US3535055A - Cold-cathode discharge ion pump - Google Patents

Cold-cathode discharge ion pump Download PDF

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Publication number
US3535055A
US3535055A US815352A US3535055DA US3535055A US 3535055 A US3535055 A US 3535055A US 815352 A US815352 A US 815352A US 3535055D A US3535055D A US 3535055DA US 3535055 A US3535055 A US 3535055A
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anode
collector
cathode
sputter
cathodes
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US815352A
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Wilson M Brubaker
Clifford E Berry
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Bendix Corp
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Bendix Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances

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  • This invention relates to ion pumps of the cold-cathode discharge type. More particularly, the invention relates to an improved cold-cathode discharge ion pump. The invention is particularly useful for evacuating noble gases and other generally nonreactive ions.
  • Ion pumps may be generally classified into hot cathode types and cold-cathode discharge types.
  • US. Pat. No. 2,850,225 issued Sept. 2, 1958 to R. G. Herb, relates to a hot cathode ion pump.
  • a pump of the type referred to in U.S. Pat. No. 2,850,225 is sold by Consolidated Vacuum Corporation, the assignee of the present application, under the trade name Evapo-Ion.
  • Such pumps are generally of high capacity, but have the relative disadvantage of being somewhat bulky and expensive.
  • a cold-cathode discharge device for measuring the pressure in an evacuated space is described in US. Pat. No. 2,197,079, issued Apr. 16, 1940, to Frans Michel Penning.
  • the Penning device consists essentially of a ring anode contained between two cathodes within an evacuated envelope. The anode and cathodes are immersed in a strong magnetic field. A high positive potential with respect to the cathode is applied to the anode. The gas between the anode and cathodes is ionized, allowing a current fiow therebetween. The magnitude of the ionization current indicates the pressure existing between theanode and cathodes.
  • Such a vacuum measuring device has the disadvantage of disturbing the vacuum to be measured, as ions are pumped from the evacuated space into the surface of the cathode of the device, where they are collected. The vacuum to be measured is thereby increased over the vacuum which would otherwise exist.
  • a practical vacuum pump can be made by combining a number of such Penning cold-cathode discharge devices into a single unit.
  • a description of such a pump is contained in Science, vol. 128, pp. 282-284, published Aug. 8, 1958.
  • a pump comprised simply of a plurality of Penning cold-cathode discharge devices suffers from a poor noble gas evacuation characteristic, in that the evacuation pressure obtained by use of such a pump when pumping noble gases oscillates instead of remaining constant.
  • the poor noble gas evacuation characteristic of such a-pump results from the inability of the pump surfaces to getter the ions of noble gases pumped thereinto.
  • getter is meant to establish physical or chemical bonds between atoms and molecules of the pump surfaces and the ions removed from the gas. The failure of the pump surfaces to getter the ions of noble gases is due to the nonreactive nature of such ions.
  • Nonreactive ions when driven to the surfaces of the ion pump by the fields of force existing therein, are entrapped physically in the outermost molecular layers of Patented Oct. 20, 1970 the pump surfaces.
  • This entrapment consists of the ions being driven beneath the surface molecular layers of the pump so as to be physically retained by the enclosing molecular layers.
  • No appreciable physical or chemical bonding exists between the entrapping molecular layers and nonreactive ions so entrapped.
  • the entrapped ions are substantially neutralized during entrapment.
  • the neutralization of the entrapped ions changes the entrapped ions into entrapped atoms of the nonreactive substances. If the entrapping molecular layers are removed, these nonreactive atoms return to the evacuated area since no bonding exists. Return of the nonreactive atoms to the evacuated area causes a rise in the pressure existing within the evacuated area, because of the addition to the evacuated area of the atoms formerly entrapped.
  • Entrapped atoms are freed from entrapment by a process known as sputtering.
  • sputtering is meant the ejection of particles of a surface in various directions from the surface. Sputtering is caused by the bombardment of the surface being sputtered by ions traveling at a high velocity. As the pump surfaces are sputtered, the molecular layers of surface material entrapping the nonreactive atoms are worn away. The nonreactive atoms thereupon escape back into the evacuated area.
  • the oscillatory nature of the nonreactive ion pumping characteristic of conventional cold-cathode discharge ion pumps is apparently due to a cumulative or avalanche effect in sputtering.
  • the surface molecular layers have entrapped all of the nonreactive atoms which they are capable of holding, further ion bombardment frees collected atoms from the portions of the surfaces they strike.
  • the freeing of these atoms has two immediate effects. First, the pressure in the evacuated area rises in relation to the number of atoms freed. Second, the increase in the number of atoms in the evacuated area increases the sputtering rate of the collector surfaces, since more ions are available to strike these surfaces.
  • the oscillatory nonreactive ion evacuation characteristic of the conventional cold-cathode discharge ion pump is not due to an inability to pump nonreactive ions into the collector surfaces of the device, but is rather due to an inability of the collector surfaces to retain such ions pumped thereinto.
  • the oscillatory noble gas or other nonreactive ion evacuation characteristic of cold-cathode discharge ion pumps is eliminated by depositing the replacement material on the sputtered portions of the collector surfaces, into which the nonreactive ions are being pumped.
  • This deposited replacement material provides additional entrapping capacity for the sputtered collector surfaces.
  • a pump constructed according to the present invention has at least one anode, at least one collector, and a repacement material source positioned adjacent each collector, all within an evacuated envelope. Particles of replacement material from the replacement material source are caused to be deposited on the sputtered collector surfaces, preferably at a rate at least substantially equal to the rate of over-all loss of material from the collector due to sputtering, thereby maintaining the entrapping capacity of the pump.
  • FIG. 1 is an elevation of a Penning cold-cathode discharge device
  • FIG. 2 is a sectional plan view, partially broken away, of a known ion pump consisting of a plurality of Penning cold-cathode discharge devices;
  • FIG. 3 is an elevation, partialy in section, taken along line 33 of FIG. 2;
  • FIG. 4 is a graph showing the oscillatory evacuation pressure characteristic of the ion pump of FIG. 2 when evacuating argon;
  • FIG. 5 is a sectional elevation of an improved coldcathode discharge ion pump according to one embodiment of the invention, in which material is sputtered from sputter-cathodes and deposited on sputtered portions of the collectors;
  • FIG. 6 is a graph showing the improved evacuation pressure characteristic of the pump of FIG. 5;
  • FIG. 7 is a cross section of another embodiment of the invention utilizable with magnetic fields which are uniform over a long distance in a direction parallel to the field, in which material is sputtered from sputter-cathodes and is deposited on sputtered portions of the collector;
  • FIG. 8 is a sectional elevation of another embodiment of the invention in which the collectors have transparent portions along the axis of the discharge and the sputtercathode is positioned adjacent these transparent portions;
  • FIG. 9 is a sectional elevation of another embodiment of the invention in which the replacement material is evaporated from a replacement material electrode positioned between the anode and an adjacent collector.
  • the Penning cold-cathode discharge device consists of an evacuated envelope 20 containing an anode 21 and two collector cathodes 22.
  • the anode 21 is connected by a lead 23 to a high voltage terminal 24 extending through the evacuated envelope.
  • the two collector cathodes 22 are connected by a common lead 25 to a cathode terminal 26 extending through the evacuated envelope.
  • An electromagnet 27 creates a magnetic field between the anode 21 and the collector cathodes 22.
  • An inlet 28 connects the device to an evacuated space.
  • the anode 21 has a ring configuration so that electrons may pass through the anode with a relatively small chance of striking the anode surface.
  • the collector cathodes 22 are of solid construction, so that ions reaching the collector cathodes will strike their surfaces.
  • a high positive potential from a high voltage source (not shown) is applied to the anode terminal 24, and the cathode terminal 26 is grounded through a common connection (not shown). Electrons in the evacuated envelope 21 will therefore tend to move toward the anode due to the attraction between the positive potential of the anode and the negative electron charge.
  • the magnetic field set up by the magnets 27 is such that the electrons spiral between the anode and collector cathodes rather than continue to move directly toward the anode.
  • the electrons produce ionization in the area of the magnetic field by striking free molecules and atoms of the gas contained in the envelope.
  • These ions are attracted to the collector cathodes 22 and, upon striking one of the collector cathodes, impinge in the surface molecular layers of the collector cathode. The removal of these ions from the gas phase in the evacuated envelope therefore reduces the pressure within the envelope.
  • FIG. 2 shows a conventional ion pump which consists essentially of thirty-six Penning cold-cathode discharge cells.
  • the ion pump of FIG. 2 has a cellular-shaped anode 30 contained within an evacuated envelope 31.
  • An anode lead 32 connects the cellular-shaped anode 30 to a highvoltage connector 33.
  • FIG. 3 shows an elevation, partially in section, of the ion pump of FIG. 2.
  • Two collector cathodes 34 are adjacent the upper and lower surfaces of the anode 30.
  • a cathode terminal terminal 35 passing through the evacuated envelope 31 is connected to the two collector cathodes 34 by a connecting lead (not shown).
  • An inlet 36 is connected to the collector space to be evacuated.
  • the collector cathodes are constructed of a reactive material; for example, titanium, magnesium, aluminum, molybdenum or various of the rare earths may be used.
  • a positive potential with respect to the collector cathodes of approximately 3,000 volts is applied to the anode 30 by means of the high voltage connector 33.
  • a gaseous discharge occurring in the same manner as described above with respect to the Penning device, is initiated.
  • the ions produced by the gaseous discharge are driven into the collector cathode surfaces and entrapped under the surface molecular layers thereof. Some of the reactive ions are gettered by physical or chemical bonding with atoms and molecules of the collector cathode material.
  • a portion of the material sputtered from one collector cathode is deposited on the opposite collector cathode. Sputtered material is also deposited on the anode and on the envelope walls. Consequently, the rate of removal of material from a collector cathode due to sputtering exceeds the rate of deposit on the collector cathode of material sputtered from the opposite collector cathode, resulting in an over-all loss of collector cathode material.
  • the oscillatory pumping characteristic occurs when nonreactive ions, for example, of a noble gas, are being pumped.
  • FIG. 4 is a graph of the actual pressure measured in in a pump of the type illustrated in FIGS. 2 and 3 when pumping argon, a noble gas.
  • a positive potential of 3,000 volts with respect to the collector cathode is applied to the anode.
  • the pressure within the evacuated envelope varies from a minimum of 0.75 X 10 mm. Hg to a maximum of 2.5 x10 mm. Hg.
  • the periods between maximum pressure peaks are approximately six minutes.
  • FIG. 5 shows an improved cold-cathode discharge ion pump accordinging to the invention.
  • An evacuated envelope 50 contains a pair of collector electrodes 51 and a cellular anode 52.
  • a collector electrode terminal 53 passes through the evacuated envelope 50 and is connected to the two collector electrodes 51 by a connecting lead (not shown). Neither the collector electrodes nor the anode need be constructed of reactive material.
  • An anode lead 54 connects the anode 52 to a high voltage connector 55.
  • a pair of cellular replacement material elements 56 which function as sputter-cathodes are positioned between the anode and the collectors. As shown in FIG.
  • sputter-cathode collector cells for each anode cell, preferably aligned as shown so that the center of the anode cell is in alignment with the center of a sputtercathode cell.
  • a sputter-cathode lead 57 connects the sputter-cathodes 56 to a bias terminal 58 passing through the evacuated envelope 50.
  • An inlet 59 connects the device to the space to be evacuated.
  • the sputter-cathodes are constructed of any material Which will sputter satisfactorily. It is not essential that the sputter-cathodes 56 be constructed of reactive ma terial, such as titanium. However, when evacuating gases which may be gettered, it is preferable to use such reactive materials, so as to increase the pump capacity by addition of a gettering effect.
  • the sputter-cathodes 56 are arranged so that the cellular passages extending therethrough are substantially perpendicular to the surfaces of the collectors 51. The cellular passages through the sputter-cathodes need not be aligned with the anode cell walls, although such alignment is preferable.
  • a positive potential with respect to the collector of from 2,000 to 4,000 volts is applied to the anode 52 by means of the high voltage connector 55.
  • a negative potential of between 2,000 and 4,000 volts is applied to the sputter-cathode 56 by means of the bias terminal 58.
  • a magnetic field of from 1,000 to 2,000 gauss is applied to the pump by a magnet 27.
  • the ion pump has an anode and two collectors constructed of stainless steel.
  • the sputter-cathode may also be constructed of stainless steel. If air or other gases which may be partially gettered are to be pumped, it is preferable to construct the sputtercathode and collector of a reactive material so as to increase the pump capacity by gettering reactive ions, rather than depending on entrapping alone.
  • the over-all thickness of the pump is 1% inches.
  • the anode and each sputter-cathode are one inch square.
  • the anode has 4 square cells.
  • the sputter-cathode has 36 square cells.
  • the anode is 1 /6 inch thick and each sputter-cathode is inch thick.
  • the space between a collector and the adjacent sputter-cathode is A inch.
  • the space between each sput ter-cathode and the anode is inch.
  • a potential positive, with respect to the collector, of 3,000 volts is applied to the anode and a potential negative, with respect to the collector, of 2,000 volts is applied to the sputter-cathodes.
  • FIG. 6 is a graph of the evacuation pressure obtained with an ion pump constructed with the above dimensions.
  • the substance being pumped is argon. It is to be noted that a substantially constant pressure of approximately mm. Hg exists in the evacuated envelope.
  • the oscillatory characteristic illustrated in FIG. 4 has been eliminated.
  • the minimum pressure shown in FIG. 4 is slightly below the average pressure shown in FIG. 6, indicating that the leak rate of the apparatus whose evacuation characteristic is shown in FIG. 6 was higher than the leak rate of the device whose evacuation characteristic is shown in FIG. 4.
  • FIG. 7 illustrates another embodiment of the invention.
  • the embodiment of FIG. 7 is particularly useful in devices having magnetic fields which are uniform over a long distance in the direction parallel to the magnetic field.
  • a cylindrical collector 70 is annularly contained within a cylindrical anode 71, an annular 72 being formed thereby.
  • sputter-cathode replacement material elements 73 extend outward radially from adjacent the collector 70 toward the anode 71.
  • a high positive potential with respect to the collector is applied to the anode 71.
  • a high negative potential with respect to the collector is applied to the sputter-cathodes 73.
  • Some of the ions moving toward the collector 70 will sputter material from the sputter-cathodes 73 by a process similar to the process described with respect to the device of FIG. 5.
  • the replacement material sputtered from the sputter-cathodes 73 is deposited on the surface of the collector 70, so as to provide continuous entrapment of nonreactive ions pumped thereinto. A satisfactory nonreactive ion pumping characteristic is thereby achieved.
  • the alternate embodiment of the invention illustrated in FIG. 8 is especially useful when the magnetic field is uniform but short. It has been found that the density of the ions causing sputtering is normally greatest along the axis of the gaseous discharge. That is, the discharge conforms generally to the outline of each anode cell, and sputtering is greatest opposite the center of the anode cell. In the embodiment of FIG. 8, those portions of the collectors which are aligned with the axis of the discharge are made transparent. The sputter-cathodes are positioned on the axis of the discharge. Some of the ions, instead of striking the collectors, strike the sputter-cathodes and sputter material therefrom. This sputtered material is deposited on the collectors to provide the entrapping layers.
  • the device of PIG. 8 has an evacuated chamber containing a pair of collectors 81 and a cellular anode 82.
  • a collector terminal passes through the evacuated envelope 80 and is connected to the two collectors 81 by connecting leads 84.
  • the anode 82 is connected by an anode lead 85 to a high voltage connector 86.
  • Each of the collectors 81 has a series of openings 87 aligned with the axis of the discharges of the anode cell.
  • sputter-cathodes 88 are positioned so as to be adjacent the openings 87. The positioning of the sputter-cathodes 88 causes material sputtered therefrom to be deposited on the collectors.
  • the sputtercathodes 88 are connected by connecting leads to a bias terminal 89 passing through the evacuated envelope 80.
  • An inlet 59' connects the evacuated envelope 80 to the space to be evacuated.
  • the material sputtered from one sputter-cathode is deposited primarily on the opposite collector and sputter-cathode, due to the almost perpendicular angle at which the sputtering ions strike the sputter-cathode surface.
  • the sputter-cathodes 8 8 are sputtered to a greater extent than are the collectors 81, due to their placement along the discharge axis, material from the sputter-cathodes is deposited on the collectors at a higher rate than the rate of over-all loss of material from the collectors due to sputtering. Thus, a continuous deposition of an entrapping layer occurs on the collectors, thereby providing a satisfactory non-reactive ion pumping characteristic for the cold-cathode discharge ion pump.
  • FIG. 9 illustrates an alternate embodiment of the invention in Which material is evaporated from replacement material electrodes and the evaporated material is deposited on the sputtered portions of the collectors which in this embodiment functions as collector cathodes.
  • An evacuated chamber 90 contains a pair of collectors 91 and a cellular anode '92. The anode is connected by means of an anode lead 94 to a high voltage connector 95.
  • Two replacement material electrodes 96 are positioned one adjacent each of the collectors 91 by a replacement material electrode 96.
  • the replacement material electrodes have leads 97 passing through the collectors 91.
  • the leads 97 are insulated from the collectors 91 and the envelope 90.
  • a battery 99 completes an'electrical circuit for each replacement material electrode 96 so as to cause heating of the electrode 96.
  • Heating of the electrodes 96 evaporates material therefrom.
  • the evaporated material is deposited on the adjacent collector surfaces. These adjacent collector surfaces are the surfaces which are being sputtered by ion bombardment.
  • the rate of evaporation of material from the electrodes 96 is controlled by the potential of the batteries 99 so that replacement material preferably is deposited on the sputtered collector surfaces at a rate substantially equal to the rate of over-all loss of material from the collectors 91 due to sputters.
  • a continuous film of collector replacement material is deposited on the collectors 91 by the evaporation of replacement material from the replacement material electrodes 96.
  • the replacement material electrodes, anode, and collector may be const-ructed of any suitable material. If reactive ions are being pumped, use of reactive materials for the collectors and replacement material electrodes is preferable, so as to add a gettering effect.
  • An improved ion pump of the cold-cathode discharge type comprising an anode, a collector positioned adjacent the anode, a source of vaporizable replacement material positioned between the anode and the collector, means for heating said source to evaporate replacement material therefrom, means for initiating a voltage gradient within at least a portion of the space between the anode and collector and the extending in a direction from the anode toward the collector, means for enclosing said anode, said source and said collector so as to provide a sealed enclosure during. pump operation, and means for producing magnetic lines. of force through the enclosure wherein the lines extend in a direction from said anode toward said collector.
  • An improved ion pump of the cold-cathode discharge type comprising a cellular anode and a collector, enclosure means containing said anode and collector, means for initiating a gaseous discharge in the space between the anode and the collector, a replacement material element positioned between the anode and the collector so that material evaporated from the replacement material element during pump operation is deposited on portions of the collector, means connected to the replacement material element to cause material to be evaporated therefrom at a rate at least substantially equal to the rate of over-all loss of material from the collector due to cathode sputtering, and means for producing magnetic lines of force through the enclosure wherein the lines extend in a direction from said anode toward said collector.
  • An improved ion pump comprising an anode, a collector adjacent the anode, a source of vaporizable replacement material positioned adjacent the collector, means for heating said source to evaporate replacement material therefrom, means for initiating a voltage gradient within at least a portion of the space between the anode and the collector and extending in a direction from the anode toward the collector, an envelope for enclosing said anode, said source and said collector and being in communication with a space to be evacuated, and means for producing magnetic lines of force extending from said anode toward said collector.
  • An electronic vacuum pump comprising an anode, a cathode, a vacuum pump casing enclosed with said anode and cathode, means for causing a multiple coldcathode discharge between said anode and cathode in said casing, means independent of said last named means for depositing reactive material within said casing, and in inlet to the interior of the casing.
  • An electronic vacuum pump comprising anode means defining a plurality of separated discrete glow discharge regions, a cathode, a vacuum pump casing enclosing said anode means and cathode, means for causing a multiple cold-cathode discharge between the anode means and cathode in said casing, means independent of said node means and said cathode for depositing reactive material within said casing, and an operating communicating with the interior of the casing.
  • anode mean defining a plurality of separated glow discharge regions, means for producing and directing a magnetic field along a predetermined axis in said regions, cathode means disposed transversely of said axis, a vacuum-tight envelope containing said anode and cathode means, means for causing a cold cathode discharge in each of said regions between said anode and cathode means, means separate from said discharge means for supplying and depositing reactive material within said envelope, and an inlet to the interior of said envelope for communication with a chamber to be evacuated.
  • cathode means disposed in said magnetic field and transversely to said direction, anode means disposed in cooperative relation with respect to said cathode means and constructed to define a plurality of separated glow discharge regions between said cathode and anode means, a vacuum tight envelope containing said anode and cathode means, means for causing a cold cathode discharge in each of said regions between said anode and cathode means, means separate from said discharge means for supplying and depositing reactive material within said envelope, and an inlet to the interior of said envelope for communication with a chamber to be evacuated.
  • An ion vacuum pump comprising a pump envelope adapted to be connected to an enclosure to be evacuated, an anode mounted within said envelope, a collector surface mounted adjacent said anode, means for producing magnetic lines of force extending in a direction from said anode toward said collector, means including said anode for producing a gaseous discharge in the magnetic field within at least a portion of the space between the anode and the collector for ionizing gases therein by accelerating electrons (within said portion and thereby bombard gas molecules therein, said last means being adapted to produce a potential gradient within said portion of said region for directing at least some of the ions toward said collector surface, a source of vavorizable metallic substance positioned within said envelope, and means for vaporizing said metallic substance some of which is adapted to be condensed upon portions of said collector surface.

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3746474A (en) * 1971-04-02 1973-07-17 W Lloyd Ionic vacuum pump
DE3343191A1 (de) * 1982-12-28 1984-07-05 Ishimaru, Hajime, Sakura, Ibaraki Ionenpumpe
US5480286A (en) * 1990-08-03 1996-01-02 Ebara Corporation Exhaust apparatus and vacuum pumping unit including the exhaust apparatus
US9960026B1 (en) * 2013-11-11 2018-05-01 Coldquanta Inc. Ion pump with direct molecule flow channel through anode
US10049864B2 (en) * 2017-01-12 2018-08-14 Upendra D Desai Metallic glow discharge diode and triode devices with large cold cathode as efficient charger generator—a power cell
WO2019226142A1 (en) * 2018-05-21 2019-11-28 Desai Upendra D Metallic glow discharge diode and triode devices with large cold cathode as efficient charge generator - a power cell

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419326A (fr) * 1964-01-02 1966-02-17 Thomson Houston Comp Francaise Perfectionnements aux pompes ioniques
US3684401A (en) * 1970-11-17 1972-08-15 Westinghouse Electric Corp Cathode-getter materials for sputter-ion pumps

Citations (4)

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Publication number Priority date Publication date Assignee Title
US2636664A (en) * 1949-01-28 1953-04-28 Hertzler Elmer Afton High vacuum pumping method, apparatus, and techniques
US2727167A (en) * 1952-04-18 1955-12-13 Westinghouse Electric Corp Ion pump
US2796555A (en) * 1954-06-29 1957-06-18 High Voltage Engineering Corp High-vacuum pump
GB797232A (en) * 1955-07-11 1958-06-25 Manfred Von Ardenne Improvements in or relating to high vacuum ion pumps

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1046249B (de) * 1956-04-05 1958-12-11 Dr Gerhard Fricke Verfahren und Vorrichtung zur Erzeugung eines hohen Vakuums
DE1052053B (de) * 1958-04-11 1959-03-05 Leybolds Nachfolger E Verfahren und Vorrichtung zur Verlaengerung der ununterbrochenen Betriebsdauer von Getterpumpen zur Hochvakuumerzeugung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2636664A (en) * 1949-01-28 1953-04-28 Hertzler Elmer Afton High vacuum pumping method, apparatus, and techniques
US2727167A (en) * 1952-04-18 1955-12-13 Westinghouse Electric Corp Ion pump
US2796555A (en) * 1954-06-29 1957-06-18 High Voltage Engineering Corp High-vacuum pump
GB797232A (en) * 1955-07-11 1958-06-25 Manfred Von Ardenne Improvements in or relating to high vacuum ion pumps

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3746474A (en) * 1971-04-02 1973-07-17 W Lloyd Ionic vacuum pump
DE3343191A1 (de) * 1982-12-28 1984-07-05 Ishimaru, Hajime, Sakura, Ibaraki Ionenpumpe
US5480286A (en) * 1990-08-03 1996-01-02 Ebara Corporation Exhaust apparatus and vacuum pumping unit including the exhaust apparatus
US9960026B1 (en) * 2013-11-11 2018-05-01 Coldquanta Inc. Ion pump with direct molecule flow channel through anode
US10049864B2 (en) * 2017-01-12 2018-08-14 Upendra D Desai Metallic glow discharge diode and triode devices with large cold cathode as efficient charger generator—a power cell
WO2019226142A1 (en) * 2018-05-21 2019-11-28 Desai Upendra D Metallic glow discharge diode and triode devices with large cold cathode as efficient charge generator - a power cell

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DE1104111B (de) 1961-04-06
GB949219A (en) 1964-02-12
NL251847A (sv)
DE1107368B (de) 1961-05-25
US3535054A (en) 1970-10-20

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