US2712522A - Bright nickel plating - Google Patents
Bright nickel plating Download PDFInfo
- Publication number
- US2712522A US2712522A US344481A US34448153A US2712522A US 2712522 A US2712522 A US 2712522A US 344481 A US344481 A US 344481A US 34448153 A US34448153 A US 34448153A US 2712522 A US2712522 A US 2712522A
- Authority
- US
- United States
- Prior art keywords
- nickel
- per liter
- group
- compound
- grams per
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 110
- 229910052759 nickel Inorganic materials 0.000 title claims description 54
- 238000007747 plating Methods 0.000 title description 7
- 150000001875 compounds Chemical class 0.000 claims description 54
- 239000003929 acidic solution Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 claims description 6
- KDOWHHULNTXTNS-UHFFFAOYSA-N hex-3-yne-2,5-diol Chemical compound CC(O)C#CC(C)O KDOWHHULNTXTNS-UHFFFAOYSA-N 0.000 claims description 5
- HRWVUBRSPSCZAZ-UHFFFAOYSA-N 4-methoxybut-2-yn-1-ol Chemical compound COCC#CCO HRWVUBRSPSCZAZ-UHFFFAOYSA-N 0.000 claims description 4
- IDYNOORNKYEHHO-UHFFFAOYSA-N pent-3-yn-1-ol Chemical compound CC#CCCO IDYNOORNKYEHHO-UHFFFAOYSA-N 0.000 claims description 4
- ACGZBRWTWOZSFU-UHFFFAOYSA-N 4-(diethylamino)but-2-yn-1-ol Chemical compound CCN(CC)CC#CCO ACGZBRWTWOZSFU-UHFFFAOYSA-N 0.000 claims description 2
- MQFAHVUKHILUOM-UHFFFAOYSA-N 4-morpholin-4-ylbut-2-yn-1-ol Chemical compound OCC#CCN1CCOCC1 MQFAHVUKHILUOM-UHFFFAOYSA-N 0.000 claims 1
- JXMQYKBAZRDVTC-UHFFFAOYSA-N hexa-2,4-diyne-1,6-diol Chemical compound OCC#CC#CCO JXMQYKBAZRDVTC-UHFFFAOYSA-N 0.000 claims 1
- JZJXKEWVUBVOEH-UHFFFAOYSA-N n,n-diethylprop-2-yn-1-amine Chemical compound CCN(CC)CC#C JZJXKEWVUBVOEH-UHFFFAOYSA-N 0.000 claims 1
- -1 unsaturated aliphatic sulfonic acids Chemical class 0.000 description 18
- 150000002815 nickel Chemical class 0.000 description 17
- 239000002253 acid Substances 0.000 description 16
- 238000013019 agitation Methods 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 8
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 8
- 239000002659 electrodeposit Substances 0.000 description 8
- NIAGBSSWEZDNMT-UHFFFAOYSA-N hydroxidotrioxidosulfur(.) Chemical class [O]S(O)(=O)=O NIAGBSSWEZDNMT-UHFFFAOYSA-N 0.000 description 8
- 229910052749 magnesium Inorganic materials 0.000 description 8
- 239000011777 magnesium Substances 0.000 description 8
- 238000007792 addition Methods 0.000 description 7
- 229910052783 alkali metal Inorganic materials 0.000 description 7
- 150000001340 alkali metals Chemical class 0.000 description 7
- 239000004327 boric acid Substances 0.000 description 7
- 238000009713 electroplating Methods 0.000 description 7
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- RHZZVWTVJHZKAH-UHFFFAOYSA-K trisodium;naphthalene-1,2,3-trisulfonate Chemical compound [Na+].[Na+].[Na+].C1=CC=C2C(S([O-])(=O)=O)=C(S([O-])(=O)=O)C(S(=O)(=O)[O-])=CC2=C1 RHZZVWTVJHZKAH-UHFFFAOYSA-K 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000005282 brightening Methods 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- YFUQYYGBJJCAPR-UHFFFAOYSA-N 1,4-dimethoxybut-2-yne Chemical compound COCC#CCOC YFUQYYGBJJCAPR-UHFFFAOYSA-N 0.000 description 2
- IHJUECRFYCQBMW-UHFFFAOYSA-N 2,5-dimethylhex-3-yne-2,5-diol Chemical compound CC(C)(O)C#CC(C)(C)O IHJUECRFYCQBMW-UHFFFAOYSA-N 0.000 description 2
- TXCLTIFWSNGTIK-UHFFFAOYSA-N 3-ethylhept-1-yn-3-ol Chemical compound CCCCC(O)(CC)C#C TXCLTIFWSNGTIK-UHFFFAOYSA-N 0.000 description 2
- USWINTIHFQKJTR-UHFFFAOYSA-N 3-hydroxynaphthalene-2,7-disulfonic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C=C(S(O)(=O)=O)C(O)=CC2=C1 USWINTIHFQKJTR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940125773 compound 10 Drugs 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- ZPBSAMLXSQCSOX-UHFFFAOYSA-K naphthalene-1,3,6-trisulfonate(3-) Chemical compound [O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-K 0.000 description 2
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- YGMADCGBQRYLND-UHFFFAOYSA-N oct-4-yne-3,6-diol Chemical compound CCC(O)C#CC(O)CC YGMADCGBQRYLND-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- BSXLLFUSNQCWJP-UHFFFAOYSA-N thiophene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CS1 BSXLLFUSNQCWJP-UHFFFAOYSA-N 0.000 description 2
- AOSZTAHDEDLTLQ-AZKQZHLXSA-N (1S,2S,4R,8S,9S,11S,12R,13S,19S)-6-[(3-chlorophenyl)methyl]-12,19-difluoro-11-hydroxy-8-(2-hydroxyacetyl)-9,13-dimethyl-6-azapentacyclo[10.8.0.02,9.04,8.013,18]icosa-14,17-dien-16-one Chemical compound C([C@@H]1C[C@H]2[C@H]3[C@]([C@]4(C=CC(=O)C=C4[C@@H](F)C3)C)(F)[C@@H](O)C[C@@]2([C@@]1(C1)C(=O)CO)C)N1CC1=CC=CC(Cl)=C1 AOSZTAHDEDLTLQ-AZKQZHLXSA-N 0.000 description 1
- WWTBZEKOSBFBEM-SPWPXUSOSA-N (2s)-2-[[2-benzyl-3-[hydroxy-[(1r)-2-phenyl-1-(phenylmethoxycarbonylamino)ethyl]phosphoryl]propanoyl]amino]-3-(1h-indol-3-yl)propanoic acid Chemical compound N([C@@H](CC=1C2=CC=CC=C2NC=1)C(=O)O)C(=O)C(CP(O)(=O)[C@H](CC=1C=CC=CC=1)NC(=O)OCC=1C=CC=CC=1)CC1=CC=CC=C1 WWTBZEKOSBFBEM-SPWPXUSOSA-N 0.000 description 1
- JLEPZAUPTZFVIM-RHIZIOMBSA-N (3s,5s,9r,10s,13r,17r)-3-hydroxy-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-1,2,3,4,5,6,9,11,12,15,16,17-dodecahydrocyclopenta[a]phenanthrene-14-carbaldehyde Chemical group C1[C@@H](O)CC[C@]2(C)[C@@H](CC[C@@]3([C@@H]([C@H](C)CCCC(C)C)CCC33C=O)C)C3=CC[C@H]21 JLEPZAUPTZFVIM-RHIZIOMBSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- JMQVWTBLPCYKFJ-UHFFFAOYSA-N 1-(diethylamino)but-2-yn-1-ol Chemical compound CCN(CC)C(O)C#CC JMQVWTBLPCYKFJ-UHFFFAOYSA-N 0.000 description 1
- ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 1
- AVZZCWASARHEDP-UHFFFAOYSA-N 2-(benzenesulfonamidomethyl)propanedioic acid Chemical compound C1(=CC=CC=C1)S(=O)(=O)NCC(C(=O)O)C(=O)O AVZZCWASARHEDP-UHFFFAOYSA-N 0.000 description 1
- RGIIAYDCZSXHGL-UHFFFAOYSA-N 2-pyridin-4-ylethanesulfonic acid Chemical compound OS(=O)(=O)CCC1=CC=NC=C1 RGIIAYDCZSXHGL-UHFFFAOYSA-N 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- NUYADIDKTLPDGG-UHFFFAOYSA-N 3,6-dimethyloct-4-yne-3,6-diol Chemical compound CCC(C)(O)C#CC(C)(O)CC NUYADIDKTLPDGG-UHFFFAOYSA-N 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229940126657 Compound 17 Drugs 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 108700024827 HOC1 Proteins 0.000 description 1
- 241000922063 Lagostrophus Species 0.000 description 1
- 101001034830 Mus musculus Interferon-induced transmembrane protein 5 Proteins 0.000 description 1
- 101150072055 PAL1 gene Proteins 0.000 description 1
- IXAIKEKMZXIEKF-UHFFFAOYSA-N S(O)(O)(=O)=O.Cl.B(O)(O)O Chemical compound S(O)(O)(=O)=O.Cl.B(O)(O)O IXAIKEKMZXIEKF-UHFFFAOYSA-N 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- 101100178273 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) HOC1 gene Proteins 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- MWOBKFYERIDQSZ-UHFFFAOYSA-N benzene;sodium Chemical compound [Na].C1=CC=CC=C1 MWOBKFYERIDQSZ-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Substances ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229940126142 compound 16 Drugs 0.000 description 1
- 229940126208 compound 22 Drugs 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000006264 diethylaminomethyl group Chemical group [H]C([H])([H])C([H])([H])N(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical compound [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical group [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 1
- 125000001064 morpholinomethyl group Chemical group [H]C([H])(*)N1C([H])([H])C([H])([H])OC([H])([H])C1([H])[H] 0.000 description 1
- IEGCHLIGIYHQLB-UHFFFAOYSA-L naphthalene-1,5-disulfonate;nickel(2+) Chemical compound [Ni+2].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1S([O-])(=O)=O IEGCHLIGIYHQLB-UHFFFAOYSA-L 0.000 description 1
- WKQJGLOSRJVIQB-UHFFFAOYSA-L naphthalene-2,7-disulfonate;nickel(2+) Chemical compound [Ni+2].C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 WKQJGLOSRJVIQB-UHFFFAOYSA-L 0.000 description 1
- VILFVXYKHXVYAB-UHFFFAOYSA-N naphthalene-2,7-disulfonic acid Chemical compound C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 VILFVXYKHXVYAB-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical compound [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- CHLCPTJLUJHDBO-UHFFFAOYSA-M sodium;benzenesulfinate Chemical compound [Na+].[O-]S(=O)C1=CC=CC=C1 CHLCPTJLUJHDBO-UHFFFAOYSA-M 0.000 description 1
- DPPYVKXVOFYYKT-UHFFFAOYSA-N sodium;thiophene Chemical compound [Na].C=1C=CSC=1 DPPYVKXVOFYYKT-UHFFFAOYSA-N 0.000 description 1
- KDYDJCSCGCIOKM-UHFFFAOYSA-M sodium;thiophene-2-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CS1 KDYDJCSCGCIOKM-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
Definitions
- a preferred process according to this invention for producing bright nickel deposits comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt, in which there is dissolved from about 0.02 to 3 grams per liter of a water-soluble acetylenic compound, together with about /4 to about 80 grams per liter of a water-soluble sulfo-oxygen compound of the group consisting of unsaturated aliphatic sulfonic acids, mononuclear and binuclear aromatic sulfonic acids, heterocyclic sulfonic acids, mononuclear aromatic sulfinic acids, alkali metal, ammonium, magnesium and nickel salts of said acids, and mononuclear aromatic sult'onamides and imides.
- any water-soluble acetylenic compound can be employed with success in the above-defined process for producing bright nickel deposits, we have had particular success, particularly as regards production of ductile bright electrodeposits, when using an acetylenic compound selected from the group consisting of Z-butyne- 1,4-diol, 4-methoxy-2-butyn-1-ol, diethylamino-2-butyn-l-ol, 4-(N-morpholinyl)-2-butyn-1- o1, 3-pentyn-l-ol, 2,4-heXadiyne-L6-diol, and l-diethylamino-Z-propyne.
- an acetylenic compound selected from the group consisting of Z-butyne- 1,4-diol, 4-methoxy-2-butyn-1-ol, diethylamino-2-butyn-l-ol, 4-(N-morpholinyl)-2-but
- R1 is a hydroxyl, hydroxymethyl or hydroxyethyl radical
- R2 is a hydrogen or methyl radical
- R3 is selected from the group consisting of methyl, hydroxymethyl, hydroxyethyl, methoxymethyl, diethylaminomethyl, morpholinomethyl, and hydroxypropyne radicals.
- Compounds having this general formula, and other compounds in the group particularly specified above, are effective brighteners in nickel electroplating 3-hexyne-2,5-diol, 4-
- the nickel deposit produced from such bath is brilliant, but at a thickness of about 0.001 inch (0.025 mm.), it is likely to be rather brittle, as indicated by slight cracking of the deposits and noise production when the article on which the deposit is formed is bent.
- the acetylenic compound is used in the electroplating bath in combination with a suite-oxygen compound of the character described, the concentration of the acetylenic compound can be very considerably reduced (e. g.
- Brightener additions according to this invention have of course been used successfully in the standard Watts nickel electroplating bath. However, these brightener additions are also efiective in all other acid nickel electroplating baths, and the invention thereforeis applicable to any nickel electrodepcsition operation from an aqueous acidic solution of one or more nickel salts.
- Compound 1 (acetylene) gave bright and dull patches when bubbled (after purification by passage through water) over the test panel.
- Compound 22 (acetylene dicarboxylic acid) was only moderately elfective as a brightener'.
- the ineffective compounds 16 and 17 contain the following group:
- Nickel deposits (0.001 inch thick) obtained with the ammo compound l0, l8, l9 and also with compounds 16 and 17 were somewhat brittle. The brightening action I of compound 1 (acetylene) was difficult to control. Hov
- the compounds listed in Table Ill are examples of sulfo-oxygen compounds which, when used in combination with a water-soluble acetylenic (Group A) compound, promote formation of brilliant and adequately ductile nickel deposits.
- concentration values set opposite each compound in Table III were found to give good results when that compound was used in combination with 0.1 gram per liter of butynediol in a bath containing 330 grams per liter nickel sulfate, grams per liter nickel chloride, and 37.5 grams per liter boric acid at a pH of 3.5, at C., and 40 amperes per square foot average current density, using bent cathodes and with air agitation.
- Benzene monosulionic acid C@H5SO3H 2 and 4 g./l.
- Nickel benzene monosulfonate (CEHGS 0021351 i 2 and 4 g./l.
- HOCOC6H4SO3NH4 "Um” ,..l. .r. W... 2 g./l. 1-amino-2,5-benzenc disulfonic acid, HZNC5H3( S 033)! 2 and 4 g./l. Ortho-am'mooenzene sulfuric acid, HgNCfiILSOiH. Z and 4 gJl.
- Table IV shows the results obtained on a bent cathode in a standard Watts sulfate-chloride-boric acid nickel plating bath under varying operating conditions at a pH of 3.5 and with air agitation:
- the concentration of the naphthalene trisulfonic acid (or other Group B compound) should be kept rather low in order to avoid milkiness of the deposit in the low current density areas, especially if the butynediol (or other Group A compound) concentration is very low (say only 0.1 g./l.).
- the concentration limits for naphthalene trisulfonate are extremely wide.
- nickel sulfate-chloride-boric acid bath at a pH of 3.5, at 50 C., and at 40 amps. per sq. ft., in the presence of 0.15 g./l.
- ylenic (Group A) compound do the sulfo-oxygen (Group B) compounds produce really brilliant nickel deposits. Also a leveling (smoothing) action is produced only in presence of a Group A (acetylenic) compound.
- the roughness values root mean square values in microinches shown in Table V were obtained with a brush surface analyzer on roughened panels before and after plating 0.001 inch of nickel.
- the concentration of Group A compounds should be kept at the minimum required to produce the desired degree of brilliancy, which is approximately the value given in Table II.
- concentrations of Group A brighteners up to e. g. 0.4 or even up to a maximum of 1.0 grams per liter may be used with advantage.
- the concentration range or" Group B addition agents is rather wide. There is a certain minimum Group B compound concentration, depending on the concentration of the Group A compound, the bath composition, and operating conditions, below which maximum brilliancy is not obtained. Increase in the concentration of Group B compound beyond this minirnum frequently produces more ductile nickel deposits.
- the bath composition itself has some influence on the brightening effect of the Group A and Group B addition agents.
- Standard Watts baths containing 330 grams per liter sulfate, grams per liter chloride, 37.5 grams per liter boric acid and operated at a pH of 3.5, C., and 40 amperes per square foot, with air agitation, in which 25% to 100% of the nickel was replaced by cobalt, showed rather increased sensitivity to butynediol, when this Group A compound was used alone, but almost no sensitivity to naphthalene trisulfonic acid when this Group B compound was used alone or in combination with butynediol. Baths high in chloride ion concentration behaved similarly.
- K comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved TABLE VI Bath concentrations in grams per liter Bath 1 Bath 2 Bath 3 Bath 4 Bath 5 Bath 6 Bath 7 Nickel Sulfate, N iSO4.7H2O 240-330 330 240 Nickel chloride, YiOl fiHzO Nickel tormate, N i(OOCH)2.2H2O Nickel fluoborate, N i(BF-1)z Nickel sulfamate, Ni(OaSNH2)2 c Sodium chloride, No.01 Sodium bromide, NaBr Boric acid, H3BO3 2-Butyne-1,-4-diol 1,3,6-Naphthalene trisulfonate. Temp, C
- the optimum pH value is in the range from 3.0 to 5.0.
- the butynediol concentration must be increased (say, to 0.2 to 0.3 gram per liter) in order to produce a deposit of full brightness.
- a process for producing bright nickel deposits which comprises electrodeposit'ing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from about 0.2 to about 3 grams per liter of an acetylenic compound selected from the group consisting of 2-butyne-l,4-diol, 4-methoxy-2-butyn-l-ol, 3- hexyne-2,5-diol, 4-diethylamino-2-butyn-l-ol, 4-(N-n1orpholinyl)-2butyn-l-ol, 3pentyn-l-ol, 2,4-heXadiyne-L6- diol, and l-diethylamino-2-propyne.
- an acetylenic compound selected from the group consisting of 2-butyne-l,4-diol, 4-methoxy-2-butyn-l-ol, 3- hexyne-2,5
- a process for producing bright nickel deposits which comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from about 0.2 to about 3 grams per liter of a acidic solution of at least one nickel salt and containing (31% as an addition agent from about 0.3 to about 1.5 grams per liter of 2-butyne-1,4-diol.
- a process for producing bright nickel deposits which comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved trcrn about 0.02 to 1 gram per liter of a watersoluble acetylenic compound and from about /11 to about 30 grams per liter of a Water-soluble sulfo-oxygen compound of the group consisting of unsaturated aliphatic sulfonicacids, mononuclear and binuclear aromatic sulfonic acids, heterocyclic sulfonic acids, mononuclear aromatic sulfinic acids, alkali metal, ammonium, magnesium and nickel salts of said acids, and mononuclear aromatic sulfonamides and imides.
- a process for producing bright nickel deposits which from about 0.02 to about 1 gram per liter of a Watersoluble acetylenic compound selected from the group consisting of acetylene, Z-propyn-l-ol, 3-butyn-l-ol, Z-methyl- 3-butyn-2-oi, l-pentyn-S-ol, 3-rnethyl-l-pentyn-3-ol, 3,5- dimethyl-1-heXyn-3-ol, 3-ethyl-l-heptyn-3-ol, l-ethynylcyclohexanol, l-diethylamino 2'- propyne, 2-butyne-1,4- diol, 4-methoxy-2-butyn-l-ol, 1,4-dimethoxy 2 butyne, 3-hexyne 2,5 diol, 4-octyne 3,6 diol, 2,5-dimethyl-3- hexy
- benzene sulthydroxarnic acid N,N dimethyl para-toluene sulfonaniide, N,N dicarboxyethyl benzene sulfonamide, Z-naphthalene monosulfonic acid, 1,5-naphthalene disulfonic acid, 2,7-naphthalene disulfonic acid, 1,5-naphthalene disulfonic acid nickel salt, 2,7-naphthalene disulfonic acid nickel salt, naphthalene trisulfonic acid, naphthalene trisulfonic acid trisodium salt, diphenyl pp disuifonic acid, 2-naphthol-3,6-disulfonic acid, Z-naphthol- 3,6-disulfonic acid sodium salt, l-naphthylamine 3,6,8- trisulfonic acid, thiophene sulfonic acid, sodium thiophene sulf
- a process for producing bright nickel deposits which comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from about 0.1 to about 1 gram per liter of 2-butynel,4-diol and from about 1 to about 40 grams per liter of a water-soluble aromatic sulfonic acid.
- a process for producing bright nickel deposits which comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from about 0.1 to about 1 gram per liter of 2-butync-l,4-diol and from about 1 to about 40 grams per liter of a water-soluble salt selected from the group consisting of alkali metal, ammonium, magnesium and nickel salts of an aromatic sulfonic acid.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NLAANVRAGE7805347,A NL185994B (nl) | 1953-03-24 | Koppelingskop voor een persluchtleiding. | |
| IT513086D IT513086A (en, 2012) | 1953-03-24 | ||
| US344481A US2712522A (en) | 1953-03-24 | 1953-03-24 | Bright nickel plating |
| GB21895/53A GB747908A (en) | 1953-03-24 | 1953-08-07 | Improvements in bright nickel plating |
| FR1096351D FR1096351A (fr) | 1953-03-24 | 1954-02-18 | Procédé de formation de dépôts électrolytiques de nickel brillant |
| DEH19752A DE1063003B (de) | 1953-03-24 | 1954-03-24 | Verfahren zur elektrolytischen Herstellung hochglaenzender Nickelueberzuege |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US344481A US2712522A (en) | 1953-03-24 | 1953-03-24 | Bright nickel plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2712522A true US2712522A (en) | 1955-07-05 |
Family
ID=23350710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US344481A Expired - Lifetime US2712522A (en) | 1953-03-24 | 1953-03-24 | Bright nickel plating |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US2712522A (en, 2012) |
| DE (1) | DE1063003B (en, 2012) |
| FR (1) | FR1096351A (en, 2012) |
| GB (1) | GB747908A (en, 2012) |
| IT (1) | IT513086A (en, 2012) |
| NL (1) | NL185994B (en, 2012) |
Cited By (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2800440A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2800442A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2800441A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2818376A (en) * | 1956-12-28 | 1957-12-31 | Hanson Van Winkle Munning Co | Nickel plating |
| US2836549A (en) * | 1955-01-21 | 1958-05-27 | Elechem Corp | Nickel plating bath containing acetylenic polyamines |
| US2849353A (en) * | 1955-02-08 | 1958-08-26 | Hanson Van Winkle Munning Co | Bright nickel plating |
| US2879211A (en) * | 1956-11-16 | 1959-03-24 | Hanson Van Winkle Munning Co | Electroplating duplex nickel coatings |
| US2970425A (en) * | 1956-05-21 | 1961-02-07 | Walter A Kluttz | Plated spinning ring and method of making same |
| US2986500A (en) * | 1959-04-21 | 1961-05-30 | Metal & Thermit Corp | Electrodeposition of bright nickel |
| US3002903A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3002902A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3002904A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3006822A (en) * | 1957-05-08 | 1961-10-31 | Langbein Pfanhauser Werke Ag | Electro-deposition of nickel coatings |
| US3041256A (en) * | 1960-07-12 | 1962-06-26 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3054733A (en) * | 1957-06-05 | 1962-09-18 | Langbein Pfanhauser Werke Ag | Composition for the electrolytic deposition of well levelled and ductile nickel coatings of mirror-like luster |
| US3095362A (en) * | 1960-11-21 | 1963-06-25 | Incar Inc | Zinc plating composition and process |
| US3111466A (en) * | 1959-03-11 | 1963-11-19 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3152975A (en) * | 1961-02-07 | 1964-10-13 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3219559A (en) * | 1958-04-23 | 1965-11-23 | Barnet D Ostrow | Additive for level nickel plating |
| US3255096A (en) * | 1963-11-01 | 1966-06-07 | Harshaw Chem Corp | Electrodeposition of nickel |
| DE1221873B (de) * | 1961-07-08 | 1966-07-28 | Dehydag Gmbh | Galvanische Nickelbaeder |
| US3305462A (en) * | 1965-09-02 | 1967-02-21 | Barnet D Ostrow | Acid nickel electroplating bath |
| US3305461A (en) * | 1963-08-23 | 1967-02-21 | Barnet D Ostrow | Nickel electroplating bath with additives |
| US3366557A (en) * | 1958-07-22 | 1968-01-30 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3414491A (en) * | 1965-10-22 | 1968-12-03 | Kewanee Oil Co | Electrodeposition of nickel |
| US3429789A (en) * | 1965-10-19 | 1969-02-25 | Lea Ronal Inc | Carbamate containing acid nickel plating bath |
| US3506548A (en) * | 1966-09-23 | 1970-04-14 | Allied Res Prod Inc | Electrodeposition of nickel |
| US3779874A (en) * | 1971-10-29 | 1973-12-18 | Basf Ag | Nickel electroplating baths |
| US4016051A (en) * | 1975-05-02 | 1977-04-05 | Starlite Chemicals, Inc. | Additives for bright plating nickel, cobalt and nickel-cobalt alloys |
| US4416741A (en) * | 1981-03-06 | 1983-11-22 | Langbein-Pfanhauser Werke Ag | Method and bath for the electrodeposition of palladium/nickel alloys |
| US20080308429A1 (en) * | 2007-06-18 | 2008-12-18 | Cvrd Inco Limited | Method for improving cathode morphology |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4221970C2 (de) * | 1992-06-30 | 1996-01-18 | Atotech Deutschland Gmbh | Verfahren zur Vermeidung der Halogengasentwicklung in Metallabscheidungsbädern mit mindestens zwei Elektrolyträumen |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE499729A (en, 2012) * | 1950-09-27 | 1951-03-16 | Kampschulte & Cie Dr W |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2635076A (en) * | 1947-01-29 | 1953-04-14 | Harshaw Chem Corp | Bright nickel plating |
| DE863159C (de) * | 1950-09-11 | 1953-01-15 | Hydrierwerke A G Deutsche | Verfahren zur Erzeugung festhaftender und glaenzender galvanischer Metallueberzuege |
| DE874100C (de) * | 1952-01-01 | 1953-04-20 | Guenter Mueschenig | Verfahren zur elektrolytischen Herstellung hochglaenzender Kupferschichten aus cyanalkalischen Baedern |
-
0
- IT IT513086D patent/IT513086A/it unknown
- NL NLAANVRAGE7805347,A patent/NL185994B/xx unknown
-
1953
- 1953-03-24 US US344481A patent/US2712522A/en not_active Expired - Lifetime
- 1953-08-07 GB GB21895/53A patent/GB747908A/en not_active Expired
-
1954
- 1954-02-18 FR FR1096351D patent/FR1096351A/fr not_active Expired
- 1954-03-24 DE DEH19752A patent/DE1063003B/de active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE499729A (en, 2012) * | 1950-09-27 | 1951-03-16 | Kampschulte & Cie Dr W |
Cited By (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2836549A (en) * | 1955-01-21 | 1958-05-27 | Elechem Corp | Nickel plating bath containing acetylenic polyamines |
| US2849353A (en) * | 1955-02-08 | 1958-08-26 | Hanson Van Winkle Munning Co | Bright nickel plating |
| US2800440A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2800441A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2800442A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| US2970425A (en) * | 1956-05-21 | 1961-02-07 | Walter A Kluttz | Plated spinning ring and method of making same |
| US2879211A (en) * | 1956-11-16 | 1959-03-24 | Hanson Van Winkle Munning Co | Electroplating duplex nickel coatings |
| US2818376A (en) * | 1956-12-28 | 1957-12-31 | Hanson Van Winkle Munning Co | Nickel plating |
| US3006822A (en) * | 1957-05-08 | 1961-10-31 | Langbein Pfanhauser Werke Ag | Electro-deposition of nickel coatings |
| US3054733A (en) * | 1957-06-05 | 1962-09-18 | Langbein Pfanhauser Werke Ag | Composition for the electrolytic deposition of well levelled and ductile nickel coatings of mirror-like luster |
| US3219559A (en) * | 1958-04-23 | 1965-11-23 | Barnet D Ostrow | Additive for level nickel plating |
| US3366557A (en) * | 1958-07-22 | 1968-01-30 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3002903A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3002902A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3002904A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3111466A (en) * | 1959-03-11 | 1963-11-19 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US2986500A (en) * | 1959-04-21 | 1961-05-30 | Metal & Thermit Corp | Electrodeposition of bright nickel |
| US3041256A (en) * | 1960-07-12 | 1962-06-26 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3095362A (en) * | 1960-11-21 | 1963-06-25 | Incar Inc | Zinc plating composition and process |
| US3152975A (en) * | 1961-02-07 | 1964-10-13 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| DE1221873B (de) * | 1961-07-08 | 1966-07-28 | Dehydag Gmbh | Galvanische Nickelbaeder |
| US3305461A (en) * | 1963-08-23 | 1967-02-21 | Barnet D Ostrow | Nickel electroplating bath with additives |
| US3255096A (en) * | 1963-11-01 | 1966-06-07 | Harshaw Chem Corp | Electrodeposition of nickel |
| US3305462A (en) * | 1965-09-02 | 1967-02-21 | Barnet D Ostrow | Acid nickel electroplating bath |
| US3429789A (en) * | 1965-10-19 | 1969-02-25 | Lea Ronal Inc | Carbamate containing acid nickel plating bath |
| US3414491A (en) * | 1965-10-22 | 1968-12-03 | Kewanee Oil Co | Electrodeposition of nickel |
| US3506548A (en) * | 1966-09-23 | 1970-04-14 | Allied Res Prod Inc | Electrodeposition of nickel |
| US3779874A (en) * | 1971-10-29 | 1973-12-18 | Basf Ag | Nickel electroplating baths |
| US4016051A (en) * | 1975-05-02 | 1977-04-05 | Starlite Chemicals, Inc. | Additives for bright plating nickel, cobalt and nickel-cobalt alloys |
| US4416741A (en) * | 1981-03-06 | 1983-11-22 | Langbein-Pfanhauser Werke Ag | Method and bath for the electrodeposition of palladium/nickel alloys |
| US20080308429A1 (en) * | 2007-06-18 | 2008-12-18 | Cvrd Inco Limited | Method for improving cathode morphology |
| WO2008154722A1 (en) * | 2007-06-18 | 2008-12-24 | Vale Inco Limited | Method for improving nickel cathode morphology |
| JP2010525170A (ja) * | 2007-06-18 | 2010-07-22 | ヴァーレ、インコ、リミテッド | カソード構造を改良する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB747908A (en) | 1956-04-18 |
| IT513086A (en, 2012) | |
| NL185994B (nl) | |
| DE1063003B (de) | 1959-08-06 |
| FR1096351A (fr) | 1955-06-20 |
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