USD877079S1 - Electrode plate for plasma processing apparatus - Google Patents
Electrode plate for plasma processing apparatus Download PDFInfo
- Publication number
- USD877079S1 USD877079S1 US29/554,794 US201629554794F USD877079S US D877079 S1 USD877079 S1 US D877079S1 US 201629554794 F US201629554794 F US 201629554794F US D877079 S USD877079 S US D877079S
- Authority
- US
- United States
- Prior art keywords
- processing apparatus
- electrode plate
- plasma processing
- view
- taken
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The broken lines shown represent portions of the electrode plate for plasma processing apparatus that form no part of the claimed design. Where the dot-dash broken lines abut the shaded surface it is understood that those broken lines represent an unclaimed boundary between claimed and unclaimed surfaces. None of the broken lines form any part of the claimed design.
Claims (1)
- The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-018692 | 2015-08-26 | ||
JPD2015-18692F JP1545606S (en) | 2015-08-26 | 2015-08-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD877079S1 true USD877079S1 (en) | 2020-03-03 |
Family
ID=55484389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/554,794 Active USD877079S1 (en) | 2015-08-26 | 2016-02-16 | Electrode plate for plasma processing apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | USD877079S1 (en) |
JP (1) | JP1545606S (en) |
TW (1) | TWD178422S (en) |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
USD460350S1 (en) * | 2001-03-22 | 2002-07-16 | Alan Davis | Compressed fabric article package having a wedge shape |
US6537419B1 (en) * | 2000-04-26 | 2003-03-25 | David W. Kinnard | Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate |
US6793733B2 (en) * | 2002-01-25 | 2004-09-21 | Applied Materials Inc. | Gas distribution showerhead |
US6872258B2 (en) * | 2001-07-16 | 2005-03-29 | Samsung Electronics Co., Ltd. | Shower head of a wafer treatment apparatus having a gap controller |
USD570310S1 (en) * | 2006-08-01 | 2008-06-03 | Tokyo Electron Limited | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
USD609652S1 (en) * | 2008-07-22 | 2010-02-09 | Tokyo Electron Limited | Wafer attracting plate |
US8221582B2 (en) * | 2008-07-07 | 2012-07-17 | Lam Research Corporation | Clamped monolithic showerhead electrode |
US8702866B2 (en) * | 2006-12-18 | 2014-04-22 | Lam Research Corporation | Showerhead electrode assembly with gas flow modification for extended electrode life |
US9484190B2 (en) * | 2014-01-25 | 2016-11-01 | Yuri Glukhoy | Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD790041S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Gas dispersing plate for semiconductor manufacturing apparatus |
USD789888S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Electrode plate for semiconductor manufacturing apparatus |
USD793572S1 (en) * | 2015-06-10 | 2017-08-01 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
-
2015
- 2015-08-26 JP JPD2015-18692F patent/JP1545606S/ja active Active
-
2016
- 2016-02-16 US US29/554,794 patent/USD877079S1/en active Active
- 2016-02-23 TW TW105300839F patent/TWD178422S/en unknown
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
US6537419B1 (en) * | 2000-04-26 | 2003-03-25 | David W. Kinnard | Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate |
USD460350S1 (en) * | 2001-03-22 | 2002-07-16 | Alan Davis | Compressed fabric article package having a wedge shape |
US6872258B2 (en) * | 2001-07-16 | 2005-03-29 | Samsung Electronics Co., Ltd. | Shower head of a wafer treatment apparatus having a gap controller |
US6793733B2 (en) * | 2002-01-25 | 2004-09-21 | Applied Materials Inc. | Gas distribution showerhead |
USD570310S1 (en) * | 2006-08-01 | 2008-06-03 | Tokyo Electron Limited | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
US8702866B2 (en) * | 2006-12-18 | 2014-04-22 | Lam Research Corporation | Showerhead electrode assembly with gas flow modification for extended electrode life |
US8221582B2 (en) * | 2008-07-07 | 2012-07-17 | Lam Research Corporation | Clamped monolithic showerhead electrode |
USD609652S1 (en) * | 2008-07-22 | 2010-02-09 | Tokyo Electron Limited | Wafer attracting plate |
US9484190B2 (en) * | 2014-01-25 | 2016-11-01 | Yuri Glukhoy | Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area |
USD793572S1 (en) * | 2015-06-10 | 2017-08-01 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD790041S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Gas dispersing plate for semiconductor manufacturing apparatus |
USD789888S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Electrode plate for semiconductor manufacturing apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWD178422S (en) | 2016-09-21 |
JP1545606S (en) | 2016-03-14 |
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