UST102104I4 - Scanning optical system adapted for linewidth measurement in semiconductor devices - Google Patents

Scanning optical system adapted for linewidth measurement in semiconductor devices Download PDF

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Publication number
UST102104I4
UST102104I4 US06/173,535 US17353580A UST102104I4 US T102104 I4 UST102104 I4 US T102104I4 US 17353580 A US17353580 A US 17353580A US T102104 I4 UST102104 I4 US T102104I4
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US
United States
Prior art keywords
spot
optical system
lens
aperture
features
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
US06/173,535
Inventor
Joseph P. Kirk
Josef Predatsch
Lo-Soun Su
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Individual
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Priority to US06/173,535 priority Critical patent/UST102104I4/en
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Publication of UST102104I4 publication Critical patent/UST102104I4/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

The present invention is directed to an optical system particularly adapted for measuring the linewidth of conductors. The particular arrangement of the various components of the optical system provide a simple system with high resolution for use in measuring very small linewidths. The optical system of the present invention utilizes a DC signal which is simpler and easier to control than an AC signal used with some optical measurement systems. More particularly, the optical system of the present invention utilizes a principle used for accurate focusing or for topographical measurements to enhance the ability of the optical system to measure small linewidths.
The optical system of the claimed invention includes a high intensity light source 18, such as a laser. Means are provided for defining and focusing a spot of the light source upon a surface 12 having features to be measured. The spot defining and focusing means include in sequence between the light source and the surface, a first lens 24, an aperture 26 and a second lens 32. The arrangement of the first and second lenses and the aperture is such that the light source is focused at the aperture by the first lens to provide a spot and the spot is focused on the surface 12 by the second lens. With this arrangement, the surface is located at the focal point of the second lens so that reflected light is refocused back in the plane of the aperture. The system further includes scanning means for selectively moving the spot across the surface to encounter the features to be measured. Light collection means 60, 62 are positioned proximate to the surface for detecting varying levels of light reflected from the surface as the spot is scanned over the edges of the features of interest. An electrical DC output is produced in response to the scanning. Means are provided for analyzing the output of the light sensitive means for providing high accuracy measurements of the distance between the detected edges of the features scanned by the spot.
US06/173,535 1978-12-29 1980-07-30 Scanning optical system adapted for linewidth measurement in semiconductor devices Pending UST102104I4 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/173,535 UST102104I4 (en) 1978-12-29 1980-07-30 Scanning optical system adapted for linewidth measurement in semiconductor devices

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97463978A 1978-12-29 1978-12-29
US06/173,535 UST102104I4 (en) 1978-12-29 1980-07-30 Scanning optical system adapted for linewidth measurement in semiconductor devices

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US97463978A Continuation 1978-12-29 1978-12-29

Publications (1)

Publication Number Publication Date
UST102104I4 true UST102104I4 (en) 1982-08-03

Family

ID=25522294

Family Applications (1)

Application Number Title Priority Date Filing Date
US06/173,535 Pending UST102104I4 (en) 1978-12-29 1980-07-30 Scanning optical system adapted for linewidth measurement in semiconductor devices

Country Status (4)

Country Link
US (1) UST102104I4 (en)
EP (1) EP0013325B1 (en)
JP (1) JPS5587904A (en)
DE (1) DE2962243D1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4689491A (en) 1985-04-19 1987-08-25 Datasonics Corp. Semiconductor wafer scanning system
US4748335A (en) 1985-04-19 1988-05-31 Siscan Systems, Inc. Method and aparatus for determining surface profiles
US7450245B2 (en) 2005-06-29 2008-11-11 Dcg Systems, Inc. Method and apparatus for measuring high-bandwidth electrical signals using modulation in an optical probing system
US7659981B2 (en) 2005-08-26 2010-02-09 Dcg Systems, Inc. Apparatus and method for probing integrated circuits using polarization difference probing
US20100039131A1 (en) * 2005-08-26 2010-02-18 Dcg Systems, Inc. System and method for modulation mapping
US20100277159A1 (en) * 2009-05-01 2010-11-04 Ng Yin Shyang Systems and method for laser voltage imaging state mapping

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070141B1 (en) * 1981-07-07 1989-05-31 Renishaw plc Device for measuring dimensions
JPS60224001A (en) * 1984-04-20 1985-11-08 Citizen Watch Co Ltd Microsize measuring instrument
US4707610A (en) * 1985-07-03 1987-11-17 Siscan Systems, Inc. Method and apparatus for measuring surface profiles
DE3903560A1 (en) * 1988-02-09 1989-08-17 Zeiss Carl Fa Microscope having a device for surveying microscopic structures
EP0407625B1 (en) * 1989-07-08 1993-01-13 International Business Machines Corporation Method and apparatus for determining line centers in a microminiature element
JPH10227617A (en) * 1997-02-12 1998-08-25 Nikon Corp Micro line width measuring method and micro line width measuring device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3858983A (en) * 1973-11-13 1975-01-07 Autech Corp Shaped product measurement
GB1474191A (en) * 1974-01-21 1977-05-18 Nat Res Dev Measurement of surface roughness
US4200396A (en) * 1977-12-19 1980-04-29 Rca Corporation Optically testing the lateral dimensions of a pattern

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4748335A (en) 1985-04-19 1988-05-31 Siscan Systems, Inc. Method and aparatus for determining surface profiles
US4689491A (en) 1985-04-19 1987-08-25 Datasonics Corp. Semiconductor wafer scanning system
US7450245B2 (en) 2005-06-29 2008-11-11 Dcg Systems, Inc. Method and apparatus for measuring high-bandwidth electrical signals using modulation in an optical probing system
US9239357B2 (en) 2005-08-26 2016-01-19 Dcg Systems, Inc. System and method for modulation mapping
US7659981B2 (en) 2005-08-26 2010-02-09 Dcg Systems, Inc. Apparatus and method for probing integrated circuits using polarization difference probing
US20100039131A1 (en) * 2005-08-26 2010-02-18 Dcg Systems, Inc. System and method for modulation mapping
US7733100B2 (en) 2005-08-26 2010-06-08 Dcg Systems, Inc. System and method for modulation mapping
US7990167B2 (en) 2005-08-26 2011-08-02 Dcg Systems, Inc. System and method for modulation mapping
US8686748B2 (en) 2005-08-26 2014-04-01 Dcg Systems, Inc. System and method for modulation mapping
US9915700B2 (en) 2005-08-26 2018-03-13 Fei Efa, Inc. System and method for modulation mapping
US20100277159A1 (en) * 2009-05-01 2010-11-04 Ng Yin Shyang Systems and method for laser voltage imaging state mapping
US9244121B2 (en) 2009-05-01 2016-01-26 Dcg Systems, Inc. Systems and method for laser voltage imaging state mapping
US8754633B2 (en) 2009-05-01 2014-06-17 Dcg Systems, Inc. Systems and method for laser voltage imaging state mapping

Also Published As

Publication number Publication date
EP0013325B1 (en) 1982-03-03
EP0013325A3 (en) 1980-08-06
DE2962243D1 (en) 1982-04-01
EP0013325A2 (en) 1980-07-23
JPS5587904A (en) 1980-07-03

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