US3614520A - Electron beam injector and focusing means suitable for electron microscope - Google Patents
Electron beam injector and focusing means suitable for electron microscope Download PDFInfo
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- US3614520A US3614520A US759431A US3614520DA US3614520A US 3614520 A US3614520 A US 3614520A US 759431 A US759431 A US 759431A US 3614520D A US3614520D A US 3614520DA US 3614520 A US3614520 A US 3614520A
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 27
- 238000005040 ion trap Methods 0.000 claims description 7
- 230000001133 acceleration Effects 0.000 description 7
- 241000239290 Araneae Species 0.000 description 6
- 230000007423 decrease Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/07—Eliminating deleterious effects due to thermal effects or electric or magnetic fields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/029—Schematic arrangements for beam forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
Definitions
- a short focal length accelerating lens is positioned in 250/495 R, 313/82 R the front focal length of the long focal length lens constituted [51] Int. Cl HOlj 29/58 by the high voltage accelerating electrodes.
- This invention relates to an electron beam producing means, for example, an electron gun which produces a collimated electron beam that is particularly suitable for use in an electron microscope but is not limited to that use.
- lens means are provided for focusing the beam and means are provided for accelerating the electrons thereof, the lens means and the accelerating means including an element in common.
- the electron beams so provided can be used for many purposes for which an electron beam gun is suitable, such as the beam gun of a cathode-ray tube, it can also be used in a high-voltage beam microscope with further beam accelerating means. When so used, the defocusing of the beam resulting from changes in voltage of the further acceleration means is minimized by the construction of the electron gun.
- FIGURE is a fragmentary section of an election microscope taken through a vertical axis thereof.
- a filamentary cathode 10 which is heated and held at a high negative accelerating potential with respect to ground by suitable means, not shown, acts as a source of electrons for the beam 12.
- a grid cap 14 which is held at a bias voltage such as 45 volts with respect to the filamentary cathode l surrounds the cathode 10.
- the grid cap 14 is symmetrical about its central vertical axis as viewed in the FIGURE.
- the central portion of the cap 14 is in the form of a plate 16 having a hole 18 therethrough for the passage of electrons from the cathode l0, and the outer portion of the grid cap 14 is formed to provide an outwardly and downwardly slanting conical wall 20.
- a further axially symmetrical electrode 22 which comprises an annular-shaped disk 24 and a cylindrical portion 26 is positioned coaxially with the cap 14 and with the disk 24 below the cap 14, the cylindrical portion 26 surrounding the grid cap 14.
- the electrode 22 is maintained by suitable means, not shown, at the voltage of the cathode 10.
- the electrode 28 comprises a hollow portion 30 which is frustoconical both at its outer and inner surfaces, the top of the portion 30 extending up into the conical portion 20 of the grid 14.
- the upper end of the portion 30 has a hole therethrough for passage of electrons.
- the lower part 32 of the conical portion 30 is cylindrical in internal shape.
- the conical portion 30 is joined to an annular disklike portion 34 by an intermediate portion 36.
- the lower edge of the intermediate portion 36 is hollowed out as shown to provide clearance between the electrode 28 and an electrode 38 as will be more fully explained.
- the beam of electrons l2 exiting through the hole 18 will expand radially in a symmetrical manner as it goes down and will therefore take the conical shape shown, the cylindrical portion 32 causing a speeding up of the radial expansion of the beams since the surface 32 does not recede from the beam as does the internal conical surface portion just above it.
- This expanding portion of the beam 12 acts as if it originated at the point 40, at the apex of the lines comprising the extensions in an upward direction of the envelope of the beam 12.
- Means are provided to hollow out the beam 12 and then to contract it in a radial direction.
- the beam hollowing out means includes the axially symmetrical electrode 38 which is maintained at the same voltage as the cathode 10 by suitable means, not shown.
- the electrode 38 includes a pointed por tion 42, the point thereof extending upwardly, the portion 42 being supported by spider arms 44 from an annular disk 46 comprising another portion of the electrode 38. While only two spider arms 44 are shown, there may be as many spider arms (three for example) as is desired.
- the outer portion of the electrode 38 is turned up and surrounds the outer edges of the disk 34 forming part of the electrode 28.
- the inner edge of the disk 46 is formed into an upstanding portion 48 whose inner shape is cylindrical and whose outer shape is conical and slants outwardly in a downward direction.
- the lower portion of the disk 46 is formed to receive a portion of an electrode 52 as will be explained. Since the electrode 38 is at a high negative potential, that of the cathode l0, and since the electrode 28 is at a high positive potential with respect thereto, the portion 36 of the electrode 28 is cut away to prevent arcing between the electrodes 28 and 38.
- the turning up of the outer portion of the electrode 38 to surround the electrode 28 is to prevent arcing between the electrode 28 and the microscope casing, not shown, of which the described electron gun may be a part.
- the shape and position of the pointed electrode portion 42, and the negative voltage applied to it, causes the electron beam to be hollowed out to provide a substantially electron free space within the beam 12 immediately surrounding the pointed portion 42, the space so formed being symmetrical with respect to the axis of the beam 12.
- the means for causing the beam 12 to contract in a radial direction includes the electrodes 38, 50 and 52.
- the electrode 50 which is also axially symmetrical, includes an outer annular disk portion 54, a transitional portion 56, spider anns 58 and a central disk portion 60.
- the transitional portion 56 has a conical upper surface and a more steeply conical lower surface and joins the lower annular portion 50 to the spider arms 58 which support the disk 60. While only two arms 58 are shown, there may be as many thereof (three for example), as may be desired.
- the electrode 50 is maintained at the same high positive potential with respect to the cathode l0 as the electrode 28 by suitable means, not shown, whereby the arms 58 are also highly positive, and whereby the electrons of the beam 12 are attracted thereby. To reduce attenuation of the beam 12 by the arms 58, the anns 58 are positioned in the shadow of the arms 44 which are at the same potential as the cathode.
- the electrode 52 which is held at the potential of the cathode 10 by suitable means, not shown, comprises an annular disk 62 having an inner diameter equal to the inner diameter of the central upstanding portion 48 of the electrode 38 surrounding the beam 12 and an upstanding cylindrical portion 64 having the same inner diameter as the disk 62 and a much smaller outer diameter.
- the cylindrical portion 64 extends up into and fits into the electrode 38 and is electrically connected thereto, to form with the inner surface of the portion 48 a long equipotential cylindrical surface.
- vertical slots 66 are cut in the upper end of the cylinder 64. While no insulation is required for the arms 44, the arms 58 and the portion 56 of the electron 50 are insulated by vacuum from the cylinder 64.
- the electrons Due to the voltages applied to the electrodes 38, 50 and 52, the electrons are attracted inwardly by the positive voltage on the disk 60, and the electrons are also repelled inwardly by the negative voltage on the inside surface of the electrodes 38 and 52 causing the beam 12 to consolidate and to cross over at the point 68 and to become a solid beam.
- the electrons of the beam 12 go downward from the point 68 so that they appear to originate at the point 70 which is the point of intersection of straight lines tangent to the envelope of the beam.
- An axially symmetrical electrode 72 is positioned coaxially with the electrodes 28, 38, 50 and 52.
- This electrode 72 which is maintained at a positive potential of about 560 volts with respect to the cathode 10 by suitable means, not shown, comprises an outer annular disk 74 and an inner annular disk 76 connected by a transitional portion 78.
- the disk portion 76 extends up into the lower part of the annular disk 62 to produce the necessary electronstatic field shape to cause the beam to appear to come from point 70.
- the hole in the disk 76 increases in diameter in a downward direction in a known manner.
- the beam 12 passes through the hole in the portion 76, and the beam emerging therefrom, due to the electrodes mentioned and to the voltage applied thereto, appears as if it originated at the point 70 with the same angular divergence and envelope as if it originated from point 40.
- the electron beam is accelerated and further focused by the electrode 72 in conjunction with electrodes 80 and 82, whereby the electrode 72 acts both as an element of the coaxial ion trap described as well as an element ofa beam accelerator.
- the axially symmetrical element 80 comprises an outer annular disk portion 84 and a centrally positioned upstanding hollow portion 86 having a conical upper surface and a cylindrical inner surface.
- the electrode 80 also includes a downwardly extending hollow portion 88 having a cylindrical inner surface 90 and a cylindrical outer surface 92 adjacent to the disk 84 and an outer conical surface 94 which decreases in diameter in a downward direction joining the cylindrical surface 92 and 90.
- the diameter of the surface 90 is greater than the inside diameter of the portion 86.
- An apertured disk 96 closes the top of the cylindrical surface 90.
- the aperture in the disk 96 may be biconical as shown.
- the disk 96 is thinner than the disk 84 and the lower surfaces of the disk 84 and 96 are in the same plane.
- the upper end of the portion 86 of the electrode 80 extends into the transitional portion 78 of the electrode 72.
- the voltage applied to the electrode 80 by suitable means, not shown, may be 660 volts positive.
- the electrode 82 which is axially symmetrical, has a positive voltage of560 volts applied thereto by suitable means, not shown.
- This electrode 82 comprises an outer annular disk portion 98 having a turned down rim 100.
- the electrode 82 also includes a central annular disk portion 102 having a hole therethrough (for the passage of electrons) which hole has a biconical shape comprising a shorter frustoconical portion, whose diameter decreases in a downward direction, and a longer frustoconical portion whose diameter increases in a downward direction, the two smaller diameter portions of the frustrums being joined.
- the shape of the aperture through the disk portion 102 aids in maintaining focus of the beam 12.
- the electrode 82 also includes a transitional portion 104 having an upper conical surface conforming in angle with the surface 94 of the electrode 80 and spaced therefrom, the conical surface 94 extending into the transitional portion 104.
- the outer surface of the transitional portion 104 is cylindrical.
- the portion 106 of the electrode 82 which, as shown, may be made up as a separate part from the portions 98, 100 and 104 thereof for the purpose of ease of manufacture, fits over the lower end of the cylindrical outer surface of the transitional portion 104.
- the portion 106 has a conical inner surface 108 whose diameter decreases in a downward direction.
- An apertured plate 1 l closes the lower part of the lower portion 106.
- the aperture in the plate 110 may have a wedge-shaped inner edge as shown.
- X-deflecting plates 112 and Y-deflecting plates 114 are provided in the chamber within the conical surface 108 and between the apertured disks 102 and 110.
- suitable means not shown, applied to the deflection plates X and Y, the direction of the beam 12 emerging below the disk may be controlled.
- the device so far described may be used as a complete electron gun requiring no additional acceleration and including the described ion trap. However, the described gun may also be used as a source of a beam of accelerated electrons subject to further acceleration, as in an electron microscope.
- a further acceleration electrode 120 may be provided.
- This electrode 120 comprises a disk apertured for passage of the electron beam 12 therethrough, to which high positive voltage in the order of 6.6 to 33kv. may be applied.
- This accelerating electrode 120 may be one of a plurality (up to 15) of similar electrodes positioned along the beam 12 below the electrode 120 to which successively higher positive voltages are applied, the highest of which may be as high as 500 kv. when the voltage on the electrode 120 is 33 kv.
- Using the described electron gun with accelerating electrodes such as electrode 120 only the voltage on the grid cap 14 need be changed to retain focusing of the beam 12, as the voltage of the accelerating electrodes such as electrode 120 is changed. This is due to the fact that the accelerating electrode 120 and any subsequent accelerating electrodes such as electrode 120 (not shown) constitute a weak electrostatic aperture lens having a very long focal length. This long focal length extends in both directions from the electrode 120.
- the electrodes 72, and 82 constitute a much stronger electrostatic lens having a much shorter focal length.
- the strong lens 72, 80 and 82 is immersed in the focal length of the weak lens comprising the electrode 120 and subsequent electrodes (not shown).
- a small focusing change in the stronger lens 72, 80 and 82 can overcome a focusing change due to a great voltage change in the weaker lens.
- the small focusing change in the strong lens 72, 80 and 82 is provided by varying the voltage in the grid cap 14, without varying the voltages in the electrodes 70, 80 and 82. Since change of the voltage on the grid cap 14 changes the position of the point 70, where the electrons of the beam 12 appear to originate, the focusing effect on the beam of electrons of the lens 72, 80 and 82 is changed.
- This change of potential on the grid cap 14 is from about 45 volts to about 60 volts, or about 33 percent, as the voltage on the electrode 120 is changed from about 6.6 kv. to about 33 kv. or about 500 percent. Therefore, the electron gun described minimized the defocusing of the beam thereof upon further acceleration of the beam and reduces the changes in potential of the grid cap 14 necessary to track, that is to keep the beam focused, as the acceleration voltage on the electrodes, such as electrode 120, is changed.
- the several electrodes may be made of any solid nonmagnetic conductor, preferably they may be made of nonmagnetic stainless steel.
- An electron gun of particular utility in the environment of an electron microscope comprising, in combination,
- a first accelerating lens of a relatively short focal length so positioned that the beam passes therethrough, and at a positive potential relative to said means to produce an electron beam
- said second lens being at a potential significantly more positive than said first lens
- said second lens being spaced from said first lens by a distance less than the focal length of the second lens
- said first accelerating lens comprises a plurality of electrodes spaced from each other and each at a potential significantly lower than the potential of said second accelerating lens.
- An electron gun wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; said grid cap being at a potential negative with respect to the potential of said first lens, and said grid cap potential being adjustable to provide said relatively small change in the potential difference between said beam producing means and said first lens.
- An electron gun according to claim 1 which further includes means to deflect said electron beam, said means to deflect being positioned between said first accelerating lens and said second accelerating lens. 5.
- An electron gun according to claim 4 wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; and an ion trap between said means to produce the electron beam and said first accelerating lens. 6.
- An electron gun according to claim 5 which further includes additional lens means extending around said ion trap and between said means to produce the electron beam and said first accelerating lens.
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Abstract
An electron beam focusing means including a grid cap and accelerating lenses is provided. To permit a small change of voltage on the grid cap to overcome the defocusing effect of a great change in voltage on the accelerating electrodes, a short focal length accelerating lens is positioned in the front focal length of the long focal length lens constituted by the high voltage accelerating electrodes.
Description
United States Patent [72] Inventor John W- Coleman [50] Field of Search 313/81, 82, Willingboro, NJ. 82 T; 315/14, 15, 31; 250/495 (3), 49.5 (7), 49.5 [21] Appl. No. 759,431 (9) [22] Filed Sept. 12, 1968 [23] Division of Ser. N0. 577,353, Sept. 6, 1966, R f r n s Cite P d 8 f UNITED STATES PATENTS atente c 2,617,060 11/1952 De Gier 313/82T [73] Assgnee f 2,911,563 11/1959 Atti et a1 313/82 T x 3,100,260 8/1963 Wilska 250 495 3 Primary ExaminerMalcolm F. Hubler Attorney-Markva, Smith & Kruger [54] ELECTRON BEAM INJECTOR AND FOCUSING MEANS SUITABLE FOR ELECTRON AlZSTRACT. An electron beain focus ng means including a MICROSCOPE grid cap and accelerating lenses 1s prov1ded. To permit a small 6 Claim 1 D in Fi change of voltage on the grid cap to overcome the defocusing raw g effect of a great change in voltage on the accelerating elec- [52] US. Cl 315/15, trodes, a short focal length accelerating lens is positioned in 250/495 R, 313/82 R the front focal length of the long focal length lens constituted [51] Int. Cl HOlj 29/58 by the high voltage accelerating electrodes.
LIZWfli/d awn/a0: 10 o JELO/YD Lf/VS +56KV639KV A l M r0 CHTHODE 1o ELECTRON BEAM INJECTOR AND FOCUSING MEANS SUITABLE FOR ELECTRON MICROSCOPE This application is a division of application Ser. No. 577,353, filed Sept. 6, 1966 now U.S. Pat. No. 3,452,241.
This invention relates to an electron beam producing means, for example, an electron gun which produces a collimated electron beam that is particularly suitable for use in an electron microscope but is not limited to that use.
When an electron beam produced by a beam producing means or gun is accelerated, as by accelerating electrodes, the voltage applied to the accelerating electrodes has a lens effect on the beam, whereby a change in accelerating voltage requires a change in focusing of the beam.
It is an object of this invention to provide an electron beam source for a linear electron accelerator in which defocusing of the beam by changes of acceleration voltage is minimized.
In accordance with this invention, lens means are provided for focusing the beam and means are provided for accelerating the electrons thereof, the lens means and the accelerating means including an element in common. While the electron beams so provided can be used for many purposes for which an electron beam gun is suitable, such as the beam gun of a cathode-ray tube, it can also be used in a high-voltage beam microscope with further beam accelerating means. When so used, the defocusing of the beam resulting from changes in voltage of the further acceleration means is minimized by the construction of the electron gun.
The invention may be better understood upon reading the following specification in connection with the accompanying drawing in which the sole FIGURE is a fragmentary section of an election microscope taken through a vertical axis thereof.
Turning to the FIGURE, a filamentary cathode 10 which is heated and held at a high negative accelerating potential with respect to ground by suitable means, not shown, acts as a source of electrons for the beam 12. A grid cap 14 which is held at a bias voltage such as 45 volts with respect to the filamentary cathode l surrounds the cathode 10. The grid cap 14 is symmetrical about its central vertical axis as viewed in the FIGURE. The central portion of the cap 14 is in the form of a plate 16 having a hole 18 therethrough for the passage of electrons from the cathode l0, and the outer portion of the grid cap 14 is formed to provide an outwardly and downwardly slanting conical wall 20. A further axially symmetrical electrode 22 which comprises an annular-shaped disk 24 and a cylindrical portion 26 is positioned coaxially with the cap 14 and with the disk 24 below the cap 14, the cylindrical portion 26 surrounding the grid cap 14. The electrode 22 is maintained by suitable means, not shown, at the voltage of the cathode 10. An axially symmetrical electrode 28, which is maintained at about 6,000 volts positive with respect to the cathode by suitable means, not shown, is also positioned coaxially with the cap 14. The electrode 28 comprises a hollow portion 30 which is frustoconical both at its outer and inner surfaces, the top of the portion 30 extending up into the conical portion 20 of the grid 14. The upper end of the portion 30 has a hole therethrough for passage of electrons. The lower part 32 of the conical portion 30 is cylindrical in internal shape. The conical portion 30 is joined to an annular disklike portion 34 by an intermediate portion 36. The lower edge of the intermediate portion 36 is hollowed out as shown to provide clearance between the electrode 28 and an electrode 38 as will be more fully explained.
Due to the shape of the lower surface of the grid cap 14 and to the shapes of the electrodes 22 and 28 and due to the potentials applied thereto, the beam of electrons l2 exiting through the hole 18 will expand radially in a symmetrical manner as it goes down and will therefore take the conical shape shown, the cylindrical portion 32 causing a speeding up of the radial expansion of the beams since the surface 32 does not recede from the beam as does the internal conical surface portion just above it. This expanding portion of the beam 12 acts as if it originated at the point 40, at the apex of the lines comprising the extensions in an upward direction of the envelope of the beam 12. Means are provided to hollow out the beam 12 and then to contract it in a radial direction. The beam hollowing out means includes the axially symmetrical electrode 38 which is maintained at the same voltage as the cathode 10 by suitable means, not shown. The electrode 38 includes a pointed por tion 42, the point thereof extending upwardly, the portion 42 being supported by spider arms 44 from an annular disk 46 comprising another portion of the electrode 38. While only two spider arms 44 are shown, there may be as many spider arms (three for example) as is desired.
The outer portion of the electrode 38 is turned up and surrounds the outer edges of the disk 34 forming part of the electrode 28. The inner edge of the disk 46 is formed into an upstanding portion 48 whose inner shape is cylindrical and whose outer shape is conical and slants outwardly in a downward direction. The lower portion of the disk 46 is formed to receive a portion of an electrode 52 as will be explained. Since the electrode 38 is at a high negative potential, that of the cathode l0, and since the electrode 28 is at a high positive potential with respect thereto, the portion 36 of the electrode 28 is cut away to prevent arcing between the electrodes 28 and 38. Also the turning up of the outer portion of the electrode 38 to surround the electrode 28 is to prevent arcing between the electrode 28 and the microscope casing, not shown, of which the described electron gun may be a part. The shape and position of the pointed electrode portion 42, and the negative voltage applied to it, causes the electron beam to be hollowed out to provide a substantially electron free space within the beam 12 immediately surrounding the pointed portion 42, the space so formed being symmetrical with respect to the axis of the beam 12.
The means for causing the beam 12 to contract in a radial direction includes the electrodes 38, 50 and 52. The electrode 50, which is also axially symmetrical, includes an outer annular disk portion 54, a transitional portion 56, spider anns 58 and a central disk portion 60. The transitional portion 56 has a conical upper surface and a more steeply conical lower surface and joins the lower annular portion 50 to the spider arms 58 which support the disk 60. While only two arms 58 are shown, there may be as many thereof (three for example), as may be desired. The electrode 50 is maintained at the same high positive potential with respect to the cathode l0 as the electrode 28 by suitable means, not shown, whereby the arms 58 are also highly positive, and whereby the electrons of the beam 12 are attracted thereby. To reduce attenuation of the beam 12 by the arms 58, the anns 58 are positioned in the shadow of the arms 44 which are at the same potential as the cathode.
The electrode 52, which is held at the potential of the cathode 10 by suitable means, not shown, comprises an annular disk 62 having an inner diameter equal to the inner diameter of the central upstanding portion 48 of the electrode 38 surrounding the beam 12 and an upstanding cylindrical portion 64 having the same inner diameter as the disk 62 and a much smaller outer diameter. The cylindrical portion 64 extends up into and fits into the electrode 38 and is electrically connected thereto, to form with the inner surface of the portion 48 a long equipotential cylindrical surface. To provide clearance for the spider arms 44 and 58, vertical slots 66 are cut in the upper end of the cylinder 64. While no insulation is required for the arms 44, the arms 58 and the portion 56 of the electron 50 are insulated by vacuum from the cylinder 64. Due to the voltages applied to the electrodes 38, 50 and 52, the electrons are attracted inwardly by the positive voltage on the disk 60, and the electrons are also repelled inwardly by the negative voltage on the inside surface of the electrodes 38 and 52 causing the beam 12 to consolidate and to cross over at the point 68 and to become a solid beam. The electrons of the beam 12 go downward from the point 68 so that they appear to originate at the point 70 which is the point of intersection of straight lines tangent to the envelope of the beam. An axially symmetrical electrode 72 is positioned coaxially with the electrodes 28, 38, 50 and 52. This electrode 72, which is maintained at a positive potential of about 560 volts with respect to the cathode 10 by suitable means, not shown, comprises an outer annular disk 74 and an inner annular disk 76 connected by a transitional portion 78. The disk portion 76 extends up into the lower part of the annular disk 62 to produce the necessary electronstatic field shape to cause the beam to appear to come from point 70. The hole in the disk 76 increases in diameter in a downward direction in a known manner. The beam 12 passes through the hole in the portion 76, and the beam emerging therefrom, due to the electrodes mentioned and to the voltage applied thereto, appears as if it originated at the point 70 with the same angular divergence and envelope as if it originated from point 40. However, an ion that originates in the portion of the described gun below the ion impermeable disk 60 hits the disk 60 and is stopped thereby. The ion cannot hit and therefore does not injure the cathode 10, whereby the life of the cathode 10 is extended by the provision of the described ion trap thereof.
The electron beam is accelerated and further focused by the electrode 72 in conjunction with electrodes 80 and 82, whereby the electrode 72 acts both as an element of the coaxial ion trap described as well as an element ofa beam accelerator. The axially symmetrical element 80 comprises an outer annular disk portion 84 and a centrally positioned upstanding hollow portion 86 having a conical upper surface and a cylindrical inner surface. The electrode 80 also includes a downwardly extending hollow portion 88 having a cylindrical inner surface 90 and a cylindrical outer surface 92 adjacent to the disk 84 and an outer conical surface 94 which decreases in diameter in a downward direction joining the cylindrical surface 92 and 90. The diameter of the surface 90 is greater than the inside diameter of the portion 86. An apertured disk 96 closes the top of the cylindrical surface 90. The aperture in the disk 96 may be biconical as shown. The disk 96 is thinner than the disk 84 and the lower surfaces of the disk 84 and 96 are in the same plane. The upper end of the portion 86 of the electrode 80 extends into the transitional portion 78 of the electrode 72. The voltage applied to the electrode 80 by suitable means, not shown, may be 660 volts positive.
The electrode 82, which is axially symmetrical, has a positive voltage of560 volts applied thereto by suitable means, not shown. This electrode 82 comprises an outer annular disk portion 98 having a turned down rim 100. The electrode 82 also includes a central annular disk portion 102 having a hole therethrough (for the passage of electrons) which hole has a biconical shape comprising a shorter frustoconical portion, whose diameter decreases in a downward direction, and a longer frustoconical portion whose diameter increases in a downward direction, the two smaller diameter portions of the frustrums being joined. The shape of the aperture through the disk portion 102 aids in maintaining focus of the beam 12. The electrode 82 also includes a transitional portion 104 having an upper conical surface conforming in angle with the surface 94 of the electrode 80 and spaced therefrom, the conical surface 94 extending into the transitional portion 104. The outer surface of the transitional portion 104 is cylindrical. The portion 106 of the electrode 82, which, as shown, may be made up as a separate part from the portions 98, 100 and 104 thereof for the purpose of ease of manufacture, fits over the lower end of the cylindrical outer surface of the transitional portion 104. The portion 106 has a conical inner surface 108 whose diameter decreases in a downward direction. An apertured plate 1 l closes the lower part of the lower portion 106. The aperture in the plate 110 may have a wedge-shaped inner edge as shown. X-deflecting plates 112 and Y-deflecting plates 114, only one of the Y-plates being shown, are provided in the chamber within the conical surface 108 and between the apertured disks 102 and 110. By adjustment of potentials provided by suitable means, not shown, applied to the deflection plates X and Y, the direction of the beam 12 emerging below the disk may be controlled.
The device so far described may be used as a complete electron gun requiring no additional acceleration and including the described ion trap. However, the described gun may also be used as a source of a beam of accelerated electrons subject to further acceleration, as in an electron microscope. When so used, a further acceleration electrode 120 may be provided. This electrode 120 comprises a disk apertured for passage of the electron beam 12 therethrough, to which high positive voltage in the order of 6.6 to 33kv. may be applied. This accelerating electrode 120 may be one of a plurality (up to 15) of similar electrodes positioned along the beam 12 below the electrode 120 to which successively higher positive voltages are applied, the highest of which may be as high as 500 kv. when the voltage on the electrode 120 is 33 kv. The voltage on the accelerating electrodes, of which only the electrode 120 is shown, while accelerating the beams 12 passing therethrough also produces an electron lens action which results in a defocusing of the beam 12. Using the described electron gun with accelerating electrodes such as electrode 120, only the voltage on the grid cap 14 need be changed to retain focusing of the beam 12, as the voltage of the accelerating electrodes such as electrode 120 is changed. This is due to the fact that the accelerating electrode 120 and any subsequent accelerating electrodes such as electrode 120 (not shown) constitute a weak electrostatic aperture lens having a very long focal length. This long focal length extends in both directions from the electrode 120. The electrodes 72, and 82, on the other hand, constitute a much stronger electrostatic lens having a much shorter focal length. Because of the proximity of this strong lens comprising the electrodes 72, 80 and 82 to the electrode and to the subsequent accelerating electrodes (not shown), the strong lens 72, 80 and 82 is immersed in the focal length of the weak lens comprising the electrode 120 and subsequent electrodes (not shown). In this situation a small focusing change in the stronger lens 72, 80 and 82 can overcome a focusing change due to a great voltage change in the weaker lens. The small focusing change in the strong lens 72, 80 and 82 is provided by varying the voltage in the grid cap 14, without varying the voltages in the electrodes 70, 80 and 82. Since change of the voltage on the grid cap 14 changes the position of the point 70, where the electrons of the beam 12 appear to originate, the focusing effect on the beam of electrons of the lens 72, 80 and 82 is changed.
This change of potential on the grid cap 14 is from about 45 volts to about 60 volts, or about 33 percent, as the voltage on the electrode 120 is changed from about 6.6 kv. to about 33 kv. or about 500 percent. Therefore, the electron gun described minimized the defocusing of the beam thereof upon further acceleration of the beam and reduces the changes in potential of the grid cap 14 necessary to track, that is to keep the beam focused, as the acceleration voltage on the electrodes, such as electrode 120, is changed.
While the several electrodes (except the cathode which may be made of tungsten) may be made of any solid nonmagnetic conductor, preferably they may be made of nonmagnetic stainless steel.
What is claimed is:
1. An electron gun of particular utility in the environment of an electron microscope comprising, in combination,
means to produce an electron beam;
a first accelerating lens of a relatively short focal length so positioned that the beam passes therethrough, and at a positive potential relative to said means to produce an electron beam;
a second accelerating lens of a relatively long focal length compared with the focal length of said first lens and so positioned that the beam passes through the second lens after it passes through the first lens,
said second lens being at a potential significantly more positive than said first lens,
said second lens being spaced from said first lens by a distance less than the focal length of the second lens,
whereby defocusing of said beam as a result of a significant change in the potential applied to said second lens is readily corrected by a relatively small change in the potential difference between said beam producing means and said first lens. 2. An electron gun according to claim 1 wherein said first accelerating lens comprises a plurality of electrodes spaced from each other and each at a potential significantly lower than the potential of said second accelerating lens. 3. An electron gun according to claim 2 wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; said grid cap being at a potential negative with respect to the potential of said first lens, and said grid cap potential being adjustable to provide said relatively small change in the potential difference between said beam producing means and said first lens. 4. An electron gun according to claim 1 which further includes means to deflect said electron beam, said means to deflect being positioned between said first accelerating lens and said second accelerating lens. 5. An electron gun according to claim 4 wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; and an ion trap between said means to produce the electron beam and said first accelerating lens. 6. An electron gun according to claim 5 which further includes additional lens means extending around said ion trap and between said means to produce the electron beam and said first accelerating lens.
Claims (6)
1. An electron gun of particular utility in the environment of an electron microscope comprising, in combination, means to produce an electron beam; a first accelerating lens of a relatively short focal length so positioned that the beam passes therethrough, and at a positive potential relative to said means to produce an electron beam; a second accelerating lens of a relatively long focal length compared with the focal length of said first lens and so positioned that the beam passes through the second lens after it passes through the first lens, said second lens being at a potential significantly more positive than said first lens, said second lens being spaced from said first lens by a distance less than the focal length of the second lens, whereby defocusing of said beam as a result of a significant change in the potential applied to said second lens is readily corrected by a relatively small change in the potential difference between said beam producing means and said first lens.
2. An electron gun according to claim 1 wherein said first accelerating lens comprises a plurality of electrodes spaced from each other and each at a potential significantly lower than the potential of said second accelerating lens.
3. An electron gun according to claim 2 wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; said grid cap being at a potential negative with respect to the potential of said first lens, and said grid cap potential being adjustable to provide said relatively small change in the potential difference between said beam producing means and said first lens.
4. An electron gun according to claim 1 which further includes means to deflect said electron beam, said means to deflect being positioned between said first accelerating lens and said second accelerating lens.
5. An electron gun according to claim 4 wherein said means to produce an electron beam includes a cathode; and a grid cap in proximity to said cathode and having an opening therethrough for passage of electrons from said cathode; and an ion trap between said means to produce the electron beam and said first accelerating lens.
6. An electron gun according to claim 5 which further includes additional lens means extending around said ion trap and between said means to produce the electron beam and said first accelerating lens.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57735366A | 1966-09-06 | 1966-09-06 | |
US37735366A | 1966-09-06 | 1966-09-06 | |
US75943168A | 1968-09-12 | 1968-09-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3614520A true US3614520A (en) | 1971-10-19 |
Family
ID=27409359
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US577353A Expired - Lifetime US3452241A (en) | 1966-09-06 | 1966-09-06 | Electron gun suitable for electron microscope |
US759431A Expired - Lifetime US3614520A (en) | 1966-09-06 | 1968-09-12 | Electron beam injector and focusing means suitable for electron microscope |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US577353A Expired - Lifetime US3452241A (en) | 1966-09-06 | 1966-09-06 | Electron gun suitable for electron microscope |
Country Status (3)
Country | Link |
---|---|
US (2) | US3452241A (en) |
DE (1) | DE1614384B1 (en) |
GB (1) | GB1178406A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3732457A (en) * | 1970-01-30 | 1973-05-08 | Victor Co Ltd | Electrode lens potential arrangement for a post-acceleration picture tube |
US3845305A (en) * | 1972-05-12 | 1974-10-29 | Max Planck Gesellschaft | Microbeam probe apparatus |
US3846663A (en) * | 1970-09-18 | 1974-11-05 | Hitachi Ltd | Electron gun device having a field emission cathode tip protected from destruction due to ion impingement |
US3916202A (en) * | 1974-05-03 | 1975-10-28 | Gen Electric | Lens-grid system for electron tubes |
US4634925A (en) * | 1983-10-07 | 1987-01-06 | Mitsubishi Denki Kabushiki Kaisha | Electron gun for a high power klystron |
US5187371A (en) * | 1990-04-19 | 1993-02-16 | Hitachi, Ltd. | Charged particle beam apparatus |
US5854490A (en) * | 1995-10-03 | 1998-12-29 | Fujitsu Limited | Charged-particle-beam exposure device and charged-particle-beam exposure method |
US20080116391A1 (en) * | 2006-11-21 | 2008-05-22 | Hitachi High-Technologies Corporation | Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3869636A (en) * | 1972-05-08 | 1975-03-04 | United Aircraft Corp | Filament for electron guns |
US3932749A (en) * | 1974-03-22 | 1976-01-13 | Varian Associates | Electron gun |
GB2140196A (en) * | 1983-05-05 | 1984-11-21 | Cambridge Instr Ltd | Particle beam lenses |
CN105225917B (en) * | 2014-11-19 | 2017-03-29 | 北京航空航天大学 | A kind of ion trap device and method for reducing straight type gun cathode pollution |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2617060A (en) * | 1950-05-02 | 1952-11-04 | Hartford Nat Bank & Trust Co | Cathode-ray tube |
US2911563A (en) * | 1957-04-24 | 1959-11-03 | Westinghouse Electric Corp | Electrostatic lens and deflection system |
US3100260A (en) * | 1961-11-15 | 1963-08-06 | Philips Electronic Pharma | Electron lens for reduction of spherical aberration |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB480948A (en) * | 1936-07-25 | 1938-02-25 | Frederick Hermes Nicoll | Improvements in or relating to cathode ray tubes |
US2661436A (en) * | 1951-11-07 | 1953-12-01 | Rca Corp | Ion trap gun |
US2888605A (en) * | 1955-02-23 | 1959-05-26 | Hughes Aircraft Co | Electron gun |
US3201631A (en) * | 1959-01-02 | 1965-08-17 | High Voltage Engineering Corp | Short focus lens at focal point of long focus lens |
FR1319431A (en) * | 1962-01-19 | 1963-03-01 | Csf | Improvements to electronic cross-field cannons |
-
1966
- 1966-09-06 US US577353A patent/US3452241A/en not_active Expired - Lifetime
-
1967
- 1967-08-11 GB GB36920/67A patent/GB1178406A/en not_active Expired
- 1967-09-06 DE DE1967R0046858 patent/DE1614384B1/en active Pending
-
1968
- 1968-09-12 US US759431A patent/US3614520A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2617060A (en) * | 1950-05-02 | 1952-11-04 | Hartford Nat Bank & Trust Co | Cathode-ray tube |
US2911563A (en) * | 1957-04-24 | 1959-11-03 | Westinghouse Electric Corp | Electrostatic lens and deflection system |
US3100260A (en) * | 1961-11-15 | 1963-08-06 | Philips Electronic Pharma | Electron lens for reduction of spherical aberration |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3732457A (en) * | 1970-01-30 | 1973-05-08 | Victor Co Ltd | Electrode lens potential arrangement for a post-acceleration picture tube |
US3846663A (en) * | 1970-09-18 | 1974-11-05 | Hitachi Ltd | Electron gun device having a field emission cathode tip protected from destruction due to ion impingement |
US3845305A (en) * | 1972-05-12 | 1974-10-29 | Max Planck Gesellschaft | Microbeam probe apparatus |
US3916202A (en) * | 1974-05-03 | 1975-10-28 | Gen Electric | Lens-grid system for electron tubes |
US4634925A (en) * | 1983-10-07 | 1987-01-06 | Mitsubishi Denki Kabushiki Kaisha | Electron gun for a high power klystron |
US5187371A (en) * | 1990-04-19 | 1993-02-16 | Hitachi, Ltd. | Charged particle beam apparatus |
US5854490A (en) * | 1995-10-03 | 1998-12-29 | Fujitsu Limited | Charged-particle-beam exposure device and charged-particle-beam exposure method |
US5872366A (en) * | 1995-10-03 | 1999-02-16 | Fujitsu Limited | Charged-particle-beam exposure device and charged-particle-beam exposure method |
US5949078A (en) * | 1995-10-03 | 1999-09-07 | Fujitsu Limited | Charged-particle-beam exposure device and charged-particle-beam exposure method |
US20080116391A1 (en) * | 2006-11-21 | 2008-05-22 | Hitachi High-Technologies Corporation | Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus |
US7947964B2 (en) * | 2006-11-21 | 2011-05-24 | Hitachi High-Technologies Corporation | Charged particle beam orbit corrector and charged particle beam apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE1614384B1 (en) | 1972-04-27 |
US3452241A (en) | 1969-06-24 |
GB1178406A (en) | 1970-01-21 |
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