US3565978A - Replication of surface deformation images - Google Patents

Replication of surface deformation images Download PDF

Info

Publication number
US3565978A
US3565978A US666617A US3565978DA US3565978A US 3565978 A US3565978 A US 3565978A US 666617 A US666617 A US 666617A US 3565978D A US3565978D A US 3565978DA US 3565978 A US3565978 A US 3565978A
Authority
US
United States
Prior art keywords
replica
generation
layer
master
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US666617A
Other languages
English (en)
Inventor
William F Folger
Ronald H Cohen
John C Urbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Application granted granted Critical
Publication of US3565978A publication Critical patent/US3565978A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C3/00—Reproduction or duplicating of printing formes
    • B41C3/08—Electrotyping; Application of backing layers thereon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C3/00—Reproduction or duplicating of printing formes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/022—Layers for surface-deformation imaging, e.g. frost imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H1/182—Post-exposure processing, e.g. latensification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H2001/0284—Replicating a master hologram without interference recording by moulding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H2001/0288—Replicating a master hologram without interference recording by electroforming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H2001/0296—Formation of the master hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/53—Photoconductor thermoplastic reactivity wherein light is transformed into an electrostatic then into a thickness distribution

Definitions

  • Relief will not occur where there is uniform charge distribution. This is an important difference, not only from the viewpoint of application, but also because it definitely indicates a different mechanism for the two systems.
  • a latent electrostatic image or charge pattern is formed on an insulating film which is softenable as by the application of heat or solvent vapor. After the latent electrostatic image is formed, the film is softened until the electrostatic forces of the charge pattern exceed the surface tension forces of the film. When this threshold condition is reached, a series of very small surface folds or wrinkles are spontaneously formed on the film surface, the depth of the wrinkles in a particular area of the film being generally dependent upon the intensity of charge in that area and the film thickness. This gives the image a frosted appearance.
  • the film may be softened prior to the application of the charge pattern if the film remains sufiiciently insulating in a softened state to hold the charge.
  • the frost image is set or fixed by allowing the film to reharden. In a reusable frost system it is usually desirable to later erase the fixed image after use by resoftening the thermoplastic film and maintaining a sufficiently low viscosity for appropriate periods of time to permit surface tension forces to smooth the film surface.
  • holography is a two-step imaging process in which the defraction pattern of an object illuminated with coherent radiation such as laser light is recorded on a radiation sensitive layer. This record, known as a hologram, is then used to reconstruct an image forming wave front by reilluminating the hologram with coherent electromagnetic radiation.
  • Holography has a great many advantages over other imaging techniques.
  • a hologram may be used to reconstruct a three dimensional image with radiation of another wavelength than that used to record the hologram, resulting in high magnification. It may be used for the secure transmission of information, since the hologram is an extremely complex coding of optical information and bears little or no resemblance to the original scene. Also, it may be used for rapidly making many similar images of the original since when the hologram is cut into a number of sections, each section contains all of the holographic information necessary to reconstruct the original image.
  • phase holograms in which the image formation is stored in a phase modulating pattern rather than an amplitude modulating pattern as described, for example, in an article by G. L. Rogers in the Proceedings of the Royal Society, Edinberg, 193 (1953) and in an article by W. T. Cathey, Jr. in the'Journal of the Optical Society of America, 55, 457 (1965).
  • phase holograms have previously been made from conventional silver holograms by bleaching the silver and using the phase difference introduced by gell swelling and/or refractive index changes. Although these have certain advantages over amplitude holograms, they require extremely diflicult and complex processing to produce.
  • phase holograms may be prepared on a deformable thermoplastic layer coated on a photoconductive layer.
  • the deformable layer is uniformly electrostatically charged and exposed to the object and reference beams using coherent radiation to which the photoconductor is sensitive.
  • the deformable layer is recharged and the plate is heated to the softening temperature of the deformable layer. At this temperature, spontaneous surface deformation occurs according to the holographic pattern.
  • the layer is then cooled to fix the holographic record.
  • the heating can take place during exposure so that the reconstructed image may be viewed simultaneously with the formation of the hologram.
  • This process is capable of simply producing phase holograms of excellent quality and extraordinary resolution.
  • the surface appears to have a random pattern of very fine, almost invisible, surface ridges and valleys. Since the average depth of these ridges and valleys is often less than 1 micron, they cannot be seen with the unaided eye.
  • the materials which may be easily deformed often are low melting, have a tacky surface and are soft. Theymay be easily damaged in handling and through inadvertent contact with dust or exposure to moderately high temperatures. While the fact that the deformable plates may be erased by re'softening the layer and allowing the surface to be smoothed by viscosity forces where it is desired to reuse the plate may be desirable, this temperature sensitivity would be undesirable where a permanent record is desired. It is difficult to form replicas of an original hologram since the surface of the original is easily degraded. Casting against a holographic original from a melt is difiicult since heating the original tends to destroy the holographic pattern.
  • a replication method which includes, generally, the steps of casting against the original surface deformation image pattern bearing surface with a curable casting material, curing the casting material to form a negative replica, casting a second generation positive replica by casting from the first generation negative replica, transferirng the cast second generation replica to a support surface, and repeating the second generation casting and transfer steps.
  • the process may include the steps of silvering the second geneartion replica, electroforming a metal surface on the silvered second generation replica, separating the metal layer from the second generation replica to form a third generation metal negative replica and pressing a thermoplastic preform against the metal replica to form the fourth generation final positive replica of the original image or passivating the surface of the third generation metal negative replica, electroforming a metal surface on the passivated surface, separating the metal layer from the third generation negative replica to form a fourth generation metal replica and pressing a. thermoplastic preform against the fourth generation metal replica to form a final fifth generation negative replica of the final image.
  • An-image pattern may be any surface deformation configuration which conveys intelligence to the eye or through a read-out or reconstruction system.
  • the surface deformation pattern to be replicated is first prepared by any conventional. technique. It is preferred that the surface of this original be treated to harden or toughen it, as is further described below.
  • a first generation replica is then prepared by casting against the original surface with a material which does not adversely affect the original.
  • a second generation replica is then cast from the first generation replica.
  • the thus formed second generation replica is then transferred to a support surface to form a final positive replica of the original image and the first generation replica is reemployedas a master or thin silver layer is formed on the'second generation replica and a thicker nickel layer is electroformed thereon.
  • a silver and nickel third generation replica may be used either as a short run stamper, or a tougher fourth generation nickel master may be formed thereagainst after passivation for use as a long run stamper.
  • the original surface deformation image to be replicated may be prepared by anysuitable method.
  • the technique of this invention is especially suitable for replicating phase holograms of the sort described in parent application Ser, No. 521,982, filed Jan. 20, 196 6.
  • This replicating technique is also useful for making replicas of frost images of the sort described in U.S. Pat. 3,196,001 and relief images of the sort described in US. Pat. 3,005,006.
  • Surface deformation images formed by any of these techniques are generally fragile and susceptible to damage ⁇ by heat or abrasion. These images are generally formed by forming an electrostatic charge pattern on a surface of a deformable thermoplastic, and heating the thermoplastic to its softening temperature whereby the deformation image spontaneously forms. Thus, these images are generally formed on thermoplastics which soften only slightly above room temperature.
  • insulating thermoplastics include the glycerol and pentaerythritol esters of partially hydrogenerated rosen, polyalpha methyl styrene, terpolymers of styrene, indene and isoprene; Piccolyte S- and S-100 (polyterpene resins made from beta pinene available from Pennsylvania Industrial Chemical Company and having ring and ball melting points of 70 and 100 C., respectively); Piccopale 70 SF and Piccopale (nonreactive olefindiene resins available from Pennsylvania Industrial Chemical Company, having melting points of 70 and 85 C.
  • Piccolastic A-75, D-l00 and E-lOO (po1y styrene resins with melting points of 75, and 100 C., respectively available from Pennsylvania Industrial Chemical Company); Amberol ST137X (an unreactive, unmodified phenolformaldehyde resin available from the Rohm & Haas Chemical Company); Neolyn 23 (an alkyd resin available from Hercules Chemical Company); poly carbonates, polysulfones, poly(vinylchloride), mixtures of low molecular weight silicone and styrene resins, and mixtures thereof.
  • thermoplastic soften slightly above room temperature and be substantially insulating at the softening temperature so that the surface deforms properly in response to surface charge patterns.
  • these preferred materials are slightly soft and tacky at room temperature and surface deformation patterns formed using them are susceptible to degradation upon slight heating or contact with most organic solvents. Therefore, care must be used in handling imaged sheets.
  • thermoplastic insulating layer may be coated over a photoconductive insulating layer or may be made photoconductive by incorporating suitable photoconductive materials therein or by sensitizin the resin to form a photoconductive charge transfer complex.
  • Typical overcoatable photoconductive layers include amorphous selenium; pigment binder layers including photoconductive pigments such as cadmium sulfide, cadmium selenide, zinc sulfide, zinc selenide, zinc oxide, lead oxide, titanium dioxide, lead iodide, lead selenide, dispersed in an insulating film-forming binder such as a silicone resin, a styrene-butadiene resin or the like.
  • Suitable organic photoconductors may also be formed into overcoatable layers or may be mixed into the heat deformable layer. Where desired, these photoconductors may be sensitized, such as with small amounts of dyes or Lewis acids, Typical organic photoconductors include 1,4-dicyano-naphthalene; 2,5-bis-(p-amino-phenyl)l,3,4-oxidiazole; N- vinyl carbazole; phthalocyanines, quinacridones, and mixtures thereof. Where the deformable layer comprises a suitable aromatic polymer, the layer itself may be made photoconductive by complexing it with a suitable Lewis acid.
  • Typical Lewis acids include 2,4,7-trinitro-9-fiuorenone, 4,4-bis-(dimethyl-amino) benzophenone, tetrachlorophthalic anhydride, chloranil, picric acid, 1,3,5-trinitrobenzene, and mixtures thereof.
  • the surface deformation image may be formed on the heat deformable layer by any suitable technique.
  • the image forming steps include uniformly electrostatically charging the surface of the layer, exposing the surface to a light pattern to be reproduced and softening the layer to permit the surface deformation image to spontaneously form.
  • uniform electrostatic charge may be formed, for example, by corona discharge as described by Carlson in US. Pat. 2,588,699.
  • the uniform electrostatic charging may be accomplished by other techniques, such as tri'boelectric friction charging as described by Carlson in U.S Pat. 2,297,- 691 if desired.
  • the uniform char e may be formed, for example, by the double corona technique described by Gundlach in US. Pat. 2,885,556. Where a frost or relief image is to be formed, exposure will be to a pattern of light-and-shadow to be reproduced. Where the deformable layer is self-photoconductive, the exposure step may be immediately followed by development.
  • the deformable layer is coated over a photoconductor, it is generally desirable to recharge the surface of the deformable layer, as by corona charging, to form a surface charge pattern suitable for development, Where it is desired to produce a phase hologram, exposure may be by the techniques described in the above-cited parent application. Development may be by any suitable technique which softens the surface of the deformable layer allowing the deformation image to form, In general, it is preferable to heat the plate to the softening temperature of the deformable layer, allow the deformation image to form and then cool below the softening temperature of the layer to fix the image. However, if desired, the surface may be softened by application of a solvent liquid or vapor to the surface of the deformable layer.
  • the original be treated so as to form a surface skin having a thickness greater than about 0.3 micron.
  • the fixing of surface deformation originals by forming such surface skins is further described in copending application Ser. No. 388,324, filed Aug. 7, 1964.
  • This surface skin is harder and less solvent soluble, hence tends to make the original more resistant to erasure by abrasion, slight heating or contact with small amounts of solvent vapor.
  • Any suitable method may be used to form the surface skin. This may be by in situ formation or by deposition of one material on a second material.
  • Typical methods of skin formation include exposure to actinic light, X-rays, beta rays, gamma rays, electrical bombardment, corona discharge, high voltage discharge, exposure to visible light, exposure to air, contact with chemical means such as oxidizing agents and/or cross linking agents, the addition of sensitizers to increase the sensitivity of the heat-deform able layer to skin forming means, spraying, dip coating, and any suitable combination of these techniques.
  • chemical means such as oxidizing agents and/or cross linking agents
  • the degree and extent of exposure to these various radiation means may be varied to form a suitable surface skin. It has been found with the generally preferred der formable materials, exposure to ultraviolet radiation for a sufiicient period gives a surface skin having excellent fixing characteristics. Therefore, ultraviolet exposure is a preferred method of forming the surface skin.
  • the second step in the replication process of this inven tion is the preparation of a negative replica by casting against the original surface deformation image.
  • Typical hardenable materials include low melting metal alloys such as Cerralow 117, a bismuth indium alloy available from the Cerro Corporation; waxes such as Epolene Cl2, a low molecular weight polyeth ylene wax available from Eastman Chemical Co.; gelatin such as the food product produced by the Knox Gelatin Company, polyvinyl alcohols such as Elvanol 71-30 and Elvanol 72-60 available from Du Pont Electrochemical; one or multiple component silicone rubbers such as RTV- ll, RTV-20, RTV-60, RTV112, RTV-116 and RTV- 118 available from General Electric, Silastic RTV-501, Silastic RTV S-5137A, Silastic RTV S-5138A, Silastic RTV S-5302 and Silastic RTV S5303 available from Dow Corning; and mixturesthereof.
  • low melting metal alloys such as Cerralow 117, a bismuth indium alloy available from the Cerro Corporation
  • waxes such as Epolene Cl2, a low
  • this first negative replica be prepared using a curable material. Optimum results are obtained with silicone rubber compounds which cure at temperatures below about 200 F. Silicone rubbers provided the highest resolution replica of any hardenable material tested. Silicone rubbers may be formed from silicone gums. These gums are largely made up of polymers of dimethyl silicone. The gums may contain dimethyl siloxanes copolymerized with minor amounts of another difunctional silicone. For example, polydimethylsiloxanes may be copolymerized with about to about 15 percent of diphenyl silicone, diethyl silicone or methylphenyl silicone.
  • the silicone gum may also contain active sites such as SiH, SiOH, or SiOC H and groups such as vinyl, fluorocarbon or nitrile groups may be introduced into the silicon-e molecule.
  • active sites such as SiH, SiOH, or SiOC H
  • groups such as vinyl, fluorocarbon or nitrile groups may be introduced into the silicon-e molecule.
  • finely divided fillers such as silica gel, calcium carbonate, titanium dioxide, iron oxide or mixtures thereof may be mixed with the silicone gum to increase the tensile strength of the ultimate silicone rubber replica.
  • image resolution increases with a decrease in average filler particle diameter.
  • Typical fillers range in diameter from about millimicrons to about one micron.
  • Any suitable catalyst such as metal soaps, peroxides and other materials capable of generating free radicals may be used to cure silicone gum compositions which require the addition of a catalyst.
  • Typical catalysts include benzoyl peroxide, dichlorobenzoyl peroxide, di-tert-butyl peroxide, t-butyl peroxide and mixtures thereof.
  • the rate of curing depends upon the relative quantity of catalyst employed. Satisfactory curing rates are achieved when up to about 5 percent by weight of catalyst based on the weight of the silicone rubber is used. Curing is believed to occur by the formation of siloxane crosslinks between polymer chains.
  • the curable material is placed in a vacuum to remove entrapped air and then introduced into a mold in contact with the surface deformation image to be reproduced. The casting material is allowed to cure after which it is peeled from the original.
  • the next step in the replication process of this invention is the preparaton of a second generation positive replica by casting from the first generation negative replica.
  • Any suitable film-forming material which can be liquified and which does not attack the first generation replica may be used.
  • the replication casting material may be prepared by dissolving a suitable film forming material in a solvent. Wide latitude in the relative quantity of solvent employed is permitted, the ultimate formation of a continuous film being the principal limiting factor.
  • Typical film forming materials include solutions of polystyrene in toluene, polymethyl methacrylate in methyl ethyl ketone, polyethyl methacrylate in ethylene dichloride, cellulose acetate butyrate in ethyl acetate, curable epoxy resins, curable polyester resins, molten polystyrene, molten polymethyl methacrylate, molten polyethylene, plastisols such as polyvinyl chloride resin dispersed in Z-ethylphenylester, and mixtures thereof.
  • Acrylic resins, particularly polyisobutyl methacrylate are preferred because they harden uniformly without bubble formation and are compatible with the generally used substrate, which are often acrylic materials.
  • the casting material is formed into a thin liquid layer on a supporting member and/or on the first generation replica.
  • the supporting member is placed upon the first generation replica under slight pressure. If solidification has not occurred prior to assembly, the liquid layer or layers is allowed to cure or dry for a suitable time.
  • the resulting casting is a rigid, fiat second generation (positive) replica of the original surface deformation image.
  • a liquid layer of casting material on the surface of the first generation replica is allowed to solidify prior to contact with the supporting member, transfer of the solidified layer to the supporting member is oc casionally enhanced 'by the application of heat to the supporting member prior to or during transfer, especially if the solidified layer is non-tacky.
  • Substantial solidification of the liquid layer on the surface of the first generation replica prior to transfer is preferred because greater production rates are achieved, particularly when film forming materials dissolved in a fugitive solvent are employed.
  • solvent softening of the cast layer and/or supporting member or any suitable conventional adhesive may be employed to effect bonding of the cast layer to the supporting member.
  • the support member may be of any convenient thickness, rigid or flexible, solvent soluble or insoluble, transparent or opaque, and may be in any desired form such as a web, sheet, plate or the like.
  • the support member should, however, have at least one smooth surface which can support the second generation replica without unduly distorting the image.
  • the first generation replica may be employed as a master to form a plurality of final second generation positive replicas.
  • the preferred technique of forming the final second generation positive replica includes the steps of solidifying the hardenable casting material to a tacky state and transferring the solidified casting material with the aid of pressure to the surface of a support member.
  • the pressure employed to effect transfer is not particularly critical, but should be sufficient to at least bring about good contact between the casting material and the surface of the support member.
  • Excellent replicas are achieved when the casting material is suificiently tacky to stick or adhere (transfer), within five seconds, under slight pressure, e.g., thumb pressure, to a sheet of clear cellulose acetate and remain adhered thereto after separation of the first generation replica from the casting material.
  • molten or curable casting materials may beemployed, optimum results are achieved with solutions of film forming polymers in volatile solvents. Solutions of film forming polymers are found to reach the tacky state in less time than other hardenable materials with' less expenditure of energy and to provide higher resolution images. The quantity of casting solution should be sufficient to form a dried layer having a smooth deformation free outer surface.
  • a metal surfaced replica is prepared. After chemically cleaning and sensitizing the surface of the second generation replica, a metal such as silver is chemically reduced and sprayed upon the second generation replica to a thickness sufficient to insure the absence of pinholes and sufiicient to bear the subsequently employed electric plating current. This thickness is preferably about 3 or 4X10 inches for maximum avoidance of pinholes and warping during the electro-forming step. This coating provides the hghly conductive surface required to produce a good electroformed metal master replica. A typical suitable process for sensitizing and silvering is described by A. M. Max in Application of Electroforming to the Manufacturing of Disk Records," ASTM Special Technical Publication No. 318 (1962).
  • the second generaton replica is then placed in a nickel sulfamate electroforming bath and nickel is electroplated onto the conductive surface.
  • the plating bath is held at a temperature of about F. while the current drawn for a 12 inch disk is about 50 amperes.
  • the electroforming is continued until the layer has suflicient thickness to be self-supporting. Optimum layer integrity and maximum freedom from image distortion is achieved with a nickel layer thickness between about 0.005 to about 0.012 inch.
  • the metallic layer is lifted from the plastic, from which it separates easily, to yield a third generation silvered metal master (negative) replica.
  • This metal master may now be used to stamp replicas of the original surface deformation image by the stamping processes described below. However, if desired, a more durable metal master may be prepared.
  • Nickel sulfamate electroforming baths are preferred because of the rapid and uniform deposition achieved.
  • the surface of the third generation metal master negative replica is treated with a potassium dichromate solution to chemically passivate its surface. This treatment permits the electroforming of an all-nickel replica of the silvered surface but prevents a metal to metal bond from forming. This results in a durable, nickel (positive) fourth generation replica. If desired, a durable fifth generation nickel (negative) replica may be formed from the fourth generation replica. Also, if desired, the surface may be given a chromium flash to increase the life of the stamper.
  • thermoplastic film typically, cellulose acetate having a thickness of from about 0.003 to about 0.010 inch
  • the thermoplastic film is preheated to a suitable temperature so that there are no thermal shock effects when it is pressed against the stamper of even higher temperature.
  • thermoplastic material may be used in this hot stamping process.
  • thermoplastics include acetates such as cellulose acetate, cellulose acetate butyrate, cellulose triacetate, butyrates, polycarbonates; polyesters such as polyethylene terephthalate; vinyl resins such as polyvinyl chloride, polysulfone resins, and mixtures thereof. Satisfactory images are obtained on most thermoplastic materials tested with stamping pressure between about 400 p.s.i.g. to about 6,000 p.s.i.g., a thermoplastic film preheat temperature up to about the softening range of the thermoplastic film material, a stamping master temperature from about 120 F. to about 400 F. and a pressing time less than about 30 seconds. Generally, higher pressures are necessary when lower stamping master temperatures are employed.
  • the highest quality replicas are produced on cellulose acetate with a stamping pressure of from about 400 to 6,000 p.s.i.g., a preheat temperature up to about 200 F., a stamping master temperature of from about 120 F. to about 300 F., and a pressing time of from about 1 to seconds.
  • a stamping pressure of from about 400 to 6,000 p.s.i.g., a preheat temperature up to about 200 F.
  • a stamping master temperature of from about 120 F. to about 300 F.
  • a pressing time of from about 1 to seconds.
  • Cold stamping may be substituted for the hot stamping technique described above.
  • the hot stamping technique is preferred because less pressure is required and mold erosion is significantly reduced.
  • metallic coated plastic films may be used to produce reflection type holographic replicas.
  • a clear plastic replica may be metallized after the replica is formed. Both sides of the plastic sheet may be stamped simultaneously or sequentially with the same or different holograms.
  • the stamping master may be either planar or formed on the surface of a cylinder suitable for rolling across the thermoplastic sheets.
  • thermoplastic film is held under pressure for comparatively short time and is then released hot leaving the softened plastic unconstrained by the mold during cooling.
  • distortion is not evident from direct viewing of the image despite the fact that the material was not cooled before removal from the mold.
  • This obviates a mold temperature reduction step after the formation of each replica and permits extremely rapid production of a series of very high quality replicas from a single master.
  • this hot stamping process has the advantage of being completely dry and free of solvent recovery or disposal problems.
  • EXAMPLE I layer of Staybelite Ester 10 (a glycerol ester of 60 percent hydrogenated rosin available from the Hercules Chemical Company) to a dry thickness of about 1 micron.
  • This layer is applied by withdrawing the substrate from a 20 percent solution of the resin in a kerosene solvent at a rate of about 5 inches per minute.
  • the com pleted imaging member consists of a conductive base, a photoconductive layer and a deformable thermoplastic layer.
  • This plate is corona charged in darkness to a surface potential of about 500 volts.
  • the plate is then exposed in a system of the sort shown in FIG. 1 of copending parent application Se'r. No. 521,982, filed Jan. 20, 1966.
  • the exposure is to object and reference beams using a helium neon continuous wave laser operated in the term 00 mode at 6328 angstrom units (Model 5200 available from the Perkin Elmer Company).
  • the reference beam is brought in at an angle of about 30 degrees.
  • the plate After rechanging, the plate is then slowly heated to its softening temperature. The reconstructed image is viewed simultaneous with the formation of the hologram. After the deformations are well formed, the plate is cooled to fix the image. A holographic record of excellent quality with resolution of about 800 lines per millimeter is thus produced.
  • the hologram is exposed for about 6 hours to ultra violet light from a General Electric watt mercury arc lamp at a distance of approximately 6 inches. As described above, this toughens the surface and makes it less susceptible to damage.
  • RTV-1l room temperature vulcanizing silicone rubber composition available from the General Electric Company
  • catalyst supplied with the rubber.
  • This mixture is placed in a vacuum desiccator at a pressure of less than 2 p.s.i.g. to allow trapped air to leave the mixture. Froth produced by the exiting trapped air is observable on the surface of the mixture. After about 5 minutes, the pressure is slowly brought up to ambient pressure. The original hologram is then placed face up in the bottom of a rectangular, half-inch mold. After skimming off the upper surface of the evacuated silicone rubber mixture, the mix ture is carefully poured into the mold to a level of approximately /8 inch to insure that all of the contours will be completely filled.
  • the resin is then allowed to cure at room temperature for about 48 hours. With larger amounts of catalyst, the cure time may be shortened considerably.
  • the cured rubber is then peeled from the original. The result is a flexible, rubber, durable first generation negative master replica. The original hologram is undamaged by this casting process.
  • a castingsolution is then prepared by dissolving about 17 parts powdered Elvacite No. 2045 (a polyisobutyl methacrylate resin available from E. I. du Pont de Nemours & Company) and about 28 parts purified ethylene dichloride. The solution is allowed to stand for several hours to let air bubbles escape from the stirred liquid. A piece of clear Plexiglas (polymethyl methacrylate available from Rohm & Haas Company) having a thickness of about .4 inch is cut to size slightly larger than the rubber master. A thick stream of the replicating solution is poured along one edge of the Plexiglas substrateand along one edge of the rubber mold. Glass stirring rods are then used to roll the streams into a thin layer of solution over both the plastic and rubber surfaces.
  • Elvacite No. 2045 a polyisobutyl methacrylate resin available from E. I. du Pont de Nemours & Company
  • the solution is allowed to stand for several hours to let air bubbles escape from the stirred liquid.
  • the coated plastic substrate is placed upon the coated rubber in a manner which resembles a hinged door moving to closed position. Any air bubbles remaining will be squeezed out during this operation. Finally, a weight sufficient to produce about 0.18 p.s.i.a. on the solution interface is placed on the plastic substrate and the system is allowed to dry for approximately 3 hours at room temperature. The result is a rigid, transparent plastic second generation positive replica of high quality.
  • the silicone rubber first generation master is undamaged by this casting process.
  • a metal hologram replica is then prepared. After chemically cleaning and sensitizing the surface of the second generation plastic replica with a stannous chloride solution, silver is chemically reduced from an ammoniacal silver nitrate solution while being sprayed on the plastic replica. The resulting silver layer has a thickness of approximately 3 l0 inches. The silver coating provides the highly conductive surface required to produce a good electroformed metal replica.
  • the nickel layer having a thickness of about 0.012 inch is then electroformed onto the silver surface in a nickel sulfamate bath at a temperature of about 130 F. and a total current for a 12 inch disk of about 50 amperes. After electroforming, the nickel backed silver is easily lifted from the plastic to yield a third generation, negative, metal master replica with a silver surface. This master is suitable for use as a short run stamper.
  • a plurality of replicas of the original hologram are then produced using the metal master.
  • a dry cellulose acetate film having a thickness of about 0.007 inch is preheated to about 190 F.
  • the metal master is heated to about 280 F. and is pressed against the preheated cellulose acetate film at a pressure of about 800 p.s.i.g. against a flat press-pad. Pressure and temperature are maintained for about seconds. At the end of the pressing time, the pressed plastic film is released without any prerelease cooling.
  • the result is an excellent quality replica of the original hologram. Over 100 additional replicas are similarly hot pressed before quality of the replica begins to noticeably decrease.
  • EXAMPLE II An original hologram, a catalytic cast first generation and a solvent cast second generation masters are prepared as in Example I. In this case, it is desired to prepare a more durable hot pressing master so that a greater number of replicas may be produced. After the plastic replica has been coated with silver and a 0.012 inch layer of nickel has been electroformed thereon, the silver surface is treated with a potassium dichromate solution to passivate the surface. This permits the electroforming of another nickel layer against the silver surface without producing silver-to-nickel bonding. After a 0.01 inch layer of nickel is thus electroformed, it is separated from the silvernickel master. The result is a durable, all-nickel (positive) fourth generation master.
  • this metal master may be given a chromium flash for about 1 minute drawing about 375 amperes to a 14 inch disk area to further increase the life of the stamper.
  • EXAMPLE IV An original hologram, and a catalytically cast first generation master are prepared as in Example I. In this case, it is desired to prepare a second generation replica at a more rapid rate than that illustrated in Example I.
  • the first generation master is dipped in a bath of about 2 grams of polymethyl methacrylate dissolved in 200 milliliters of methyl ethyl ketone and smoothly withdrawn over a period of about 3 seconds.
  • the resulting liquid film is permitted to dry in air at room temperature for about 30 seconds until it reaches a tacky state.
  • the tacky film is then pressed into contact with a thin sheet of cellulose acetate butyrate having a thickness of about 10 mils.
  • the first generation master is peeled away immediately after pressure contact with the cellulose acetate butyrate sheet is established.
  • the transferred film exhibits surprisingly strong adhesion to the cellulose acetate sheet.
  • the total time required to form the second generation replica is approximately 360 times faster than the second generation master making steps described in Example I.
  • the first generation master is reused in the manner described above to produce over 100 good quality second generation replicas with no discernable decrease in quality.
  • One of the second generation replicas thus formed is then used to make a third generation master as described in Example I.
  • Example V The process described in Example IV is repeated except that a 12 mil sheet of polyethylene terephthalate is substituted for the cellulose acetate butyrate sheet.
  • the second generation replicas formed are equal in quality to those obtained in Example IV.
  • thermoplastic film preheating said thermoplastic film to about the softening temperature
  • thermoplastic material from about 120 F. to about 400 F., provided the stamping temperature is above the softening temperature of the thermoplastic material;
  • thermoplastic material has a thickness of from about 0.003 to about 0.0l0inch.
  • thermoplastic film is cellulose acetate.
  • thermoplastic material having a softening temperature of from about F. to about 400 F. to about the softening temperature
  • thermoplastic replica stripping the thermoplastic replica from said metal master while said metal master is maintained at about the stamping temperature
  • thermoplastic material has a thickness of from about 0.003 to about 0.010 inch.
  • thermoplastic film is cellulose acetate.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Holo Graphy (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
US666617A 1967-09-11 1967-09-11 Replication of surface deformation images Expired - Lifetime US3565978A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66661767A 1967-09-11 1967-09-11

Publications (1)

Publication Number Publication Date
US3565978A true US3565978A (en) 1971-02-23

Family

ID=24674751

Family Applications (1)

Application Number Title Priority Date Filing Date
US666617A Expired - Lifetime US3565978A (en) 1967-09-11 1967-09-11 Replication of surface deformation images

Country Status (5)

Country Link
US (1) US3565978A (xx)
BE (1) BE710829A (xx)
DE (1) DE1621783B2 (xx)
GB (1) GB1221342A (xx)
NL (2) NL6802421A (xx)

Cited By (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3790245A (en) * 1972-10-12 1974-02-05 Rca Corp Double-sided holographic replicas
US3882207A (en) * 1972-10-12 1975-05-06 Rca Corp Process of producing double-sided holographic replicas
US3898358A (en) * 1972-08-18 1975-08-05 Rca Corp Holographic recording media
US3993401A (en) * 1975-02-10 1976-11-23 Minnesota Mining And Manufacturing Company Retroreflective material including geometric fresnel zone plates
US4001874A (en) * 1973-09-14 1977-01-04 Thomson-Brandt Method apparatus and record for distributing information in the form of color images
US4097117A (en) * 1975-10-30 1978-06-27 Rca Corporation Optical coupler having improved efficiency
DE2807414A1 (de) * 1977-02-18 1978-08-24 Minnesota Mining & Mfg Polymeres optisches element mit antireflektierender oberflaeche
US4231982A (en) * 1975-05-20 1980-11-04 Ab Volvo Method for the production of tools for deep drawing, moulding, extruding and the like
US4250135A (en) * 1979-05-17 1981-02-10 Orsini Peter C Roller for producing continuous sueded or grit type finish and method of making
US4360408A (en) * 1976-12-17 1982-11-23 Hoechst Aktiengesellschaft Information carriers, method of forming and copying said carriers
US4478769A (en) * 1982-09-30 1984-10-23 Amerace Corporation Method for forming an embossing tool with an optically precise pattern
US4482511A (en) * 1981-08-21 1984-11-13 Victor Company Of Japan, Ltd. Method of manufacturing a stamper for information storage discs
EP0145481A2 (en) * 1983-12-12 1985-06-19 E.I. Du Pont De Nemours And Company Improved holographic image transfer process
US4556378A (en) * 1983-09-19 1985-12-03 Lgz Landis & Gyr Zug Ag Apparatus for embossing high resolution relief patterns
US4582885A (en) * 1978-07-20 1986-04-15 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
US4758296A (en) * 1983-06-20 1988-07-19 Mcgrew Stephen P Method of fabricating surface relief holograms
US4824626A (en) * 1986-03-14 1989-04-25 Ausimont S.P.A. Process for the reproduction of works of art of lithoid material
DE3736119A1 (de) * 1987-10-26 1989-05-03 Krupp Gmbh Verfahren zur massenreproduktion von hologrammen
US4906315A (en) * 1983-06-20 1990-03-06 Mcgrew Stephen P Surface relief holograms and holographic hot-stamping foils, and method of fabricating same
US4923572A (en) * 1988-09-29 1990-05-08 Hallmark Cards, Incorporated Image transfer tool
US4933120A (en) * 1988-04-18 1990-06-12 American Bank Note Holographics, Inc. Combined process of printing and forming a hologram
US4937030A (en) * 1986-07-21 1990-06-26 Mitusboshi Belting Ltd. Method of fabricating a slush mold and skin made therefrom
US5003915A (en) * 1988-04-18 1991-04-02 American Bank Note Holographics, Inc. Apparatus for printing and for forming a hologram on sheet material
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5083850A (en) * 1989-08-29 1992-01-28 American Bank Note Holographics, Inc. Technique of forming a separate information bearing printed pattern on replicas of a hologram or other surface relief diffraction pattern
US5116548A (en) * 1989-08-29 1992-05-26 American Bank Note Holographics, Inc. Replicaton of microstructures by casting in controlled areas of a substrate
US5182063A (en) * 1990-04-12 1993-01-26 Artagraph Reproduction Technology Incorporated Method and means of publishing images having coloration and three-dimensional texture
US5201548A (en) * 1990-04-12 1993-04-13 Artagraph Reproduction Technology Incorporated Method and means for publishing images having coloration and three-dimensional texture
US5225133A (en) * 1990-07-26 1993-07-06 Bridgestone Corporation Method for manufacturing a golf ball mold
WO1993013933A1 (en) * 1992-01-09 1993-07-22 Fohrman Scott R Reproduction of holograms
US5293370A (en) * 1991-01-16 1994-03-08 Del Mar Avionics Method and apparatus for creating optical disc masters
EP0759448A1 (en) 1995-08-21 1997-02-26 Dainippon Printing Co., Ltd. Ionizing radiation-curable resin composition for optical article, optical article, and surface light source
US5608576A (en) * 1992-09-03 1997-03-04 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
US5623347A (en) * 1991-06-21 1997-04-22 Light Impressions Europe Plc Holograms for security markings
US5807456A (en) * 1992-04-03 1998-09-15 Gao Gesellschaft Fur Automation Und Organisation Method for producing metallic planar elements on substrates
US6190838B1 (en) * 1998-04-06 2001-02-20 Imation Corp. Process for making multiple data storage disk stampers from one master
US6616867B2 (en) 2001-02-07 2003-09-09 Imation Corp. Multi-generation stampers
US6638692B1 (en) 2001-07-16 2003-10-28 Imation Corp. Replicated regions on optical disks
US20040137376A1 (en) * 2003-01-15 2004-07-15 Bishop John L. Method and system for replicating film data to a metal substrate and article of manufacture
US20040170118A1 (en) * 1998-04-06 2004-09-02 Edwards Jathan D. Reverse optical mastering for data storage disks
US20040247732A1 (en) * 2003-06-05 2004-12-09 Michael Walk Method and apparatus for forming an imprinting tool
US20050213482A1 (en) * 2004-03-24 2005-09-29 Imation Corp. Multi-track mastering techniques
US6977052B1 (en) 2002-01-18 2005-12-20 Imation Corp Check disk for optical data storage disk manufacturing
US6998196B2 (en) 2001-12-28 2006-02-14 Wavefront Technology Diffractive optical element and method of manufacture
US7008208B1 (en) 2002-01-17 2006-03-07 Imation Corp. Grounded molding tool for manufacture of optical components
US20060073422A1 (en) * 2004-09-28 2006-04-06 Imation Corp. Portable conformable deep ultraviolet master mask
US20060110568A1 (en) * 2004-11-23 2006-05-25 Imation Corp. Multi-layers optical data storage disk masters
US20060115773A1 (en) * 2004-11-29 2006-06-01 Imation Corp. Anti-reflection optical data storage disk master
US20060259546A1 (en) * 2003-12-11 2006-11-16 Heptagon Oy Manufacturing a replication tool, sub-master or replica
US20070059497A1 (en) * 2002-05-08 2007-03-15 Xudong Huang Reversal imprint technique
US7294294B1 (en) 2000-10-17 2007-11-13 Seagate Technology Llc Surface modified stamper for imprint lithography
US20080145765A1 (en) * 2004-02-12 2008-06-19 Optaglio Ltd. Metal Identification Platelet and Method of Producing Thereof
US20080254238A1 (en) * 2007-04-10 2008-10-16 The Boeing Company Method and apparatus for scaled up reproduction of detailed features
EP2164703A1 (en) * 2007-06-28 2010-03-24 Emot Co., Ltd Method of duplicating nano pattern texture on object's surface by nano imprinting and electroforming
US20110159245A1 (en) * 2008-09-05 2011-06-30 Jun Taniguchi Method for producing transfer structure and matrix for use therein
CN101693422B (zh) * 2009-10-20 2012-10-03 绍兴京昇光信息科技有限公司 一种在全息素面上定位并叠加图案的全息镍板的制造方法
CN112940314A (zh) * 2021-02-04 2021-06-11 东北师范大学 一种可表面形变的纳米复合膜的制备方法和应用

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8300344A (nl) * 1983-01-31 1984-08-16 Polygram Bv Methode voor de vervaardiging van metalen matrijzen.
NL8902949A (nl) * 1989-11-29 1991-06-17 Leer Koninklijke Emballage Werkwijze voor het vervaardigen van een materiaal met interferentiepatroon, zoals holografische afbeeldingen.
CN112652229A (zh) * 2020-12-29 2021-04-13 中丰田光电科技(珠海)有限公司 一种具有多种镭射效果组合的膜压镍板的制作方法

Cited By (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3898358A (en) * 1972-08-18 1975-08-05 Rca Corp Holographic recording media
US3882207A (en) * 1972-10-12 1975-05-06 Rca Corp Process of producing double-sided holographic replicas
US3790245A (en) * 1972-10-12 1974-02-05 Rca Corp Double-sided holographic replicas
US4001874A (en) * 1973-09-14 1977-01-04 Thomson-Brandt Method apparatus and record for distributing information in the form of color images
US3993401A (en) * 1975-02-10 1976-11-23 Minnesota Mining And Manufacturing Company Retroreflective material including geometric fresnel zone plates
FR2333261A1 (fr) * 1975-02-10 1977-06-24 Minnesota Mining & Mfg Matiere retroreflechissante supportant des reseaux zones et son procede de fabrication
US4231982A (en) * 1975-05-20 1980-11-04 Ab Volvo Method for the production of tools for deep drawing, moulding, extruding and the like
US4097117A (en) * 1975-10-30 1978-06-27 Rca Corporation Optical coupler having improved efficiency
US4360408A (en) * 1976-12-17 1982-11-23 Hoechst Aktiengesellschaft Information carriers, method of forming and copying said carriers
US4114983A (en) * 1977-02-18 1978-09-19 Minnesota Mining And Manufacturing Company Polymeric optical element having antireflecting surface
US4153654A (en) * 1977-02-18 1979-05-08 Minnesota Mining And Manufacturing Company Polymeric optical element having antireflecting surface
DE2807414A1 (de) * 1977-02-18 1978-08-24 Minnesota Mining & Mfg Polymeres optisches element mit antireflektierender oberflaeche
US4582885A (en) * 1978-07-20 1986-04-15 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
US4250135A (en) * 1979-05-17 1981-02-10 Orsini Peter C Roller for producing continuous sueded or grit type finish and method of making
US4482511A (en) * 1981-08-21 1984-11-13 Victor Company Of Japan, Ltd. Method of manufacturing a stamper for information storage discs
US4478769A (en) * 1982-09-30 1984-10-23 Amerace Corporation Method for forming an embossing tool with an optically precise pattern
US5948199A (en) * 1983-06-20 1999-09-07 Mcgrew; Stephen Paul Surface relief holograms and holographic hot-stamping foils, and method of fabricating same
US4758296A (en) * 1983-06-20 1988-07-19 Mcgrew Stephen P Method of fabricating surface relief holograms
US4906315A (en) * 1983-06-20 1990-03-06 Mcgrew Stephen P Surface relief holograms and holographic hot-stamping foils, and method of fabricating same
US4556378A (en) * 1983-09-19 1985-12-03 Lgz Landis & Gyr Zug Ag Apparatus for embossing high resolution relief patterns
EP0145481A3 (en) * 1983-12-12 1987-04-15 E.I. Du Pont De Nemours And Company Improved holographic image transfer process
EP0145481A2 (en) * 1983-12-12 1985-06-19 E.I. Du Pont De Nemours And Company Improved holographic image transfer process
US4824626A (en) * 1986-03-14 1989-04-25 Ausimont S.P.A. Process for the reproduction of works of art of lithoid material
US4937030A (en) * 1986-07-21 1990-06-26 Mitusboshi Belting Ltd. Method of fabricating a slush mold and skin made therefrom
DE3736119A1 (de) * 1987-10-26 1989-05-03 Krupp Gmbh Verfahren zur massenreproduktion von hologrammen
US4933120A (en) * 1988-04-18 1990-06-12 American Bank Note Holographics, Inc. Combined process of printing and forming a hologram
US5003915A (en) * 1988-04-18 1991-04-02 American Bank Note Holographics, Inc. Apparatus for printing and for forming a hologram on sheet material
US4923572A (en) * 1988-09-29 1990-05-08 Hallmark Cards, Incorporated Image transfer tool
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5083850A (en) * 1989-08-29 1992-01-28 American Bank Note Holographics, Inc. Technique of forming a separate information bearing printed pattern on replicas of a hologram or other surface relief diffraction pattern
US5116548A (en) * 1989-08-29 1992-05-26 American Bank Note Holographics, Inc. Replicaton of microstructures by casting in controlled areas of a substrate
US5182063A (en) * 1990-04-12 1993-01-26 Artagraph Reproduction Technology Incorporated Method and means of publishing images having coloration and three-dimensional texture
US5201548A (en) * 1990-04-12 1993-04-13 Artagraph Reproduction Technology Incorporated Method and means for publishing images having coloration and three-dimensional texture
US5225133A (en) * 1990-07-26 1993-07-06 Bridgestone Corporation Method for manufacturing a golf ball mold
US5293370A (en) * 1991-01-16 1994-03-08 Del Mar Avionics Method and apparatus for creating optical disc masters
US5623347A (en) * 1991-06-21 1997-04-22 Light Impressions Europe Plc Holograms for security markings
EP0591285B1 (en) * 1991-06-21 1997-10-01 Light Impressions International Limited Holograms for security markings
WO1993013933A1 (en) * 1992-01-09 1993-07-22 Fohrman Scott R Reproduction of holograms
US5807456A (en) * 1992-04-03 1998-09-15 Gao Gesellschaft Fur Automation Und Organisation Method for producing metallic planar elements on substrates
US5608576A (en) * 1992-09-03 1997-03-04 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
EP0759448A1 (en) 1995-08-21 1997-02-26 Dainippon Printing Co., Ltd. Ionizing radiation-curable resin composition for optical article, optical article, and surface light source
US20040170118A1 (en) * 1998-04-06 2004-09-02 Edwards Jathan D. Reverse optical mastering for data storage disks
US6890704B2 (en) * 1998-04-06 2005-05-10 Imation Corp. Reverse optical mastering for data storage disks
US7349323B2 (en) 1998-04-06 2008-03-25 Imation Corp. Reverse optical mastering for data storage disks
US7352685B2 (en) 1998-04-06 2008-04-01 Imation Corp. Reverse optical mastering for data storage disk replicas
US8705334B2 (en) 1998-04-06 2014-04-22 Legger Col. A.B. Llc Replica disk for data storage
US6190838B1 (en) * 1998-04-06 2001-02-20 Imation Corp. Process for making multiple data storage disk stampers from one master
US20040170117A1 (en) * 1998-04-06 2004-09-02 Edwards Jathan D. Reverse optical mastering for data storage disk replicas
US20040231531A1 (en) * 1998-04-06 2004-11-25 Edwards Jathan D. Reverse Optical mastering for data storage disk stamper
USRE44633E1 (en) 1998-04-06 2013-12-10 Legger Col. A.B. Llc Reverse optical mastering for data storage disk replicas
US6365329B2 (en) * 1998-04-06 2002-04-02 Imation Corp. Process for making multiple data storage disk stampers from one master
US8593931B2 (en) 1998-04-06 2013-11-26 Legger Col. A.B. Llc Replica disk for data storage
US8363534B2 (en) 1998-04-06 2013-01-29 Legger Col. A.B. Llc Reverse optical mastering for data storage disk replicas
US20110223369A1 (en) * 1998-04-06 2011-09-15 Imation Corp. Reverse Optical Mastering for Data Storage Disk Replicas
US7952986B2 (en) 1998-04-06 2011-05-31 Imation Corp. Reverse optical mastering for data storage disk replicas
US7801016B2 (en) 1998-04-06 2010-09-21 Imation Corp. Reverse optical mastering for data storage disk replicas
US20100067360A1 (en) * 1998-04-06 2010-03-18 Edwards Jathan D Reverse optical mastering for data storage disk replicas
US7600992B2 (en) 1998-04-06 2009-10-13 Imation Corp. Reverse optical mastering for data storage disk stamper
US7448860B2 (en) 2000-10-17 2008-11-11 Seagate Technology Llc Surface modified stamper for imprint lithography
US7294294B1 (en) 2000-10-17 2007-11-13 Seagate Technology Llc Surface modified stamper for imprint lithography
US6616867B2 (en) 2001-02-07 2003-09-09 Imation Corp. Multi-generation stampers
US6638692B1 (en) 2001-07-16 2003-10-28 Imation Corp. Replicated regions on optical disks
US7429437B2 (en) 2001-12-28 2008-09-30 Wavefront Technology, Inc. Diffractive optical element and method of manufacture
US20060121358A1 (en) * 2001-12-28 2006-06-08 Chris Rich Diffractive optical element and method of manufacture
US6998196B2 (en) 2001-12-28 2006-02-14 Wavefront Technology Diffractive optical element and method of manufacture
US7008208B1 (en) 2002-01-17 2006-03-07 Imation Corp. Grounded molding tool for manufacture of optical components
US6977052B1 (en) 2002-01-18 2005-12-20 Imation Corp Check disk for optical data storage disk manufacturing
US20070059497A1 (en) * 2002-05-08 2007-03-15 Xudong Huang Reversal imprint technique
US20040137376A1 (en) * 2003-01-15 2004-07-15 Bishop John L. Method and system for replicating film data to a metal substrate and article of manufacture
US7186365B2 (en) * 2003-06-05 2007-03-06 Intel Corporation Methods for forming an imprinting tool
US20040247732A1 (en) * 2003-06-05 2004-12-09 Michael Walk Method and apparatus for forming an imprinting tool
US20070056454A1 (en) * 2003-06-05 2007-03-15 Intel Corporation System and apparatus for forming an imprinting tool
US20060259546A1 (en) * 2003-12-11 2006-11-16 Heptagon Oy Manufacturing a replication tool, sub-master or replica
US8221665B2 (en) * 2003-12-11 2012-07-17 Heptagon Oy Manufacturing a replication tool, sub-master or replica
US8211595B2 (en) * 2004-02-12 2012-07-03 Optaglio, Ltd. Metal identification platelet and method of producing thereof
US20080145765A1 (en) * 2004-02-12 2008-06-19 Optaglio Ltd. Metal Identification Platelet and Method of Producing Thereof
US20050213482A1 (en) * 2004-03-24 2005-09-29 Imation Corp. Multi-track mastering techniques
US20060073422A1 (en) * 2004-09-28 2006-04-06 Imation Corp. Portable conformable deep ultraviolet master mask
US20060110568A1 (en) * 2004-11-23 2006-05-25 Imation Corp. Multi-layers optical data storage disk masters
US20060115773A1 (en) * 2004-11-29 2006-06-01 Imation Corp. Anti-reflection optical data storage disk master
US7427466B2 (en) 2004-11-29 2008-09-23 Imation Corp. Anti-reflection optical data storage disk master
US7981341B2 (en) * 2007-04-10 2011-07-19 The Boeing Company Method and apparatus for scaled up reproduction of detailed features
US20110199693A1 (en) * 2007-04-10 2011-08-18 The Boeing Company Method and Apparatus for Scaled Up Reproduction of Detailed Features
US20080254238A1 (en) * 2007-04-10 2008-10-16 The Boeing Company Method and apparatus for scaled up reproduction of detailed features
US8508845B2 (en) 2007-04-10 2013-08-13 The Boeing Company Method and apparatus for scaled up reproduction of detailed features
EP2164703A1 (en) * 2007-06-28 2010-03-24 Emot Co., Ltd Method of duplicating nano pattern texture on object's surface by nano imprinting and electroforming
EP2164703A4 (en) * 2007-06-28 2012-07-25 Emot Co Ltd METHOD FOR MAKING A NANOMA TEXTURE STRUCTURE ON THE SURFACE OF AN OBJECT BY NANOPRESSION AND ELECTRO FORMING
US20110159245A1 (en) * 2008-09-05 2011-06-30 Jun Taniguchi Method for producing transfer structure and matrix for use therein
US8865049B2 (en) * 2008-09-05 2014-10-21 Tokyo University Of Science Educational Foundation Administrative Org. Method for producing transfer structure and matrix for use therein
CN101693422B (zh) * 2009-10-20 2012-10-03 绍兴京昇光信息科技有限公司 一种在全息素面上定位并叠加图案的全息镍板的制造方法
CN112940314A (zh) * 2021-02-04 2021-06-11 东北师范大学 一种可表面形变的纳米复合膜的制备方法和应用

Also Published As

Publication number Publication date
NL7601465A (nl) 1976-05-31
NL6802421A (xx) 1969-03-13
GB1221342A (en) 1971-02-03
DE1621783A1 (de) 1971-04-01
BE710829A (xx) 1968-08-16
DE1621783B2 (de) 1972-02-10

Similar Documents

Publication Publication Date Title
US3565978A (en) Replication of surface deformation images
US5071597A (en) Plastic molding of articles including a hologram or other microstructure
US5521030A (en) Process for making holographic embossing tools
US4337303A (en) Transfer, encapsulating, and fixing of toner images
US4482511A (en) Method of manufacturing a stamper for information storage discs
JPH0423777B2 (xx)
JPH11505625A (ja) 微小レリーフ要素およびその作製方法
US3637385A (en) Solid deformation imaging
US3560205A (en) Method of forming a phase modulating hologram on a deformable thermoplastic
US3922416A (en) Medium for recording phase holograms
CA1070261A (en) Process for producing a stamper for videodisc purposes
JPH0360115B2 (xx)
US3664834A (en) Migration imaging method employing adhesive transfer member
JPS62233234A (ja) ホログラムを有する成形品の製造方法
US3655257A (en) Apparatus for forming a phase hologram on a deformable thermoplastic
EP0369081A1 (en) Method of preparing volume type hologram film
JPH02235082A (ja) 画像形成部材
US3615394A (en) Method of forming a pigment image from a pigment-resin toner image
US3446616A (en) Xerographic imaging employing a selectively removable layer
US3791822A (en) Removal of background from an imaged migration layer
US3672883A (en) Crystalline polymers for frost
Bartolini et al. Replication of Relief‐Phase Holograms for Prerecorded Video
DE1621783C (de) Verfahren zur Nachbildung von Deformationsbildern
Puech Thin film optical components duplication method
Shvartsman Holographic optical elements by dry photopolymer embossing