US3678888A - Material depositing apparatus - Google Patents

Material depositing apparatus Download PDF

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Publication number
US3678888A
US3678888A US13941A US3678888DA US3678888A US 3678888 A US3678888 A US 3678888A US 13941 A US13941 A US 13941A US 3678888D A US3678888D A US 3678888DA US 3678888 A US3678888 A US 3678888A
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US
United States
Prior art keywords
substrate
cylindrical surface
deposited
roll
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US13941A
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English (en)
Inventor
Gordon Idris Davies
Terence Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
British Iron and Steel Research Association BISRA
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British Iron and Steel Research Association BISRA
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/1686—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed involving vaporisation of the material to be sprayed or of an atomising-fluid-generating product
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/001—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work incorporating means for heating or cooling the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/286—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers using a temporary backing to which the coating has been applied

Definitions

  • a cylindrical [56] References cued surface is rotated towards and away from the substrate and a UNITED STATES PATENTS feeder head spaced apart from the surface depositsthe material thereover. Substannally the whole of the cylindrical surface 2,429,862 10/]947 Woofter 8! a1 ..l l8/48 is heated so that material deposited thereon and moved 2,899,528 8/1959 Relcllflll 18/49 X towards the substrate on rotation of the surface will be 3,147,085 l 964 M X vaporized and deposited on the substrate. 3,081,201 3/1963 Koller.... ...118/49 X 3,036,549 5/1962 Iwata et a1. ..1 18/49.1 2 Claims, 7 Drawing Figures Patented July 25,1972 BEST AVAILABLE C 3. .8
  • the present invention relates to an apparatus for depositing volatilizable non-thermosetting material, for example epoxy, phenolic (of the Novolak type), or silicone resins or natural oils, etc. on to a substrate, for example moving steel strip.
  • volatilizable non-thermosetting material for example epoxy, phenolic (of the Novolak type), or silicone resins or natural oils, etc.
  • an apparatus for depositing volatilizable non-thermosetting material on a substrate comprising: a cylindrical surface; means for rotating the cylindrical surface so that a portion of its travel is adjacent a part of the substrate; feeding means spaced apart from the cylindrical surface for depositing said material thereover when the cylindrical surface is spaced apart from its position of nearest approach to the substrate;
  • the deposited material at the surface of the substrate may be subjected to ionizing radiation, under vacuum, to polymerize the material in the film or coating on the substrate.
  • FIG. I is a schematic view of an embodiment of the inventron
  • FIGS. 2 and 3 are detailed end and front elevation views respectively of the embodiment of FIG. 1;
  • FIG. 4 is a part sectional schematic view of a moving strip coating line employing the embodiment of FIG. 1, and
  • FIGS. 5 to 7 are somewhat schematic views each showing a modification of the embodiment of FIG. I.
  • the apparatus there shown comprises a high polish hard-chrome roll 10 mounted for rotation in the clockwise direction as indicated.
  • a reservoir I1 contains the epoxy resin which is to be deposited as a coating on to a moving strip 12 by way of the roll I0.
  • the strip 12 moves in a direction perpendicular to the axis about which the roll 10 rotates.
  • the reservoir is preferably kept at a temperature of the order of 50 to 150 C to keep the resin in a molten state.
  • a positive displacement pump 13 (for example a gear pump) pumps the resin, at the required rate, from the reservoir 11 through a feeder head 14 arranged to deposit the resin on to the roll 10.
  • At the location of the feeder head 14 is an adjustable scraper blade 9.
  • the roll 10 carries heater elements which heat the surface of the roll on which the resin is deposited.
  • a film of epoxy resin is formed on the roll surface.
  • the thickness of this film is determined by the gap between the scraper blade 9 the roll 10, the rotational speed of the roll 10, the pump rate of the pump 13 and the viscosity of the hot resin.
  • the liquid epoxy resin can be made to evaporate (or boil" off) and condense on to the strip 12 giving a thin coating of the desired thickness.
  • the surface temperature of the roll will probably be in the range of 150 to 300 C or higher.
  • the evaporated resin is referenced 15 in FIG. I.
  • the deposition of the resin on the roll 10 and the evaporation and condensation of the resin on to the strip I2 may take place in a vacuum chamber 16.
  • the chamber I6 may be at a vacuum of 0.1 atmospheres or lower.
  • seals shown in FIG. 4 at 43 and 44 to maintain the desired level of vacuum within the chamber 16.
  • the ducting connecting the pump 13 to the feeder head I4 may include pre-set regulating valves 17.
  • a by-pass duct 18incorporating a by-pass valve 20 may be provided.
  • a de-gas pump 21 connected to the reservoir 11 by way of valve 22 may be employed to remove gas from above the surface of the resin in the reservoir.
  • FIGS. 2 to 4 partsalready described with reference to FIG. I will be given the same reference numerals in FIGS. 2 to 4 as they have been given in FIG. I.
  • the roll 10 comprises a cylinder 23closed at its ends by plates 24.
  • the roll is fast with stub shafts 25.
  • Rotation of the roll 10 is effected by means of a power source not shown.
  • the shafts 25 are received in bearing housings mounted on upstanding supports; one of these supports is shown at 26 in FIG. 2.
  • a number of pyrotenax electric heaters is arranged in circu-Center array around the rotational axis of the roll 10 and the heaters are secured to the end plates 24 of the roll 10 as at 27. Some of these heaters are referenced 28. Electric current is fed to and away from the heaters by way of slip ring collectors 30. Wall portions of the chamber 16 are shown at 31 in FIG. 3.
  • the feeder head 14 has an adjustable width machined slit 32 from which the epoxy resin will be discharged.
  • the width of the feeder head slit can be adjusted by orthodox methods, e. g. screw adjustment or cam-operated adjusting system.
  • the gap 33 between the feeder head and the roll 10 is made adjustable by reason of the feeder head being carried on an adjustable height mounting 34.
  • the feeder head has electric heaters 35, for example pyrotenax heaters, for maintaining the epoxy resin in a molten state.
  • the ducting connecting the pump 13 to the feeder head 14 comprises a conduit 36 leading to a pipe manifold 37.
  • Pipes 38 take the resin from the manifold 37 into the feeder head 14.
  • Ducts 40 in the feeder head direct the resin to the slit 32.
  • FIG. 2 the film of resin deposited on the roll 10 is shown at 41, and the resin layer deposited on the strip 12 at 42.
  • FIG. 4 shows (schematically) how depositing apparatus according to the invention could be used in a high speed epoxy resin coating or lacquen'ng plant.
  • the moving strip 12 enters the vacuum chamber 16 by way of seal 43 and leaves this chamber by way of seal 44.
  • the strip with the coating of epoxy resin thereon (which resin is radiation-curable) is then cured in the manner disclosed in our British Patent specification No. 1,168,641.
  • the strip enters (and leaves) a vacuum curing irradiation chamber 45 by way of seal 46; within the chamber 45 the epoxy resin coating at the surface of the strip 12 is subjected to ionizing radiation 47 from electron guns 48.
  • the ionizing radiation 47 cures the coating by polymerizing the resin in the coating.
  • the level of vacuum in the chamber 45 may be the same as that quoted in the said specification No. 1,168,641 for the chamber 11.
  • the strip is turned in the chamber 45 by means of guide rollers 50.
  • a guide roller 51 turns the strip after exit thereof from sea] 46.
  • Seals 43, 44 and 46 may be of known design.
  • the heated roll 10 is shrouded with baffles or shields defining a space therebetween opening towards the strip 12. Such an arrangement ensures that the evaporated resin is directed towards the strip 12 and thus losses due to vaporization from the roll where it is not adjacent the strip are minimised.
  • FIG. 5 Such a modified form is shown in FIG. 5 wherein the roll 10 is shrouded with deflector shields 52 for directing stray epoxy resin vapor towards the strip 12.
  • the shields 52 have gutters 53 for trapping liquid epoxy resin not evaporated on to the strip 12.
  • the shields 52 are preferably provided with heaters, (four referenced 54), to keep the shields at the same temperature as the roll surface from which evaporation of the resin takes place.
  • the heaters 54 may be pyrotenax heaters.
  • FIG. 6 shows an alternative design for the shields 52 which, again, are preferably heated to the same temperature as said roll surface.
  • each shield may comprise two parts disposed at approximately to each other so that the resulting four shields form a generally rectangular outline when seen in end view.
  • the embodiment shown in FIG. 7 can be regarded as an off-set roller coating embodiment.
  • Resin from the head 14 is deposited on the roll 10 and from there is deposited on a roll 10 which is in driving engagement with the roll 10 so that rotation of roll 10 will ,7 cause rotation of roll 10.
  • the resin layer on the roll 10' evaporates on to the strip 12.
  • the temperature of the resin receiving surface of the roll 10 will be adjusted so that the resin thereon will be maintained in the molten state but below the vaporization state.
  • shields 52 in the FIG. 7 embodiment serve the same purpose as the shields 52 in the embodiments of FIGS. 5 and 6 and are preferably heated.
  • the epoxy resin coating on the roll 10' of FIG. 7 should be thinner and more uniform than the coatings on the rolls 10 of the other embodiments, and a more uniform coating on the strip 12 will result.
  • FIGS. 5 to 7 may replace the particular form of such apparatus shown in the coating or lacquering plant of FIG. 4.
  • This invention may be used to deposit non-thermosetting material other than epoxy resin or lacquer on to a substrate which may be stationary instead of moving the depositing apparatus then being mounted for movement relative to the substrate.
  • the said substrate may be strip other than steel strip.
  • the said substrate may not be metal strip.
  • the said substrate may not be strip.
  • the said substrate may be wire for example.
  • the apparatus of the invention is however particularly suitable for moving strip or web.
  • the roll 10 and when used roll 10' rotate continuously in the direction indicated so that the material to be deposited on the substrate is continuously deposited on to the roll 10, 10 from the feeder head 14 or from the roll 10 and continuously evaporates (or boils" off) and condenses on to the substrate.
  • An apparatus for depositing volatilizable nonthermosetting organic material on a substrate comprising;
  • feeding means spaced apart from the cylindrical surface for depositing said material on said cylindrical surface and means for spreading said material in a film of predetermined thickness over said cylindrical surface when said surface is spaced apart from its position of nearest approach to the substrate;
  • shroud means comprising heated baffles defining a space therebetween opening towards the substrate whereby vaporized material deposited on the surface is directed towards the substrate and including gutter means therewith whereby material deposited on said baffles may be received.
  • An apparatus including means for subjecting said material when deposited on the substrate to ionizing radiation to cure said material.

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)
US13941A 1969-02-28 1970-02-25 Material depositing apparatus Expired - Lifetime US3678888A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1098469 1969-02-28

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JP (1) JPS4945989B1 (zh)
DE (1) DE2009080C3 (zh)
GB (1) GB1253124A (zh)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0808667A2 (en) 1996-05-21 1997-11-26 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6248407B1 (en) 1998-05-07 2001-06-19 Voith Sulzer Papiertechnik Gmbh Method for applying a coating medium onto a moving surface
EP1191295A3 (en) * 1995-09-18 2002-07-03 Minnesota Mining And Manufacturing Company Coated substrate drying system
WO2003085157A1 (fr) * 2002-04-05 2003-10-16 Matsushita Electric Industrial Co., Ltd. Procede et dispositif pour preparer un film de resine mince
US20030230238A1 (en) * 2002-06-03 2003-12-18 Fotios Papadimitrakopoulos Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
US20100300351A1 (en) * 2008-02-29 2010-12-02 Yasui Seiki Co., Ltd. Apparatus for production of composite material sheet
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
CN103476962A (zh) * 2011-03-30 2013-12-25 夏普株式会社 蒸镀颗粒射出装置、蒸镀颗粒射出方法和蒸镀装置

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
WO1987007848A1 (en) * 1986-06-23 1987-12-30 Spectrum Control, Inc. Flash evaporation of monomer fluids
JP4830220B2 (ja) * 2001-06-27 2011-12-07 凸版印刷株式会社 有機物蒸気の製造方法及びその製造装置
US7232588B2 (en) 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
DE602005026820D1 (de) 2004-08-23 2011-04-21 Basf Se Verfahren zur herstellung von blättchenförmigen pi0)
US20060099344A1 (en) 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material

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US2428868A (en) * 1944-05-01 1947-10-14 Rca Corp Apparatus for producing hardened optical coatings by electron bombardment
US2429862A (en) * 1944-11-27 1947-10-28 Jones & Laughlin Steel Corp Apparatus for oiling sheet metal
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
US2899528A (en) * 1959-08-11 Method and apparatus for supplying
US2925062A (en) * 1953-05-15 1960-02-16 Heraeus Gmbh W C Coating apparatus
US3036549A (en) * 1957-05-08 1962-05-29 Sumitomo Electric Industries Apparatus for vacuum evaporation of metals
US3081201A (en) * 1957-05-15 1963-03-12 Gen Electric Method of forming an electric capacitor
US3147085A (en) * 1961-09-14 1964-09-01 Gen Electric Apparatus for growing whiskers
US3296014A (en) * 1964-03-04 1967-01-03 Robert C Williams Method and apparatus for pressure cast coating
US3338738A (en) * 1963-08-06 1967-08-29 Hooker Chemical Corp Method and apparatus for applying a halogenatedhydrocarbon solventcontaining enamel to wire
US3346413A (en) * 1964-10-12 1967-10-10 Hooker Chemical Corp Method and apparatus for coating wire and solvent recovery
US3406660A (en) * 1966-03-18 1968-10-22 Agfa Gevaert Ag Apparatus for the electrostatic atomization of liquids

Patent Citations (14)

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US2899528A (en) * 1959-08-11 Method and apparatus for supplying
US2403018A (en) * 1933-03-03 1946-07-02 Behr Manning Corp Manufacture of abrasives
US2391595A (en) * 1942-11-27 1945-12-25 Vard Inc Nonreflective lens coating
US2428868A (en) * 1944-05-01 1947-10-14 Rca Corp Apparatus for producing hardened optical coatings by electron bombardment
US2429862A (en) * 1944-11-27 1947-10-28 Jones & Laughlin Steel Corp Apparatus for oiling sheet metal
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
US2925062A (en) * 1953-05-15 1960-02-16 Heraeus Gmbh W C Coating apparatus
US3036549A (en) * 1957-05-08 1962-05-29 Sumitomo Electric Industries Apparatus for vacuum evaporation of metals
US3081201A (en) * 1957-05-15 1963-03-12 Gen Electric Method of forming an electric capacitor
US3147085A (en) * 1961-09-14 1964-09-01 Gen Electric Apparatus for growing whiskers
US3338738A (en) * 1963-08-06 1967-08-29 Hooker Chemical Corp Method and apparatus for applying a halogenatedhydrocarbon solventcontaining enamel to wire
US3296014A (en) * 1964-03-04 1967-01-03 Robert C Williams Method and apparatus for pressure cast coating
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US3406660A (en) * 1966-03-18 1968-10-22 Agfa Gevaert Ag Apparatus for the electrostatic atomization of liquids

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1191295A3 (en) * 1995-09-18 2002-07-03 Minnesota Mining And Manufacturing Company Coated substrate drying system
US20030157742A1 (en) * 1996-05-21 2003-08-21 Kazuyoshi Honda Thin film, method and apparatus for forming the same, and electronic component incorporating the same
EP0808667A3 (en) * 1996-05-21 1998-12-16 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US8480804B2 (en) 1996-05-21 2013-07-09 Panasonic Corporation Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6714401B2 (en) 1996-05-21 2004-03-30 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US20100192858A1 (en) * 1996-05-21 2010-08-05 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6488985B1 (en) 1996-05-21 2002-12-03 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6153259A (en) * 1996-05-21 2000-11-28 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6602559B1 (en) * 1996-05-21 2003-08-05 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US20030145792A1 (en) * 1996-05-21 2003-08-07 Kazuyoshi Honda Thin film, method and apparatus for forming the same, and electronic component incorporating the same
EP0808667A2 (en) 1996-05-21 1997-11-26 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
US6942903B2 (en) 1996-05-21 2005-09-13 Matsushita Electric Industrial Co., Ltd. Thin film, method and apparatus for forming the same, and electronic component incorporating the same
KR100330111B1 (ko) * 1996-05-21 2002-11-27 마쯔시다덴기산교 가부시키가이샤 박막 제조 방법 및 장치
US6503325B1 (en) 1998-05-07 2003-01-07 Voith Sulzer Papiertechnik Patent Gmbh Device and method for applying a coating medium onto a moving surface
US6248407B1 (en) 1998-05-07 2001-06-19 Voith Sulzer Papiertechnik Gmbh Method for applying a coating medium onto a moving surface
US20050129860A1 (en) * 2002-04-05 2005-06-16 Matsushita Electric Industrial Co., Ltd. Method and apparatus for preparing thin resin film
WO2003085157A1 (fr) * 2002-04-05 2003-10-16 Matsushita Electric Industrial Co., Ltd. Procede et dispositif pour preparer un film de resine mince
US20030230238A1 (en) * 2002-06-03 2003-12-18 Fotios Papadimitrakopoulos Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
US20100300351A1 (en) * 2008-02-29 2010-12-02 Yasui Seiki Co., Ltd. Apparatus for production of composite material sheet
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
CN103476962A (zh) * 2011-03-30 2013-12-25 夏普株式会社 蒸镀颗粒射出装置、蒸镀颗粒射出方法和蒸镀装置
CN103476962B (zh) * 2011-03-30 2015-07-01 夏普株式会社 蒸镀颗粒射出装置、蒸镀颗粒射出方法和蒸镀装置

Also Published As

Publication number Publication date
DE2009080C3 (de) 1979-06-13
GB1253124A (zh) 1971-11-10
JPS4945989B1 (zh) 1974-12-07
DE2009080A1 (de) 1970-09-10
DE2009080B2 (de) 1978-10-19

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