WO1992006923A1 - Method of making superconductive film - Google Patents

Method of making superconductive film Download PDF

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Publication number
WO1992006923A1
WO1992006923A1 PCT/JP1991/001423 JP9101423W WO9206923A1 WO 1992006923 A1 WO1992006923 A1 WO 1992006923A1 JP 9101423 W JP9101423 W JP 9101423W WO 9206923 A1 WO9206923 A1 WO 9206923A1
Authority
WO
WIPO (PCT)
Prior art keywords
ttl
superconductive film
making
film
making superconductive
Prior art date
Application number
PCT/JP1991/001423
Other languages
French (fr)
Inventor
Atsushi Tanaka
Nobuo Kamehara
Koichi Niwa
Original Assignee
Fujitsu Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Limited filed Critical Fujitsu Limited
Priority to EP91917815A priority Critical patent/EP0510201B1/en
Priority to DE69110450T priority patent/DE69110450T2/en
Priority to US07/860,505 priority patent/US5306702A/en
Publication of WO1992006923A1 publication Critical patent/WO1992006923A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/728—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/731—Sputter coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Definitions

  • Bi:Pb:Sr:Ca:Cu (1.9—2.1) : (1.2 -2.2) :2: (1.9 -2.2): (3— 3.5)®!! ⁇ ®% /PifeBi, Pb, Sr, Ca, Cu ⁇ #t, ⁇ Pb

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Treatment And Processing Of Natural Fur Or Leather (AREA)

Abstract

A method of making a Bi-family perovskite type superconductive film comprising such processes that: a film of Pb-containing Bi-family material containing Bi, Pb, Sr, Ca, and Cu in the molar ratio of (1.9 to 2.1):(1.2 to 2.3, preferably, 1.5 to 1.8):2:(1.9 to 2.2):(3 to 3.5) is formed on a substrate, and then baked for 20 to 120 min in an oxygen-containing atmosphere with a temperature rise of 3 to 10 °C, preferably 3 to 5 °C until a final temperature of 850 to 860 °C, preferably 852 to 855 °C, is attained.

Description

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Claims

* 0
1. Pb**fcBiJR*«π:/λ*-f hiSfel^Ol^M
2. Xβi±C^ Bi:Pb:Sr:Ca:Cu = (1.9-2.1) : (1.2-2.2) : 2: (1.9— 2.2) : C3 -3.5) 0 KSfflA © * Λ> Jt *?Bi> Pb, Sr, Ca, ttPb$#&Bi$iTOIt$. $.##=Pr#fflMΦ20-120 #n τ*. ^ØΓH13 -io#c©MS±#^#^τm^^^^^^85θ -860 icβ>ffflSAκ:%«fπftftAftftτ. ttA-^«
3. «iaBPb*#tfBi3RWJSIRO|aA^*Bi.Pb,Sr,CabCue0« (^Φx a ttl.9 2.1 . x ttl.2 -2.2 . b «1.9 -2.2 . c ItS —3.3 0^Hrt0ffiT2b«). z Ithu' Pb, Sr, Ca, Cu
©»efcuτ*s*fl:Miltt*©*-ff**) tiέtiδi
4. WEPb£#frBi3S#.BR©ffllS#^Bi.Pb«Sr«CabCueO, (^Φ. a ttl.9 -2.1 . x ttl.5 -1.8 . b ttl.9 -2.2 . c tt3 -3.5 . ©lgffll*I©itτ$>«3. z ttBi, Pb, Sr, Ca, Cn©*CKt5Tft*«ft^*tt»M©*-C&*) tiέ^δ
5. HΪfte^^fiJfHiΦøMS±#^3 -5 t ©|gHl*iτfe§ «m©Hffl^2^§2iι0^ϊ£o
6. tiGttASHft*<λ*Φ'Cfc«flf$®&HS29G*
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8. ϋ8f2&$0&*!S&J&<852 —855 *C T' & S If >R©|βffl H 2 Jjiai{0^^o
10. ϊi&i2Pb£#£rBi$*mK£xA v 9 y y^τSIR±K: ^^■r^ltA)c©tgSll2 i|f3 is© ^^o
11. «ϊiBβfe*IR*»Λa^^-^^^t*XS*!lκ:^ ^ ft ^ ©ϋ HH 2 JItSi{©;fr£c
12. HiIIB^^τ^ζ)^^ B i I^π/XΛ -f hS^feHl ©ia^C#^BiaPbxSr2CabCuc0z ( ^φv a ttl.9 -2.1 . x «0.3 PIT, b ttl.9 -2.2 v c «3 -3.5 ©IBHΛ©ffiτ 2fe^5. z UBi, Pb, Sr1 Ca, CuøfiK J& L> T &£ <S tø^filfc
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PCT/JP1991/001423 1990-10-17 1991-10-17 Method of making superconductive film WO1992006923A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP91917815A EP0510201B1 (en) 1990-10-17 1991-10-17 Method of making superconductive film
DE69110450T DE69110450T2 (en) 1990-10-17 1991-10-17 METHOD FOR PRODUCING A THIN SUPRAL-CONDUCTING LAYER.
US07/860,505 US5306702A (en) 1990-10-17 1991-10-17 Process for producing Bi-Pb-Sr-Ca-Cu-O superconducting films

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2276507A JPH04154656A (en) 1990-10-17 1990-10-17 Production of superconducting film
JP2/276507 1990-10-17

Publications (1)

Publication Number Publication Date
WO1992006923A1 true WO1992006923A1 (en) 1992-04-30

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PCT/JP1991/001423 WO1992006923A1 (en) 1990-10-17 1991-10-17 Method of making superconductive film

Country Status (5)

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US (1) US5306702A (en)
EP (1) EP0510201B1 (en)
JP (1) JPH04154656A (en)
DE (1) DE69110450T2 (en)
WO (1) WO1992006923A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6809042B2 (en) * 2001-11-22 2004-10-26 Dowa Mining Co., Ltd. Oxide superconductor thick film and method for manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0226879A (en) * 1988-07-13 1990-01-29 Toray Ind Inc Superconducting material
JPH02170311A (en) * 1988-12-23 1990-07-02 Hitachi Ltd Manufacture of oxide superconductor thin film

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01282105A (en) * 1988-05-09 1989-11-14 Fujitsu Ltd Production of superconducting ceramic film
JPH075313B2 (en) * 1988-12-27 1995-01-25 住友セメント株式会社 Method for producing oxide superconducting thin film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0226879A (en) * 1988-07-13 1990-01-29 Toray Ind Inc Superconducting material
JPH02170311A (en) * 1988-12-23 1990-07-02 Hitachi Ltd Manufacture of oxide superconductor thin film

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0510201A4 *

Also Published As

Publication number Publication date
EP0510201A1 (en) 1992-10-28
DE69110450D1 (en) 1995-07-20
EP0510201B1 (en) 1995-06-14
JPH04154656A (en) 1992-05-27
DE69110450T2 (en) 1995-10-12
US5306702A (en) 1994-04-26
EP0510201A4 (en) 1993-12-08

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