UST883005I4 - Method for producing dimensionally stable - Google Patents

Method for producing dimensionally stable Download PDF

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Publication number
UST883005I4
UST883005I4 US883005DH UST883005I4 US T883005 I4 UST883005 I4 US T883005I4 US 883005D H US883005D H US 883005DH US T883005 I4 UST883005 I4 US T883005I4
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US
United States
Prior art keywords
resist
areas
thin film
substrate
photosensitive
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Publication of UST883005I4 publication Critical patent/UST883005I4/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/138—Corona discharge process

Definitions

  • PUBLISHED FEBRUARY 2, 1971 CHARGED PARTlCLES annular Will l l l A method for depositing thin film electrical elements of closely controlled dimensions onto a substrate wherein a coating of a photosensitive resinous resist (KTFR) is applied to the surface of the substrate; selected areas of the resist are exposed to light; the unexposed areas of the resist are removed by developing; remaining resist pattern is subjected to a bombardment of electrically charged particles from a glow discharge initiated by an impressed potential of from 800 to 2,000 volts to stabilize the dimensions of the photosensitive resist pattern; and thin film elements are deposited at elevated temperatures to areas from which the resist has been removed,
  • KTFR photosensitive resinous resist

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A METHOD FOR DEPOSITING THIN FILM ELECTRICAL ELEMENTS OF CLOSELY CONTROLLED DIMENSIONS ONTO A SUBSTRATE WHEREIN A COATING OF A PHOTOSENSITIVE RESINOUS RESIST (KTFR) IS APPLIED TO THE SURFACE OF THE SUBSTRATE; SELECTED AREAS OF THE RESIST ARE EXPOSED TO LIGHT; THE UNEXPOSED AREAS OF THE RESIST ARE REMOVED BY DEVELOPING; REMAINING RESIST PATTERN IS SUBJECTED TO A BOMBARDMENT OF ELECTRICALLY CHARGED PARTICLES FROM A GLOW DISCHARGE INITIATED BY AN IMPRESSED POTENTIAL OF FROM 800 TO 2,000 VOLTS TO STABILIZE THE DIMENSIONS OF THE PHOTOSENSITIVE RESIST PATTERN; AND THIN FILM ELEMENTS ARE DEPOSITED AT ELEVATED TEMPERATURES TO AREAS FROM WHICH THE RESIST HAS BEEN REMOVED.

Description

DEFENSIVE PUBLICATION UNITED STATES PATENT OFFICE Published at the request of the applicant or owner in accordance with the Notice of Dec. 16, 1969, 869 0.G. 687. The abstracts of Defensive Publication applications are identified by distinctly numbered series and are arranged chronologically. The heading of each abstract indicates the number of pages of specification. including claims and sheets of drawings contained in the application as originally filed. The files of these applications are available to the public for inspection and reproduction may be purchased for 30 cents a sheet.
Defensive Publication applications have not been examined as to the merits of alleged invention. The Patent Office makes no assertion as to the novelty of the disclosed subject matter.
PUBLISHED FEBRUARY 2, 1971 CHARGED PARTlCLES annular Will l l l A method for depositing thin film electrical elements of closely controlled dimensions onto a substrate wherein a coating of a photosensitive resinous resist (KTFR) is applied to the surface of the substrate; selected areas of the resist are exposed to light; the unexposed areas of the resist are removed by developing; remaining resist pattern is subjected to a bombardment of electrically charged particles from a glow discharge initiated by an impressed potential of from 800 to 2,000 volts to stabilize the dimensions of the photosensitive resist pattern; and thin film elements are deposited at elevated temperatures to areas from which the resist has been removed,
Feb. 2,, 1971 METHOD FOR PRODUCING DIMENSIONALLY STABLE Q M. J. SCHULLER ETAL T883,005
PHOTOSENSITIVE RESIST PATTERN Original Filed Feb. 4, 1966 CHARGED PARTICLES Manama/Hm i I l I ATTORNEYS
US883005D 1966-02-04 1969-11-06 Method for producing dimensionally stable Pending UST883005I4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52501866A 1966-02-04 1966-02-04
US87154069A 1969-11-06 1969-11-06

Publications (1)

Publication Number Publication Date
UST883005I4 true UST883005I4 (en) 1971-02-02

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ID=27061664

Family Applications (1)

Application Number Title Priority Date Filing Date
US883005D Pending UST883005I4 (en) 1966-02-04 1969-11-06 Method for producing dimensionally stable

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US (1) UST883005I4 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2481473A1 (en) * 1980-04-29 1981-10-30 Dainippon Printing Co Ltd Planographic printing plate - with untreated organo-polysiloxane non-image areas and ink receptive low temp. plasma treated image areas
EP0094247A1 (en) * 1982-05-10 1983-11-16 British Telecommunications A method of hardening resist material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2481473A1 (en) * 1980-04-29 1981-10-30 Dainippon Printing Co Ltd Planographic printing plate - with untreated organo-polysiloxane non-image areas and ink receptive low temp. plasma treated image areas
EP0094247A1 (en) * 1982-05-10 1983-11-16 British Telecommunications A method of hardening resist material

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