WO1997011494A1 - X-ray detector - Google Patents
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- WO1997011494A1 WO1997011494A1 PCT/US1996/015036 US9615036W WO9711494A1 WO 1997011494 A1 WO1997011494 A1 WO 1997011494A1 US 9615036 W US9615036 W US 9615036W WO 9711494 A1 WO9711494 A1 WO 9711494A1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PIN type
Definitions
- This invention is relates to X-ray detectors, and more particularly, to X-ray detectors that include a wide-bandgap semiconductor alloy, or alloys, and are adapted for uncooled operation.
- X-ray detection as used herein is meant to include the detection of electromagnetic radiation whose wave length is generally in the range of from about 0.1 angstroms to about 100.0 angstroms.
- X-ray detectors should be radiation-sensitive, radiation-hard, and should not be physically bulky.
- semiconductor detectors have been developed for the detection of X-ray radiation. Examples are X- ray detectors that are made from c-Si, Ge, CdTe,
- Si silicon
- Germanium (Ge) detectors must be operated at cryogenic temperatures in order to reduce thermally-generated leakage current, and in order to reduce Li diffusion in Li-diffused detectors.
- micro-coolers have been developed, they add cost, weight and power consumption, and they generate vibrations.
- Position-sensitive and physically large X-Y area detectors are desirable for use in X-ray crystallography, as well as in medical and industrial radiography; for example, as an electron "film” substitute for photographic film.
- Such an electron "film” would have broader dynamic range and would provide real-time digital-read-out capability.
- a large, multi-pixel, array of X-ray detectors that requires vacuum cryostat and low temperature would be extremely bulky and would be costly to use.
- an X-ray detector that is superbly radiation hard, that is highly sensitive, that operates at room temperature, that has low operating and material cost, that is environmentally sound, and that can be built to form a large, multi-pixel, planar, array of X-ray detectors.
- Patents 4,614,961, 4,616,248, and 5,182,670 by M. A. Kahn et al, and U.S. Patent 5,278,435 to Van Hove et al are generally of interest.
- Patent '961 describes a UV detector that is prepared from AlGaN by the use of Metal-Organic-Chemical-Deposition (MOCVD) .
- MOCVD Metal-Organic-Chemical-Deposition
- patent '248 comprises an aluminum oxide substrate, a single crystalline gallium nitride layer, a single crystalline AlGaN layer, and a very thin layer of cesium.
- the teachings of patents '670 and '435 again relate to devices using AlGaN layers.
- the present invention provides a single-pixel X- ray semiconductor detector, and a multiple-pixel array of semiconductor X-ray detectors, that are radiation- hard, that are radiation-sensitive, and that operate at room temperature.
- the present invention finds utility in the fields of radiography, nuclear physics research, X-ray crystallography, X-ray and gamma-ray astronomy and environmental monitoring.
- an active i-type semiconductor layer of InGaN is located between an upper p-type AlGaN semiconductor layer that comprises a window to X-ray radiation, and a lower n-type GaN layer.
- the X-ray detector semiconductor assembly is based upon the material (InGa)N, wherein this material is preferably grown on a nearly latticed- matched substrate.
- the lattice constant is about 3.246 angstroms, very close to the lattice constant of 3.252 of a ZnO substrate.
- the X-ray detector comprises a p-i-n semiconductor diode that is reverse voltage biased, such that in the presence of X-ray radiation an electrical current flows external to the detector.
- a number of individual single-pixel X-ray detectors are arranged in a multi-pixel array, and each individual pixel of the array is electrically read-out by the intersection of an active row-conductor and an active column-conductor that operate to apply a reverse bias to the one detector pixel that is physically located at the intersection of the active row-conductor and the active column conductor.
- the X-ray detector of the present invention has little or no memory, and as a result, the X-ray detector is electrically read-out during the time interval that an object to be investigated by the use of X-rays is being radiated by the X-rays.
- electrical read-out occurs during an X-ray pulse interval that is usually less than one second long.
- X-ray detectors in accordance with this invention include a p-type layer that preferably serves as a window, or entry side for the X-ray radiation that is to be detected, this is not to be taken as a limitation on the spirit and scope of the invention, since the X-ray radiation that is to be detected can also enter the X-ray detector from its opposite side; i.e., through the n-type layer.
- An object of this invention is to provide a p-i-n semiconductor diode that is useful for detecting X-ray radiation, wherein an i-type InGaN semiconductor layer has a first surface portion and a second surface portion, wherein a p-type semiconductor region exists on this first surface portion, wherein a n-type semiconductor region exists on this second surface portion, wherein a first electrical contact is located on the p-type semiconductor region, and wherein a second electrical contact is located on the n-type semiconductor region.
- An additional object of the present invention is to provide a multi-pixel X-ray detector array wherein each pixel is constructed and arranged as stated above, and in which the above-described first and second electrical contacts comprise the column and row pixel- interrogation conductors of the array.
- FIG. 1 is a side view of a single-pixel, p-i-n semiconductor diode X-ray detector in accordance with the present invention, as seen in the X-Z plane.
- FIG. 2 is a side view of another embodiment of a single-pixel, p-i-n semiconductor diode X-ray detector in accordance with the present invention, as seen in the X-Z plane.
- FIG. 3 is a top or X-Y plane view of a circular detector in accordance with FIG. 1.
- FIG. 4 shows a circuit that is used to reverse- bias the p-i-n diode X-ray detector of FIGS. 1, or the X-ray detector of FIG. 3.
- FIG. 5 shows a physically large X-Y array of X-ray detectors that comprises the number "n” of detector columns, and the number "m” of detector rows.
- FIG. 6 is an enlarged side view of the detector array of FIG. 5, taken in the X-Z plane, showing three individual X-ray pixel detectors, along with three linear Y-direction column-conductors and one linear X- direction row-conductor, which conductors are used to interrogate the three detector pixels.
- FIG. 7 is a top or X-Y plane view of a circular detector in accordance with FIG. 2.
- FIG. 8 is a side sectional view in the X-Z plane of another form of p-i-n diode X-ray detector of the present invention that is similar to FIG. 1 in which an interdigitated finger electrode configuration is provided.
- FIG. 9 is a side sectional view in the X-Z plane of another form of an X-ray detector of the present invention wherein the n-i-p regions of the X-ray detector are formed as separate regions within a single layer of InGaN.
- FIG. 10 is a side sectional view in the X-Z plane of another form of an X-ray detector of the invention, wherein the top and bottom surfaces of an insulating InGaN layer are each provided with a metal contact layer.
- a single-pixel, p-i-n semiconductor diode X-ray detector of the present invention is generally designed as 10.
- a ZnO substrate is not shown in FIG. 1.
- the single-pixel X-ray detectors that are shown and described relative to the various embodiments of this invention can easily be fabricated into large, multi-pixel, and generally X-Y planar, detector arrays that can be read-out pixel-by- pixel in order to form a visual display of an X-Y coordinate X-ray radiation pattern.
- X-ray detector 10 of FIG. 1 comprises a semiconductor body 12 of single crystalline i-type conductivity (intrinsic) InGaN, having two opposed and generally parallel planar surfaces 14 and 16.
- a semiconductor body 12 of single crystalline i-type conductivity (intrinsic) InGaN having two opposed and generally parallel planar surfaces 14 and 16.
- On surface 14 of body 12 is a generally uniform Z- thickness semiconductor layer 18 of n-type conductivity GaN.
- On surface 16 of body 12 is a generally uniform Z-thickness semiconductor layer 20 of p-type conductivity AlGaN.
- a generally uniform thickness first metal contact 22 of Al/Ti is located on the lower surface of GaN layer 18, and a generally uniform thickness second metal contact 24 of Au/Ti is located on the upper surface of AlGaN layer 20.
- X-ray detector 10 may be of a number of geometric shapes, including circular, square and rectangular.
- FIG. 3 is a top view in the X-Z plane of a circular version of FIG. l's X-ray detector 10.
- the semiconductor material In 0.16 Ga 0 84 N was usec -- to form i-type layer 12.
- This material has an X-ray absorption that is comparable to that of Ge, assuming the material is working at the photoelectric absorption region; i.e., in the spectral region where a photon is converted into electron/hole pairs. Also, this material has an energy bandgap of about 3.16 eV, and a lattice constant of about 3.246 angstroms.
- Upper p-type AlGaN layer 20 serves as a window to allow X-ray radiation 100 that travels in the Z direction to enter i-type InGaN body 12.
- An undoped InGaN layer, or body 12 tends to be n-type.
- a controlled amount of Mg, Zn, Cd or Ca may be added to body 12 to make it insulating.
- the In, Ga and Al composition can be graded to achieve a good electric field profile.
- X-ray detector 10 surpasses the performance characteristics of cooled Ge-based X-ray detectors in the following ways. Because of the much wider bandgap of InGaN body 12, the thermal background of carriers is small, thus making room-temperature and low noise operation possible. Detector 10 is not responsive to most of the visible light spectrum, and is easy to use; i.e., it is user-friendly. In addition, an evacuated container is not needed to transport detector 10. An X-ray detector without cryostat and liquid nitrogen is more carefree, less bulky and more economical to operate. Furthermore, because there is no need for vacuum and cryostat, it is feasible to build large detector arrays (several feet square) to replace X-ray films that are currently used in radiography and crystallography.
- FIG. 2 another form of an X-ray detector of the present invention is generally designed as 30.
- Detector 30 as viewed from above, is generally rectangular.
- the X-Y shape of detector 30 may take a variety of geometric shapes
- FIG. 7 is a top view of a circular detector 30.
- X-ray detector 30 comprises a generally flat and uniform Z-direction thickness substrate 32 of ZnO having an upper surface 34.
- a generally uniform thickness semiconductor buffer-layer 35 of GaN or AlN On the upper surface 34 of substrate 32 is a generally uniform thickness semiconductor buffer-layer 35 of GaN or AlN.
- a generally uniform thickness n-type GaN semiconductor layer 38 is located on the upper surface 42 of GaN buffer-layer 35.
- a relatively thick and uniform thickness semiconductor layer 40 of i-type conductivity (electrically insulating) InGaN is located on only the portion 50 of the upper surface 44 of n-type GaN 38.
- a generally uniform thickness layer 51 of p-type conductivity AlGaN semiconductor is located on the upper surface 52 of i-type InGaN layer 40.
- a first metal contact, or contact layer 53 of Al/Ti, is located on a portion 55 the upper surface 56 of n-type GaN layer 38.
- a second metal contact or layer 59 of Au/Ti is located on the upper surface 60 of p-type AlGaN layer 51.
- ZnO substrate 32 is optional. It is known that ZnO material attenuates X- ray radiation, and should detector 30 be used with X- ray radiation entering detector 30 from the under side, i.e., through GaN buffer-layer 35, it may be desirable to remove ZnO substrate 32 after detector 30 has been fabricated.
- an alternate material for substrate layer 32 is aluminum oxide, i.e., A1 2 0 3 .
- a reverse bias or negative DC voltage
- a positive DC voltage is applied to contact 22 of FIG. 1, or to contact 53 of FIG. 2.
- the p-i-n X-ray detector structure 18,12,20 of FIG. 1, and 38,40,51 of FIG. 2 is reverse-biased.
- reverse-biased detector 10 of FIGS. 1 and 3 or reverse-biased detector 30 of FIG. 2 is thereafter subjected to X-ray radiation, preferably X-ray radiation that travels in the Z-direction, electron/hole pairs are generated within the i-type InGaN layers 12,40 of detectors 10,30.
- FIG. 4 show an electrical circuit that operates to reverse voltage bias detector 10 of FIG. 1, and additionally shows the use of a current sensitive means 70 to detect the external current that flows when detector 10 is subjected to X-ray radiation.
- the DC bias voltage 71 of about 15 VDC that is applied to contacts 24,22 of detector 10, or to contacts 59,53 of FIG.
- this figure shows a physically large X-Y detector array 81 that comprises the number "n” of detector columns and the number “m” of detector rows, wherein “n” and “m” are both integers that may, or may not be of equal magnitude.
- detector array 81 comprises the number "n-times-m” of individual X-ray detectors 80 that are constructed and arranged in accordance with this invention.
- the number "n” of column-conductors, and the number "m” of row-conductors are provided.
- one column-conductor Cn-3, and one row-conductor Rm-2 are shown.
- pixel interrogation voltages are applied to one column- conductor and one row-conductor, for example, column- conductor Cn-3 and row-conductor Rm-2, only one pixel is read-out (for example, pixel 82 of FIG. 5) .
- the above- described column-conductors of FIG. 5 may comprise conductor 22 of FIG. 1, or conductor 53 of FIG. 3., whereupon the above described row-conductors will comprise conductor 24 of FIG. 1, or conductor 59 of FIG. 2.
- this configuration can be reversed from the above-stated order; i.e., the column conductors may comprise p-i-n diode conductors 24 or 59, as the row conductors comprise p-i-n diode conductors 22,53.
- FIG. 6 is an enlarged side view of the detector array 81 of FIG. 5, taken in the X-Z plane, and showing three individual X-ray pixel detectors 94,95,96 of the present invention, along with the three linear Y- direction column-conductors 91,92,93 and one linear X- direction row-conductor 90, which conductors are used to interrogate the three detector pixels 94,95,96 in the manner above described.
- the individual pixels 80 of array 81 may be generally in the multimicron-by- multimicron or centimeter-by-centimeter size, and an example is in the range of from about 3 mm to 5 mm square, as is measured in the X-Y plane.
- FIG. 6 shows that the three layers (i.e., n-type, i-type, p-type) of each individual X-ray detector 94,95,96 are supported by an inert substrate member 97 through which column-conductors 91,92,93 extend.
- Each of the detector pixels 80 of FIG. 5 is surrounded by a small Z-direction space 98 that may be formed in a large three-layer semiconductor member, as by the use of chemical etching, laser cutting, or mechanical cutting.
- Space 98 may also be filled by a passive material, such as insulating AlN, Al 2 0 3 or Si0 2 , or a passive layer of AlN, Al 2 0 3 or Si0 2 and a filler of polymer or epoxy.
- a passive material such as insulating AlN, Al 2 0 3 or Si0 2 , or a passive layer of AlN, Al 2 0 3 or Si0 2 and a filler of polymer or epoxy.
- FIG. 8 is a side sectional view in the X-Z plane of another form of a p-i-n diode X-ray detector 80 of the present invention that is similar to FIG. 1.
- FIG. 8 an interdigitated finger electrode configuration is shown wherein p-type layer 22 comprises five individual sections 118, and each p-type section 118 has its own individual electrical contact 122. While five sections 118 are shown, this number is not critical to the invention.
- the detector assembly of FIG. 8 is again reverse biased by connecting its contact 24 to a source of positive DC voltage.
- the contacts 122 are alternately connected to a source of negative DC voltage by way of conductors 200,201.
- the resolution of the X-ray detector can be improved by using the above-described interdigitated finger electrodes.
- a small magnitude voltage that is supplied across conductors 200,201 functions as a grid to remove the collection of the slow moving carriers (normally holes) , thus enhancing the resolution of the X-ray detector.
- FIG. 9 is a side sectional view in the X-Z plane of another form of an X-ray detector 300 of the present invention, wherein the n-i-p regions of the X-ray detector are formed as separate regions within a single layer 301 of InGaN.
- detector 300 is generally of the same geometric shape as detector 10 of FIG. 1. More specifically, and with reference to FIG. 9, as layer 301 of InGaN is grown, the doping is altered so that its major midportion 302 comprises i-type conductivity, so that its relatively thin upper portion 303 comprises higher n-type conductivity, and so that its relatively thin lower portion 304 comprises p-type conductivity.
- the single-pixel of the FIG. 9 X-ray detector is readout by applying a reverse-bias voltage to contacts 305 and 306.
- X-ray detector 30 of FIG. 2 the various layers of the detector are grown on substrate 32 using the well-known process of MOCVD.
- N-type GaN layer 38 is grown from triethylgallium (TEG) or trimethylgallium (TMG) and ammonia (NH 3 ), with the addition of a controlled amount of Si.
- TAG triethylgallium
- TMG trimethylgallium
- NH 3 ammonia
- i-type InGaN layer 40 is grown from TEG, TEI (triethylindium) , or TMG and TMI (trimethylindium) , and ammonia at a temperature of about 750-degrees C. Controlled amounts of Mg, Zn, Cd or Ca are introduced to change the compensation level so as to deposit i-type material 40.
- the partially-manufactured detector 30 is then heated to about 1030-degrees C in order to grow p-type conductivity AlGaN layer 51 using TEA, TEG, NH 3 and c P 2 Mg with hydrogen or helium dilution. After the layer depositions as above described, partially-manufactured detector 30 is annealed in dry nitrogen at about 700-degrees C, and then cooled down.
- Electrical contact layers 53 and 59 are deposited by any well-known technique, such as vacuum evaporation or sputtering. If desired, contact layers 53,59 can be further annealed in order to improve their characteristics.
- the percentage-amount "x" of the element "In” that is contained in the semiconductor material InxGal-xN that comprises active layers 12,40 of FIGS. 1 and 3, respectively, is in the range from about 0% to about 40%. While higher percentages of the element "In” may be desirable for the active layers 12,40, these higher percentages are generally more difficult to achieve.
- doping of the detector's active InGaN layers 12,40 was provided in order to increase the resistivity of layers 12,40, and in this manner, a resistivity generally above 10' ohm-cm was provided.
- the Z-direction thickness of the resistive InGaN i-type layer of X-ray detectors in accordance with this invention is dictated by the X-ray absorption coefficient, and is about 1mm.
- the Z-direction thickness of the GaN n-type layer of X-ray detectors in accordance with this invention is about 3.0 micrometer.
- the Z-direction thickness of the AlGaN p-type layer of X-ray detectors in accordance with this invention is about 1.0 micrometer.
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Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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EP96933060A EP0792522A4 (en) | 1995-09-19 | 1996-09-19 | X-ray detector |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US53050795A | 1995-09-19 | 1995-09-19 | |
US08/530,507 | 1995-09-19 |
Publications (1)
Publication Number | Publication Date |
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WO1997011494A1 true WO1997011494A1 (en) | 1997-03-27 |
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Application Number | Title | Priority Date | Filing Date |
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PCT/US1996/015036 WO1997011494A1 (en) | 1995-09-19 | 1996-09-19 | X-ray detector |
Country Status (1)
Country | Link |
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WO (1) | WO1997011494A1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000261025A (en) * | 1999-03-12 | 2000-09-22 | Toyoda Gosei Co Ltd | Light receiving device |
US6332888B1 (en) | 1998-02-12 | 2001-12-25 | Urogyn Ltd. | Finger-guided surgical instrument |
EP1620899A2 (en) * | 2003-05-02 | 2006-02-01 | Picometrix Inc. | Pin photodetector |
US7515684B2 (en) * | 2001-12-04 | 2009-04-07 | X-Ray Optical Systems, Inc. | Detection apparatus for x-ray analysis, including semiconductor detectors having uncooled active areas |
DE102011118684B3 (en) * | 2011-11-03 | 2013-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Direct-conversion semiconductor detector for detecting e.g. X-ray, has semiconductor device that is stretched by mechanical expansion device and is mechanically clamped and is heated to join with ceramic substrate of base |
CN107342346A (en) * | 2017-07-03 | 2017-11-10 | 京东方科技集团股份有限公司 | A kind of photodiode, X-ray detector and preparation method thereof |
US10749063B2 (en) | 2017-12-27 | 2020-08-18 | Lg Display Co., Ltd. | X-ray detector |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6332888B1 (en) | 1998-02-12 | 2001-12-25 | Urogyn Ltd. | Finger-guided surgical instrument |
JP2000261025A (en) * | 1999-03-12 | 2000-09-22 | Toyoda Gosei Co Ltd | Light receiving device |
US7515684B2 (en) * | 2001-12-04 | 2009-04-07 | X-Ray Optical Systems, Inc. | Detection apparatus for x-ray analysis, including semiconductor detectors having uncooled active areas |
EP1620899A2 (en) * | 2003-05-02 | 2006-02-01 | Picometrix Inc. | Pin photodetector |
EP1620899A4 (en) * | 2003-05-02 | 2007-08-01 | Picometrix Llc | Pin photodetector |
US7468503B2 (en) | 2003-05-02 | 2008-12-23 | Picometrix, Llc | Pin photodetector with mini-mesa contact layer |
DE102011118684B3 (en) * | 2011-11-03 | 2013-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Direct-conversion semiconductor detector for detecting e.g. X-ray, has semiconductor device that is stretched by mechanical expansion device and is mechanically clamped and is heated to join with ceramic substrate of base |
CN107342346A (en) * | 2017-07-03 | 2017-11-10 | 京东方科技集团股份有限公司 | A kind of photodiode, X-ray detector and preparation method thereof |
US10749063B2 (en) | 2017-12-27 | 2020-08-18 | Lg Display Co., Ltd. | X-ray detector |
GB2570401B (en) * | 2017-12-27 | 2020-09-09 | Lg Display Co Ltd | X-Ray detector |
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