WO1996021238B1 - Electron beam device with single crystal window and matching anode - Google Patents
Electron beam device with single crystal window and matching anodeInfo
- Publication number
- WO1996021238B1 WO1996021238B1 PCT/US1996/000272 US9600272W WO9621238B1 WO 1996021238 B1 WO1996021238 B1 WO 1996021238B1 US 9600272 W US9600272 W US 9600272W WO 9621238 B1 WO9621238 B1 WO 9621238B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- membrane
- single crystal
- gas impermeable
- electron
- electrons
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract 6
- 239000012528 membrane Substances 0.000 claims abstract 25
- 239000012530 fluid Substances 0.000 claims abstract 6
- 239000000463 material Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 230000037361 pathway Effects 0.000 claims 2
- 239000007787 solid Substances 0.000 claims 2
- 210000004940 Nucleus Anatomy 0.000 claims 1
- 125000004429 atoms Chemical group 0.000 claims 1
- 238000005516 engineering process Methods 0.000 claims 1
- 230000000737 periodic Effects 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 230000000414 obstructive Effects 0.000 abstract 1
- 230000035515 penetration Effects 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Abstract
A vacuum tube electron beam device (15) includes a thin single crystal, electron permeable, gas impermeable membrane (20) for electron transmission. The single crystal membrane may include a small thickness due to high strength, and is highly transmissive to free the electrons due to the small thickness. The ordered crystalline structure of such membrane provides minimal obstructions to electron beams, and yet is highly impermeable to penetration by gas and liquid molecules. A doped silicon anode (19) can provide support for the membrane with matching thermal expansion characteristics, and a crystalline anode can be integral with the membrane. A double membrane embodiment confines the cooling fluid so that it passes close to both membranes.
Claims
1. An electron beam device comprising, a body formed from gas impermeable material and defining a chamber having an aperture disposed at one end, a crystalline substrate positioned on said body to cover said aperture, said crystalline substrate attached to said body forming a fluid-tight seal therewith, with said body forming a generally vacuous chamber, said crystalline substrate including a thin, electron permeable, gas impermeable, single crystal membrane, disposed adjacent to said aperture, said membrane having first and second opposed major surfaces, means, distally positioned with respect to said membrane, for generating electrons within said chamber, means, in electrical communication with said generating means, for accelerating said electrons toward said membrane.
2. The device of claim 1 wherein said means for acceler¬ ating said electrons toward said membrane includes a crystalline anode connected to said membrane.
3. The device of claim 1 further comprising a crystalline layer affixed to said body pierced by an aperture traversed by at least one supporting structure adjoining said second major surface.
4. The device of claim 1 further comprising, a solid layer affixed to said body and defining an aperture adjacent said second major surface, said solid layer having a plurality of microchannels in fluid communication with said aperture.
5. The device of claim 4 further comprising a fluid flowing in said microchannels and past said second major surface.
6. The device of claim 1 wherein at least one of said major surfaces includes a plurality of recessed areas defining at least one ridge separating said plurality of recessed areas.
7. The device of claim 1 wherein said membrane is compressed along at least one of said first and second major surfaces.
8. The device of claim 2 further comprising means, connected to said anode, for monitoring a current of said electrons striking said anode.
9. The device of claim 1 further comprising, a second electron permeable, gas impermeable, single crystal membrane spaced proximate to said second major surface, and a heat exchanging fluid disposed between said membranes.
10. The device of claim 9 wherein said fluid has a pres¬ sure that is greater than a pressure within said chamber and less than an ambient pressure outside said body, whereby said fluid reduces a differential pressure on said membranes compared to that between said chamber and said ambient pressure. -22-
S ATE ENTUNDER ARTICLE 19
In response to the International Search Report, claim 1 was rewritten to point out that the electron beam device includes an electron permeable, gas impermeable, membrane formed from a single crystal. Having an electron permeable, gas impermeable, membrane formed from a single crystal distinguishes the claimed invention from the prior art cited in the International Search Report.
Applicant's electron beam device has a single crystal electron permeable, gas impermeable membrane disposed adjacent to an aperture of a body formed from gas impermeable material, forming a generally vacuous chamber with a means for generating electrons being disposed in the chamber. The advantages of employing an electron permeable, gas impermeable, membrane formed from a single crystal is that it increases the probability of electrons exiting the electron beam device. Specifically, a single crystal includes a periodic lattice structure which defines a plurality of unobstructed pathways through which electrons can travel. By forming an electron permeable, gas impermeable, membrane from a single crystal, Applicant has orientated the nuclei of the atoms that form the membrane so as to create a series of pathways that are substantially free of atomic obstacles, thereby increasing the probability that electrons can penetrate the same.
The prior art, on the other hand, does not recognize the problems encountered by Applicant nor the advantages of using single crystal technology in electron permeable, gas impermeable, membranes. To that end, the prior art employs electron perme¬ able, gas impermeable, membranes formed from polycrystalline materials.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52126596A JP3899524B2 (en) | 1995-01-05 | 1996-01-03 | Electron beam device with single crystal window and matching anode |
EP96903392A EP0871972B1 (en) | 1995-01-05 | 1996-01-03 | Electron beam device with single crystal window and matching anode |
DE69635189T DE69635189T2 (en) | 1995-01-05 | 1996-01-03 | ELECTRON BEAM UNIT WITH A CIRCULAR WINDOW AND ADJUSTED ANODE |
AU47495/96A AU685350B2 (en) | 1995-01-05 | 1996-01-03 | Electron beam device with single crystal window and matching anode |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US369,127 | 1982-04-16 | ||
US08/369,127 US5612588A (en) | 1993-05-26 | 1995-01-05 | Electron beam device with single crystal window and expansion-matched anode |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1996021238A1 WO1996021238A1 (en) | 1996-07-11 |
WO1996021238B1 true WO1996021238B1 (en) | 1996-08-29 |
Family
ID=23454190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1996/000272 WO1996021238A1 (en) | 1995-01-05 | 1996-01-03 | Electron beam device with single crystal window and matching anode |
Country Status (9)
Country | Link |
---|---|
US (1) | US5612588A (en) |
EP (1) | EP0871972B1 (en) |
JP (1) | JP3899524B2 (en) |
KR (1) | KR100385583B1 (en) |
AU (1) | AU685350B2 (en) |
CA (1) | CA2209593A1 (en) |
DE (1) | DE69635189T2 (en) |
TW (1) | TW282551B (en) |
WO (1) | WO1996021238A1 (en) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5909032A (en) * | 1995-01-05 | 1999-06-01 | American International Technologies, Inc. | Apparatus and method for a modular electron beam system for the treatment of surfaces |
JP3649743B2 (en) | 1996-06-12 | 2005-05-18 | ウシオ電機株式会社 | Actinic radiation source with anode window region formed by thin monolithic silicon film |
US6002202A (en) * | 1996-07-19 | 1999-12-14 | The Regents Of The University Of California | Rigid thin windows for vacuum applications |
DE19810922A1 (en) * | 1998-03-13 | 1999-09-30 | Karlsruhe Forschzent | Gas target window |
US7264771B2 (en) * | 1999-04-20 | 2007-09-04 | Baxter International Inc. | Method and apparatus for manipulating pre-sterilized components in an active sterile field |
US6140657A (en) * | 1999-03-17 | 2000-10-31 | American International Technologies, Inc. | Sterilization by low energy electron beam |
US6239543B1 (en) * | 1999-08-23 | 2001-05-29 | American International Technologies, Inc. | Electron beam plasma formation for surface chemistry |
US7424764B2 (en) * | 1999-09-01 | 2008-09-16 | Hagleitner Hygiene International Gmbh | Brush with locking and detaching structure for disposable head |
TW464947B (en) | 1999-11-29 | 2001-11-21 | Ushio Electric Inc | Measuring apparatus of electron beam quantity and processing apparatus of electron beam irradiation |
US7243689B2 (en) | 2000-02-11 | 2007-07-17 | Medical Instill Technologies, Inc. | Device with needle penetrable and laser resealable portion and related method |
DE10050810A1 (en) * | 2000-10-13 | 2002-04-18 | Philips Corp Intellectual Pty | Process for producing an electron beam transparent window and an electron beam transparent window |
DE10050811A1 (en) * | 2000-10-13 | 2002-04-18 | Philips Corp Intellectual Pty | Electron beam transparent window |
US7331944B2 (en) | 2000-10-23 | 2008-02-19 | Medical Instill Technologies, Inc. | Ophthalmic dispenser and associated method |
MXPA03003556A (en) | 2000-10-23 | 2005-04-11 | Medical Instill Tech Inc | Fluid dispenser having a rigid vial and flexible inner bladder. |
US6559424B2 (en) | 2001-01-02 | 2003-05-06 | Mattson Technology, Inc. | Windows used in thermal processing chambers |
US7186241B2 (en) * | 2001-10-03 | 2007-03-06 | Medical Instill Technologies, Inc. | Syringe with needle penetrable and laser resealable stopper |
US7798185B2 (en) * | 2005-08-01 | 2010-09-21 | Medical Instill Technologies, Inc. | Dispenser and method for storing and dispensing sterile food product |
US6957752B2 (en) * | 2001-10-16 | 2005-10-25 | Medical Instill Technologies, Inc. | Dispenser with sealed chamber and one-way valve for providing metered amounts of substances |
US6696018B2 (en) | 2001-11-14 | 2004-02-24 | Electron Process Company, Llc | System and method for sterilization of biological connections |
US20030226857A1 (en) * | 2002-04-12 | 2003-12-11 | Hyclone Laboratories, Inc. | Systems for forming sterile fluid connections and methods of use |
US6929040B2 (en) | 2002-06-19 | 2005-08-16 | Medical Instill Technologies, Inc. | Sterile filling machine having needle filling station within e-beam chamber |
US6977492B2 (en) * | 2002-07-10 | 2005-12-20 | Marvell World Trade Ltd. | Output regulator |
WO2004014778A2 (en) * | 2002-08-13 | 2004-02-19 | Medical Instill Technologies, Inc. | Container and valve assembly for storing and dispensing substances, and related method |
CA2638781C (en) * | 2002-09-03 | 2010-02-02 | Medical Instill Technologies, Inc. | Sealed containers and methods of making and filling same |
BRPI0407067A (en) * | 2003-01-28 | 2006-01-17 | Medical Instill Tech Inc | Medicine vial having a heat sealable cap, and apparatus and method for filling the vial |
WO2004096113A2 (en) | 2003-04-28 | 2004-11-11 | Medical Instill Technologies, Inc. | Container with valve assembly for filling and dispensing substances, and apparatus and method for filling |
US6997219B2 (en) * | 2003-05-12 | 2006-02-14 | Medical Instill Technologies, Inc. | Dispenser and apparatus and method for filling a dispenser |
JP2005003564A (en) * | 2003-06-13 | 2005-01-06 | Ushio Inc | Electron-beam tube and window for electron beam extraction |
US7145988B2 (en) * | 2003-12-03 | 2006-12-05 | General Electric Company | Sealed electron beam source |
US7264142B2 (en) | 2004-01-27 | 2007-09-04 | Medical Instill Technologies, Inc. | Dispenser having variable-volume storage chamber and depressible one-way valve assembly for dispensing creams and other substances |
DE102004013620B4 (en) * | 2004-03-19 | 2008-12-04 | GE Homeland Protection, Inc., Newark | Electron window for a liquid metal anode, liquid metal anode, X-ray source and method of operating such an X-ray source |
US7148613B2 (en) | 2004-04-13 | 2006-12-12 | Valence Corporation | Source for energetic electrons |
US7197116B2 (en) * | 2004-11-16 | 2007-03-27 | General Electric Company | Wide scanning x-ray source |
JP2006202671A (en) * | 2005-01-24 | 2006-08-03 | Ushio Inc | Extreme ultraviolet ray light source device and removing method of debris generated therein |
WO2006127736A2 (en) * | 2005-05-23 | 2006-11-30 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Silicon substrates with thermal oxide windows for transmission electron microscopy |
WO2009035727A2 (en) * | 2007-05-18 | 2009-03-19 | State Of Oregon Acting By And Through The State Board Of Higher Educ.On Behalf Of The Univ.Of Oregon | Tem grids for determination of structure-property relationships in nanotechnology |
US7504643B2 (en) * | 2005-12-22 | 2009-03-17 | Asml Netherlands B.V. | Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
US7495239B2 (en) * | 2005-12-22 | 2009-02-24 | Asml Netherlands B.V. | Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
JP2008128973A (en) * | 2006-11-24 | 2008-06-05 | Hamamatsu Photonics Kk | Electron beam irradiation device |
US7656236B2 (en) | 2007-05-15 | 2010-02-02 | Teledyne Wireless, Llc | Noise canceling technique for frequency synthesizer |
US8179045B2 (en) * | 2008-04-22 | 2012-05-15 | Teledyne Wireless, Llc | Slow wave structure having offset projections comprised of a metal-dielectric composite stack |
DE102008031846A1 (en) * | 2008-07-08 | 2010-01-21 | ELROG GmbH & Co. Elektronenröhren KG | Method for producing electron beam between cathode and anode, involves removing gases from inner area of housing, in which gases are ionized in active micro ion getter pump, where ionized gases are bonded |
US8699206B1 (en) * | 2009-10-21 | 2014-04-15 | The Board Of Trustees Of The University Of Illinois | Nano vacuum tube arrays for energy storage |
WO2013121078A1 (en) | 2012-02-15 | 2013-08-22 | Hs Foils Oy | Method and arrangement for manufacturing a radiation window |
EP2819708B1 (en) | 2012-02-28 | 2017-08-02 | Life Technologies Corporation | Systems and containers for sterilizing a fluid |
JP5070616B1 (en) * | 2012-03-09 | 2012-11-14 | レーザーテック株式会社 | Plasma shield device and plasma light source device |
GB2514984B (en) | 2012-03-11 | 2015-09-30 | Mark Larson | Improved Radiation Window With Support Structure |
US9535100B2 (en) | 2012-05-14 | 2017-01-03 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor and method for using same |
US9383460B2 (en) | 2012-05-14 | 2016-07-05 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor |
US9202660B2 (en) | 2013-03-13 | 2015-12-01 | Teledyne Wireless, Llc | Asymmetrical slow wave structures to eliminate backward wave oscillations in wideband traveling wave tubes |
FR3006499B1 (en) * | 2013-05-31 | 2016-11-25 | Commissariat Energie Atomique | ELECTROSTATIC LENS WITH INSULATING OR SEMICONDUCTOR MEMBRANE |
JP2016211850A (en) * | 2013-12-19 | 2016-12-15 | 日立造船株式会社 | Electron irradiation device |
US9969513B2 (en) | 2014-01-31 | 2018-05-15 | Tetra Laval Holdings & Finance S.A. | Device and method for sterilization of packaging containers |
JP6543260B2 (en) * | 2014-01-31 | 2019-07-10 | テトラ ラバル ホールディングス アンド ファイナンス エス エイ | Device and method for sterilizing packaging containers |
CN106061514A (en) * | 2014-02-25 | 2016-10-26 | 利乐拉瓦尔集团及财务有限公司 | Conditioning system for a sterilization device, a sterilization machine and a method of conditioning a sterilization device |
US9576765B2 (en) * | 2014-09-17 | 2017-02-21 | Hitachi Zosen Corporation | Electron beam emitter with increased electron transmission efficiency |
US10258930B2 (en) | 2015-06-19 | 2019-04-16 | Mark Larson | High-performance, low-stress support structure with membrane |
WO2017112937A1 (en) * | 2015-12-23 | 2017-06-29 | Massachusetts Institute Of Technology | Electron transparent membrane for cold cathode devices |
CA3048303C (en) * | 2016-12-29 | 2023-08-01 | The University Of British Columbia | Optically addressed, thermionic electron beam device |
AU2018261367C1 (en) | 2017-05-02 | 2021-02-11 | Spark Thermionics, Inc. | System and method for work function reduction and thermionic energy conversion |
US10818327B2 (en) | 2018-06-29 | 2020-10-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory circuit and method of operating same |
US10699886B2 (en) | 2018-11-06 | 2020-06-30 | Spark Thermionics, Inc. | System and method for thermionic energy conversion |
EP4147265A1 (en) | 2020-05-06 | 2023-03-15 | Spark Thermionics, Inc. | System and method for thermionic energy conversion |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3319318A (en) * | 1964-02-24 | 1967-05-16 | Stanford Research Inst | Thin gas tight window assembly |
GB1166053A (en) * | 1966-08-08 | 1969-10-01 | Atomic Energy Authority Uk | Improvements in or relating to Particle Accelerators |
US3486060A (en) * | 1967-09-06 | 1969-12-23 | High Voltage Engineering Corp | Cooling apparatus with laminar flow for electron permeable windows |
US3607680A (en) * | 1967-10-03 | 1971-09-21 | Matsushita Electric Ind Co Ltd | Methof for producing a device for transmitting an electron beam |
US3629576A (en) * | 1970-05-21 | 1971-12-21 | Deltaray Corp | Accelerator tube electrode for focusing a beam of charged particles |
US3702973A (en) * | 1970-09-17 | 1972-11-14 | Avco Corp | Laser or ozone generator in which a broad electron beam with a sustainer field produce a large area, uniform discharge |
DE2151079A1 (en) * | 1971-10-13 | 1973-04-19 | Siemens Ag | RADIATION WINDOW |
US3883413A (en) * | 1972-09-25 | 1975-05-13 | Avco Corp | Ozone generator using pulsed electron beam and decaying electric field |
US4061944A (en) * | 1975-06-25 | 1977-12-06 | Avco Everett Research Laboratory, Inc. | Electron beam window structure for broad area electron beam generators |
US4095115A (en) * | 1976-12-27 | 1978-06-13 | Accelerators, Inc. | Ozone generation apparatus and method |
US4328443A (en) * | 1980-03-11 | 1982-05-04 | Avco Everett Research Laboratory, Inc. | Apparatus for providing improved characteristics of a broad area electron beam |
US4362965A (en) * | 1980-12-29 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Composite/laminated window for electron-beam guns |
US4409511A (en) * | 1981-02-23 | 1983-10-11 | Rpc Industries | Phase transition cooled window for broad beam electron gun |
US4468282A (en) * | 1982-11-22 | 1984-08-28 | Hewlett-Packard Company | Method of making an electron beam window |
US4455561A (en) * | 1982-11-22 | 1984-06-19 | Hewlett-Packard Company | Electron beam driven ink jet printer |
FR2581212B1 (en) * | 1985-04-26 | 1988-06-17 | Commissariat Energie Atomique | ELECTRON CANON PRINTER |
US4764947A (en) * | 1985-12-04 | 1988-08-16 | The Machlett Laboratories, Incorporated | Cathode focusing arrangement |
US4825123A (en) * | 1986-12-31 | 1989-04-25 | General Electric Company | Two-piece cathode cup |
US4873468A (en) * | 1988-05-16 | 1989-10-10 | Varian Associates, Inc. | Multiple sheet beam gridded electron gun |
US4966663A (en) * | 1988-09-13 | 1990-10-30 | Nanostructures, Inc. | Method for forming a silicon membrane with controlled stress |
US5093602A (en) * | 1989-11-17 | 1992-03-03 | Charged Injection Corporation | Methods and apparatus for dispersing a fluent material utilizing an electron beam |
US5235239A (en) * | 1990-04-17 | 1993-08-10 | Science Research Laboratory, Inc. | Window construction for a particle accelerator |
JPH052100A (en) * | 1990-10-12 | 1993-01-08 | Toshiba Corp | Electron beam irradiated device and manufacture of electron beam penetration film |
US5391958A (en) * | 1993-04-12 | 1995-02-21 | Charged Injection Corporation | Electron beam window devices and methods of making same |
US5414267A (en) * | 1993-05-26 | 1995-05-09 | American International Technologies, Inc. | Electron beam array for surface treatment |
-
1995
- 1995-01-05 US US08/369,127 patent/US5612588A/en not_active Expired - Lifetime
-
1996
- 1996-01-03 AU AU47495/96A patent/AU685350B2/en not_active Ceased
- 1996-01-03 EP EP96903392A patent/EP0871972B1/en not_active Expired - Lifetime
- 1996-01-03 DE DE69635189T patent/DE69635189T2/en not_active Expired - Lifetime
- 1996-01-03 JP JP52126596A patent/JP3899524B2/en not_active Expired - Lifetime
- 1996-01-03 KR KR1019970704608A patent/KR100385583B1/en not_active IP Right Cessation
- 1996-01-03 WO PCT/US1996/000272 patent/WO1996021238A1/en active IP Right Grant
- 1996-01-03 CA CA002209593A patent/CA2209593A1/en not_active Abandoned
- 1996-01-04 TW TW085100033A patent/TW282551B/zh active
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