US7638347B2 - Image sensor and method for fabricating the same - Google Patents
Image sensor and method for fabricating the same Download PDFInfo
- Publication number
- US7638347B2 US7638347B2 US11/508,956 US50895606A US7638347B2 US 7638347 B2 US7638347 B2 US 7638347B2 US 50895606 A US50895606 A US 50895606A US 7638347 B2 US7638347 B2 US 7638347B2
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- Prior art keywords
- trench
- channel stop
- forming
- substrate
- stop layer
- Prior art date
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- Expired - Fee Related, expires
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 238000002955 isolation Methods 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims description 17
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 9
- 150000004767 nitrides Chemical class 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1463—Pixel isolation structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14689—MOS based technologies
Definitions
- the present invention relates to a method for fabricating a semiconductor device, and more particularly, to a method for fabricating an image sensor.
- image sensors have been used in a vast range of areas including domestic products such as digital cameras and cellular phones, endoscopes at hospitals, and telescopes of satellites.
- FIG. 1 illustrates a cross-sectional view of a typical image sensor.
- a substrate 103 includes a lowly doped P-type epitaxial layer 102 formed on a highly doped P + -type substrate 101 .
- One reason for using the lowly doped P-type epitaxial layer 102 is because the existence of the lowly doped P-type epitaxial layer 102 allows a larger and deeper depletion region of a photodiode. Thus, the ability of the photodiode in concentrating photocharges can be increased.
- Another reason is because forming the highly doped P + -type substrate 101 below the P-type epitaxial layer 102 allows a fast recombination of photocharges before the photocharges diffuse into adjacent unit pixels.
- trenches are formed in the substrate 103 as a part of a process for forming an isolation structure using a shallow trench isolation (STI) process.
- STI shallow trench isolation
- thermal oxide layers 104 are formed on the trenches by performing a rounding oxidation process. Then, high density plasma (HDP) oxide layers 106 are filled into the trenches.
- HDP high density plasma
- Inner surfaces of the trenches are cured by forming the thermal oxide layers 104 inside the trenches.
- trap sites caused by the defects still exist on an interfacial surface between the thermal oxide layers 104 and the substrate 103 even after the rounding oxidation process is performed. If a photodiode 107 is formed in the substrate structure including the trap sites to generate photoelectrons by light, some of the photoelectrons may be trapped in the trap sites and cause a loss of light.
- N-channel stop (NCST) impurity regions 105 are implanted into the sidewall and bottom surfaces of the trenches to form N-channel stop (NCST) impurity regions 105 . Sidewalls of the photodiode 107 are separated from the trenches by the NCST impurity regions 105 , and thus, the photoelectrons can be prevented from being trapped in the trap sites and the loss of light can be reduced.
- NCST N-channel stop
- a horizontal portion of the NCST impurity regions 105 has a thickness ranging from 0.1 ⁇ m to 0.2 ⁇ m.
- a light characteristic may be deteriorated due to a reduced area of the photodiode 107 .
- an object of the present invention to provide a method for fabricating an image sensor, which can reduce loss of photoelectrons due to trap sites and increase a fill factor of a photodiode.
- an image sensor including: a trench formed by a shallow trench isolation (STI) process; a channel stop layer formed over a substrate in the trench; an isolation structure filled in the trench; and a photodiode formed in the substrate adjacent to a sidewall of the trench.
- STI shallow trench isolation
- a method for fabricating an image sensor including: forming a trench in a substrate through a STI process; forming a channel stop layer over the substrate in the trench; forming an isolation structure in the trench; and forming a photodiode in the substrate adjacent to a sidewall of the trench.
- FIG. 1 illustrates a cross-sectional view of a typical image sensor
- FIG. 2 illustrates a cross-sectional view of an image sensor in accordance with a specific embodiment of the present invention
- FIG. 3 illustrates a graph of horizontal thicknesses of a typical channel stop region and a channel stop region according to a specific embodiment of the present invention, each horizontal thickness changing with respect to boron concentration;
- FIGS. 4A to 4C illustrate cross-sectional views of an image sensor structure to describe a method for fabricating the same in accordance with a specific embodiment of the present invention.
- FIG. 2 illustrates a cross-sectional view of an image sensor in accordance with a specific embodiment of the present invention.
- a substrate 203 includes a lowly doped P-type epitaxial layer 202 formed on a highly doped P + -type substrate 201 .
- One reason for using the lowly doped P-type epitaxial layer 202 is because the existence of the lowly doped P-type epitaxial layer 202 allows a larger and deeper depletion region of a photodiode. Thus, the ability of the photodiode in concentrating photocharges can be increased.
- Trenches TREN are formed in the substrate 203 as a part of a process for forming an isolation structure using a shallow trench isolation (STI) process.
- Channel stop layers 204 are formed in the trenches TREN.
- Thermal oxide layers 205 are formed over the channel stop layers 204 , and an isolation material 206 is disposed over the thermal oxide layers 205 being filled into the trenches TREN.
- the channel stop layers 204 include selective epitaxial growth (SEG) layers, formed by doping P-type impurities which have substantially the same conductivity type as the substrate 203 .
- the P-type impurities may include boron.
- the boron-doped SEG layers are formed to overcome limitations associated with the typical trap sites.
- the trap sites are generated due to changes in silicon lattice structures during the trench formation.
- the changes in the silicon lattice structures are reduced and the doped boron prevents a photodiode 207 including N-type impurities from overlapping with the trap sites.
- the isolation material 206 includes a high density plasma (HDP) oxide-based material and filled into the trenches TREN.
- the thermal oxide layers 205 are formed by performing a rounding oxidation process.
- Reference numeral 208 represents a typical photodiode. A comparison between the photodiode 207 consistent with this embodiment and the typical photodiode 208 shows that a fill factor has increased in this embodiment.
- FIG. 3 illustrates a graph of horizontal thicknesses of a typical channel stop region and a channel stop region consistent with this embodiment, each horizontal thickness changing with respect to boron concentration.
- Reference letter ‘A’ represents the channel stop region consistent with this embodiment, i.e., the channel stop layers 204 in FIG. 2
- reference letter ‘B’ represents the typical channel stop region, i.e., the N-channel stop (NCST) impurity regions 105 in FIG. 1 .
- the graph shows that the channel stop region ‘A’ has a higher impurity concentration level than the typical channel stop region ‘B’ and yet has a smaller horizontal thickness than the typical channel stop region ‘B’. Consequently, the higher impurity concentration level allows easier separation of the channel stop region ‘A’ from a photodiode, and the small horizontal thickness results in an increased fill factor of the photodiode.
- FIGS. 4A to 4C illustrate cross-sectional views of an image sensor structure to describe a method for fabricating the same.
- a substrate 303 includes a lowly doped P-type epitaxial layer 302 formed on a highly doped P + -type substrate 301 .
- One reason for using the lowly doped P-type epitaxial layer 302 is because the existence of the lowly doped P-type epitaxial layer 302 allows a larger and deeper depletion region of a photodiode. Thus, the ability of the photodiode in concentrating photocharges can be increased.
- Another reason is because forming the highly doped P + -type substrate 301 below the P-type epitaxial layer 302 allows a fast recombination of photocharges before the photocharges diffuse into adjacent unit pixels. Thus, random diffusion of the photocharges can be reduced, resulting in a reduced fluctuation of the photocharge transfer function.
- a pad oxide layer and a pad nitride layer are sequentially formed over the substrate 303 . Predetermined portions of the pad oxide layer and the pad nitride layer are etched away to form a patterned pad oxide layer 304 and a patterned pad nitride layer 305 , exposing regions where an isolation structure is to be formed.
- the substrate 303 is etched to form trenches TREN using the patterned pad oxide layer 304 and the patterned pad nitride layer 305 as an etch barrier.
- channel stop layers 306 are formed in the trenches TREN.
- the channel stop layers 306 include boron doped SEG layers which have substantially the same conductivity type as the substrate 303 .
- the SEG layers are formed at a temperature ranging from approximately 700° C. to approximately 1,000° C. using a gas selected from a group consisting of diborane (B 2 H 6 ), silane (SiH 4 ), and hydrogen chloride (HCl).
- the SEG layers are doped with boron at approximately 1 ⁇ 10 20 atoms/cm 3 .
- the channel stop layers 306 are formed to overcome limitations associated with the typical trap sites.
- trap sites are generated due to changes in silicon lattice structures during the trench formation.
- the changes in the silicon lattice structures are reduced and the doped boron prevents a photodiode including N-type impurities from overlapping with the trap sites.
- a rounding oxidation process is performed to form thermal oxidation layers 307 over the channel stop layers 306 , and the patterned pad oxide layer 304 and the patterned pad nitride layer 305 are removed.
- the thermal oxide layers 307 are oxidized at a temperature ranging from approximately 800° C. to approximately 900° C. using one of oxygen (O 2 ) gas and water (H 2 O) gas.
- an HDP oxide layer is filled into the trenches TREN to form an isolation structure 308 .
- N-type impurities are implanted into the substrate 303 adjacent to sidewalls of the trenches TREN to form a photodiode 309 .
- a fill factor of the photodiode 309 increases because channel stop regions, i.e. the channel stop layers 306 , are formed inside the trenches TREN using the SEG layers.
- the limitations associated with loss of the photoelectrons due to the trap sites can be reduced by forming the channel stop regions using the SEG layers.
- the SEG layers are doped with impurities and formed in the trenches, wherein the trenches are used in the forming of the isolation structure.
- the impurities have substantially the same conductivity type as the substrate.
Abstract
Description
Claims (11)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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US12/632,424 US7893469B2 (en) | 2005-08-26 | 2009-12-07 | Image sensor and method for fabricating the same |
US13/023,754 US8476685B2 (en) | 2005-08-26 | 2011-02-09 | Image sensor and method for fabricating the same |
US13/918,342 US20130280846A1 (en) | 2005-08-26 | 2013-06-14 | Image sensor and method for fabricating the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR2005-0078838 | 2005-08-26 | ||
KR1020050078838A KR100721661B1 (en) | 2005-08-26 | 2005-08-26 | Image sensor, and method for fabricating the same |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US12/632,424 Division US7893469B2 (en) | 2005-08-26 | 2009-12-07 | Image sensor and method for fabricating the same |
Publications (2)
Publication Number | Publication Date |
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US20070045684A1 US20070045684A1 (en) | 2007-03-01 |
US7638347B2 true US7638347B2 (en) | 2009-12-29 |
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Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/508,956 Expired - Fee Related US7638347B2 (en) | 2005-08-26 | 2006-08-24 | Image sensor and method for fabricating the same |
US12/632,424 Expired - Fee Related US7893469B2 (en) | 2005-08-26 | 2009-12-07 | Image sensor and method for fabricating the same |
US13/023,754 Active 2027-05-16 US8476685B2 (en) | 2005-08-26 | 2011-02-09 | Image sensor and method for fabricating the same |
US13/918,342 Abandoned US20130280846A1 (en) | 2005-08-26 | 2013-06-14 | Image sensor and method for fabricating the same |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/632,424 Expired - Fee Related US7893469B2 (en) | 2005-08-26 | 2009-12-07 | Image sensor and method for fabricating the same |
US13/023,754 Active 2027-05-16 US8476685B2 (en) | 2005-08-26 | 2011-02-09 | Image sensor and method for fabricating the same |
US13/918,342 Abandoned US20130280846A1 (en) | 2005-08-26 | 2013-06-14 | Image sensor and method for fabricating the same |
Country Status (3)
Country | Link |
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US (4) | US7638347B2 (en) |
JP (1) | JP5248757B2 (en) |
KR (1) | KR100721661B1 (en) |
Cited By (3)
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US20080102557A1 (en) * | 2006-10-27 | 2008-05-01 | Dae-Woong Kim | Method of forming an isolation layer and method of manufacturing an image device using the same |
US20100047950A1 (en) * | 2005-09-14 | 2010-02-25 | Kim Sang-Young | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
US20130234202A1 (en) * | 2012-03-08 | 2013-09-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image Sensor Isolation Region and Method of Forming the Same |
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KR100721661B1 (en) * | 2005-08-26 | 2007-05-23 | 매그나칩 반도체 유한회사 | Image sensor, and method for fabricating the same |
KR100731102B1 (en) * | 2005-12-29 | 2007-06-22 | 동부일렉트로닉스 주식회사 | A image sensor and a method for fabricating image sensor |
US7732885B2 (en) * | 2008-02-07 | 2010-06-08 | Aptina Imaging Corporation | Semiconductor structures with dual isolation structures, methods for forming same and systems including same |
US8138531B2 (en) * | 2009-09-17 | 2012-03-20 | International Business Machines Corporation | Structures, design structures and methods of fabricating global shutter pixel sensor cells |
CN102437033A (en) * | 2011-07-22 | 2012-05-02 | 上海华力微电子有限公司 | Method for avoiding damaging shallow trench isolation in high-dielectric-constant metal gate technique |
CN104167419B (en) * | 2013-03-21 | 2017-08-25 | 英属开曼群岛商恒景科技股份有限公司 | Suppress the semiconductor structure of hot gathering, make method of the method for suppressing hot gathering semiconductor element with suppressing hot gathering |
CN105261623A (en) * | 2014-07-16 | 2016-01-20 | 中芯国际集成电路制造(上海)有限公司 | Chip and preparation method thereof and image sensor including chip |
US9847363B2 (en) | 2015-10-20 | 2017-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device with a radiation sensing region and method for forming the same |
US10304886B2 (en) * | 2017-09-28 | 2019-05-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Back-side deep trench isolation (BDTI) structure for pinned photodiode image sensor |
CN107910343A (en) * | 2017-12-11 | 2018-04-13 | 上海华力微电子有限公司 | Cmos image sensor and its manufacture method |
US11289530B2 (en) | 2020-01-21 | 2022-03-29 | Omnivision Technologies, Inc. | Shallow trench isolation (STI) structure for CMOS image sensor |
US11282890B2 (en) | 2020-01-21 | 2022-03-22 | Omnivision Technologies, Inc. | Shallow trench isolation (STI) structure for suppressing dark current and method of forming |
US20210265416A1 (en) * | 2020-02-21 | 2021-08-26 | Applied Materials, Inc. | Structure & material engineering methods for optoelectronic devices signal to noise ratio enhancement |
US11721774B2 (en) * | 2020-02-27 | 2023-08-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Full well capacity for image sensor |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4977096A (en) * | 1987-06-30 | 1990-12-11 | Canon Kabushiki Kaisha | Method of making a photosensor using selective epitaxial growth |
US20020019102A1 (en) * | 1999-11-19 | 2002-02-14 | Chartered Semiconductor Manufacturing Ltd. | Process to fabricate a novel source-drain extension |
KR20020096136A (en) | 2001-06-18 | 2002-12-31 | 주식회사 하이닉스반도체 | Method for manufacturing isolation of semiconductor device |
KR20040003981A (en) | 2002-07-05 | 2004-01-13 | 주식회사 하이닉스반도체 | Imase sensor with improved capability of protection against crosstalk and method for fabricating thereof |
US20040053457A1 (en) * | 2002-09-17 | 2004-03-18 | Yong-Sun Sohn | Method for fabricating semiconductor device with ultra-shallow super-steep-retrograde epi-channel by boron-fluoride compound doping |
US20050167709A1 (en) * | 2002-09-19 | 2005-08-04 | Augusto Carlos J. | Light-sensing device |
US7033895B2 (en) * | 2003-05-14 | 2006-04-25 | Samsung Electronics Co., Ltd. | Method of fabricating a MOS transistor with elevated source/drain structure using a selective epitaxial growth process |
US20060138471A1 (en) * | 2004-12-29 | 2006-06-29 | Shim Hee S | CMOS image sensor and method for fabricating the same |
US20060160295A1 (en) * | 2002-06-12 | 2006-07-20 | Samsung Electronics Co., Ltd. | Semiconductor device and method for fabricating the same |
US7112511B2 (en) * | 2004-05-06 | 2006-09-26 | Magnachip Semiconductor, Ltd. | CMOS image sensor having prism and method for fabricating the same |
US20070057147A1 (en) * | 2005-09-14 | 2007-03-15 | Magnachip Semiconductor, Ltd. | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3925120A (en) * | 1969-10-27 | 1975-12-09 | Hitachi Ltd | A method for manufacturing a semiconductor device having a buried epitaxial layer |
KR960001611B1 (en) * | 1991-03-06 | 1996-02-02 | 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 | Insulated gate type fet and its making method |
JP3104274B2 (en) * | 1991-04-02 | 2000-10-30 | 日本電気株式会社 | Semiconductor device and manufacturing method thereof |
US5612242A (en) * | 1996-03-11 | 1997-03-18 | United Microelectronics Corp. | Trench isolation method for CMOS transistor |
JPH10144784A (en) * | 1996-11-11 | 1998-05-29 | Nec Corp | Semiconductor device and manufacture thereof |
JPH11233610A (en) * | 1998-02-17 | 1999-08-27 | Mitsubishi Electric Corp | Semiconductor device and its manufacturing method |
JP3911585B2 (en) * | 1999-05-18 | 2007-05-09 | 富士通株式会社 | Semiconductor device and manufacturing method thereof |
JP2001015591A (en) * | 1999-06-30 | 2001-01-19 | Toshiba Corp | Manufacture of semiconductor device and semiconductor device |
DE10127888A1 (en) * | 2001-06-08 | 2002-12-19 | Infineon Technologies Ag | Process for forming contact holes in contact regions of components integrated in a substrate comprises applying an insulating layer on a substrate with the integrated components, and applying a mask with openings |
JP2004088015A (en) * | 2002-08-29 | 2004-03-18 | Nec Corp | Semiconductor device and manufacturing method thereof |
KR100477790B1 (en) * | 2003-03-13 | 2005-03-22 | 매그나칩 반도체 유한회사 | Method of manufacturing cmos image sensor |
US6797611B1 (en) * | 2003-08-03 | 2004-09-28 | Nanya Technology Corp. | Method of fabricating contact holes on a semiconductor chip |
KR100619396B1 (en) * | 2003-12-31 | 2006-09-11 | 동부일렉트로닉스 주식회사 | CMOS Image sensor and its fabricating method |
JP2006287117A (en) * | 2005-04-04 | 2006-10-19 | Canon Inc | Semiconductor device and its manufacturing method |
JP2006344809A (en) * | 2005-06-09 | 2006-12-21 | Toshiba Corp | Semiconductor device and its manufacturing method |
KR100721661B1 (en) * | 2005-08-26 | 2007-05-23 | 매그나칩 반도체 유한회사 | Image sensor, and method for fabricating the same |
-
2005
- 2005-08-26 KR KR1020050078838A patent/KR100721661B1/en active IP Right Grant
-
2006
- 2006-08-23 JP JP2006226620A patent/JP5248757B2/en not_active Expired - Fee Related
- 2006-08-24 US US11/508,956 patent/US7638347B2/en not_active Expired - Fee Related
-
2009
- 2009-12-07 US US12/632,424 patent/US7893469B2/en not_active Expired - Fee Related
-
2011
- 2011-02-09 US US13/023,754 patent/US8476685B2/en active Active
-
2013
- 2013-06-14 US US13/918,342 patent/US20130280846A1/en not_active Abandoned
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4977096A (en) * | 1987-06-30 | 1990-12-11 | Canon Kabushiki Kaisha | Method of making a photosensor using selective epitaxial growth |
US20020019102A1 (en) * | 1999-11-19 | 2002-02-14 | Chartered Semiconductor Manufacturing Ltd. | Process to fabricate a novel source-drain extension |
KR20020096136A (en) | 2001-06-18 | 2002-12-31 | 주식회사 하이닉스반도체 | Method for manufacturing isolation of semiconductor device |
US20060160295A1 (en) * | 2002-06-12 | 2006-07-20 | Samsung Electronics Co., Ltd. | Semiconductor device and method for fabricating the same |
KR20040003981A (en) | 2002-07-05 | 2004-01-13 | 주식회사 하이닉스반도체 | Imase sensor with improved capability of protection against crosstalk and method for fabricating thereof |
US20040053457A1 (en) * | 2002-09-17 | 2004-03-18 | Yong-Sun Sohn | Method for fabricating semiconductor device with ultra-shallow super-steep-retrograde epi-channel by boron-fluoride compound doping |
US20050167709A1 (en) * | 2002-09-19 | 2005-08-04 | Augusto Carlos J. | Light-sensing device |
US7033895B2 (en) * | 2003-05-14 | 2006-04-25 | Samsung Electronics Co., Ltd. | Method of fabricating a MOS transistor with elevated source/drain structure using a selective epitaxial growth process |
US7112511B2 (en) * | 2004-05-06 | 2006-09-26 | Magnachip Semiconductor, Ltd. | CMOS image sensor having prism and method for fabricating the same |
US20060138471A1 (en) * | 2004-12-29 | 2006-06-29 | Shim Hee S | CMOS image sensor and method for fabricating the same |
US20070057147A1 (en) * | 2005-09-14 | 2007-03-15 | Magnachip Semiconductor, Ltd. | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100047950A1 (en) * | 2005-09-14 | 2010-02-25 | Kim Sang-Young | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
US8084284B2 (en) * | 2005-09-14 | 2011-12-27 | Intellectual Ventures Ii Llc | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
US8815628B2 (en) | 2005-09-14 | 2014-08-26 | Intellectual Ventures Ii Llc | Complementary metal oxide semiconductor image sensor and method for fabricating the same |
US20080102557A1 (en) * | 2006-10-27 | 2008-05-01 | Dae-Woong Kim | Method of forming an isolation layer and method of manufacturing an image device using the same |
US20130234202A1 (en) * | 2012-03-08 | 2013-09-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image Sensor Isolation Region and Method of Forming the Same |
US20130280849A1 (en) * | 2012-03-08 | 2013-10-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image Sensor Isolation Region and Method of Forming the Same |
US9673244B2 (en) * | 2012-03-08 | 2017-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image sensor isolation region and method of forming the same |
US9786707B2 (en) * | 2012-03-08 | 2017-10-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image sensor isolation region and method of forming the same |
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KR20070024174A (en) | 2007-03-02 |
JP2007067401A (en) | 2007-03-15 |
US8476685B2 (en) | 2013-07-02 |
US20110127630A1 (en) | 2011-06-02 |
US7893469B2 (en) | 2011-02-22 |
US20100084731A1 (en) | 2010-04-08 |
US20130280846A1 (en) | 2013-10-24 |
US20070045684A1 (en) | 2007-03-01 |
KR100721661B1 (en) | 2007-05-23 |
JP5248757B2 (en) | 2013-07-31 |
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