US3723260A - Acid nickel electroplating - Google Patents
Acid nickel electroplating Download PDFInfo
- Publication number
- US3723260A US3723260A US00226543A US3723260DA US3723260A US 3723260 A US3723260 A US 3723260A US 00226543 A US00226543 A US 00226543A US 3723260D A US3723260D A US 3723260DA US 3723260 A US3723260 A US 3723260A
- Authority
- US
- United States
- Prior art keywords
- acid
- alkyl
- acrylate monomer
- carbon atoms
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract description 53
- 238000009713 electroplating Methods 0.000 title abstract description 28
- 239000002253 acid Substances 0.000 title abstract description 27
- 229910052759 nickel Inorganic materials 0.000 title abstract description 26
- 239000000178 monomer Substances 0.000 abstract description 64
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 48
- 229920001577 copolymer Polymers 0.000 abstract description 22
- 238000000034 method Methods 0.000 abstract description 13
- 230000008569 process Effects 0.000 abstract description 13
- 229920001519 homopolymer Polymers 0.000 abstract description 12
- 229910052739 hydrogen Chemical group 0.000 abstract description 12
- 239000001257 hydrogen Chemical group 0.000 abstract description 12
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract description 10
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 abstract description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract description 9
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 abstract description 9
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 abstract description 9
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 abstract description 9
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 abstract description 9
- 150000004820 halides Chemical class 0.000 abstract description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000654 additive Substances 0.000 abstract description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 3
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical group [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 abstract 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 description 24
- 125000004432 carbon atom Chemical group C* 0.000 description 24
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 17
- 238000007747 plating Methods 0.000 description 10
- 125000005907 alkyl ester group Chemical group 0.000 description 8
- -1 aromatic sulfur compounds Chemical class 0.000 description 7
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 7
- 150000002431 hydrogen Chemical group 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 238000005282 brightening Methods 0.000 description 6
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 5
- 230000009471 action Effects 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 150000002815 nickel Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000011260 aqueous acid Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- IQDGSYLLQPDQDV-UHFFFAOYSA-N dimethylazanium;chloride Chemical compound Cl.CNC IQDGSYLLQPDQDV-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- JZMJDSHXVKJFKW-UHFFFAOYSA-M methyl sulfate(1-) Chemical compound COS([O-])(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-M 0.000 description 3
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- ITFGZZGYXVHOOU-UHFFFAOYSA-N n,n-dimethylmethanamine;methyl hydrogen sulfate Chemical compound C[NH+](C)C.COS([O-])(=O)=O ITFGZZGYXVHOOU-UHFFFAOYSA-N 0.000 description 2
- NTKVOMZTMDTAMB-UHFFFAOYSA-N n,n-dimethylprop-2-yn-1-amine;hydrobromide Chemical compound Br.CN(C)CC#C NTKVOMZTMDTAMB-UHFFFAOYSA-N 0.000 description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 235000019204 saccharin Nutrition 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- KLCKMAMMLDRAQP-UHFFFAOYSA-M 1-prop-2-enylpyridin-1-ium;bromide Chemical compound [Br-].C=CC[N+]1=CC=CC=C1 KLCKMAMMLDRAQP-UHFFFAOYSA-M 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- VXIVSQZSERGHQP-UHFFFAOYSA-N chloroacetamide Chemical compound NC(=O)CCl VXIVSQZSERGHQP-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ZOKQTSPYMNKPPN-UHFFFAOYSA-N diethyl(prop-2-ynyl)azanium bromide Chemical compound [Br-].C(C)[NH+](CC#C)CC ZOKQTSPYMNKPPN-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- IAGIRAMRPKZOQT-UHFFFAOYSA-N prop-2-enylazanium;bromide Chemical compound [Br-].[NH3+]CC=C IAGIRAMRPKZOQT-UHFFFAOYSA-N 0.000 description 1
- YORCIIVHUBAYBQ-UHFFFAOYSA-N propargyl bromide Chemical compound BrCC#C YORCIIVHUBAYBQ-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- YSJZWXFVNXMVCR-UHFFFAOYSA-M sodium;3-chlorobut-2-ene-1-sulfonate Chemical compound [Na+].CC(Cl)=CCS([O-])(=O)=O YSJZWXFVNXMVCR-UHFFFAOYSA-M 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 229920006029 tetra-polymer Polymers 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- ORGHESHFQPYLAO-UHFFFAOYSA-N vinyl radical Chemical compound C=[CH] ORGHESHFQPYLAO-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4407—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications with polymers obtained by polymerisation reactions involving only carbon-to-carbon unsaturated bonds
- C09D5/4411—Homopolymers or copolymers of acrylates or methacrylates
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
Definitions
- R is methyl or hydrogen
- n is a positive whole integer of 1 to 3 inclusive
- R is alkyl of 1 to 4 carbon atoms
- -R" is alkyl of 1 to 4 carbon atoms
- a copolymer of said acrylate monomer With at least one ethylenically unsaturated monomer selected from the group consisting of an a,,9-ethylenically unsaturated monocarboxylic acid, an alkyl ester of said acid wherein the alkyl group is from 1 to 4 carbon atoms, acrylonitrile, acrylamide, methacrylamide, vinyl acetate, vinyl sulfone and vinyl pyridine, the molar ratio of said acrylate monomer to said unsaturated monomer being within the range of 0.9:(11 to 0.1 :0.9.
- This invention relates to acid nickel electroplating baths and processes.
- Prior art 3,723,260 Patented Mar. 27, 1973 are generally divided into two classes on the basis of their predominant function.
- Primary brighteners are materials used in relatively low concentration which by themselves may or may not produce visible brightening action. However, some primary brighteners, when used alone, also produce some deletrious side eifects such as deposit brittleness, narrow bright plate range and skip plating at low current densities.
- Secondary brighteners are materials which are usually used in combination with primary brighteners, but at a higher concentration. Secondary brighteners, by themselves, may produce some brightening action, but the deposits are usually not mirror bright and the rate of brightening is usually inadequate.
- US. Pat. 2,647,866 (issued to Henry Brown on Aug. 4, 1953) discloses the use of various pyridinium compounds, e.g., N-allyl pyridinium bromide as primary additives for bright nickel plating.
- This patent also teaches the use of the pyridinium compounds in conjunction with organic sulfonic, sulfonamide and sulfonirnide compounds which are the subjects of US. Pats. 2,191,813 and 2,466,677 also issued to Henry Brown.
- the use of various acetylenic compounds, e.g., 2-butyne-1,4- diol, as primary brighteners again used in conjunction with aromatic sulfur compounds is the subject of U.S.. Pat.
- esters of unsaturated monocarboxylic acids e.g., methyl acrylate used as primary brighteners is the subject of US. Pat. 2,690,996 (issued to Henry Brown on Oct. 5, 1954)..
- an aqueous acid nickel electroplating bath comprising an aqueous solution of a nickel salt, said solution maintained at a pH in the range of about 3 to 5 and having dissolved therein as primary brightener in an elfective amount, an acrylate selected from the group consisting of (1) an acrylate monomer of the formula:
- R is methyl or hydrogen
- n is a positive whole integer of 1 to 3 inclusive
- R' is alkyl of 1 to 4 carbon atoms
- the invention pertains to the electro-deposition of nickel from aqueous, acidic nickel electroplating baths known to those skilled in the art. These baths are usually formed by the dissolution of at least one nickel salt in an aqueous, acid solution. Conventional baths and processes for electroplating bright nickel are described in Principles of Electroplating and Electroforming, Blum and Hogaboom, pages 362-381, revised third edition, 1949, McGraw-Hill, Inc., New York; and in Modern Electroplating, edited by A. G. Gray, The Electrochemical Society, 1953, pages 299-355. Operating conditions disclosed, including pH, temperature, current density and the concentration of bath ingredients are applicable to the present invention.
- the pH will be in the range of 3 to and usually 3.5 to 4.5, while the temperature will be in the range of 40 to 70 C. and usually 55 to 65 C.
- Practically all baths for electroplating bright nickel contain nickel sulfate; a chloride, usually nickel chloride; a buffering agent, usually boric acid; and optionally a wetting agent.
- Such baths include the well-known Watts bath and the high chloride bath.
- Other baths may contain, as the source of nickel, a combination of nickel fluoborate with nickel sulfate and nickel chloride, or a combination of nickel fluoborate with nickel chloride.
- Typical Watts baths and high chloride baths are as follows:
- the primary brighteners of the present invention may be used in concentrations ranging between about 0.001 to 5 g./l., preferably between about 0.002 to 2 g./l., the particular concentration used depending on the types and concentrations of secondary and secondary auxiliary brighteners used. Other factors to be considered are concentrations of the bath ingredients, bath operating conditions and the degree and rate of brightening and leveling desired.
- the primary brighteners of this invention are certain quaternized dialkylaminoalkylacrylate monomers and more particularly homopolymers of these monomers or copolymers of these monomers with other ethylenically unsaturated monomers.
- the quaternized dialkylaminoalkylacrylates used in this invention have the general formula:
- R is methyl or hydrogen
- n is a positive whole integer of l to 3 inclusive
- R is alkyl of 1 to 4 carbon atoms
- Z-methacryloxyethyl, dimethyl propargyl ammonium bromide which may be prepared by the addition of propargyl bromide to dimethylaminoethyl methacrylate in a suitable solvent.
- This monomer may be readily polymerized in aqueous solution under the action of a peroxide initiator and a temperature of 60 to C. to give a homopolymer which shows enhanced brightening-leveling characteristics over the monomer but which also inhibits plating at low current densities, i.e., less than 10 amps/ft
- the problem of low current density skipping, while retaining brightening-leveling characteristics, is overcome by copolymerizing the quaternized dialkylaminoalkylacrylates with at least one other ethylenically unsaturated monomer such as an a,fi-ethylenically unsaturated monocarboxylic acid such as acrylic acid or methacrylic acid, an alkyl ester of said acid wherein the alkyl group is from 1 to 4 carbon atoms, methacrylamide, acrylamide, acrylonitrile, vinyl acetate, vinyl sulfone, and vinyl pyridine.
- the molar ratios of the acrylate monomer to the other monomer can vary between about 0.9/0.1 to 0.1/0.9.
- this capacity is the copolymer formed between: Z-methacryloxyethyl trimethyl ammonium methyl sulfate and methacrylic acid CH: CHa
- the above copolymer is preferably used with molar ratios of n/m varying between 0.7/0.3 to 0.3/0.7, although maximum benefits are obtained at ratios of n/m about 0.7/O.3.
- the invention includes terpolymers, tetrapolymers and other copolymers.
- Secondary brighteners usually used at a concentration of 1 to 20 g./l., may consist typically of aromatic sulfonates, sulfonamides or sulfimides such as sodium or potassium salts of saccharin, 1,3,6-naphthalene trisulfonate p-toluene sulfonamide, benzene sulfonic acid (usually in form of sodium or potassium salt).
- the secondary brighteners are generally characterized by having at least one sulfone or sulfonic acid group attached to a nuclear carbon of a homocyclic aromatic ring. These maproximately a mole for mole basis the quaternizing agent to the dimethylaminoethylmethacrylate in a suitable solvent, and found to have a brightening-leveling ability.
- terials have a brightening elfect on the nickel deposits but, more importantly, impart ductility.
- sulfonated unsaturated hydrocarbons such as sodium allyl sulfonate and sodium-3-chloro-2-butene-l-sulfonate may be added to the bath as auxiliary secondary brighteners to further improve the brightness range and ductility of the nickel deposits.
- auxiliary secondary brighteners as well as the secondary brighteners are well-known to those skilled in the art.
- EXAMPLE 1 Z-methacryloxyethyl, carboxamidomethyl, dimethyl ammonium chloride (B) was prepared by standing together 9.4 g. of chloroacetamide and 8 g. dimethylaminoethylmethacrylate in g. dimethyl formamide for 12 days. After this time, a few white solids had appeared. On pouring the solution into methyl ethyl ketone, considerable white crystalline solids precipitated. They contained Cl: 13.92%. Theory for C1: 14.18%.
- (F) was polymerized by warming together 5 g. (F), 25 g. water, 0.05 g. potassium persulfate in a stirred vessel at C. for 1 hour. Poly (F) was precipitated as a white rubbery material on pouring into acetone. After drying at 60 C. under vacuum, brownish brittle solids, easily soluble in water, were obtained.
- poly (F) in an amount of 0.04 g./l. of plating bath, poly (F) was found to be an excellent brightener-leveler above 40 a./ft. The nickel deposit was mirror bright with all scratches completely leveled. Lesser amounts of poly (F) in the plating bath permitted nickel deposition below 40 a./ft. but with some loss of leveling ability. Thus, at 0.008 g./l., bright nickel was obtained above 1 a./ft. but only slight leveling was observed.
- R is methyl or hydrogen
- R' is methyl or ethyl
- An aqueous acid nickel electroplating bath comprising an aqueous solution of a nickel salt, said solution maintained at a pH in the range of about 3 to 5 and having dissolved therein as primary brightener an effective amount of an acrylate selected from the group consisting of (1) an acrylate monomer of the formula:
- R is methyl or hydrogen
- n is a positive whole integer of 1 to 3 inclusive
- R is alkyl of 1 to 4 carbon atoms
- R" is alkyl of 1 to 4 carbon atoms
- R is as defined above, -CH CONH CH CN, --CH CH OH, CH CH COO or -CH2CH2'CHZSO3 and X is CH2SO4, C2H5SO4 Or is absent when R is CH CH COO- or CH CH CH SO (2) a homopolymer of said acrylate monomer, and (3) a copolymer of said acrylate monomer with at least one ethylenically unsaturated monomer selected from the group consisting of an a, fl-e'thylenically unsaturated monocarboxylic acid, an alkyl ester of said acid wherein the alkyl group is from 1 to 4 carbon atoms, acrylonitrile, acrylamide, methacrylamide, vinyl acetate, vinyl sulfone and vinyl pyridine, the molar ratio of said acrylate monomer to said unsaturated monomer being within the range of 0.9101 to 0.1209.
- ethylenically unsaturated monomer selected from the group consisting of an a, B-ethylenically unsaturated monocarboxylic acid, an alkyl ester of said acid wherein the alkyl group is from 1 to 4 carbon atoms, acrylonitrile, acrylamide, methacrylamide, vinyl acetate, vinyl sulfone and vinyl pyridine, the copolymer having a molar ratio of said acrylate monomer to said unsaturated monomer being within the range of 0.7/0.3 to 0.3/0.7.
- the acid electroplating bath of claim 2 wherein the pH of the bath is within the range of about 3.5 to 4.5 and the copolymer concentration is about 0.001 to 5 g./l.
- copolymer is about 70 molar percent of Z-rnethacryloxyethyl, trimethyl ammonium methyl sulfate and about 30 molar percent of methacrylic acid.
- R is methyl or hydrogen, R is methyl or ethyl, R" is alkyl of 1 to 4 carbon atoms,
- the acid electroplating bath of claim 7 wherein the pH of the bath is within the range of about 3.5 to 4.5 and the acrylate monomer concentration is about 0.001 to 5 g./l.
- R is methyl or hydrogen
- n is a positive whole integer of 1 to 3 inclusive
- R is alkyl of 1 to 4 carbon atoms
- R" is alkyl of 1 to 4 carbon atoms
- -CH CH 'CH OH CiEOH -CH C0OCH -CH COOC H CH COR
- R is as defined above, CH CONH -CH CN, -CH CH OH, -CH CH COO* or CH CH CH SO and X- is CH SO C H SO halide or is absent when R" is -CH OH COO- or -OH CH CH SO
- X is CH SO C H SO halide or is absent when R" is 01' CH2CH2CH2SO3 with at least one ethylenically unsaturated monomer selected from the group consisting of an ac, B-ethylenically unsaturated monocarboxylic acid, an alkyl ester of said acid wherein the alkyl group is from 1 to 4 carbon atoms, acrylonitrile, acrylamide, methacrylamide, vinyl acetate, vinyl sulfone and vinyl pyridine, the copolymer having a molar ratio of said acrylate monomer to said unsaturated monomer within the range of 0.7/0.3 to 0.3/0.7 and the bath is at a temperature in the range of about 20 to 30 C.
- copolymer is about 70 molar percent of 2-methacryloxyethyl, trimethyl ammonium methyl sulfate and about 30 molar percent of methacrylic acid.
- R is methyl or hydrogen, R is methyl or ethyl,
- the process of claim 14 wherein the acrylate is a homopolymer of an acrylate monomer of the general formula:
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22654372A | 1972-02-15 | 1972-02-15 | |
US22654272A | 1972-02-15 | 1972-02-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3723260A true US3723260A (en) | 1973-03-27 |
Family
ID=26920631
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00226543A Expired - Lifetime US3723260A (en) | 1972-02-15 | 1972-02-15 | Acid nickel electroplating |
US00226542A Expired - Lifetime US3723262A (en) | 1972-02-15 | 1972-02-15 | Acid zinc electroplating |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00226542A Expired - Lifetime US3723262A (en) | 1972-02-15 | 1972-02-15 | Acid zinc electroplating |
Country Status (7)
Country | Link |
---|---|
US (2) | US3723260A (forum.php) |
JP (1) | JPS4892235A (forum.php) |
BE (1) | BE795359A (forum.php) |
DE (1) | DE2307520A1 (forum.php) |
FR (1) | FR2172222B1 (forum.php) |
IT (1) | IT979117B (forum.php) |
NL (1) | NL7301796A (forum.php) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4077855A (en) * | 1976-05-04 | 1978-03-07 | Francine Popescu | Bright nickel electroplating bath and process |
US6106940A (en) * | 1998-03-17 | 2000-08-22 | 3M Innovative Properties Company | Adhesive compositions with zwitterionic tackifiers and plasticizers |
US6133391A (en) * | 1998-03-17 | 2000-10-17 | 3M Innovative Properties Company | Adhesive compositions and adhesive tapes comprising zwitterionic copolymers, and novel zwitterionic copolymers |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2310424A1 (fr) * | 1975-05-06 | 1976-12-03 | Popescu Francine | Bain de nickelage electrolytique brillant |
JPS5856037B2 (ja) * | 1975-07-17 | 1983-12-13 | ソニー株式会社 | 酸性Ni電気メッキ浴 |
JPS52111820A (en) * | 1976-03-18 | 1977-09-19 | Furukawa Electric Co Ltd:The | Electro-deposition of zinc |
US4176017A (en) * | 1979-01-31 | 1979-11-27 | Oxy Metal Industries Corporation | Brightening composition for acid zinc electroplating bath and process |
US4425198A (en) | 1981-06-16 | 1984-01-10 | Omi International Corporation | Brightening composition for zinc alloy electroplating bath and its method of use |
DE3640804A1 (de) * | 1986-11-28 | 1988-06-09 | Basf Lacke & Farben | Durch protonierung mit saeure wasserverduennbare bindemittel |
JP2538646B2 (ja) * | 1988-07-05 | 1996-09-25 | 花王株式会社 | 新規カチオン化合物、それを含有する漂白剤組成物及び漂白洗浄剤組成物 |
DE10100954A1 (de) * | 2001-01-11 | 2002-07-18 | Raschig Gmbh | Verwendung von Polyolefinen mit basischen, aromatischen Substituenten als Hilfsmittel zur elektrolytischen Abscheidung von metallischen Schichten |
WO2012051446A2 (en) * | 2010-10-14 | 2012-04-19 | Freeport-Mcmoran Corporation | Improved electrowinning process |
JP6498617B2 (ja) * | 2016-02-18 | 2019-04-10 | 奥野製薬工業株式会社 | 電気ニッケルめっき用光沢剤、電気ニッケルめっき液、電気めっき方法、めっき製品及びニッケル溶出防止方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA759424A (en) * | 1967-05-23 | Nakanishi Kunihiko | Metal electroplating bath | |
US2798040A (en) * | 1955-09-15 | 1957-07-02 | Dow Chemical Co | Electrowinning of metals |
-
0
- BE BE795359D patent/BE795359A/xx unknown
-
1972
- 1972-02-15 US US00226543A patent/US3723260A/en not_active Expired - Lifetime
- 1972-02-15 US US00226542A patent/US3723262A/en not_active Expired - Lifetime
-
1973
- 1973-02-08 NL NL7301796A patent/NL7301796A/xx unknown
- 1973-02-14 FR FR7305187A patent/FR2172222B1/fr not_active Expired
- 1973-02-14 IT IT20399/73A patent/IT979117B/it active
- 1973-02-15 JP JP48017960A patent/JPS4892235A/ja active Pending
- 1973-02-15 DE DE19732307520 patent/DE2307520A1/de active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4077855A (en) * | 1976-05-04 | 1978-03-07 | Francine Popescu | Bright nickel electroplating bath and process |
US6106940A (en) * | 1998-03-17 | 2000-08-22 | 3M Innovative Properties Company | Adhesive compositions with zwitterionic tackifiers and plasticizers |
US6133391A (en) * | 1998-03-17 | 2000-10-17 | 3M Innovative Properties Company | Adhesive compositions and adhesive tapes comprising zwitterionic copolymers, and novel zwitterionic copolymers |
Also Published As
Publication number | Publication date |
---|---|
FR2172222A1 (forum.php) | 1973-09-28 |
JPS4892235A (forum.php) | 1973-11-30 |
FR2172222B1 (forum.php) | 1977-02-04 |
US3723262A (en) | 1973-03-27 |
DE2307520A1 (de) | 1973-08-30 |
BE795359A (fr) | 1973-05-29 |
NL7301796A (forum.php) | 1973-08-17 |
IT979117B (it) | 1974-09-30 |
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