USRE30668E - Process for preparing materials having improved mechanical and thermal properties and materials obtained thereby - Google Patents
Process for preparing materials having improved mechanical and thermal properties and materials obtained thereby Download PDFInfo
- Publication number
- USRE30668E USRE30668E US06/019,574 US1957479A USRE30668E US RE30668 E USRE30668 E US RE30668E US 1957479 A US1957479 A US 1957479A US RE30668 E USRE30668 E US RE30668E
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- silicon compound
- aluminum oxide
- alumina
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- treatment
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- 239000000463 material Substances 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 56
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 29
- 238000011282 treatment Methods 0.000 claims abstract description 29
- 239000003054 catalyst Substances 0.000 claims abstract description 24
- 238000009835 boiling Methods 0.000 claims abstract description 14
- -1 γ alumina Chemical compound 0.000 claims abstract description 11
- 230000003647 oxidation Effects 0.000 claims abstract description 7
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract 16
- 239000003960 organic solvent Substances 0.000 claims abstract 3
- 238000000034 method Methods 0.000 claims description 31
- 230000008569 process Effects 0.000 claims description 23
- 239000012071 phase Substances 0.000 claims description 13
- 238000001035 drying Methods 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 5
- 230000009466 transformation Effects 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 238000005470 impregnation Methods 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 3
- 229910003828 SiH3 Inorganic materials 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000001228 spectrum Methods 0.000 claims description 2
- 238000001179 sorption measurement Methods 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 229910018404 Al2 O3 Inorganic materials 0.000 description 11
- 239000000377 silicon dioxide Substances 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 229910052681 coesite Inorganic materials 0.000 description 8
- 229910052906 cristobalite Inorganic materials 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 229910052682 stishovite Inorganic materials 0.000 description 8
- 229910052905 tridymite Inorganic materials 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 7
- 239000000969 carrier Substances 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 238000007669 thermal treatment Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- 239000008119 colloidal silica Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000001354 calcination Methods 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910003910 SiCl4 Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000001473 noxious effect Effects 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 3
- 238000000844 transformation Methods 0.000 description 3
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 2
- 239000005695 Ammonium acetate Substances 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229940043376 ammonium acetate Drugs 0.000 description 2
- 235000019257 ammonium acetate Nutrition 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000003349 gelling agent Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000009738 saturating Methods 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- DPEYHNFHDIXMNV-UHFFFAOYSA-N (9-amino-3-bicyclo[3.3.1]nonanyl)-(4-benzyl-5-methyl-1,4-diazepan-1-yl)methanone dihydrochloride Chemical compound Cl.Cl.CC1CCN(CCN1Cc1ccccc1)C(=O)C1CC2CCCC(C1)C2N DPEYHNFHDIXMNV-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 229920003091 Methocel™ Polymers 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- MCRWZBYTLVCCJJ-DKALBXGISA-N [(1s,3r)-3-[[(3s,4s)-3-methoxyoxan-4-yl]amino]-1-propan-2-ylcyclopentyl]-[(1s,4s)-5-[6-(trifluoromethyl)pyrimidin-4-yl]-2,5-diazabicyclo[2.2.1]heptan-2-yl]methanone Chemical compound C([C@]1(N(C[C@]2([H])C1)C(=O)[C@@]1(C[C@@H](CC1)N[C@@H]1[C@@H](COCC1)OC)C(C)C)[H])N2C1=CC(C(F)(F)F)=NC=N1 MCRWZBYTLVCCJJ-DKALBXGISA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- XFBXDGLHUSUNMG-UHFFFAOYSA-N alumane;hydrate Chemical class O.[AlH3] XFBXDGLHUSUNMG-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Inorganic materials [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004351 phenylcyclohexyl group Chemical group C1(=CC=CC=C1)C1(CCCCC1)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000007425 progressive decline Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/12—Oxidising
- B01J37/14—Oxidising with gases containing free oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/12—Silica and alumina
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/03—Precipitation; Co-precipitation
- B01J37/031—Precipitation
- B01J37/033—Using Hydrolysis
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
- C01P2006/13—Surface area thermal stability thereof at high temperatures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S502/00—Catalyst, solid sorbent, or support therefor: product or process of making
- Y10S502/50—Stabilized
Definitions
- the present invention relates to a process for obtaining materials of high thermal and mechanical stability which are constituted by oxides of aluminium and more particularly, materials used as catalysts or as catalyst carriers for chemical reactions in the heterogeneous phase and also to the materials obtained thereby.
- the purpose of the present invention is to provide a method for improving the mechanical properties of materials constituted by oxides of alumina (e.g. ⁇ -alumina, ⁇ -alumina, ⁇ -alumina, ⁇ -alumina; ⁇ -alumina being preferred) through a simple and economical treatment.
- alumina e.g. ⁇ -alumina, ⁇ -alumina, ⁇ -alumina, ⁇ -alumina; ⁇ -alumina being preferred
- modified aluminas having a high thermal and mechanical stability.
- a third object of the present invention consists of the production of materials useful as catalysts or as catalyst carriers for reactions in the heterogeneous phase.
- alumina granules having high mechanical and thermal properties useful as catalyst carriers to be used in the catalytic mufflers of automobiles for the removal of noxious components in the waste gases are provided.
- the above and other purposes are achieved by the present invention through a simple and economical process consisting in treating the material formed from oxides of aluminum whose mechanical characteristics are to be improved, with a silicon compound and in subjecting the so obtained product to a drying and to a controlled oxidation.
- the process of our invention may be carried out in the liquid phase, at atmospheric or higher pressure.
- the process carried out in the liquid phase and atmospheric pressure consists of an impregnation, at room temperature, of the solid material with the silicon compound as such or in solution with other organic compounds having a boiling point preferably lower than that of the silicon compound and chemically compatible therewith (hydrocarbons, alcohols, etc.), and a heating of the so obtained composition to a temperature ranging from 50° to 500° C.
- organic compounds having a boiling point preferably lower than that of the silicon compound and chemically compatible therewith (hydrocarbons, alcohols, etc.
- a heating of the so obtained composition to a temperature ranging from 50° to 500° C.
- a diluent when stated amounts, more or less low, of the silicon compound are to be deposited on the material which is to be modified.
- the process in the vapour phase and at atmospheric pressure is carried out by introducing the chosen silicon compound in a gas stream and feeding such a mixture onto the solid material at temperatures ranging from the boiling temperature of the silicon compound to 500° C., preferably between 100° and 400° C.
- a preferred process, when large amounts of the silicon compounds are to be deposited, is the one in the liquid-vapour phase and aboveatmospheric pressure which is carried out in an autoclave at pressures in the range of from room pressure to 50 Kg/cm 2 , and preferably from 10 to 30 kg/cm 2 and at temperatures ranging from the room temperature to 500° C., preferably from 100° to 400° C., over a period of from 1 to 20 hours.
- the material, treated according to the aforeaid three processes, is further subjected to a thermal treatment under an inert gas stream at a temperature of from the boiling temperature of the silicon compound to 500° C. over a period of from 1 to 5 hours, the material being finally treated with air at temperatures ranging from 300° to 600° C. over periods ranging from 2 to 10 hours.
- the thermal treatment under an inert gas atmosphere allows the removal, through carbonization or pyrolisis, of most of the organic material, which remains bond to the carrier, and, therefore, the following treatment with air does not promote local overheating, which would cause noxious modifications of the obtained product.
- the employed air is mixed with an inert gas, .[.as such.]. .Iadd.such as .Iaddend.nitrogen, in order to control the oxidation temperature.
- the treatment with nitrogen may be replaced by a slow air oxidation, highly diluted by an inert gas.
- the obtained materials which are a further subject of the invention, have improved mechanical and thermal characteristics and a production cost not higher than that of the compounds which are not treated with the silicon compounds.
- the silicon compound usefully employable according to the invention have the general formula ##STR1## in which X, Y, Z and W may be (--R), (--OR), (--Cl), (--Br), (--F), (--SiH 3 ), (--COOR), (--SiH n Cl m ), --[OSi(OR) 2 ] p , OSi(OR) 3 ; (--R) being H, an alkyl, cycloalkyl, aromatic, alkyl-aromatic or alkyl-cycloalkyl radical having from 1 to 30 carbon atoms, such as, for instance, CH 3 , --C 2 H 5 , isopropyl, n-propyl, normal-butyl, isobutyl, cyclohexyl, cyclopentyl, phenyl, phenylcyclohexyl, alkylphenyl; n, m and p being whole numbers in the range
- orthosilicic acid esters such as, for instance, methyl, propyl, isopropyl, isobutyl and normal butyl tetrasilicates.
- the materials, which can be treated according to the inventive process may be all oxides of aluminium, e.g. ⁇ -alumina ⁇ -alumina, ⁇ -alumina ⁇ -alumina, among which ⁇ -alumina is preferred.
- the products obtained by the inventive process have mechanical and thermal characteristics very superior to the ones of the starting products and, upom chemical and physical-chemical analyses show surface structures and compositions substantially different from the starting ones.
- ⁇ -alumina stabilized according to the invention after a treatment at 1000° C. over a period of 24 hours -, shows a volume shrinkage lower than 2%.
- a spheroidal ⁇ --Al 2 O 3 (a) was prepared according to the process described in USP 3,416,888 owned by assignee of this application.
- the determination of the resistance against abrasion was carried out by employing a steel container, having 18 cc volume, which was 80% filled with the material to be examined.
- the sample to be examined was kept in a stove to 150° C. for 2 hours, was cooled to room temperature under an anhydrous atmosphere and then was weighed with great care.
- the recovered sample was sieved through a sieve which removed the granular fractions, was blown by air to remove the powder adhering the to little .[.shperes.]. .Iadd.spheres.Iaddend., again dried at 150° C. for 20 hours and then weighed.
- the friction resistance (K) was expressed as weight percentage loss of the sample.
- a spheroidal ⁇ -Al 2 O 3 was prepared containing 3% SiO 2 (b).
- the product was obtained by adding colloidal silica Ludox AS (Du Pont) to a mixture of ammonium-acetate, aluminum chlorohydroxide and gelling agent.
- the alumina spheroids were dried for 24 hours at 120° C., then air calcined up to 500° C. (e).
- the characteristics of these aluminas are illustrated in table 2.
- a sample of this alumina was immersed in an excess of (C 2 H 5 O) 4 Si; according to the same process as example 3, a ⁇ Al 2 O 3 was obtained containing 6.3% of SiO 2 (f). This sample too was subjected to the sinterization tests and the obtained results are reported in table 2.
- the alumina as example 5 was treated with CH 3 Si (OC 2 H 5 ) 3 in the vapour phase at room pressure in the following way; 100 g of alumina were put in a quartz pipe immersed in a heating oven; the pipe was bottom connected to a two necked flask, containing 30 cc of methyltriethoxylane, and immersed in a thermostatic bath. Alumina was heated at 400° C. under a nitrogen stream; this temperature having been achieved in the alumina bed, the thermostatic bath was brought up to 120° C. and N 2 was sent to the flask containing CH 3 Si (OC 2 H 5 ) 3 until total vaporization of the silicon compound occurred.
- a sample of the same alumina as example 5 was treated with SiCl 4 in the vapour phase according to the following way: 100 g of Al 2 O 3 were put into a quartz pipe immersed in an electric oven; a nitrogen stream was sent and the sample was heated up to 400° C.; then the pipe was connected to a saturating vessel containing SiCl 4 kept at room temperature, through which an anhydrous nitrogen stream flowed, which was then sent onto the alumina sample.
- a drawing was performed of the same alumina prepared according to the process disclosed in example 5, which was treated with (CH 3 O) 2 SiCl 2 in the following way: 100 g of Al 2 C 3 were put into a quartz pipe immersed in an electric oven; the pipe was connected to a N 2 stream and was heated up to 200° C.; after 2 hours the pipe was connected to a saturation vessel containing (CH 3 O) 2 SiCl 2 , kept at 60° C., and through which an anhydrous N 2 stream was passed.
- the first tablet was treated with ethyl orthosilicate under the same conditions and according to the procedure of example 6, the second one was treated with colloidal silica Ludox S.M. (Du Pont) according to the procedure of example 9.
- FIG. 1 In the first case (FIG. 1) there was obtained an absorption spectrum typical of silica wherein a very clear band was observed at 3745 cm -1 , awarded to an Si--OH group with a disappearance of the bands at 3737 cm -1 and 3795 cm -1 and a strong attenuation of the bands at 3698 cm -1 awarded to an Al--OH band.
- the pressure was brought to 5 Kg/cm 2 by nitrogen.
- the autoclave was heated up to 200° C. over 8 hours; at the end it was cooled, the pressure was released and alumina was recovered, which was heated in a quartz pipe under a nitrogen stream for 4 hours at 200° C., and then air calcined at 500° C. for 4 hours.
- the autoclave temperature was brought to the stated temperature (250° C., 300° C., 350° C.) and the pressure was reguated at a steam pressure .Iadd.of .Iaddend.15 atmospheres by means of a manometer suitably connected to the autoclave, made possible by releasing the excess pressure through a suitable valve.
- the curve 1 refers to the three temperature values, whereas the curve 2 refers to 350° C., the curve 3 to 300° C. and the curve 4 to 250° C.
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Abstract
The mechanical and thermal properties of aluminum oxide, such as γ alumina, adapted for use as a catalyst or catalyst carrier are improved through a treatment thereof with a silicon compound such as an alkyl orthosilicate in which the aluminum oxide is impregnated with the silicon compound or a solution thereof in a compatible organic solvent whose boiling point is lower than the boiling point of the silicon compound. The impregnated aluminum oxide is dried at a temperature in the range from above the boiling point of the silicon compound to 500° C. and is then subjected to controlled oxidation.
Description
The present invention relates to a process for obtaining materials of high thermal and mechanical stability which are constituted by oxides of aluminium and more particularly, materials used as catalysts or as catalyst carriers for chemical reactions in the heterogeneous phase and also to the materials obtained thereby.
It is known that, when chemical processes are based on chemical reactions carried out by means of catalysts in the heterogeneous phase, the catalyst undergoes irreversible transformations which decrease the effectiveness thereof and necessitate the frequent replacement of the catalyst itself. Such a process would be improved by decreasing the rate of such transformations, which increases the efficacious employment period of the catalyst.
Generally the activity of a heterogeneous phase catalyst increases with increases of the catalyst surface in contact with the reagents. For this purpose use is made of catalysts having a high porosity and surface area .Iadd.or .Iaddend.which are carried on materials having such characteristics.
However the increase of the porosity and the surface area of the carriers and/or catalysts is generally obtained at the expense of their physical characteristics and, as a consequence, such catalysts or carriers undergo a quick deterioration over a long employment which causes a progressive reduction of the catalytic effectiveness.
Particularly this problem is remarkably present in the case of reactions carried out in the presence of a catalyst in a so called fluid bed and in the chemical reactions occurring in the catalytic muffler of an automobile wherein the catalyst undergoes a more or less quick decay, also because of the abrasion resulting from the impact of the granules upon one another and against the muffler walls, as a result of the vibrations due to the operation of the automobile.
When these materials are brought to high temperatures, the aforesaid phenomena are further emphasized: the increase of the mechanical strains joined to the thermal ones causes, on the one hand, a higher abrasion and mechanical breakage and, on the other hand, the decrease of the surface area because of sintering. Particularly such a problem occurs when these materials are used as catalyst carriers in automobile mufflers for the removal of the noxious components of the exhaust gases. In face the temperatures that may be reached in the catalytic mufflers of automobiles are very variable and, sometimes on working, they may reach values higher than 1000° C.; in such cases the usual materials used as carriers undergo thermal transformations which remarkably decrease the physical properties thereof and make them become very sensitive to the mechanical strains; moreover the shrinkage of the volume thereof because of the sinterization which affects the effective volume of the container, further overburdens the problems of resistance to compression and abrasion.
Heretofore methods have been proposed for improving the surface characteristics of alumina by means of a treatment with alkali, alkaline-earth metal compounds or with silicic acid or colloidal silica, but the obtained results that have been obtained have not been satisfactory.
The purpose of the present invention is to provide a method for improving the mechanical properties of materials constituted by oxides of alumina (e.g. γ-alumina, ε-alumina, δ-alumina, ⊖-alumina; γ-alumina being preferred) through a simple and economical treatment.
According to a further aspect of the present invention there are provided modified aluminas having a high thermal and mechanical stability.
A third object of the present invention consists of the production of materials useful as catalysts or as catalyst carriers for reactions in the heterogeneous phase.
According to a particular aspect of the present invention there is provided a method for the production of alumina granules having high mechanical and thermal properties useful as catalyst carriers to be used in the catalytic mufflers of automobiles for the removal of noxious components in the waste gases.
The above and other purposes are achieved by the present invention through a simple and economical process consisting in treating the material formed from oxides of aluminum whose mechanical characteristics are to be improved, with a silicon compound and in subjecting the so obtained product to a drying and to a controlled oxidation.
The process of our invention may be carried out in the liquid phase, at atmospheric or higher pressure.
The process carried out in the liquid phase and atmospheric pressure consists of an impregnation, at room temperature, of the solid material with the silicon compound as such or in solution with other organic compounds having a boiling point preferably lower than that of the silicon compound and chemically compatible therewith (hydrocarbons, alcohols, etc.), and a heating of the so obtained composition to a temperature ranging from 50° to 500° C. Particularly use is made of a diluent when stated amounts, more or less low, of the silicon compound are to be deposited on the material which is to be modified. The process in the vapour phase and at atmospheric pressure is carried out by introducing the chosen silicon compound in a gas stream and feeding such a mixture onto the solid material at temperatures ranging from the boiling temperature of the silicon compound to 500° C., preferably between 100° and 400° C.
A preferred process, when large amounts of the silicon compounds are to be deposited, is the one in the liquid-vapour phase and aboveatmospheric pressure which is carried out in an autoclave at pressures in the range of from room pressure to 50 Kg/cm2, and preferably from 10 to 30 kg/cm2 and at temperatures ranging from the room temperature to 500° C., preferably from 100° to 400° C., over a period of from 1 to 20 hours.
The material, treated according to the aforeaid three processes, is further subjected to a thermal treatment under an inert gas stream at a temperature of from the boiling temperature of the silicon compound to 500° C. over a period of from 1 to 5 hours, the material being finally treated with air at temperatures ranging from 300° to 600° C. over periods ranging from 2 to 10 hours.
The thermal treatment under an inert gas atmosphere allows the removal, through carbonization or pyrolisis, of most of the organic material, which remains bond to the carrier, and, therefore, the following treatment with air does not promote local overheating, which would cause noxious modifications of the obtained product. Preferably the employed air is mixed with an inert gas, .[.as such.]. .Iadd.such as .Iaddend.nitrogen, in order to control the oxidation temperature.
Alternatively the treatment with nitrogen may be replaced by a slow air oxidation, highly diluted by an inert gas.
The obtained materials, which are a further subject of the invention, have improved mechanical and thermal characteristics and a production cost not higher than that of the compounds which are not treated with the silicon compounds.
The silicon compound usefully employable according to the invention have the general formula ##STR1## in which X, Y, Z and W may be (--R), (--OR), (--Cl), (--Br), (--F), (--SiH3), (--COOR), (--SiHn Clm), --[OSi(OR)2 ] p, OSi(OR)3 ; (--R) being H, an alkyl, cycloalkyl, aromatic, alkyl-aromatic or alkyl-cycloalkyl radical having from 1 to 30 carbon atoms, such as, for instance, CH3, --C2 H5, isopropyl, n-propyl, normal-butyl, isobutyl, cyclohexyl, cyclopentyl, phenyl, phenylcyclohexyl, alkylphenyl; n, m and p being whole numbers in the range of from 1 to 3.
Among the abovecited compounds we prefer orthosilicic acid esters such as, for instance, methyl, propyl, isopropyl, isobutyl and normal butyl tetrasilicates.
The materials, which can be treated according to the inventive process, may be all oxides of aluminium, e.g. γ-alumina ε-alumina, δ-alumina θ-alumina, among which γ-alumina is preferred.
The products obtained by the inventive process have mechanical and thermal characteristics very superior to the ones of the starting products and, upom chemical and physical-chemical analyses show surface structures and compositions substantially different from the starting ones.
In fact the infrared spectrum undoubtedly changes and the bands, characteristic of the silicon - hydroxyl band, prevail. Particularly in the case of alumina treated by the inventive process, we no longer observe the bands at 3795 and 3737 cm-1 of the different hydroxyls present on the alumina surface, but we observe a band at 3745 cm-1 characteristic of the hydroxyl group bound to silica.
In the following description, reference will be made to processes for the stabilization of γ-alumina which is used as carrier for catalysts of many chemical reactions carried out on industrial scale, and also to the so obtained stabilized aluminas which show, after a heating at 1200° C. over a period of 24 hours, the only change from the phase to phase. Said aluminas, stabilized by a treatment over 40 hours at 250° C. at a steam pressure of 15 atmosphere, keep unchanged their crystalline structure, their exceptional mechanical and thermal characteristics and the superficial area.
Moreover γ-alumina, stabilized according to the invention after a treatment at 1000° C. over a period of 24 hours -, shows a volume shrinkage lower than 2%.
A spheroidal γ--Al2 O3 (a) was prepared according to the process described in USP 3,416,888 owned by assignee of this application.
It consisted in dripping a mixture of ammonium acetate and aluminum chlorohydroxides and a suitable gelling agent into a mineral oil kept at 90° C.
On the column bottom we recovered little gel spheres which, suitably treated with NH3 and washed with H2 O, crystallized into α-monohydrate. The little spheres, dried and then calcined, changed into γ-Al2 O3.
Alumina, obtained as described above, was examined with respect to resistance against abrasion before and after thermal treatment at 1000° and 1100° C. for 24 hours, the volume shrinkage and the surface area variations after an analogous treatment.
The determination of the resistance against abrasion was carried out by employing a steel container, having 18 cc volume, which was 80% filled with the material to be examined.
A high frequency vibration, for over 30 minutes, was given to said container by means of a suitable apparatus.
Before the beginning of the tests the sample to be examined was kept in a stove to 150° C. for 2 hours, was cooled to room temperature under an anhydrous atmosphere and then was weighed with great care. At the end of the abrasion tests, the recovered sample was sieved through a sieve which removed the granular fractions, was blown by air to remove the powder adhering the to little .[.shperes.]. .Iadd.spheres.Iaddend., again dried at 150° C. for 20 hours and then weighed.
The friction resistance (K) was expressed as weight percentage loss of the sample.
The results obtained from the various determinations are reported in table 1.
According to the procedure of example one, a spheroidal γ-Al2 O3 was prepared containing 3% SiO2 (b).
The product was obtained by adding colloidal silica Ludox AS (Du Pont) to a mixture of ammonium-acetate, aluminum chlorohydroxide and gelling agent.
On the sample so obtained were carried out the determinations of surface area, volume shrinkage and abrasion after a thermal treatment at 1000° C. and 1100° C.; the results of these determinations are listed in Table 1.
A sample of the same γ-Al2 O3 used in the example 1 had Ba added thereto in the following way:
100 g of alumina were impregnated with a solution obtained by dissolving 9.8 g. of Ba(NO3)2 into 80 cc. of H2 O.
After drying at 120° C. for 12 hours and an air calcination at 500° C. for 2 hours, a γ-Al2 O3 was obtained containing 5.2% of Ba (c). The determinations carried out on the sample so obtained are reported in Table 1.
By always employing same alumina as example 1, 100 g of Al2 O3 were immersed in 200 cc of (C2 H5 O)4 Si and kept in contact with the liquid for 4 hours; at the end the solid was separated from the excess liquid, and was transferred into a quartz pipe put in an electric oven; a nitrogen stream was sent and the whole was slowly heated up to the boiling temperature of ethylorthosilicate (160°-170° C.) so as to completely distill the unreacted product. The thermal treatment was then prosecuted up to 500° C., when the nitrogen flow was stopped and air was sent; the duration of the final treatment was 2 hours. A product was obtained having a SiO2 content equal to 6.1% (d). The results of the thermal treatments and the other determinations performed on the so obtained sample are reported in table 1. In table 1 there are reported also the results of X-ray examinations carried out on the samples of examples 1, 3 and 4 at 1100° C. and 1200° C.
TABLE 1 __________________________________________________________________________ SA m.sup.2 /g ΔV % K % R X R X Starting after treatment after treatment K % after treatment after treatment after treatment SAMPLE SA m.sup.2 /g 1000° C. 1100° C. 1000° C. 1100° C. starting 1000° C. 1100° C. 1100° C. 1200° __________________________________________________________________________ C. a 196 80 68 9 14 3.2 6.1 9.3 THETA + ALPHA ALPHA b 208 88 65 6 12 1.7 6.9 6.9 n.d. n.d. c 190 100 71 7 12 3.2 6.4 10.5 THETA + DELTA n.d.d 200 140 136 1 4 0.9 2.1 2.3 DELTA DELTA __________________________________________________________________________ wherein SA means the surface area, ΔV is the voiding shrinkage expressed as percent, K is the friction resistance expressed as percent o abraded material.
By comparing the data of Table 1 it is possible to infer that the treatment of a .[.γ---Al2 O3 .]. .Iadd.γδAl2 O3 .Iaddend.with Si(OC2 H5)4 causes a stabilizing effect much higher than that of other known common methods.
A spheroidal γ-alumina sample ws prepared according the rotating place pelletizing technique in the following way: .[.γ---Al2 O3 .]. .Iadd.γδAl2 O3 .Iaddend., reduced into a very fine powder, was put in a rotating plate; while the plate was rotating, as aqueous solution containing 0.1% of hydrated methyl cellulose (Methocel) was nebulized onto the powder itself; spheroidal nuclei formed, the sizes of which could be regulated according to the residence - time in the plate and the alumina powder present therein. When the desired sizes have been obtained, the alumina spheroids were dried for 24 hours at 120° C., then air calcined up to 500° C. (e). The characteristics of these aluminas are illustrated in table 2. A sample of this alumina was immersed in an excess of (C2 H5 O)4 Si; according to the same process as example 3, a γAl2 O3 was obtained containing 6.3% of SiO2 (f). This sample too was subjected to the sinterization tests and the obtained results are reported in table 2.
100 g of the same alumina as example 5 were put in a self-heating autoclave together with 40 g of (C2 H5 O)4 Si. The autoclave was evacuated and repeatedly washed with N2 in order to remove all O2 traces, then it was charged at a 5 kg/cm2 pressure with N2. The autoclave was heated to 200° C. and this temperature was kept for 4 hours, at the end it was cooled, the pressure was released and alumina was recovered, which was subjected to a following thermal treatment of 2 hours at 200° C. under N2, and then to an air calcination at 500° C. for 4 hours.
The γ-Al2 O3 little spheres, treated in such a way, after analysis, showed a SiO2 content equal to 10.2% (g).
The results of the sinterization tests are listed in table 2.
The alumina as example 5 was treated with CH3 Si (OC2 H5)3 in the vapour phase at room pressure in the following way; 100 g of alumina were put in a quartz pipe immersed in a heating oven; the pipe was bottom connected to a two necked flask, containing 30 cc of methyltriethoxylane, and immersed in a thermostatic bath. Alumina was heated at 400° C. under a nitrogen stream; this temperature having been achieved in the alumina bed, the thermostatic bath was brought up to 120° C. and N2 was sent to the flask containing CH3 Si (OC2 H5)3 until total vaporization of the silicon compound occurred.
The treatment at 400° C. was prosecuted with air for 4 hours, then the whole was cooled.
The SiO2 content of the so treated alumina was equal to 8.5% (h). The sinterization tests gave the results listed in table 2.
100 g of the same alumina as example 5 were impregnated with an aqueous solution of orthosilicic acid obtained in the following way:
25 cc of sodium silicate (40 Be) were kept in 70 cc of H2 O; the solution was contacted with an ion exchange resin (Amberlite IRC-50 H+) in order to completely remove Na+ ions.
After the cationic exchange, the solution was utilized for impregnating alumina. After drying at 120° C. and air calcination at 500° C. for 4 hours, an alumina was obtained having a SiO2 content equal to 6.5% (i).
The results of the sinterization tests, the sample was subjected to, are listed in table 2.
Another sample of the same alumina as example 5 was impregnated with colloidal silica Ludox SM (Du Pont) in the following way:
7 g of colloidal silica at 30% were diluted in 80 cc of H2 O; 100 g of alumina were impregnated with the resulting solution. After drying at 120° C. for 12 hours and calcination at 500° C. in air for 4 hours, an alumina was obtained containing 1.6% of SiO2 (l).
The results of the tests carried out on this sample are listed in table 2.
A sample of the same alumina as example 5 was treated with SiCl4 in the vapour phase according to the following way: 100 g of Al2 O3 were put into a quartz pipe immersed in an electric oven; a nitrogen stream was sent and the sample was heated up to 400° C.; then the pipe was connected to a saturating vessel containing SiCl4 kept at room temperature, through which an anhydrous nitrogen stream flowed, which was then sent onto the alumina sample.
After 4 hours of treatment, the nitrogen flow through the saturating vessel containing SiCl4 was stopped, and air was sent.
After 1 hour of air treatment it was cooled and alumina was recovered which, at analysis, showed a SiO2 content equal to 7.3 (m).
The so obtained sample, subjected to sinterization tests, gave the results reported in table 2.
TABLE 2 __________________________________________________________________________ SA m.sup.2 /g ΔV % K % SA m.sup.2 /g after treatment after treatment K % after treatment SAMPLE starting 1000° C. 1100° C. 1000° C. 1100° C. starting 1000° C. 1100° C. __________________________________________________________________________ e 269 124 50 13 26 23.2 37.2 42.5 f 272 220 180 1 7 3.8 6.3 6.4 g 290 238 203 1 8 0.9 0.5 1.4h 300 211 200 2 6 1.8 1.7 2.8 i 300 111 95 8 14 8.4 9.0 19.7 l 295 105 69 11 20 6.5 23.2 39.9 m 305 209 158 4 10 3.0 5.3 15.3 n 275 198 170 2 9 1.5 2.3 2.8 __________________________________________________________________________
A drawing was performed of the same alumina prepared according to the process disclosed in example 5, which was treated with (CH3 O)2 SiCl2 in the following way: 100 g of Al2 C3 were put into a quartz pipe immersed in an electric oven; the pipe was connected to a N2 stream and was heated up to 200° C.; after 2 hours the pipe was connected to a saturation vessel containing (CH3 O)2 SiCl2, kept at 60° C., and through which an anhydrous N2 stream was passed.
After 4 hours of this treatment, the vapour stream was stopped and air was sent; the temperature was raised to 500° C. and the air treatment was prosecuted for 4 hours; at the end it was cooled and the material (n) was recovered, which was subjected to various tests in order to evaluate the thermal stability and mechanical characteristics thereof; the results of the performed tests are reported in table 2.
By using γ-Al2 O3 of example 1, two tablets were prepared suitable to be examined at I.R.
The first tablet was treated with ethyl orthosilicate under the same conditions and according to the procedure of example 6, the second one was treated with colloidal silica Ludox S.M. (Du Pont) according to the procedure of example 9. The so prepared two samples, after dehydration under vacuum at 450° C., were examined at I.R. and the spectrum is reported in the FIGS. 1 and 2, wherein the abscissae refer to the frequency of the infrared radiation expressed in cm1 and the ordinates refer to the percentage transmission.
In the first case (FIG. 1) there was obtained an absorption spectrum typical of silica wherein a very clear band was observed at 3745 cm-1, awarded to an Si--OH group with a disappearance of the bands at 3737 cm-1 and 3795 cm-1 and a strong attenuation of the bands at 3698 cm-1 awarded to an Al--OH band.
In the second case (FIG. 2) there was obtained an overlapping absorption spectrum, typical of a mixture of silica and alumina, this latter being the prevailing one.
100 g of the same alumina as example 5 were put in a self-heating autoclave. The autoclave was evacuated and repeatedly washed with nitrogen in order to remove all oxygen traces: then, from time to time, the following amounts of silicon compounds were introduced:
______________________________________ Example ______________________________________ 13g 30 of diethylchlorosilane (C.sub.2 H.sub.5).sub.2 SiCl.sub.2 14 g 17 of tetramethylsilane (CH.sub.3).sub.4 Si 15 g 17 of acetoxisilane H.sub.3 Si(OOCCH.sub.3) 16 g 18 of methoxidisilane CH.sub.3 OSiH.sub.2 (SiH.sub.3) 17 g 22 of triethylsilane (C.sub.2 H.sub.3).sub.3 SiH 18 g 45 of polymethylsiloxane (CH.sub.3).sub.3 SiO(CH.sub.3).sub.2 SiOSi(CH.sub.3) .sub.3 ______________________________________
The pressure was brought to 5 Kg/cm2 by nitrogen.
The autoclave was heated up to 200° C. over 8 hours; at the end it was cooled, the pressure was released and alumina was recovered, which was heated in a quartz pipe under a nitrogen stream for 4 hours at 200° C., and then air calcined at 500° C. for 4 hours.
the characteristics of these modified aluminas are emphasized in table 4, where are collected the results of the measurements carried out after the thermal ageing treatment at 1100° C. for 24 hours.
For the sake of comparison, we report also the sample as such prepared according to example 1 (a).
100 g of the same alumina used in example 1 were immersed into 200 cc of (C2 H5 O)4 Si and kept in contact with the liquid for 1 hour; at the end the solid was separated from the excess liquid .[.in excess.]. .Iadd.δ.Iaddend.and was transferred into a quartz pipe immersed in an electric oven; a nitrogen stream was sent and the whole was heated to the boiling temperature of ethylorthosilicate, so as to completely distill the unreacted product.
After the end of the ethylorthosilicate distillation, the nitrogen flow was stopped, air was sent and the heating was prosecuted by gradually increasing the temperature; when this reached 350° C., determined on alumina, a combustion reaction was started on the organic groups bound to the alumina surface and on the condensation products thereof, therefor the temperature rapidly rose to 900°-1000° C.
The violent combustion occurring negatively affects the physical and mechanical characteristics of the final product, as it is possible to infer from the data of table 4.
TABLE 4 ______________________________________ EX- Starting Sample After treatment at 1100° C. AMPLES SA m.sup.2 /g K % SA m.sup.2 /g k % ΔV% ______________________________________ 13 193 1.9 110 4.5 7 14 190 2.3 112 5.2 5 15 205 1.4 108 3.6 5 16 203 3.1 131 4.3 5 17 198 2.8 119 4.8 6 18 195 2.3 121 4.7 6 19 192 1.8 102 7.8 10 a 196 3.2 68 9.3 14 ______________________________________
By using two samples of γ-alumina, the former prepared according to example 1 and the latter according to example 4, hydrothermal treatments were carried out, at growing times, at 250° C., 300° C. and 350° C.
15 g of the two samples were introduced into two test tubes, which were put into 0.5 l autoclave to which 10 cc of water were added.
The autoclave temperature was brought to the stated temperature (250° C., 300° C., 350° C.) and the pressure was reguated at a steam pressure .Iadd.of .Iaddend.15 atmospheres by means of a manometer suitably connected to the autoclave, made possible by releasing the excess pressure through a suitable valve.
The surface area of the samples, so treated over periods of from 4 to 64 hours is reported in the diagram of FIG. 3, wherein the abscissae refer to the treatment duration and the ordinates relate to the surface area (m2 /g). It is to be noted that the stabilized alumina (curve 1) does not undergo any modification, whereas alumina as such ( curves 2, 3, 4) undergoes progressive decreases of the surface area which means, as confirmed by X-ray analyses, a change, higher and more higher, of γ-alumina into aluminum monohydrates.
The curve 1 refers to the three temperature values, whereas the curve 2 refers to 350° C., the curve 3 to 300° C. and the curve 4 to 250° C.
Claims (9)
1. The process of improving the mechanical and thermal properties of aluminum oxide adapted for use as a catalyst or catalyst carrier which comprises impregnating said aluminum oxide with a silicon compound having the general formula: ##STR2## in which X, Y, Z and W are selected from the group consisting of (--R), (--Cl), (--Br), (--SiH), (--COOR), (--SiH.sub. nCl.sub. m), --[OSi(OR)]p, OSi, (OR)3, in which R is an alkyl, cycloalkyl, aromatic.Iadd., .Iaddend.alkylaromatic or alkyl-cycloalkyl radical having from 1 to 30 carbon atoms; n, m and p are whole numbers from 1 to 3, by bringing said silicon compound or a solution thereof in a compatible organic solvent whose boiling point is lower than the boiling point of the silicon compound into contact with said aluminum oxide, drying said impregnated aluminum oxide at a temperature in the range of from the boiling point of the silicon compound to 500° C., and then subjecting said impregnated aluminum oxide to controlled oxidation.
2. Process according to claim 1, wherein said silicon compound is an alkyl orthosilicate.
3. Process according to claim 1, wherein said impregnation with the silicon compound is carried out in the liquid phase at atmospheric pressure and in the temperature range of from 50° to 500° C.
4. Process according to claim 1, wherein said impregnation with the silicon compound is carried out in the vapour phase at atmospheric pressure by flowing the silicon compound in an inert gas stream onto the aluminum oxide which is to be treated.
5. Process according to claim 1, wherein said aluminum oxide which is to be treated and the silicon compound are contacted in the pressure range of from room pressure to 50 kg/cm2 and at temperatures ranging between the room temperature and 500° C.
6. Process according to claim 1, wherein the oxidation is carried out under an air stream at 500° C.
7. Process according to claim 1, wherein the aluminum oxide material is γ-alumina.
8. Stabilized alumina having a sliicon content, expressed as silicon atoms per A2 of area, of from 0.01 to 0.06 which shows, after a treatment at 1200° C. over a period of 24 hours, no transformation other than from phase to phase, and which, after a treatment for 40 hours at 250° C. under a steam pressure of 15 ata, keeps unchanged its starting crystalline structure and, after a treatment at 1000° C. for 24 hours, shows a volume shrinkage lower than 2%.
9. Stabilized alumina according to claim 8, which shows an infrared adsorption spectrum having a very strong band at 3745 cm-1 characteristic of the group Si--OH and very weak bands or no band at 3795 cm-1 and 3737-1 awardable to hydroxyls at the alumina surface. .Iadd. 10. The process for improving the mechanical and thermal properties of aluminum oxide adapted for use as a catalyst or catalyst carrier which comprises impregnating said aluminum oxide with a silicon compound having the general formula: ##STR3## in which X, Y, Z and W are selected from the group consisting of (--R), (--OR) (--Cl), (--Br), (--SiH3), (--COOR), (--SiHn Clm), --[OSi(OR)2 ]p, OSi(OR)3, in which R is H or an alkyl, cycloalkyl, aromatic, alkylaromatic or alkyl-cycloaklyl radical having from 1 to 30 carbon atoms; n, m and p are whole numbers from 1 to 3, by bringing said silicon compound or a solution thereof in a compatible organic solvent whose boiling point is lower than the boiling poit of the silicon compound into contact with said aluminum oxide, drying said impregnated aluminum oxide at a temperature in the range of from the boiling point of the silicon compound to 500° C., and then subjecting said impregnated aluminum oxide to controlled oxidation. .Iaddend.
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- 1974-10-19 MW MW42/74*UA patent/MW4274A1/en unknown
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- 1974-10-23 ZM ZM157/74A patent/ZM15774A1/en unknown
- 1974-10-24 CH CH1427174A patent/CH620177A5/it not_active IP Right Cessation
- 1974-10-25 YU YU2861/74A patent/YU36901B/en unknown
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- 1974-10-30 DK DK565774A patent/DK144813C/en not_active IP Right Cessation
- 1974-10-30 HU HUSA2706A patent/HU169769B/hu unknown
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- 1974-10-31 ES ES431755A patent/ES431755A1/en not_active Expired
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