WO2000012778A1 - Method for applying a coating to a substrate - Google Patents
Method for applying a coating to a substrate Download PDFInfo
- Publication number
- WO2000012778A1 WO2000012778A1 PCT/NL1999/000533 NL9900533W WO0012778A1 WO 2000012778 A1 WO2000012778 A1 WO 2000012778A1 NL 9900533 W NL9900533 W NL 9900533W WO 0012778 A1 WO0012778 A1 WO 0012778A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- substrate
- water
- compound
- volume
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Definitions
- This invention relates to the application of a coating to various substrates, including the application of barrier layers to plastics.
- Plastic materials that have sufficient barrier properties are, for instance, PVDC, and laminates of non-barrier plastics and other plastics, such as EVOH and the like, or metals, such as aluminum, which have a good barrier function.
- the use of this kind of systems meets with other objections, for instance from an environmental point of view.
- chlorine containing plastics are less desirable specifically m garbage incineration, while, on the other hand, multilayer systems possess disadvantages from the viewpoint of reuse. Accordingly, there is a need for a system enabling a coating to be applied to a plastic or any other substrate, which coating imparts to the substrate additional useful properties.
- the present invention now provides for this need .
- the invention relates, m a first variant, to a method for applying a coating co at least one surface of a substrate, wherein the substrate s introduced into an atmosphere which contains at least one chemically reactive compound and water, and subsequently, using a corona discharge, on the surface of the substrate a coating is formed from the reactive compound.
- a coating by activating a suitable chemically reactive compound using a corona discharge, in the presence of water, to form a coating on the surface with good properties.
- Suitable reactive compounds include inter alia silicon-containing compounds which can be brought into the gas phase, such as silanes and siloxanes.
- the amount of water is more than 0.1% by volume, based on the volume of the gas phase, while the balance consists of inert gas and the chemically reactive compound. More preferably, the amount of water is at least 0.5% by volume, the upper limit being formed by the saturation vapor pressure. Obviously, it is dependent on the temperature, but will not exceed 5% by volume.
- Suitable as chemically reactive compound are inter alia the compounds given in Table 1.
- Table 1 Examples of reactive components for forming a coa ting on a substra te using the reactive corona technique .
- the choice of the compound depends on various factors. Primarily, the desired properties of the coating are of importance. What substrate the coating is to be applied to also plays a role.
- Suitable substrates are especially metals and plastics.
- the invention can be advantageously used for imparting barrier properties to plastics that do not inherently possess these properties. Examples include polyester bottles and polypropylene films. These materials are often used for packing beverages and foods. It is then of importance that no oxygen can reach them, or that no C0 2 can escape.
- a coating m the manner described heremabove, a single- layer plastic having a coating thereon that does not give any adverse effects upon subsequent processing and/or reuse is obtained in a simple manner.
- the coating is applied by contacting the surface with a gas phase m which at least one chemically reactive compound and water are present.
- the gas phase further contains inert gas, such as nitrogen, or noble gas, including argon.
- Corona treatments are known per se, for instance for promoting adhesion of inks and glues to plastics.
- a corona treatment consists in subjecting the surface to a corona discharge for a limited time (1 second to a few minutes) .
- a corona discharge is a stable electrical discharge between two electrodes in a gas having a pressure of more than 0.2 bar (typically 0.8 to 1.0 bar) .
- the discharge is maintained with an AC high voltage (voltage: 5 to 30 kV, frequency: 15 to 30 kHz) .
- One or both of the electrodes is/are coated with a dielectric.
- a schematic representation of a set-up for corona treatment is given m Fig. 1.
- the pressure at which the treatment occurs is preferably at least 0.2 bar, more particularly at least 1 bar.
- the invention further relates to a substrate having at least one surface provided with a coating m the manner described heremabove.
- Table 2 Overview of the different combinations of 0 electrodes and dielectrics for the reactive corona .
- the grounded roll is formed by a ceramic tube internally provided with a layer of 'aquadag', -5 i.e. an electrically conductive graphite coating.
- the corona electrode consists of a glass tube filled with metal balls as conducting electrode.
- the gas atmosphere in which the reactive component is introduced, and in which the corona discharge is 0 induced, has an influence on the nature of the coating formed on the substrate.
- Table 3 gives an overview of the different gas compositions using which the substrate films were provided with a coating.
- Table 3 Examples of the composi tion of the gas atmosphere in which the reactive component is included.
- Coatings were applied to substrate films, under variation of the following conditions: electrode configuration, partial pressure of the reactive component, the composition and total pressure of the gas atmosphere, the power of the corona discharge, and the duration of the treatment. Subsequently, the oxygen-permeability of the films with coating was measured.
- the gas permeability of a film is expressed in c 3 /m 2 dag.bar.
- Table 4 shows, by way of example, some results of the permeability of the PP film with coatings applied under different conditions. Summarized in the table are: the reactive component with the partial pressure, the gas atmosphere (see Table 3), the electrode configuration (see Table 2), the corona power, the treatment time, and the measured permeability to oxygen for different samples per condition.
- Table 6 shows the permeability to oxygen of the PP film and the PET film with a coating applied using the reactive corona technique.
- the permeability of the films with coating is compared with the permeability of the corresponding films without coating (PET v and PP v, respectively) .
- Table 6 Permeabili ty to oxygen of PP film and PET film wi th a coating applied by the reactive corona technique.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002341696A CA2341696A1 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
AU55346/99A AU760293B2 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
JP2000567760A JP2002523235A (en) | 1998-08-27 | 1999-08-27 | How to apply a coating to a substrate |
EP99941871A EP1115901A1 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
US09/763,764 US6649224B1 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
NO20010965A NO20010965L (en) | 1998-08-27 | 2001-02-26 | Method of applying a coating to a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1009956A NL1009956C2 (en) | 1998-08-27 | 1998-08-27 | Method of applying a coating to a substrate. |
NL1009956 | 1998-08-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000012778A1 true WO2000012778A1 (en) | 2000-03-09 |
Family
ID=19767717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/NL1999/000533 WO2000012778A1 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
Country Status (8)
Country | Link |
---|---|
US (1) | US6649224B1 (en) |
EP (1) | EP1115901A1 (en) |
JP (1) | JP2002523235A (en) |
AU (1) | AU760293B2 (en) |
CA (1) | CA2341696A1 (en) |
NL (1) | NL1009956C2 (en) |
NO (1) | NO20010965L (en) |
WO (1) | WO2000012778A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070049499A1 (en) * | 2005-08-24 | 2007-03-01 | Basf Corporation. | Pesticide composition |
JP4809022B2 (en) * | 2005-09-05 | 2011-11-02 | Hoya株式会社 | Contact lens material manufacturing method and soft contact lens manufacturing method |
US9339770B2 (en) | 2013-11-19 | 2016-05-17 | Applied Membrane Technologies, Inc. | Organosiloxane films for gas separations |
KR20210094694A (en) | 2020-01-21 | 2021-07-30 | 삼성전자주식회사 | Substrate processing apparatus, material layer deposition apparatus, and apparatus for atmospheric pressure chemical vapor deposition |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0577447A1 (en) * | 1992-06-17 | 1994-01-05 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for forming a silicon containing coating on a metallic substrate, anti-corrosion treatment process |
US5527629A (en) * | 1990-12-17 | 1996-06-18 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge |
DE19515069A1 (en) * | 1995-04-27 | 1996-10-31 | Suratech Gmbh | Prodn. of inorganic layers e.g. on glass, ceramic |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5254688A (en) * | 1975-10-30 | 1977-05-04 | Sumitomo Chem Co Ltd | Method of producing semipermeable memebrane |
-
1998
- 1998-08-27 NL NL1009956A patent/NL1009956C2/en not_active IP Right Cessation
-
1999
- 1999-08-27 EP EP99941871A patent/EP1115901A1/en not_active Withdrawn
- 1999-08-27 CA CA002341696A patent/CA2341696A1/en not_active Abandoned
- 1999-08-27 AU AU55346/99A patent/AU760293B2/en not_active Ceased
- 1999-08-27 JP JP2000567760A patent/JP2002523235A/en active Pending
- 1999-08-27 WO PCT/NL1999/000533 patent/WO2000012778A1/en not_active Application Discontinuation
- 1999-08-27 US US09/763,764 patent/US6649224B1/en not_active Expired - Fee Related
-
2001
- 2001-02-26 NO NO20010965A patent/NO20010965L/en not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5527629A (en) * | 1990-12-17 | 1996-06-18 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge |
EP0577447A1 (en) * | 1992-06-17 | 1994-01-05 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for forming a silicon containing coating on a metallic substrate, anti-corrosion treatment process |
DE19515069A1 (en) * | 1995-04-27 | 1996-10-31 | Suratech Gmbh | Prodn. of inorganic layers e.g. on glass, ceramic |
Non-Patent Citations (1)
Title |
---|
THYEN R ET AL: "Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure", FIFTH INTERNATIONAL CONFERENCE ON PLASMA SURFACE ENGINEERING, GARMISCH-PARTENKIRCHEN, GERMANY, 9-13 SEPT. 1996, vol. 97, no. 1-3, ISSN 0257-8972, Surface and Coatings Technology, Dec. 1997, Elsevier, Switzerland, pages 426 - 434, XP002101532 * |
Also Published As
Publication number | Publication date |
---|---|
NO20010965L (en) | 2001-04-25 |
CA2341696A1 (en) | 2000-03-09 |
NL1009956C2 (en) | 2000-02-29 |
AU5534699A (en) | 2000-03-21 |
US6649224B1 (en) | 2003-11-18 |
NO20010965D0 (en) | 2001-02-26 |
JP2002523235A (en) | 2002-07-30 |
AU760293B2 (en) | 2003-05-08 |
EP1115901A1 (en) | 2001-07-18 |
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