USD381030S - Sputtering target - Google Patents

Sputtering target Download PDF

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Publication number
USD381030S
USD381030S US29/047,081 US4708195F USD381030S US D381030 S USD381030 S US D381030S US 4708195 F US4708195 F US 4708195F US D381030 S USD381030 S US D381030S
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US
United States
Prior art keywords
sputtering target
present
view
sputtering
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/047,081
Inventor
Avi Tepman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Individual
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Filing date
Publication date
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Priority to US29/047,081 priority Critical patent/USD381030S/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TEPMAN, AVI
Application granted granted Critical
Publication of USD381030S publication Critical patent/USD381030S/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a perspective view showing substantially the top of a sputtering target of the present invention;
FIG. 2 is a perspective view showing substantially the bottom of a sputtering target of the present invention;
FIG. 3 is a top view of a sputtering target of the present invention;
FIG. 4 is a side view of a sputtering target of the present invention;
FIG. 5 is a bottom view of a sputtering target of the present invention; and,
FIG. 6 is a cross-sectional view of a sputtering target of the present invention.

Claims (1)

  1. The ornamental design for a sputtering target, as shown and described.
US29/047,081 1995-11-21 1995-11-21 Sputtering target Expired - Lifetime USD381030S (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/047,081 USD381030S (en) 1995-11-21 1995-11-21 Sputtering target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/047,081 USD381030S (en) 1995-11-21 1995-11-21 Sputtering target

Publications (1)

Publication Number Publication Date
USD381030S true USD381030S (en) 1997-07-15

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ID=71462239

Family Applications (1)

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US29/047,081 Expired - Lifetime USD381030S (en) 1995-11-21 1995-11-21 Sputtering target

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US (1) USD381030S (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
USD828190S1 (en) * 2016-10-03 2018-09-11 Sintokogio, Ltd. Probe
USD830865S1 (en) * 2016-10-03 2018-10-16 Sintokogio, Ltd. Probe
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD876299S1 (en) * 2018-02-02 2020-02-25 Amsted Rail Company, Inc. Vented brake cylinder
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD937329S1 (en) * 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD1007449S1 (en) * 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5460708A (en) * 1990-11-30 1995-10-24 Texas Instruments Incorporated Semiconductor processing system
US5480530A (en) * 1993-03-09 1996-01-02 Leybold Aktiengesellschaft Mask for covering the margin of a disk-shaped substrate
US5529673A (en) * 1995-02-17 1996-06-25 Sony Corporation Mechanically joined sputtering target and adapter therefor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5460708A (en) * 1990-11-30 1995-10-24 Texas Instruments Incorporated Semiconductor processing system
US5480530A (en) * 1993-03-09 1996-01-02 Leybold Aktiengesellschaft Mask for covering the margin of a disk-shaped substrate
US5529673A (en) * 1995-02-17 1996-06-25 Sony Corporation Mechanically joined sputtering target and adapter therefor

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
USD828190S1 (en) * 2016-10-03 2018-09-11 Sintokogio, Ltd. Probe
USD830865S1 (en) * 2016-10-03 2018-10-16 Sintokogio, Ltd. Probe
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) * 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD876299S1 (en) * 2018-02-02 2020-02-25 Amsted Rail Company, Inc. Vented brake cylinder
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD937329S1 (en) * 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD970566S1 (en) * 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) * 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) * 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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