WO1986005214A1 - Disque memoire a couche mince et procede - Google Patents
Disque memoire a couche mince et procede Download PDFInfo
- Publication number
- WO1986005214A1 WO1986005214A1 PCT/US1986/000414 US8600414W WO8605214A1 WO 1986005214 A1 WO1986005214 A1 WO 1986005214A1 US 8600414 W US8600414 W US 8600414W WO 8605214 A1 WO8605214 A1 WO 8605214A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- target
- sputtering
- deposition
- baffle
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000010409 thin film Substances 0.000 title claims abstract description 28
- 238000003860 storage Methods 0.000 title description 9
- 239000000758 substrate Substances 0.000 claims abstract description 177
- 238000000151 deposition Methods 0.000 claims abstract description 97
- 230000008021 deposition Effects 0.000 claims abstract description 97
- 238000004544 sputter deposition Methods 0.000 claims abstract description 89
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000010408 film Substances 0.000 claims abstract description 31
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 30
- 239000011651 chromium Substances 0.000 claims abstract description 30
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 19
- 239000010941 cobalt Substances 0.000 claims abstract description 19
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 16
- 239000013078 crystal Substances 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 23
- 239000000956 alloy Substances 0.000 claims description 18
- 229910045601 alloy Inorganic materials 0.000 claims description 16
- 238000011144 upstream manufacturing Methods 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 238000010276 construction Methods 0.000 claims description 3
- 238000005477 sputtering target Methods 0.000 claims description 3
- 239000002178 crystalline material Substances 0.000 claims 5
- 238000005259 measurement Methods 0.000 description 10
- 238000003466 welding Methods 0.000 description 8
- 238000012360 testing method Methods 0.000 description 6
- 230000004907 flux Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001447 compensatory effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Procédé de fabrication d'un disque magnétique à couche mince (en commençant par les substrats 28 et 30 à la fig. 1) possédant une coercitivité et une rémanence magnétique élevées, une bonne rectangularité de boucles et de faibles fluctuations de l'amplitude crête-à-crête du signal d'enregistrement sur un trajet circulaire complet d'enregistrement. Les aspects novateurs du procédé contribuant aux caractéristiques performantes du disque consistent à: (a) déposer une couche magnétique de 300 à 1000 Ao contenant environ entre 70 et 88% de cobalt, 10 et 28% de nickel, et 2 et 12% de chrome sur une sous-couche de chrome de 1000 à 4000 Ao; (b) former la couche et la sous-couche dans des conditions de dépôt par pulvérisation empêchant la pulvérisation asymétrique sous un angle faible; et (c) protéger le substrat du disque pendant la pulvérisation d'une manière permettant d'obtenir un dépôt d'épaisseur sensiblement uniforme.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61501389A JPH0668147B2 (ja) | 1985-02-28 | 1986-02-26 | 薄膜記憶ディスクおよび方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US706,737 | 1985-02-28 | ||
US06/706,737 US4604179A (en) | 1985-02-28 | 1985-02-28 | Sputtering-system baffle |
US06/814,229 US4816127A (en) | 1984-11-15 | 1985-12-27 | Method of producing thin-film storage disk |
US814,229 | 1985-12-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1986005214A1 true WO1986005214A1 (fr) | 1986-09-12 |
Family
ID=27107747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1986/000414 WO1986005214A1 (fr) | 1985-02-28 | 1986-02-26 | Disque memoire a couche mince et procede |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0213191A4 (fr) |
JP (1) | JPH0668147B2 (fr) |
CA (1) | CA1261465A (fr) |
WO (1) | WO1986005214A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0222459A2 (fr) * | 1985-11-15 | 1987-05-20 | Komag, Inc. | Système et méthode manipulateurs robotiques de disques |
EP0298840A2 (fr) * | 1987-07-09 | 1989-01-11 | Fujitsu Limited | Support d'enregistrement magnétique et sa méthode de fabrication |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1201957A (en) * | 1966-12-23 | 1970-08-12 | Commissariat Energie Atomique | Thin film having a high coercivity |
US3904503A (en) * | 1974-05-31 | 1975-09-09 | Western Electric Co | Depositing material on a substrate using a shield |
JPS57109127A (en) * | 1980-12-05 | 1982-07-07 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
US4381453A (en) * | 1980-12-31 | 1983-04-26 | International Business Machines Corporation | System and method for deflecting and focusing a broad ion beam |
US4392931A (en) * | 1981-03-30 | 1983-07-12 | Northern Telecom Limited | Reactive deposition method and apparatus |
US4416759A (en) * | 1981-11-27 | 1983-11-22 | Varian Associates, Inc. | Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers |
CA1163602A (fr) * | 1981-07-27 | 1984-03-13 | Joseph S. Logan | Dispositif quadripolaire de pulverisation cathodique radiofrequence avec blindage anodique-cathodique et blindage de cible flottant |
US4552820A (en) * | 1984-04-25 | 1985-11-12 | Lin Data Corporation | Disc media |
-
1986
- 1986-02-26 WO PCT/US1986/000414 patent/WO1986005214A1/fr not_active Application Discontinuation
- 1986-02-26 EP EP19860901705 patent/EP0213191A4/fr not_active Withdrawn
- 1986-02-26 JP JP61501389A patent/JPH0668147B2/ja not_active Expired - Lifetime
- 1986-02-28 CA CA000503053A patent/CA1261465A/fr not_active Expired
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1201957A (en) * | 1966-12-23 | 1970-08-12 | Commissariat Energie Atomique | Thin film having a high coercivity |
US3904503A (en) * | 1974-05-31 | 1975-09-09 | Western Electric Co | Depositing material on a substrate using a shield |
JPS57109127A (en) * | 1980-12-05 | 1982-07-07 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
US4381453A (en) * | 1980-12-31 | 1983-04-26 | International Business Machines Corporation | System and method for deflecting and focusing a broad ion beam |
US4392931A (en) * | 1981-03-30 | 1983-07-12 | Northern Telecom Limited | Reactive deposition method and apparatus |
CA1163602A (fr) * | 1981-07-27 | 1984-03-13 | Joseph S. Logan | Dispositif quadripolaire de pulverisation cathodique radiofrequence avec blindage anodique-cathodique et blindage de cible flottant |
US4416759A (en) * | 1981-11-27 | 1983-11-22 | Varian Associates, Inc. | Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers |
US4552820A (en) * | 1984-04-25 | 1985-11-12 | Lin Data Corporation | Disc media |
Non-Patent Citations (3)
Title |
---|
I.E.E.E. issued 1985, T. YAMADA et al, CoNiCr/Cr Sputtered Thin Film Disks, see page CH 2180 8/85/000-DB-2 * |
IBM Techn. Disc. Bull, Vol. 21, No. 10, issued March 1979, K.Y. AHN et al., Hard Magnetic Films for Magnetic Recording, See page 4232 * |
IEEE, issued 1984, EDWARD M. SIMPSON et al. Underlayer Induced Modulation in Double Layer Perpendicular Media, see page CH1918-2/84/0000-BP-28 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0222459A2 (fr) * | 1985-11-15 | 1987-05-20 | Komag, Inc. | Système et méthode manipulateurs robotiques de disques |
EP0222459A3 (fr) * | 1985-11-15 | 1989-08-23 | Komag, Inc. | Système et méthode manipulateurs robotiques de disques |
EP0298840A2 (fr) * | 1987-07-09 | 1989-01-11 | Fujitsu Limited | Support d'enregistrement magnétique et sa méthode de fabrication |
EP0298840A3 (en) * | 1987-07-09 | 1989-10-11 | Fujitsu Limited | Magnetic recording medium and manufacturing method thereof |
US5047297A (en) * | 1987-07-09 | 1991-09-10 | Fujitsu Limited | Magnetic recording medium and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
EP0213191A1 (fr) | 1987-03-11 |
JPS62501978A (ja) | 1987-08-06 |
CA1261465A (fr) | 1989-09-26 |
JPH0668147B2 (ja) | 1994-08-31 |
EP0213191A4 (fr) | 1988-04-27 |
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