US3814829A - Device for electron-beam heating of materials mainly for their melting and evaporation - Google Patents
Device for electron-beam heating of materials mainly for their melting and evaporation Download PDFInfo
- Publication number
- US3814829A US3814829A US00276037A US27603772A US3814829A US 3814829 A US3814829 A US 3814829A US 00276037 A US00276037 A US 00276037A US 27603772 A US27603772 A US 27603772A US 3814829 A US3814829 A US 3814829A
- Authority
- US
- United States
- Prior art keywords
- electron
- magnetic circuit
- ribbon
- coils
- cores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Definitions
- ABSTRACT t .r 'i t r Lgkvymheslav A device which relates to devices for f :11 I xa I vacuum-heating of materials.
- the device for electronk g f g g beam heating of'materials. preferably for their melting O f and evaporation comprises an electron-beam gun [22] Filed: July 28, 1972 forming a ribbon electron beam; and 'an electromag- 3 netic system for controlling said ribbon electron beam App!
- the present invention relates generally to devices for heating materials in a vacuum and more particularly, it
- a serious disadvantage of the devices lies also in the fact that the beam can be controlled only in one plane, which diminishes substantially the technological potentialities of the devices.
- the device comprises a single-unit elec tromagnetic ribbonbeam control system which enables v a slightly divergent sheet beam formed by the electronbeam gun to be deflected at an angle of up to 45 and to be concurrently focused and converted into a cylin drical beam, ensuring also correction of the beam path and its scanning in a plane perpendicular to the dellection plane.
- a device for electron-beam heating of materials comprising an electron-beam gun forming a ribbon electron beam and an electromagnetic system of control of said beam with a closed rectangular magnetic circuit having cores with deflection coils are arranged thereto, according to the invention. the latter being disposed on the long opposing cores of the closed magnetic circuit, the short-opposing cores ofsaid magbeam.
- the opti- I mutn length ratio of the cores can be within the range
- the deflection coils as well as those for correction and scanning are advisable to be coupled with each other in series.
- Fine focusing of the deflected beam during its conversion into a cylindrical one or its focusing into a nar row long focal spot is performed by changing the ampere-turn ratio in these coils by connecting by-pass adjustable resistors to them so as to produce a nonuniform magnetic field of a requisite shape.
- the neutral point of the series-connected COIIS is advisable to be provided with a lead-out.
- the correction and scanning coils can be coupled to a DC. current supply with an A.C. component having a pre-set amplitude and frequency.
- the device accomplished in conformity with the present invention has proved successful in solving a number of major technological problems encountered in the melting and evaporation of both metallic and non-metallic materials; a relatively small increase in only one dimension of the device (by increasing only the length of a linear emitter) enables the rated power ofthe device to be enhanced up to 400-500 kW with the accelerating voltages not exceeding 20 kV.
- FIG. I is a sectional view of the device layout, according to the invention.
- FIG. 2 depicts an electromagnetic system of the device, according to the invention, the shape of magnetic field and projections of three representative paths of the elements of a slightly divergent electron ribbon beam;
- FIG. 3 is a wiring diagram of the coils of the electromagnetic system of said device.
- each of the two deflection coils 9 and 10 (FIG. 3) and correction and scanning coils II and 12 disposed accordingly on the between the cores and are directed across the incoming 3 ribbon beam.
- the length ratio between the short and long cores of the magnetic circuit 8 is chosen within the range of
- the slightly divergent ribbon beam 7 focused by the electron-beam gun and passing in the beam guide 5 is rectangular in cross-section (FIG. 2).
- the electrons passing in the transverse magnetic field of the deflection coils 9 and'l0, indicated in FIG. 2 by solid lines, are deflected at right angles to the intensity vector of the magnetic field.
- the sheet beam Due to a certain curvature of magnetic force lines depending to a considerable degree on geometric dimensions of the rectangular magnetic circuit with the foregoing coils disposed on it, the sheet beam, on being deflected, is subject to the condenser effect directed to the middle deflection plane having a projection as shown by a straight line AB.
- FIG. 2 depicts the projections of the representative paths of the ribbon electron beam onto a focal plane which in this case is a horizontal plane being level. with the point of collision between the beam and the object being heated.
- the electrons are deflected in the middle plane AB.
- the electron path projections of these representative points are shown by the straight lines bb, mm", aa' and nn.
- the electrons which have first reached into a convex field will move along the path cc and then, on being deflected into the concave field arc, are subjected within it to a prolonged effect and will follow the path shown ..by the linefc'cf directed also toward the plane AB.
- Such interaction between the slightly divergent sheet electron beam with the magnetic field under consideration results in its deflection accompanied by a concurrent conversion of the sheet beam-into a cylindrical one and by its focusing into a focal spot 15 on the object being heated.
- Decrease of the focal spot l5 along the axis CD and its increase along the axis AB is achieved by attenuation of the field of the deflection coil 10 which is ef-- fected by bypassing its turns with the aid of the adjustable resistor R (FIG. 2).
- Decrease of the focal spot 15 along the axisAB and its increase along the axis CD is effected by attenuation of the field of the deflection coil 9 by bypassing it with the aid of the adjustable resistor R Correction (displacement) and scanning of the beam 7 along the axis CD are effected by the transverse field of the coils 11 and 12 shown in FIG. 2 by dotted lines.
- Concurrent correction and scanning is achieved by 1 feeding the coils 11 and 12 with a direct current from a power supply E with an A.C. component of a pre-set amplitude and frequency.
- a device for electron-beam heating of materials mainly for their melting and evaporation, said device comprising: 4
- an electron-beam gun means forming a ribbon electron-beam and including an anode unit with an accelerating anode; an electromagnetic system including a closed magnetic circuit having a rectangular shape, said electromagnetic system beingdisposed in said anode 1 unit directly behind said accelerating anode for converting said ribbon electron-beam into a cylin- 'drical one; deflection coil means disposed on the long opposing cores of said rectangular magnetic circuit associated electrically with each other for deflecting said ribbon electronbeam in a plane perpendicular to-the plane of the beam, and correcting and scanning coil means disposed on the short opposing cores of said rectangular magnetic circuit and electrically associated with each other for deflecting said ribbon electron-beam over the surface of the material being heated.
- an eleetron-beanl gun means forming a ribbon clcctrotfbcam; an electromagnetic system including a closed magnetic circuit having a rectangular shape for controlling said ribbon electron-beam; deflection coil means disposed on the long opposing cores of said rectangular magnetic circuit associated electrically with each other for deflecting said ribbon electron-beam-in a plane perpendicular to the plane ofthe beam, said deflection coil means including coils which are series-connected for defleeting said beam being formed said seriesconnected deflection coils having a lead-out-from-- their neutral point to which b y-pass adjustable re sistors are coupled for providing a line focusing of said beam being formed; and
- correcting and scanning coil means disposed on the short opposing cores of said rectangular magnetic circuit and electrically associated with each other and frequency.
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU711706901A SU370899A1 (ru) | 1971-10-26 | 1971-10-26 | Установка дл электроннолучевого нагрева материалов |
Publications (1)
Publication Number | Publication Date |
---|---|
US3814829A true US3814829A (en) | 1974-06-04 |
Family
ID=20490757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00276037A Expired - Lifetime US3814829A (en) | 1971-10-26 | 1972-07-28 | Device for electron-beam heating of materials mainly for their melting and evaporation |
Country Status (3)
Country | Link |
---|---|
US (1) | US3814829A (ru) |
FR (1) | FR2157832B1 (ru) |
SU (1) | SU370899A1 (ru) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2719725A1 (de) * | 1976-05-03 | 1977-11-17 | Inst Elektroswarki Patona | Einrichtung zur elektronenstrahlerwaermung von materialien |
US4315131A (en) * | 1978-10-30 | 1982-02-09 | The Electricity Council | Electron discharge heating devices |
US4341569A (en) * | 1979-07-24 | 1982-07-27 | Hughes Aircraft Company | Semiconductor on insulator laser process |
US4532888A (en) * | 1982-08-03 | 1985-08-06 | Bakish Materials Corp. | Electron-beam coating of very broad strips |
DE3532888A1 (de) * | 1985-09-14 | 1987-04-02 | Leybold Heraeus Gmbh & Co Kg | Anordnung zur regelung der ablenkung eines elektronenstrahls |
US4731537A (en) * | 1985-06-13 | 1988-03-15 | Sony Corporation | Electron beam gun |
US5346554A (en) * | 1990-04-12 | 1994-09-13 | Seiko Instruments Inc. | Apparatus for forming a thin film |
US20090090876A1 (en) * | 2007-10-08 | 2009-04-09 | Advanced Ion Beam Technology, Inc. | Implant beam utilization in an ion implanter |
EP3396696A1 (en) * | 2017-04-27 | 2018-10-31 | Imatrex, Inc. | Compact deflecting magnet |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2495878A1 (fr) * | 1980-12-09 | 1982-06-11 | Dmitriev Stanislav | Dispositif pour irradier des objets par electrons |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3390222A (en) * | 1965-08-17 | 1968-06-25 | Air Reduction | Electron beam apparatus with variable orientation of transverse deflecting field |
US3622679A (en) * | 1970-09-29 | 1971-11-23 | Air Reduction | Heating system for electron beam furnace |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USB385358I5 (ru) * | 1935-10-31 | |||
GB612906A (en) * | 1946-06-06 | 1948-11-19 | Eric William Bull | Improvements in or relating to magnetic deflecting means for cathode ray tubes |
-
1971
- 1971-10-26 SU SU711706901A patent/SU370899A1/ru active
-
1972
- 1972-07-28 US US00276037A patent/US3814829A/en not_active Expired - Lifetime
- 1972-10-05 FR FR7235403A patent/FR2157832B1/fr not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3390222A (en) * | 1965-08-17 | 1968-06-25 | Air Reduction | Electron beam apparatus with variable orientation of transverse deflecting field |
US3622679A (en) * | 1970-09-29 | 1971-11-23 | Air Reduction | Heating system for electron beam furnace |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2719725A1 (de) * | 1976-05-03 | 1977-11-17 | Inst Elektroswarki Patona | Einrichtung zur elektronenstrahlerwaermung von materialien |
US4315131A (en) * | 1978-10-30 | 1982-02-09 | The Electricity Council | Electron discharge heating devices |
US4341569A (en) * | 1979-07-24 | 1982-07-27 | Hughes Aircraft Company | Semiconductor on insulator laser process |
US4532888A (en) * | 1982-08-03 | 1985-08-06 | Bakish Materials Corp. | Electron-beam coating of very broad strips |
US4731537A (en) * | 1985-06-13 | 1988-03-15 | Sony Corporation | Electron beam gun |
DE3532888A1 (de) * | 1985-09-14 | 1987-04-02 | Leybold Heraeus Gmbh & Co Kg | Anordnung zur regelung der ablenkung eines elektronenstrahls |
US5346554A (en) * | 1990-04-12 | 1994-09-13 | Seiko Instruments Inc. | Apparatus for forming a thin film |
US7772571B2 (en) | 2007-10-08 | 2010-08-10 | Advanced Ion Beam Technology, Inc. | Implant beam utilization in an ion implanter |
US20090090876A1 (en) * | 2007-10-08 | 2009-04-09 | Advanced Ion Beam Technology, Inc. | Implant beam utilization in an ion implanter |
EP3396696A1 (en) * | 2017-04-27 | 2018-10-31 | Imatrex, Inc. | Compact deflecting magnet |
CN108807119A (zh) * | 2017-04-27 | 2018-11-13 | 伊玛曲公司 | 紧凑型致偏磁体 |
US10290463B2 (en) | 2017-04-27 | 2019-05-14 | Imatrex, Inc. | Compact deflecting magnet |
US10332718B1 (en) | 2017-04-27 | 2019-06-25 | Imatrex, Inc. | Compact deflecting magnet |
RU2693565C1 (ru) * | 2017-04-27 | 2019-07-03 | Иматрекс, Инк. | Компактный отклоняющий магнит |
EP3537469A1 (en) * | 2017-04-27 | 2019-09-11 | Imatrex, Inc. | Compact deflecting magnet |
CN108807119B (zh) * | 2017-04-27 | 2022-01-21 | 伊玛曲公司 | 紧凑型致偏磁体 |
Also Published As
Publication number | Publication date |
---|---|
FR2157832B1 (ru) | 1976-03-26 |
DE2234378A1 (de) | 1973-05-03 |
SU370899A1 (ru) | 1979-04-05 |
DE2234378B2 (de) | 1975-10-02 |
FR2157832A1 (ru) | 1973-06-08 |
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