WO1999027159A1 - Metal composition containing metal acetilide, blank having metallic coating formed therewith, and method for forming the metallic coating - Google Patents
Metal composition containing metal acetilide, blank having metallic coating formed therewith, and method for forming the metallic coating Download PDFInfo
- Publication number
- WO1999027159A1 WO1999027159A1 PCT/JP1998/005139 JP9805139W WO9927159A1 WO 1999027159 A1 WO1999027159 A1 WO 1999027159A1 JP 9805139 W JP9805139 W JP 9805139W WO 9927159 A1 WO9927159 A1 WO 9927159A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal
- parts
- acetylide
- film
- paste
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
Definitions
- the present invention relates to a metal composition for forming a metal film such as an electrode or a decorative film on the surface of a material and a method of applying the same, and more particularly, to a method for converting a metal acetylide compound containing no sulfur or halogen into an organic compound.
- TECHNICAL FIELD The present invention relates to a metal composition which does not generate harmful gases to the environment such as SO x and C 1 when firing a metal film to be used as a metal agent, and which can maintain the environment cleanly and a method of applying the same. (Background technology)
- a metal powder or an organic metal complex is mixed and kneaded with a resin, an organic solvent, etc. to prepare an organic metal paste, and the second organic metal paste is prepared.
- the strip is applied to electronic components on a circuit board by screen printing or the like to form a predetermined circuit pattern, and this pattern is heated to decompose organic components.
- a method of evaporating and depositing a metal in a film form There is known a method of evaporating and depositing a metal in a film form.
- a metal solution having low viscosity is required, and an organic metal complex that is soluble in an organic solvent is selected.
- An organic metal liquid is prepared by dissolving and dispersing in the organic solvent.
- organometallic complexes are currently used in a wide range of fields such as electronic equipment, ceramics, and crafts.
- Pa Rusa beam based compound eg if sulfide Te Le Binet ol gold (C:. H, s SA u C 1,), vulcanized I ⁇ Te Le Binet Haut Le platinum (C,. H, B SP t C 1,), sulfide Te Le Binet per Rupa
- C OH! S SP d Clx
- gold balsam platinum balsam
- palladium balsam palladium balsam
- precious metal balsams such as rhodium balsam and ruthenium hum are known.
- balsam compounds contain chlorine and sulfur, they are inevitably generated as by-products such as S0 and C1 in the firing process.
- the release of these harmful substances into the environment not only adversely affects the hygiene of workers, but also has a negative effect on the natural environment in general.
- a large amount of equipment such as a desulfurization unit was required to recover these harmful substances, and it was difficult to recover 100% of the harmful substances.
- SOx and halogen are also causes of damage to the baking equipment, a metal composition for forming a safer metal film has been desired.
- SO and halogen generated during firing may adversely affect the material.
- the material is ripened to decompose and evaporate components other than metal.However, s ⁇ and halogens corrode the material, and sulfur and halogen atoms become impurities in the material. May spread. In particular, when the material was an electronic component, the electronic properties were sometimes adversely affected.
- the present invention has been made in order to improve the above-mentioned drawbacks, and uses a metal acetylide compound containing no sulfur or chlorine as an organometallic complex which is a main component of a metal composition. Suggest and.
- This metal acetylide compound has a general formula M (— C ⁇ C 1 R), where M is a metal atom, n is the valence of the metal atom M, and R is an oxygen atom-containing compound. Hydrocarbon group), and does not contain sulfur or halogen as a constituent element.
- the present invention proposes a metal composition in which the metal acetylide compound is dissolved and dispersed in an organic solvent to make an organic metal liquid.
- the present invention proposes a metal composition obtained by kneading the metal acetylide compound, a resin for adjusting viscosity, and an organic solvent to form an organic metal paste.
- a metal composition containing an additive that enhances the adhesion of the metal film is proposed.
- a metal composition in which a plurality of metal acetylide compounds having different metal elements are combined is proposed.
- metal compositions are applied on the surface of the material in a desired pattern to form a metal composition film, and the metal composition film is heated to decompose and evaporate substances other than metals.
- a metal film formation method that forms a dense metal film by sintering the metal.
- a material with a metal film of the desired pattern formed on the surface by this method propose a material with a metal film of the desired pattern formed on the surface by this method.
- the present inventors have conducted intensive studies on organometallic complexes that do not contain sulfur or halogens that cause environmental pollution and are soluble in many organic solvents, and as a result, a type of acetylene derivative It has been found that such a metal acetylide compound is suitable for the purpose of the present invention, and based on this knowledge, the present invention has been accomplished. That is, the organometallic complex used in the present invention is a metal acetylide compound represented by the general formula M (-C ⁇ C-R).
- M represents a metal atom, for example, B i, C u, In, N i, R u, R h, P d, A g, O s, I r, P t , Au, etc.
- a metal composition such as an organic metal liquid or an organic metal paste, a highly stable noble metal is often used.
- the noble metal includes Au, Ag, and platinum group (Ru, R h, P d, O s, I r, P t).
- n represents the valence of the metal atom M.
- Au is monovalent and trivalent
- Ag is monovalent and divalent
- Pt is divalent, tetravalent and hexavalent. That is, not only does the value differ depending on the type of the metal element, but also a specific metal element has multiple valences.
- Ligand of metal acetylide compound—R in C ⁇ C—R is a hydrocarbon group containing or not containing an oxygen atom, and its constituent elements are C and H, or C, H, and O You.
- the hydrocarbon group R desirably has 1 to 8 carbon atoms, and accordingly, the ligand as a whole preferably has 3 to 10 carbon atoms. The reason is that if the number of carbon atoms is small, the metal acetylide compound becomes difficult to dissolve in the solvent, and at the same time, the explosive property becomes large and the handling becomes dangerous. As the number increases, the weight of the metal in the substance becomes relatively small, and it becomes impossible to form a metal film when using an organic metal liquid or an organic metal base.
- the metal acetylide compound of the present invention when used for a metal composition, a metal weight that is soluble in a solvent and that is constant is required. In other words, when the number of carbon atoms of the ligand C CC ⁇ R is in the range of 3 to 10, the metal acetylide compound is easily soluble in the solvent, and the power and the metal weight are relatively large. Thus, it can be sufficiently used as a metal composition.
- the hydrocarbon group R contains oxygen
- it contains an aliphatic hydrocarbon group as a hydroxyl group when it contains oxygen, and in this case, it may be linear or may have a side chain. You may.
- hydrocarbon group R contains oxygen
- hydrocarbon group containing at least a cyclic hydrocarbon contained as a hydroxyl group This hydrocarbon group may have a cyclic hydrocarbon group in a straight chain or may have a cyclic hydrocarbon group in a side chain-as a matter of course, the entire R is a cyclic hydrocarbon group. Including the case of hydrogen.
- H—C 3 C—R is in the form of 1—ethyl 1-cyclobromo 1—ethyl 1 1 — cyclobutano 1 — echini 1-cyclopentanol, 1 echini i-cyclohexano 1 — propyne 1 3 — ci Cloblobanol, i-propyne 13 — cyclobutanol, 11-propyne 13 — cycloventanol 1-butyne 14 — Cyclopropanol 1-butyne 1 4 — Cyclopropanol 1, pentin 1 5 — Cyclopropanol 1
- the metal acetylide compound according to the present invention is composed only of a metal element, carbon, hydrogen, and / or oxygen, and even if it is decomposed by calcination, it is a gas.
- carbon dioxide, water vapor, and other parts depend on the firing temperature. Only hydrocarbons are produced, but no harmful substances such as s O and halogen gas are produced: Therefore, organometallic complexes that are extremely safe and clean for the environment and organisms It is.
- the organometallic paste is a mixture of a gold acetylide compound and a resin for viscosity adjustment in an organic solvent, and the viscosity is increased or decreased depending on the usage. You.
- the liquid metal composition having low viscosity may be referred to as an organometallic liquid or an organometallic base, and the boundary between the two cannot be clearly defined.
- metal acetylide compounds are soluble in a wide range of organic solvents, both polar and non-polar.
- organic solvent include petroleum-based solvents, esters such as terbineol, petal carbitol, and ethyl lactate, and cellosolve. , Alcohols, aromatics, and DEP (jetiphthalate).
- the viscosity of the organometallic base differs depending on the application conditions (printing conditions) to the material, the firing conditions and the surface state after firing, and a resin is mixed in to adjust the viscosity.
- the resin is required to be easily dissolved and dispersed in an organic solvent together with the metal acetylide compound. Since metal acetylide compounds dissolve well in many organic solvents, the choice of resins that can be dissolved and dispersed in these organic solvents is much wider than conventional balsam compounds. It becomes: For example, ethylcellulose, nitroselorose, asphalt, butyral, acrylocobalms, dan Equally, these related substances can be used as resin.
- the above-mentioned metal acetylide compound and an organic solvent are mixed to produce an organic metal liquid.
- the metal acetylide compound is 60 to 10 parts by weight
- the organic solvent is desirably 30 parts by weight to 90 parts by weight, and it is preferable to add 10 parts by weight to 1 part by weight of an additive described later thereto.
- a small amount of resin may be added.
- the amount of the metal acetylide compound is smaller than this, the metal weight is so small that a metal film cannot be formed, and when the amount is larger, the metal acetylide compound becomes organic. It cannot be dispersed in the solvent and precipitates. Therefore, an organometallic liquid having a favorable range can be provided.
- the optimum blending amount can be set according to the conditions such as the material for forming the metal film, the ripening temperature, and the film thickness.
- a metal acetyl compound, an organic solvent and a resin are mixed to produce an organic metal base.
- the compounding amounts of the components are 60 to 10 parts by weight for the metal acetylide compound, 30 to 85 parts by weight for the organic solvent, and 3 to 30 parts by weight for the resin. Department is desirable. If necessary, the additives can be added in an amount of 1 to 10 parts by weight.
- the viscosity of the organometallic base produced in this range is in the range of 5 Op (poise) to ⁇ 0000p (poise).
- the organic metal base approaches the organometallic liquid
- the viscosity becomes higher than the upper limit the metal composition is applied to the surface of the material. It will be difficult to reduce the thickness of the metal paste ..
- the viscosity of the organometallic paste can be changed independently according to the application. To produce an organometallic liquid or organometallic paste, select the necessary components from metal acetylide compounds, organic solvents, resins, and additives, and fill the container with the required weight.
- the metal composition film is fired to form a metal film.
- the entire material may be put into a heating furnace and heated to the firing temperature, or the metal composition film on the material surface may be locally heated with a gas burner or the like.
- ligands other than metals in organic solvents, resins, additives, and metal acetylide are thermally decomposed and evaporated, and the remaining metal atoms bond and grow with each other.
- Form a metal film The metal film functions as a decoration film in a decorative product, and functions as an electrode in an electronic component.
- the metal composition of the present invention has the following features. First, because it does not contain sulfur or chlorine, it does not emit harmful substances such as SOx and halogen during the firing stage, is environmentally clean, and requires no equipment such as desulfurization equipment. Become. Second, the decomposition temperature of the metal acetylide compound is about 400 degrees, which is slightly lower than the decomposition temperature of the conventional organometallic complex. In other words, since it can be fired at a relatively low temperature of 400 ° C. or more, it can be applied to many materials such as low-melting glass, and can prevent deterioration and thermal denaturation of the material. You.
- the fired metal film can be finished smoothly like a mirror surface, and can be used in fields where high precision is required, such as decorative parts, as well as electronic parts.
- Gold acetylide 40 parts, naphthenic acid bismuth 0.8 parts, rhodium acetylide 0.08 parts, ethylcellulose 6 parts, terbione When thirty-eight parts were kneaded, they became paste-like. The resulting paste was passed through a mesh to remove debris. When this gold paste was applied on pottery and glass by screen printing and then fired, a shiny golden pattern was obtained.
- Example 11 1 [Application of palladium gold paste to electronic component electrode] 18 parts of gold acetylide, 12 parts of palladium acetylide, bis (octylate) 2.5 parts of mass, 0.4 parts of rhodium acetylide, 5 parts of ethylcellulose, 17 parts of petroleum resin, 15 parts of tervineol, 25 parts of butyl carbitol, When 5 parts of DEP were kneaded, it became paste-like. The finished paste was passed through a mesh to remove debris. This palladium gold paste was patterned on ceramics by screen printing and then baked, resulting in a smooth palladium gold alloy pattern. Was obtained. When this pattern was used as an electrode of an electronic component, it was found that it was excellent in terms of electrical conduction performance, and that it could be used as an electrode for other electronic components. I got it.
- the present invention provides, as a metal source, a general formula M (—C ⁇ CR) friendship(where M is a metal atom, n is a valence of the metal atom M, and R is an oxygen atom.
- this metal liquid or metal paste is applied to a material and then baked, an extremely smooth and fine metal film can be formed, and a high-grade metal film can be formed. Since it shows luster, it can be used for decoration of ceramics and glassware. Furthermore, since the electrical conductivity of the metal film is extremely good, it can be used as an electrode for electronic components. In addition, in a metal composition containing a plurality of metal acetylide compounds, a plurality of metals can exhibit their advantages and form a high-performance metal film.
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Conductive Materials (AREA)
- Chemically Coating (AREA)
- Paints Or Removers (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/341,373 US6120586A (en) | 1998-11-13 | 1998-11-13 | Metal composition containing metal acetylide, blank having metallic coating formed therewith, and method for forming the metallic coating |
EP98953055A EP0976848B1 (en) | 1997-11-26 | 1998-11-13 | Metal composition containing metal acetilide, blank having metallic coating formed therewith, and method for forming the metallic coating |
DE69840542T DE69840542D1 (en) | 1997-11-26 | 1998-11-13 | METAL COMPOSITION WITH ACETYLIDE, THEREFORE METALLICALLY COATED COATING AND METHOD OF COATING |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9/363803 | 1997-11-26 | ||
JP36380397A JP3491021B2 (en) | 1997-11-26 | 1997-11-26 | Metal composition containing metal acetylide compound, raw material on which metal film is formed using the same, and method for forming the metal film |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999027159A1 true WO1999027159A1 (en) | 1999-06-03 |
Family
ID=18480237
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1998/005139 WO1999027159A1 (en) | 1997-11-26 | 1998-11-13 | Metal composition containing metal acetilide, blank having metallic coating formed therewith, and method for forming the metallic coating |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0976848B1 (en) |
JP (1) | JP3491021B2 (en) |
KR (1) | KR20000069225A (en) |
DE (1) | DE69840542D1 (en) |
TW (1) | TW561140B (en) |
WO (1) | WO1999027159A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007009250A (en) * | 2005-06-29 | 2007-01-18 | Daiken Kagaku Kogyo Kk | Electronic component wiring method, and electronic component |
JP2008106058A (en) * | 2006-09-28 | 2008-05-08 | Daiken Kagaku Kogyo Kk | Metal compound, its manufacturing method and conductor paste |
JPWO2010119787A1 (en) * | 2009-04-14 | 2012-10-22 | 旭化成イーマテリアルズ株式会社 | Conductive layer forming composition, conductive substrate, and method of manufacturing conductive substrate |
JP5448628B2 (en) * | 2009-08-03 | 2014-03-19 | 大研化学工業株式会社 | Method for producing basic platinum acetate salt, method for producing basic platinum acetate salt and platinum acetylide compound |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186451A (en) * | 1974-12-09 | 1976-07-29 | Air Prod & Chem | Bisu * shisu shisuushikurookuta 1 55 jen * hatsukin mataha parajiumunoseizoho |
JPH03247772A (en) * | 1990-02-22 | 1991-11-05 | Nissan Chem Ind Ltd | Composition for forming platinum thin film |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2606807A (en) * | 1948-12-03 | 1952-08-12 | Rca Corp | Electric marking |
US3316088A (en) * | 1963-02-11 | 1967-04-25 | Ibm | Process of electrophotography based on electrophotolytic reactions and element therefor |
US3800030A (en) * | 1972-05-02 | 1974-03-26 | Polaroid Corp | Process for purifying silver compounds |
JPH04186229A (en) * | 1990-11-20 | 1992-07-03 | Matsushita Electric Ind Co Ltd | Transparent electrode with auxiliary electrode and its manufacture |
US5464990A (en) * | 1992-09-25 | 1995-11-07 | Fuji Xerox Co., Ltd. | Voltage non-linear device and liquid crystal display device incorporating same |
KR100294581B1 (en) * | 1994-12-09 | 2001-09-17 | 후지무라 마사지카, 아키모토 유미 | Metal oxide thin film pattern forming composition and its manufacturing method, metal oxide thin film pattern forming method, electronic component and optical part manufacturing method, and thin film forming method |
JP3674870B2 (en) * | 1997-09-30 | 2005-07-27 | 大研化学工業株式会社 | Metal acetylide compound and method for producing the same |
-
1997
- 1997-11-26 JP JP36380397A patent/JP3491021B2/en not_active Expired - Fee Related
-
1998
- 1998-11-13 DE DE69840542T patent/DE69840542D1/en not_active Expired - Lifetime
- 1998-11-13 EP EP98953055A patent/EP0976848B1/en not_active Expired - Lifetime
- 1998-11-13 WO PCT/JP1998/005139 patent/WO1999027159A1/en not_active Application Discontinuation
- 1998-11-13 TW TW087118843A patent/TW561140B/en not_active IP Right Cessation
- 1998-11-30 KR KR1019997004810A patent/KR20000069225A/en active Search and Examination
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186451A (en) * | 1974-12-09 | 1976-07-29 | Air Prod & Chem | Bisu * shisu shisuushikurookuta 1 55 jen * hatsukin mataha parajiumunoseizoho |
JPH03247772A (en) * | 1990-02-22 | 1991-11-05 | Nissan Chem Ind Ltd | Composition for forming platinum thin film |
Non-Patent Citations (1)
Title |
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See also references of EP0976848A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP0976848B1 (en) | 2009-02-11 |
EP0976848A1 (en) | 2000-02-02 |
TW561140B (en) | 2003-11-11 |
KR20000069225A (en) | 2000-11-25 |
DE69840542D1 (en) | 2009-03-26 |
JPH11158184A (en) | 1999-06-15 |
JP3491021B2 (en) | 2004-01-26 |
EP0976848A4 (en) | 2005-02-23 |
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