USD427088S - Wafer level burn-in tester - Google Patents

Wafer level burn-in tester Download PDF

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Publication number
USD427088S
USD427088S US29/114,644 US11464499F USD427088S US D427088 S USD427088 S US D427088S US 11464499 F US11464499 F US 11464499F US D427088 S USD427088 S US D427088S
Authority
US
United States
Prior art keywords
tester
wafer level
level burn
burn
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/114,644
Inventor
Yoshihiko Asai
Yoshikazu Ezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. reassignment MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ASAI, YOSHIHIKO, EZAWA, YOSHIKAZU
Application granted granted Critical
Publication of USD427088S publication Critical patent/USD427088S/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a perspective view of the top, front and right side of a wafer level burn-in tester showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a bottom view thereof; and,
FIG. 6 is a rear view thereof.

Claims (1)

  1. The ornamental design for a wafer level burn-in tester, as shown and described.
US29/114,644 1999-07-09 1999-11-29 Wafer level burn-in tester Expired - Lifetime USD427088S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11-18322 1999-07-09
JP1832299 1999-07-09

Publications (1)

Publication Number Publication Date
USD427088S true USD427088S (en) 2000-06-27

Family

ID=71780506

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/114,644 Expired - Lifetime USD427088S (en) 1999-07-09 1999-11-29 Wafer level burn-in tester

Country Status (1)

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US (1) USD427088S (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD989144S1 (en) * 2021-05-14 2023-06-13 Hitachi High-Tech Corporation Apparatus for evaluating semiconductor substrate
USD989831S1 (en) * 2021-05-14 2023-06-20 Hitachi High-Tech Corporation Apparatus for evaluating semiconductor substrate
USD989830S1 (en) * 2021-05-14 2023-06-20 Hitachi High-Tech Corporation Semiconductor substrate transfer apparatus
USD990538S1 (en) * 2021-02-05 2023-06-27 Syskey Technology Co., Ltd. Miniaturized semiconductor manufacturing device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD333144S (en) * 1990-10-03 1993-02-09 Canon Kabushiki Kaisha Chamber for semiconductor fabricating machine
USD352911S (en) * 1992-11-27 1994-11-29 Hitachi, Ltd. Processing machine for electron beam lithography system
USD365584S (en) * 1993-12-15 1995-12-26 Tokyo Electron Kabushiki Kaisha Semiconductor manufacturing device
US5851143A (en) * 1996-05-10 1998-12-22 Thermal Industries Disk drive test chamber
US5929651A (en) * 1995-08-09 1999-07-27 International Business Machines Corporation Semiconductor wafer test and burn-in

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD333144S (en) * 1990-10-03 1993-02-09 Canon Kabushiki Kaisha Chamber for semiconductor fabricating machine
USD352911S (en) * 1992-11-27 1994-11-29 Hitachi, Ltd. Processing machine for electron beam lithography system
USD365584S (en) * 1993-12-15 1995-12-26 Tokyo Electron Kabushiki Kaisha Semiconductor manufacturing device
US5929651A (en) * 1995-08-09 1999-07-27 International Business Machines Corporation Semiconductor wafer test and burn-in
US5851143A (en) * 1996-05-10 1998-12-22 Thermal Industries Disk drive test chamber

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD990538S1 (en) * 2021-02-05 2023-06-27 Syskey Technology Co., Ltd. Miniaturized semiconductor manufacturing device
USD989144S1 (en) * 2021-05-14 2023-06-13 Hitachi High-Tech Corporation Apparatus for evaluating semiconductor substrate
USD989831S1 (en) * 2021-05-14 2023-06-20 Hitachi High-Tech Corporation Apparatus for evaluating semiconductor substrate
USD989830S1 (en) * 2021-05-14 2023-06-20 Hitachi High-Tech Corporation Semiconductor substrate transfer apparatus

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