WO2000066674A1 - Dielectric material including particulate filler - Google Patents

Dielectric material including particulate filler Download PDF

Info

Publication number
WO2000066674A1
WO2000066674A1 PCT/US2000/012002 US0012002W WO0066674A1 WO 2000066674 A1 WO2000066674 A1 WO 2000066674A1 US 0012002 W US0012002 W US 0012002W WO 0066674 A1 WO0066674 A1 WO 0066674A1
Authority
WO
WIPO (PCT)
Prior art keywords
composite
dielectric
nanometers
dielectric material
layer
Prior art date
Application number
PCT/US2000/012002
Other languages
French (fr)
Inventor
William F. Hartman
Kirk M. Slenes
Kristen J. Law
Original Assignee
Tpl, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/305,253 external-priority patent/US6616794B2/en
Application filed by Tpl, Inc. filed Critical Tpl, Inc.
Priority to DE1198532T priority Critical patent/DE1198532T1/en
Priority to AU46944/00A priority patent/AU4694400A/en
Priority to CA002373172A priority patent/CA2373172A1/en
Priority to EP00928757A priority patent/EP1198532A4/en
Publication of WO2000066674A1 publication Critical patent/WO2000066674A1/en
Priority to HK02107710.2A priority patent/HK1047953A1/en
Priority to US10/644,386 priority patent/US20040109298A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • B32B2311/18Titanium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/16Capacitors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0242Shape of an individual particle
    • H05K2201/0257Nanoparticles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0302Properties and characteristics in general
    • H05K2201/0317Thin film conductor layer; Thin film passive component
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/0929Conductive planes
    • H05K2201/09309Core having two or more power planes; Capacitive laminate of two power planes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4688Composite multilayer circuits, i.e. comprising insulating layers having different properties

Definitions

  • DIELECTRIC MATERIAL INCLUDING PARTICULATE FILLER
  • the present invention relates to a dielectric substrate useful in the manufacture of printed wiring boards wherein the dielectric substrate comprises at least one organic polymer having a T g greater than 140°C and at least one filler material
  • the dielectric substrate of this invention has a dielectric constant that varies less than 15% over a temperature range of from -55 to 125°C
  • This invention also includes multilayer printed circuit boards including dielectric substrates of this invention and especially printed circuit boards wherein the dielectric substrate of this invention is used to form internal distributed capacitors in the printed circuit board
  • the present invention further relates to providing capacitance in printed circuit boards, more specifically to a method and apparatus for providing a layer or layers of integral capacitance in printed circuit boards using dielectric nanopowders Back ⁇ round Art
  • Multilayer printed wiring boards are widely used in electronic devices such as computers, telephones, appliances, automobiles and the like Multilayer printed wiring boards typically include a board having a plurality of insulated conductive trace layers separated by dielectric substrate layers Due to the demand for smaller and smaller electronic devices, efforts have been made to incorporate circuit devices directly into printed wiring boards For example, U S Patent No 5,010,641 discloses a multilayer printed wiring board including internal distributed capacitors Similarly, U.S Patent Nos 5,155,655 and 5,161 ,060 disclose capacitor laminates useful in the manufacture of capacitive printed wiring boards
  • the capacitors built into printed wiring boards typically include a metal ground layer and a charged metal layer divided by a dielectric substrate layer
  • the dielectric layers used in printed wiring board capacitors are generally polymeric sheets that may be reinforced with materials such as glass, ceramics and so forth More recently, there has been a trend towards reducing the profile of circuits and dielectric layers in printed wiring boards in order to increase printed wiring board circuit density This trend has resulted in the reduction of the thickness of dielectric layers associated with wiring board capacitors.
  • a problem with reducing the thickness of capacitor dielectric layers is that the dielectric constant of the dielectric layer varies too widely with varying temperatures causing undesirable variable capacitance Therefore, there remains the need for dielectric substrate layers that are useful in forming printed wiring board capacitors that are thin and have dielectric constants that vary little over a wide temperature range
  • PCBs printed circuit boards
  • These surface devices consist of integrated circuits and discrete passive devices, such as capacitors, resistors and inductors, and the like
  • the discrete passive devices occupy a high percentage of the surface area of the complete PCB Therefore, in order to increase the available surface of the PCBs, there have been a variety of past efforts to locate passive devices, including capacitors, in a embedded or subsurface, configuration within the board
  • passive devices are known collectively and individually in the art as "integral passives "
  • a capacitor designed for disposition within (between the lamina) of a PCB is called an "integral capacitor” and provides “integral capacitance " If integral capacitive devices are to result in significant contributions to the overall power operations in integrated circuits, advances in the energy storage capabilities of these devices must be made
  • C p capacitance
  • A area of capacitor
  • dielectric constant of laminate
  • ⁇ 0 dielectric constant of vacuum
  • f thickness of the dielectric
  • dielectric powders such as metal titanate-based powders
  • metal titanate-based powders are produced by a high-temperature, solid-state reaction of a mixture of the appropriate stoichiomet ⁇ c amounts of the oxides or oxide precursors (e g carbonates hydroxides or nitrates) of barium calcium, titanium and the like
  • the reactants are wet milled to accomplish an intimate mixture
  • the resulting slurry is dried and fired at elevated temperatures, as high as 1300°C, to attain the desired solid state reactions Thereafter, the fired product is milled to produce a powder
  • the milled product consists of irregularly shaped fractured aggregates that are large in size and possess a wide particle size distribution, 500-20,000 nm Consequently, films produced using these powders are limited to thicknesses greater than the size of the largest particle
  • powder suspensions or composites produced using pre-fired ground ceramic powders must be used immediately after dispersion, due to the high sedimentation rates associated with large particles
  • the stable crystalline phase of barium titanate for particles greater than 200 nm is tetragonal and, at elevated temperatures, a large increase in dielectric constant occurs due to a phase transition
  • a primary object of the present invention is to provide a dielectric substrate that has a dielectric constant that varies little over a wide temperature range
  • Another object of the present invention is to provide a dielectric layer that includes a non-sintered particular material
  • An additional object of the present invention is to provide a capacitor laminate including a dielectric sheet having an essentially unchanging dielectric constant which is located between conductive foil layers
  • a primary advantage of the present invention is a composite comprising at least one organic polymer having a T g greater than about 140°C, and at least one ferroelectric particle filler The organic polymer and ferroelectric particles are chosen to produce a composite having a dielectric constant that varies less than 15% when the composite is subjected to temperatures ranging from -55 to 125°C
  • a capacitor laminate comprising a composite of the invention can be formed into a sheet and having a top surface and a bottom surface
  • the capacitor laminate includes a first conductive layer associated with the composite top surface, and a second conductive layer associated with the composite bottom surface
  • Fig 1 is a cross sectional view of an integral capacitor apparatus prepared according to the invention
  • Fig 2 is an enlarged cross section of the dielectric layer portion of the apparatus shown in Fig 1 , illustrating the dispersal of the nanopowder in the bonding material matrix,
  • Fig 3 is a further enlarged view of the components shown in Fig 2
  • Fig 4 is a schematic flowchart illustrating some principal steps of one embodiment of the method of the invention.
  • Fig 5 is a schematic flowchart illustrating some principal steps of another embodiment of the method of the invention, and -7-
  • Fig 6 is a schematic flowchart illustrating some principal steps of yet another embodiment of the method of the invention.
  • Fig 7 is a plot showing the effect of temperatures ranging from -55 to 125°C on the measure dielectric constant of composites prepared according to Example 1 .
  • Fig 8 is an electron micrograph depicting barium titanate particles manufactured by a non- refractory method and having a uniform particle size of approximately 50 nm, and
  • Fig 9 is an electron micrograph of milled barium titanate particles that were prepared by a refractory process
  • the present invention is of dielectric substrate materials comprising at least one organic polymer and at least one filler wherein the dielectric constant of the laminate varies less than 15% when the composite is subjected to temperatures ranging from -55 to 125° C
  • the present invention includes capacitor laminates and multilayer printed circuit boards including capacitor laminates prepared from the dielectric substrate materials of this invention
  • the capacitance of the dielectric layer varies depending upon factors such as the layer dielectric constant, thickness and area according to the following equation
  • the only way to vary capacitance, C p is to vary the substrate dielectric constant ( ⁇ ) or thickness ( ⁇ ) Furthermore since decreasing the thickness ( ⁇ ) of the laminate becomes difficult below about 1 mil, it becomes important to control capacitance by choosing a dielectric substrate composition with the desired dielectric constant A further complicating factor is that the substrate dielectric constant ( ⁇ ), and thus C p , can vary significantly over a range of temperatures Dielectric substrates are considered to have performance or "X7R" performance when the dielectric constant changes ⁇ 15% over the 180°C temperature range of from -55 to 125°C An important aspect of this invention is our discovery that the dielectric substrates that include non-refractory ferroelectric particles exhibit a high and vary stable dielectric constant over wide ranging temperatures
  • non-refractory ferroelectric particles is used herein to refer to particles made from one or more ferroelectric materials
  • Preferred ferroelectric materials include barium titanate, strontium titanate, barium neodymium titanate, barium strontium titanate, magnesium zirconate, titanate dioxide, calcium titanate, barium magnesium titanate, lead zirconium titanate and mixtures thereof
  • the ferroelectric particles useful in the present invention may have particle size ranging from about 20 to about 150 nanometers It is preferred that the particles are essentially ail nanoparticles which means that the particles have a particle size of less than 100 nanometers and preferably a particle size of about 50 nanometers It is also preferred that at least 80% of the ferroelectric particles have a size ranging from 5 to 100 nanometers and preferably from 40-60 nanometers
  • the ferroelectric particles useful in this invention are preferably manufactured by a non-refractory process such as precipitation process
  • Most preferred non-refractory particles are 50 nanometer barium strontium titanate nanoparticles manufactured by TPL, Inc
  • What is not included within the scope of non- refractory ferroelectric particles are those particles that are produced by a heating or sintering process
  • the ferroelectric particles are combined with at least one polymer to form dielectric layers
  • the ferroelectric particles may be present in the dielectric layer in an amount ranging from about 10 to about 60 vol % and preferably from about 15 to 50 vol % and most preferably from about 20 to 40 vol % of the dielectric layer with the remainder of the dielectric layer comprising one or more resin systems
  • the ferroelectric particles are preferably combined with one or more resins that are commonly used to manufacture dielectric printed circuit board layers
  • the resins may include material such as silicone resins, cyanate ester resins, epoxy resins, polyamide resins, Kapton material, bismaleimide tnazine resins, urethane resins, mixtures of resins and any other resins that are useful in manufacturing dielectric substrate materials
  • the resin is preferably a high T g resin By high T g , it is meant that the resin system used should have a cured T g greater than about 140°C It is more preferred that the resin T g be in excess of 160°C
  • the dielectric layers of this invention are manufactured by combining the appropriate amount of ferroelectric particles with the desired resin The resin/ferroelectric particle resin mixture is then coated onto a conductive metal layer The ferroelectric particle containing resin is then dried to remove solvent from the resin
  • the dielectric substrates of this invention are useful for manufacturing capacitor laminates
  • the capacitor laminate of this invention includes a dielectric layer described above comprising ferroelectric particles, a first conductive metal layer associated with the dielectric layer top surface and a second conductive metal layer associated with the dielectric layer bottom surface
  • Capacitor laminates may be manufactured by any methods that are known in the art, for example, the U S Patent No 5,155,655, which is incorporated herein by reference
  • capacitor laminates having a top conductive metal surface and a bottom conductive metal surface separated by a ferroelectric particle- containing resin are manufactured by (i) applying ferroelectric particle-containing resin mixture to the surface of a conductive metal foil, and (n) applying a second layer of the conductive metal to the exposed resin to sandwich the ferroelectric particle containing resin between the conductive metal layers
  • a second ferroelectric particle/resin coated conductive metal can be applied to the first ferroelectric particle-containing resin coated conductive metal to create a sandwich wherein the ferroelectric particle-containing resin is
  • the curing temperatures and pressures will range from about 250 to about 350° and the pressures will vary from about 100 to about 1500 psi.
  • Conductive metal layers may be applied to the top surface and bottom surface of the dielectric substrate sheet by sputtering, by electrodeposition or by adhering a conductive metal film or foil to a dielectric sheet top surface and bottom surface.
  • the surface of the conductive metal or surface of the dielectric layer may be modified or roughened to improve adhesion of the metal layer to the top and bottom surfaces of the dielectric layer.
  • the first and second conductive layers will typically have a thickness ranging from 9 to about 105 microns. It is preferred that the first and second conductive metal layers are copper foil layers having a thickness of from 17 to about 70 microns and most preferably a thickness of about 35 microns. It is preferred that the conductive metal layers used in the capacitor dielectric are copper foil layers. Most preferably, both conductive metal layers will be double treated copper foil layers manufactured by Oak Mitsui, Gould or Circuit Foils.
  • the dielectric layer may include an optional second filler material in order to impart strength to the dielectric layer.
  • the second filler materials include woven or non-woven materials such as quartz, silica glass, electronic grade glass and ceramic and polymers such as aramids, liquid crystal polymers, aromatic polyamides, or polyesters, particulate materials such as ceramic polymers, and other fillers and reinforcing material that are commonly used to manufacture printed wiring board substrate.
  • the optional second filler material my be present in the dielectric layer in an amount ranging from about 20 to 70 wt% and preferably from an amount ranging from about 35 to about 65 wt%.
  • the dielectric materials of the invention may include other optional ingredients that are commonly used in the manufacture of dielectric layers.
  • the dielectric particles and/or the second filler material can include a binding agent to include the bond between the filler and the resin material in order to strengthen the dielectric layer.
  • the resin compositions useful in the invention may include coupling agents such as silane coupling agents, zirconates and titanates.
  • the resin composition useful in this invention may include surfactants and wetting agents to control particle agglomeration or coated surface appearance
  • compositions of the invention may be made into various articles
  • the composites may be shaped into films, sheets, plaques, disks and other flat shapes which are particularly useful as substrates in electronics such as printed wiring boards
  • the composites may also be manufactured into three dimensional shapes
  • the composites may be shaped by any methods known in the art such as extrusion, injection molding and compression molding
  • the dielectric layers manufactured using the resin/ferroelectric particle of the invention preferably will have a thickness of from about 5 to about 60 microns At these thicknesses the layers will have a capacitance from about 2100 to about 25000 pF/ ⁇ n 2 Preferred dielectric layers will have a thickness ranging from about 20 to about 40 microns and the capacitance from about 3100 to about 6300 pF/ ⁇ n 2 based upon a standard area
  • the capacitor laminates of this invention have an extremely high breakdown voltage in comparison to filled and non-filled capacitor laminates of the prior art It is preferred that the capacitor laminates of this invention have a breakdown voltage that exceeds 2000 volts/mil and preferably that exceeds 2500 volts/mil
  • the capacitor laminates manufactured using the dielectric materials of the invention can be stacked and interconnected so that multiple layers are present in the printed wiring board
  • the layers may have different dielectric constants, different capacitance values and different thicknesses to form substrates for high density electronic packages such as single chip and multi-chip modules
  • the present invention is further of methods and means for providing integral capacitance within printed circuit boards
  • the invention provides a method for producing a high capacitance core element for integral inclusion in a printed circuit board comprising the steps of preparing a composite mixture by mixing a bonding matrix material with a slurry comprising a suspension of hydrothermally prepared nanopowder, forming the composite mixture into a dielectric layer, and disposing the dielectric layer between two conductive layers
  • the method optionally further comprises the step of dispersing the hydrothermally prepared nanopowder in an organic solvent
  • the step of dispersing the hydrothermally prepared nanopowder may comprise dispersing the powder in an initial volumetric ratio of between about 20 percent and about 40 percent powder by volume
  • the method may also comprise the step of sonicating the nanopowder and the solvent, or the step of milling the nanopowder and the solvent Further, a surfactant may be mixed with the nanopowder and solvent
  • the step of mixing a bonding matrix material preferably comprises mixing a polymer to form a homogenous nanopowder-polymer-solvent suspension
  • the invention may further comprise the step of curing the composite mixture to produce a dielectric layer having between about 40 percent and about 55 percent nanopowder by volume
  • the step of forming the composite mixture into a dielectric layer preferably comprises impregnating a fiberglass sheet with the composite mixture, and the step of forming the composite mixture into a dielectric layer may comprise selecting a member from the group consisting of extruding, spraying, rolling, dipping, and casting the composite mixture
  • the step of disposing a conductive layer preferably comprises laminating a conductive foil onto the cured dielectric layer
  • the step of disposing a conductive layer comprises the steps of placing the composite mixture upon a conductive foil, and then cu ⁇ ng the dielectric layer
  • the step of disposing a conductive layer may comprise metallizing the side of the dielectric layer, such as by evaporating sputtering, or chemical vapor depositing a conductive material upon the dielectric layer
  • a finer dielectric powder is used, a powder having an unconventionally narrow particle size distribution
  • the finer powder preferably is produced using a low-temperature chemical precipitation method
  • the method known in the art as "a hydrothermal process"
  • a hydrothermal process has been utilized in manufacturing contexts besides the production of dielectric materials for use in integral capacitors, for example in the production of certain industrial cements
  • the general hydrothermal process for creating powders is available to one skilled in the art, for example, in U S Patent No 4,764,493 to Lilley, et al
  • hydrothermally prepared nanopowders have not previously been used to produce composite dielectric layers in the manner disclosed herein, and their use in the invention avoids many of the disadvantages associated with the pre-fired and ground nanopowders commonly employed in the art of capacitor construction
  • barium titanate for example, titania or a titanium alkoxide is reacted with barium hydroxide solvent to produce a product which possesses high density, high purity, controlled stoichiometry, small particle size and narrow particle size distribution Reactions are typically performed at temperatures less than 100°C to produce barium titanate with cubic crystallinity Reaction conditions can be tailored to produced powders of appropriate compositions, depending on the dielectric application with a mean primary particle size ranging from 10-200 nm with size deviations less than 20%
  • a mean primary particle size ranging from 10-200 nm with size deviations less than 20%
  • Preferably such hydrothermal process prepared barium titanate powders are employed in the present invention
  • Hydrothermally prepared powders offer several advantages, germane to the production of integral capacitors over conventionally produced powders First, because composite film thickness is proportional to powder particle size, and the specific capacitance is inversely proportional to film thickness powder with smaller particle size allows for films to be produced with higher specific capacitance Second, with the diameter of vias approaching 20,000 nm, producing such vias in composite films incorporating hydrothermally prepared dielectric powders is possible Third hydrothermal nanopowders, such as barium titanate powders, possess a cubic structure and thus do not undergo phase transition at the temperatures which produce large increases in dielectric constant for conventionally prepared, pre-fired powders Lastly, hydrothermal nanopowders are sufficiently small to remain in uniform suspensions or composite slurries without sedimentation, allowing material preparation to occur independently of producing a dielectric layer
  • the invention includes alternative processes for producing a high capacitance core element for integral inclusion in a PCB device
  • a hydrothermally prepared powder, preferably barium titanate powder, with particle size between 10-200 nm preferably is used in all embodiments
  • the process of the invention includes forming a dielectric layer consisting of a fiberglass sheet impregnated with a nanopowder-loaded bonding composite, and then sandwiching the dielectric layer between two conductive layers
  • the nanopowder-loaded composite may be placed onto a conductive substrate, and a top conductive layer formed by coating a conductor, such as by metallization (e g , through metal evaporation), upon the composite dielectric layer
  • a dielectric layer comprised of the nanopowder-loaded composite may be formed and then two conductive layers deposited on both sides thereof by metallization, such as through evaporation
  • a slurry is prepared by dispersing the nanopowder, preferably a hydrothermally prepared powder, most preferably a barium titanate nanopowder, in an organic based or aqueous solvent compatible with the bonding material
  • Suitable solvents for the practice of the invention include methyl ethyl ketone or dimethyl formamide, or a combination of these two
  • the slurry is a colloidal suspension, where the powders are prepared to maintain particles apart from each other and to inhibit particle/particle interactions Powders are mixed into the solvent using sonication, or milling, and coated with surface active molecules (surfactant) in order to minimize powder particle agglomeration
  • the surfactant preferably but not necessarily is a non-ionic phosphate ester
  • the polymer matrix material is then added to the colloidal suspension slurry to form a powder-polymer- solvent composite suspension
  • a polymer epoxy well suited for use as the bonding material in the invention is the 406 Epoxy Resin available from Allied Signal Corporation
  • a capacitor for integration into a PCB is created by impregnating fiberglass sheets with the composite material and then laminating the impregnated sheet between two conductive layers, such as copper foil
  • the impregnated fiberglass sheet typically has a thickness ranging between 2 0 mil and 6 0 mil
  • the fiberglass sheet is submerged in and passed through a bath of the composite mixture, and the nanopowder particles are permitted to penetrate into the interstitial spaces of the fiberglass sheet to impregnate it with the composite mixture
  • An advantage of the invention is that the nano-powders are sufficiently small to freely enter between the glass fibers, thoroughly saturating the fiberglass sheet This results in a dielectric layer of desirable strength and resiliency which also features suitable dielectric qualities
  • the bonding material used in the composite mixture preferably is an epoxy resin, while the ceramic used is a high dielectric constant barium titanate powder produced using a hydrothermal process
  • Fig 1 illustrating an integral capacitance apparatus 15 according to the invention
  • Conductive layers 10 and 12, such as copper foils have the dielectric layer 11 , such as a composite-impregnated fiberglass sheet disposed there between
  • Fig 2 is an enlarged cross sectional view of the composite dielectric layer 11 showing that individual hydrothermally prepared barium titanate nanopowders 13,13' are uniformly dispersed throughout the bonding matrix 14, which has impregnated the fiberglass sheet 22
  • Fig 3 shows an enlarged view of a portion of the dielectric 11 , without the fiberglass sheet, where individual hydrothermally prepared nanopowders 13,13' are disposed within the epoxy matrix 14 at an average distance of separation which permits ready provision of microvias
  • the composite-impregnated fiberglass sheet comprises the dielectric layer 11
  • the conductive layers 10 and 12 are disposed upon one, or usually two sides, of the dielectric layer
  • the conductive layers 10,12 e g , thin copper sheets, each about 1 or 2 mils thick
  • the entire sandwiched assembly heated to cause the polymer matrix in the dialectic layer 11 to bond to the conductive sheets
  • it is desirable to employ a polymer with a relatively low glass transition temperature so that conventional lamination presses can induce the bonding between layer 11 and the conduction sheets 10,12
  • alternative modes such as attachment of the conductive layers to the dielectric layer using other adhesive materials are within the scope of the invention
  • a slurry is prepared by dispersing a hydrothermally prepared nanopowder in a solvent
  • the dispersal may be accomplished with sonication, or by any other suitable means
  • a surfactant is supplied to the suspension to create a colloidal suspension of the nanopowder in the solvent
  • the bonding material preferably an epoxy
  • the bonding material is mixed with the slurry to prepare a composite mixture of the solvent and nanopowder with the bonding material
  • the resulting composite mix then is impregnated into a porous supporting laminate, preferably a fiberglass sheet, so that the composite mix and the fiberglass sheet effectively form a dielectric layer
  • a conductive layer is disposed upon one or preferably both sides of the dielectric layer
  • the disposition of the conductive layer or layers is accomphshed by lamination, in which the three layers are pressed together under conditions of elevated
  • An advantage of the invention is that the use of nano-powders allows microvias to be drilled through the dielectric layer 11 with the use of micro lasers
  • a typical micro laser beam, encountering a nano-powder particle, is able to destroy or displace the small particle and thereby maintain the straightness and quality of the microvia
  • the size of the ceramic particles can interfere with microvia drilling with micro lasers Laser beams are scattered by the larger diameter particles, drilling is impeded, and the quality of the microvia impaired
  • an integral capacitor is created by coating a conductive foil or sheet 12 with a composite mixture which includes a bonding matrix material, solvent, and hydrothermally prepared nanopowders
  • the preparation of the composite mixture is generally the same as previously described, that is, a nanopowder is suspended in a solvent to create a suspension slurry, and the bonding material, usually a polymer, is mixed with the slurry
  • Coating of a conductive foil substrate 12 such as copper is performed by physical placement of the composite mixture on the foil and subsequent removal of the solvent
  • the uncured composite mixture may be extruded onto a conductive layer 12, and then the composite and conductive layer placed into a curing oven for about ten minutes at about 180°F
  • no fiberglass sheet is included in the dielectric layer, rather the composite mixture is by itself cured to form the dielectric layer 11
  • the dielectric layer 11 thus is not as mechanically strong, but, when using powders which have mean diameters of less than 50 nm, dielectric layers as thin as one micro
  • Fig 1 may also be referred to as illustrative of this second embodiment of the apparatus
  • the composite dielectric layer 11 forming the dielectric film is placed or coated onto a self-supporting conductive layer 12, such as a copper foil
  • a second conductive layer 10 is applied to the other side of the dielectric layer 11 , such as by press laminating a second foil, or by metal evaporation, to complete the integral capacitor construction
  • Fig 2 shows a cross-section of the dielectric composite layer 11 , with individual hydrothermally prepared nanopowders 13,13' uniformly dispersed throughout the binding matrix 14
  • Figure 3 shows an enlarged view of the dielectric layer 11 where individual hydrothermally prepared nanopowders 13,13' are dispersed within the binding matrix 14
  • this embodiment includes the steps of preparing a slurry of a nanopowder dispersed in a solvent, preferably also with a surfactant
  • the method includes mixing the bonding material, again preferably an epoxy, with the nanopowder-solvent suspension
  • the forming of the dielectric layer is accomplished by extruding, spraying rolling, dipping or casting the uncured composite mixture, while a conductive layer is disposed thereon by placing the uncured composite mixture upon a self-supporting conductive layer such as a copper foil or the like
  • the method then involves curing the composite mixture to eliminate most of the solvent, so that the dielectric layer becomes substantially solid
  • the basic method is completed with the disposing of a second conductive layer, such as a copper foil, on the other side of the dielectric layer, that is, the side of the layer that was not initially placed upon the first
  • a capacitor for integration is created by metallizing a self-supported composite dielectric layer 11 which includes a bonding matrix material and the hydrothermally prepared nanopowders
  • the composite dielectric layer 11 preferably having a thickness of at least 2 0 micron, is formed by extrusion or casting.
  • the general process of this embodiment of invention is similar to the process of the second embodiment described, except that instead of incorporating at least one self-supporting conductive foil at least one of the conductive layers 10 and 12 is disposed upon the -19-
  • the third embodiment includes at least one, "metallized" conductive layer 12, and optionally both layers 10,12 are metallized layers
  • metallized conductive layers 10 or 12 An advantage of metallized conductive layers 10 or 12 is that the conductive layers may be deposited with comparatively thin thicknesses, e.g , one micron or less These thinner conductive layers 10,12 deposited on the dielectric film 11 using metallization, such as vapor deposition, reduce the amount of etching required for patterning electrodes for specific integral capacitors
  • the conductive layers 10 and 12 are created by evaporation or sputtering
  • Fig 2 shows the cross-section of the dielectric film 11 where individual hydrothermally prepared nanopowders 13,13' are uniformly dispersed throughout the binding matrix 14
  • Fig 6 generally depicts the fundamental steps of this third embodiment of the method
  • the first two basic steps are common to the other embodiments, with the slurry very preferably involving the suspension of a hydrothermally prepared barium titanate nanopowder
  • the slurry is mixed with the bonding material, and the resulting composite mixture is allowed to cure to form a dielectric layer
  • no self-supporting conductive layers need be disposed against the dielectric layer Rather, at least one side of the dielectric layer, and optionally both sides of the dielectric layer, are metallized, preferably by metal vapor deposition This permits the incorporation of extremely thin conductive layers
  • a second conductive layer is disposed upon the other side of the dielectric layer
  • This second conductive layer may be a self-supporting metal foil, or, as mention, may be a second metallized surface
  • a single capacitor apparatus typically has a composite dielectric layer 11 from about 2 mil to about 6 mil in thickness if the fiberglass sheet is used therein, and with conductive layers 10,12 each of about 1 to 2 mils thickness, for an overall apparatus thickness of between about 4 mil to about 10 mil
  • the composite dielectric layer 11 can be much thinner, approaching one mil thickness, while metallized conductive layers 10,12 produced by vapor deposition or the like can also be much thinner, with corresponding resulting dramatic decreases in the total thickness 12 02
  • capacitors for example from five to ten, produced according to any of the embodiments of the invention, to create a multi-capacitor component
  • five capacitors e g , five dielectric layers alternately stacked between six conductive layers
  • PCB PCB
  • Example 1 Dielectric substrates with varying resin T g and varying filler compositions were prepared and tested in this Example Specifically, the substrates included no filler, sintered and ground barium titanate filler particles, and non-refractory barium titanate filler particles
  • AlliedSignal 406 Resin was used alone or combined with 50 wt% barium titanate particles to form a dielectric layer
  • Two forms of barium titanate particles were used, sintered barium titanate particles manufactured by TAM Ceramics, inc , Niagara Falls, NY, and nonrefractory barium titanate particles manufactured by TPL, Inc , in Albuquerque, NM
  • the sintered barium titanate particles have a primary particle size of 1 micrometer, a BET surface area of 3 3m 2 /g and a dielectric constant of 3000
  • the nonrefractory barium strontium titanate particles had a particle size of about 0 05 micrometers, a BET surface area of 26 0 m /g and dielectric constant of 3000
  • Dielectric layers were prepared using the resin or resin/particle combination by coating a 1 oz Double Treat (DT) copper foil manufactured by Oak Mitsui with resin/particle combination, applying a second layer of 1 oz copper foil to sandwich the resin/particle combination between the two copper foil layers and laminating the product for about one hour at 350°F under a pressure from 300 to 1200 psi
  • DT 1 oz Double Treat
  • Each of the three capacitors was evaluated by measuring the dielectric constant of the substrate material over a temperature range from -55°C to 125°C
  • the unfilled resin exhibited a 25% change in the dielectric constant over the testing temperature range
  • the composite including 50 wt% sintered banum titanate particles saw a 24 2% change in the dielectric constant over the tested temperature range while the composite including 50 wt% nonrefractory barium titanate saw its dielectric constant change only 10% over the tested temperature range
  • a dielectric material including 35 vol % nonrefractory barium titanate was prepared and tested according to the method of Example 1
  • the change in dielectric constant over a temperature range from -55° to 125°C was plotted and is reported in Fig 7 From Fig 7, it is clear that the dielectric constant changes about 10% over the temperature range Therefore, the amount of nonrefractory barium titanate in the composition does not dramatically alter the dielectric constant stability of the resulting dielectric composition.
  • a capacitor laminate including 35 vol % nonrefractory barium titanate was prepared and tested according to the method of Example 1
  • the resin system used was AlliedSignal 402 Resin which has a T g of 140°C
  • the change in dielectric constant over a temperature range of -55 to 125°C was 27.5%

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Insulating Materials (AREA)

Abstract

A dielectric substrate (15) useful in the manufacture of printed wiring boards is disclosed wherein the dielectric substrate comprises at least one organic polymer having a Tg greater than 140 °C and at least one filler material. The dielectric substrate of this invention has a dielectric constant that varies less than 15 % over a temperature range of from -55 to 125 °C. Additionally, a method for producing integral capacitance components for inclusion within printed circuit boards. Hydrothermally prepared nanopowders (13) permit the fabrication of very thin dielectric layers that offer increased dielectric constants and are readily penetrated by microvias. Disclosed is a method of preparing a slurry or suspension of a hydrothermally prepared nanopowder and solvent. A suitable bonding material (14), such as a polymer is mixed with the nanopowder slurry, to generate a composite mixture that is formed into a dielectric layer (11). The dielectric layer (11) may be placed upon a conductive layer (10, 12) prior to curing, or conductive layers (10, 12) may be applied upon a cured dielectric layer, either by lamination or by metallization processes, such as vapor deposition or sputtering.

Description

WO 00/66674 PCTtUSOO/12002
DIELECTRIC MATERIAL INCLUDING PARTICULATE FILLER
This application claims the benefit of U S Patent Application Serial No 09/458,363, entitled "Dielectric Material Including Particulate Filler", filed on May 4, 1999, and of U S Patent Application Serial No 09/305,253, entitled "Integral Capacitance for Printed Circuit Board Using Dielectric Nanopowders", filed on May 4, 1999, both by William F Hartman, Kirk M Slenes, and Kristen J Law, and the specifications thereof are incorporated herein by reference
BACKGROUND OF THE INVENTION Field of the Invention (Technical Field.
The present invention relates to a dielectric substrate useful in the manufacture of printed wiring boards wherein the dielectric substrate comprises at least one organic polymer having a Tg greater than 140°C and at least one filler material The dielectric substrate of this invention has a dielectric constant that varies less than 15% over a temperature range of from -55 to 125°C This invention also includes multilayer printed circuit boards including dielectric substrates of this invention and especially printed circuit boards wherein the dielectric substrate of this invention is used to form internal distributed capacitors in the printed circuit board
The present invention further relates to providing capacitance in printed circuit boards, more specifically to a method and apparatus for providing a layer or layers of integral capacitance in printed circuit boards using dielectric nanopowders Backαround Art
Multilayer printed wiring boards (PWB's) are widely used in electronic devices such as computers, telephones, appliances, automobiles and the like Multilayer printed wiring boards typically include a board having a plurality of insulated conductive trace layers separated by dielectric substrate layers Due to the demand for smaller and smaller electronic devices, efforts have been made to incorporate circuit devices directly into printed wiring boards For example, U S Patent No 5,010,641 discloses a multilayer printed wiring board including internal distributed capacitors Similarly, U.S Patent Nos 5,155,655 and 5,161 ,060 disclose capacitor laminates useful in the manufacture of capacitive printed wiring boards
The capacitors built into printed wiring boards typically include a metal ground layer and a charged metal layer divided by a dielectric substrate layer The dielectric layers used in printed wiring board capacitors are generally polymeric sheets that may be reinforced with materials such as glass, ceramics and so forth More recently, there has been a trend towards reducing the profile of circuits and dielectric layers in printed wiring boards in order to increase printed wiring board circuit density This trend has resulted in the reduction of the thickness of dielectric layers associated with wiring board capacitors However, a problem with reducing the thickness of capacitor dielectric layers is that the dielectric constant of the dielectric layer varies too widely with varying temperatures causing undesirable variable capacitance Therefore, there remains the need for dielectric substrate layers that are useful in forming printed wiring board capacitors that are thin and have dielectric constants that vary little over a wide temperature range
Furthermore, printed circuit boards (PCBs) typically are constructed in a laminated form Several layers of laminate are used in a board for providing electrical connections to and among various devices located on the surface of the board These surface devices consist of integrated circuits and discrete passive devices, such as capacitors, resistors and inductors, and the like The discrete passive devices occupy a high percentage of the surface area of the complete PCB Therefore, in order to increase the available surface of the PCBs, there have been a variety of past efforts to locate passive devices, including capacitors, in a embedded or subsurface, configuration within the board When passive devices are in such a configuration, they are known collectively and individually in the art as "integral passives " A capacitor designed for disposition within (between the lamina) of a PCB is called an "integral capacitor" and provides "integral capacitance " If integral capacitive devices are to result in significant contributions to the overall power operations in integrated circuits, advances in the energy storage capabilities of these devices must be made
There have been past attempts to provide integral capacitance One example of an invention providing for integral capacitance is U S Patent No 5,079,069 to Howard, et al , where a dielectric sheet is sandwiched between conducting sheets to provide a layer of integral capacitance Currently in such configurations the materials consist of conventional PCB laminate resins such as epoxy, and provide a dielectric sheet with a dielectric constant of approximately 4 5 With thicknesses of approximately 2 mils, such material can provide planar capacitance values of approximately 500 picofarads per square inch However, many applications require capacitance values much greater than 500 picofarads per square inch and therefore other approaches must provide capacitance layers having higher planar capacitance values
For a fixed capacitor area, only two approaches are available for increasing the planar capacitance (capacitance/area) of an integral capacitor First, higher dielectric constant materials can be used Second the thickness of the dielectric can be reduced These constraints are reflected in the following formula known to the art, for capacitance per area
Figure imgf000005_0001
where Cp = capacitance A = area of capacitor ε = dielectric constant of laminate, ε0 = dielectric constant of vacuum, and f = thickness of the dielectric
Prior efforts in this regard have sought to provide a high capacitance core using laminate with a filler having a high dielectric constant As an example, U S Patent No 5,162,977 suggests how to enhance the capacitance of a dielectric layer using pre-fired and ground ceramic nanopowder, and purports to teach how to produce capacitance values that are four orders of magnitude greater than those achieved simply using epoxy dielectrics However, using pre-fired and ground ceramic nanopowders in the dielectric layer poses obstacles for the formation of vias (holes permitting electronic communication between layers of a laminated PCB) Pre-fired and ground ceramic nanopowder particles have a typical dimension in the range of 500-20,000 nm Furthermore, the particle distribution in this range is generally rather broad, meaning that there could be a 10,000 nm particle alongside a 500 nm particle The distribution within the dielectric layer of particles of different size often presents major obstacles to microvia formation, due to the presence of the larger particles Another problem associated with pre-fired ceramic nanopowders is the ability for the dielectric layer to withstand substantial voltage without breakdown occurring across the layer Typically, capacitance layers within a PCB are expected to hold off at least 300 V in order to qualify as a reliable component for PCB construction The presence of the comparatively larger ceramic particles in pre-fired ceramic nanopowders within a capacitance layer prevents ultrathin layers from being used because the boundaries of contiguous large particles provide a path for voltage breakdown This is doubly unfortunate because, as indicated by the equation above, greater planar capacitance may also be achieved by reducing the thickness of the dielectric layer - with the thinness limited by the size of the particles therein Accordingly, any process which uniformly disperses very fine uniform dielectric nanopowders within a binder, such as epoxy, leads to capacitance layers which are more compatible with desired microvia formations and can withstand high voltages for thinner layers
Most commercially available dielectric powders such as metal titanate-based powders, are produced by a high-temperature, solid-state reaction of a mixture of the appropriate stoichiometπc amounts of the oxides or oxide precursors (e g carbonates hydroxides or nitrates) of barium calcium, titanium and the like In such calcination processes, the reactants are wet milled to accomplish an intimate mixture The resulting slurry is dried and fired at elevated temperatures, as high as 1300°C, to attain the desired solid state reactions Thereafter, the fired product is milled to produce a powder
Although the pre-fired and ground dielectric formulations produced by solid phase reactions are acceptable for many electrical applications, they suffer from several disadvantages First, the milling -5-
step serves as a source of contaminants that can adversely affect electrical properties Second, the milled product consists of irregularly shaped fractured aggregates that are large in size and possess a wide particle size distribution, 500-20,000 nm Consequently, films produced using these powders are limited to thicknesses greater than the size of the largest particle Thirdly, powder suspensions or composites produced using pre-fired ground ceramic powders must be used immediately after dispersion, due to the high sedimentation rates associated with large particles The stable crystalline phase of barium titanate for particles greater than 200 nm is tetragonal and, at elevated temperatures, a large increase in dielectric constant occurs due to a phase transition
A need remains for a method and apparatus for providing integral capacitors that employ improved materials to allow for thinner, purer, dielectric layers to boost capacitance and permit reliable creation of microvias
SUMMARY OF THE INVENTION (DISCLOSURE OF THE INVENTION)
A primary object of the present invention is to provide a dielectric substrate that has a dielectric constant that varies little over a wide temperature range
Another object of the present invention is to provide a dielectric layer that includes a non-sintered particular material
An additional object of the present invention is to provide a capacitor laminate including a dielectric sheet having an essentially unchanging dielectric constant which is located between conductive foil layers
A primary advantage of the present invention is a composite comprising at least one organic polymer having a Tg greater than about 140°C, and at least one ferroelectric particle filler The organic polymer and ferroelectric particles are chosen to produce a composite having a dielectric constant that varies less than 15% when the composite is subjected to temperatures ranging from -55 to 125°C Another advantage of the present invention is that a capacitor laminate comprising a composite of the invention can be formed into a sheet and having a top surface and a bottom surface The capacitor laminate includes a first conductive layer associated with the composite top surface, and a second conductive layer associated with the composite bottom surface
An additional advantage of the present invention is the enablement of multi-layer printed wiring boards wherein at least one layer comprises a capacitor laminate of this invention
BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are incorporated into and form a part of the specification, illustrate several embodiments of the present invention and, together with the description, serve to explain the principles of the invention The drawings are only for the purpose of illustrating a preferred embodiment of the invention and are not to be construed as limiting the invention In the drawings
Fig 1 is a cross sectional view of an integral capacitor apparatus prepared according to the invention,
Fig 2 is an enlarged cross section of the dielectric layer portion of the apparatus shown in Fig 1 , illustrating the dispersal of the nanopowder in the bonding material matrix,
Fig 3 is a further enlarged view of the components shown in Fig 2
Fig 4 is a schematic flowchart illustrating some principal steps of one embodiment of the method of the invention,
Fig 5 is a schematic flowchart illustrating some principal steps of another embodiment of the method of the invention, and -7-
Fig 6 is a schematic flowchart illustrating some principal steps of yet another embodiment of the method of the invention
Fig 7 is a plot showing the effect of temperatures ranging from -55 to 125°C on the measure dielectric constant of composites prepared according to Example 1 , and
Fig 8 is an electron micrograph depicting barium titanate particles manufactured by a non- refractory method and having a uniform particle size of approximately 50 nm, and
Fig 9 is an electron micrograph of milled barium titanate particles that were prepared by a refractory process
DESCRIPTION OF THE PREFERRED EMBODIMENTS (BEST MODES FOR CARRYING OUT THE INVENTION) The present invention is of dielectric substrate materials comprising at least one organic polymer and at least one filler wherein the dielectric constant of the laminate varies less than 15% when the composite is subjected to temperatures ranging from -55 to 125° C The present invention includes capacitor laminates and multilayer printed circuit boards including capacitor laminates prepared from the dielectric substrate materials of this invention
The capacitance of the dielectric layer varies depending upon factors such as the layer dielectric constant, thickness and area according to the following equation
Cp/A = ε/τ
Because the area (A) is generally constant, the only way to vary capacitance, Cp, is to vary the substrate dielectric constant (ε) or thickness (τ) Furthermore since decreasing the thickness (τ) of the laminate becomes difficult below about 1 mil, it becomes important to control capacitance by choosing a dielectric substrate composition with the desired dielectric constant A further complicating factor is that the substrate dielectric constant (ε), and thus Cp, can vary significantly over a range of temperatures Dielectric substrates are considered to have performance or "X7R" performance when the dielectric constant changes ± 15% over the 180°C temperature range of from -55 to 125°C An important aspect of this invention is our discovery that the dielectric substrates that include non-refractory ferroelectric particles exhibit a high and vary stable dielectric constant over wide ranging temperatures
The term "non-refractory ferroelectric particles" is used herein to refer to particles made from one or more ferroelectric materials Preferred ferroelectric materials include barium titanate, strontium titanate, barium neodymium titanate, barium strontium titanate, magnesium zirconate, titanate dioxide, calcium titanate, barium magnesium titanate, lead zirconium titanate and mixtures thereof
The ferroelectric particles useful in the present invention may have particle size ranging from about 20 to about 150 nanometers It is preferred that the particles are essentially ail nanoparticles which means that the particles have a particle size of less than 100 nanometers and preferably a particle size of about 50 nanometers It is also preferred that at least 80% of the ferroelectric particles have a size ranging from 5 to 100 nanometers and preferably from 40-60 nanometers
The ferroelectric particles useful in this invention are preferably manufactured by a non-refractory process such as precipitation process Most preferred non-refractory particles are 50 nanometer barium strontium titanate nanoparticles manufactured by TPL, Inc What is not included within the scope of non- refractory ferroelectric particles are those particles that are produced by a heating or sintering process
The ferroelectric particles are combined with at least one polymer to form dielectric layers The ferroelectric particles may be present in the dielectric layer in an amount ranging from about 10 to about 60 vol % and preferably from about 15 to 50 vol % and most preferably from about 20 to 40 vol % of the dielectric layer with the remainder of the dielectric layer comprising one or more resin systems The ferroelectric particles are preferably combined with one or more resins that are commonly used to manufacture dielectric printed circuit board layers The resins may include material such as silicone resins, cyanate ester resins, epoxy resins, polyamide resins, Kapton material, bismaleimide tnazine resins, urethane resins, mixtures of resins and any other resins that are useful in manufacturing dielectric substrate materials The resin is preferably a high Tg resin By high Tg, it is meant that the resin system used should have a cured Tg greater than about 140°C It is more preferred that the resin Tg be in excess of 160°C and most preferably in excess of 180°C A preferred resin system is 406-N Resin manufactured by Al edSignal Inc
The dielectric layers of this invention are manufactured by combining the appropriate amount of ferroelectric particles with the desired resin The resin/ferroelectric particle resin mixture is then coated onto a conductive metal layer The ferroelectric particle containing resin is then dried to remove solvent from the resin
The dielectric substrates of this invention are useful for manufacturing capacitor laminates The capacitor laminate of this invention includes a dielectric layer described above comprising ferroelectric particles, a first conductive metal layer associated with the dielectric layer top surface and a second conductive metal layer associated with the dielectric layer bottom surface Capacitor laminates may be manufactured by any methods that are known in the art, for example, the U S Patent No 5,155,655, which is incorporated herein by reference In another method, capacitor laminates having a top conductive metal surface and a bottom conductive metal surface separated by a ferroelectric particle- containing resin are manufactured by (i) applying ferroelectric particle-containing resin mixture to the surface of a conductive metal foil, and (n) applying a second layer of the conductive metal to the exposed resin to sandwich the ferroelectric particle containing resin between the conductive metal layers Alternatively, a second ferroelectric particle/resin coated conductive metal can be applied to the first ferroelectric particle-containing resin coated conductive metal to create a sandwich wherein the ferroelectric particle-containing resin is located between the two conductive metal layers Once formed, the capacitor precursor is laminated at appropriate temperatures and pressures in order to cure the -10-
ferroelectric particle-containing resin. The curing temperatures and pressures will range from about 250 to about 350° and the pressures will vary from about 100 to about 1500 psi.
Conductive metal layers may be applied to the top surface and bottom surface of the dielectric substrate sheet by sputtering, by electrodeposition or by adhering a conductive metal film or foil to a dielectric sheet top surface and bottom surface. In order to ensure adhesion between the conductive layer and the dielectric layer, the surface of the conductive metal or surface of the dielectric layer may be modified or roughened to improve adhesion of the metal layer to the top and bottom surfaces of the dielectric layer. The first and second conductive layers will typically have a thickness ranging from 9 to about 105 microns. It is preferred that the first and second conductive metal layers are copper foil layers having a thickness of from 17 to about 70 microns and most preferably a thickness of about 35 microns. It is preferred that the conductive metal layers used in the capacitor dielectric are copper foil layers. Most preferably, both conductive metal layers will be double treated copper foil layers manufactured by Oak Mitsui, Gould or Circuit Foils.
The dielectric layer may include an optional second filler material in order to impart strength to the dielectric layer. Examples of the second filler materials include woven or non-woven materials such as quartz, silica glass, electronic grade glass and ceramic and polymers such as aramids, liquid crystal polymers, aromatic polyamides, or polyesters, particulate materials such as ceramic polymers, and other fillers and reinforcing material that are commonly used to manufacture printed wiring board substrate. The optional second filler material my be present in the dielectric layer in an amount ranging from about 20 to 70 wt% and preferably from an amount ranging from about 35 to about 65 wt%.
The dielectric materials of the invention may include other optional ingredients that are commonly used in the manufacture of dielectric layers. For example, the dielectric particles and/or the second filler material can include a binding agent to include the bond between the filler and the resin material in order to strengthen the dielectric layer. In addition, the resin compositions useful in the invention may include coupling agents such as silane coupling agents, zirconates and titanates. In addition, the resin composition useful in this invention may include surfactants and wetting agents to control particle agglomeration or coated surface appearance
The compositions of the invention may be made into various articles For instance, the composites may be shaped into films, sheets, plaques, disks and other flat shapes which are particularly useful as substrates in electronics such as printed wiring boards The composites may also be manufactured into three dimensional shapes The composites may be shaped by any methods known in the art such as extrusion, injection molding and compression molding
The dielectric layers manufactured using the resin/ferroelectric particle of the invention preferably will have a thickness of from about 5 to about 60 microns At these thicknesses the layers will have a capacitance from about 2100 to about 25000 pF/ιn2 Preferred dielectric layers will have a thickness ranging from about 20 to about 40 microns and the capacitance from about 3100 to about 6300 pF/ιn2 based upon a standard area
An important property of the capacitor laminates of this invention is the breakdown voltage The capacitor laminates of this invention have an extremely high breakdown voltage in comparison to filled and non-filled capacitor laminates of the prior art It is preferred that the capacitor laminates of this invention have a breakdown voltage that exceeds 2000 volts/mil and preferably that exceeds 2500 volts/mil
The capacitor laminates manufactured using the dielectric materials of the invention can be stacked and interconnected so that multiple layers are present in the printed wiring board The layers may have different dielectric constants, different capacitance values and different thicknesses to form substrates for high density electronic packages such as single chip and multi-chip modules
The present invention is further of methods and means for providing integral capacitance within printed circuit boards The invention provides a method for producing a high capacitance core element for integral inclusion in a printed circuit board comprising the steps of preparing a composite mixture by mixing a bonding matrix material with a slurry comprising a suspension of hydrothermally prepared nanopowder, forming the composite mixture into a dielectric layer, and disposing the dielectric layer between two conductive layers The method optionally further comprises the step of dispersing the hydrothermally prepared nanopowder in an organic solvent The step of dispersing the hydrothermally prepared nanopowder may comprise dispersing the powder in an initial volumetric ratio of between about 20 percent and about 40 percent powder by volume The method may also comprise the step of sonicating the nanopowder and the solvent, or the step of milling the nanopowder and the solvent Further, a surfactant may be mixed with the nanopowder and solvent
The step of mixing a bonding matrix material preferably comprises mixing a polymer to form a homogenous nanopowder-polymer-solvent suspension Also, the invention may further comprise the step of curing the composite mixture to produce a dielectric layer having between about 40 percent and about 55 percent nanopowder by volume
The step of forming the composite mixture into a dielectric layer preferably comprises impregnating a fiberglass sheet with the composite mixture, and the step of forming the composite mixture into a dielectric layer may comprise selecting a member from the group consisting of extruding, spraying, rolling, dipping, and casting the composite mixture
The step of disposing a conductive layer preferably comprises laminating a conductive foil onto the cured dielectric layer Alternatively, the step of disposing a conductive layer comprises the steps of placing the composite mixture upon a conductive foil, and then cuπng the dielectric layer Or, the step of disposing a conductive layer may comprise metallizing the side of the dielectric layer, such as by evaporating sputtering, or chemical vapor depositing a conductive material upon the dielectric layer
Highly efficient capacitance can be provided integrally within a PCB through the utility of the invention by permitting the incorporation of one or more ultra-thin dielectric layers which resist the undesirable voltage breakdown which besets known integral capacitance devices Thus, in the present invention a method is provided for supplying integral capacitance using very fine, uniform dielectric nanopowders within a binder, such that thinner, higher capacitance, layers are obtained These layers hold off required test voltages, and yet may be successfully penetrated with microvias
In the present invention, a finer dielectric powder is used, a powder having an unconventionally narrow particle size distribution The finer powder preferably is produced using a low-temperature chemical precipitation method The method, known in the art as "a hydrothermal process", has been utilized in manufacturing contexts besides the production of dielectric materials for use in integral capacitors, for example in the production of certain industrial cements Thus the general hydrothermal process for creating powders is available to one skilled in the art, for example, in U S Patent No 4,764,493 to Lilley, et al However, hydrothermally prepared nanopowders have not previously been used to produce composite dielectric layers in the manner disclosed herein, and their use in the invention avoids many of the disadvantages associated with the pre-fired and ground nanopowders commonly employed in the art of capacitor construction
In the case of barium titanate, for example, titania or a titanium alkoxide is reacted with barium hydroxide solvent to produce a product which possesses high density, high purity, controlled stoichiometry, small particle size and narrow particle size distribution Reactions are typically performed at temperatures less than 100°C to produce barium titanate with cubic crystallinity Reaction conditions can be tailored to produced powders of appropriate compositions, depending on the dielectric application with a mean primary particle size ranging from 10-200 nm with size deviations less than 20% Preferably such hydrothermal process prepared barium titanate powders are employed in the present invention
Hydrothermally prepared powders offer several advantages, germane to the production of integral capacitors over conventionally produced powders First, because composite film thickness is proportional to powder particle size, and the specific capacitance is inversely proportional to film thickness powder with smaller particle size allows for films to be produced with higher specific capacitance Second, with the diameter of vias approaching 20,000 nm, producing such vias in composite films incorporating hydrothermally prepared dielectric powders is possible Third hydrothermal nanopowders, such as barium titanate powders, possess a cubic structure and thus do not undergo phase transition at the temperatures which produce large increases in dielectric constant for conventionally prepared, pre-fired powders Lastly, hydrothermal nanopowders are sufficiently small to remain in uniform suspensions or composite slurries without sedimentation, allowing material preparation to occur independently of producing a dielectric layer
The invention includes alternative processes for producing a high capacitance core element for integral inclusion in a PCB device A hydrothermally prepared powder, preferably barium titanate powder, with particle size between 10-200 nm preferably is used in all embodiments In one embodiment, the process of the invention includes forming a dielectric layer consisting of a fiberglass sheet impregnated with a nanopowder-loaded bonding composite, and then sandwiching the dielectric layer between two conductive layers Alternatively, the nanopowder-loaded composite may be placed onto a conductive substrate, and a top conductive layer formed by coating a conductor, such as by metallization (e g , through metal evaporation), upon the composite dielectric layer Or, a dielectric layer comprised of the nanopowder-loaded composite may be formed and then two conductive layers deposited on both sides thereof by metallization, such as through evaporation
In all embodiments, a slurry is prepared by dispersing the nanopowder, preferably a hydrothermally prepared powder, most preferably a barium titanate nanopowder, in an organic based or aqueous solvent compatible with the bonding material Suitable solvents for the practice of the invention include methyl ethyl ketone or dimethyl formamide, or a combination of these two Preferably the slurry is a colloidal suspension, where the powders are prepared to maintain particles apart from each other and to inhibit particle/particle interactions Powders are mixed into the solvent using sonication, or milling, and coated with surface active molecules (surfactant) in order to minimize powder particle agglomeration The surfactant preferably but not necessarily is a non-ionic phosphate ester The polymer matrix material is then added to the colloidal suspension slurry to form a powder-polymer- solvent composite suspension A polymer epoxy well suited for use as the bonding material in the invention is the 406 Epoxy Resin available from Allied Signal Corporation, although other resins can suffice The composite mixtures are then used to create high dielectric constant layers for use as capacitors In the preferred embodiment of the invention, the solvent/powder slurries have an initial volumetric ratio of between about 20 percent and about 40 percent powder by volume, with higher powder volumes resulting in increased viscosity Viscosity thus can be controlled to suit the solvent powder composition for different possible application methods, e g , casting versus extrusion The solvent powder slurry is mixed with the bonding material, and the resulting mixture is cured to drive off solvent and set the matrix The resulting finished (cured) dielectric layer according to the invention preferably has a volumetric powder/matrix ratio of between about 40 percent and about 55 percent powder by volume The dielectric constant of a film may be controlled though varying volume fractions of the powder and the bonding material, with higher percent volumes of powder yielding increased dielectric constants at the expense of decreasing mechanical strength Percent volumes of nanopowders in excess of about 55 percent exhibit undesirable brittleness
in one embodiment of the invention, a capacitor for integration into a PCB is created by impregnating fiberglass sheets with the composite material and then laminating the impregnated sheet between two conductive layers, such as copper foil The impregnated fiberglass sheet typically has a thickness ranging between 2 0 mil and 6 0 mil Preferably, the fiberglass sheet is submerged in and passed through a bath of the composite mixture, and the nanopowder particles are permitted to penetrate into the interstitial spaces of the fiberglass sheet to impregnate it with the composite mixture An advantage of the invention is that the nano-powders are sufficiently small to freely enter between the glass fibers, thoroughly saturating the fiberglass sheet This results in a dielectric layer of desirable strength and resiliency which also features suitable dielectric qualities
The bonding material used in the composite mixture preferably is an epoxy resin, while the ceramic used is a high dielectric constant barium titanate powder produced using a hydrothermal process Reference is made to Fig 1 , illustrating an integral capacitance apparatus 15 according to the invention Conductive layers 10 and 12, such as copper foils have the dielectric layer 11 , such as a composite-impregnated fiberglass sheet disposed there between Fig 2 is an enlarged cross sectional view of the composite dielectric layer 11 showing that individual hydrothermally prepared barium titanate nanopowders 13,13' are uniformly dispersed throughout the bonding matrix 14, which has impregnated the fiberglass sheet 22 Fig 3 shows an enlarged view of a portion of the dielectric 11 , without the fiberglass sheet, where individual hydrothermally prepared nanopowders 13,13' are disposed within the epoxy matrix 14 at an average distance of separation which permits ready provision of microvias
In this first embodiment of the invention, the composite-impregnated fiberglass sheet comprises the dielectric layer 11 Subsequent to the production of the dielectric layer 11 as described above, the conductive layers 10 and 12 are disposed upon one, or usually two sides, of the dielectric layer This may be done in a lamination press, wherein the conductive layers 10,12 (e g , thin copper sheets, each about 1 or 2 mils thick) are pressed against the dielectric layer 11 , and the entire sandwiched assembly heated to cause the polymer matrix in the dialectic layer 11 to bond to the conductive sheets Accordingly, in many applications of the invention, it is desirable to employ a polymer with a relatively low glass transition temperature so that conventional lamination presses can induce the bonding between layer 11 and the conduction sheets 10,12 Besides the foregoing lamination manner of disposing the conductive layers upon the dielectric layer, alternative modes such as attachment of the conductive layers to the dielectric layer using other adhesive materials are within the scope of the invention
The method for making the apparatus of this first embodiment is further explained with reference to Fig 4 Again, in one step, a slurry is prepared by dispersing a hydrothermally prepared nanopowder in a solvent The dispersal may be accomplished with sonication, or by any other suitable means Preferably, a surfactant is supplied to the suspension to create a colloidal suspension of the nanopowder in the solvent Preferably, the bonding material, preferably an epoxy, is mixed with the slurry to prepare a composite mixture of the solvent and nanopowder with the bonding material The resulting composite mix then is impregnated into a porous supporting laminate, preferably a fiberglass sheet, so that the composite mix and the fiberglass sheet effectively form a dielectric layer Once the composite has hardened, as by curing, a conductive layer is disposed upon one or preferably both sides of the dielectric layer Preferably, in this embodiment of the method, the disposition of the conductive layer or layers is accomphshed by lamination, in which the three layers are pressed together under conditions of elevated temperature and pressure
An advantage of the invention is that the use of nano-powders allows microvias to be drilled through the dielectric layer 11 with the use of micro lasers A typical micro laser beam, encountering a nano-powder particle, is able to destroy or displace the small particle and thereby maintain the straightness and quality of the microvia In known dielectric layers including conventional powders, the size of the ceramic particles can interfere with microvia drilling with micro lasers Laser beams are scattered by the larger diameter particles, drilling is impeded, and the quality of the microvia impaired
In a second embodiment of the invention, an integral capacitor is created by coating a conductive foil or sheet 12 with a composite mixture which includes a bonding matrix material, solvent, and hydrothermally prepared nanopowders The preparation of the composite mixture is generally the same as previously described, that is, a nanopowder is suspended in a solvent to create a suspension slurry, and the bonding material, usually a polymer, is mixed with the slurry Coating of a conductive foil substrate 12 such as copper is performed by physical placement of the composite mixture on the foil and subsequent removal of the solvent For example, the uncured composite mixture may be extruded onto a conductive layer 12, and then the composite and conductive layer placed into a curing oven for about ten minutes at about 180°F In this embodiment, no fiberglass sheet is included in the dielectric layer, rather the composite mixture is by itself cured to form the dielectric layer 11 The dielectric layer 11 thus is not as mechanically strong, but, when using powders which have mean diameters of less than 50 nm, dielectric layers as thin as one micron may be obtained By this embodiment, therefore, integral capacitors yielding extremely high planar capacitance, for example at least 120,000 picofarads per square inch, may be constructed Application of the uncured composite mixture preferably is accomplished by extruding, or alternatively through spraying, rolling, dipping, or casting the composite mixture onto the conductive substrate 12
Fig 1 may also be referred to as illustrative of this second embodiment of the apparatus The composite dielectric layer 11 forming the dielectric film is placed or coated onto a self-supporting conductive layer 12, such as a copper foil Subsequently, a second conductive layer 10 is applied to the other side of the dielectric layer 11 , such as by press laminating a second foil, or by metal evaporation, to complete the integral capacitor construction Again, Fig 2 shows a cross-section of the dielectric composite layer 11 , with individual hydrothermally prepared nanopowders 13,13' uniformly dispersed throughout the binding matrix 14 Figure 3 shows an enlarged view of the dielectric layer 11 where individual hydrothermally prepared nanopowders 13,13' are dispersed within the binding matrix 14
Reference to Fig 5 provides additional information regarding the second embodiment of the method of the invention As mentioned, this embodiment includes the steps of preparing a slurry of a nanopowder dispersed in a solvent, preferably also with a surfactant The method includes mixing the bonding material, again preferably an epoxy, with the nanopowder-solvent suspension After the preparation of the composite mixture by mixing the bonding matrix material with the slurry, the forming of the dielectric layer is accomplished by extruding, spraying rolling, dipping or casting the uncured composite mixture, while a conductive layer is disposed thereon by placing the uncured composite mixture upon a self-supporting conductive layer such as a copper foil or the like The method then involves curing the composite mixture to eliminate most of the solvent, so that the dielectric layer becomes substantially solid Thereafter, as indicated in Fig 5, the basic method is completed with the disposing of a second conductive layer, such as a copper foil, on the other side of the dielectric layer, that is, the side of the layer that was not initially placed upon the first conductive layer This embodiment is characterized, therefore, by the of extruding, spraying, rolling, dipping or casting of the composite mixture directly upon at least one self-supporting conductive layer such as a metal foil This method permits the forming of extremely thin dielectric layers
In another embodiment of the invention, a capacitor for integration is created by metallizing a self- supported composite dielectric layer 11 which includes a bonding matrix material and the hydrothermally prepared nanopowders The composite dielectric layer 11 , preferably having a thickness of at least 2 0 micron, is formed by extrusion or casting The general process of this embodiment of invention is similar to the process of the second embodiment described, except that instead of incorporating at least one self-supporting conductive foil at least one of the conductive layers 10 and 12 is disposed upon the -19-
dielectnc layer 11 using a metal deposition process such as evaporation, sputtering or chemical vapor deposition Thus, the third embodiment includes at least one, "metallized" conductive layer 12, and optionally both layers 10,12 are metallized layers An advantage of metallized conductive layers 10 or 12 is that the conductive layers may be deposited with comparatively thin thicknesses, e.g , one micron or less These thinner conductive layers 10,12 deposited on the dielectric film 11 using metallization, such as vapor deposition, reduce the amount of etching required for patterning electrodes for specific integral capacitors Referring again to Fig 1 , the conductive layers 10 and 12 are created by evaporation or sputtering Fig 2 shows the cross-section of the dielectric film 11 where individual hydrothermally prepared nanopowders 13,13' are uniformly dispersed throughout the binding matrix 14
Reference is now made to Fig 6, which generally depicts the fundamental steps of this third embodiment of the method Again, the first two basic steps are common to the other embodiments, with the slurry very preferably involving the suspension of a hydrothermally prepared barium titanate nanopowder The slurry is mixed with the bonding material, and the resulting composite mixture is allowed to cure to form a dielectric layer In this embodiment, unlike the second embodiment of the method, no self-supporting conductive layers need be disposed against the dielectric layer Rather, at least one side of the dielectric layer, and optionally both sides of the dielectric layer, are metallized, preferably by metal vapor deposition This permits the incorporation of extremely thin conductive layers Finally, as shown by Fig 6, a second conductive layer is disposed upon the other side of the dielectric layer This second conductive layer may be a self-supporting metal foil, or, as mention, may be a second metallized surface
It is seen, therefore, that a single capacitor apparatus according to the invention typically has a composite dielectric layer 11 from about 2 mil to about 6 mil in thickness if the fiberglass sheet is used therein, and with conductive layers 10,12 each of about 1 to 2 mils thickness, for an overall apparatus thickness of between about 4 mil to about 10 mil In alternative embodiments constructed without the inclusion of the reinforcing fiberglass sheet, the composite dielectric layer 11 can be much thinner, approaching one mil thickness, while metallized conductive layers 10,12 produced by vapor deposition or the like can also be much thinner, with corresponding resulting dramatic decreases in the total thickness 12 02
-20-
(e g , down to about six microns) of the integral capacitor, due particularly to the uniformly small diameters of the nanopowders included in the dielectric layer of the capacitor
Also, in may applications, it may be desirable to "stack" a number of capacitors, for example from five to ten, produced according to any of the embodiments of the invention, to create a multi-capacitor component For example, five capacitors (e g , five dielectric layers alternately stacked between six conductive layers) may be laminated together for inclusion into a PCB
Example 1 Dielectric substrates with varying resin Tg and varying filler compositions were prepared and tested in this Example Specifically, the substrates included no filler, sintered and ground barium titanate filler particles, and non-refractory barium titanate filler particles
AlliedSignal 406 Resin was used alone or combined with 50 wt% barium titanate particles to form a dielectric layer Two forms of barium titanate particles were used, sintered barium titanate particles manufactured by TAM Ceramics, inc , Niagara Falls, NY, and nonrefractory barium titanate particles manufactured by TPL, Inc , in Albuquerque, NM The sintered barium titanate particles have a primary particle size of 1 micrometer, a BET surface area of 3 3m2/g and a dielectric constant of 3000 The nonrefractory barium strontium titanate particles had a particle size of about 0 05 micrometers, a BET surface area of 26 0 m /g and dielectric constant of 3000
Dielectric layers were prepared using the resin or resin/particle combination by coating a 1 oz Double Treat (DT) copper foil manufactured by Oak Mitsui with resin/particle combination, applying a second layer of 1 oz copper foil to sandwich the resin/particle combination between the two copper foil layers and laminating the product for about one hour at 350°F under a pressure from 300 to 1200 psi
Each of the three capacitors was evaluated by measuring the dielectric constant of the substrate material over a temperature range from -55°C to 125°C The unfilled resin exhibited a 25% change in the dielectric constant over the testing temperature range The composite including 50 wt% sintered banum titanate particles saw a 24 2% change in the dielectric constant over the tested temperature range while the composite including 50 wt% nonrefractory barium titanate saw its dielectric constant change only 10% over the tested temperature range
Example 2
A dielectric material including 35 vol % nonrefractory barium titanate was prepared and tested according to the method of Example 1 The change in dielectric constant over a temperature range from -55° to 125°C was plotted and is reported in Fig 7 From Fig 7, it is clear that the dielectric constant changes about 10% over the temperature range Therefore, the amount of nonrefractory barium titanate in the composition does not dramatically alter the dielectric constant stability of the resulting dielectric composition.
Example 3
A capacitor laminate including 35 vol % nonrefractory barium titanate was prepared and tested according to the method of Example 1 However, the resin system used was AlliedSignal 402 Resin which has a Tg of 140°C The change in dielectric constant over a temperature range of -55 to 125°C was 27.5%
The preceding examples can be repeated with similar success by substituting the geneπcally or specifically described reactants and/or operating conditions of this invention for those used in the preceding examples
Although the invention has been described in detail with particular reference to these preferred embodiments, other embodiments can achieve the same results Variations and modifications of the present invention will be obvious to those skilled in the art and it is intended to cover in the appended claims all such modifications and equivalents The entire disclosures of all references, applications, patents, and publications cited above are hereby incorporated by reference

Claims

-22-CLAIMS
What is claimed is
1 A composite comprising at least one organic polymer having a Tg greater than about
140°C, and at least one ferroelectric particle filler wherein the dielectric constant of the laminate varies less than 15% when the composite is subjected to a temperature of from -55 to 125°C, and preferably wherein said ferroelectric particles comprise barium-based ceramic particles, most preferably selected from the group consisting of barium titanate, strontium titanate, and mixtures thereof, and preferably wherein said ferroelectric particles comprise non-refractory particles, most preferably having an average particle size of from about 10 nm to about 60 nm, and preferably wherein the composite has a Tg greater than about 160°C, most preferably greater than about 180°C, and preferably wherein at least one resin is a thermosetting resin, most preferably selected from epoxy resins, cyanate ester resins, siiicone resins, polyamide resins, bismaleimide tnazine resins, urethane resins, and mixtures thereof, and preferably wherein the composition breakdown voltage is greater than about 2000 volts/mil, most preferably greater than about 2500 volts/mil
2 A capacitor laminate comprising the composite of claim 1 in sheet form having a top surface and a bottom surface, a first conductive layer associated with the composite top surface and a second conductive layer associated with the composite bottom surface
3 A multi-layer printed wiring board wherein at least one layer comprises the capacitor laminate of claim 2
4 A dielectric material integrally included in a printed circuit board said dielectric material comprising a ferroelectric nanopowder that is prepared using a low temperature chemical precipitation process and a bonding agent intermittently dispersed in the form of a film, said film disposed between two conducting layers
5 The dielectric material of claim 4 wherein said ferroelectric nanopowder comprises barium titanate
6 The dielectric material of claim 4 wherein said dielectric material has a planar capacitance of at least 100,000 picofarads per square inch
7 The dielectric material of ciaim 4 further comprising a surfactant, preferably a non-ionic phosphate ester
8 A dielectric material integrally included in a printed circuit board said dielectric material comprising a ferroelectric nanopowder that is prepared using a low temperature chemical precipitation process and having particle size ranging from about 10 to 200 nanometers, a polymer resin, preferably a polymer epoxy, intermittently dispersed in the form of a film, said film disposed between two conducting layers, preferably wherein said dielectric nanopowder is barium titanate
9 A method for producing a dielectric for integral inclusion in a printed circuit board comprising the steps of a) suspending a ferroelectric nanopowder in a solvent to form a suspension, b) preparing a composite mixture by adding a bonding agent to the suspension, c) forming the composite mixture into a layer d) cuπng the composite mixture layer to form a dielectric film, and e) disposing conductive layers on planar surfaces of the dielectric film -24-
10. A method for producing a dielectric for integral inclusion in a printed circuit board comprising the steps of: a) suspending a ferroelectric nanopowder that is prepared using a low temperature chemical precipitation process in an organic solvent to form a suspension; b) preparing a composite mixture by adding a polymer resin, preferably a polymer epoxy to the suspension; c) forming the composite mixture into a layer; d) curing the composite mixture layer to form a dielectric film; and e) disposing conductive layers on planar surfaces of the dielectric film.
AMENDED CLAIMS
[received by the International Bureau on 04 October 2000 (04.10.00); original claims 1 - 10 cancelled; new claims 11 - 20 added. (2 pages)]
11 A composite comprising at least one polymer having a Tg greater than about
140°C, and at least one particle filler wherein the dielectric constant of the composite varies less than 15% when the composite is subjected to a temperature of from -55 to 125°C, and preferably wherein said particles comprise ceramic particles, most preferably selected from the group consisting of barium titanate, strontium titanate, and mixtures thereof, and preferably wherein said particles comprise non-refractory particles; and preferably wherein said particle size is substantially in the range of between approximately 5 nanometers and 200 nanometers; and preferably wherein the composite has a Tg greater than about 160°C, most preferably greater than about 180°C, and preferably wherein said polymer is a resin, preferably a thermosetting resin, and most preferably selected from epoxy resins, cyanate ester resins, siiicone resins, polyamide resins, bismaleimide tnazine resins, urethane resins, and mixtures thereof; and preferably wherein the composite breakdown voltage is greater than about 2000 volts/mil, most preferably greater than about 2500 volts/mil; and preferably wherein said dielectric material has a planar capacitance of at least 100,000 picofarads per square inch; and preferably wherein said composite has a particle distribution of at least 80% of the particles having a size ranging from between appoximately 5 nanometers and 100 nanometers, and most preferably from between approximately 40 nanometers and 60 nanometers 12 A capacitor laminate comprising the composite of claim 1 1 in sheet form having a top surface and a bottom surface, a first conductive layer associated with the composite top surface, and a second conductive layer associated with the composite bottom surface
13 A multi-layer circuit board wherein at least one layer comprises the capacitor laminate of claim 12 14 A dielectric material for inclusion in a circuit board comprising nanopowders prepared using a low temperature chemical precipitation process, and at least one composite comprising said nanopowders disposed within said composite, said dielectric material having a planar capacitance of at least 100,000 picofarads per square inch
15 A dielectric material for inclusion in a circuit board comprising nanopowders prepared using a low temperature chemical precipitation process, said nanopowders comprising a particle range of between approximately 5 nanometers and 200 nanometers, and at least one composite comprising said nanopowders disposed within said composite
16 The dielectric material of claim 15 comprising a particle distribution of at least 80% of the particles having a size ranging from between approximately 5 nanometers and 100 nanometers, and preferably from between approximately 40 nanometers and 60 nanometers
17 The dielectric material of claim 15 comprising a planar capacitance of at least 100,000 picofarads per square inch
18 A dielectric material for inclusion in a circuit board comprising nanopowders prepared using a low temperature chemical precipitation process, said nanopowders comprising a particle distribution of at least 80% of the particles having a size ranging from between approximately 5 nanometers and 100 nanometers, and preferably from between approximately 40 nanometers and 60 nanometers, and at least one composite comprising said nanopowders disposed within said composite
19 The dielectric material of claim 18 comprising a planar capacitance of at least 100,000 picofarads per square inch
20 A method for producing a dielectric for integral inclusion in a circuit board comprising the steps of a) suspending nanopowders that are prepared using a chemical precipitation process in an organic solvent to form a suspension, preferably wherein the particles have a particle size substantially in the range of between approximately 5 nanometers and 200 nanometers, and preferably wherein the particle distribution is at least 80% of the particles having a size ranging from between approximately 5 nanometers and 100 nanometers and preferably from between approximately 40 nanometers and 60 nanometers, b) preparing a composite mixture by adding a polymer, preferably a polymer resin, and most preferably a polymer epoxy, to the suspension, c) forming the composite mixture into a layer, d) curing the composite mixture layer to form a dielectric film, preferably wherein the dielectric film has a planar capacitance of at least 100,000 picofarads per square inch and e) disposing conductive layers on surfaces of the dielectric film to produce a laminate, preferably wherein the dielectric constant of the laminate varies less than 15% when the composite is subjected to a temperature of between approximately -55° and 125°
PCT/US2000/012002 1998-05-04 2000-05-03 Dielectric material including particulate filler WO2000066674A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE1198532T DE1198532T1 (en) 1999-05-04 2000-05-03 DIELECTRIC MATERIAL CONTAINING A PARTICULATE FILLER
AU46944/00A AU4694400A (en) 1999-05-04 2000-05-03 Dielectric material including particulate filler
CA002373172A CA2373172A1 (en) 1999-05-04 2000-05-03 Dielectric material including particulate filler
EP00928757A EP1198532A4 (en) 1999-05-04 2000-05-03 Dielectric material including particulate filler
HK02107710.2A HK1047953A1 (en) 1999-05-04 2002-10-24 Dielectric material including particulate filler
US10/644,386 US20040109298A1 (en) 1998-05-04 2003-08-19 Dielectric material including particulate filler

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/305,253 US6616794B2 (en) 1998-05-04 1999-05-04 Integral capacitance for printed circuit board using dielectric nanopowders
US09/305,253 1999-05-04
US09/458,363 1999-12-09
US09/458,363 US6608760B2 (en) 1998-05-04 1999-12-09 Dielectric material including particulate filler

Publications (1)

Publication Number Publication Date
WO2000066674A1 true WO2000066674A1 (en) 2000-11-09

Family

ID=26974508

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/012002 WO2000066674A1 (en) 1998-05-04 2000-05-03 Dielectric material including particulate filler

Country Status (8)

Country Link
US (1) US6608760B2 (en)
EP (1) EP1198532A4 (en)
AU (1) AU4694400A (en)
CA (1) CA2373172A1 (en)
DE (1) DE1198532T1 (en)
ES (1) ES2184657T1 (en)
TW (1) TW487932B (en)
WO (1) WO2000066674A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003019656A2 (en) * 2001-08-24 2003-03-06 3M Innovative Properties Company Interconnect module with reduced power distribution impedance
WO2003099741A1 (en) * 2002-05-24 2003-12-04 Acoustical Technologies Singapore Pte Ltd Process for producing nanocrystalline composites
EP1755161A2 (en) * 2001-08-24 2007-02-21 3M Innovative Properties Company Interconnect module with reduced power distribution impedance

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040109298A1 (en) * 1998-05-04 2004-06-10 Hartman William F. Dielectric material including particulate filler
US6737364B2 (en) * 2002-10-07 2004-05-18 International Business Machines Corporation Method for fabricating crystalline-dielectric thin films and devices formed using same
JP4700332B2 (en) * 2003-12-05 2011-06-15 イビデン株式会社 Multilayer printed circuit board
US20080128961A1 (en) * 2003-12-19 2008-06-05 Tpl, Inc. Moldable high dielectric constant nano-composites
US20060074164A1 (en) * 2003-12-19 2006-04-06 Tpl, Inc. Structured composite dielectrics
US20060074166A1 (en) * 2003-12-19 2006-04-06 Tpl, Inc. Title And Interest In An Application Moldable high dielectric constant nano-composites
EP1578179A3 (en) 2004-03-16 2006-05-03 E.I. du Pont de Nemours and Company Thick-film dielectric and conductive compositions
KR100586963B1 (en) * 2004-05-04 2006-06-08 삼성전기주식회사 Composition for Forming Dielectric, Capacitor Prepared Therefrom and Printed Circuit Board Comprising The same
US7495887B2 (en) * 2004-12-21 2009-02-24 E.I. Du Pont De Nemours And Company Capacitive devices, organic dielectric laminates, and printed wiring boards incorporating such devices, and methods of making thereof
US20070004844A1 (en) * 2005-06-30 2007-01-04 Clough Robert S Dielectric material
KR100665261B1 (en) * 2005-10-13 2007-01-09 삼성전기주식회사 Composite dielectric composition having small capacity change by temperature and signal-matching embedded capacitor prepared using the same
KR20080068065A (en) * 2005-11-14 2008-07-22 더 리전트 오브 더 유니버시티 오브 캘리포니아 Cast dielectric composite linear accelerator
US20090168391A1 (en) * 2007-12-27 2009-07-02 Kouichi Saitou Substrate for mounting device and method for producing the same, semiconductor module and method for producing the same, and portable apparatus provided with the same
TWI447155B (en) * 2007-12-28 2014-08-01 Ind Tech Res Inst Flexible, low dielectric loss composition and manufacture method thereof
US10176162B2 (en) * 2009-02-27 2019-01-08 Blackberry Limited System and method for improved address entry
KR101679896B1 (en) * 2009-05-01 2016-11-25 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Passive electrical article
CN103547548A (en) 2011-03-23 2014-01-29 密苏里大学学监 High dielectric constant composite materials and methods of manufacture
CN102757229A (en) * 2012-07-03 2012-10-31 深圳光启创新技术有限公司 Conformal ceramic metamaterial and preparation method thereof
BR112018002077B1 (en) 2015-08-19 2023-02-28 Chevron U.S.A. Inc. BOTTOM WELL DRILLING SYSTEM AND HIGH VOLTAGE CAPACITOR
WO2017154167A1 (en) * 2016-03-10 2017-09-14 三井金属鉱業株式会社 Multilayer laminate plate and production method for multilayered printed wiring board using same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4087300A (en) * 1974-01-07 1978-05-02 Edward Adler Process for producing metal-plastic laminate
US4764493A (en) * 1986-06-16 1988-08-16 Corning Glass Works Method for the production of mono-size powders of barium titanate
US5162977A (en) * 1991-08-27 1992-11-10 Storage Technology Corporation Printed circuit board having an integrated decoupling capacitive element
US5172304A (en) * 1990-11-22 1992-12-15 Murata Manufacturing Co., Ltd. Capacitor-containing wiring board and method of manufacturing the same
US5796587A (en) * 1996-06-12 1998-08-18 International Business Machines Corporation Printed circut board with embedded decoupling capacitance and method for producing same

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2803553A (en) * 1953-07-03 1957-08-20 Erie Resistor Corp Barium titanate ceramic dielectrics
US3290756A (en) 1962-08-15 1966-12-13 Hughes Aircraft Co Method of assembling and interconnecting electrical components
US3304475A (en) 1965-06-07 1967-02-14 Scionics Corp Miniature capacitor and method of making the same
US3593107A (en) 1969-08-19 1971-07-13 Computer Diode Corp High voltage multiplier circuit employing tapered monolithic capacitor sections
US3673092A (en) 1970-06-05 1972-06-27 Owens Illinois Inc Multilayer dielectric compositions comprising lead-barium borosilicate glass and ceramic powder
US4000054A (en) 1970-11-06 1976-12-28 Microsystems International Limited Method of making thin film crossover structure
DE2737863C2 (en) 1977-08-23 1983-11-03 Robert Bosch Gmbh, 7000 Stuttgart Impregnated winding or stacked electrical capacitor
FR2435883A1 (en) 1978-06-29 1980-04-04 Materiel Telephonique HYBRID INTEGRATED CIRCUIT AND ITS MANUFACTURING PROCESS
JPS589877A (en) 1981-07-08 1983-01-20 松下電器産業株式会社 High dielectric constant ceramic composition
JPS5817651A (en) 1981-07-24 1983-02-01 Hitachi Ltd Multilayer circuit board and its manufacture
JPS5945928A (en) 1982-09-08 1984-03-15 Sony Corp Preparation of fine particle from strontium titanate
US4827377A (en) 1982-08-30 1989-05-02 Olin Corporation Multi-layer circuitry
US4536451A (en) * 1983-12-27 1985-08-20 International Business Machines Corporation Rigid magnetic recording media coating composition
EP0196865B1 (en) 1985-03-27 1990-09-12 Ibiden Co, Ltd. Electronic circuit substrates
US4808315A (en) 1986-04-28 1989-02-28 Asahi Kasei Kogyo Kabushiki Kaisha Porous hollow fiber membrane and a method for the removal of a virus by using the same
US4829033A (en) 1986-05-05 1989-05-09 Cabot Corporation Barium titanate powders
US4863883A (en) 1986-05-05 1989-09-05 Cabot Corporation Doped BaTiO3 based compositions
GB2193713B (en) 1986-07-14 1990-12-05 Cabot Corp Method of producing perovskite-type compounds.
JPH0821266B2 (en) 1987-03-11 1996-03-04 株式会社村田製作所 Dielectric paste
US4775573A (en) 1987-04-03 1988-10-04 West-Tronics, Inc. Multilayer PC board using polymer thick films
JP2608288B2 (en) 1987-06-19 1997-05-07 キヤノン株式会社 Ceramic, circuit board and electronic circuit board using the same
JP2568204B2 (en) 1987-07-02 1996-12-25 キヤノン株式会社 Ceramic, circuit board and electronic circuit board using the same
JP2568208B2 (en) 1987-07-09 1996-12-25 キヤノン株式会社 Ceramic, circuit substrate and electronic circuit substrate using the same, and method of manufacturing ceramic
JPS6461087A (en) 1987-09-01 1989-03-08 Sumitomo Chemical Co Resin composition for printed wiring board
DE3739853A1 (en) 1987-11-25 1989-06-08 Philips Patentverwaltung METHOD FOR PRODUCING BARIUM TITANATE IN POWDER FORM
US4908258A (en) 1988-08-01 1990-03-13 Rogers Corporation High dielectric constant flexible sheet material
USRE35064E (en) 1988-08-01 1995-10-17 Circuit Components, Incorporated Multilayer printed wiring board
US5112433A (en) 1988-12-09 1992-05-12 Battelle Memorial Institute Process for producing sub-micron ceramic powders of perovskite compounds with controlled stoichiometry and particle size
US4999740A (en) 1989-03-06 1991-03-12 Allied-Signal Inc. Electronic device for managing and dissipating heat and for improving inspection and repair, and method of manufacture thereof
US5010641A (en) 1989-06-30 1991-04-30 Unisys Corp. Method of making multilayer printed circuit board
US5445806A (en) 1989-08-21 1995-08-29 Tayca Corporation Process for preparing fine powder of perovskite-type compound
US5155655A (en) 1989-08-23 1992-10-13 Zycon Corporation Capacitor laminate for use in capacitive printed circuit boards and methods of manufacture
US5079069A (en) 1989-08-23 1992-01-07 Zycon Corporation Capacitor laminate for use in capacitive printed circuit boards and methods of manufacture
US5161086A (en) 1989-08-23 1992-11-03 Zycon Corporation Capacitor laminate for use in capacitive printed circuit boards and methods of manufacture
US5604017A (en) 1990-04-12 1997-02-18 Arlon, Inc. Multi-dielectric laminates
US5256470A (en) 1990-10-11 1993-10-26 Aluminum Company Of America Crystal growth inhibitor for glassy low dielectric inorganic composition
US5800575A (en) 1992-04-06 1998-09-01 Zycon Corporation In situ method of forming a bypass capacitor element internally within a capacitive PCB
US5261153A (en) 1992-04-06 1993-11-16 Zycon Corporation In situ method for forming a capacitive PCB
JP3225583B2 (en) 1992-04-10 2001-11-05 株式会社村田製作所 Barium titanate thin film forming method
US5428499A (en) 1993-01-28 1995-06-27 Storage Technology Corporation Printed circuit board having integrated decoupling capacitive core with discrete elements
JPH0715101A (en) 1993-06-25 1995-01-17 Shinko Electric Ind Co Ltd Oxide ceramic circuit board and its manufacture
JPH0730257A (en) * 1993-07-13 1995-01-31 Fujitsu Ltd Thin film multilayer printed circuit board with built-in capacitor
IT1270828B (en) * 1993-09-03 1997-05-13 Chon Int Co Ltd PROCESS FOR THE SYNTHESIS OF CRYSTAL CERAMIC POWDERS OF PEROVSKITE COMPOUNDS
JP3363651B2 (en) 1994-04-21 2003-01-08 キヤノン株式会社 Printed wiring board and its design method
US5504993A (en) 1994-08-30 1996-04-09 Storage Technology Corporation Method of fabricating a printed circuit board power core using powdered ceramic materials in organic binders
US5469324A (en) 1994-10-07 1995-11-21 Storage Technology Corporation Integrated decoupling capacitive core for a printed circuit board and method of making same
US5555486A (en) 1994-12-29 1996-09-10 North Carolina State University Hybrid metal/metal oxide electrodes for ferroelectric capacitors
US5638252A (en) 1995-06-14 1997-06-10 Hughes Aircraft Company Electrical device and method utilizing a positive-temperature-coefficient ferroelectric capacitor
WO1998021272A2 (en) * 1996-10-29 1998-05-22 Holl Richard A Manufacture of composites of inorganic powder and polymer materials
US6268054B1 (en) * 1997-02-18 2001-07-31 Cabot Corporation Dispersible, metal oxide-coated, barium titanate materials
JP3926880B2 (en) 1997-03-31 2007-06-06 富士通株式会社 Multilayer printed board
DE69832444T2 (en) * 1997-09-11 2006-08-03 E.I. Dupont De Nemours And Co., Wilmington Flexible polyimide film with high dielectric constant
US5972231A (en) 1997-10-31 1999-10-26 Ncr Corporation Imbedded PCB AC coupling capacitors for high data rate signal transfer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4087300A (en) * 1974-01-07 1978-05-02 Edward Adler Process for producing metal-plastic laminate
US4764493A (en) * 1986-06-16 1988-08-16 Corning Glass Works Method for the production of mono-size powders of barium titanate
US5172304A (en) * 1990-11-22 1992-12-15 Murata Manufacturing Co., Ltd. Capacitor-containing wiring board and method of manufacturing the same
US5162977A (en) * 1991-08-27 1992-11-10 Storage Technology Corporation Printed circuit board having an integrated decoupling capacitive element
US5796587A (en) * 1996-06-12 1998-08-18 International Business Machines Corporation Printed circut board with embedded decoupling capacitance and method for producing same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1198532A4 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003019656A2 (en) * 2001-08-24 2003-03-06 3M Innovative Properties Company Interconnect module with reduced power distribution impedance
WO2003019656A3 (en) * 2001-08-24 2003-11-20 3M Innovative Properties Co Interconnect module with reduced power distribution impedance
US6847527B2 (en) 2001-08-24 2005-01-25 3M Innovative Properties Company Interconnect module with reduced power distribution impedance
EP1755161A2 (en) * 2001-08-24 2007-02-21 3M Innovative Properties Company Interconnect module with reduced power distribution impedance
EP1755161A3 (en) * 2001-08-24 2007-05-02 3M Innovative Properties Company Interconnect module with reduced power distribution impedance
KR100896548B1 (en) * 2001-08-24 2009-05-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 An Interconnect Module and A Method for Forming an Interconnect Module
WO2003099741A1 (en) * 2002-05-24 2003-12-04 Acoustical Technologies Singapore Pte Ltd Process for producing nanocrystalline composites

Also Published As

Publication number Publication date
US20010036052A1 (en) 2001-11-01
ES2184657T1 (en) 2003-04-16
TW487932B (en) 2002-05-21
US6608760B2 (en) 2003-08-19
EP1198532A4 (en) 2003-04-02
DE1198532T1 (en) 2003-08-14
EP1198532A1 (en) 2002-04-24
AU4694400A (en) 2000-11-17
CA2373172A1 (en) 2000-11-09

Similar Documents

Publication Publication Date Title
US6616794B2 (en) Integral capacitance for printed circuit board using dielectric nanopowders
EP1198532A1 (en) Dielectric material including particulate filler
US20040109298A1 (en) Dielectric material including particulate filler
KR100716824B1 (en) Printed circuit board with embedded capacitors using hybrid materials, and manufacturing process thereof
KR100638620B1 (en) Printed Circuit Board Materials for Embedded Passive Device
KR100691437B1 (en) Polymer-ceramic composition for dielectrics, embedded capacitor and printed circuit board using the same
US7911029B2 (en) Multilayer electronic devices for imbedded capacitor
US20060182973A1 (en) Resin composition and ceramic/polymer composite for embedded capacitors having excellent TCC property
JP2000277369A (en) Multilayer ceramic electronic component and conductive paste thereof
KR20020069146A (en) Electronic parts and method producing the same
KR102496228B1 (en) Double-sided copper clad laminate
KR20070116948A (en) Itfc with optimized c(t)
JP2006248074A (en) Composite substrate with high dielectric constant, composite sheet with high dielectric constant, and methods for producing them
JP4207517B2 (en) Embedded substrate
KR100803499B1 (en) Thick-film dielectric and conductive compositions
JP3443808B2 (en) Manufacturing method of laminated substrate and electronic component
JP2000340955A (en) Passive component-incorporated composite multilayered wiring board and manufacture thereof
KR100631994B1 (en) Polymer-ceramic composite, and capacitor, resin coated copper and copper clad laminate using the composite
JP4372471B2 (en) Manufacturing method of electronic component built-in substrate
JP2001303102A (en) Composite dielectric material, and compacting material, compacting powder material, coating material, prepreg and substrate all using the same
KR100493888B1 (en) Polymer/Ceramic Composite Capacitor Film
JP2003200526A (en) Material for manufacturing printed wiring board, printed wiring board and method for manufacturing the same
Imanaka Future of LTCCs
JP2004277495A (en) Highly electroconductive resin composition and highly electroconductive electronic part
JPH02235627A (en) Substrate for high frequency circuit

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
ENP Entry into the national phase

Ref document number: 2373172

Country of ref document: CA

Ref country code: CA

Ref document number: 2373172

Kind code of ref document: A

Format of ref document f/p: F

WWE Wipo information: entry into national phase

Ref document number: 2000928757

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

WWP Wipo information: published in national office

Ref document number: 2000928757

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: JP