USD570310S1 - Attracting plate of an electrostatic chuck for semiconductor manufacturing - Google Patents

Attracting plate of an electrostatic chuck for semiconductor manufacturing Download PDF

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Publication number
USD570310S1
USD570310S1 US29/276,679 US27667907F USD570310S US D570310 S1 USD570310 S1 US D570310S1 US 27667907 F US27667907 F US 27667907F US D570310 S USD570310 S US D570310S
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US
United States
Prior art keywords
semiconductor manufacturing
electrostatic chuck
attracting plate
attracting
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/276,679
Inventor
Yasuharu Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SASAKI, YASUHARU
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Publication of USD570310S1 publication Critical patent/USD570310S1/en
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Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a front elevational view of an attracting plate of an electrostatic chuck for semiconductor manufacturing, or the like, showing my new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a top plan view thereof, the bottom plan view being a mirror image of the plan view shown;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof; and,
FIG. 6 is a bottom, rear and lower perspective view thereof.
The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described.
US29/276,679 2006-08-01 2007-02-01 Attracting plate of an electrostatic chuck for semiconductor manufacturing Expired - Lifetime USD570310S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006020298 2006-08-01
JP2006-020298 2006-08-01

Publications (1)

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USD570310S1 true USD570310S1 (en) 2008-06-03

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Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD654033S1 (en) * 2010-01-20 2012-02-14 Celadon Systems, Inc. Grooved wire support for a probe test core
USD668211S1 (en) * 2010-09-10 2012-10-02 Novellus Systems, Inc. Segmented electroplating anode and anode segment
USD685335S1 (en) * 2008-11-18 2013-07-02 Applied Materials, Inc. Substrate support
USD689032S1 (en) * 2011-04-21 2013-09-03 Panasonic Corporation Electrostatic atomized water particle generating module
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD877079S1 (en) * 2015-08-26 2020-03-03 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD913256S1 (en) * 2019-07-31 2021-03-16 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD926716S1 (en) * 2019-07-31 2021-08-03 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1110975S1 (en) 2022-01-12 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5671116A (en) * 1995-03-10 1997-09-23 Lam Research Corporation Multilayered electrostatic chuck and method of manufacture thereof
US6278600B1 (en) * 1994-01-31 2001-08-21 Applied Materials, Inc. Electrostatic chuck with improved temperature control and puncture resistance
US20040212947A1 (en) * 2003-04-22 2004-10-28 Applied Materials, Inc. Substrate support having heat transfer system
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20060002053A1 (en) * 2004-03-31 2006-01-05 Applied Materials, Inc. Detachable electrostatic chuck for supporting a substrate in a process chamber
US20060221539A1 (en) * 2005-03-31 2006-10-05 Ngk Spark Plug Co., Ltd. Electrostatic chuck
USD546784S1 (en) * 2005-09-29 2007-07-17 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD548200S1 (en) * 2005-09-29 2007-08-07 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6278600B1 (en) * 1994-01-31 2001-08-21 Applied Materials, Inc. Electrostatic chuck with improved temperature control and puncture resistance
US5671116A (en) * 1995-03-10 1997-09-23 Lam Research Corporation Multilayered electrostatic chuck and method of manufacture thereof
US20040212947A1 (en) * 2003-04-22 2004-10-28 Applied Materials, Inc. Substrate support having heat transfer system
US20060002053A1 (en) * 2004-03-31 2006-01-05 Applied Materials, Inc. Detachable electrostatic chuck for supporting a substrate in a process chamber
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20060221539A1 (en) * 2005-03-31 2006-10-05 Ngk Spark Plug Co., Ltd. Electrostatic chuck
USD546784S1 (en) * 2005-09-29 2007-07-17 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD548200S1 (en) * 2005-09-29 2007-08-07 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD685335S1 (en) * 2008-11-18 2013-07-02 Applied Materials, Inc. Substrate support
USD654033S1 (en) * 2010-01-20 2012-02-14 Celadon Systems, Inc. Grooved wire support for a probe test core
USD668211S1 (en) * 2010-09-10 2012-10-02 Novellus Systems, Inc. Segmented electroplating anode and anode segment
USD689032S1 (en) * 2011-04-21 2013-09-03 Panasonic Corporation Electrostatic atomized water particle generating module
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD877079S1 (en) * 2015-08-26 2020-03-03 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD913256S1 (en) * 2019-07-31 2021-03-16 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD926716S1 (en) * 2019-07-31 2021-08-03 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD1110975S1 (en) 2022-01-12 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber

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