US3597266A - Electroless nickel plating - Google Patents
Electroless nickel plating Download PDFInfo
- Publication number
- US3597266A US3597266A US761865A US3597266DA US3597266A US 3597266 A US3597266 A US 3597266A US 761865 A US761865 A US 761865A US 3597266D A US3597266D A US 3597266DA US 3597266 A US3597266 A US 3597266A
- Authority
- US
- United States
- Prior art keywords
- ions
- nickel
- liter
- mole
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract description 103
- 238000007747 plating Methods 0.000 title abstract description 54
- 229910052759 nickel Inorganic materials 0.000 title abstract description 50
- -1 AMMONIUM IONS Chemical class 0.000 abstract description 52
- 239000000243 solution Substances 0.000 abstract description 30
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 24
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 abstract description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract description 17
- 150000002500 ions Chemical class 0.000 abstract description 15
- 229910001453 nickel ion Inorganic materials 0.000 abstract description 14
- 239000012190 activator Substances 0.000 abstract description 12
- 229910052763 palladium Inorganic materials 0.000 abstract description 11
- 230000008021 deposition Effects 0.000 abstract description 9
- 239000007864 aqueous solution Substances 0.000 abstract description 8
- 230000003197 catalytic effect Effects 0.000 abstract description 8
- 239000003054 catalyst Substances 0.000 abstract description 5
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 abstract description 4
- 230000002028 premature Effects 0.000 abstract description 4
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 abstract description 2
- 238000009877 rendering Methods 0.000 abstract description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 abstract 1
- KVZZAKQEFSYAOU-UHFFFAOYSA-N azane palladium(2+) Chemical compound N.[Pd+2] KVZZAKQEFSYAOU-UHFFFAOYSA-N 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 description 23
- 239000004033 plastic Substances 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000006722 reduction reaction Methods 0.000 description 12
- 239000003638 chemical reducing agent Substances 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- 241000080590 Niso Species 0.000 description 5
- 229920001944 Plastisol Polymers 0.000 description 5
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004999 plastisol Substances 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 239000000908 ammonium hydroxide Substances 0.000 description 3
- 229940040526 anhydrous sodium acetate Drugs 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- XXSPKSHUSWQAIZ-UHFFFAOYSA-L 36026-88-7 Chemical compound [Ni+2].[O-]P=O.[O-]P=O XXSPKSHUSWQAIZ-UHFFFAOYSA-L 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 2
- 239000005695 Ammonium acetate Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 description 2
- 229940043376 ammonium acetate Drugs 0.000 description 2
- 235000019257 ammonium acetate Nutrition 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- UPPLJLAHMKABPR-UHFFFAOYSA-H 2-hydroxypropane-1,2,3-tricarboxylate;nickel(2+) Chemical compound [Ni+2].[Ni+2].[Ni+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O UPPLJLAHMKABPR-UHFFFAOYSA-H 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 101100028920 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) cfp gene Proteins 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- DAPUDVOJPZKTSI-UHFFFAOYSA-L ammonium nickel sulfate Chemical compound [NH4+].[NH4+].[Ni+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DAPUDVOJPZKTSI-UHFFFAOYSA-L 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- XEXFVRMLYUDDJY-UHFFFAOYSA-N azane;hydrate;hydrochloride Chemical compound [NH4+].[NH4+].[OH-].[Cl-] XEXFVRMLYUDDJY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- 229910001380 potassium hypophosphite Inorganic materials 0.000 description 1
- CRGPNLUFHHUKCM-UHFFFAOYSA-M potassium phosphinate Chemical compound [K+].[O-]P=O CRGPNLUFHHUKCM-UHFFFAOYSA-M 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
Definitions
- the nickel ions are supplied by any suitable source of nickel ions such as, for example, one or more watersoluble nickel salts, e.g., nickel chloride, nickel sulfate, nickel acetate, nickel ammonium sulfate and nickel hypophosphite.
- Ammonium ions are supplied to the bath by any suitable source of ammonium ions such as, for example, a suitable ammonium compound exemplified by ammonium hydroxide ammonium chloride, ammonium acetate, ammonium sulfate and ammonium hypophosphite.
- the surfaces capable of being nickel plated with the electroless nickel plating baths herein are both electrically non-conductive or nonmetaliic surfaces and metallic surfaces.
- Nonmetallic surfaces platable herein are exemplified by organic plastic surfaces, e.g., surfaces of acrylonitrile-butadiene-styrene resins, epoxy resins, polypropylene, polysulfone and polystyrene.
- the object or article may be formed entirely of plastic, or partially of plastic with the plastic forming a surface or surfaces and being secured or bonded to another material.
- the metallic surfaces are exemplified by surfaces of ferrous metal, e.g., steel, nickel, cobalt or palladium.
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US76186568A | 1968-09-23 | 1968-09-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3597266A true US3597266A (en) | 1971-08-03 |
Family
ID=25063455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US761865A Expired - Lifetime US3597266A (en) | 1968-09-23 | 1968-09-23 | Electroless nickel plating |
Country Status (2)
Country | Link |
---|---|
US (1) | US3597266A (enrdf_load_stackoverflow) |
JP (1) | JPS4815776B1 (enrdf_load_stackoverflow) |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3930896A (en) * | 1973-05-18 | 1976-01-06 | Tatsuta Densen Kabushiki Kaisha | Method for producing metal film resistor by electroless plating |
US4084023A (en) * | 1976-08-16 | 1978-04-11 | Western Electric Company, Inc. | Method for depositing a metal on a surface |
US4097286A (en) * | 1976-03-25 | 1978-06-27 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
US4131519A (en) * | 1976-08-04 | 1978-12-26 | Ppg Industries, Inc. | Cathode electrocatalyst |
WO1982000666A1 (en) * | 1980-08-12 | 1982-03-04 | Macdermid Inc | Method for continuous metal deposition from a non-autocatalytic electroless plating bath using electric potential |
US4459184A (en) * | 1980-08-12 | 1984-07-10 | Macdermid, Inc. | Method for continuous metal deposition from a non-autocatalytic electroless plating bath using electric potential |
US5445720A (en) * | 1990-08-29 | 1995-08-29 | Xerox Corporation | Substrates, belts and electrostatographic imaging members, and methods of making |
US6080447A (en) * | 1998-05-14 | 2000-06-27 | Enthone-Omi, Inc. | Low etch alkaline zincate composition and process for zincating aluminum |
US6468672B1 (en) | 2000-06-29 | 2002-10-22 | Lacks Enterprises, Inc. | Decorative chrome electroplate on plastics |
US20040144285A1 (en) * | 2002-10-04 | 2004-07-29 | Enthone Inc. | Process and electrolytes for deposition of metal layers |
US20060135282A1 (en) * | 2004-12-17 | 2006-06-22 | Integran Technologies, Inc. | Article comprising a fine-grained metallic material and a polymeric material |
WO2010045559A1 (en) | 2008-10-16 | 2010-04-22 | Atotech Deutschland Gmbh | Metal plating additive, and method for plating substrates and products therefrom |
EP2671969A1 (en) | 2012-06-04 | 2013-12-11 | ATOTECH Deutschland GmbH | Plating bath for electroless deposition of nickel layers |
EP3026143A1 (en) | 2014-11-26 | 2016-06-01 | ATOTECH Deutschland GmbH | Plating bath and method for electroless deposition of nickel layers |
EP3190209A1 (en) | 2016-01-06 | 2017-07-12 | ATOTECH Deutschland GmbH | 1-acylguanidine compounds and the use of said compounds in electroless deposition of nickel and nickel alloy coatings |
EP3190208A1 (en) | 2016-01-06 | 2017-07-12 | ATOTECH Deutschland GmbH | Electroless nickel plating baths comprising aminonitriles and a method for deposition of nickel and nickel alloys |
US20180312976A1 (en) * | 2017-04-26 | 2018-11-01 | Rolls-Royce Corporation | Coated article resistant to corrosion with nano-crystalline layer |
US10752999B2 (en) | 2016-04-18 | 2020-08-25 | Rolls-Royce Corporation | High strength aerospace components |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53129181U (enrdf_load_stackoverflow) * | 1977-08-23 | 1978-10-13 |
-
1968
- 1968-09-23 US US761865A patent/US3597266A/en not_active Expired - Lifetime
-
1969
- 1969-09-22 JP JP44074718A patent/JPS4815776B1/ja active Pending
Cited By (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3930896A (en) * | 1973-05-18 | 1976-01-06 | Tatsuta Densen Kabushiki Kaisha | Method for producing metal film resistor by electroless plating |
US4097286A (en) * | 1976-03-25 | 1978-06-27 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
US4131519A (en) * | 1976-08-04 | 1978-12-26 | Ppg Industries, Inc. | Cathode electrocatalyst |
US4084023A (en) * | 1976-08-16 | 1978-04-11 | Western Electric Company, Inc. | Method for depositing a metal on a surface |
US4459184A (en) * | 1980-08-12 | 1984-07-10 | Macdermid, Inc. | Method for continuous metal deposition from a non-autocatalytic electroless plating bath using electric potential |
JPS57501188A (enrdf_load_stackoverflow) * | 1980-08-12 | 1982-07-08 | ||
WO1982000666A1 (en) * | 1980-08-12 | 1982-03-04 | Macdermid Inc | Method for continuous metal deposition from a non-autocatalytic electroless plating bath using electric potential |
US5445720A (en) * | 1990-08-29 | 1995-08-29 | Xerox Corporation | Substrates, belts and electrostatographic imaging members, and methods of making |
US6080447A (en) * | 1998-05-14 | 2000-06-27 | Enthone-Omi, Inc. | Low etch alkaline zincate composition and process for zincating aluminum |
US6468672B1 (en) | 2000-06-29 | 2002-10-22 | Lacks Enterprises, Inc. | Decorative chrome electroplate on plastics |
US20040144285A1 (en) * | 2002-10-04 | 2004-07-29 | Enthone Inc. | Process and electrolytes for deposition of metal layers |
US7846503B2 (en) | 2002-10-04 | 2010-12-07 | Enthone Inc. | Process and electrolytes for deposition of metal layers |
EP1413646A3 (de) * | 2002-10-04 | 2008-01-16 | Enthone Inc. | Verfahren zur stromlosen Abscheidung von Metallen |
US20080090066A1 (en) * | 2004-12-17 | 2008-04-17 | Integran Technologies, Inc. | Article comprising a fine-grained metallic material and a polymeric material |
US7354354B2 (en) | 2004-12-17 | 2008-04-08 | Integran Technologies Inc. | Article comprising a fine-grained metallic material and a polymeric material |
US20080254310A1 (en) * | 2004-12-17 | 2008-10-16 | Integran Technologies, Inc. | Article comprising a fine-Grained metallic material and a polymeric material |
US7553553B2 (en) | 2004-12-17 | 2009-06-30 | Integran Technologies, Inc. | Article comprising a fine-grained metallic material and a polymeric material |
US20060135282A1 (en) * | 2004-12-17 | 2006-06-22 | Integran Technologies, Inc. | Article comprising a fine-grained metallic material and a polymeric material |
EP2261027A2 (en) | 2004-12-17 | 2010-12-15 | Integran Technologies Inc. | Article comprising a fine-grained metallic material and a polymeric material |
WO2010045559A1 (en) | 2008-10-16 | 2010-04-22 | Atotech Deutschland Gmbh | Metal plating additive, and method for plating substrates and products therefrom |
EP2671969A1 (en) | 2012-06-04 | 2013-12-11 | ATOTECH Deutschland GmbH | Plating bath for electroless deposition of nickel layers |
WO2013182489A2 (en) | 2012-06-04 | 2013-12-12 | Atotech Deutschland Gmbh | Plating bath for electroless deposition of nickel layers |
EP3026143A1 (en) | 2014-11-26 | 2016-06-01 | ATOTECH Deutschland GmbH | Plating bath and method for electroless deposition of nickel layers |
WO2016083195A1 (en) | 2014-11-26 | 2016-06-02 | Atotech Deutschland Gmbh | Plating bath and method for electroless deposition of nickel layers |
EP3190209A1 (en) | 2016-01-06 | 2017-07-12 | ATOTECH Deutschland GmbH | 1-acylguanidine compounds and the use of said compounds in electroless deposition of nickel and nickel alloy coatings |
EP3190208A1 (en) | 2016-01-06 | 2017-07-12 | ATOTECH Deutschland GmbH | Electroless nickel plating baths comprising aminonitriles and a method for deposition of nickel and nickel alloys |
US10752999B2 (en) | 2016-04-18 | 2020-08-25 | Rolls-Royce Corporation | High strength aerospace components |
US20180312976A1 (en) * | 2017-04-26 | 2018-11-01 | Rolls-Royce Corporation | Coated article resistant to corrosion with nano-crystalline layer |
Also Published As
Publication number | Publication date |
---|---|
JPS4815776B1 (enrdf_load_stackoverflow) | 1973-05-17 |
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