WO1995016059A1 - Continuous immersion treatment apparatus of horizontal transfer type - Google Patents

Continuous immersion treatment apparatus of horizontal transfer type Download PDF

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Publication number
WO1995016059A1
WO1995016059A1 PCT/JP1994/002061 JP9402061W WO9516059A1 WO 1995016059 A1 WO1995016059 A1 WO 1995016059A1 JP 9402061 W JP9402061 W JP 9402061W WO 9516059 A1 WO9516059 A1 WO 9516059A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
tank
gate
gate member
work
Prior art date
Application number
PCT/JP1994/002061
Other languages
French (fr)
Japanese (ja)
Inventor
Tatsuya Tomioka
Yasuo Sekiguchi
Original Assignee
Taisho Kogyo Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31015893A external-priority patent/JPH07166364A/en
Priority claimed from JP13903394A external-priority patent/JPH0827599A/en
Application filed by Taisho Kogyo Kabushiki Kaisha filed Critical Taisho Kogyo Kabushiki Kaisha
Publication of WO1995016059A1 publication Critical patent/WO1995016059A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16Apparatus for electrolytic coating of small objects in bulk
    • C25D17/28Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment

Definitions

  • the present invention provides a dipping process for dipping a work in a liquid processing tank, such as plating, anodizing, electrolytic polishing, electrolytic pickling, through-hole plating on a printed circuit board, cleaning with a substitute for freon, and jig peeling. Related to the device.
  • a work is suspended by a transport device (rack and barrel) called an elevator or a carrier.
  • a transport device rack and barrel
  • the treatment is performed by immersion.
  • Such a method of transporting a work is conventionally referred to as aerial transfer.
  • the lower the work the longer the dipping time in the processing solution, and for example, in the case of plating, the plating film pressure becomes uneven in the vertical direction.
  • the above-described conventional apparatus has a large loss time due to the transfer to the air, and usually takes 5 seconds each for the process of lifting and lowering the work and the horizontal movement during the transfer to the air. Assuming 8 hours, the vertical and horizontal movement time in the air was 10 hours, and the work efficiency was extremely low.
  • This device processes continuous rests such as strips (wires), and has the problem that it cannot process mechanical parts and other objects that have independent shapes.
  • the present invention has been made in view of the above-described conventional problems, and provides a horizontal traveling continuous immersion treatment apparatus capable of continuously performing liquid treatment by horizontally traveling even if it is a mechanical part or the like.
  • the purpose is to do.
  • the present invention relates to a transfer means for transferring a work horizontally in a certain range along a horizontal transfer line, a liquid treatment tank, front and rear reserve tanks disposed before and after the liquid treatment tank, and a liquid treatment tank and a reservoir.
  • a liquid amount adjusting means for adjusting the amount of the processing liquid in one tank, and at least one set for each processing liquid arranged horizontally and continuously along the transport line.
  • a gate that is formed in a range, and that is arranged in an opening that allows the passage of a workpiece, that allows the workpiece to pass horizontally in an open state, and that blocks a flow of a processing solution in a closed state, and a workpiece to the gate. Open the gate when approaching and open the gate after passing through the work
  • a gate drive control device that opens and closes the gate on the inlet side of the front reservoir and the gate on the outlet side of the rear reservoir in opposite phases to the inlet and outlet gates of the liquid treatment tank.
  • the liquid amount adjusting means sets the same liquid treatment level between the liquid treatment tank and the reserve tank when entering and leaving the tank, and enters and exits between the reserve tank and the outside of the reserve tank.
  • the above object is achieved by setting the liquid treatment level of the reserve tank to be equal to or lower than the lower end of the gate opening when the gate is open.
  • the reserve tanks are provided before and after the liquid treatment tank, the entrance boundary wall of the front reserve tank, the exit boundary wall of the rear reserve tank, and the boundary wall of the liquid treatment tank and the reserve tank.
  • the work before entering the liquid treatment tank is guided to the front reserve tank with the liquid level lowered and the gate on the entrance boundary wall is opened, and then the work on the entrance boundary wall is opened. Close the gate and fill it with the processing liquid to the same level as the liquid processing tank, then open the front reservoir tank and the gate on the boundary wall with the liquid processing tank, and remove the work in the front reservoir tank.
  • the work that has been guided to the processing tank, and then closed the gate of the boundary wall, and the workpiece that has been subjected to the predetermined processing in the liquid processing tank is the boundary wall between the outlet side of the liquid processing tank and the rear reserve tank.
  • the boundary gate between the liquid treatment tank and the rear reserve tank is closed, and the inside of the rear reserve tank is closed.
  • the gate is constituted by a shutter-plate force for opening and closing the opening by moving the gate in a direction perpendicular to the horizontal transfer line of the work, so that the opening can be quickly opened and closed.
  • a pair of shirt evening plates at the gate are provided so as to advance and retreat with respect to the passing line in a vertical plane perpendicular to the horizontal feed line of the work, and the opposite edges of the shirt evening plates come into contact with each other.
  • the distance between the opposing edges of the pair of shutter plates is adjusted according to the shape of the work to minimize the opening amount. ⁇ It is possible to shorten the time required for the gate to pass through the gate.
  • the gate drive control device is configured to open and close the entrance gate and the exit gate of the liquid processing tank in a set of liquid processing tanks in a synchronized manner, so that the work is fixed to the transfer means. It can be suspended and processed continuously.
  • the gate is moved in a direction orthogonal to a horizontal transfer line of the work.
  • the shape of the tip of the shutter plate is adapted to the shape of the workpiece, and the gap between the tip and the workpiece when the shutter plate is open is minimized to shorten the workpiece transit time. Can be.
  • the gate includes a shutter plate that is swingably supported in a vertical plane orthogonal to a horizontal transport line of the vehicle, and that opens and closes an opening by swinging.
  • a power conversion device for transmitting the rotational motion of the shaft as the oscillating motion of the shutter plate the rotational motion of the power shaft can be easily converted to the oscillating motion and transmitted to the shutter plate.
  • the at least one set of liquid processing tank groups shares one power line, and the transmission device is provided for each gate, so that each gate can be easily opened and closed in synchronization. .
  • liquid processing tank and the reserve tank in each of the liquid processing tank groups of each set are linearly arranged, and the adjacent sets are arranged such that the relative angle of the horizontal feed line can be freely adjusted.
  • the layout in the factory can be arbitrarily set according to the surrounding equipment and space.
  • a cylindrical member having an open top and a bottom which is provided with an allowable work passage notch and is rotatable around a center in a vertical direction, wherein an opening direction of the work passage notch is set to the transfer line.
  • a cylindrical gate member capable of being converted by 180 degrees in two directions along the seal member, and a seal member for sealing between the outer periphery of the cylindrical gate member and the inner peripheral edge of the opening in a liquid-tight manner, Due to the space inside the cylindrical gate member Constitute the reserve tank.
  • the cylindrical gate member forms a reserve tank in the space
  • the opening direction of the work passage notch is changed 180 degrees in the opposite direction to the transfer line while the work is stored, and at this time, a seal member is provided between the outer periphery of the cylindrical gate member and the opening between the partition wall.
  • the work can be passed through the partition wall without contacting the cylindrical gate member. Since the amount of liquid leakage at this time is equal to the amount of liquid that has entered the space of the cylindrical gate member, it is possible to suppress liquid leakage.
  • the bottom wall of the cylindrical gate member has a double structure, a large number of rectifying holes are formed in the upper bottom wall, and the lower bottom wall is provided with a change in the direction of the opening of the work passage cutout. Therefore, the position is changed, and thereby the liquid is allowed to flow into the cylindrical gate member, or a supply / drain port for discharging the flowed liquid is provided, and before the liquid flows from the opening of the work passage cutout, Changes in the suspended state of the work due to the liquid flowing into the cylindrical gate member from the supply / drain port and the rapid flow of the liquid through the opening of the work passage notch, distortion due to a sudden increase in pressure near the cylindrical gate member, etc.
  • the liquid force flowing from the supply / drain port ⁇ the flow force through the rectifying pores of the upper bottom wall can prevent the liquid flowing into the cylindrical gate member from being disturbed.
  • the opening force of the workpiece passage notch ⁇ Before the liquid level is low, the liquid inside the cylindrical gate member is discharged from the supply / drain port to open the tank with the liquid level low from the opening of the work passage notch. It is possible to suppress the liquid from suddenly flowing into the inside of the container, thereby disturbing the suspended state of the work and preventing the liquid from scattering.
  • liquid tank bottom wall adjacent to the lower side of the lower bottom wall of the cylindrical gate member is provided with the supply / drainage port in the lower bottom wall of the cylindrical gate member, and the work passing notch force is adjacent to the tank.
  • the liquid supply and drainage to the inside of the cylindrical gate member can be performed in accordance with the opening direction of the work passage cutout of the cylindrical gate member without requiring a special valve or valve control.
  • a driven gear is provided below the bottom wall of the cylindrical gate member and integrally therewith, and the liquid tank bottom wall below the cylindrical gate member is a circle for rotatably receiving the driven gear.
  • a driving gear that meshes with the driven gear in the circular recess to rotate the driven gear.
  • the driven gear is provided with the supply / discharge at the lower bottom wall of the cylindrical gate member.
  • the sealing member is provided in parallel with the central axis of the cylindrical gate member, and at two positions on the left and right sides of the transfer line, on the front side and the rear side in the transfer direction of the cylindrical gate member, the cylindrical gate member.
  • a seal roll disposed in contact with the cylindrical outer periphery so as to be relatively displaceable about the central line, and attached to an inner peripheral side of the opening; And four seal plates that come into contact with each other so as to be relatively displaceable from the opposite side of the member, so that rotation of the cylindrical gate member with little friction can be allowed while maintaining a good state of the see-through.
  • the seal roll comprises a pipe, and a support shaft rotatably supporting the pipe, and a support shaft loosely fitted with a radial allowance to the inner diameter of the pipe,
  • the pipe forming the seal roll is displaced following the displacement of the cylindrical gate member which is displaced in the radial direction by the hydraulic pressure, and the seal can be maintained satisfactorily.
  • the liquid level of the seal port is high, the liquid comes into contact with the outside of the seal port on the tank side, and the leading edge extends near a vertical tangent between the seal roll and the outer periphery of the cylindrical gate member.
  • the work passage cutout of the cylindrical gate member communicates with the peripheral wall of the cylindrical gate member on the side where the liquid surface is higher, the work passage cutout is adjacent to the work passage cutout in front of the cylindrical gate member rotation direction.
  • a drain communication hole communicating between the inside and outside of the cylinder is formed at a position between the seal roll to be sealed and the next adjacent seal roll, and the liquid collected between the seal rolls outside the cylindrical gate member is discharged into the cylindrical gate member. Balloons can be prevented.
  • a chain is circumferentially fixed to the outer periphery of the cylinder at one of the vicinity of the lower end and the upper end of the cylindrical gate member, and the chain and the chain are provided on the liquid tank side including the boundary wall.
  • a sprocket wheel for tilling drive is provided.
  • the seal is easier, the frictional resistance at the time of driving is reduced, and the sprocket is driven.
  • the chain distributes the driving force from the wheel in the circumferential direction of the cylindrical gate member, preventing the concentration of stress.
  • a pair of a pair of work pieces arranged so as to surround the outer side of the opening along the movement trajectory that converts the opening direction of the work passage cutout of the cylindrical gate member into two directions from both sides of the transfer line.
  • a guide member having a guide wall, and a guide bottom wall that is in contact with the bottom surface of the cylindrical gate member and supports the movable member in a fixed range, is provided.
  • the seal member is provided on the guide wall, and includes a seal piece slidably provided on the outer periphery of the cylindrical gate member, so that even if the cylindrical gate member is inclined or displaced, the seal piece is formed. Can reliably seal between the guide wall and the guide member to prevent liquid leakage.
  • the cylindrical gate member includes a flange at a bottom portion
  • the pair of guide members includes an arc-shaped inner peripheral surface arranged with a slight gap with respect to the outer periphery of the flange
  • the seal includes:
  • the member includes a seal piece provided on the guide member and slidably provided on the cylindrical outer peripheral surface of the cylindrical gate member and the upper surface of the flange. It is possible to seal the outer periphery and the bottom of the bracket member.
  • a driven member projecting downward below the bottom wall of the liquid tank, and around the center line through the driven member.
  • the cylindrical gate member can be easily driven by arranging the driving device below the liquid tank so as to be rotated.
  • a driven gear is provided on the lower side of the bottom wall of the cylindrical gate member and integrally therewith, and the driven gear is rotatably provided on the bottom wall of the liquid tank below the cylindrical gate member. Circle to accommodate A concave recess, and a driven gear for rotating the driven gear with the driven gear in the recess, and rotatably supporting the cylindrical gate member via the driven gear without causing liquid leakage.
  • the cylindrical gate member can be driven to rotate stably without generating distortion or twist.
  • the liquid tank bottom wall has a double structure of a movable bottom wall having the circular recess and a fixed bottom wall connected to the bottom wall of the liquid processing tank, and the cylindrical gate member, the sealing member, The driven gear and the movable bottom wall are integrally assembled by a frame member, and the fixed bottom wall is detachably attached to a position where the driven gear meshes with the driving gear. Replacement and maintenance can be facilitated.
  • a reinforcing lid having a work passage groove formed in a radial direction of a cylinder with a width equal to the work passage notch from the work passage notch to a position beyond the central axis at an upper end opening of the cylindrical gate member.
  • the rigidity of the cylindrical gate member can be increased by mounting the.
  • the cylindrical gate member comprises: an oval-shaped bottom wall; and a flexible peripheral wall member disposed on the ⁇ so as to be slidable on an oval orbit in the circumferential direction.
  • the flexible peripheral wall member is configured to be shorter than the entire length of the elliptical track by about the work passing width, and by increasing the major axis of the ellipse, it is possible to process a workpiece that is long in the transport line direction. it can.
  • a work passage corresponding to at least the passage locus range of the work is formed, and an insertion member which is detachable from above is provided in the space of the cylindrical gate member. It is filled with the insertion member without obstructing the passage of the liquid, and the amount of liquid leakage accompanying opening and closing of the cylindrical gate member can be reduced by the volume of the insertion member.
  • a partition wall having a height lower than the bottom of the opening is erected on the bottom wall of the reserve tank and outside the cylindrical gate member.
  • the height of the partition wall and the leaked liquid discharge capability of the leak recovery hole are set so that the liquid leaking from the liquid treatment tank is discharged without exceeding the partition wall when the partition is fully opened. In the unlikely event that the gate member is broken and a large amount of liquid in the liquid treatment tank flows out of the opening, it can be collected without leaking to another liquid tank.
  • a reserve tank is provided before and after the liquid treatment tank, and the entrance boundary wall of the front reserve tank, the exit boundary wall of the rear reserve tank, and the liquid treatment tank and the reserve are provided.
  • the boundary wall of the tank is made openable and closable by a gate, and the work before entering the liquid treatment tank is introduced into the front reserve tank after the liquid level is lowered and the gate on the entrance boundary wall is open. Close the gate on the side boundary wall, apply the processing liquid to the same level as the liquid processing tank, and then open the front reservoir tank and the gate on the boundary wall with the liquid processing tank to open the work in the front reservoir. The work is guided to the liquid treatment tank, and then the gate on the boundary wall is closed.
  • the work which has been subjected to the predetermined treatment in the liquid treatment tank is located at the boundary between the outlet side of the liquid treatment tank and the rear reserve tank.
  • the gates, etc. on the wall are transferred into the rear reserve tank filled with the treatment liquid in advance, and then the liquid treatment tank and the rear reservoir are filled.
  • the liquid processing can be performed sequentially and continuously while moving the workpiece horizontally.
  • FIG. 1 is a perspective view showing a horizontal traveling continuous plating device according to the embodiment of the present invention.
  • FIG. 2 is a schematic front view showing the apparatus of the embodiment.
  • FIG. 3 is a schematic side view of the same device.
  • FIG. 4 is an enlarged perspective view showing a gate opening / closing mechanism in the apparatus of the embodiment.
  • FIG. 5 is a schematic cross-sectional view including a partial block diagram showing a relationship between control of the liquid level of each tank and control of opening and closing of the gate in the apparatus of the embodiment.
  • FIG. 6 is a schematic cross-sectional view showing a relationship between control of the liquid level of each tank and control of opening and closing the gate in the apparatus of the embodiment.
  • FIG. 7 is a schematic cross-sectional view showing the relationship between control of the liquid level of each tank and control of opening and closing the gate in the apparatus of the embodiment.
  • Fig. 8 shows the control of the liquid level of each tank and the opening and closing control of the gate in the apparatus of the embodiment. It is a schematic sectional drawing which shows the relationship.
  • FIG. 9 is a schematic plan view showing a second embodiment of the present invention.
  • FIG. 10 is a schematic plan view showing a modified example of the reserve tank in the apparatus of the embodiment.
  • FIG. 11 is a perspective view showing a processing liquid tank line using the gate of the third embodiment in the present invention.
  • FIG. 12 is an exploded perspective view showing the liquid level maintaining gate of the embodiment in an enlarged manner.
  • FIG. 13 is a schematic plan view showing the relationship between the liquid level maintaining gate and the work of the example.
  • FIG. 14 is a perspective view showing a liquid level maintaining gate according to a fourth embodiment of the present invention.
  • FIG. 15 is a perspective view showing a liquid level maintaining gate according to a fifth embodiment of the present invention.
  • FIG. 16 is a perspective view showing a liquid level maintaining gate according to a sixth embodiment of the present invention.
  • FIG. 17 is an exploded perspective view showing the gate member of the embodiment.
  • FIG. 18 is a perspective view showing a part of the liquid tank of the embodiment.
  • FIG. 19 is a plan view showing another embodiment of the seal member of the embodiment.
  • FIG. 20 is a sectional view showing a seventh embodiment of the present invention.
  • FIG. 21 is a plan view showing the same example.
  • FIG. 22 is a cross-sectional view of the embodiment of FIG. 21 as viewed from the right.
  • FIG. 23 is a plan view showing a movable bottom wall portion of the gate member when the gate member is not assembled.
  • the present invention is applied to a horizontal traveling continuous plating device 10 for gold plating shown in FIG.
  • the horizontal traveling continuous plating apparatus 10 is provided with a transport means 12 for transporting a workpiece along a horizontal transport line 12A, and a continuous arrangement below the horizontal transport line 12A. And a tank 16 for neutralization and recovery of water.
  • the plating tank group 14 is composed of a plating tank 18, front and rear reserve tanks 20, 22 arranged before and after the plating tank 18, and the water washing neutralization and recovery.
  • Vessel group 16 is being flushed with the front recovery reservoir 24 adjacent to the rear reservoir 22 It comprises a sum recovery tank 26 and a rear recovery reserve tank 28 arranged on the rear side.
  • the boundary wall 26 A between the neutralization and recovery tank 26 and the boundary wall 26 B between the washing neutralization and recovery tank 26 and the rear recovery reserve tank 28, and the rear recovery reserve tank Gates 30 to 36 forces are arranged on the outgoing boundary wall 28 A of 28, respectively, and these boundary walls 18 A, 18 B, 22 A, 26 A, 26 B And 28 A are opened and closed.
  • the gates 30 to 36 are, as shown in an enlarged view in FIG. 4, in a vertical plane orthogonal to the horizontal transfer line 12 A of the work, in synchronization with the work passing line in a horizontal direction. Equipped with a pair of shut-off plates 38 that move forward and backward, the boundary wall closes when the opposing edges 38 A of the shut-off plates come into contact with each other, and when separated, the work force ⁇ Is formed in an open state.
  • the opposite edge 38 A is made of a flexible rubber seal material.
  • the pair of shirt evening plates 38 opens and closes a U-shaped opening 40 formed on the boundary wall from the left and right. It is guided by a horizontal guide 42 traversed below 40, and can be moved in and out of the horizontal direction along one side of the boundary wall.
  • a moving shutter arranged on the upper end of the shutter plate 38 so as to straddle the upper end of the boundary wall and sandwich the upper end of the shutter plate 38 with the boundary wall. 4 4 ⁇ Mounted so that the upper end of the shutter plate 38 can be moved along the upper end of the boundary wall.
  • the shutter plate 38 is opened and closed by a gate drive control device 46.
  • the gate drive control device 46 includes a cylindrical cam 48 slidably attached to a pin 44 A discharged from the upper surface of the moving shroud 44 at the upper end of the shutter plate 38, and a cylindrical cam 48.
  • a worm wheel 50 that is tied together, a worm gear 52 that drives the worm wheel 50, and a worm gear And a driving device 56 including a motor 56 A for driving the rotation ⁇ it] 2 A mounted on one of the two motors.
  • the cam groove 48 A of the cylindrical cam 48 moves the moving shaft 44 to the gate closed position within a range of 180 degrees, and reciprocates the moving shaft 44 within the remaining 180 degrees.
  • the gates 30, 33, and 36 are synchronously formed, and the gates 31, 32, 34, and 35 are gates 30, 33, 36, and 1, respectively.
  • Cylindrical cams 48 are set so as to be opened and closed in synchronization with a shift of 80 degrees.
  • the driving device 56 is set so as to intermittently drive the rotating shaft 52 A, and to rotate the cylindrical cam 48 half a turn in one driving time.
  • cylindrical cam 48 is supported by a supporting force bar 54 above the boundary wall in a state where the lower end is covered by a cover 49 # which is opened like a free-directional slit.
  • the supporting force bars 54 are fixed to both side walls 17 of the plating tank group 14 and the washing neutralization and recovery tank group 16.
  • the worm wheel 50 is mounted on the outer side of the support cover 54 and also on the outer side of the side wall 17 and with the worm gear 152 arranged in parallel with the horizontal transfer line 12A.
  • the supporting force bar 54 shields the space between the worm wheel 50 projecting upward from the side wall 17 and the space above the plating tank group 14 and the washing neutralization and recovery tank group 16.
  • the transfer means 12 includes a motor 56A, a sprocket wheel 58, and a chain 60 wound around the motor 56A, and is provided between the left and right chains 60.
  • the work W is suspended and supported under the suspended suspension plate 64, and the upper part of the plating tank group 14 and the washing neutralization recovery tank group 16 is horizontally arranged along the guide frame 62, In FIG. 2, they are transported from left to right.
  • Reference numeral 66 in FIG. 2 denotes a dispensing device that removes the workpiece W from the washing neutralization and recovery tank group 16 to a lower knife 67.
  • the plating tank 18, the front and rear reserve tanks 20 and 22, the front recovery reserve tank 24, the rinsing neutralization recovery tank 26, and the rear recovery reserve tank Underneath 28 are control tanks 68, 70, 72, 74, 76 and 7 corresponding to the respective volumes. 8 forces ⁇ located.
  • valves 70 A, 72 A, 74 A and 78 A are placed on the bottom wall of each reserve tank, as shown in Fig. 5. It can communicate with the upper end of the corresponding management tank.
  • control tanks 68 to 78 are connected to the suction side of a pump 82 via a filter 80, and the discharge ports 84 of the pumps 82 are provided with corresponding plating tanks and reserves. It is located above the tank and the water neutralization and recovery tank so that the processing solution sucked from the control tank can be circulated to the corresponding tank above.
  • Reference numerals 86 A to 86 F in FIG. 5 denote liquid level sensors for detecting the liquid level in each upper tank, 88 denotes a signal from the liquid level sensor 86 A to 86 F, and gates 30 to 3.
  • Control devices for controlling the opening / closing of the vanolebs 70 A, 72 A, 74 A, and 78 A and the driving of the pump 82 based on the gate opening / closing signal from 6 are shown, respectively.
  • the gate opening / closing signal is derived from the rotation of the cylindrical cam 48.
  • Reference numeral 37 in FIG. 4 is attached to the side wall 17 at the entrance side of each of the gates 30 to 36.
  • the sensor which outputs to the gate control device 57 for the drive device 56 of the said gate is shown.
  • the gate control device 57 turns on the driving device 56 so as to open the gate only during the time when the work W passes through the gate in response to the work W approach signal from the sensor 37. I have.
  • the length of the reserve tank in the horizontal transfer line 12A direction is set to an extent that the minimum transfer unit of the work W by the transfer means 12 can be accommodated. Therefore, in the case where the work W is a linear material as shown in FIG. 2, for example, three pieces are set as one unit, and the length is set to accommodate these three pieces.
  • the operation of the horizontal traveling continuous plating device 10 according to the above embodiment will be described.
  • the plating 8 and the water washing neutralization recovery t 26 are maintained at the liquid level required for plating and recovery processing, respectively.
  • the front reserve tank 2 In the case of 0, the valve 7OA is opened in advance, and the plating liquid is set to be lower than the lower end position of the opening 40 of the boundary wall 31 as shown in FIG.
  • the gate 30 which has been opened as shown in FIG. 6 ⁇ closes, and then the plating solution in the control tank 72 is pumped by the pump 82, and the plating liquid in the control tank 72 is moved to the upper front reservoir tank 2. Inject to 0 to the same liquid level as the plating tank 18.
  • the work W When the liquid level sensor 86 A detects a rise in the liquid level, the work W is advanced, and when it approaches the gate 31, it opens as shown in FIG. As shown in FIG. 8, the gate 31 opened is closed, and the workpiece W is intermittently advanced in the plating tank 18 to perform the plating process.
  • the peak W after the plating process is completed is moved into the rear reserve tank 22 having the same liquid level as the plating tank 18 by opening the gate 32 as shown in FIG. After passing through the work W, the gate 32 is closed, the plating solution in the rear reserve tank 22 is discharged into the lower management tank 72, and the liquid level is lowered, and the liquid level is also lowered. Is moved into the front collection reservoir 24.
  • the work W is also provided in the water-recovery neutralization recovery tank group 16, the front recovery reservoir 24, the water-wash neutralization recovery tank 26, and the rear recovery reservoir.
  • the tank 28 proceeds in the same process as above, and is finally carried out from the gate 36 of the rear recovery reservoir tank 28 to the outside.
  • the liquid levels of the four reserve tanks are raised and lowered in synchronization with each other, and the inlet gate 30 of the front reserve tank 20 and the outlet gate of the rear reserve tank 22 are provided.
  • the outlet gate 36 of the rear recovery reservoir tank 28 is opened and closed synchronously, and it is deviated by 180 degrees in the rotation direction of the cylindrical cam 48 from these, so that the plating tank 18 Gates 31 and 32 on the inlet and outlet sides of the tank and gates 34 and 35 on the inlet and outlet sides of the washing neutralization and recovery tank 26 are synchronously opened and closed.
  • control tanks are arranged below the respective liquid processing tank groups in correspondence with the liquid processing ffi and the reserve tank, the management of the processing liquid is easy, and the control of the processing liquid in the factory is easy. apparatus The volume can be reduced.
  • the force in which the plating tank group 14 and the water-washing neutralization recovery tank group 16 are arranged along the linear horizontal transfer line 12A is not limited to this.
  • a plurality of liquid processing tank groups 101 to 1 ⁇ 3 may be arranged in a U shape or a crank shape.
  • the arrangement of the reserve tank and the liquid processing tank in each processing liquid tank group is linear.
  • each reserve tank is the same as the width of the plating tank 18 and the washing neutralization and recovery tank 26.
  • the width of the reserve tanks 104 and 105 may be the minimum necessary for the workpiece W to pass through.
  • the liquid processing tank 106 has a normal width.
  • a block 107 made of, for example, a corrosion-resistant resin may be provided inside the side wall 17 with a passage having a passage width of the work W left inside.
  • Reference numeral 108 in FIG. 10 denotes a gate.
  • the power of the gate of the reserve tank and the gate of the plating tank and the gate of the water-washing neutralization and recovery tank are respectively opened and closed in synchronization.
  • the present invention is not limited to this. It is not always necessary to open and close in synchronization with the relationship between the processing time and distance of plating and the dimensions of the workpiece W. However, in this case, it is necessary to adjust the opening and closing phase of the gate.
  • the above-described embodiment is for a gold plating platform, and is provided with only the plating tank 18 and the flushing water recovery tank 26, but the present invention is not limited to this.
  • Applicable to other immersion processing equipment for immersing a workpiece in a liquid processing tank for other plating, alumite treatment, electrolytic polishing, electrolytic pickling, printed circuit board through-hole plating, chlorofluorocarbon alternative cleaning, jig peeling, etc. Can be done.
  • the liquid level maintaining gate 10 is, for example, a second liquid tank 1 12 which is a plating tank in a plating line (described later) and an outlet side. It is provided on the boundary wall 1 16 between the second liquid tanks 1 1 4 which is the reservoir tank, and this boundary wall 1 1 6
  • the opening and closing of the opening 1 18 of the container 1 allows the work 1 2 2 to pass along the transfer line 1 2 0 passing horizontally through the opening 1 1 8 when opened, and the first liquid tank when closed. The liquid is prevented from flowing out of the liquid 124 to the second liquid tank 114.
  • the liquid level of the liquid 1 24 in the first liquid tank is made slightly lower than the upper end of the boundary wall 1 16, and the liquid level in the second liquid tank 1 14 is the first liquid.
  • the liquid level of the liquid 124 in the tank 112 is significantly less than or equal to zero.
  • the liquid level maintaining gate 110 is a bottomed cylindrical member having a central axis vertically arranged at the center of the opening 118 and a flange 126 at the bottom, and It is arranged with a small gap between the cylindrical gate member 128 that is rotatable in front of the line and the outer periphery of the flange 126, and is arranged concentrically with the cylindrical outer peripheral surface of the cylindrical gate member 128.
  • a pair of guide walls 1 provided with a circular arc-shaped inner peripheral surface 130 A and arranged so as to surround the cylindrical gate member 128 on the transfer line 120 with a gap from both sides.
  • the configuration of the cylindrical gate member 128, the guide member 134, and the seal member 136 is as shown in FIG.
  • the boundary wall 1 16 has a double structure, and the guide wall 1 30 is integrally supported in a slit 1 16 A between the boundary walls 1 16 of the double structure.
  • the support wall 130B is dropped from above and is fixed to the boundary wall 116 by bolts 130C.
  • the opening 1 18 is formed from the upper end of the boundary wall 1 16 so as to reach the common bottom wall 1 13 of the first liquid tank 1 12 and the second liquid tank 1 14 .
  • the cylindrical gate member 128 has a work passage notch 138 extending from the upper end to the lower end flange 126 at one location in the circumferential direction.
  • the width of the work passing notch 1 38 is set to be slightly larger than the width of the work 122 traveling along the transfer line 120.
  • the pair of guide walls 130 The gap 130D between both ends of the transfer line 120 in the direction is also set to be substantially equal to the work passage notch 1338.
  • the support wall 130B is integrally connected to the guide wall 130 on the side opposite to the arc-shaped inner peripheral surface 13 ⁇ A in the normal direction of the arc.
  • the cylindrical gate member 128 has a driven shaft 128 A penetrating the guide bottom wall 132 at the center position of the bottom wall, and is provided at the tip (lower end) of the driven shaft 128 A.
  • the attached bevel gear 140 is engaged with the bevel gear 144 attached to the drive shaft 142 so as to be rotationally driven by the drive shaft 144.
  • the sealing member 1336 is vertically attached along the end of the pair of guide walls 130 on the first liquid tank 112 side, and the tip is the cylindrical gate member 128. And a flexible seal piece such as rubber which comes into contact with the cylindrical outer peripheral surface and the upper surface 126A of the flange 126.
  • an outlet (gap 13) on the second liquid tank 114 side of the liquid level maintaining gate 110 is provided on the bottom wall 113 of the second liquid tank 114.
  • a leaked liquid collecting hole 1 488 is formed in the bottom wall 1 13 of the second liquid tank 114 at a position between the partition wall 146 and the boundary wall 111. .
  • the leaked liquid collecting hole 1 48 communicates with a reserve tank 150 arranged below the first liquid tank 112 and passes through the opening 118 to form the first liquid tank 1 1 2 The liquid leaked from the tank can be returned to the reserve tank 150.
  • the liquid level maintaining gate 110 is disposed on a boundary wall between the tanks in a continuous processing liquid tank line 152 and passes below each liquid tank.
  • the one drive shaft 142 is driven to rotate via a bevel gear in the same manner as shown in FIG.
  • reference numeral 54 denotes a motor
  • reference numeral 156 denotes an electromagnetic clutch for turning on and off engagement between the level gear 144 and the drive shaft 144 in the rotational direction.
  • Reference numeral 158 indicates a control device for controlling on / off of the electromagnetic latch 156 according to a program.
  • the work 122 is a transfer device disposed above the treatment liquid tank line 52. It is suspended and supported by a rack 160 via a plating jig 162. The plating jig 162 is supported by being hooked on a bracket 160B integrated with the rack 16OA.
  • the transfer device 160 is configured to rotate in a horizontal plane outside both ends of the processing liquid tank line 152, and is composed of, for example, a chain 164A and a sprocket wheel 164B.
  • the transport device 160 transports the plurality of workpieces 122 attached to the plating jig 162 from the upper right direction to the lower left direction in FIG. 11 along the transport line 120.
  • the height is set below the liquid level of the liquid 124 in the first liquid tank 112.
  • the plurality of liquid tanks along the transfer line 120 are, from the upper right of FIG. 11, a washing tank 166, a first buffer tank 168, a plating layer (first liquid tank 112), a second buffer layer (first The two-liquid tank 114) and the recovery tank 170 are arranged in this order.
  • the pretreatment system upstream of the washing tank 166 and the posttreatment system downstream of the collection tank 170 are not shown.
  • the liquid level maintaining gate is located at the entrance wall 166A of the washing tank 166, the boundary wall 167 between the washing tank 166 and the first buffer tank 168, the boundary wall 169 between the first buffer 168 and the first liquid tank 112, and the first liquid.
  • Reference numerals 201 to 201 denote the boundary wall 116 between the tank 112 and the second liquid tank 114 as the second buffer layer, the boundary wall 115 between the second liquid tank 114 and the collection tank 170, and the boundary wall 171 on the exit side of the collection tank 170, respectively. They are arranged as indicated by 203, 110, 204, 205.
  • each liquid level maintaining gate is a cylindrical gate member when the work 122 approaches.
  • the work passage notch 138 is used. The rotation is controlled so as to be directed to the traveling direction of 122.
  • the seal member 13 6 attached to the guide wall 13 0 is always provided with the cylindrical outer peripheral surface of the cylindrical gate member 1 2 8 and the upper surface 1 2 6 A of the lower end flange 1 2 6 And is in pressure contact with the cylindrical gate member 128 by the liquid pressure from the liquid tank on the higher liquid surface side, so that liquid leakage can be suppressed well.
  • the liquid that has entered the cylindrical gate member 128 is rotated by the rotation of the cylindrical gate member 128 into the liquid tank on the lower side of the liquid level, and rotates every time the cylindrical gate member 128 rotates. It will be discharged (leaked).
  • reference numeral 172 denotes a jet hole for the piercing liquid which is arranged on the bottom surface of the first liquid tank 1 12
  • 1 74 denotes an orifice provided on a side wall of the first liquid tank 1 12.
  • a single hole, 176 indicates a return pipe for returning the plating solution overflowing from the overflow hole 174 to the reserve tank 150.
  • Reference numeral 1178 in FIG. 11 denotes an exhaust hood for preventing the emission of odor of the chemical solution from the first liquid tank 112, which is a fitting liquid tank.
  • the workpieces 122 transported by the transport device 160 via the plating jigs 16 2 include the washing tanks 166, the first buffer layer 168, and the first liquid tank 1 1 2, 2nd liquid
  • the bath 114 and the recovery tank 170 are moved in and out through the liquid level maintaining gates 201 to 203, 110, 204 and 205, and the plating process is completed.
  • each liquid level maintaining gate is connected to the drive shaft 142, which is arranged vertically below the liquid tank along the transfer line 12 °, via a bevel gear 144, 145.
  • the bevel gear 144 force is turned on and off with respect to the drive shaft 142 by an electromagnetic clutch 156 that is turned on and off by a control device 1 58.
  • the position of the work passing notch 138 is converted.
  • the liquid level maintaining gate 180 is provided with an insertion member 182 in which a work passage 182A corresponding to a range of a locus of passage of the work 122 including the plating jig 162 is formed.
  • the insertion member 182 is removably inserted from above into the space 129 inside the cylindrical gate member 128 (but not in contact with the cylindrical gate member 128). Except for filling the space 129.
  • the leakage amount of the cylindrical gate member 128 when the workpiece 122 enters and exits can be reduced by the volume of the input member 182.
  • FIG. 15 Next, a fifth embodiment of the present invention shown in FIG. 15 will be described.
  • a cylindrical gate member 186 is formed by an elliptical bottom wall 186A, and a bellows-like member is disposed on the bottom wall 186A so as to be slidable along an elliptical orbit in the circumferential direction.
  • a flexible peripheral wall member 186B comprising: a work passage width shorter than a total length of the elliptical track by a work passage width; 188. In this embodiment, a long work can be passed in the direction of the transfer line 120.
  • the liquid level maintaining gate 190 is a single rectangular parallelepiped assembly including a cylindrical gate member 192 having a bottomed cylindrical shape.
  • the bottom wall of this cylindrical gate member 192 has a double structure, and a large number of flow regulating holes 1994A are formed in the upper bottom wall 1994, and the work passes through the lower bottom wall 1996.
  • the position of the notch 1998 is changed in accordance with the change of the opening direction, so that the liquid in the first liquid tank 1 12 flows into the cylindrical gate member 192 or the liquid that flows in is discharged.
  • An annular spacer 195 is disposed between the upper bottom wall 14 and the lower bottom wall 196, and between the upper bottom wall 194 and the lower ij bottom wall 1996. It forms a space into which liquid flows.
  • a wear-resistant resin sheet 197 such as PVDF is attached to the lower side of the lower bottom wall 196.
  • the cylindrical gate member 192 is rotatable around its central axis, and is rotatably sealed by seal members 210 at four locations in the circumferential direction.
  • Each of the four seal members 210 is parallel to the rotation center line of the cylindrical gate member 192 with respect to the cylindrical outer periphery of the cylindrical gate member 192, and has a total height range of the cylindrical outer periphery.
  • the seal rolls 2 1 2 arranged in contact with each other so as to be displaceable in the circumferential direction, and attached to the inner peripheral side of the opening 1 18, and the leading edge 2 1 4 8 ⁇ the seal roll 2 1 2
  • four seal plates 2 14 that are relatively displaceable from the opposite side of the cylindrical gate member 19 2 over the entire height range of the seal roll 2 12. .
  • the seal roll is made of, for example, a pipe 212A made of a wear-resistant resin such as PVDF, and a pair of upper and lower supporting pongs loosely fitted with a radial allowance near the upper end and the lower end of the pipe 212A. 2 1 2B.
  • a chain 2 16 is fixed in the circumferential direction on the outer periphery of the cylindrical shape near the upper end of the cylindrical gate member 19 2, and on the boundary wall 1 16 side, it engages with the chain 2 16.
  • a sprocket wheel 218 is provided for rotating the cylindrical gate member 192 about the width rf] line via the chain 2.
  • the lower side of the chain 2 16 of the cylindrical gate member 19 2 A pair of arcuate guide members 220 facing each other are placed at both sides of the transfer line 120 so as to sandwich the cylindrical outer periphery of the cylindrical gate member 192 with a slight gap. Have been.
  • the sprocket wheel 2 18 is rotatably supported by the arcuate guide member 220.
  • An assembly bottom wall 222 supporting the lower bottom wall 196 below the cylindrical gate member 192 is provided with a liquid supply port 224 and a drain port 226. I have. The liquid supply port 224 and the liquid discharge port 226 overlap the liquid tank lined liquid port 225 and the liquid tank discharge port 227 formed on the lower liquid tank bottom wall 223, respectively. It is located.
  • the liquid supply port 224 is a part of the time from when the work passage notch 198 of the cylindrical gate member 192 is closed to the second liquid tank side to when it is opened to the first liquid tank side.
  • the lined drain port 200 vertically overlaps with the lined drain port 200, whereby the liquid in the first liquid tank is supplied to the supply ports 222, 224, the supply / drain port 200, and the baser 19.
  • the air flows into the cylindrical gate member 1992 from the rectifying pore 1994A of the upper bottom wall 1994 through the inner space of 5.
  • Reference numeral 2 28 in FIG. 18 denotes a communication pipe for connecting the liquid supply port 2 25 to the communication hole 22 on the bottom of the first liquid tank
  • reference numeral 230 denotes a liquid from the drain port 2 27.
  • the discharge pipes for discharging to the outside are shown respectively.
  • Reference numeral 232 in the figure denotes a vertical engaging projection formed by projecting the tip of the seal plate 2 14 opposite to the seal roll 2 12.
  • the mooring projections 2 32 are inserted from above into vertical mooring grooves 2 3 4 formed inside the liquid tank side wall 2 33 to maintain the liquid level of this embodiment.
  • the gate 190 is detachable as one assembly.
  • the supply / drainage liquid formed on the lower bottom wall 1 96 of the cylindrical gate member 190 before the work passage notch 1 98 opens to the first liquid tank 112 side. Mouth 200 force ⁇ Liquid supply port 2 24, 2 25 When the liquid in the first liquid tank 1 12 overlaps with the liquid supply port 2 24, 2 25, the communication pipe 2 28, the liquid supply boat 2 25, 2 24, The liquid is introduced into the cylindrical gate member 192 through the supply / drainage port 200 and the rectifying pore 194A. Therefore, the liquid is injected into the cylindrical gate member 192 before the liquid in the first liquid tank 112 flows suddenly due to the work passing notch 198 force, and the liquid is rapidly injected. Generation of turbulent flow due to liquid inflow, rapid pressure increase in cylindrical gate member 192, and work 1 2 2 trying to enter cylindrical gate member 192 from notch 1998 It does not fall by the current.
  • the supply / drain port 200 is set to the drain port 22
  • the liquid in the cylindrical gate member 192 is discharged from the discharge pipe 230 in communication with 6, 27.
  • the cylindrical gate member 192 seals with the seal member 210 so that the liquid in the first liquid tank 112 does not enter.
  • a small amount of leaked liquid or liquid dripped from the work is collected from the leaked liquid collecting port 148.
  • the cylindrical gate member 19 2 is displaced from its center axis by the hydraulic pressure.
  • the pipe 21 A constituting the seal roll 21 is loosely fitted to the support 21 B. Therefore, the seal can be maintained by following the displacement of the cylindrical gate member 192 in the radial direction by hydraulic pressure.
  • the pipe 2 12 A is made of wear-resistant resin, when the cylindrical gate member 19 2 rotates, it does not rotate even if it comes into contact with or slides on the gate member 19 2 Without the need to maintain the seal.
  • the outer edge of the seal roll 112 on the side of the first liquid tank 112, and the leading edge 236A is cylindrical with the seal roll 211.
  • the seal can be further improved, and the cylindrical gate member 192 can be further improved. Even if there is a gap between the second seal piece 236 and the seal roll 211, the seal can be maintained.
  • This second seal piece 236 may be, for example, a vinyl chloride sheet or half-divided vinyl chloride. It may be constituted by a chip. Further, in the above embodiment, as shown by the two-dot chain line in FIG.
  • the lower end of the work passage notch 1 98 is provided at the outer peripheral position of the upper bottom wall 19 4 of the cylindrical gate member 19 2.
  • cylindrical gate members 1 28 and 1 92 of the above embodiment have a cylindrical shape with a bottom, and the cylindrical gate member 18 6 is a force constituted by a flexible peripheral wall member 18 B.
  • the present invention is not limited to this, and if necessary, accepts the work 122 conveyed on the conveyance line 120 while maintaining a sealed state with the opening 118 side, and inserts the work inside. It is sufficient that the direction of the notch 1 98 can be changed 180 degrees on the transfer line 120 while the work 122 is present.
  • the shape may be an elliptical cylindrical shape.
  • the rotation may be either unidirectional or reciprocating.
  • the sprocket wheel since the chain 2 16 is not connected at the work passing notch 1 98, the sprocket wheel must be used when rotating in one direction. It is necessary to provide at two or more places.
  • the chain may be attached to the outer periphery of the lower end of the cylindrical gate member 186. At this stage, the chain is L continuously in the circumferential direction, so that only one sprocket wheel may be used. Further, there is an advantage that no torsional force is generated in the cylindrical gate member 186.
  • a cylindrical gate member 240 similar to the cylindrical gate member 92 in the sixth embodiment shown in FIG. 16 is provided.
  • a driven gear 2 42 which is coaxially and integrally mounted at the lower end of 0, is driven by a driving gear (described later), and a reinforcing lid having a cylindrical gate member 240 with an opening at the upper end provided with a work passage groove 24 A.
  • This embodiment differs from the embodiment shown in FIG. 16 in that the second embodiment is provided with a second through-hole 24, and a drainage communication hole 246 is provided in the peripheral wall of the cylindrical gate member 240.
  • the driven gear 242 is located below the cylindrical gate member 240. It is fixed to the side bottom wall 248 by bolt nuts 252A and 252B so as to be sandwiched from below with the movable bottom wall 25 °.
  • the driven gear 242 is integrally fastened and fixed to the lower bottom wall 248 of the cylindrical gate member 240, and is rotatably mounted on the movable bottom wall 250 around the bolt 252A together with the cylindrical gate member 240. L, ru.
  • Reference numeral 254 in FIG. 2 indicates an upper bottom wall in which a number of rectifying holes 254 A are formed.In the center of the upper bottom wall 254, work is performed so that the nut 252B can be tightened or loosened. A hole 254B is formed.
  • the driven gear 242 and the lower bottom wall 248 are formed so as to be substantially aligned in the thickness direction, as shown by broken lines in FIG.
  • the reinforcing lid 244 has a force having a width equal to that of the work passage notch 256 and has a substantially U-shape formed from the work passage notch 256 to a position beyond the rotation center line.
  • the cylindrical gate member 240 is provided with a work passage groove 244A and is attached to the inner periphery of the upper end of the cylindrical gate member 240 so as to increase its rigidity.
  • the drainage communication hole 246 is formed in the peripheral wall of the cylindrical gate member 240 near the upper bottom wall 254, and the rotational position of the cylindrical gate member 240 in the rotation direction. L is disposed at a position shifted by about 60 degrees in the rotation direction forward with respect to the work passage notch 256.
  • the movable bottom wall 250 is integrally provided with four seal plates 114 at the front and rear ends in the work transfer line direction and a wall-shaped frame 117 connecting the seal plates 114 in the transfer line direction. Inside, four seal rolls 112 are attached by supporting means 112 ⁇ , and a cylindrical gate member 240 is set between them. A lid 258 is attached from above, and a support 112 ⁇ on the back surface of the lid 258 is attached to the seal roll.
  • the gate member assembling rest 260 can be configured by fitting and fixing to the upper end of 112.
  • a circular recess 262 for rotatably storing the driven gear 242 is formed on the bottom surface of the movable bottom wall 250.
  • a through hole 26 2 A through which the bolt 25 2 A penetrates is formed, and a phase of 18 ° is interposed with the through hole 26 2 A interposed therebetween.
  • the liquid supply port 26 2 B and the liquid discharge port 26 2 C have the same fan shape as the above-mentioned liquid supply and discharge ports 24 2 A and 248 A, and may overlap with these. Is placed so that it can be
  • the gate member assembly 260 When the gate member assembly 260 is set at a predetermined position on the fixed bottom wall 266 which is the liquid tank bottom wall, the fixed bottom wall 2
  • the driving gear 2668 disposed at 66 is inserted so as to be able to communicate with the driven gear 2442.
  • Reference numeral 270 in FIG. 21 indicates a positioning wall for positioning in the work transfer line direction when the gate member assembly 260 is mounted.
  • the drive gear 268 is engaged with a pinion 272 as shown in FIG. 21 and FIG. 22, and the pinion 272 is a sprocket mounted in the middle of the rotation cold 272A.
  • the driven gear 242 is driven to rotate by a chain 276 wound around a rocket wheel 274, and the driven gear 242 is rotated via a driving gear 268.
  • the chain 2776 is wound around and driven by an external sprocket wheel (not shown) through a through hole 2778A of the liquid tank wall 2778.
  • the driving gear 2 68 and the pinion 2 7 2 are arranged so that the processing liquid level is zero with respect to the liquid level in the liquid tank on the opposite side with the cylindrical gate member 240 interposed therebetween. , And are the lower sides of the lower end of the work passage notch 256. Therefore, the through hole 2778A of the liquid tank wall 2778 needs to be provided at a position higher than the lower end of the work passage cutout 256 to prevent liquid leakage.
  • the processing liquid collected here at a position between the pair of (upper) seal rolls 111 is discharged into the cylindrical gate member 240.
  • the drainage communication hole 246 is arranged with a phase difference of about 60 degrees ahead of the workpiece passage notch 256 in the rotation direction. Does not enter or exit the cylindrical gate member 240.
  • the present invention provides a method for purifying a workpiece in a liquid processing tank, such as plating, alumite treatment, electrolytic polishing, electrolytic pickling, through-hole plating on a printed substrate, freon substitute cleaning, and jig peeling.
  • This is an immersion treatment device that can move the work horizontally continuously without moving it up and down with respect to the liquid treatment tank, so that the treatment can be performed efficiently with little loss time.

Abstract

An apparatus for immersing works in a liquid treatment tank such as a plating bath. Conventionally, a plating process of works has been carried out in such a manner that they transferred in the air from one tank to another after a given time of immersion in an arrangement including a plurality of tanks. Such an arrangement lacks efficiency because it requires both vertical and horizontal movements of works. In a continuous immersion apparatus (10) of horizontal transfer type of the present invention, reserve tanks (20, 22 and 24, 28) are disposed at the front and back of a liquid treatment tank (18) and a water washing neutralization recovery tank (26), respectively, and gates 30 to 36 are provided between these tanks so that the work can be transferred by only horizontal movement between the reserve tank and the outside, between the reserve tanks, and between the reserve tank and the liquid treatment tank (18) or the water washing neutralization recovery tank (26), by using a gate control apparatus and liquid quantity regulation means so as to improve liquid treatment efficiency.

Description

明 細 書 水平走行連続浸漬処理装置 技 術 分 野  Description Horizontal immersion continuous immersion treatment equipment Technical field
この発明は、 メツキ、 アルマイト処理、 電解研磨、 電解酸洗、 プリント基板ス ルーホールメツキ、 フロン代替洗浄、 治具剥離等の、 液処理槽にワークを浸濱し て処理を行うための浸漬処理装置に関する。  The present invention provides a dipping process for dipping a work in a liquid processing tank, such as plating, anodizing, electrolytic polishing, electrolytic pickling, through-hole plating on a printed circuit board, cleaning with a substitute for freon, and jig peeling. Related to the device.
背 景 技 術  Background technology
従来、 例えば、 メツキ処理、 電解酸洗等の工程は、 複数種類の液処理槽を並べ て、 ワークをエレベータあるいはキヤリャと称される搬送装置 (ラック及びバレ ル) により吊り下げて、 1つの液処理槽に一定時間浸漬した後、 これを上方に吊 り上げて、 そのまま隣接する液処理槽上方に移動した後降下させ、 該液処理槽に 浸漬させるという手順で、 順次所定の液処理槽に浸漬して処理を行うものである。 このようなワークの搬送方法は、 従来、 空中移行と称されている。  Conventionally, for example, in processes such as plating and electrolytic pickling, a plurality of types of liquid processing tanks are arranged, and a work is suspended by a transport device (rack and barrel) called an elevator or a carrier. After being immersed in the treatment tank for a certain period of time, it is lifted upward, moved directly above the adjacent liquid treatment tank, lowered, and immersed in the liquid treatment tank. The treatment is performed by immersion. Such a method of transporting a work is conventionally referred to as aerial transfer.
この搬送方法では、 ワークの下側ほど処理液に浸漬する時間が多くなり、 例え ばめつきでは、 めっき膜圧が上下で不均一となってしまう。  In this transfer method, the lower the work, the longer the dipping time in the processing solution, and for example, in the case of plating, the plating film pressure becomes uneven in the vertical direction.
又、 上記従来の装置は、 空中移行するために、 ロスタイムが大きく、 通常、 空 中移行の際のワークの上昇及び下降、 水平移動の工程で各々 5秒の時間を要し、 液処理時間を 8時間とすると、 空中での上下動及び水平移動の時間が 1 0時間と なり、 非常に作業能率が低 L、という問題点があつた。  In addition, the above-described conventional apparatus has a large loss time due to the transfer to the air, and usually takes 5 seconds each for the process of lifting and lowering the work and the horizontal movement during the transfer to the air. Assuming 8 hours, the vertical and horizontal movement time in the air was 10 hours, and the work efficiency was extremely low.
又、 このように空中移行によるロスタイムを補うために、 多くのワークを 1つ のラックに取付けて移動させるので、 必然的に各液処理槽が大きくなり、 このた め、 装置スペース力 <過大となるのみならず、 多量の処理液を必要とするという問 題点があつた。  Also, in order to compensate for the loss time due to the air transfer, many workpieces are mounted on one rack and moved, so that each liquid processing tank is inevitably large, and as a result, the equipment space < In addition, there is a problem that a large amount of processing solution is required.
又、 このように、 液処理嘈の容量が大きいと、 処理液を管理する管理槽を別途 に設けることが困難であるため、 液処理槽内の処理液を頻繁に検査して、 その液 質低下を防止しなければならないという問題点があつた。  Also, as described above, if the capacity of the liquid processing tank is large, it is difficult to separately provide a management tank for managing the processing liquid. Therefore, the processing liquid in the liquid processing tank is frequently inspected and the quality of the liquid is checked. There was a problem that the decline had to be prevented.
これらに対して、 例えば特開乎 2— 1 8 2 8 9 5号公報に開示されるように、 ワークを水平方向に連続的に走行させつつメッキ処理を行う装置がある。 On the other hand, for example, as disclosed in Japanese Patent Application Laid-Open No. There is an apparatus that performs a plating process while continuously moving a work in a horizontal direction.
し力、しな力くら、 この装置は、 条体 (線材) 等の連続休を処理するものであり、 機械部品等の独立した形状を有するものは処理することができないという問題点 がある。  This device processes continuous rests such as strips (wires), and has the problem that it cannot process mechanical parts and other objects that have independent shapes.
発 明 の 開 示  Disclosure of the invention
この発明は、 上記従来の問題点に鑑みてなされたものであって、 機械部品等で あっても、 連铳的に水平走行させて液処理することができる水平走行連続浸漬処 理装置を提供することを目的とする。  The present invention has been made in view of the above-described conventional problems, and provides a horizontal traveling continuous immersion treatment apparatus capable of continuously performing liquid treatment by horizontally traveling even if it is a mechanical part or the like. The purpose is to do.
又、 液処理槽の容量を小さくすることができる水平走行連続浸漬処理装置を提 供することを目的とする。  It is another object of the present invention to provide a horizontal traveling continuous immersion treatment apparatus capable of reducing the capacity of a liquid treatment tank.
この発明は、 ワークを一定範囲で水平搬送ラインに沿って水平に搬送する搬送 手段と、 液処理槽、 この液処理槽の前後に配置された前側及び後側リザーブ槽、 及び液処理槽とリザ一ブ槽内の処理液の量を調整する液量調整手段、 を含んで一 組とされて、 前記搬送ラインに沿って水平、 且つ、 連続的に配置された、 各処理 液につき少なくとも一組の液処理槽群と、 各液処理槽とリザ一ブ槽の境界壁及び 前側リザ一ブ槽の入側境界壁、 後側リザ一ブ槽の出側境界壁の上端から下方に一 定高さ範囲で形成され、 ワークの通過を許容する開口にそれぞれ配置され、 開状 態で前記ヮークの水平通過を許容すると共に、 閉じ状態で処理液の流出を阻止す るゲートと、 ゲートへのワーク接近時に該ゲートを開き、 ワーク通過後に該ゲー 卜を閉じ、 前側リザーブ槽の入側のゲ—卜と後側リザーブ槽の出側のゲー卜を、 液処理槽の入側のゲートと出側のゲートに対して逆位相で開閉させるゲート駆動 制御装置と、 を有してなり、 前記液量調整手段は、 液処理槽とリザーブ槽間をヮ ークが出入りするとき両槽の液処理レベルを同一とし、 リザ一ブ槽とリザーブ槽 外間を出入りするとき該リザーブ槽の液処理レベルを、 ゲート開状態におけるゲ 一卜開口下端以下とすることにより上記目的を達成するものである。  The present invention relates to a transfer means for transferring a work horizontally in a certain range along a horizontal transfer line, a liquid treatment tank, front and rear reserve tanks disposed before and after the liquid treatment tank, and a liquid treatment tank and a reservoir. A liquid amount adjusting means for adjusting the amount of the processing liquid in one tank, and at least one set for each processing liquid arranged horizontally and continuously along the transport line. And a constant height below the upper edge of the boundary wall between each liquid processing tank and the reserve tank, the entrance boundary wall of the front reserve tank, and the exit boundary wall of the rear reserve tank A gate that is formed in a range, and that is arranged in an opening that allows the passage of a workpiece, that allows the workpiece to pass horizontally in an open state, and that blocks a flow of a processing solution in a closed state, and a workpiece to the gate. Open the gate when approaching and open the gate after passing through the work A gate drive control device that opens and closes the gate on the inlet side of the front reservoir and the gate on the outlet side of the rear reservoir in opposite phases to the inlet and outlet gates of the liquid treatment tank. Wherein the liquid amount adjusting means sets the same liquid treatment level between the liquid treatment tank and the reserve tank when entering and leaving the tank, and enters and exits between the reserve tank and the outside of the reserve tank. In this case, the above object is achieved by setting the liquid treatment level of the reserve tank to be equal to or lower than the lower end of the gate opening when the gate is open.
本発明によれば、 液処理槽の前後にリザ一ブ槽が設けられ、 前側リザ一ブ槽の 入側境界壁、 後側リザーブ槽の出側境界壁及び液処理槽とリザーブ槽の境界壁を、 それぞれゲー卜により開閉自在とし、 液処理槽に入る前のワークを、 液面が低下 し、 入側境界壁のゲー卜が開いた状態で前側リザーブ槽に導いた後に入側境界壁 のゲートを閉じ、 ここに液処理槽と同一レベルまで処理液を満し、 次に前側リザ 一ブ槽、 液処理槽との境界壁のゲートを開き、 前側リザ一ブ槽内のワークを液処 理槽に導き、 次に前記境界壁のゲートを閉じ、 該液処理槽内で所定の処理が施さ れたワークは、 液処理槽の出側の、 後側リザ一ブ槽との境界壁のゲートカ、ら、 予 め処理液が満された後側リザーブ槽内に移送され、 しかる後、 液処理槽と後側リ ザ一ブ槽の境界ゲートを閉じて、 該後側リザーブ槽内の壁面を低下し、 後側リザ 一ブ槽の出側境界壁のゲ一卜を開いてワークを排出するという工程により、 ヮー クを水平に移動させつつ、 液処理を順次連続的に行うことができる。 According to the present invention, the reserve tanks are provided before and after the liquid treatment tank, the entrance boundary wall of the front reserve tank, the exit boundary wall of the rear reserve tank, and the boundary wall of the liquid treatment tank and the reserve tank. The work before entering the liquid treatment tank is guided to the front reserve tank with the liquid level lowered and the gate on the entrance boundary wall is opened, and then the work on the entrance boundary wall is opened. Close the gate and fill it with the processing liquid to the same level as the liquid processing tank, then open the front reservoir tank and the gate on the boundary wall with the liquid processing tank, and remove the work in the front reservoir tank. The work that has been guided to the processing tank, and then closed the gate of the boundary wall, and the workpiece that has been subjected to the predetermined processing in the liquid processing tank is the boundary wall between the outlet side of the liquid processing tank and the rear reserve tank. After being transferred to the rear reserve tank filled with the treatment liquid in advance, the boundary gate between the liquid treatment tank and the rear reserve tank is closed, and the inside of the rear reserve tank is closed. The process of lowering the wall surface, opening the gate on the outlet boundary wall of the rear reservoir tank, and discharging the workpiece enables the liquid treatment to be performed sequentially and continuously while moving the workpiece horizontally. it can.
従って、 従来の空中移行のロスタイムがなく、 又、 ワークをバッチ処理する必 要がないので、 液処理槽及びリザ一ブ槽を小さくすることができ、 これにより、 使用する処理液量も低'减させることができる。  Therefore, there is no loss time in the conventional air transfer, and there is no need to perform batch processing of the work, so that the liquid processing tank and the reserve tank can be made smaller, thereby reducing the amount of processing liquid used.减 can be.
前記ゲートを、 ワークの水平搬送ラインと直交する方向に移動して開口を開閉 するシャッタ一プレー卜力、ら構成し、 開口を迅速に開閉することができる。 更に、 前記ゲートにおけるシャツ夕一プレートを、 前記ワークの水平送りライ ンと直交する鉛直面内で該通過ラインに対して進退する一対設け、 これらシャツ 夕一プレートの対向端縁が接触することにより閉じ状態、 離間することにより開 状態となるようにして、 ワークを通過させるために、 該ワークの形状に応じて、 一対のシャッタープレートの対向端縁間を調整して、 開き量を最小限として、 ヮ 一クのゲ一ト通過の際の時間を短くすることができる。  The gate is constituted by a shutter-plate force for opening and closing the opening by moving the gate in a direction perpendicular to the horizontal transfer line of the work, so that the opening can be quickly opened and closed. Further, a pair of shirt evening plates at the gate are provided so as to advance and retreat with respect to the passing line in a vertical plane perpendicular to the horizontal feed line of the work, and the opposite edges of the shirt evening plates come into contact with each other. In order to allow the work to pass through the closed state and the open state when separated, the distance between the opposing edges of the pair of shutter plates is adjusted according to the shape of the work to minimize the opening amount.ヮ It is possible to shorten the time required for the gate to pass through the gate.
又、 前記ゲ一ト駆動制御装置を、 一組の液処理槽群における液処理槽の入側ゲ 一卜と出側ゲートを同期して開閉させるようにして、 ワークを搬送手段に固定的 に吊り下げて連続的に処理することができる。  In addition, the gate drive control device is configured to open and close the entrance gate and the exit gate of the liquid processing tank in a set of liquid processing tanks in a synchronized manner, so that the work is fixed to the transfer means. It can be suspended and processed continuously.
又、 前記ゲート駆動制御装置を、 前記ワークの水平送りラインに沿って前記液 処理槽群の側面に配置された動力軸と、 この動力由の駆動力を前記ゲートに伝達 する伝達装置と、 を有してなるようにして、 該動力由から滴下した油滴等が液処 理槽あるいはリザーブ槽内に落下することがなく、 又、 搬送手段と干渉すること もなく、 更に、 この動力由の任意の箇所から伝達装置を介してゲートに駆動力を 伝達できるので、 ゲ一卜を任意の箇所に設置することができる。  A power shaft arranged on a side surface of the liquid processing tank group along a horizontal feed line of the work; and a transmission device for transmitting a driving force from the power to the gate. As a result, the oil droplets and the like dropped from the power source do not fall into the liquid processing tank or the reserve tank, do not interfere with the conveying means, and Since the driving force can be transmitted from any location to the gate via the transmission device, the gate can be installed at any location.
更に、 前記ゲートを、 前記ワークの水平搬送ラインと直交する方向に移動して 開口を開閉するシャッタ一プレートを備えると共に、 該シャッタープレートを前 記ワークの搬送ラインと直交する鉛直面内で移動自在に案内するガイドを備え、 前記伝達装置は、 前記動力軸の回転運動を往復動にして前記ゲートに伝達する動 力変換装置として、 該シャッタープレート先端形状を、 ワークの形状に合わせて、 シャッタープレート開状態での先端とワークの隙間を最小にしてワーク通過時間 を短くすることができる。 Further, the gate is moved in a direction orthogonal to a horizontal transfer line of the work. A shutter plate for opening and closing the opening; and a guide for movably guiding the shutter plate in a vertical plane perpendicular to the work transfer line, wherein the transmission device reciprocates the rotational motion of the power shaft. As a power conversion device for transmitting the motion to the gate, the shape of the tip of the shutter plate is adapted to the shape of the workpiece, and the gap between the tip and the workpiece when the shutter plate is open is minimized to shorten the workpiece transit time. Can be.
又、 前記ゲートは、 前記ヮ クの水平搬送ラインと直交する鉛直面内で揺動自 在に支持されて、 揺動により開口を開閉するシャッタープレー卜を備え、 前記伝 達装置は、 前記動力軸の回転運動を前記シャッタープレー卜の揺動運動として伝 達する動力変換装置として、 動力軸の回転運動を容易に揺動運動に変換して、 シ ャッ夕一プレー卜に伝達することができる。  Further, the gate includes a shutter plate that is swingably supported in a vertical plane orthogonal to a horizontal transport line of the vehicle, and that opens and closes an opening by swinging. As a power conversion device for transmitting the rotational motion of the shaft as the oscillating motion of the shutter plate, the rotational motion of the power shaft can be easily converted to the oscillating motion and transmitted to the shutter plate.
更に、 前記少なくとも一組の液処理槽群が、 1本の動力铀を共有し、 前記伝達 装置は各ゲート毎に設けられるようにして、 同期して容易に各ゲートを開閉させ ることができる。  Further, the at least one set of liquid processing tank groups shares one power line, and the transmission device is provided for each gate, so that each gate can be easily opened and closed in synchronization. .
更に、 前記各組の液処理槽群における液処理槽とリザーブ槽を、 直線状に配置 し、 且つ、 隣接する組は、 その水平送りラインの相対角度が任意に調節自在とさ れるようにして、 工場内のレイアウトを、 周囲の装置、 スペースに合わせて任意 に設定することができる。  Furthermore, the liquid processing tank and the reserve tank in each of the liquid processing tank groups of each set are linearly arranged, and the adjacent sets are arranged such that the relative angle of the horizontal feed line can be freely adjusted. The layout in the factory can be arbitrarily set according to the surrounding equipment and space.
又、 前記前側リザーブ槽の入側ゲートと処理液槽の入側ゲートとの対、 前記後 側リザ一ブ槽の出側ゲートと処理液槽出側ゲー卜との対の少なくとも一方の対を、 前記境界壁の前記開口に配置し、 内部にワークを収納する空間、 及び上端から一 定深さで、 前記空間から外周の一個所に至るまで形成され、 ワークが前記空間に 出入することを許容するワーク通過切欠きを備え、 且つ、 上下方向の中心幸由廻り に回動自在とされた上端開放有底円筒状部材であって、 前記ワーク通過切欠きの 開口方向を、 前記搬送ラインに沿う 2方向に 1 8 0度変換可能とされた円筒ゲー ト部材と、 この円筒ゲート部材の外周と前記開口の内周縁との間を液密にシール するシール部材と、 を備えて構成し、 前記円筒ゲート部材の内部の前記空間によ り前記リザーブ槽を構成する。  Further, at least one pair of a pair of the entrance gate of the front reserve tank and the entrance gate of the processing liquid tank, and a pair of the exit gate of the rear reserve tank and the exit gate of the processing liquid tank. A space that is arranged in the opening of the boundary wall and accommodates a work therein, and that is formed from the upper end at a certain depth from the space to one location on the outer periphery, and that the work enters and exits the space. A cylindrical member having an open top and a bottom which is provided with an allowable work passage notch and is rotatable around a center in a vertical direction, wherein an opening direction of the work passage notch is set to the transfer line. A cylindrical gate member capable of being converted by 180 degrees in two directions along the seal member, and a seal member for sealing between the outer periphery of the cylindrical gate member and the inner peripheral edge of the opening in a liquid-tight manner, Due to the space inside the cylindrical gate member Constitute the reserve tank.
この発明によれば、 円筒ゲート部材が、 その空間内にリザーブ槽を形成し、 こ こにワークを収納した状態のままワーク通過切欠きの開口方向を搬送ラインの反 対方向に 1 8 0度変換し、 そのとき、 円筒ゲート部材の外周と隔壁との開口との 間はシール部材によって液密状態にシールされるので、 ワークを円筒ゲ一ト部材 に接触しない状態のまま仕切壁を通過させることができる。 又このときの液漏れ 量は、 前記円筒ゲート部材の空間内に入り込んだ液量に等しいので、 液漏れを抑 制することができる。 According to the present invention, the cylindrical gate member forms a reserve tank in the space, The opening direction of the work passage notch is changed 180 degrees in the opposite direction to the transfer line while the work is stored, and at this time, a seal member is provided between the outer periphery of the cylindrical gate member and the opening between the partition wall. As a result, the work can be passed through the partition wall without contacting the cylindrical gate member. Since the amount of liquid leakage at this time is equal to the amount of liquid that has entered the space of the cylindrical gate member, it is possible to suppress liquid leakage.
又、 前記円筒ゲート部材の底壁を、 二重構造とし、 上側底壁には多数の整流細 孔が形成され、 下側底壁には、 前記ワーク通過切欠きの開口の方向の変換に伴つ て位置が変化され、 これにより円筒ゲート部材内に液体を流入させ、 又は、 流入 した液体を排出するための給排液口を設け、 ワーク通過切欠きの開口から液体が 流入する前に、 給排液口から円筒ゲート部材内に液体を流入させ、 ワーク通過切 欠きの開口から急激に液体が流れ込むことによるワーク吊り下げ状態の変化、 円 筒ゲート部材近傍における急激な圧力上昇による歪等を解消すると共に、 給排液 口から流入した液体力《上側底壁の整流細孔を通ることによって、 円筒ゲート部材 内に流入する液体の乱れを防止することができる。  Further, the bottom wall of the cylindrical gate member has a double structure, a large number of rectifying holes are formed in the upper bottom wall, and the lower bottom wall is provided with a change in the direction of the opening of the work passage cutout. Therefore, the position is changed, and thereby the liquid is allowed to flow into the cylindrical gate member, or a supply / drain port for discharging the flowed liquid is provided, and before the liquid flows from the opening of the work passage cutout, Changes in the suspended state of the work due to the liquid flowing into the cylindrical gate member from the supply / drain port and the rapid flow of the liquid through the opening of the work passage notch, distortion due to a sudden increase in pressure near the cylindrical gate member, etc. In addition, the liquid force flowing from the supply / drain port << the flow force through the rectifying pores of the upper bottom wall can prevent the liquid flowing into the cylindrical gate member from being disturbed.
又、 ワーク通過切欠きの開口力《液面が低い槽側に開く前に、 給排液口から円筒 ゲート部材内の液体を排出することによって、 ワーク通過切欠きの開口から液面 が低い槽内に液体が急激に流出すること及びこれによるワーク吊り下げ状態の乱 れ、 液体の飛散を抑制することができる。  In addition, the opening force of the workpiece passage notch <Before the liquid level is low, the liquid inside the cylindrical gate member is discharged from the supply / drain port to open the tank with the liquid level low from the opening of the work passage notch. It is possible to suppress the liquid from suddenly flowing into the inside of the container, thereby disturbing the suspended state of the work and preventing the liquid from scattering.
又、 前記円筒ゲート部材の下側底壁の下側に隣接する液槽底壁には、 前記円筒 ゲート部材の下側底壁における前記給排液口を、 前記ワーク通過切欠き力 隣接 する槽のうち液面が低い側に閉じてから液面力高い側に開くまでの間の少なくと も一部の時間に、 該液面が高い側に連通させる給液ポートと、 前記給排液口を、 ヮーク通過切欠きが液面が高 L、側に閉じてから液面が低 L、側に開くまでの間の少 なくとも一部の時間に排液系に連通させる排液ポー卜と、 を設けて特別なバルブ あるいはバルブ制御を必要とすることなく、 円筒ゲ一卜部材内側への給液及び排 液を円筒ゲート部材のワーク通過切欠きの開口方向に合わせて行うことができる。 又、 前記円筒ゲート部材の底壁の下側に、 これと同^一体的に被動ギヤを備え、 該円筒ゲート部材の下方の液槽底壁には、 前記被動ギヤを回転自在に収容する円 形凹所と、 該円形凹所内の前記被動ギヤと嚙み合ってこれを回転駆動する駆動ギ ャを配置し、 前記被動ギヤに、 前記円筒ゲ一卜部材の下側底壁における前記給排 液口に接続する第 2給排液口を設けて、 円形凹所により円筒ゲート部材を回動自 在に支持すると共に給排液の同期を可能とすることができる。 Further, the liquid tank bottom wall adjacent to the lower side of the lower bottom wall of the cylindrical gate member is provided with the supply / drainage port in the lower bottom wall of the cylindrical gate member, and the work passing notch force is adjacent to the tank. A liquid supply port communicating with the liquid level higher side at least for a part of time from when the liquid level is closed to the lower side to when the liquid level is higher, and A drain port that communicates with the drainage system at least part of the time from when the notch passage notch closes the liquid level to high L and closes to the side to low L and opens to the side at least in part. By providing a valve, the liquid supply and drainage to the inside of the cylindrical gate member can be performed in accordance with the opening direction of the work passage cutout of the cylindrical gate member without requiring a special valve or valve control. In addition, a driven gear is provided below the bottom wall of the cylindrical gate member and integrally therewith, and the liquid tank bottom wall below the cylindrical gate member is a circle for rotatably receiving the driven gear. And a driving gear that meshes with the driven gear in the circular recess to rotate the driven gear. The driven gear is provided with the supply / discharge at the lower bottom wall of the cylindrical gate member. By providing a second liquid supply / drain port connected to the liquid port, the cylindrical gate member can be pivotally supported by the circular recess and the liquid supply / drain can be synchronized.
又、 前記シール部材を、 前記円筒ゲート部材の中心軸線と平行に、 且つ、 前記 搬送ラインの左右であって円筒ゲート部材の搬送方向前側の 2個所及び後側の 2 個所で、 該円筒ゲート部材の円筒形外周に、 前記中心帥線廻りの相対変位可能に 接触して配置されたシールロールと、 前記開口の内周縁側に取付けられ、 先端縁 力《前記シールロールの外周に、 前記円筒ゲート部材と反対側から相対変位可能に 接触する 4個のシール板と、 を備えて構成し、 シーノレ状態を良好に維持したまま、 円筒ゲート部材の摩擦の少ない回転を許容することができる。  Further, the sealing member is provided in parallel with the central axis of the cylindrical gate member, and at two positions on the left and right sides of the transfer line, on the front side and the rear side in the transfer direction of the cylindrical gate member, the cylindrical gate member. A seal roll disposed in contact with the cylindrical outer periphery so as to be relatively displaceable about the central line, and attached to an inner peripheral side of the opening; And four seal plates that come into contact with each other so as to be relatively displaceable from the opposite side of the member, so that rotation of the cylindrical gate member with little friction can be allowed while maintaining a good state of the see-through.
又、 前記シールロールを、 パイプと、 このパイプを回動可能に支持し、 且つ、 前記パイプの内径に対して径方向の遊び代をもって遊嵌された支持軸と、 を備え て構成して、 液圧によって径方向に変位する円筒形の円筒ゲート部材に対して、 該変位に追随して、 シールロールを形成するパイプが変位し、 シールを良好に維 持することができる。  Also, the seal roll comprises a pipe, and a support shaft rotatably supporting the pipe, and a support shaft loosely fitted with a radial allowance to the inner diameter of the pipe, The pipe forming the seal roll is displaced following the displacement of the cylindrical gate member which is displaced in the radial direction by the hydraulic pressure, and the seal can be maintained satisfactorily.
又、 前記シール口—ルのうち液面が高 、槽側のシール口一ルの外側に接触して、 先端縁が、 該シールロールと前記円筒ゲート部材外周との鉛直方向接線近傍に延 在される軟質の第 2シール片を設けて、 円筒ゲート部材の回転を妨げることなく、 更に確実にシール状態を維持することができる。  Also, when the liquid level of the seal port is high, the liquid comes into contact with the outside of the seal port on the tank side, and the leading edge extends near a vertical tangent between the seal roll and the outer periphery of the cylindrical gate member. By providing a soft second seal piece, the sealed state can be maintained more reliably without hindering the rotation of the cylindrical gate member.
又、 前記円筒ゲー卜部材の周壁の、 該円筒ゲート部材のワーク通過切欠きが液 面が高い側に連通しているとき、 該ワーク通過切欠きに対して円筒ゲート部材回 転方向前方に隣接するシールロール及び次に隣接するシールロール間の位置に、 円筒内外を連通する排液連通孔を形成し、 円筒ゲート部材外側でシールロール間 に溜まる液を円筒ゲート部材内に排出して、 液の吹き出しを防止することができ る。  In addition, when the work passage cutout of the cylindrical gate member communicates with the peripheral wall of the cylindrical gate member on the side where the liquid surface is higher, the work passage cutout is adjacent to the work passage cutout in front of the cylindrical gate member rotation direction. A drain communication hole communicating between the inside and outside of the cylinder is formed at a position between the seal roll to be sealed and the next adjacent seal roll, and the liquid collected between the seal rolls outside the cylindrical gate member is discharged into the cylindrical gate member. Balloons can be prevented.
又、 前記円筒ゲート部材の下端近傍及び上端近傍の一方における円筒形の外周 に円周方向にチェーンを固着し、 前記境界壁を含む液槽側には、 前記チェーンと 嚙み台うと共に、 該チェーンを介して前記円筒ゲート部材を、 前記 ib線廻りに回 耘駆動するスプロケッ トホイールが設けて、 例えば、 円筒ゲート部材下端から被 動铀を下方に突出した場合と比較して、 シールが容易であると共に、 駆動時の摩 擦抵抗が少なく、 又スプロケッ トホイールからの駆動力を、 チェーンが、 円筒ゲ —ト部材の円周方向に分散して、 応力の集中を防止できる。 Further, a chain is circumferentially fixed to the outer periphery of the cylinder at one of the vicinity of the lower end and the upper end of the cylindrical gate member, and the chain and the chain are provided on the liquid tank side including the boundary wall. Turn the cylindrical gate member around the ib line through a chain. A sprocket wheel for tilling drive is provided. For example, compared to a case where the driven 時 protrudes downward from the lower end of the cylindrical gate member, the seal is easier, the frictional resistance at the time of driving is reduced, and the sprocket is driven. The chain distributes the driving force from the wheel in the circumferential direction of the cylindrical gate member, preventing the concentration of stress.
更に前記開口に、 前記円筒ゲート部材のワーク通過切欠きの開口方向を 2方向 に変換する運動軌跡に沿って、 その外側を、 搬送ラインの両側から、 隙間をもつ て囲んで配置された一対のガイド壁と、 前記円筒ゲート部材の底面に接触し、 ― 定範囲で運動可能に支持するガイド底壁と、 を有してなるガイ ド部材を設け、 ガ ィ ド壁の前記搬送ライン方向両端は、 ワークの通過を許容する間隙をもって対向 させて、 円筒ゲート部材を、 ガイド部材により囲むことにより、 液圧によって円 筒ゲート部材が傾いたりすることを防止できると共に、 強い液圧によって円筒ゲ 一ト部材が流されようとするとき、 これが一対のガイ ド壁に接触することによつ てその流出が防止されると同時に、 液漏れも防止できる。  Furthermore, a pair of a pair of work pieces arranged so as to surround the outer side of the opening along the movement trajectory that converts the opening direction of the work passage cutout of the cylindrical gate member into two directions from both sides of the transfer line. A guide member having a guide wall, and a guide bottom wall that is in contact with the bottom surface of the cylindrical gate member and supports the movable member in a fixed range, is provided. By surrounding the cylindrical gate member with a guide member with a gap that allows the workpiece to pass through, it is possible to prevent the cylindrical gate member from tilting due to hydraulic pressure, and to use a strong hydraulic pressure to prevent the cylindrical gate member from tilting. When the member is about to flow, it comes into contact with the pair of guide walls, thereby preventing the member from flowing out and also preventing liquid leakage.
又、 前記シール部材を、 前記ガイ ド壁に設けられ、 前記円筒ゲート部材の外周 に摺設自在とされたシール片を含むようにして、 円筒ゲート部材が傾いたり、 ず れを生じても、 シール片が確実にガイ ド壁とガイ ド部材の間のシールをして、 液 漏れを防止することができる。  In addition, the seal member is provided on the guide wall, and includes a seal piece slidably provided on the outer periphery of the cylindrical gate member, so that even if the cylindrical gate member is inclined or displaced, the seal piece is formed. Can reliably seal between the guide wall and the guide member to prevent liquid leakage.
又、 前記円筒ゲ一ト部材の、 底部にフランジを備え、 前記一対のガイ ド部材は、 前記フランジの外周に対して僅かな隙間をもつて配置された円弧状内周面を備え、 前記シール部材は、 前記ガイ ド部材に設けられ、 前記円筒ゲート部材の円筒状外 周面とフランジの上面に摺設自在とされたシール片を含んで構成しているので、 1つのシール片によって円筒ゲー卜部材の外周及び底部のシールを行うことがで きる。  Further, the cylindrical gate member includes a flange at a bottom portion, the pair of guide members includes an arc-shaped inner peripheral surface arranged with a slight gap with respect to the outer periphery of the flange, and the seal includes: The member includes a seal piece provided on the guide member and slidably provided on the cylindrical outer peripheral surface of the cylindrical gate member and the upper surface of the flange. It is possible to seal the outer periphery and the bottom of the bracket member.
又、 前記円筒ゲート部材の底壁の、 前記中心鈾線の位置に、 前記液槽の底壁よ りも下方に突出する被動^]を備え、 該被動蚰を介して前記中心轴線廻りに回動さ れるようにして、 液槽下方に駆動装置を配置することによって、 円筒ゲート部材 を容易に駆動することができる。  In addition, at the position of the center line of the bottom wall of the cylindrical gate member, there is provided a driven member projecting downward below the bottom wall of the liquid tank, and around the center line through the driven member. The cylindrical gate member can be easily driven by arranging the driving device below the liquid tank so as to be rotated.
又、 前記円筒ゲート部材の底壁の下側に、 これと同 ΐ由一体的に被動ギヤを備え、 該円筒ゲ一ト部材の下方の液槽底壁には、 前記被動ギヤを回転自在に収容する円 形凹所と、 該凹所内の前記被動ギヤと嚙み台ってこれを回転駆動する駆動ギヤを 配置して、 円筒ゲート部材を被動ギヤを介して液漏れを生じることなく回動自在 に支持すると共に、 円筒ゲート部材に歪やねじれを発生させることなく安定して 回転駆動することができる。 In addition, a driven gear is provided on the lower side of the bottom wall of the cylindrical gate member and integrally therewith, and the driven gear is rotatably provided on the bottom wall of the liquid tank below the cylindrical gate member. Circle to accommodate A concave recess, and a driven gear for rotating the driven gear with the driven gear in the recess, and rotatably supporting the cylindrical gate member via the driven gear without causing liquid leakage. In addition, the cylindrical gate member can be driven to rotate stably without generating distortion or twist.
更に、 前記液槽底壁を、 前記円形凹所を備えた可動底壁と、 前記液処理槽の底 壁に連統する固定底壁との二重構造とし、 前記円筒ゲート部材、 シール部材、 被 動ギヤ及び可動底壁は、 枠部材により一体的な組立体とし、 且つ、 前記固定底壁 の、 前記被動ギヤが前記駆動ギヤと嚙み合う位置に着脱自在として、 円筒ゲート 部材の設定、 交換、 メンテナンスを容易とすることができる。  Further, the liquid tank bottom wall has a double structure of a movable bottom wall having the circular recess and a fixed bottom wall connected to the bottom wall of the liquid processing tank, and the cylindrical gate member, the sealing member, The driven gear and the movable bottom wall are integrally assembled by a frame member, and the fixed bottom wall is detachably attached to a position where the driven gear meshes with the driving gear. Replacement and maintenance can be facilitated.
又、 前記円筒ゲート部材の上端開口に、 前記ワーク通過切欠きから前記中心軸 を超える位置まで、 該ワーク通過切欠きと等しい幅で円筒の径方向に形成された ワーク通過溝を備えた補強蓋を取付けて、 円筒ゲート部材の剛性を增大すること ができる。  Further, a reinforcing lid having a work passage groove formed in a radial direction of a cylinder with a width equal to the work passage notch from the work passage notch to a position beyond the central axis at an upper end opening of the cylindrical gate member. The rigidity of the cylindrical gate member can be increased by mounting the.
又、 前記円筒ゲート部材を、 長円形状の底壁と、 この β上に、 長円軌道上を 周方向に摺動自在に配置された可撓性周壁部材と、 を有して構成し、 且つ、 該可 撓性周壁部材を前記長円軌道の全長よりも、 ワーク通過幅程度短くして構成して、 長円の長径を大きくすることによって、 搬送ライン方向に長いワークも処理する ことができる。  Further, the cylindrical gate member comprises: an oval-shaped bottom wall; and a flexible peripheral wall member disposed on the β so as to be slidable on an oval orbit in the circumferential direction. In addition, the flexible peripheral wall member is configured to be shorter than the entire length of the elliptical track by about the work passing width, and by increasing the major axis of the ellipse, it is possible to process a workpiece that is long in the transport line direction. it can.
又、 少なくとも前記ワークの通過軌跡範囲に相当するワーク通路が形成され、 前記円筒ゲート部材における前記空間内に、 上方から着脱自在とされた揷入部材 を設け、 円筒ゲート部材の内側空間を、 ワークの通過を妨げることなく挿入部材 によって充填し、 円筒ゲート部材の開閉に伴なう液漏れ量を、 挿入部材の体積分 だけ低'减させることができる。  Further, a work passage corresponding to at least the passage locus range of the work is formed, and an insertion member which is detachable from above is provided in the space of the cylindrical gate member. It is filled with the insertion member without obstructing the passage of the liquid, and the amount of liquid leakage accompanying opening and closing of the cylindrical gate member can be reduced by the volume of the insertion member.
更に、 前記リザーブ槽の底壁に、 円筒ゲート部材の外側に、 前記開口の底辺よ りも低い高さの仕切壁を立設し、 且つ、 この仕切壁と前記隔壁の間に、 漏出液回 収孔を設けて、 円筒ゲート部材の開閉に際して発生する漏出液を他の液槽に漏出 されることなく回収することができる。  Further, a partition wall having a height lower than the bottom of the opening is erected on the bottom wall of the reserve tank and outside the cylindrical gate member. By providing a collecting hole, the leakage liquid generated when the cylindrical gate member is opened and closed can be collected without leaking to another liquid tank.
更に又、 前記仕切壁の高さ及び漏液回収孔の漏出液排出能力を、 前記隔壁の全 開時に、 液処理槽から漏出する液体を、 前記仕切壁を越えることなく排出する程 度として、 万一、 ゲート部材が破壊されて、 液処理槽内の液体が開口から大量に 流出しても、 これを他の液槽に漏出されることなく回収することができる。 Further, the height of the partition wall and the leaked liquid discharge capability of the leak recovery hole are set so that the liquid leaking from the liquid treatment tank is discharged without exceeding the partition wall when the partition is fully opened. In the unlikely event that the gate member is broken and a large amount of liquid in the liquid treatment tank flows out of the opening, it can be collected without leaking to another liquid tank.
本発明によれば、 液処理槽の前後にリザ一ブ槽が設けられ、 前側リザ一ブ槽の 入側境界壁、 後側リザ—ブ槽の出側境界壁及び液処理槽とリザ一ブ槽の境界壁を、 それぞれゲートにより開閉自在とし、 液処理槽に入る前のワークを、 液面が低下 し、 入側境界壁のゲ一卜が開いた状態で前側リザーブ槽に導いた後に入側境界壁 のゲートを閉じ、 ここに液処理槽と同一レベルまで処理液を满し、 次に前側リザ 一ブ槽、 液処理槽との境界壁のゲートを開き、 前側リザーブ槽内のワークを液処 理槽に導き、 次に前記境界壁のゲートを閉じ、 該液処理槽内で所定の処理が施さ れたワークは、 液処理槽の出側の、 後側リザ一ブ槽との境界壁のゲ一トカ、ら、 予 め処理液が満された後側リザーブ槽内に移送され、 しかる後、 液処理槽と後側リ ザ一ブ槽の境界ゲートを閉じて、 該後側リザ一ブ槽内の壁面を低下し、 後側リザ —ブ槽の出側境界壁のゲ一卜を開いてワークを排出するという工程により、 ヮー クを水平に移動させつつ、 液処理を順次連続的に行うことができる。  According to the present invention, a reserve tank is provided before and after the liquid treatment tank, and the entrance boundary wall of the front reserve tank, the exit boundary wall of the rear reserve tank, and the liquid treatment tank and the reserve are provided. The boundary wall of the tank is made openable and closable by a gate, and the work before entering the liquid treatment tank is introduced into the front reserve tank after the liquid level is lowered and the gate on the entrance boundary wall is open. Close the gate on the side boundary wall, apply the processing liquid to the same level as the liquid processing tank, and then open the front reservoir tank and the gate on the boundary wall with the liquid processing tank to open the work in the front reservoir. The work is guided to the liquid treatment tank, and then the gate on the boundary wall is closed. The work which has been subjected to the predetermined treatment in the liquid treatment tank is located at the boundary between the outlet side of the liquid treatment tank and the rear reserve tank. The gates, etc. on the wall are transferred into the rear reserve tank filled with the treatment liquid in advance, and then the liquid treatment tank and the rear reservoir are filled. By closing the boundary gate of the reserve tank, lowering the wall surface in the rear reserve tank, opening the gate on the outlet boundary wall of the rear reserve tank, and discharging the work. The liquid processing can be performed sequentially and continuously while moving the workpiece horizontally.
従って、 従来の空中移行のロスタイムがなく、 又、 ワークをバッチ処理する必 要がないので、 液処理槽及びリザ一ブ槽を小さくすることができ、 これにより、 使用する処理液量も低'减させることができる。  Therefore, there is no loss time in the conventional air transfer, and there is no need to perform batch processing of the work, so that the liquid processing tank and the reserve tank can be made smaller, thereby reducing the amount of processing liquid used.减 can be.
図面の簡単な説明  BRIEF DESCRIPTION OF THE FIGURES
図 1は、 本発明の実施冽に係る水平走行連続メツキ装置を示す斜視図である。 図 2は、 同実施例装置を示す略示正面図である。  FIG. 1 is a perspective view showing a horizontal traveling continuous plating device according to the embodiment of the present invention. FIG. 2 is a schematic front view showing the apparatus of the embodiment.
図 3は、 同装置の略示側面図である。  FIG. 3 is a schematic side view of the same device.
図 4は、 同実施例装置におけるゲー卜開閉機構を拡大して示す斜視図である。 図 5は、 同実施例装置における各槽の液面レベルの制御とゲー卜の開閉制御と の関係を示す一部プロック図を含む略示断面図である。  FIG. 4 is an enlarged perspective view showing a gate opening / closing mechanism in the apparatus of the embodiment. FIG. 5 is a schematic cross-sectional view including a partial block diagram showing a relationship between control of the liquid level of each tank and control of opening and closing of the gate in the apparatus of the embodiment.
図 6は、 同実施例装置における各槽の液面レベルの制御とゲー卜の開閉制御と の関係を示す略示断面図である。  FIG. 6 is a schematic cross-sectional view showing a relationship between control of the liquid level of each tank and control of opening and closing the gate in the apparatus of the embodiment.
図 7は、 同実施例装置における各槽の液面レベルの制御とゲー卜の開閉制御と の関係を示す略示断面図である。  FIG. 7 is a schematic cross-sectional view showing the relationship between control of the liquid level of each tank and control of opening and closing the gate in the apparatus of the embodiment.
図 8は、 同実施例装置における各槽の液面レベルの制御とゲー卜の開閉制御と の関係を示す略示断面図である。 Fig. 8 shows the control of the liquid level of each tank and the opening and closing control of the gate in the apparatus of the embodiment. It is a schematic sectional drawing which shows the relationship.
図 9は、 本発明の第 2実施例を示す略示平面図である。  FIG. 9 is a schematic plan view showing a second embodiment of the present invention.
図 1 0は、 実施例装置におけるリザーブ槽の変形例を示す略示平面図である。 図 1 1は、 本発明に第 3実施例のゲー卜を利用した処理液槽ラインを示す斜視 図である。  FIG. 10 is a schematic plan view showing a modified example of the reserve tank in the apparatus of the embodiment. FIG. 11 is a perspective view showing a processing liquid tank line using the gate of the third embodiment in the present invention.
図 1 2は、 同実施例の液面維持ゲ一トを拡大して示す分解斜視図である。 図 1 3は、 同実施例の液面維持ゲー卜とワークとの関係を示す略示平面図であ 。  FIG. 12 is an exploded perspective view showing the liquid level maintaining gate of the embodiment in an enlarged manner. FIG. 13 is a schematic plan view showing the relationship between the liquid level maintaining gate and the work of the example.
図 1 4は、 本発明の第 4実施例に係る液面維持ゲ一トを示す斜視図である。 図 1 5は、 本発明の第 5実施例に係る液面維持ゲー卜を示す斜視図である。 図 1 6は、 本発明の第 6実施例に係る液面維持ゲー卜を示す斜視図である。 図 1 7は、 同実施例のゲート部材を分解して示す斜視図である。  FIG. 14 is a perspective view showing a liquid level maintaining gate according to a fourth embodiment of the present invention. FIG. 15 is a perspective view showing a liquid level maintaining gate according to a fifth embodiment of the present invention. FIG. 16 is a perspective view showing a liquid level maintaining gate according to a sixth embodiment of the present invention. FIG. 17 is an exploded perspective view showing the gate member of the embodiment.
図 1 8は、 同実施例の液槽の一部を示す斜視図である。  FIG. 18 is a perspective view showing a part of the liquid tank of the embodiment.
図 1 9は、 同実施例のシール部材の他の実施例を示す平面図である。  FIG. 19 is a plan view showing another embodiment of the seal member of the embodiment.
図 2 0は、 本発明の第 7実施例を示す断面図である。  FIG. 20 is a sectional view showing a seventh embodiment of the present invention.
図 2 1は、 同実施例を示す平面図である。  FIG. 21 is a plan view showing the same example.
図 2 2は、 図 2 1の実施例を右方向から見た断面図である。  FIG. 22 is a cross-sectional view of the embodiment of FIG. 21 as viewed from the right.
図 2 3は、 同実施例のゲート部材組立休の可動底壁部分を示す平面図である。  FIG. 23 is a plan view showing a movable bottom wall portion of the gate member when the gate member is not assembled.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
以下、 本発明の実施例を図面を参照して説明する。  Hereinafter, embodiments of the present invention will be described with reference to the drawings.
この実施例は、 本発明を図 1に示される金メツキのための水平走行連続メツキ 装置 1 0に適用したものである。  In this embodiment, the present invention is applied to a horizontal traveling continuous plating device 10 for gold plating shown in FIG.
この水平走行連続メッキ装置 1 0は、 ワークを水平搬送ライン 1 2 Aに沿って 搬送する搬送手段 1 2と、 前記水平搬送ライン 1 2 Aに沿って、 その下側に、 連 続して配置されたメツキ槽群 1 4と、 水洗中和回収槽群 1 6とを備えて構成され ている。  The horizontal traveling continuous plating apparatus 10 is provided with a transport means 12 for transporting a workpiece along a horizontal transport line 12A, and a continuous arrangement below the horizontal transport line 12A. And a tank 16 for neutralization and recovery of water.
前記メッキ槽群 1 4は、 メツキ槽 1 8と、 このメッキ槽 1 8の前後に配置され た前側及び後側リザーブ槽 2 0、 2 2と力、ら構成され、 又、 前記水洗中和回収槽 群 1 6は、 前記後側リザーブ槽 2 2に隣接する前側回収リザーブ槽 2 4と水洗中 和回収槽 2 6と、 その後側に配置された後側回収リザーブ槽 2 8と、 から構成さ れている。 The plating tank group 14 is composed of a plating tank 18, front and rear reserve tanks 20, 22 arranged before and after the plating tank 18, and the water washing neutralization and recovery. Vessel group 16 is being flushed with the front recovery reservoir 24 adjacent to the rear reservoir 22 It comprises a sum recovery tank 26 and a rear recovery reserve tank 28 arranged on the rear side.
前記前側リザ一ブ槽 2 0の入側の境界壁 2 0 Aと、 この前側リザ一ブ槽 2 0と メツキ槽 1 8との間の境界壁 1 8 Aと、 後側リザ一ブ槽 2 2との境界壁 1 8 Bと、 この後側リザ一ブ槽 2 2と前側回収リザ一ブ槽 2 4との間の境界壁 2 2 Aと、 前 側回収リザ一ブ槽 2 4と水洗中和回収槽 2 6との境界壁 2 6 Aと、 この水洗中和 回収槽 2 6と後側回収リザ—ブ槽 2 8との境界壁 2 6 Bと、 前記後側回収リザ一 ブ槽 2 8の出側の境界壁 2 8 Aとには、 それぞれゲー卜 3 0〜 3 6力 <配置され、 これら境界壁 1 8 A、 1 8 B、 2 2 A、 2 6 A、 2 6 B及び 2 8 Aが開閉される ようになつている。  A boundary wall 20 A on the entrance side of the front reservoir tank 20, a boundary wall 18 A between the front reservoir tank 20 and the plating tank 18, and a rear reservoir tank 2 Boundary wall 18 B with 2 and boundary wall 2 2 A between this rear reservoir 22 and front recovery reservoir 24 and front recovery reservoir 24 The boundary wall 26 A between the neutralization and recovery tank 26 and the boundary wall 26 B between the washing neutralization and recovery tank 26 and the rear recovery reserve tank 28, and the rear recovery reserve tank Gates 30 to 36 forces are arranged on the outgoing boundary wall 28 A of 28, respectively, and these boundary walls 18 A, 18 B, 22 A, 26 A, 26 B And 28 A are opened and closed.
前記ゲート 3 0〜3 6は、 図 4に拡大して示されるように、 前記ワークの水平 搬送ライン 1 2 Aと直交する鉛直面内で、 ワークの通過ラインに対して水平方向 に同期して進退する一対のシャッ夕一プレート 3 8を備え、 これらシャッ夕一プ レート対向端縁 3 8 Aが接触することにより境界壁を閉じ、 又、 離間することに よってワーク力《通過できる程度の隙間を形成する開状態となるようにされている。 前記対向端縁 3 8 Aは、 柔軟なゴムシ―ル材から構成されている。  The gates 30 to 36 are, as shown in an enlarged view in FIG. 4, in a vertical plane orthogonal to the horizontal transfer line 12 A of the work, in synchronization with the work passing line in a horizontal direction. Equipped with a pair of shut-off plates 38 that move forward and backward, the boundary wall closes when the opposing edges 38 A of the shut-off plates come into contact with each other, and when separated, the work force < Is formed in an open state. The opposite edge 38 A is made of a flexible rubber seal material.
前記一対のシャツ夕一プレート 3 8は、 図 4に示されるように、 境界壁に形成 された U字形状の開口 4 0を左右から開閉するものであり、 該境界壁の下側に、 開口 4 0の下方を通って横断して配置された水平ガイド 4 2により案内され、 境 界壁の一側面に沿って水平方向に進退できるようにされている。  As shown in FIG. 4, the pair of shirt evening plates 38 opens and closes a U-shaped opening 40 formed on the boundary wall from the left and right. It is guided by a horizontal guide 42 traversed below 40, and can be moved in and out of the horizontal direction along one side of the boundary wall.
前記シャッタープレート 3 8の上端には、 図 4に示されるように、 境界壁の上 端縁を跨 、で、 該境界壁とシャッタープレート 3 8の上端を挾み込むようにして 配置された移動シュ一 4 4カ《取付けられ、 これにより、 シャッタープレート 3 8 の上端は、 境界壁の上端に沿つて移動できるようにされて L、る。  As shown in FIG. 4, a moving shutter arranged on the upper end of the shutter plate 38 so as to straddle the upper end of the boundary wall and sandwich the upper end of the shutter plate 38 with the boundary wall. 4 4 《Mounted so that the upper end of the shutter plate 38 can be moved along the upper end of the boundary wall.
前記シャッ夕一プレート 3 8は、 ゲート駆動制御装置 4 6により開閉されるよ うになつている。 このゲート駆動制御装置 4 6は、 前記シャッタープレート 3 8 上端の移動シュ一 4 4の上面から吐出したピン 4 4 Aに摺動自在に係台する円筒 カム 4 8と、 この円筒カム 4 8に同 ΐ由的に結台されたウォームホイール 5 0と、 このウォームホイール 5 0を駆動するウォームギヤ一 5 2と、 このウォームギヤ 一 5 2カ取付けられた回転 ί it] 2 Aを駆動するモータ 5 6 Aを含む駆動装置 5 6 と、 を備えて構成されている。 The shutter plate 38 is opened and closed by a gate drive control device 46. The gate drive control device 46 includes a cylindrical cam 48 slidably attached to a pin 44 A discharged from the upper surface of the moving shroud 44 at the upper end of the shutter plate 38, and a cylindrical cam 48. A worm wheel 50 that is tied together, a worm gear 52 that drives the worm wheel 50, and a worm gear And a driving device 56 including a motor 56 A for driving the rotation {it] 2 A mounted on one of the two motors.
又、 円筒カム 4 8のカム溝 4 8 Aは、 1 8 0度の範囲で移動シユー 4 4をゲー ト閉位置に、 残りの 1 8 0度の範囲で移動シユー 4 4を往復動させるようにそれ ぞれ形成され、 ゲート 3 0、 3 3、 3 6が同期して、 又、 ゲ一卜 3 1、 3 2、 3 4、 3 5は、 ゲート 3 0、 3 3、 3 6と 1 8 0度ずれて同期して、 それぞれ開閉 されるように、 円筒カム 4 8が設定されている。 又、 駆動装置 5 6は間欠的に回 転軸 5 2 Aを駆動するものである力 <、 1回の駆動時間で円筒カム 4 8を半回転さ せるように設定されている。  In addition, the cam groove 48 A of the cylindrical cam 48 moves the moving shaft 44 to the gate closed position within a range of 180 degrees, and reciprocates the moving shaft 44 within the remaining 180 degrees. The gates 30, 33, and 36 are synchronously formed, and the gates 31, 32, 34, and 35 are gates 30, 33, 36, and 1, respectively. Cylindrical cams 48 are set so as to be opened and closed in synchronization with a shift of 80 degrees. The driving device 56 is set so as to intermittently drive the rotating shaft 52 A, and to rotate the cylindrical cam 48 half a turn in one driving time.
更に、 前記円筒カム 4 8は下端が由方向スリッ ト状に開口したカバー 4 9 Αに より被われた状態で、 前記境界壁の上側に、 支持力バー 5 4により支持されてい 。  Further, the cylindrical cam 48 is supported by a supporting force bar 54 above the boundary wall in a state where the lower end is covered by a cover 49 # which is opened like a free-directional slit.
この支持力バー 5 4は、 前記メッキ槽群 1 4及び水洗中和回収槽群 1 6の両側 壁 1 7に固定されている。 前記ウォームホイール 5 0は、 支持カバ一 5 4の外側 で、 同じく側壁 1 7の外側に水平搬送ライン 1 2 Aと平行に配置された前記ゥォ ームギヤ一 5 2と嚙台っている。  The supporting force bars 54 are fixed to both side walls 17 of the plating tank group 14 and the washing neutralization and recovery tank group 16. The worm wheel 50 is mounted on the outer side of the support cover 54 and also on the outer side of the side wall 17 and with the worm gear 152 arranged in parallel with the horizontal transfer line 12A.
前記支持力バー 5 4は、 側壁 1 7から上方に突出するウォームホイール 5 0と メツキ槽群 1 4及び水洗中和回収槽群 1 6の上方空間との間を遮蔽するものであ る。  The supporting force bar 54 shields the space between the worm wheel 50 projecting upward from the side wall 17 and the space above the plating tank group 14 and the washing neutralization and recovery tank group 16.
前記搬送手段 1 2は、 図 1〜図 3に示されるように、 モータ 5 6 A、 スプロケ ッ 卜ホイール 5 8及びこれに巻きかけられるチヱーン 6 0を備え、 左右のチェ一 ン 6 0間に張り渡された吊下げプレート 6 4の下側にワーク Wを吊り下げ支持し て、 ガイドフレーム 6 2に沿って前記メッキ槽群 1 4及び水洗中和回収槽群 1 6 の上方を水平に、 図 2において左から右方向に搬送するものである。  As shown in FIGS. 1 to 3, the transfer means 12 includes a motor 56A, a sprocket wheel 58, and a chain 60 wound around the motor 56A, and is provided between the left and right chains 60. The work W is suspended and supported under the suspended suspension plate 64, and the upper part of the plating tank group 14 and the washing neutralization recovery tank group 16 is horizontally arranged along the guide frame 62, In FIG. 2, they are transported from left to right.
図 2の符号 6 6は水洗中和回収槽群 1 6から出てきたワーク Wを下方のノ <ケッ 卜 6 7に払い落とす払い出し装置を示す。  Reference numeral 66 in FIG. 2 denotes a dispensing device that removes the workpiece W from the washing neutralization and recovery tank group 16 to a lower knife 67.
図 5に示されるように、 前記メツキ槽 1 8、 前側、 後側リザーブ槽 2 0、 2 2、 前側回収リザ一ブ槽 2 4、 水洗中和回収槽 2 6及び後側回収リザ一ブ槽 2 8の下 側には、 それぞれの容積に対応した管理槽 6 8、 7 0、 7 2、 7 4、 7 6及び 7 8力 <配置されている。 As shown in FIG. 5, the plating tank 18, the front and rear reserve tanks 20 and 22, the front recovery reserve tank 24, the rinsing neutralization recovery tank 26, and the rear recovery reserve tank Underneath 28 are control tanks 68, 70, 72, 74, 76 and 7 corresponding to the respective volumes. 8 forces <located.
前記前側リザ一ブ槽 2 0と管理嘈 7 0、 後側リザ一ブ槽 2 2と管理槽 7 2、 前 側回収リザ一ブ槽 2 4と管理槽 7 4、 後側回収リザ一ブ槽 2 8と管理槽 7 8との 間には、 図 5に示されるように、 バルブ 7 0 A、 7 2 A、 7 4 A 7 8 A力くそれ ぞれ、 各リザーブ槽の底壁に配置され、 対応する管理槽の上端と連通できるよう にされている。  The front reserve tank 20 and the control tank 70, the rear reserve tank 22 and the control tank 72, the front recovery reserve tank 24 and the control tank 74, the rear collection reservoir tank As shown in Fig. 5, valves 70 A, 72 A, 74 A and 78 A are placed on the bottom wall of each reserve tank, as shown in Fig. 5. It can communicate with the upper end of the corresponding management tank.
又、 前記各管理槽 6 8〜 7 8の下端は、 フィルタ 8 0を介してポンプ 8 2の吸 入側に連通され、 又これらポンプ 8 2の吐出口 84は対応するメッキ槽、 リザ一 ブ槽及び水洗中和回収槽の上方に位置され、 管理槽から吸入した処理液を上方の 対応する槽に循環させることができるようにされている。  The lower ends of the control tanks 68 to 78 are connected to the suction side of a pump 82 via a filter 80, and the discharge ports 84 of the pumps 82 are provided with corresponding plating tanks and reserves. It is located above the tank and the water neutralization and recovery tank so that the processing solution sucked from the control tank can be circulated to the corresponding tank above.
図 5の符号 8 6 A~ 8 6 Fは上側の各槽の液面レベルを検出する液面センサ、 88は前記液面センサ 8 6 A〜8 6 Fからの信号、 ゲー卜 3 0〜3 6からのゲー 卜開閉信号に基づいて、 バノレブ 7 0 A、 7 2 A、 7 4 A、 7 8 Aの開閉及びボン プ 8 2の駆動を制御するための制御装置をそれぞれ示す。 ゲート開閉信号は、 円 筒カム 4 8の回転から取出される。  Reference numerals 86 A to 86 F in FIG. 5 denote liquid level sensors for detecting the liquid level in each upper tank, 88 denotes a signal from the liquid level sensor 86 A to 86 F, and gates 30 to 3. Control devices for controlling the opening / closing of the vanolebs 70 A, 72 A, 74 A, and 78 A and the driving of the pump 82 based on the gate opening / closing signal from 6 are shown, respectively. The gate opening / closing signal is derived from the rotation of the cylindrical cam 48.
又、 図 4の符号 3 7は各ゲート 3 0 ~ 3 6の入側位置で側壁 1 7に取付けられ、 これらゲート 3 0〜3 6にワーク Wが接近したときこれを検出して、 信号を、 前 記ゲー卜の駆動装置 5 6のためのゲー卜制御装置 5 7に出力するセンサを示す。 ゲート制御装置 5 7はセンサ 3 7からのワーク W接近信号により、 該ワーク Wが ゲ一トを通過する時間だけ、 該ゲ一卜を開くように駆動装置 5 6をオンさせるよ つになつている。  Reference numeral 37 in FIG. 4 is attached to the side wall 17 at the entrance side of each of the gates 30 to 36. When the work W approaches these gates 30 to 36, this is detected and a signal is output. The sensor which outputs to the gate control device 57 for the drive device 56 of the said gate is shown. The gate control device 57 turns on the driving device 56 so as to open the gate only during the time when the work W passes through the gate in response to the work W approach signal from the sensor 37. I have.
ここで、 前記リザーブ槽の水平搬送ライン 1 2 A方向の長さは、 搬送手段 1 2 によるワーク Wの最小搬送単位を収容できる程度とされている。 従って、 ワーク Wが図 2に示されるように線状材の場合は、 例えば 3本を 1単位として、 この 3 本を収容できるような長さにする。  Here, the length of the reserve tank in the horizontal transfer line 12A direction is set to an extent that the minimum transfer unit of the work W by the transfer means 12 can be accommodated. Therefore, in the case where the work W is a linear material as shown in FIG. 2, for example, three pieces are set as one unit, and the length is set to accommodate these three pieces.
次に、 上記実施例に係る水平走行連続メツキ装置 1 0の作用について説明する。 まず、 前記メツキ 8及び水洗中和回収 t 2 6は、 それぞれメツキ及び回収 処理に必要な液面レベルに維持しておく。  Next, the operation of the horizontal traveling continuous plating device 10 according to the above embodiment will be described. First, the plating 8 and the water washing neutralization recovery t 26 are maintained at the liquid level required for plating and recovery processing, respectively.
ワーク Wが搬送手段 1 2によりゲート 3 0に接近するとき、 前側リザ一ブ槽 2 0は、 バルブ 7 O Aを予め開いてメツキ液を図 5に示されるように、 境界壁 3 1 の開口 4 0の下端位置以下にしておく。 When the work W approaches the gate 30 by the transfer means 12, the front reserve tank 2 In the case of 0, the valve 7OA is opened in advance, and the plating liquid is set to be lower than the lower end position of the opening 40 of the boundary wall 31 as shown in FIG.
この状態でワーク Wの接近がセンサ 3 7に検知されたとき、 ゲート 3◦を開き (図 5〜図 8において破線はゲート開、 実線はゲー卜閉の状態をそれぞれ示すも のとする) 、 前側リザーブ槽 2 0内にワーク Wを移動させて停止させる。  In this state, when the approach of the workpiece W is detected by the sensor 37, the gate 3◦ is opened (in FIGS. 5 to 8, the broken line indicates the gate is open, and the solid line indicates the gate closed state). Move the work W into the front reserve tank 20 and stop it.
ワーク Wが通過すると、 図 6に示されるように開いていたゲ一卜 3 0カ<閉じ、 次にポンプ 8 2により、 管理槽 7 2内のメッキ液をその上側の前側リザ一ブ槽 2 0内に、 メツキ槽 1 8と同一液面レベルまで注入する。  When the workpiece W passes, the gate 30 which has been opened as shown in FIG. 6 <closes, and then the plating solution in the control tank 72 is pumped by the pump 82, and the plating liquid in the control tank 72 is moved to the upper front reservoir tank 2. Inject to 0 to the same liquid level as the plating tank 18.
液面センサ 8 6 Aが液面レベル上昇を検知すると、 次に、 ワーク Wが進行され、 ゲ一ト 3 1に接近するとこれが図 7に示ざれるように開き、 ワーク Wがメツキ槽 1 8内に進行すると、 図 8に示されるように開いていたゲート 3 1が閉じられ、 ワーク Wがメツキ槽 1 8内で間欠的に進行しつつメツキ処理がなされる。 メツキ 処理が終了したヮーク Wは、 予め液面レベルがメツキ槽 1 8と同一とされた後側 リザーブ槽 2 2内に、 図 7に示されるようにゲート 3 2を開いて移動される。 ワーク Wの通過後にゲー卜 3 2が閉じられ、 後側リザ一ブ槽 2 2内のメッキ液 が下方の管理槽 7 2内に排出されて液面レベルが下がり、 同じく液面レベルが下 げられている前側回収リザーブ槽 2 4内に移動される。  When the liquid level sensor 86 A detects a rise in the liquid level, the work W is advanced, and when it approaches the gate 31, it opens as shown in FIG. As shown in FIG. 8, the gate 31 opened is closed, and the workpiece W is intermittently advanced in the plating tank 18 to perform the plating process. The peak W after the plating process is completed is moved into the rear reserve tank 22 having the same liquid level as the plating tank 18 by opening the gate 32 as shown in FIG. After passing through the work W, the gate 32 is closed, the plating solution in the rear reserve tank 22 is discharged into the lower management tank 72, and the liquid level is lowered, and the liquid level is also lowered. Is moved into the front collection reservoir 24.
ワーク Wは、 前記メツキ槽群 1 4におけると同様に、 水洗中和回収槽群 1 6に おいても前側回収リザ一ブ槽 2 4、 水洗中和回収槽 2 6及び後側回収リザ一ブ槽 2 8を上記と同様の工程で進行し、 最後に、 後側回収リザ一ブ槽 2 8のゲート 3 6から外部に搬出される。  In the same manner as in the plating tank group 14, the work W is also provided in the water-recovery neutralization recovery tank group 16, the front recovery reservoir 24, the water-wash neutralization recovery tank 26, and the rear recovery reservoir. The tank 28 proceeds in the same process as above, and is finally carried out from the gate 36 of the rear recovery reservoir tank 28 to the outside.
上記の過程において、 4つのリザーブ槽の液面レベルは、 同期して上下され、 又前側リザ一ブ槽 2 0の入側のゲー卜 3 0、 後側リザ一ブ槽 2 2の出側ゲート 3 3、 後側回収リザ一ブ槽 2 8の出側ゲ一ト 3 6は同期して開閉され、 又、 これら と円筒カム 4 8の回転方向に 1 8 0度ずれて、 メッキ槽 1 8の入側及び出側のゲ —卜 3 1、 3 2と、 水洗中和回収槽 2 6の入側及び出側のゲー卜 3 4、 3 5は、 同期して開閉される。  In the above process, the liquid levels of the four reserve tanks are raised and lowered in synchronization with each other, and the inlet gate 30 of the front reserve tank 20 and the outlet gate of the rear reserve tank 22 are provided. 3 3, The outlet gate 36 of the rear recovery reservoir tank 28 is opened and closed synchronously, and it is deviated by 180 degrees in the rotation direction of the cylindrical cam 48 from these, so that the plating tank 18 Gates 31 and 32 on the inlet and outlet sides of the tank and gates 34 and 35 on the inlet and outlet sides of the washing neutralization and recovery tank 26 are synchronously opened and closed.
この実施例では、 各液処理槽群の下側に液処理 ffi及びリザ一ブ槽に対応して管 理槽が配置されているので、 処理液の管理が容易であると共に、 工場内での装置 容積を小さくすることができる。 In this embodiment, since the control tanks are arranged below the respective liquid processing tank groups in correspondence with the liquid processing ffi and the reserve tank, the management of the processing liquid is easy, and the control of the processing liquid in the factory is easy. apparatus The volume can be reduced.
なお、 上言己実施例においては、 メツキ槽群 1 4と水洗中和回収槽群 1 6が直線 状の水平搬送ライン 1 2 Aに沿って配置されている力《、 本発明はこれに限定され るものでなく、 例えば図 9に示されるように、 複数の液処理槽群 1 0 1 ~ 1◦ 3 をコ字状あるいはクランク状等に配置してもよい。 この場合、 各処理液槽群の中 ではリザ一ブ槽と液処理槽の配置を直線状とする。  In the above embodiment, the force in which the plating tank group 14 and the water-washing neutralization recovery tank group 16 are arranged along the linear horizontal transfer line 12A is not limited to this. Instead, for example, as shown in FIG. 9, a plurality of liquid processing tank groups 101 to 1◦3 may be arranged in a U shape or a crank shape. In this case, the arrangement of the reserve tank and the liquid processing tank in each processing liquid tank group is linear.
又、 前記実施例において、 各リザーブ槽の幅はメツキ槽 1 8及び水洗中和回収 槽 2 6の幅と同一とされている力 これは、 例えば図 1 0の実施例に示されるよ うに、 リザ一ブ槽 1 0 4、 1 0 5の幅をワーク Wが通過する必要最小限としても よい。 液処理槽 1 0 6は通常の幅としておく。  Further, in the above embodiment, the width of each reserve tank is the same as the width of the plating tank 18 and the washing neutralization and recovery tank 26.For example, as shown in the embodiment of FIG. The width of the reserve tanks 104 and 105 may be the minimum necessary for the workpiece W to pass through. The liquid processing tank 106 has a normal width.
この場台、 側壁 1 7の内側に、 ワーク Wの通過幅の通路を残して、 例えば耐食 性樹脂からなるブロック 1 0 7を設けるようにしてもよい。 図 1 0の符号 1 0 8 はゲートを示す。  In this case, a block 107 made of, for example, a corrosion-resistant resin may be provided inside the side wall 17 with a passage having a passage width of the work W left inside. Reference numeral 108 in FIG. 10 denotes a gate.
このように、 リザーブ槽 1 0 4、 1 0 5の容積を小さくすると、 処理液の迅速 な排出注入を行うことができると共に、 使用処理液量を低'减させること力《できる。 なお、 上記実施例において、 リザーブ槽のゲート及びメツキ槽と水洗中和回収 槽のゲ一卜はそれぞれ同期して開閉されるようになっている力 本発明はこれに 限定されるものでなく、 メッキ等の処理時間及び距離とワーク Wの寸法との関係 において、 必ずしも同期して開閉させる必要はない。 但し、 この場台は、 ゲ一卜 の開閉の位相を調整する必要がある。  As described above, when the volumes of the reserve tanks 104 and 105 are reduced, it is possible to quickly discharge and inject the processing liquid, and to reduce the amount of the processing liquid to be used. In the above embodiment, the power of the gate of the reserve tank and the gate of the plating tank and the gate of the water-washing neutralization and recovery tank are respectively opened and closed in synchronization.The present invention is not limited to this. It is not always necessary to open and close in synchronization with the relationship between the processing time and distance of plating and the dimensions of the workpiece W. However, in this case, it is necessary to adjust the opening and closing phase of the gate.
更に、 上記実施例は、 金メツキの場台のものであって、 メツキ槽 1 8と水洗中 和回収槽 2 6のみを備えるものであるが、 本発明はこれに限定されるものでなく、 他のメツキ、 アルマイ ト処理、 電解研磨、 電解酸洗、 プリント基板スルーホール メツキ、 フロン代替洗浄、 治具剥離等の液処理槽にワークを浸漬して処理を行う ための浸漬処理装置全般に適用され得るものである。  Furthermore, the above-described embodiment is for a gold plating platform, and is provided with only the plating tank 18 and the flushing water recovery tank 26, but the present invention is not limited to this. Applicable to other immersion processing equipment for immersing a workpiece in a liquid processing tank for other plating, alumite treatment, electrolytic polishing, electrolytic pickling, printed circuit board through-hole plating, chlorofluorocarbon alternative cleaning, jig peeling, etc. Can be done.
以下、 本発明の第 3実施例を図 1 1〜図 1 3を参照して説明する。  Hereinafter, a third embodiment of the present invention will be described with reference to FIGS.
図 1 1に示されるように、 本発明の第 3実施例に係る液面維持ゲー卜 ] 1 0は、 例えばめつきライン (後述) におけるめっき槽である第 ΐ液槽 1 1 2と出側リザ 一ブ槽である第 2液槽 1 1 4の間の境界壁 1 1 6に設けられ、 この境界壁 1 1 6 の開口 1 1 8を開閉するものであり、 開いたときには前記開口 1 1 8を水平に通 る搬送ライン 1 2 0に沿うワーク 1 2 2の通過を許容し、 閉じたときには、 第 1 液槽 1 1 2力、ら第 2液槽 1 1 4への液体 1 2 4の流出を防止するようにされて 、 る。 As shown in FIG. 11, the liquid level maintaining gate 10 according to the third embodiment of the present invention] is, for example, a second liquid tank 1 12 which is a plating tank in a plating line (described later) and an outlet side. It is provided on the boundary wall 1 16 between the second liquid tanks 1 1 4 which is the reservoir tank, and this boundary wall 1 1 6 The opening and closing of the opening 1 18 of the container 1 allows the work 1 2 2 to pass along the transfer line 1 2 0 passing horizontally through the opening 1 1 8 when opened, and the first liquid tank when closed. The liquid is prevented from flowing out of the liquid 124 to the second liquid tank 114.
ここで、 第 1液槽内の液体 1 2 4の液面高さは、 境界壁 1 1 6の上端よりも少 し低くされ、 又第 2液槽 1 1 4内の液面は第 1液槽 1 1 2内の液体 1 2 4の液面 よりも大幅に少ないか、 又は零となるようにされている。  Here, the liquid level of the liquid 1 24 in the first liquid tank is made slightly lower than the upper end of the boundary wall 1 16, and the liquid level in the second liquid tank 1 14 is the first liquid. The liquid level of the liquid 124 in the tank 112 is significantly less than or equal to zero.
前記液面維持ゲート 1 1 0は、 前記開口 1 1 8の中心部で中心軸線が上下方向 に配置され、 底部にフランジ 1 2 6を備えた有底円筒状部材であって、 前記中心 幸 III線前に回動自在とされた円筒ゲート部材 1 2 8と、 前記フランジ 1 2 6の外周 に対して僅かな隙間をもって配置され、 円筒ゲート部材 1 2 8の円筒状外周面と 同心上に配置された円弧状内周面 1 3 0 Aを備え、 搬送ライン 1 2 0上にある円 筒ゲート部材 1 2 8に対して、 その両側から隙間をもって囲むようにして配置さ れた一対のガイ ド壁 1 3 0及び、 前記円筒ゲート部材 1 2 8の底面に接触して、 これを回転自在に支持するガイ ド底壁 1 3 2を備えてなるガイド部材 1 3 4と、 このガイ ド部材 1 3 4と前記円筒ゲート部材 1 2 8との間を液密にシールするシ 一ル部材 1 3 6と、 を含んで構成されている。  The liquid level maintaining gate 110 is a bottomed cylindrical member having a central axis vertically arranged at the center of the opening 118 and a flange 126 at the bottom, and It is arranged with a small gap between the cylindrical gate member 128 that is rotatable in front of the line and the outer periphery of the flange 126, and is arranged concentrically with the cylindrical outer peripheral surface of the cylindrical gate member 128. A pair of guide walls 1 provided with a circular arc-shaped inner peripheral surface 130 A and arranged so as to surround the cylindrical gate member 128 on the transfer line 120 with a gap from both sides. 30 and a guide member 13 4 having a guide bottom wall 13 2 that comes into contact with the bottom surface of the cylindrical gate member 128 to rotatably support the same, and a guide member 1 34 And a sealing member 1336 for liquid-tight sealing between the cylindrical gate member 128 and the cylindrical gate member 128. That.
前記円筒ゲート部材 1 2 8、 ガイド部材 1 3 4及びシール部材 1 3 6の構成は、 図 1 2に拡大して示されるようになつている。  The configuration of the cylindrical gate member 128, the guide member 134, and the seal member 136 is as shown in FIG.
前記境界壁 1 1 6は、 二重構造であり、 この二重構造の境界壁 1 1 6の間のス リッ ト 1 1 6 A内に、 前記ガイ ド壁 1 3 0を一体的に支持する支持壁 1 3 0 Bが 上方から落し込まれ、 且つボルト 1 3 0 Cにより境界壁 1 1 6に締付け固定され るようになっている。 ここで、 開口 1 1 8は、 第 1液槽 1 1 2及び第 2液槽 1 1 4の共通の底壁 1 1 3まで到達するように、 境界壁 1 1 6の上端から形成されて いる。  The boundary wall 1 16 has a double structure, and the guide wall 1 30 is integrally supported in a slit 1 16 A between the boundary walls 1 16 of the double structure. The support wall 130B is dropped from above and is fixed to the boundary wall 116 by bolts 130C. Here, the opening 1 18 is formed from the upper end of the boundary wall 1 16 so as to reach the common bottom wall 1 13 of the first liquid tank 1 12 and the second liquid tank 1 14 .
前記円筒ゲート部材 1 2 8は、 その円周方向の一個所に上端から下端フランジ 1 2 6に到達するまでのワーク通過切欠き 1 3 8が形成されている。 このワーク 通過切欠き 1 3 8の幅は、 前記搬送ライン 1 2 0に沿って進行するワーク 1 2 2 の幅よりも僅かに大きくなるようにされている。 又前記一対のガイ ド壁 1 3 0の、 搬送ライン 1 2 0方向の両端の間の間隙 1 3 0 Dも、 前記ワーク通過切欠き 1 3 8と略等しくなるようにされている。 The cylindrical gate member 128 has a work passage notch 138 extending from the upper end to the lower end flange 126 at one location in the circumferential direction. The width of the work passing notch 1 38 is set to be slightly larger than the width of the work 122 traveling along the transfer line 120. Also, the pair of guide walls 130 The gap 130D between both ends of the transfer line 120 in the direction is also set to be substantially equal to the work passage notch 1338.
前記支持壁 1 3 0 Bは、 ガイ ド壁 1 3 0の円弧状内周面 1 3◦ Aと反対側に、 その円弧の法線方向に一体的に接続されている。  The support wall 130B is integrally connected to the guide wall 130 on the side opposite to the arc-shaped inner peripheral surface 13◦A in the normal direction of the arc.
前記円筒ゲート部材 1 2 8は、 その底壁の中心位置に、 前記ガイ ド底壁 1 3 2 を貫通する被動軸 1 2 8 Aを備え、 この被動軸 1 2 8 Aの先端 (下端) に取付け られたべベルギヤ 1 4 0が、 駆動シャフ ト 1 4 2に取付けられたべベルギヤ 1 4 4と啮合うことによって、 駆動シャフト 1 4 2により回転駆動されるようになつ ている。  The cylindrical gate member 128 has a driven shaft 128 A penetrating the guide bottom wall 132 at the center position of the bottom wall, and is provided at the tip (lower end) of the driven shaft 128 A. The attached bevel gear 140 is engaged with the bevel gear 144 attached to the drive shaft 142 so as to be rotationally driven by the drive shaft 144.
前記シール部材 1 3 6は、 前記一対のガイ ド壁 1 3 0の、 第 1液槽 1 1 2側の 端部に沿って、 上下方向に取付けられ、 先端が、 前記円筒ゲート部材 1 2 8の円 筒状外周面及びフランジ 1 2 6の上面 1 2 6 Aに接触するゴム等の可撓性のシー ル片から構成されている。  The sealing member 1336 is vertically attached along the end of the pair of guide walls 130 on the first liquid tank 112 side, and the tip is the cylindrical gate member 128. And a flexible seal piece such as rubber which comes into contact with the cylindrical outer peripheral surface and the upper surface 126A of the flange 126.
図 1 2に示されるように、 前記第 2液槽 1 1 4の底壁 1 1 3上には、 前記液面 維持ゲート 1 1 0の第 2液槽 1 1 4側の出口 (間隙 1 3 0 D) 側に隣接して、 低 い高さの仕切壁 1 4 6力立設されている。 又、 この仕切壁 1 4 6と前記境界壁 1 1 6との間の位置での第 2液槽 1 1 4の底壁 1 1 3には、 漏出液回収孔 1 4 8が 形成されている。  As shown in FIG. 12, on the bottom wall 113 of the second liquid tank 114, an outlet (gap 13) on the second liquid tank 114 side of the liquid level maintaining gate 110 is provided. There is a low-profile partition wall 1 4 6 adjacent to the 0D) side. In addition, a leaked liquid collecting hole 1 488 is formed in the bottom wall 1 13 of the second liquid tank 114 at a position between the partition wall 146 and the boundary wall 111. .
この漏出液回収孔 1 4 8は、 前記第 1液槽 1 1 2の下側に配置されたリザ一ブ 槽 1 5 0に連通され、 開口 1 1 8を通って第 1液槽 1 1 2から漏出した液体をリ ザーブ槽 1 5 0に戻すことができるようにされている。  The leaked liquid collecting hole 1 48 communicates with a reserve tank 150 arranged below the first liquid tank 112 and passes through the opening 118 to form the first liquid tank 1 1 2 The liquid leaked from the tank can be returned to the reserve tank 150.
前記液面維持ゲ一ト 1 1 0は、 例えば図 2 1に示されるように連続した処理液 槽ライン 1 5 2において、 各槽の間の境界壁に配置され、 各液槽の下方を通る一 本の前記駆動シャフ卜 1 4 2によって、 図 1 2に示されると同様にべベルギヤを 介して回転駆動されるようになっている。 図 1 2の符号 5 4はモー夕、 1 5 6は レベルギヤ 1 4 4と駆動シャフト 1 4 2の回転方向の係合をオンオフするための 電磁クラッチを示す。 又符号 1 5 8は、 前記電磁ラツチ 1 5 6をプロゲラムに従 つてオンオフ制御するための制御装置をそれぞれ示す。  For example, as shown in FIG. 21, the liquid level maintaining gate 110 is disposed on a boundary wall between the tanks in a continuous processing liquid tank line 152 and passes below each liquid tank. The one drive shaft 142 is driven to rotate via a bevel gear in the same manner as shown in FIG. In FIG. 12, reference numeral 54 denotes a motor, and reference numeral 156 denotes an electromagnetic clutch for turning on and off engagement between the level gear 144 and the drive shaft 144 in the rotational direction. Reference numeral 158 indicates a control device for controlling on / off of the electromagnetic latch 156 according to a program.
前記ワーク 1 2 2は、 前記処理液槽ライン ] 5 2の上方に配置された搬送装置 160のラックに、 めっき治具 162を介して吊下げ支持されている。 めっき治 具 162はラック 16 OAと一体のブラケッ ト 160 Bに引掛け支持されるよう にされている。 The work 122 is a transfer device disposed above the treatment liquid tank line 52. It is suspended and supported by a rack 160 via a plating jig 162. The plating jig 162 is supported by being hooked on a bracket 160B integrated with the rack 16OA.
搬送装置 160は、 処理液槽ライン 152の両端外側で水平面内で回転する、 例えばチェーン 164 A、 スプロケットホイール 164 Bから構成されている。 ここで、 前記搬送装置 160は、 めっき治具 162に取付けられた複数のヮー ク 122を、 図 11において右上方向から左下方向に搬送ライン 120に沿って 搬送するものであり、 ワーク 122の吊下げ高さは、 第 1液槽 112内の液体 1 24の液面下となるようにされている。  The transfer device 160 is configured to rotate in a horizontal plane outside both ends of the processing liquid tank line 152, and is composed of, for example, a chain 164A and a sprocket wheel 164B. Here, the transport device 160 transports the plurality of workpieces 122 attached to the plating jig 162 from the upper right direction to the lower left direction in FIG. 11 along the transport line 120. The height is set below the liquid level of the liquid 124 in the first liquid tank 112.
前記搬送ライン 120に沿う複数の液槽は、 例えばめつき処理の場合、 図 11 右上から、 水洗槽 166、 第 1バッファ槽 168、 めっき層 (第 1液槽 112) 、 第 2バッファ層 (第 2液槽 114) 及び回収槽 170の順で配置されている。 な お、 水洗槽 166よりも上流の前処理系及び回収槽 170よりも下流の後処理系 は図示省略されている。  For example, in the case of the plating process, the plurality of liquid tanks along the transfer line 120 are, from the upper right of FIG. 11, a washing tank 166, a first buffer tank 168, a plating layer (first liquid tank 112), a second buffer layer (first The two-liquid tank 114) and the recovery tank 170 are arranged in this order. The pretreatment system upstream of the washing tank 166 and the posttreatment system downstream of the collection tank 170 are not shown.
液面維持ゲートは、 水洗槽 166の入側壁 166 A、 水洗槽 166と第 1バッ ファ槽 168の間の境界壁 167、 第 1バッファ 168と第 1液槽 112の境界 壁 169、 第 1液槽 112と第 2バッファ層である第 2液槽 114との前記境界 壁 116、 第 2液槽 114と回収槽 170の境界壁 115及び回収槽 170の出 側の境界壁 171にそれぞれ符号 201〜 203、 110、 204、 205で示 されるように配置されている。  The liquid level maintaining gate is located at the entrance wall 166A of the washing tank 166, the boundary wall 167 between the washing tank 166 and the first buffer tank 168, the boundary wall 169 between the first buffer 168 and the first liquid tank 112, and the first liquid. Reference numerals 201 to 201 denote the boundary wall 116 between the tank 112 and the second liquid tank 114 as the second buffer layer, the boundary wall 115 between the second liquid tank 114 and the collection tank 170, and the boundary wall 171 on the exit side of the collection tank 170, respectively. They are arranged as indicated by 203, 110, 204, 205.
次に、 搬送装置 160により、 めっき治具 162を介して吊下げれられたヮー ク 122を、 各液槽を通して処理する過程について説明する。  Next, a process of treating the workpiece 122 suspended by the transport device 160 via the plating jig 162 through each liquid tank will be described.
この場台、 搬送装置 160は、 一定速度でワーク 122を搬送ライン 120に 沿って搬送するものであり、 これに対して、 各液面維持ゲートは、 ワーク 122 が接近したとき円筒ゲ一ト部材 128カ《、 そのワーク通過 欠き 138からヮー ク 122が内側の空間 129内に進入できるようにされ、 且つワーク 122が空 問 129から出ようとするときには、 そのヮ一ク通過切欠き 138をワーク 12 2の進行方向に向けるように回転制御されるものである。  The table and the transfer device 160 transfer the work 122 at a constant speed along the transfer line 120. On the other hand, each liquid level maintaining gate is a cylindrical gate member when the work 122 approaches. When the work 122 is allowed to enter the inner space 129 from the work passage notch 138 and the work 122 is going to leave the airspace 129, the work passage notch 138 is used. The rotation is controlled so as to be directed to the traveling direction of 122.
例えば、 図 13 (Α) に示されるように、 ワーク 122力く接近してきたときに、 円筒ゲー卜部材 2 8はそのワーク通過切欠き 1 3 8が図において右向きに回転さ れ、 搬送ライン 1 2 0上を進行してきたワーク 1 2 2は、 ワーク通過切欠き 1 3 8から円筒ゲー卜部材 1 2 8の内側の空間 1 2 9内に入り込む。 For example, as shown in Fig. 13 (Α), when the work 122 The cylindrical gate member 28 has its work passage notch 1 38 rotated to the right in the figure, and the work 122 that has been traveling on the transport line 120 has its work passage notch 1 38 It goes into the space 1 2 9 inside the lock member 1 2 8.
ワーク 1 2 2が円筒ゲ—ト部材 1 2 8内側の空間個 1 2 9において搬送ラィン 1 2 0上を進行している間に、 円筒ゲ一ト部材 1 2 8はその中心軸線廻りに回転 され、 図 1 3 ( B ) に示されるように、 ワーク通過切欠き 1 3 8が右向きに位置 される。 従ってワーク 1 2 2は、 ワーク通過切欠き 1 3 8を通って円筒ゲート部 材 1 2 8から抜け出すことになる。 ワーク 1 2 2が抜出した後は、 円筒ゲート部 材 1 2 8が更に回転され、 再び図 1 3 (A) に示されるように、 次のワーク 1 2 2を受入れる状態となる。  While the work 1 2 2 is traveling on the transfer line 120 in the space 1 2 9 inside the cylindrical gate member 1 2 8, the cylindrical gate member 1 2 8 rotates around its central axis. Then, as shown in FIG. 13 (B), the work passage notch 1 38 is positioned rightward. Therefore, the work 122 comes out of the cylindrical gate member 128 through the work passage cutout 138. After the work 122 is extracted, the cylindrical gate member 128 is further rotated, and the next work 122 is received again as shown in FIG. 13 (A).
上記の過程において、 ガイ ド壁 1 3 0に取付けられたシール部材 1 3 6は、 常 に円筒ゲート部材 1 2 8の円筒状外周面と、 その下端のフランジ 1 2 6の上面 1 2 6 Aに接触し、 且つ液面の高い側の液槽からの液圧によって円筒ゲート部材 1 2 8に圧接されているので、 液漏れを良好に抑制することができる。  In the above process, the seal member 13 6 attached to the guide wall 13 0 is always provided with the cylindrical outer peripheral surface of the cylindrical gate member 1 2 8 and the upper surface 1 2 6 A of the lower end flange 1 2 6 And is in pressure contact with the cylindrical gate member 128 by the liquid pressure from the liquid tank on the higher liquid surface side, so that liquid leakage can be suppressed well.
但し、 円筒ゲ—ト部材 1 2 8内に入り込んでいた液体は、 円筒ゲート部材 1 2 8の回転により、 液面の低い側の液槽内に、 円筒ゲート部材 1 2 8の 1回転毎に 排出 (漏出) されることになる。  However, the liquid that has entered the cylindrical gate member 128 is rotated by the rotation of the cylindrical gate member 128 into the liquid tank on the lower side of the liquid level, and rotates every time the cylindrical gate member 128 rotates. It will be discharged (leaked).
この漏出液は、 前記仕切壁 1 4 6によって阻止されるので、 他の部分に漏出す ることがない。 又、 漏出液回収孔 1 4 8から速かにリザーブ槽 1 5 0に戻される。 図 1 1において、 符号 1 7 2は第 1液槽 1 1 2の底面に配置されためつき液の 噴流孔、 1 7 4は第 1液槽 1 1 2の側壁に設けられたォーノく一フ口一孔、 1 7 6 はオーバ一フロー孔 1 7 4から溢出しためっき液をリザーブ槽 1 5 0に戻すため の戻しパイプを示す。  This leaked liquid is blocked by the partition wall 146 and does not leak to other parts. Also, the liquid is quickly returned to the reserve tank 150 from the leaked liquid recovery hole 148. In FIG. 11, reference numeral 172 denotes a jet hole for the piercing liquid which is arranged on the bottom surface of the first liquid tank 1 12, and 1 74 denotes an orifice provided on a side wall of the first liquid tank 1 12. A single hole, 176 indicates a return pipe for returning the plating solution overflowing from the overflow hole 174 to the reserve tank 150.
リザーブ槽 1 5 0に、 戻しパイプ 1 7 6及び漏出液回収孔 1 4 8から戻された めっき液は、 ポンプ (図示省略) により、 前記噴流孔 1 7 2から再び第 1液槽 1 1 2内に噴出される。 図 1 1の符号 1 7 8はめつき液槽である第 1液槽 1 1 2か らの薬液の臭気発散を防止するための排気フードを示す。  The plating solution returned from the return pipe 176 and the leaked liquid recovery hole 148 to the reserve tank 150 is pumped from the jet hole 172 again by the pump (not shown). Squirted into. Reference numeral 1178 in FIG. 11 denotes an exhaust hood for preventing the emission of odor of the chemical solution from the first liquid tank 112, which is a fitting liquid tank.
上記のように、 めっき治具 1 6 2を介して搬送装置 1 6 0により搬送されるヮ ーク 1 2 2は、 水洗槽 1 6 6、 第 1バッファ層 1 6 8、 第 1液槽 1 1 2、 第 2液 槽 114及び回収槽 170を、 液面維持ゲー卜 201〜 203、 110、 204 及び 205を経て出入し、 めっき処理を終了する。 As described above, the workpieces 122 transported by the transport device 160 via the plating jigs 16 2 include the washing tanks 166, the first buffer layer 168, and the first liquid tank 1 1 2, 2nd liquid The bath 114 and the recovery tank 170 are moved in and out through the liquid level maintaining gates 201 to 203, 110, 204 and 205, and the plating process is completed.
この実施例において、 各液面維持ゲートは、 それぞれ各液槽の下方を、 搬送ラ イン 12◦に沿って縦断して配置された前記駆動シャフト 142に対して、 ベべ ルギヤ 144、 145を介して駆動される力《、 ベベルギヤ 144力 制御装置 1 58によってオンオフ制御される電磁クラッチ 156により、 駆動シャフト 14 2に対してオンオフされるので、 搬送装置 160によるワーク 122の進行速度 及びピッチに応じて、 そのワーク通過切欠き 138の位置を変換される。  In this embodiment, each liquid level maintaining gate is connected to the drive shaft 142, which is arranged vertically below the liquid tank along the transfer line 12 °, via a bevel gear 144, 145. The bevel gear 144 force is turned on and off with respect to the drive shaft 142 by an electromagnetic clutch 156 that is turned on and off by a control device 1 58. The position of the work passing notch 138 is converted.
次に図 14に示される本発明の第 4実施例に係る液面維持ゲ一ト 180につい て説明する。  Next, a liquid level maintaining gate 180 according to a fourth embodiment of the present invention shown in FIG. 14 will be described.
この液面維持ゲ一卜 180は、 前記ワーク 122の、 めっき治具 162を含む 通過軌跡範囲に相当するワーク通路 182 Aが形成された揷入部材 182を備え たもである。  The liquid level maintaining gate 180 is provided with an insertion member 182 in which a work passage 182A corresponding to a range of a locus of passage of the work 122 including the plating jig 162 is formed.
この揷入部材 182は、 前記円筒ゲート部材 128の内側の空間 129内に、 上方から着脱自在に挿入されるものであり (但し、 円筒ゲート部材 128とは非 接触) 、 前記ワーク通過軌跡範囲を除いて、 空間 129内を充填するものである。 この実施例の場台、 円筒ゲート部材 128の、 ワーク 122の出入りに際する 液漏れ量を、 揷入部材 182の体積分だけ低減させることができる。  The insertion member 182 is removably inserted from above into the space 129 inside the cylindrical gate member 128 (but not in contact with the cylindrical gate member 128). Except for filling the space 129. In this embodiment, the leakage amount of the cylindrical gate member 128 when the workpiece 122 enters and exits can be reduced by the volume of the input member 182.
なお、 挿入部材 182のワーク通路 182 Aは、 通過するワーク 122及びめ つき治具 162の大きさによって異なる通路断面積のものを複数種類用意してお くとよい。  It is preferable to prepare a plurality of types of the work passages 182A of the insertion member 182 having different passage cross-sectional areas depending on the sizes of the work 122 and the fixing jig 162 passing therethrough.
次に図 15に示される本発明の第 5実施例につ ゝて説明する。  Next, a fifth embodiment of the present invention shown in FIG. 15 will be described.
この第 5実施例は、 円筒ゲート部材 186力 \ 長円形状の底壁 186 Aと、 こ の底壁 186 A上に、 長円軌道を周方向に摺動自在に配置された例えばジャバラ 状部材からなる可撓性周壁部材 186Bと、 を有してなり、 該可撓性周壁部材は、 前記長円軌道の全長よりもワーク通過幅程度短くされ、 ここに、 前記ここがヮー ク通過切欠き 188となるようにされている。 この実施例においては、 搬送ライ ン 120方向に長いワークを通過させることができる。  In the fifth embodiment, a cylindrical gate member 186 is formed by an elliptical bottom wall 186A, and a bellows-like member is disposed on the bottom wall 186A so as to be slidable along an elliptical orbit in the circumferential direction. And a flexible peripheral wall member 186B comprising: a work passage width shorter than a total length of the elliptical track by a work passage width; 188. In this embodiment, a long work can be passed in the direction of the transfer line 120.
次に図 16〜図 18に示される本発明の第 6実施例について説明する。 この第 6実施例に係る液面維持ゲー卜 1 9 0は、 有底円筒形状の円筒ゲー卜部 材 1 9 2を備えた 1個の直方体形状の組立体とされている。 この円筒ゲート部材 1 9 2の底壁は、 二重構造とされ、 上側底壁 1 9 4には多数の整流細孔 1 9 4 A が形成され、 下側底壁 1 9 6にはワーク通過切欠き 1 9 8の開口方向の変換に伴 つて位置が変化され、 これにより、 円筒ゲート部材 1 9 2内に第 1液槽 1 1 2内 の液体を流入させ、 又は流入した液体を排出するための給排液口 2 0◦を備えて いる。 Next, a sixth embodiment of the present invention shown in FIGS. 16 to 18 will be described. The liquid level maintaining gate 190 according to the sixth embodiment is a single rectangular parallelepiped assembly including a cylindrical gate member 192 having a bottomed cylindrical shape. The bottom wall of this cylindrical gate member 192 has a double structure, and a large number of flow regulating holes 1994A are formed in the upper bottom wall 1994, and the work passes through the lower bottom wall 1996. The position of the notch 1998 is changed in accordance with the change of the opening direction, so that the liquid in the first liquid tank 1 12 flows into the cylindrical gate member 192 or the liquid that flows in is discharged. Supply / drainage port for water supply.
前記上側底壁 1 4と下側底壁 1 9 6との間には環状のスぺ一サ 1 9 5が配置 され、 上側底壁 1 9 4と下仴 ij底壁 1 9 6の間に液体が流入する空間を形成してい る。 又、 下側底壁 1 9 6の下側には P V D F等の耐摩耗性樹脂シ一ト 1 9 7力く取 付けられている。  An annular spacer 195 is disposed between the upper bottom wall 14 and the lower bottom wall 196, and between the upper bottom wall 194 and the lower ij bottom wall 1996. It forms a space into which liquid flows. In addition, a wear-resistant resin sheet 197 such as PVDF is attached to the lower side of the lower bottom wall 196.
前記円筒ゲート部材 1 9 2はその中心軸線廻りに回動自在とされ、 その円周方 向の 4個所において、 シール部材 2 1 0により、 回転可能な状態でシールされて いる。  The cylindrical gate member 192 is rotatable around its central axis, and is rotatably sealed by seal members 210 at four locations in the circumferential direction.
前記 4個のシール部材 2 1 0は、 各々、 円筒ゲート部材 1 9 2の円筒形外周に 対して、 該円筒ゲート部材 1 9 2の回転中心由線と平行に、 円筒形外周の全高さ 範囲で、 円周方向相対変位可能に接触して配置されたシールロール 2 1 2と、 前 記開口 1 1 8の内周縁側に取付けられ、 先端縁 2 1 4八カ<前記シールロール 2 1 2の外周に、 前記円筒ゲート部材 1 9 2と反対側からシールロール 2 1 2の全高 さ範囲に亘つて相対変位可能に接触する 4個のシール板 2 1 4とを備えて構成さ れている。  Each of the four seal members 210 is parallel to the rotation center line of the cylindrical gate member 192 with respect to the cylindrical outer periphery of the cylindrical gate member 192, and has a total height range of the cylindrical outer periphery. And the seal rolls 2 1 2 arranged in contact with each other so as to be displaceable in the circumferential direction, and attached to the inner peripheral side of the opening 1 18, and the leading edge 2 1 4 8 <the seal roll 2 1 2 And four seal plates 2 14 that are relatively displaceable from the opposite side of the cylindrical gate member 19 2 over the entire height range of the seal roll 2 12. .
前記シールロールは、 例えば P V D F等の耐摩耗樹脂からなるパイプ 2 1 2 A と、 このパイプ 2 1 2 Aの上端近傍及び下端近傍に、 径方向の遊び代をもって遊 嵌された上下一対の支持紬 2 1 2 Bとから構成されている。  The seal roll is made of, for example, a pipe 212A made of a wear-resistant resin such as PVDF, and a pair of upper and lower supporting pongs loosely fitted with a radial allowance near the upper end and the lower end of the pipe 212A. 2 1 2B.
前記円筒ゲート部材 1 9 2の上端近傍における円筒形の外周には円周方向にチ エーン 2 1 6が固着され、 前記境界壁 1 1 6側には、 前記チェーン 2 1 6と嚙み 合うと共に、 該チェーン 2ュ 6を介して円筒ゲート部材 1 9 2を前記巾心 rf]線廻 りに回転駆動するスプロケッ トホイール 2 1 8が設けられている。  A chain 2 16 is fixed in the circumferential direction on the outer periphery of the cylindrical shape near the upper end of the cylindrical gate member 19 2, and on the boundary wall 1 16 side, it engages with the chain 2 16. A sprocket wheel 218 is provided for rotating the cylindrical gate member 192 about the width rf] line via the chain 2.
前記円筒ゲート部材 1 9 2の、 前記チェーン 2 1 6の下側 ί立置の外周に対向す る高さ位置に、 搬送ライン 1 2 0の両側から且つ僅かの隙間をもって円筒ゲート 部材 1 9 2の円筒形外周を挟み込むようにして、 対向する一対の円弧状ガイ ド部 材 2 2 0が配置されている。 前記スプロケッ 卜ホイール 2 1 8はこの円弧状ガイ ド部材 2 2 0に回転自在に支持されている。 The lower side of the chain 2 16 of the cylindrical gate member 19 2 A pair of arcuate guide members 220 facing each other are placed at both sides of the transfer line 120 so as to sandwich the cylindrical outer periphery of the cylindrical gate member 192 with a slight gap. Have been. The sprocket wheel 2 18 is rotatably supported by the arcuate guide member 220.
前記円筒ゲート部材 1 9 2の下側の、 前記下側底壁 1 9 6を支持する組立体底 壁 2 2 2には、 給液ポート 2 2 4及び排液ポート 2 2 6が設けられている。 給液 ポート 2 24及び排液ポート 2 2 6は、 それぞれその下側の液槽底壁 2 2 3に形 成された液槽袷液ポート 2 2 5、 液槽排液ポート 2 2 7に重なって位置されてい る。  An assembly bottom wall 222 supporting the lower bottom wall 196 below the cylindrical gate member 192 is provided with a liquid supply port 224 and a drain port 226. I have. The liquid supply port 224 and the liquid discharge port 226 overlap the liquid tank lined liquid port 225 and the liquid tank discharge port 227 formed on the lower liquid tank bottom wall 223, respectively. It is located.
前記給液ポー卜 2 2 4は、 円筒ゲート部材 1 9 2のワーク通過切欠き 1 9 8が、 第 2液槽側に閉じてから第 1液槽側に開くまでの間の一部の時間に、 前記袷排液 口 2 0 0と上下方向に重なり、 これによつて第 1液槽内の液体を給液ポー卜 2 2 5、 2 24、 給排液口 2 0 0、 スベーサ 1 9 5の内側空間を経て、 上側底壁 1 9 4の整流細孔 1 9 4 Aから、 円筒ゲート部材 1 9 2内に流入させるものである。 このとき、 液休は整流細孔 1 9 4 Aを通ってゆつくりと円筒ゲ一ト部材 1 9 2 内に流入するので、 円筒ゲ一卜部材 1 9 2内での液休の乱流発生が抑制される。 図 1 8における符号 2 2 8は給液ポー卜 2 2 5を第 1液槽底面の連通孔 2 2 に連通するための連通パイプ、 2 3 0は排液ポー卜 2 2 7からの液体を外部に排 出するための排出パイプをそれぞれ示す。  The liquid supply port 224 is a part of the time from when the work passage notch 198 of the cylindrical gate member 192 is closed to the second liquid tank side to when it is opened to the first liquid tank side. In addition, the lined drain port 200 vertically overlaps with the lined drain port 200, whereby the liquid in the first liquid tank is supplied to the supply ports 222, 224, the supply / drain port 200, and the baser 19. The air flows into the cylindrical gate member 1992 from the rectifying pore 1994A of the upper bottom wall 1994 through the inner space of 5. At this time, since the liquid rest slowly flows through the rectifying pores 194A and flows into the cylindrical gate member 192, a turbulent flow of the liquid rest occurs in the cylindrical gate member 192. Is suppressed. Reference numeral 2 28 in FIG. 18 denotes a communication pipe for connecting the liquid supply port 2 25 to the communication hole 22 on the bottom of the first liquid tank, and reference numeral 230 denotes a liquid from the drain port 2 27. The discharge pipes for discharging to the outside are shown respectively.
又、 図の符号 2 3 2は、 前記シール板 2 1 4の、 シールロール 2 1 2と反対側 の先端を突出して形成した鉛直方向の係合突起を示す。 この係台突起 2 3 2が、 液槽側壁 2 3 3の内側に形成された鉛直方向の係台溝 2 3 4に上方から揷入♦係 合されることによって、 この実施例の液面維持ゲー卜 1 9 0は、 1つの組立体と して着脱可能とされている。  Reference numeral 232 in the figure denotes a vertical engaging projection formed by projecting the tip of the seal plate 2 14 opposite to the seal roll 2 12. The mooring projections 2 32 are inserted from above into vertical mooring grooves 2 3 4 formed inside the liquid tank side wall 2 33 to maintain the liquid level of this embodiment. The gate 190 is detachable as one assembly.
この実施例においては、 ワーク通過切欠き 1 9 8が第 1液槽 1 1 2側に開口す る前に、 円筒ゲート部材 1 9 0の下側底壁 1 9 6に形成された給排液口 2 0 0力 \ 給液ポート 2 24、 2 2 5と重なることによって、 第 1液槽 1 1 2内の液体が、 連通パイプ 2 2 8、 給液ボー卜 2 2 5、 2 2 4、 給排液口 2 0 0、 整流細孔 1 9 4 Aを経て、 円筒ゲート部材 1 9 2内に導入される。 従って、 ワーク通過切欠き 1 9 8力、ら第 1液槽 1 1 2内の液体が急激に流人す る前に円筒ゲート部材 1 9 2内に液体が注入されることになり、 急激な液体の流 入による乱流の発生、 円筒ゲート部材 1 9 2内の急激な圧力上昇、 及びワーク通 過切欠き 1 9 8から円筒ゲート部材 1 9 2内に入ろうとするワーク 1 2 2が液流 によって落下したりすることがない。 In this embodiment, the supply / drainage liquid formed on the lower bottom wall 1 96 of the cylindrical gate member 190 before the work passage notch 1 98 opens to the first liquid tank 112 side. Mouth 200 force \ Liquid supply port 2 24, 2 25 When the liquid in the first liquid tank 1 12 overlaps with the liquid supply port 2 24, 2 25, the communication pipe 2 28, the liquid supply boat 2 25, 2 24, The liquid is introduced into the cylindrical gate member 192 through the supply / drainage port 200 and the rectifying pore 194A. Therefore, the liquid is injected into the cylindrical gate member 192 before the liquid in the first liquid tank 112 flows suddenly due to the work passing notch 198 force, and the liquid is rapidly injected. Generation of turbulent flow due to liquid inflow, rapid pressure increase in cylindrical gate member 192, and work 1 2 2 trying to enter cylindrical gate member 192 from notch 1998 It does not fall by the current.
円筒ゲート部材 1 9 2が更に回転して、 そのワーク通過切欠き 1 9 8力 <、 第 2 液槽 1 1 4側に開く前に、 前記給排液口 2 0 0が排液ポート 2 2 6、 2 2 7に連 通して、 排出パイプ 2 3 0から、 円筒ゲート部材 1 9 2内の液体が排出される。 このとき、 円筒ゲート部材 1 9 2は、 シール部材 2 1 0との間において、.第 1 液槽 1 1 2側の液体が浸入しないようにシールしている。  Before the cylindrical gate member 192 is further rotated and its work passage notch 1998 force <, opening to the second liquid tank 114 side, the supply / drain port 200 is set to the drain port 22 The liquid in the cylindrical gate member 192 is discharged from the discharge pipe 230 in communication with 6, 27. At this time, the cylindrical gate member 192 seals with the seal member 210 so that the liquid in the first liquid tank 112 does not enter.
ワーク通過切欠き 1 3 8が第 2液槽 1 1 4側に開口したときは、 円筒ゲー卜部 材 1 9 2内の液体はほとんど排出されているので、 第 2液槽 1 1 4側に液体が急 激に流出して飛散したりすることがない。  When the work passage notch 1 3 8 opens to the second liquid tank 1 14 side, most of the liquid in the cylindrical gate member 19 2 has been discharged. Does not suddenly flow out and scatter.
僅かな漏出液あるいはワークから滴り落ちた液体は、 漏出液回収口 1 4 8から 回収される。  A small amount of leaked liquid or liquid dripped from the work is collected from the leaked liquid collecting port 148.
上記の過程において、 円筒ゲート部材 1 9 2は、 液圧によってその中心軸線か ら偏る力 シールロール 2 1 2を構成するパイプ 2 1 2 Aは、 支持铀 2 1 2 Bに 遊嵌されているので、 円筒ゲート部材 1 9 2の径方向の変位に対して液圧により 追随してシールを維持することができる。  In the above process, the cylindrical gate member 19 2 is displaced from its center axis by the hydraulic pressure. The pipe 21 A constituting the seal roll 21 is loosely fitted to the support 21 B. Therefore, the seal can be maintained by following the displacement of the cylindrical gate member 192 in the radial direction by hydraulic pressure.
又、 パイプ 2 1 2 Aは耐摩耗性樹脂から構成されているので、 円筒形状の円筒 ゲート部材 1 9 2が回転する際に、 これに転接したりあるいは摺接するいずれの 場合でも、 回転を妨げることなくシールを維持することができる。  In addition, since the pipe 2 12 A is made of wear-resistant resin, when the cylindrical gate member 19 2 rotates, it does not rotate even if it comes into contact with or slides on the gate member 19 2 Without the need to maintain the seal.
なお、 上記実施例において、 図 1 9に示されるように、 第 1液槽 1 1 2側のシ —ルロール 1 1 2の外側に、 先端縁 2 3 6 Aが前記シールロール 2 1 2と円筒ゲ 一ト部材 1 9 2の円周面との接触線近傍にまで到達する第 2のシール片 2 3 6を 設けると、 更にシールを良好にすることができ、 又、 円筒ゲート部材 1 9 2とシ ールロール 2 1 2との間に隙間が生じても、 第 2のシール片 2 3 6によってシー ルを維持することができる。 この第 2のシ一ル片 2 3 6は、 例えば塩化ビニール シートあるいは半割りの塩化ビニ一ルノ、。ィプから構成してもよい。 更に、 上記実施例において、 図 1 6で 2点鎖線で示されるように、 円筒ゲート 部材 1 9 2における上側底壁 1 9 4の外周位置に、 前記ワーク通過切欠き 1 9 8 の下端部を一定高さ範囲で被うように立上げ部 2 3 8を設けると、 ワーク通過切 欠き 1 9 8が第 2液槽 1 1 4側に開口したときの液漏れ量を低減させることがで さる。 In the above embodiment, as shown in FIG. 19, the outer edge of the seal roll 112 on the side of the first liquid tank 112, and the leading edge 236A is cylindrical with the seal roll 211. By providing the second seal piece 236 that reaches near the contact line with the circumferential surface of the gate member 192, the seal can be further improved, and the cylindrical gate member 192 can be further improved. Even if there is a gap between the second seal piece 236 and the seal roll 211, the seal can be maintained. This second seal piece 236 may be, for example, a vinyl chloride sheet or half-divided vinyl chloride. It may be constituted by a chip. Further, in the above embodiment, as shown by the two-dot chain line in FIG. 16, the lower end of the work passage notch 1 98 is provided at the outer peripheral position of the upper bottom wall 19 4 of the cylindrical gate member 19 2. By providing the rising portion 238 so as to cover a certain height range, it is possible to reduce the amount of liquid leakage when the work passage notch 198 is opened to the second liquid tank 114 side. .
なお上記実施例の円筒ゲート部材 1 2 8、 1 9 2は、 有底円筒形状であり、 又 円筒ゲート部材 1 8 6は可撓性周壁部材 1 8 6 Bから構成されている力 本発明 はこれに限定されるものでなく、 要すれば、 開口 1 1 8側との間にシール状態を 維持したまま、 搬送ライン 1 2 0上を搬送されてくるワーク 1 2 2を受け入れ、 その内側にワーク 1 2 2が存在している間に、 ワーク通過切欠き 1 9 8の方向を 搬送ライン 1 2 0上で 1 8 0度変換できるものであればよい。  Note that the cylindrical gate members 1 28 and 1 92 of the above embodiment have a cylindrical shape with a bottom, and the cylindrical gate member 18 6 is a force constituted by a flexible peripheral wall member 18 B. However, the present invention is not limited to this, and if necessary, accepts the work 122 conveyed on the conveyance line 120 while maintaining a sealed state with the opening 118 side, and inserts the work inside. It is sufficient that the direction of the notch 1 98 can be changed 180 degrees on the transfer line 120 while the work 122 is present.
従って、 例えば楕円筒形状等であってもよい。  Therefore, for example, the shape may be an elliptical cylindrical shape.
又、 円筒ゲート部材がワーク通過切欠きを備えた筒状体のとき、 その回転は一 方向又は往復回転のいずれでもよい。 但し、 図 1 6〜図 1 8の実施例の場合、 チ エーン 2 1 6がワーク通過切欠き 1 9 8の部分で連綜していないので、 一方向に 回転させるときは、 スプロケッ 卜ホイールを 2個所以上に設ける必要がある。 又、 チヱーンは円筒ゲート部材 1 8 6の下端外周に取付けてもよい。 この場台、 チェ一ンが円周方向に連続して L、るのでスプロケッ トホイールは 1個でもよい。 又円筒ゲート部材 1 8 6にねじり力が発生しないという利点がある。  Further, when the cylindrical gate member is a cylindrical body provided with a work passage notch, the rotation may be either unidirectional or reciprocating. However, in the case of the embodiment shown in FIGS. 16 to 18, since the chain 2 16 is not connected at the work passing notch 1 98, the sprocket wheel must be used when rotating in one direction. It is necessary to provide at two or more places. The chain may be attached to the outer periphery of the lower end of the cylindrical gate member 186. At this stage, the chain is L continuously in the circumferential direction, so that only one sprocket wheel may be used. Further, there is an advantage that no torsional force is generated in the cylindrical gate member 186.
次に図 2 0〜 2 2を参照して本発明の第 7実施例について説明する。  Next, a seventh embodiment of the present invention will be described with reference to FIGS.
この第 7実施例は、 図 1 6に示される第 6実施例における円筒ゲート部材 1 9 2と同様の円筒ゲート部材 2 4 0を設けたものであるが、 これは該円筒ゲート部 材 2 4 0の下端に同軸一体的に取付けた被動ギヤ 2 4 2を駆動ギヤ (後述) によ り駆動すると共に、 円筒ゲート部材 2 4 0上端の開口をワーク通過溝 2 4 4 Aを 備えた補強蓋 2 4 4を取付け、 更に円筒ゲート部材 2 4 0の周壁に排液連通孔 2 4 6を設けた点において前記図 1 6の実施例と相違している。  In the seventh embodiment, a cylindrical gate member 240 similar to the cylindrical gate member 92 in the sixth embodiment shown in FIG. 16 is provided. A driven gear 2 42, which is coaxially and integrally mounted at the lower end of 0, is driven by a driving gear (described later), and a reinforcing lid having a cylindrical gate member 240 with an opening at the upper end provided with a work passage groove 24 A. This embodiment differs from the embodiment shown in FIG. 16 in that the second embodiment is provided with a second through-hole 24, and a drainage communication hole 246 is provided in the peripheral wall of the cylindrical gate member 240.
他の構成は図 1 6の実施例と同一又は類似しているので、 同一部分には図 1 6 におけると同様の符号を付することにより説明を省略するものとする。  Other configurations are the same as or similar to the embodiment of FIG. 16, and the same parts are denoted by the same reference numerals as in FIG. 16 and description thereof will be omitted.
前記被動ギヤ 2 4 2は、 図 2 0に示されるように、 円筒ゲート部材 2 4 0の下 側底壁 248に、 下方から、 可動底壁 25◦との間に挟み込まれるようにして、 ボルトナツト 252A、 252Bにより、 固定されている。 As shown in FIG. 20, the driven gear 242 is located below the cylindrical gate member 240. It is fixed to the side bottom wall 248 by bolt nuts 252A and 252B so as to be sandwiched from below with the movable bottom wall 25 °.
ここで、 被動ギヤ 242は円筒ゲート部材 240の下側底壁 248に一体的に 締め付け固定され、 可動底壁 250に対してはボルト 252A回りに円筒ゲ一ト 部材 240と共に回転可能に取付けられて L、る。  Here, the driven gear 242 is integrally fastened and fixed to the lower bottom wall 248 of the cylindrical gate member 240, and is rotatably mounted on the movable bottom wall 250 around the bolt 252A together with the cylindrical gate member 240. L, ru.
図 2◦の符号 254は整流細孔 254 Aが多数形成された上側底壁を示し、 こ の上側底壁 254の中心には、 ナツ ト 252Bを締め付け、 あるいは、 緩めるこ とができるように作業孔 254 Bが形成されている。  Reference numeral 254 in FIG. 2 indicates an upper bottom wall in which a number of rectifying holes 254 A are formed.In the center of the upper bottom wall 254, work is performed so that the nut 252B can be tightened or loosened. A hole 254B is formed.
前記被動ギヤ 242及び下側底壁 248には、 図 21において破線で示される ように略扇形の給排液口 242 A、 248 Aカ<厚さ方向に整列して形成されてい 。  The driven gear 242 and the lower bottom wall 248 are formed so as to be substantially aligned in the thickness direction, as shown by broken lines in FIG.
これら給排液口 242 A、 248 Aの、 円筒ゲート部材 240の中心 rf]回りの 位置は、 図 21に示されるように、 ワーク通過切欠き 256に対して 180度位 相がずれた位置に配置されている。  As shown in FIG. 21, the positions of these supply / drainage ports 242 A and 248 A around the center rf] of the cylindrical gate member 240 are shifted by 180 degrees from the work passage cutout 256. Are located.
前記補強蓋 244は、 図 21に示されるように、 ワーク通過切欠き 256と等 しい幅で力 該ワーク通過切欠き 256から回転中心蚰を越えた位置にまで形成 された略 U字形状の前記ワーク通過溝 244 Aを備え、 円筒ゲー卜部材 240の 上端内周に取付けられることによってその剛性を増大するようにされている。 前記排液連通孔 246は図 20及び図 21に示されるように、 円筒ゲート部材 2 40の周壁の前記上側底壁 254近傍に形成されたものであり、 円筒ゲー卜部材 240の回転方向の位置は、 前記ワーク通過切欠き 256に対して回 ΐ云方向前方 に約 60度位相がずれた位置に配置されて L、る。  As shown in FIG. 21, the reinforcing lid 244 has a force having a width equal to that of the work passage notch 256 and has a substantially U-shape formed from the work passage notch 256 to a position beyond the rotation center line. The cylindrical gate member 240 is provided with a work passage groove 244A and is attached to the inner periphery of the upper end of the cylindrical gate member 240 so as to increase its rigidity. As shown in FIGS. 20 and 21, the drainage communication hole 246 is formed in the peripheral wall of the cylindrical gate member 240 near the upper bottom wall 254, and the rotational position of the cylindrical gate member 240 in the rotation direction. L is disposed at a position shifted by about 60 degrees in the rotation direction forward with respect to the work passage notch 256.
前記可動底壁 250は、 そのワーク搬送ライン方向の前後端に 4枚のシール板 114と、 これらシール板 114を搬送ライン方向に連結する壁状の枠体 117 とが一体的に取付けられ、 この中に 4本のシールロール 112を支持由112Β により取付け、 且つその間に円筒ゲート部材 240をセッ 卜し、 更にその上方か ら、 蓋 258を取付け、 該蓋 258の裏面の支持 112 Βをシールロール 11 2の上端に嵌合させて固定することにより、 ゲート部材組立休 260を構成でき るようにされている。 前記可動底壁 2 5 0の底面には、 前記被動ギヤ 2 4 2を回転自在に収納する円 形凹所 2 6 2が形成されている。 The movable bottom wall 250 is integrally provided with four seal plates 114 at the front and rear ends in the work transfer line direction and a wall-shaped frame 117 connecting the seal plates 114 in the transfer line direction. Inside, four seal rolls 112 are attached by supporting means 112Β, and a cylindrical gate member 240 is set between them. A lid 258 is attached from above, and a support 112Β on the back surface of the lid 258 is attached to the seal roll. The gate member assembling rest 260 can be configured by fitting and fixing to the upper end of 112. On the bottom surface of the movable bottom wall 250, a circular recess 262 for rotatably storing the driven gear 242 is formed.
又、 この円形凹所 2 6 2の中心には、 前記ボルト 2 5 2 Aが貫通する貫通孔 2 6 2 Aが形成されると共に、 該貫通孔 2 6 2 Aを挟んで 1 8◦度位相のずれた位 置に、 給液口 2 6 2 B及び排液口 2 6 2 C力 前記給排液口 24 2 A、 2 4 8 A と同様の扇形状で、 且つ、 これらと重なり合うことができるように配置されてい る o  At the center of the circular recess 26 2, a through hole 26 2 A through which the bolt 25 2 A penetrates is formed, and a phase of 18 ° is interposed with the through hole 26 2 A interposed therebetween. The liquid supply port 26 2 B and the liquid discharge port 26 2 C have the same fan shape as the above-mentioned liquid supply and discharge ports 24 2 A and 248 A, and may overlap with these. Is placed so that it can be
前記円形凹所 2 6 2からは、 前記ワーク搬送ライン方向の一方に連続して延在 する駆動ギヤ進入溝 2 6 4が可動底壁 2 5 0の一方の端部に至るまで連続的に形 成されている。  From the circular recess 26 2, a drive gear entry groove 26 4 extending continuously in one direction in the work transfer line direction is continuously formed until it reaches one end of the movable bottom wall 250. Has been established.
この駆動ギヤ進入溝 2 6 4に対しては、 ゲ—ト部材組立体 2 6 0を液槽底壁で ある固定底壁 2 6 6上の所定位置にセッ 卜したとき、 該固定底壁 2 6 6に配置さ れた駆動ギヤ 2 6 8が入り込み、 前記被動ギヤ 2 4 2と嚙台うことができるよう にされている。  When the gate member assembly 260 is set at a predetermined position on the fixed bottom wall 266 which is the liquid tank bottom wall, the fixed bottom wall 2 The driving gear 2668 disposed at 66 is inserted so as to be able to communicate with the driven gear 2442.
図 2 1の符号 2 7 0はゲート部材組立体 2 6 0を取付けたときにワーク搬送ラ ィン方向の位置決めをするための位置決め壁を示す。  Reference numeral 270 in FIG. 21 indicates a positioning wall for positioning in the work transfer line direction when the gate member assembly 260 is mounted.
前記駆動ギヤ 2 6 8は図 2 1及び図 2 2に示されるようにピニオン 2 7 2と嚙 合っていて、 該ピニオン 2 7 2はその回転寒由 2 7 2 Aの途中に取付けられたスプ ロケッ 卜ホイール 2 7 4に巻回されるチヱーン 2 7 6により回転駆動され、 駆動 ギヤ 2 6 8を介して前記被動ギヤ 24 2を回転させるものである。  The drive gear 268 is engaged with a pinion 272 as shown in FIG. 21 and FIG. 22, and the pinion 272 is a sprocket mounted in the middle of the rotation cold 272A. The driven gear 242 is driven to rotate by a chain 276 wound around a rocket wheel 274, and the driven gear 242 is rotated via a driving gear 268.
チェーン 2 7 6は、 液槽壁 2 7 8の貫通孔 2 7 8 Aを通って外部のスプロケッ トホイール (図示省略) に巻回され、 駆動されるようになっている。  The chain 2776 is wound around and driven by an external sprocket wheel (not shown) through a through hole 2778A of the liquid tank wall 2778.
ここで、 駆動ギヤ 2 6 8、 ピニオン 2 7 2力く配置されるのは、 円筒ゲート部材 2 4 0を間にして反対側の液槽の液レベルに対して、 処理液レベルが零かある、、 はワーク通過切欠き 2 5 6の下端よりも低い位置にある側とする。 従って、 液槽 壁 2 7 8の貫通孔 2 7 8 Aは、 液漏れ防止のために、 ワーク通過切欠き 2 5 6下 端よりも高い位置に設ける必要がある。  Here, the driving gear 2 68 and the pinion 2 7 2 are arranged so that the processing liquid level is zero with respect to the liquid level in the liquid tank on the opposite side with the cylindrical gate member 240 interposed therebetween. ,, And are the lower sides of the lower end of the work passage notch 256. Therefore, the through hole 2778A of the liquid tank wall 2778 needs to be provided at a position higher than the lower end of the work passage cutout 256 to prevent liquid leakage.
この実施例における円筒ゲー卜部材 24 0内へのワーク及び処理液の出入は前 記図 1 6の実施例と同様であるので説明は省略する力 排液連通孔 2 4 6の作用 について次に説明する。 The entry and exit of the work and the processing liquid into and from the cylindrical gate member 240 in this embodiment are the same as in the embodiment of FIG. 16 described above. Will be described below.
図 2 1において左側の液面レベルが高く、 右側の液面レベルが零又はワーク通 過切欠き 2 5 6の下端よりも低い位置とされた場合、 円筒ゲート部材 24 0の回 転に従って、 該円筒ゲ—ト部材 24 0の外周と前後のシールド 1 1 2及び壁状枠 体 1 1 7の間に処理液が溜り、 これ力 液面低レベル側に吹出すことがある。 排液連通孔 24 6は上記のように前後のシールロール 1 1 2間に溜った処理液 を排出させるものであり、 図 2 1の状態のときは同図において下側の一対のシ一 ルロール 1 1 2と円筒ゲート部材 24 0の外周との間に溜った処理液を該円筒ゲ 一ト部材 24 0内に排出し、 更に図 2 1において時計方向に回転して、 反対側 In FIG. 21, when the liquid level on the left side is high and the liquid level on the right side is zero or lower than the lower end of the work passage cutout 256, the rotation of the cylindrical gate member 240 The processing liquid may accumulate between the outer periphery of the cylindrical gate member 240 and the front and rear shields 112 and the wall-like frame 117, which may be blown out to a lower liquid level. The drain communication holes 246 are used to discharge the processing liquid accumulated between the front and rear seal rolls 11 and 12 as described above. In the state shown in FIG. 21, a pair of lower seal rolls in FIG. The processing liquid accumulated between 1 12 and the outer periphery of the cylindrical gate member 240 is discharged into the cylindrical gate member 240, and further rotated clockwise in FIG.
(上側) の一対のシールロール 1 1 2の間の位置でここに溜った処理液を円筒ゲ 一ト部材 24 0内に排出するものである。 The processing liquid collected here at a position between the pair of (upper) seal rolls 111 is discharged into the cylindrical gate member 240.
排液連通孔 24 6は、 前述の如く、 ワーク通過切欠き 2 5 6に対してその回転 方向前方に約 6 0度の位相差をもつて配置されてる 、ので、 予期しないときに処 理液が円筒ゲート部材 24 0内に出入することがない。  As described above, the drainage communication hole 246 is arranged with a phase difference of about 60 degrees ahead of the workpiece passage notch 256 in the rotation direction. Does not enter or exit the cylindrical gate member 240.
産業上の利用可能性  Industrial applicability
この発明は、 メツキ、 アルマイ ト処理、 電解研磨、 電解酸洗、 プリン卜基板ス ルーホールメツキ、 フロン代替洗浄、 治具剥離等の、 液処理槽にワークを浸清し て処理を行うための浸漬処理装置であって、 ワークを液処理槽に対して、 上下方 向に移動させることなく、 水平に連続して移動させて、 ロスタイムが少なく効率 的に処理することができる。  The present invention provides a method for purifying a workpiece in a liquid processing tank, such as plating, alumite treatment, electrolytic polishing, electrolytic pickling, through-hole plating on a printed substrate, freon substitute cleaning, and jig peeling. This is an immersion treatment device that can move the work horizontally continuously without moving it up and down with respect to the liquid treatment tank, so that the treatment can be performed efficiently with little loss time.

Claims

請 求 の 範 囲 The scope of the claims
( 1 ) ワークを一定範囲で水平搬送ラインに沿つて水平に搬送する搬送手段と、 液処理槽、 この液処理槽の前後に配置された前側及び後側リザ一ブ槽、 及び液処 理槽とリザーブ槽内の処理液の量を調整する液量調整手段、 を含んで一組とされ て、 前記搬送ラインに沿って水平、 且つ、 連続的に配置された、 各処理液につき 少なくとも一組の液処理槽群と、 各液処理槽とリザーブ槽の境界壁及び前側リザ 一ブ槽の入側境界壁、 後側リザ一ブ槽の出側境界壁の上端から下方に一定高さ範 囲で形成され、 ワークの通過を許容する開口にそれぞれ配置され、 開状態で前記 ワークの水平通過を許容すると共に、 閉じ状態で処理液の流出を阻止するゲート と、 ゲートへのワーク接近時に該ゲートを開き、 ワーク通過後に該ゲートを閉じ、 前側リザ一ブ槽の入側のゲ一トと後側リザ一ブ槽の出側のゲートを、 液処理槽の 入側のゲー卜と出側のゲー卜に対して逆位相で開閉させるゲート駆動制御装置と、 を有してなり、 前記液量調整手段は、 液処理槽とリザーブ槽間をワークが出入り するとき両槽の液処理レベルを同一とし、 リザ一ブ槽とリザ一ブ槽外間を出入り するとき該リザーブ槽の液処理レベルを、 ゲ一ト開状態におけるゲート開口下端 以下とすることを特徴とする水平走行連続浸濱処理装置。  (1) A transport means for transporting a work horizontally along a horizontal transport line within a certain range, a liquid treatment tank, front and rear reserve tanks disposed before and after the liquid treatment tank, and a liquid treatment tank And a liquid amount adjusting means for adjusting the amount of the processing liquid in the reserve tank, and at least one set for each processing liquid horizontally and continuously arranged along the transport line. And a fixed height range from the upper end of the boundary wall between each liquid processing tank and the reserve tank, the entrance boundary wall of the front reservoir, and the exit boundary wall of the rear reservoir. A gate that is formed at each of the openings that allow the passage of the work, and that allows the work to pass horizontally in the open state and prevents the outflow of the processing liquid in the closed state; and a gate when the work approaches the gate. And close the gate after passing the work Gate drive that opens and closes the gate on the inlet side of the reserve tank and the gate on the outlet side of the rear reserve tank in opposite phases to the gate on the inlet side and the gate on the outlet side of the liquid treatment tank And a control device, wherein the liquid amount adjusting means sets the same liquid processing level between the liquid processing tank and the reserve tank when the work enters and leaves between the liquid processing tank and the reserve tank. A horizontal traveling continuous shoreline treatment apparatus characterized in that the liquid treatment level of the reserve tank when entering and exiting the gate is not more than the lower end of the gate opening when the gate is open.
( 2 ) 請求項 1において、 前記ゲー卜は前記ワークの水平搬送ラインと直交する 方向に移動して開口を開閉するシャッタープレートを備えたことを特徴とする水 平走行連続浸漬処理装置。  (2) The horizontal traveling continuous immersion treatment apparatus according to claim 1, wherein the gate includes a shutter plate that opens and closes an opening by moving in a direction orthogonal to a horizontal transfer line of the work.
( 3 ) 請求項 2において、 前記ゲートにおけるシャッタープレー卜は、 前記ヮー クの搬送ラインと直交する鉛直面内で該通過ラインに対して進退する一対設けら れ、 これらシャッタープレートの対向端縁が接触することにより閉じ状態、 離間 することにより開状態となることを特徵とする水平走行連続浸漬処理装置。  (3) In claim 2, a pair of shutter plates at the gate are provided to advance and retreat with respect to the passage line in a vertical plane orthogonal to the transport line of the park, and the opposite edges of the shutter plates are provided. A horizontal running continuous immersion treatment apparatus characterized in that it comes into a closed state when it comes in contact with it, and it becomes an open state when it comes apart.
(4 ) 請求項 1において、 前記ゲート駆動制御装置は、 一組の液処理槽群におけ る液処理槽の入側ゲートと出側ゲー卜を同期して開閉させるものであることを特 徴とする水平走行連続浸濱処理装置。  (4) In claim 1, the gate drive control device synchronously opens and closes an inlet gate and an outlet gate of a liquid processing tank in a set of liquid processing tanks. Horizontal traveling continuous beach treatment equipment.
( 5 ) 請求項 1において、 前記ゲート駆動制御装置は、 前記ワークの搬送ライン に沿って前記液処理槽群の側面に配置された動力^と、 この動力 (tiの駆動力を前 記ゲー卜に伝達する伝達装置と、 を有してなることを特徴とする水平走行連続浸 (5) In claim 1, the gate drive control device comprises: a power ^ disposed on a side surface of the liquid processing tank group along the work transfer line; A horizontal traveling continuous immersion comprising:
( 6) 請求項 5において、 前記ゲートは、 前記ワークの水平搬送ラインと直交す る方向に移動して開口を開閉するシャッタープレートを備えると共に、 該シャッ 夕一プレートを前記ワークの搬送ラインと直交する鉛直面内で移動自在に案内す るガイ ドを備え、 前記伝達装置は、 前記動力軸の回転運動を往復動にして前記ゲ 一トに伝達する動力変換装置であることを特徴とする水平走行連続浸漬処理装置(6) In claim 5, the gate includes a shutter plate that opens and closes an opening by moving in a direction orthogonal to a horizontal transfer line of the work, and the shutter plate is orthogonal to the transfer line of the work. Wherein the transmission device is a power conversion device for transmitting the rotational motion of the power shaft to the gate by reciprocating the rotational motion. Traveling continuous immersion processing equipment
( 7 ) 請求項 5において、 前記ゲートは、 前記ワークの水平搬送ラインと直交す る鉛直面内で揺動自在に支持されて揺動により開口を開閉するシャッタープレー トを備え、 前記伝達装置は、 前記動力軸の回転運動を前記シャツ一プレートの揺 動運動として伝達する動力変換装置であることを特徴とする水平走行連続浸漬処 (7) In Claim 5, the gate includes a shutter plate that is swingably supported in a vertical plane orthogonal to a horizontal transfer line of the work and that opens and closes an opening by swinging, and the transmission device is A horizontal running continuous immersion process, wherein the power conversion device transmits the rotational motion of the power shaft as the oscillating motion of the shirt-plate.
(8) 請求項 5において、 少なくとも一組の液処理槽群の各ゲートが、 同一の動 力奉由を共有し、 前記伝達装置は各ゲート毎に設けられていることを特徴とする水 平走行連続浸漬処理装置。 (8) The horizontal plane according to claim 5, wherein each gate of at least one set of the liquid treatment tank groups shares the same driving force, and the transmission device is provided for each gate. Running continuous immersion treatment equipment.
( 9 ) 請求項 1において、 前記各組の液処理槽群における液処理槽とリザーブ槽 は、 直線状に配置され、 且つ、 隣接する組は、 その搬送ラインの相対角度が任意 に調節自在とされたことを特徴とする水平走行連続浸漬処理装置。  (9) In claim 1, the liquid treatment tank and the reserve tank in each of the liquid treatment tank groups of each set are arranged linearly, and the relative angle of the transport line of the adjacent set is freely adjustable. A horizontal running continuous immersion treatment apparatus characterized by being performed.
( 1 0 ) 請求項 1において、 前記前側リザ一ブ槽の入側ゲートと処理液槽の入側 ゲ一卜との対、 前記後側リザ一ブ槽の出側ゲートと処理液槽出側ゲ一卜との対の 少なくとも一方の対は、 前記境界壁の前記開口に配置され、 内部にワークを収納 する空間、 及び上端から一定深さで、 前記空間から外周の一個所に至るまで形成 され、 ワークが前記空間に出入することを許容するワーク通過切欠きを備え、 且 つ、 上下方向の中心 廻りに回動自在とされた上端開放有底円筒状部材であって、 前記ワーク通過切欠きの開口方向を、 前記搬送ラインに沿う 2方向に 1 8 0度変 換可能とされた円筒ゲー卜部材と、 この円筒ゲート部材の外周と前記開口の内周 縁との間を液密にシールするシール部材と、 を備えて構成され、 前記円筒ゲー卜 部材の内部の前記空間が前記リザ一ブ槽を構成することを特徴とする水平走行連  (10) In Claim 1, a pair of an inlet gate of the front reservoir and an inlet gate of the processing liquid tank, and an outlet gate of the rear reservoir and an outlet of the processing liquid tank. At least one pair of the pair with the gate is arranged in the opening of the boundary wall, and has a space for accommodating the work therein, and is formed at a certain depth from the upper end and from the space to one outer periphery. A bottom-opened cylindrical member provided with a work-passing notch that allows the work to enter and exit the space, and that is rotatable about a vertical center. A cylindrical gate member capable of changing the opening direction of the notch by 180 degrees in two directions along the transfer line; and a liquid-tight space between the outer periphery of the cylindrical gate member and the inner periphery of the opening. And a sealing member for sealing. Horizontal running communicating said space is characterized in that it constitutes the reservoir one blanking tank
( 1 1 ) 請求項 1 0において、 前記円筒ゲート部材の底壁は、 二重構造とされ、 上側底壁には多数の整流細孔が形成され、 下側底壁には、 前記ワーク通過切欠き の開口の方向の変換に伴って位置が変化され、 これにより円筒ゲート部材内に隣 接する 2つの槽のうち液面が高い側の槽内の流体を流入させ、 又は、 流入した液 体を排出するための給排水口を設けたことを特徴とする水平走行連続浸漬処理装 置。 (11) In Claim 10, the bottom wall of the cylindrical gate member has a double structure, A large number of flow regulating pores are formed in the upper bottom wall, and the position is changed in the lower bottom wall in accordance with the change in the direction of the opening of the work passage notch, whereby the adjoining cylindrical gate member 2 is formed. A horizontal traveling continuous immersion treatment apparatus characterized in that a water supply / drain port is provided for inflow of a fluid in a tank having a higher liquid level in one of the two tanks or for discharging the inflowing liquid.
( 1 2 ) 請求項 1 1において、 前記円筒ゲート部材の下側底壁の下側に隣接する 液槽底壁には、 前記円筒ゲー卜部材の下側底壁における前記給排液口を、 前記ヮ ーク通過切欠きが、 隣接する槽のうち液面が低い側に閉じてから液面力 <高い側に 開くまでの間の少なくとも一部の時間に、 該液面が高い側に連通させる耠液ポー トと、 前記給排液口を、 ワーク通過切欠きが液面力《高い側に閉じてから液面が低 い側に開くまでの間の少なくとも一部の時間に排液系に連通させる排液ポートと、 を設けたことを特徴とする水平走行連続浸漬処理装置。  (12) In Claim 11, the liquid supply / discharge port in the lower bottom wall of the cylindrical gate member is provided on a liquid tank bottom wall adjacent to a lower side of a lower bottom wall of the cylindrical gate member. The peak passage notch communicates with the liquid surface on the high side during at least part of the time from when the liquid surface of the adjacent tank closes on the low side to when the liquid surface force opens on the high side. The liquid supply port and the liquid supply / drain port are connected at least partially during the time from when the workpiece passage notch closes to the liquid level << high side to when the liquid level opens to the low side. A horizontal traveling continuous immersion treatment apparatus, comprising:
( 1 3 ) 請求項 1 1において、 前記円筒ゲート部材は、 その底壁の下側に、 これ と同铀一体的に被動ギヤを備え、 該円筒ゲート部材の下方の液槽底壁には、 前記 被動ギヤを回転自在に収容する円形凹所と、 該凹所内の前記被動ギヤと嚙み合つ てこれを回転駆動する駆動ギヤが配置され、 前記被動ギヤは、 前記円筒ゲート部 材の下側底壁における前記給排液口に接続する第 2給排液口を備えたことを特徴 とする水平走行連続浸漬処理装置。  (13) The cylindrical gate member according to claim 11, wherein the cylindrical gate member is provided with a driven gear integrally below the bottom wall thereof, and a liquid tank bottom wall below the cylindrical gate member includes: A circular recess that rotatably accommodates the driven gear, and a drive gear that meshes with the driven gear in the recess to rotate the driven gear are arranged, and the driven gear is located below the cylindrical gate member. A horizontal traveling continuous immersion treatment apparatus comprising a second supply / drain port connected to the supply / drain port on the side bottom wall.
( 1 4 ) 請求項 1 0において、 前記シール部材は、 前記円筒ゲート部材の中心軸 線と平行に、 且つ、 前記搬送ラインの左右であって円筒ゲート部材の搬送方向前 側の 2個所及び後側の 2個所で、 該円筒ゲート部材の円筒形外周に、 前記中心幸由 線廻りの相対変位可能に接触して配置されたシールロールと、 前記開口の内周縁 側に取付けられ、 先端縁が前記シールロールの外周に、 前記円筒ゲート部材と反 対側から相対変位可能に接触する 4個のシール板と、 を備えて構成されたことを 特徴とする水平走行連続浸漬処理装置。  (14) In the tenth aspect, the seal member is provided at two places parallel to the central axis of the cylindrical gate member, on the left and right sides of the transfer line, and on the front side in the transfer direction of the cylindrical gate member, and after. A seal roll disposed at two positions on the outer periphery of the cylindrical gate member so as to be relatively displaceable about the center line, and attached to the inner peripheral side of the opening, and the leading edge is A horizontal traveling continuous immersion treatment apparatus, comprising: four seal plates that are in contact with the outer periphery of the seal roll so as to be relatively displaceable from the opposite side from the cylindrical gate member.
( 1 5 ) 請求項 1 4において、 前記シールロールは、 パイプと、 このパイプを回 動可能に支持し、 且つ、 前記パイプの内径に対して径方向の遊び代をもって遊嵌 された支持 it]と、 を備えて構成されたことを特徴とする水平走行連続浸漬処理装 ( 1 6) 請求項 1 4において、 前記シールロールのうち前記液面が高い槽側のシ ールロールの外側に接触して、 先端縁が、 該シールロールと前記円筒ゲート部材 外周との鉛直方向接線近傍に延在される軟質の第 2シール片を設けたことを特徴 とする水平走行連続浸漬処理装置。 (15) The seal roll according to (14), wherein the seal roll supports the pipe and the pipe so as to be rotatable, and is loosely fitted with a radial allowance to the inner diameter of the pipe. And a horizontal traveling continuous immersion treatment apparatus characterized by comprising: (16) The sealing roll according to (14), wherein the sealing roll is in contact with the outer side of the sealing roll on the tank side where the liquid level is high, and a leading edge is a vertical tangent between the sealing roll and the outer periphery of the cylindrical gate member. A horizontal traveling continuous immersion treatment apparatus, comprising a soft second seal piece extending in the vicinity.
( 1 7 ) 請求項 1 4において、 前記円筒ゲート部材の周壁の、 該ゲー卜部材のヮ ーク通過切欠きが液面が高い側に連通しているとき、 該ワーク通過切欠きに対し てゲート部材回転方向前方に隣接するシールロール及び次に隣接するシール口一 ル間の位置に、 円筒内外を連通する排液連通孔を形成したことを特徴とする水平 走行連続浸漬処理装置。  (17) In the above item (14), the work passage notch of the peripheral wall of the cylindrical gate member, when the notch passage notch of the gate member communicates with a higher liquid surface side, A horizontal traveling continuous immersion treatment apparatus, characterized in that a drain communication hole communicating between the inside and outside of the cylinder is formed at a position between a seal roll adjacent to the front in the gate member rotation direction and a seal hole adjacent to the next.
( 1 8) 請求項 1 0において、 前記円筒ゲート部材の下端近傍及び上端近傍の一 方における円筒形の外周には円周方向にチェーンが固着され、 前記境界壁を含む 液槽側には、 前記チェ一ンと嚙み合うと共に、 該チェーンを介して前記円筒ゲー ト部材を、 前記 線廻りに回転駆動するスプロケットホイール力 <設けられたこと を特徴とする水平走行連続浸漬処理装置。  (18) In the tenth aspect, a chain is circumferentially fixed to a cylindrical outer periphery near one of a lower end and an upper end of the cylindrical gate member, and a liquid tank side including the boundary wall includes: A horizontal traveling continuous immersion treatment apparatus, which is provided with a sprocket wheel force that engages with the chain and drives the cylindrical gate member to rotate around the line through the chain.
( 1 ) 請求項 1 0において、 前記開口に、 前記円筒ゲート部材のワーク通過切 欠きの開口方向を 2方向に変換する運動軌跡に沿って、 その外側を、 搬送ライン の両側から、 隙間をもって囲んで配置された一対のガイ ド壁と、 前記円筒ゲート 部材の底面に接触し、 一定範囲で運動可能に支持するガイ ド底壁と、 を有してな るガイ ド部材を設け、 ガイ ド壁の前記搬送ライン方向両端は、 ワークの通過を許 容する間隙をもって対向されたことを特徴とする水平走行連続浸漬処理装置。 (1) In Claim 10, the outside of the cylindrical gate member is surrounded by a gap from both sides of a transfer line along a movement trajectory that converts the opening direction of the work passage cutout of the cylindrical gate member into two directions. A guide wall having a pair of guide walls arranged in the above manner, and a guide bottom wall in contact with the bottom surface of the cylindrical gate member and supporting the movable body within a certain range; The horizontal traveling continuous immersion treatment apparatus is characterized in that both ends in the conveying line direction are opposed to each other with a gap allowing passage of the work.
( 2 0 ) 請求項 1 9において、 前記シール部材は、 前記ガイド壁に設けられ、 前 記円筒ゲート部材の外周に摺設自在とされたシール片を含むことを特徴とする水 平走行連続浸濱処理装置。 (20) The horizontal running continuous immersion device according to claim 19, wherein the seal member includes a seal piece provided on the guide wall and slidably provided on an outer periphery of the cylindrical gate member. Hama processing equipment.
( 2 1 ) 請求項 1 9において、 前記円筒ゲー卜部材は、 底部にフランジを備え、 前記一対のガイ ド部材は、 前記フランジの外周に対して僅かな隙間をもって配置 された円弧状内周面を備え、 前記シール部材は、 前記ガイ ド部材に設けられ、 前 記円筒ゲート部材の円筒状外周面とフランジの上面に摺設自在とされたシール片 を含んで構成されたことを特徴とする水平走行連続浸漬処理装置。  (21) The cylindrical gate member according to claim 19, wherein the cylindrical gate member has a flange at a bottom portion, and the pair of guide members have an arc-shaped inner peripheral surface arranged with a small gap with respect to the outer periphery of the flange. The seal member is provided on the guide member, and includes a seal piece slidably provided on the cylindrical outer peripheral surface of the cylindrical gate member and the upper surface of the flange. Horizontal running continuous immersion treatment equipment.
( 2 2) 請求項 1 0において、 前記円筒ゲート部材は、 その底壁の、 前記中心 線の位置に、 液槽の底壁よりも下方に突出する被動 ΐ由を備え、 該被動铀を介して 前記中心蚰線廻りに回動されることを特徴とする水平走行連続浸漬処理装置。(22) The cylindrical gate member according to claim 10, wherein: A horizontal traveling continuous immersion treatment apparatus, comprising a driven member projecting below the bottom wall of the liquid tank at a position of the line, and being rotated around the center line through the driven member.
( 2 3 ) 請求項 1 0において、 前記円筒ゲート部材は、 その底壁の下側に、 これ と同軸一体的に被動ギヤを備え、 該円筒ゲート部材の下方の液槽底壁には、 前記 被動ギヤを回転自在に収容する円形凹所と、 該凹所内の前記被動ギヤと嚙み合つ てこれを回転駆動する駆動ギヤが配置されたことを特徴とする水平走行連続浸漬 処理装置。 (23) The cylindrical gate member according to claim 10, wherein the cylindrical gate member includes a driven gear coaxially and integrally with a lower side of a bottom wall thereof, and a liquid tank bottom wall below the cylindrical gate member includes: A horizontal traveling continuous immersion treatment apparatus, comprising: a circular recess that rotatably accommodates a driven gear; and a drive gear that meshes with the driven gear in the recess to rotate the driven gear.
( 2 4 ) 請求項 2 3において、 前記液槽底壁は、 前記円形凹所を備えた可動底壁 と、 前記液処理槽の底壁に連続する固定底壁との二重構造とされ、 前記円筒ゲ一 ト部材、 シール部材、 被動ギヤ及び可動底壁は、 枠部材により一体的な組立体と され、 且つ、 前記固定底壁の、 前記被動ギヤが前記駆動ギヤと嚙み台う位置に着 脱自在とされたことを特徴とする水平走行連続浸漬処理装置。  (24) In Claim 23, the liquid tank bottom wall has a double structure of a movable bottom wall having the circular recess, and a fixed bottom wall continuous to the bottom wall of the liquid processing tank. The cylindrical gate member, the seal member, the driven gear, and the movable bottom wall are an integral assembly formed by a frame member, and the fixed bottom wall has a position where the driven gear is mounted on the drive gear. A horizontal traveling continuous immersion treatment device characterized in that it can be freely attached to and detached from.
( 2 5 ) 請求項 1 0において、 前記円筒ゲート部材の上端開口に、 前記ワーク通 過切欠きから前記中心軸を超える位置まで、 該ワーク通過切欠きと等し L、幅で円 筒の径方向に形成されたワーク通過溝を備えた補強蓋を取付けたことを特徴とす る水平走行連続浸漬処理装置。  (25) In Claim 10, at the upper end opening of the cylindrical gate member, from the work passage notch to a position beyond the center axis, the work passage notch is equal to L, and the diameter of the cylinder in width. A horizontal running continuous immersion treatment apparatus characterized by mounting a reinforcing lid having a work passage groove formed in a direction.
( 2 6 ) 請求項 1 0において、 前記ゲート部材は、 長円形状の底壁と、 この底壁 上に、 長円軌道上を周方向に摺動自在に配置された可撓性周壁部材と、 を有して なり、 該可撓性周壁部材は前記長円軌道の全長よりも、 ワーク通過幅程度短くさ れたことを特徴とする水平走行連続浸漬処理装置。  (26) In Claim 10, wherein the gate member has an oval bottom wall, and a flexible peripheral wall member disposed on the bottom wall so as to be slidable in a circumferential direction on an oval orbit. The horizontal traveling continuous immersion treatment apparatus, characterized in that the flexible peripheral wall member is shorter than the entire length of the elliptical orbit by about the work passage width.
( 2 7 ) 請求項 1 0において、 少なくとも前記ワークの通過軌跡範囲に相当する ワーク通路が形成され、 前記ゲー卜部材における前記空間を略充填する大きさで あって、 該空間内に、 上方から着脱自在とされた揷入部材を設けたことを特徴と する水平走行連続浸漬処理装置。  (27) The work passage according to claim 10, wherein at least a work passage corresponding to a range of a passage locus of the work is formed, and the work passage has a size that substantially fills the space in the gate member. A horizontal traveling continuous immersion treatment device characterized by providing a detachable insertion member.
( 2 8) 請求項 1において、 前記リザーブ槽の底壁には、 ゲート部材の外側に、 前記開口の底辺よりも低い高さの辻切壁を立設し、 且つ、 この ί土切壁と前記隔壁 の間に、 漏出液回収孔を設けたことを特徴とする水平走行連続浸濱処理装置。 (28) In Claim 1, a bottom wall of the reserve tank is provided with a tsuji cut wall having a height lower than a bottom of the opening, outside the gate member, and A horizontal traveling continuous immersion processing apparatus, wherein a leaked liquid recovery hole is provided between the partition walls.
( 2 9 ) 請求項 2 8において、 前記仕切壁の高さ及び漏液回収孔の漏出液排出能 力は、 前記隔壁の全開時に、 前記液処理槽から漏出する液体を、 前記仕切壁を越 えることなく排出する程度とされたことを特徴とする水平走行連続浸漬処理装置。 (29) In Claim 28, the height of the partition wall and the leaked liquid discharge capability of the leak recovery hole are such that when the partition wall is fully opened, the liquid leaking from the liquid treatment tank passes through the partition wall. A horizontal traveling continuous immersion treatment apparatus characterized in that the immersion treatment is performed without discharge.
PCT/JP1994/002061 1993-12-10 1994-12-09 Continuous immersion treatment apparatus of horizontal transfer type WO1995016059A1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP31015893A JPH07166364A (en) 1993-12-10 1993-12-10 Horizontal traveling and continuous immersion treating device
JP5/310158 1993-12-10
JP6/124188 1994-05-13
JP12418894 1994-05-13
JP6/139033 1994-06-21
JP13903394A JPH0827599A (en) 1994-05-13 1994-06-21 Liquid level maintaining gate

Publications (1)

Publication Number Publication Date
WO1995016059A1 true WO1995016059A1 (en) 1995-06-15

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117380689A (en) * 2023-12-11 2024-01-12 山东耀华玻璃有限公司 Glass coating cleaning device with quick drying function

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61246372A (en) * 1985-04-23 1986-11-01 シエリング アクチエンゲゼルシヤフト Method and apparatus for plating article
JPH04365878A (en) * 1991-03-29 1992-12-17 Saatec Kk Continuous treating device by liquid chemical

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JPS61246372A (en) * 1985-04-23 1986-11-01 シエリング アクチエンゲゼルシヤフト Method and apparatus for plating article
JPH04365878A (en) * 1991-03-29 1992-12-17 Saatec Kk Continuous treating device by liquid chemical

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117380689A (en) * 2023-12-11 2024-01-12 山东耀华玻璃有限公司 Glass coating cleaning device with quick drying function
CN117380689B (en) * 2023-12-11 2024-03-15 山东耀华玻璃有限公司 Glass coating cleaning device with quick drying function

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