Classifications

• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
  • A61Q3/00—Manicure or pedicure preparations
  • A61Q3/02—Nail coatings
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
  • A61K8/00—Cosmetics or similar toiletry preparations
  • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
  • A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
  • A61K8/84—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions otherwise than those involving only carbon-carbon unsaturated bonds
  • A61K8/87—Polyurethanes
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S428/00—Stock material or miscellaneous articles
  • Y10S428/913—Material designed to be responsive to temperature, light, moisture
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
  • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
  • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
  • Y10T156/1111—Using solvent during delaminating [e.g., water dissolving adhesive at bonding face during delamination, etc.]
  • Y10T156/1116—Using specified organic delamination solvent
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/31504—Composite [nonstructural laminate]
  • Y10T428/31855—Of addition polymer from unsaturated monomers
  • Y10T428/31909—Next to second addition polymer from unsaturated monomers
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/8305—Miscellaneous [e.g., treated surfaces, etc.]

Definitions

• This invention relates to a method for coating human nails. More particularly, it concerns a method of this character which employs the application of a basecoat comprising a water-soluble or water-swellable polymer in a solvent system followed by the application of a photocurable nail lacquer composition and the curing of the same by means of a light source. This invention also concerns a method for the removal of this nail coating.
• Basecoat compositions of the prior art generally comprise a l% solution of nitrocellulose as the film former.
• a nail coating is obtained which is difficult to remove.
• Organic solvents are ordinarily required to remove these coatings which tend to defat and thereby dry the nails in the process of removing the nail coating. This obviously is an undesirable result.
• a two-part nail coating system comprising as a first part (a) basecoat composition of a water-soluble or water-swellable polymer in a solvent and as a second part (b), a photocurable nail lacquer composition adopted to be cured to a hard nail coating on its exposure to a light source described in more detail below.
• the basecoat compositions of this invention are characterized by the fact that they employ a water-soluble or water-swellable polymer system as the film former. These serve to facilitate the removal of the nail lacquer when both basecoat and photocurable nail lacquer have been applied to the nail. Soaking the nails so coated in hot water, preferably warm water, for a few minutes causes the basecoat to swell with the result that the overlaying layer of nail lacquer as well as the basecoat can be lifted up and released from the nail.
• the term water-swellable polymer is used in the present context to designate a polymeric material which has the capability of picking up a certain quantity of water without being dissolved therein. This water pick-up is accompanied by an increase in volume of the polymeric material.
• water-soluble polymer is used herein to mean a polymer that is soluble in waterat least to the extent of 1% by weight.
• a class of water-soluble or water-swellable polymers that is particularly useful for the purpose of the present invention can be described as water-soluble or waterswellable polymers made by the polymerization of one or more vinylic compounds of the formula:
• R is hydrogen, alkyl, phenyl, halide or pyrrolidonyl i.e.
• R is hydrogen, alkyl, phenyl, halide or ,COOH
• R is hydrogen, alkyl, carboxyalkyl, phenyl or halide
• X is hydrogen, -COO alkyl, COOH-O alkyl,
• R is hydrogen or pyrrolidonyl
• R is hydrogen, alkyl or COOl-l
• X is C00 alkyl; COOH, hydrogen or .-CN.
• polymer is used herein in its generic sense to cover polymeric material which would be derived from the polymerization of one monomer described in formula I or a mixture of monomers of said formula. It is thus intended to cover homopolymers, copolymers, terpolymers, tetrapolymers, etc.
• R R or R in the above formula is an alkyl group or the alkyl moiety of a complex group containing an alkyl group (e.g. carboxyalkyl)
• the alkyl group or alkyl moiety preferably contains from 1 to 6 carbons e.g. methyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl and n-hexyl.
• any other substituent designated as alkyl the alkyl will also contain from 1 to 6 carbons e.g. methyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl, hexyl.
• R R R or X are halide, they may be Cl, Br, F, I.
• Gantrez AN 139 methyl vinyl ether/maleic anhydride copolymer, 1:1 molar relationship, medium molecular weight grade, Av. M.W. 500,000
• Gantrez AN 169 Gantrez ES 425 (monobutyl ester of poly(methyl vinyl ether/- maleic acid); Gantrez ES 225 (monoethyl ester of poly(methyl vinyl ether/maleic acid); Gafquat (quaternized vinyl pyrrolidone copolymer); National Starch Resyn 26-2905; National Starch Resyn 2261; National Starch Resyn 28-2930 (terpolymer of crotonic acid and mixture of vinyl acetate and vinyl ester of C -C fatty acids (90%) mole percent) (See US.
• the water-swellable or water-soluble polymers that are particularly useful in the present invention are further characterized by the fact that they are film forming polymers which form flexible films, as distinguished from rigid films. Since these polymers are intended to form a film which adheres to human nails and which at the same time forms a base on which a photocured polymeric top coat. may adhere, it is important to select a water-soluble or water swellable polymer that will have these adhesive properties.
• any one of the aforesaid water-soluble or water-swellable polymers or combinations thereof may be employed in formulating the basecoat compositions of the present invention.
• compositions will generally be in the form of solution of one or more of said polymers in a solvent system.
• solvent system will preferably be a relatively volatile solvent that is predominantly organic in character which may contain small amounts of an inorganic solvent e.g. water.
• solvents that may be used advantageously in this connection, mention may be made of the following: ethanol, acetone, cosmetic solvents, ethyl acetate, toluene, isopropanol, methyl ethyl ketone. These may be used singularly or in combination.
• the quantity of water-soluble or water-swellable polymer that may be contained in the present basecoat compositions may vary somewhat. Usually, it will constitute between about 5% to 30% by weight of the basecoat compositions.
• the basecoat composition of this invention may contain other conventional ingredients commonly employed in compositions. These may be such things as pigments, plasticizers, surfactants, auxiliary solvents, perfumes, etc. Among the pigments that may be used, mention may be made of the D&C colors that are soluble in organic solvents. Typical of the plasticizers that can be incorporated in the present basecoat composition are dibutyl phthalate, dibutyl citrate, etc. As a suitable surfactant for these purposes is sorbitan trioleate.
• nail lacquer compositions Of special utility in connection with the present basecoat compositions are the photocurable nail lacquer compositions described in Applicants copending application Ser. No. 370,071, filed June 14, 1973 which is incorporated herein by way of reference.
• These nail lacquer compositions comprise generally a photocurable liquid system containing as essential ingredients at least one polyene, polythiol, photocuring rate accelerator, and one or more of a class of special surfactants described in more detail below.
• This liquid system is adopted to form cohesive film when applied to human nails and exposed to actinic light and particularly ultraviolet light (e.g. 3660A).
• the aforesaid photocurable nail lacquer compositions are particularly suited for use with the present basecoat compositions because their mode of application and composition are such that they do not mix with the layer of basecoat that is previously laid down on the nails. Because of this, there is no interference with the capability of releasing the basecoat from the nails by the simple expedient of soaking the coated nails in warm water. This is to be contrasted with the situation in which an attempt would be made to use one of the prior art nail lacquers in conjunction with the present basecoats e.g. nitrocellulose in an organic solvent system. In this case, the application of the nail lacquer to the basecoat causes the softening of the basecoat and a comingling of the layers. This seriously influences the ability to get release of the basecoat from the nails by soaking them in water.
• compositions which do not interfere with the curing process.
• the compositions may contain pigments, dyes, organic solvents (which serve as viscosity regulating agents), plasticizers, etc.
• auxiliary resins which do not interfere with the principal curing reaction. Since these compositions are subject to be cured by the action of light which may be initiated by opening and closing the container in which the material is stored, it is often advisable to add a stabilizing agent or system to the composition to prolong the shelf life of the product.
• the viscosity of these liquid photocurable nail lacquer compositions may vary somewhat. Generally, however, this will be in the range of from about 20 to 10,000 CPS at 25 to 28C using the Brookfield Model LV with Spindle 4 at 60 rpm. The preferred viscosity is about 4300 CPS at 27C.
• the viscosity of the system may be varied by means of a viscosity modifier (e.g. ethyl acetate, ethanol, isopropyl alcohol, methanol, butyl acetate, glyme, diglyme, methyl ethyl ketone, diethyl ketone, acetone, toluene, and proprietary cosmetic solvents.
• a viscosity modifier e.g. ethyl acetate, ethanol, isopropyl alcohol, methanol, butyl acetate, glyme, diglyme, methyl ethyl ketone, diethyl ketone,
• the aforesaid polyene component may be represented by the formula:
• R is a radical selected from the group consisting of hydrogen, fluorine, chlorine, furyl, thienyl, pyridyl, phenyl' and substituted phenyl, benzyl and substituted benzyl, alkyl and substituted alkyl, alkoxy and substituted alkoxy, and cycloalkyl and substituted cycloalkyl.
• the substituentson the substituted members are selected from the group consisting of nitro, chloro, fluoro, acetoxy, acetamide, phenyl, benzyl, alkyl, alkoxy and cy-' cloalkyl.
• Alkyl and alkoxy have froml to 9 carbon atoms and cycloalkyl has from 3 to 8 carbon atoms.
• the members (a) to (e) are connectedv to [A] through divalent chemically compatible derivative members.
• the members (a) to (e) maybe connected to [A] through a divalent chemically compatible derivative member of the group consisting of Si(R) carbonate, carboxylate, sulfone, O-,
• B is a member of the group'consisting of 'O, S, and NR.
• the member [A] is polyvalent; free of reactive nonaromatic carbon to carbon unsaturation; free of highly water sensitive members; and consisting of atoms selected from the group consisting of carbon, oxygen, nitrogen, chlorine, bromine, fluorine, phosphorus, silicon and hydrogen.
• the polyene component has a molecular weight in the range from about 64 to 20,000, preferably about 200 to about 10,000; and a viscosity in the range from essentially 0 to 20 million centipoises at 70C, as measured by a Brookfield Viscometer.
• the member [A] of the polyene composition may be formed primarily of alkyl radicals, phenyl and urethane derivatives, oxygenated radicals, and nitrogen substituted radicals.
• the member [A] may also be represented by the formula:
• R is a member of the group consisting of hydrogen, and alkyl having 1 m9 carbon atoms; R is a member of the group consisting of hydrogen and saturated alkyl having 1 to 9 carbon atoms; R, is a divalent derivative of the group consisting of phenyl, benzyl, alkyl, cycloalkyl, substituted phenyl, substituted benzyl, substituted alkyl and substituted cycloalkyl; with the terms alkyl, cycloalkyl and members substituted being defined above.
• the polythiol component of said photocurable compositions are simple or complex organic compounds having a multiplicity of pendant or terminally positioned SH functional groups per average molecule.
• the polythiol must contain two or more Sl-l groups/molecule and have a viscosity range of essentially 0 to 20 million centipoises (cps) at 70C as measured by a Brookfield viscometer either alone or when in the presence of an inert solvent, aqu'eous dispersion or plasticizer.
• Operable polythiols employed herein usually have molecular weights in the range about 50 to about 20,000 and preferably from about 100 to about 10,000.
• the polythiols used herein may be exemplified by the general formula R,,--(Sl-l wherein n is at least 2 and R, is a polyvalent organic moiety free from reactive non-aromatic carbon to carbon unsaturation.
• R may contain cyclic groupings and hetero atoms such as N, P or O and primarily contains carbon-carbon, carhon-hydrogen, carbon-oxygen, or silicon-oxygen containing chain linkages free of any reactive nonaromatic carbon to carbon unsaturation.
• polythiol having the general struc- 'ttll'el RmiH-Rg-SH
• polythiol compounds preferred because of relatively low odor level include but are not limited to esters of thioglycollic acid (HSCH COOH), a-mercaptopropionic acid (HSCH(CH )COOH)and B-mercaptopropionic acid HS(CH CH COOH) with polyhy- 5 droxy compounds such as glycols, triols, tetraols, pentaols, hexaols, and the like.
• polythiols include but are not limited to ethylene glycol bis (thioglycolate), ethylene glycol bis(B- mercaptopropionate), trimethylolpropane tris(thioglycolate), trimethylolpropane tris (B-mercaptopropionate), pentaerythritol tetrakis (thioglycolate), pentaerythritol tetrakis (B-mercaptopropionate), all of which are commercially available and dipentaerylthritol hexakis (B-mercaptopropionate).
• polypropylene ether glycol bis([3-mercaptopropionate) which is prepared from polypropylene ether glycol (e.g. Pluracol P201, Wyandotte Chemical Corp.) and B- mercaptopropionic acid by esterification.
• the preferred polythiol compounds are characterized by a low level of mercaptan-like odor initially, and after reaction, give essentially odorless polythioether end products which are commercially attractive and practically useful resins or elastomers.
• polythiol component Also of use as the polythiol component is a class of isocyanurate containing polythiols described in U.S. Pat. No. 3,676,440. These are defined generally by the formula:
• tris(2-mercaptoethoxyethyling compounds tris(3-mercaptopropionate)ester of tris(2-mercaptoethyl)isocyanurate; )isocyanurate; tris(2-thiocarboxyethyl)isocyanurate; tris(2-mercaptoethyl)ester of tris(2ecarboxyethyl- )isocyanurate; tris(l 1-mercaptoundecanoate)ester of tris( 2-hyd roxyethyl )isocyanurate; tris( 3 -mercaptopropionate)ester of tris(2-hydroxypropyl)isocyanurate; and tris(Z-mercaptopropionate)ester of tris(Z-hydroxyethyl)isocyanurate.
• polyenes and polythiols are of special interest and are preferred in the practice of the present invention. These are given below together with a short statement of how they may be prepared. For convenience of identification, these materials are given a Polythiol or a Polyene number.
• Polythiols Polyenes Polyene No. 1 This polyene is a tri-ene. It is made from allyl alcohol, malic acid and toluene diisocyanate. To prepare the polyene, one first reacts 2 moles of allyl alcohol with malic acid to give the diallyl malate ester. Separately, one then reacts 1 mole of allyl alcohol with 1 mole of toluene diisocyanate in such a way as to form the mono-adduct of these two compounds with the structure:
• Polyene No. 2 This polyene is a tetraene. It is made from allyl alcohol, malic acid, and toluene diisocyanate (TDI).
• Either the 2,4 or the 2,6 TDI isomer may be used or mixtures thereof.
• To prepare the polyene one first prepares diallyl malate by esterification. Two moles of diallyl malate ester are then reacted with 1 mole of TDI to give the product. A small amount of dibutyltin dilaurate is used as a catalyst.
• Polyene No. 2 has the following structure:
• Polyene No 2 Polyene No. 3 This polyene is a diene. It is made from bisphenol A and allyl chloride by standard etherification techniques. The structure is:
• the polyene is prepared by reacting 2 moles of diallyl malate with one mole of isophorone diisocyanate in the presence of small amounts of dibutyltin dilaurate catalyst.
• the polyene is tetrafunctional and has the following structure:
• Polyene No. 5 This polyene is a diene. It is made from TDI and allyl alcohol. Two moles of allyl alcohol are reacted with one mole of TDI in the presence of small amounts of dibutyltin dilaurate catalyst.
• the polyene has the following structure:
• Polyene No. 6 This polyene is a tri-ene. It is triallylisocyanurate. Its structure is as follows:
• the individual polyenes and polythiols Accordingly, the molar ratio of the polythiol to polyene must have a functionality of at least 2 and the sum of will ordinarily be in the range of from about 0.50: l .0 to the functionalities of the polyene and polythiol compol.5:l.0 and preferably in the range of from about nents must always be greater than 4.
• Conventional curing inhibitors or retarders may be 'A third s nti l component f h h bl used in order to stabilize the components or curable composition used herein is the photocuring rate accelcompositions so as to pr n premature onset of curerator.
• the photocuring rate accelg- may be present as a separate and distinct combutyl catecbol; 2,6-di tert.-butyl-p-methylphenol; phepound such as azobenzene, as a mixture of two or more notbialine; -p y p yl min e t gas at separate components, such as benzophenone; benzan- Spheres such as helium, argon, nitrogen and carbon throne; anthrone, and dibenzosuberone; carbon tetradioxide.
• hydroquino P- erator may be present as a separate and distinct combutyl catecbol; 2,6-di tert.-butyl-p-methylphenol; phepound such as azobenzene, as a mixture of two or more notbialine; -p y p yl min e t gas at separate components, such as benzophenone; benzan- Spheres such as heli
• a fourth component of the photocurable nail lacquer cally combined form within the molecular structure of composition employed herein is one or more of a cereither the polyene or the polythiol.
• An example of this tain class of certain specific surfactants are sorbitan sesquitor is present not as a separate component but rather in, oleate, sorbitan dioleate, sorbitan trioleate, pentaerytha form chemically combined within the polyene comritol dioleate, and pentaerythritol trioleate.
• the polyene, the polydimethyl ammonium chloride; quaternary thiol or the photocuring rate accelerator may be imidazolinium salt (from stearic acid); glyceryl monoformed in situ in the photocurable composition without oleate; glyceryl dioleate; glyceryl trioleate and polyglydeparting from the spirit of this invention. cerol ester of oleic acid.
• surfactant component which may be rate accelerators such as benzophenone, acetopheincorporated into the present photocurable liquid comnone, acenapthene-quionone, o-methoxy benzophenone, thioxanthen-9-one, xanthen-9-one, 7-H-Benzposition may vary somewhat. Ordinarily, it will constitute between about .5% to 1.0% based on the total [de]anthracen-7-one, dibenzosuberone, l-napthweight of the composition.
• thaldehyde, 4,4-bis(dimethylamino) benzophenone The basecoat compositions of the present invention fluorene-9-one, l'-acetonaphthone, 2'-acetonaphare applied in any suitable fashion. Ordinarily, it will be thone, anthraquinone, l-indanone, 2-tert.-butyl anthrabrushed on or wiped on and allowed to air dry. This will quinone, valerophenone, hexanophenone, 8-phenylso usually take about 30 seconds to a minute.
• the photopholino-benzophenone, 4-morpholinodeoxybenzoin, curable lacquer can then be applied with a brush or a pdiacetylbenzene, 4-aminobenzophenone, 4'-methox porous tipped applicator.
• the lacquer should be apyacetophenone, benzaldehyde, a-tetralone, 9-acetylphenanthrene, Z-acetylphenanthrene, IO-thioxantheplied carefully.
• Preferred phosource wherein the wave length of the light is primarily tocuring rate accelerators are the aldehyde and ketone about 3660A.
• the coated nails may be exposed to this cleus attached directly to the light for a period of from 10 seconds to 15 minutes. This is adequate time to cure the nail lacquer composi E tion to a suitable hardness and finish.
• a typical light source is a mercury arc lamp of low or medium pressure type with a suitable phosphor for low pressure arc group benzophenonetube to yield sufficient radiation in 3660A radiation.
• EXAMPLE B-6 Gantrez AN 139 (methyl vinyl ether/ maleic anhydride copolymer 1:1 molar v 1. The nails are placed in hot water; gggg 1- 5001000) :8
• Peeling EXAMPLE 13-7 The following Examples are further illustrative of the present invention. It is to be understood, however, that z g L g'ggg gggiiflf they arenot limitative of this invention. All percentages 10 l 10 are given below in terms of percent by weight, unless f zg f p gg gg gy l I 8110 ISO ropano otherw1se specified.
• nail lacquer compositions EXAMPLE B-Z Below are Examples of nail lacquer compositions Amphomer 28 4910 20 which may be used in conjunction with the basecoat gzgggghg 30 compositions of this invention.
• EXAMPLE B-4 Ingredient Percent National Starch Resyn 28-2930 0 40 2 (terpolymer crotonic acid (10%) y 1 43-20 mixture of vinyl acetate and gegzophgnone vinyl ester of C -C fatty S y i q J2 acids (90%) mole percent 10 of TnOleate Ethanol 90 Rubme Lake .95 pmcedu'e t c (Cl 38 01 73360) D Red No. s as Example 45 1 D&C Yellow No. 5 01 19140 .13 EXAMPLE Titanium Dioxide .85
• Gantrez AN 119 (methyl vinyl ether/ maleic anhydride copolymer 1:1 molar relationship MW. 250,000) 20
• the followmg Examples are g1ven in tabular form. Acetone g0
• the formulas were compounded using the same proce- Pmcedgrel E I B l dure described in Example L-l. Similar results were ame as xamp e obtained Table 1 by weight Ingredients 'Ex. L-2 Ex. L-3 Ex. L-4 Ex. L-S Ex. L-6 Ex. L-7 Ex. L-8 Ex. L-9 Ex. L-10 Polyene N0. 2 48.178 48.298 48.30 48.44 48.25 47.75 '-''---'L Polythiol No.
• compositions are prepared using the procedure given in Example L-l
• percentages of polyene l and polythioi contained in the composition are given as polythiol to polyene 1.6. the molar ratio of unsaturated the combined weight of polyene and polythiol, the groups to SH groups.
• the nails were soaked in hot water for approximately four minutes. The nails were removed from the water and the lacquer was peeled off. If there is any resistance to peeling, the nails are soaked for a longer period of time.
• Example M-l The same procedure of Example M-l is used in connection with all of the basecoats B-l to B-4 and 8-6 to B-8 described above in combination with each of the nail lacquers L-2 to L-32 also described above. The results obtained are similar to those obtained with basecoat B-5 and nail lacquer L-l.
• a method for coating human nails with compositions that are adopted to be readily removable from the nails by soaking the nails in water which comprises:
• R is hydrogen, alkyl, phenyl, halide or pyrrolidonyl (ii).
• R is hydrogen, alkyl, phenyl, halide r -COOH;
• R is hydrogen, alkyl, carboxyalkyl, phenyl or halide
• X is hydrogen, -COO alkyl, COOH, 0 alkyl,
• watersoluble polymer is a copolymer of vinyl pyrrolidone and vinyl acetate.
• watersoluble polymer is a copolymer of methyl vinyl ether and maleic anhydride.
• said watersoluble polymer is a terpolymer of crotonic acid, vinyl acetate and a vinyl ester of a higher fatty acid having from C -C carbons.
• liquid photocurable nail lacquer comprises a liquid composition containing a polyene component, a polythiol component and a photocuring rate accelerator.
• liquid photocurable nail lacquer composition also contains a surfactant selected from the group consisting of sorbitan sesquioleate, sorbitan dioleate, sorbitan trioleate, pentaerythritol dioleate, pentaerythritol trioleate, glyceryl monooleate, gylceryl dioleate, glyceryl trioleate, polyglycerol ester of oleic acid, alkenyldimethylethyl ammonium bromide, di coco dimethyl ammonium chloride, and quaternary imidazolinium salt.
• a surfactant selected from the group consisting of sorbitan sesquioleate, sorbitan dioleate, sorbitan trioleate, pentaerythritol dioleate, pentaerythritol trioleate, glyceryl monooleate, gylceryl dioleate, glyce
• said polyene component is a terminally unsaturated polyene which comprises the formula: ti l-i wherein m is an integer of at least 2, wherein X is R I U wherefis an integer from 1 to 9; R is a radical selected from the group consisting of hydrogen, fluorine, chlorine, furyl, thienyl, pyridyl, phenyl and substituted phenyl, benzyl and substituted benzyl, alkyl and substituted alkyl, alkoxy and substituted alkoxy, cycloalkyl and substituted cycloalkyl; said substituents on said substituted members being selected from the group consisting of nitro, chloro, fluoro, acetoxy, acetamide, phenyl, benzyl, alkyl, alkoxy and cycloalkyl; said alkyl and alkoxy having from 1 to 9 carbon atoms and said cycloalkyl having from 3 t0 8 carbon atoms;
• said polythiol component has a molecular weight in the range from about 50 to about 20,000 and is of the general formula:
• R is a polyvalent organic moiety free from reactive non-aromatic carbon to carbon unsaturation and n is at least 2, the sum of m and n being greater than 4, with the ene/thiol mole ratio being selected so as to provide a cross-linked solid, self-supporting cured product.
• liquid photocurable nail lacquer composition additionally contains a photocuring rate accelerator selected from the group consisting of aryl aldehyde, diaryl ketone, alkyl aryl ketone, triaryl phosphine and a blend of carbon tetrahalide with polynuclear aromatic hydrocarbon.
• a photocuring rate accelerator selected from the group consisting of aryl aldehyde, diaryl ketone, alkyl aryl ketone, triaryl phosphine and a blend of carbon tetrahalide with polynuclear aromatic hydrocarbon.
• liquid photocurable nail lacquer composition contains from about 0.5% to 1.0% by weight of said surfactant, about l% to 10% by weight of said photocuring rate accelerator and from about 1% to about 98.5% by weight of a mixture of said polythiol and said polyene, the molar ratio of polythiol to polyene in said mixture being in the range of about .50:l.0 to 1.5110.
• a method according to claim 10 wherein said polyene is CH n 2 OH r CH ll CH 12.
• polythiol is tris(2-hydroxyethyl)isocyanurate tris (B- mercaptopropionate).
• polythiol is trimethylolpropane tris (B-mercaptopropionate).
• polythiol is dipentaerythritol hexakis (B-mercaptopropionate).
• polythiol is trimethylolpropane tris (Ii-mercaptopropionate).
• a method according to claim 10 wherein said polyene is 32.
• a method according to claim 31 wherein said polythiol is pentaerythritol tetrakis (Ii-mercaptopropionate).
• polythiol is tris (2-hydroxyethyl)isocyanurate tris (B- mercaptopropionate).
• polythiol is trimethylolpropane tris (B-mercaptopro-' c- CH -CH CH CH CH-CH 37.
• polythiol is pentaerythritol tetrakis (B-mercaptopropionate).
• a method for removing from human nails the nail covering applied by the method of claim 1 which comprises soaking said covered nails in water for a period of from 3 to 6 minutes until said water-soluble film has sufficiently swelled to lift said nail covering from said nails and then stripping said nail covering from said nails.

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Citations (6)

• 1973
  • 1973-10-24 US US40935973 patent/US3928113A/en not_active Expired - Lifetime
• 1974
  • 1974-05-07 CA CA199,184A patent/CA1034503A/en not_active Expired
  • 1974-05-10 AU AU68818/74A patent/AU6881874A/en not_active Expired
  • 1974-05-21 JP JP5620674A patent/JPS5019941A/ja active Pending
  • 1974-06-07 FR FR7419682A patent/FR2241290B3/fr not_active Expired
  • 1974-06-11 NL NL7407775A patent/NL7407775A/xx unknown
  • 1974-06-11 FI FI178274A patent/FI178274A/fi unknown
  • 1974-06-11 DE DE19742428172 patent/DE2428172A1/de active Pending
  • 1974-06-12 BR BR482574A patent/BR7404825D0/pt unknown
  • 1974-06-12 NO NO742124A patent/NO742124L/no unknown
  • 1974-06-13 DK DK316474A patent/DK316474A/da unknown
  • 1974-06-14 SE SE7407903A patent/SE7407903L/xx unknown

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