quantities to be made inexpensively, it can be used as a disposable unit.
  • Receptacle 18 of accelerators 10 and 70 can be positioned perpendicular to longitudinal axis A for space constraint reasons.

Landscapes

  • Particle Accelerators (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Luminescent Compositions (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Lasers (AREA)

Abstract

L'invention concerne un accélérateur de faisceau d'électrons comprenant une chambre à vide qui présente une fenêtre de sortie du faisceau d'électrons. Cette fenêtre de sortie est composée de feuilles métalliques liées à la chambre à vide au moyen d'un contact métal sur métal permettant de réaliser un joint étanche au gaz à ce niveau. La largeur de la fenêtre de sortie est inférieure à environ 12,5 microns. La chambre à vide est fermée hermétiquement afin d'y préserver un vide permanent auto-entretenu. Un générateur d'électrons est placé à l'intérieur de la chambre à vide afin de générer des électrons. Un boîtier entoure ce générateur. Ce boîtier présente une zone perméable aux électrons, formée dans le boîtier entre le générateur d'électrons et la fenêtre de sortie. Cette zone permet d'accélérer les électrons à partir du générateur d'électrons, à travers la fenêtre de sortie, dans un faisceau d'électrons lorsque une tension est appliquée entre le boîtier et la fenêtre de sortie.
PCT/US2000/017816 1999-07-09 2000-06-28 Accelerateur de faisceau d'electrons WO2001004924A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP00943252A EP1194944B1 (fr) 1999-07-09 2000-06-28 Accelerateur de faisceau d'electrons
JP2001509058A JP4808879B2 (ja) 1999-07-09 2000-06-28 電子加速器及び電子を加速する方法
AU57748/00A AU5774800A (en) 1999-07-09 2000-06-28 Electron beam accelerator
BR0013191-1A BR0013191A (pt) 1999-07-09 2000-06-28 Acelerador de feixe de elétrons
DE60045551T DE60045551D1 (de) 1999-07-09 2000-06-28 Elektronenstrahlbeschleuniger
AT00943252T ATE496387T1 (de) 1999-07-09 2000-06-28 Elektronenstrahlbeschleuniger

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/349,592 1999-07-09
US09/349,592 US6407492B1 (en) 1997-01-02 1999-07-09 Electron beam accelerator

Publications (1)

Publication Number Publication Date
WO2001004924A1 true WO2001004924A1 (fr) 2001-01-18

Family

ID=23373097

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/017816 WO2001004924A1 (fr) 1999-07-09 2000-06-28 Accelerateur de faisceau d'electrons

Country Status (8)

Country Link
EP (2) EP1194944B1 (fr)
JP (1) JP4808879B2 (fr)
CN (1) CN1369105A (fr)
AT (1) ATE496387T1 (fr)
AU (1) AU5774800A (fr)
BR (1) BR0013191A (fr)
DE (1) DE60045551D1 (fr)
WO (1) WO2001004924A1 (fr)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002078033A3 (fr) * 2001-03-21 2003-08-07 Advanced Electron Beams Inc Emetteur de faisceau electronique
WO2007095205A2 (fr) 2006-02-14 2007-08-23 Advanced Electron Beams, Inc. Emetteur de faisceau electronique
WO2009151533A3 (fr) * 2008-05-21 2010-04-08 Advanced Electron Beams, Inc. Emetteur de faisceau électronique doté d’un canon rainuré
WO2011011079A1 (fr) * 2009-07-22 2011-01-27 Advanced Electron Beams Appareil amélioré de stérilisation par faisceau d’électrons
EP2492202A1 (fr) 2008-08-30 2012-08-29 Krones AG Stérilisation par rayonnement d'électrons pour récipients
US8293173B2 (en) 2009-04-30 2012-10-23 Hitachi Zosen Corporation Electron beam sterilization apparatus
CN103262220A (zh) * 2010-12-16 2013-08-21 日立造船株式会社 利用电子束技术产生臭氧和等离子体
US8772743B2 (en) 2008-10-07 2014-07-08 Tetra Laval Holdings & Finance S.A. Control method for electron beam sterilizing device and device performing said method
JP2016156831A (ja) * 2016-03-29 2016-09-01 Ｊｆｅエンジニアリング株式会社 粒子線透過窓

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102074431B (zh) * 2010-11-30 2012-07-04 南京大学 一种电子直线加速器用的电子枪控制电路
JP5910290B2 (ja) * 2012-04-26 2016-04-27 Ｊｆｅエンジニアリング株式会社 粒子線透過窓の製造方法
CN104616949B (zh) * 2013-11-05 2017-10-27 上海联影医疗科技有限公司 一种电子输出窗
JP6628728B2 (ja) * 2014-02-19 2020-01-15 日立造船株式会社 電子線照射装置、および照射検出を有する照射システム
WO2015144425A1 (fr) * 2014-03-24 2015-10-01 Tetra Laval Holdings & Finance S.A. Émetteur de faisceau d'électrons
AU2018212953B2 (en) * 2017-01-26 2022-12-08 Canadian Light Source Inc. Exit window for electron beam in isotope production
CN106601577A (zh) * 2017-02-28 2017-04-26 公安部第研究所 波纹玻壳x射线管
CN111010794A (zh) * 2019-12-26 2020-04-14 北京机电工程研究所 一种等离子体产生单元及使用方法
JP2021189038A (ja) * 2020-05-29 2021-12-13 浜松ホトニクス株式会社 電子線照射装置及び電子線照射装置の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0589606A2 (fr) * 1992-09-24 1994-03-30 Eev Limited Dispositifs de canon à électron
WO1998029895A1 (fr) * 1997-01-02 1998-07-09 Applied Advanced Technologies, Inc. Accelerateur de faisceau d'electrons
JPH10232290A (ja) * 1997-02-20 1998-09-02 Japan Atom Energy Res Inst セラミックスベローズの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5362977A (en) * 1976-11-17 1978-06-05 Hitachi Ltd Plane face pressure insulated electron gun
JPS5366151A (en) * 1976-11-26 1978-06-13 Hitachi Ltd Electron gun unit of electron microscope and equivalent unit
JPS5568057A (en) * 1978-11-17 1980-05-22 Hitachi Ltd Electron gun
JPS6128377Y2 (fr) * 1979-12-19 1986-08-22
DE3333686A1 (de) * 1983-09-17 1985-04-04 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlkanone zum erwaermen von materialien, insbesondere zum schweissen
DE3834913A1 (de) * 1988-10-13 1990-04-19 Hubert Boesch Dichtung fuer ventile oder flansche, insbesondere fuer die vakuumtechnik
US5414267A (en) * 1993-05-26 1995-05-09 American International Technologies, Inc. Electron beam array for surface treatment
CA2126251A1 (fr) * 1994-02-18 1995-08-19 Ronald Sinclair Nohr Procede de renforcement du liage chimique par l'action d'un faisceau d'electrons
US5483074A (en) * 1995-01-11 1996-01-09 Litton Systems, Inc. Flood beam electron gun
SE507282C2 (sv) * 1995-08-11 1998-05-04 Tetra Laval Holdings & Finance Sätt att sterilisera fyllfärdiga förpackningar samt användning av en elektronkanon vid sättet
JPH1130700A (ja) * 1997-05-15 1999-02-02 Toyo Ink Mfg Co Ltd パターン形成方法およびパターン形成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0589606A2 (fr) * 1992-09-24 1994-03-30 Eev Limited Dispositifs de canon à électron
WO1998029895A1 (fr) * 1997-01-02 1998-07-09 Applied Advanced Technologies, Inc. Accelerateur de faisceau d'electrons
JPH10232290A (ja) * 1997-02-20 1998-09-02 Japan Atom Energy Res Inst セラミックスベローズの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 14 31 December 1998 (1998-12-31) *

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002078033A3 (fr) * 2001-03-21 2003-08-07 Advanced Electron Beams Inc Emetteur de faisceau electronique
US6630774B2 (en) 2001-03-21 2003-10-07 Advanced Electron Beams, Inc. Electron beam emitter
US6800989B2 (en) 2001-03-21 2004-10-05 Advanced Electron Beams, Inc. Method of forming filament for electron beam emitter
US7180231B2 (en) 2001-03-21 2007-02-20 Advanced Electron Beams, Inc. Electron beam emitter
US7759661B2 (en) 2006-02-14 2010-07-20 Advanced Electron Beams, Inc. Electron beam emitter for sterilizing containers
US8258486B2 (en) 2006-02-14 2012-09-04 Hitachi Zosen Corporation Electron beam emitter for sterilizing containers
JP2009526971A (ja) * 2006-02-14 2009-07-23 アドバンスト・エレクトロン・ビームズ・インコーポレーテッド 電子ビーム照射器
US8586944B2 (en) 2006-02-14 2013-11-19 Hitachi Zosen Corporation Electron beam emitter for sterilizing containers
WO2007095205A2 (fr) 2006-02-14 2007-08-23 Advanced Electron Beams, Inc. Emetteur de faisceau electronique
WO2007095205A3 (fr) * 2006-02-14 2007-11-29 Advanced Electron Beams Inc Emetteur de faisceau electronique
US8338796B2 (en) 2008-05-21 2012-12-25 Hitachi Zosen Corporation Electron beam emitter with slotted gun
WO2009151533A3 (fr) * 2008-05-21 2010-04-08 Advanced Electron Beams, Inc. Emetteur de faisceau électronique doté d’un canon rainuré
EP2492202A1 (fr) 2008-08-30 2012-08-29 Krones AG Stérilisation par rayonnement d'électrons pour récipients
US8772743B2 (en) 2008-10-07 2014-07-08 Tetra Laval Holdings & Finance S.A. Control method for electron beam sterilizing device and device performing said method
US8293173B2 (en) 2009-04-30 2012-10-23 Hitachi Zosen Corporation Electron beam sterilization apparatus
WO2011011079A1 (fr) * 2009-07-22 2011-01-27 Advanced Electron Beams Appareil amélioré de stérilisation par faisceau d’électrons
CN103262220A (zh) * 2010-12-16 2013-08-21 日立造船株式会社 利用电子束技术产生臭氧和等离子体
JP2016156831A (ja) * 2016-03-29 2016-09-01 Ｊｆｅエンジニアリング株式会社 粒子線透過窓

Also Published As

Publication number Publication date
EP1194944A1 (fr) 2002-04-10
DE60045551D1 (de) 2011-03-03
EP1194944B1 (fr) 2011-01-19
ATE496387T1 (de) 2011-02-15
JP2003504605A (ja) 2003-02-04
JP4808879B2 (ja) 2011-11-02
EP2239755A3 (fr) 2015-11-25
AU5774800A (en) 2001-01-30
BR0013191A (pt) 2002-04-30
EP2239755A2 (fr) 2010-10-13
CN1369105A (zh) 2002-09-11

Similar Documents

Publication Publication Date Title
US6407492B1 (en) Electron beam accelerator
US5962995A (en) Electron beam accelerator
EP1194944B1 (fr) Accelerateur de faisceau d'electrons
EP2324485B1 (fr) Tube radiogène
US5211919A (en) Flat plate corona cell for generating ozone
AU2005236862A1 (en) Improved source for energetic electrons
KR100466702B1 (ko) 진공펌프용이중벽배기어셈블리,이온주입시스템및이중벽배기어셈블리를재구성하는방법
US8698097B2 (en) Radially inwardly directed electron beam source and window assembly for electron beam source or other source of electromagnetic radiation
US5623183A (en) Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode
JPH11139809A (ja) 両面冷却オゾナイザ
RU38081U1 (ru) Электронно-лучевая пушка
JP2008100897A (ja) オゾン発生装置
EP2729938B1 (fr) Suspension de logement de cathode d'un dispositif à faisceau d'électrons

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2000943252

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 00811336X

Country of ref document: CN

ENP Entry into the national phase

Ref country code: RU

Ref document number: 2002 2002103510

Kind code of ref document: A

Format of ref document f/p: F

WWP Wipo information: published in national office

Ref document number: 2000943252

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642