USD1053157S1 - Heat reflector for semiconductor manufacturing equipment - Google Patents
Heat reflector for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- USD1053157S1 USD1053157S1 US29/883,098 US202329883098F USD1053157S US D1053157 S1 USD1053157 S1 US D1053157S1 US 202329883098 F US202329883098 F US 202329883098F US D1053157 S USD1053157 S US D1053157S
- Authority
- US
- United States
- Prior art keywords
- semiconductor manufacturing
- manufacturing equipment
- heat reflector
- view
- reflector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-017170D | 2022-08-10 | ||
| JP2022017170F JP1733769S (enrdf_load_stackoverflow) | 2022-08-10 | 2022-08-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD1053157S1 true USD1053157S1 (en) | 2024-12-03 |
Family
ID=84601522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/883,098 Active USD1053157S1 (en) | 2022-08-10 | 2023-01-24 | Heat reflector for semiconductor manufacturing equipment |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1053157S1 (enrdf_load_stackoverflow) |
| JP (1) | JP1733769S (enrdf_load_stackoverflow) |
| TW (1) | TWD236269S (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1082730S1 (en) * | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Cover base for susceptors |
Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5088006A (en) * | 1991-04-25 | 1992-02-11 | International Business Machines Corporation | Liquid film interface cooling system for semiconductor wafer processing |
| US6035100A (en) * | 1997-05-16 | 2000-03-07 | Applied Materials, Inc. | Reflector cover for a semiconductor processing chamber |
| US6108491A (en) * | 1998-10-30 | 2000-08-22 | Applied Materials, Inc. | Dual surface reflector |
| US6815645B2 (en) * | 2001-03-08 | 2004-11-09 | Shin-Etsu Handotai Co., Ltd. | Heat reflecting material and heating device using the material |
| US7772527B2 (en) * | 2005-05-04 | 2010-08-10 | Samsung Electronics Co., Ltd. | Heat reflector and substrate processing apparatus comprising the same |
| USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD804437S1 (en) * | 2016-09-30 | 2017-12-05 | Norton (Waterford) Limited | Circuit board |
| USD818961S1 (en) * | 2016-02-10 | 2018-05-29 | Hitachi Kokusai Electric Inc. | Insulation unit cover of semiconductor manufacturing apparatus |
| JP1624353S (enrdf_load_stackoverflow) | 2018-07-19 | 2019-02-12 | ||
| US10283637B2 (en) * | 2016-07-18 | 2019-05-07 | Taiwan Semiconductor Manufacturing Co, Ltd. | Individually-tunable heat reflectors in an EPI-growth system |
| USD849422S1 (en) * | 2014-12-17 | 2019-05-28 | Ngk Insulators, Ltd. | Composite substrate for acoustic wave device |
| US10453713B2 (en) * | 2016-11-29 | 2019-10-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for controlling temperature of furnace in semiconductor fabrication process |
| USD981972S1 (en) * | 2021-03-22 | 2023-03-28 | Kokusai Electric Corporation | Adiabatic plate for substrate processing appratus |
| USD1003834S1 (en) * | 2021-06-28 | 2023-11-07 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
-
2022
- 2022-08-10 JP JP2022017170F patent/JP1733769S/ja active Active
-
2023
- 2023-01-10 TW TW110305062D01F patent/TWD236269S/zh unknown
- 2023-01-24 US US29/883,098 patent/USD1053157S1/en active Active
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5088006A (en) * | 1991-04-25 | 1992-02-11 | International Business Machines Corporation | Liquid film interface cooling system for semiconductor wafer processing |
| US6035100A (en) * | 1997-05-16 | 2000-03-07 | Applied Materials, Inc. | Reflector cover for a semiconductor processing chamber |
| US6108491A (en) * | 1998-10-30 | 2000-08-22 | Applied Materials, Inc. | Dual surface reflector |
| US6815645B2 (en) * | 2001-03-08 | 2004-11-09 | Shin-Etsu Handotai Co., Ltd. | Heat reflecting material and heating device using the material |
| US7772527B2 (en) * | 2005-05-04 | 2010-08-10 | Samsung Electronics Co., Ltd. | Heat reflector and substrate processing apparatus comprising the same |
| USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD849422S1 (en) * | 2014-12-17 | 2019-05-28 | Ngk Insulators, Ltd. | Composite substrate for acoustic wave device |
| USD818961S1 (en) * | 2016-02-10 | 2018-05-29 | Hitachi Kokusai Electric Inc. | Insulation unit cover of semiconductor manufacturing apparatus |
| US10283637B2 (en) * | 2016-07-18 | 2019-05-07 | Taiwan Semiconductor Manufacturing Co, Ltd. | Individually-tunable heat reflectors in an EPI-growth system |
| USD804437S1 (en) * | 2016-09-30 | 2017-12-05 | Norton (Waterford) Limited | Circuit board |
| US10453713B2 (en) * | 2016-11-29 | 2019-10-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for controlling temperature of furnace in semiconductor fabrication process |
| JP1624353S (enrdf_load_stackoverflow) | 2018-07-19 | 2019-02-12 | ||
| USD924823S1 (en) | 2018-07-19 | 2021-07-13 | Kokusai Electric Corporation | Adiabatic plate for substrate processing apparatus |
| USD981972S1 (en) * | 2021-03-22 | 2023-03-28 | Kokusai Electric Corporation | Adiabatic plate for substrate processing appratus |
| USD1003834S1 (en) * | 2021-06-28 | 2023-11-07 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
Non-Patent Citations (1)
| Title |
|---|
| 113 Applied Materials Reflector Plate, Inject, 300MM Radiance Plus 0041-12156,https://www.ebay.com/itm/114949674079, 2024. (Year: 2024). * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1082730S1 (en) * | 2023-01-11 | 2025-07-08 | Nuflare Technology, Inc. | Cover base for susceptors |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1733769S (enrdf_load_stackoverflow) | 2023-01-06 |
| TWD236269S (zh) | 2025-02-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |