US3865702A - Galvanic nickel bath for depositing silk-dull nickel coats - Google Patents
Galvanic nickel bath for depositing silk-dull nickel coats Download PDFInfo
- Publication number
- US3865702A US3865702A US334298A US33429873A US3865702A US 3865702 A US3865702 A US 3865702A US 334298 A US334298 A US 334298A US 33429873 A US33429873 A US 33429873A US 3865702 A US3865702 A US 3865702A
- Authority
- US
- United States
- Prior art keywords
- nickel
- galvanic
- bath
- dull
- coats
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 43
- 238000000151 deposition Methods 0.000 title description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims abstract description 13
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 11
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 4
- -1 nickel fluorborate Chemical compound 0.000 claims description 4
- 150000002815 nickel Chemical class 0.000 claims description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 3
- 229940081974 saccharin Drugs 0.000 claims description 3
- 235000019204 saccharin Nutrition 0.000 claims description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims 1
- 150000003014 phosphoric acid esters Chemical group 0.000 abstract description 7
- 229920000233 poly(alkylene oxides) Polymers 0.000 abstract description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 abstract description 4
- 230000001376 precipitating effect Effects 0.000 abstract description 3
- 150000003839 salts Chemical class 0.000 abstract description 3
- 150000001450 anions Chemical class 0.000 abstract description 2
- 239000002932 luster Substances 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 238000007792 addition Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005246 galvanizing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229960004063 propylene glycol Drugs 0.000 description 3
- 235000013772 propylene glycol Nutrition 0.000 description 3
- 241000272534 Struthio camelus Species 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical class C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 150000004653 carbonic acids Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical class CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- ABSTRACT A galvanic nickel bath for precipitating silk-dull nickel coats, which includes anion active primary and/or secondary phosphoric acid esters of polyalkylene oxide adducts adapted to be produced from ethylene oxide and/or propylene oxide and/or butylene oxide, or of the salts of such propylene oxide aclducts.
- the present invention relates to a galvanic nickel bath for precipitating dull, glare or dazzle free nickel coats with a certain content of basic luster substances.
- the production of articles the surface of which is made glare-free by the galvanic precipitation of silk-dull nickel coats is to an ever increasing extent requested by consumers in a wide range of technical fields.
- a silkdull nickel coat is characterized by a velvet-like luster and by a reduced reflection as compared to nickel coats having a high luster and strong reflection.
- the bath contains such substituted or non-substituted ethylene oxide or propylene oxide or ethylene oxidepropylene oxide adducts in a concentration of from 5 100 mg/l which at a temperature of from 40 75C form a finely dispersed emulsion in the bath electrolyte.
- addition compounds include, for instance, the high molecular polyethylene oxides, polypropylene oxides, mixing adducts of ethylene oxide and propylene oxide, addition compounds of ethylene oxide and propylene oxide or ethylene oxide and propylene oxide in any desired sequence on one or multi-valent saturated and unsaturated straight chained and branch chained aliphatic, cycloaliphatic, aromatic and heterocyclic-alcohols, ethyl hydrosulfides (mercaptanes), aldehydes, ketones, acetals, amines, carbonic acids, carbonic acid amides and phenols.
- the high molecular polyethylene oxides polypropylene oxides
- mixing adducts of ethylene oxide and propylene oxide addition compounds of ethylene oxide and propylene oxide or ethylene oxide and propylene oxide in any desired sequence on one or multi-valent saturated and unsaturated straight chained and branch chained aliphatic, cycloaliphatic, aromatic and heterocyclic-al
- composition of the customary nickel baths which consists of nickel salts, such as nickel chloride, nickel sulfate, nickel fluorborate or nickel sulfamate and customarily contains a buffer, such as boric acid.
- nickel salts such as nickel chloride, nickel sulfate, nickel fluorborate or nickel sulfamate
- a buffer such as boric acid.
- a frequently employed bath is the so-called Watt-bath with nickel chloride, nickel sulfate and boric acid.
- the galvanic nickel bath contains anionactive primary and/or secondary phosphoric acid esters of polyalkylene oxide adducts adapted to be produced from ethylene oxide and/or propylene oxide and/or butylene oxide, or :by the fact that the galvanic nickel bath contains the salts of such polyalkylene oxide adducts.
- the present invention concerns the teaching that anionactive primary and secondary phosphoric acid esters of polyalkylene oxide adducts prepared by the known reaction of polyalkylene adducts and P 2 O 5 when added to nickel baths containing basic luster substances, especially nickel baths of the Watt-type, during the galvanizing process will yield silk-dull nickel deposits.
- polyalkylene oxide adducts intended for reaction with P 2 O there are meant addition compounds of ethylene oxide, propylene oxide, butylene oxide or mixtures of these alkylene oxides in any desired sequence with low molecular organic compounds.
- ethyleneglycol, propyleneglycol, ethyleneglycol, etc. which with reference to active hydrogen represent bior polyfunctional low molecular organic compounds.
- the galvanic nickel bath according to the invention contains the phosphoric acid esters in a con centration of from 20 8O mg/l.
- the galvanic nickel bath according to the present invention makes possible the generation of a silky luster on articles in the form of a uniform coat even when low and very low current densities are involved. Black deposits do not occur so that above all with highly profiled and curved workpieces to be coated considerable advantages are realized by the present invention over the state of the art as it existed prior to the invention.
- a galvanic nickel bath according to claim 1 which contains 1 g/l of saccharin.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Paints Or Removers (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE794695D BE794695A (fr) | 1972-01-29 | Bain galvanique de nickel pour la separation de revetements de nickel satines mats | |
| DE19722204171 DE2204171B2 (de) | 1972-01-29 | 1972-01-29 | Galvanisches nickelbad zur abscheidung seidenmatter nickelueberzuege |
| AT74273A AT317625B (de) | 1972-01-29 | 1973-01-29 | Galvanisches Nickelbad zur Abscheidung seidenmatter Nickelüberzüge |
| GB445273A GB1376552A (en) | 1972-01-29 | 1973-01-29 | Electrolytic nickel bahts |
| FR7303080A FR2169404B1 (enrdf_load_stackoverflow) | 1972-01-29 | 1973-01-29 | |
| US334298A US3865702A (en) | 1972-01-29 | 1973-02-21 | Galvanic nickel bath for depositing silk-dull nickel coats |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722204171 DE2204171B2 (de) | 1972-01-29 | 1972-01-29 | Galvanisches nickelbad zur abscheidung seidenmatter nickelueberzuege |
| US334298A US3865702A (en) | 1972-01-29 | 1973-02-21 | Galvanic nickel bath for depositing silk-dull nickel coats |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3865702A true US3865702A (en) | 1975-02-11 |
Family
ID=25762635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US334298A Expired - Lifetime US3865702A (en) | 1972-01-29 | 1973-02-21 | Galvanic nickel bath for depositing silk-dull nickel coats |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3865702A (enrdf_load_stackoverflow) |
| AT (1) | AT317625B (enrdf_load_stackoverflow) |
| BE (1) | BE794695A (enrdf_load_stackoverflow) |
| DE (1) | DE2204171B2 (enrdf_load_stackoverflow) |
| FR (1) | FR2169404B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1376552A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5897763A (en) * | 1995-10-27 | 1999-04-27 | Lpw-Chemie Gmbh | Method of electroplating glare-free nickel deposits |
| EP1424407A1 (en) * | 2002-11-26 | 2004-06-02 | Furukawa Circuit Foil Co., Ltd. | Plating bath for forming thin resistance layer, method of formation of resistance layer, conductive base with resistance layer, and circuit board material with resistance layer |
| US20050056542A1 (en) * | 2003-07-04 | 2005-03-17 | Seiko Epson Corporation | Plating tool, plating method, electroplating apparatus, plated product, and method for producing plated product |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
| US2986500A (en) * | 1959-04-21 | 1961-05-30 | Metal & Thermit Corp | Electrodeposition of bright nickel |
| US3084111A (en) * | 1958-04-24 | 1963-04-02 | Dehydag Gmbh | Wetting agents for electroplating baths |
-
0
- BE BE794695D patent/BE794695A/xx unknown
-
1972
- 1972-01-29 DE DE19722204171 patent/DE2204171B2/de active Granted
-
1973
- 1973-01-29 FR FR7303080A patent/FR2169404B1/fr not_active Expired
- 1973-01-29 GB GB445273A patent/GB1376552A/en not_active Expired
- 1973-01-29 AT AT74273A patent/AT317625B/de not_active IP Right Cessation
- 1973-02-21 US US334298A patent/US3865702A/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
| US3084111A (en) * | 1958-04-24 | 1963-04-02 | Dehydag Gmbh | Wetting agents for electroplating baths |
| US2986500A (en) * | 1959-04-21 | 1961-05-30 | Metal & Thermit Corp | Electrodeposition of bright nickel |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5897763A (en) * | 1995-10-27 | 1999-04-27 | Lpw-Chemie Gmbh | Method of electroplating glare-free nickel deposits |
| EP1424407A1 (en) * | 2002-11-26 | 2004-06-02 | Furukawa Circuit Foil Co., Ltd. | Plating bath for forming thin resistance layer, method of formation of resistance layer, conductive base with resistance layer, and circuit board material with resistance layer |
| US20040144656A1 (en) * | 2002-11-26 | 2004-07-29 | Akira Matsuda | Plating bath for forming thin resistance layer, method of formation of resistance layer, conductive base with resistance layer, and circuit board material with resistance layer |
| CN100466881C (zh) * | 2002-11-26 | 2009-03-04 | 古河电路铜箔株式会社 | 附带电阻层的铜箔及附带电阻层的电路基板材料 |
| US7794578B2 (en) | 2002-11-26 | 2010-09-14 | The Furukawa Electric Co., Ltd. | Method for preparing a circuit board material having a conductive base and a resistance layer |
| US20050056542A1 (en) * | 2003-07-04 | 2005-03-17 | Seiko Epson Corporation | Plating tool, plating method, electroplating apparatus, plated product, and method for producing plated product |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2169404A1 (enrdf_load_stackoverflow) | 1973-09-07 |
| GB1376552A (en) | 1974-12-04 |
| BE794695A (fr) | 1973-05-16 |
| AT317625B (de) | 1974-09-10 |
| FR2169404B1 (enrdf_load_stackoverflow) | 1975-10-31 |
| DE2204171A1 (de) | 1973-08-16 |
| DE2204171B2 (de) | 1976-07-22 |
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