US2576922A - Electrodeposition with nickel - Google Patents
Electrodeposition with nickel Download PDFInfo
- Publication number
- US2576922A US2576922A US679558A US67955846A US2576922A US 2576922 A US2576922 A US 2576922A US 679558 A US679558 A US 679558A US 67955846 A US67955846 A US 67955846A US 2576922 A US2576922 A US 2576922A
- Authority
- US
- United States
- Prior art keywords
- nickel
- bath
- hydrofluoric acid
- excess
- complex
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 174
- 229910052759 nickel Inorganic materials 0.000 title claims description 87
- 238000004070 electrodeposition Methods 0.000 title description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 112
- 239000002184 metal Substances 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 34
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 claims description 28
- 238000007747 plating Methods 0.000 claims description 28
- 150000002816 nickel compounds Chemical class 0.000 claims description 27
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 20
- 239000004327 boric acid Substances 0.000 claims description 20
- 150000001450 anions Chemical class 0.000 claims description 13
- 150000001642 boronic acid derivatives Chemical class 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- XLYOFNOQVPJJNP-PWCQTSIFSA-N Tritiated water Chemical compound [3H]O[3H] XLYOFNOQVPJJNP-PWCQTSIFSA-N 0.000 claims 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 52
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- 150000002222 fluorine compounds Chemical class 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229910052742 iron Inorganic materials 0.000 description 10
- 239000002253 acid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 7
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000000080 wetting agent Substances 0.000 description 5
- 238000005282 brightening Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 150000002815 nickel Chemical class 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- -1 fatty alcohol sulphate Chemical class 0.000 description 2
- 239000013528 metallic particle Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229920001875 Ebonite Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 241000842783 Orna Species 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 241000193803 Therea Species 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- UIFOTCALDQIDTI-UHFFFAOYSA-N arsanylidynenickel Chemical compound [As]#[Ni] UIFOTCALDQIDTI-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 208000006379 syphilis Diseases 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S29/00—Metal working
- Y10S29/012—Method or apparatus with electroplating
Definitions
- ELECTRODERO SITION' WITHiNICKEI; Etienne L. A. Ctmi'n,,New Yiirli, NI Y.,.vand' Siren E. Hybin'ette' and'Herbert B: 'l-ayl'or;Wilmimfi ton; Del., assignors; by m'esne assignmentefipto Kenmore--Metajls Gorporation, a corporation 01 Delaware NdDrawiiig, Applicationlime 26;.1946 ⁇ Sbri'a'ITNO. 679,558
- An object of this invention is to produce a: ductile nickel plating on metalwhich can be drawn;
- the ductility of-the product obtainable by the process of this: invention goesconsider ably beyond the previous standards -of ductility; inthis art.
- plated article:- is considered 1 ductile ii itcan be hammered or bent: without cracking;
- plated articles may be made in whichthe product is so ductile that it may be drawn; several thousands of timesits: previous length and :the' drawn product can --still be bentgtwisted or braided-withoutcausingtheplating: tozcrack;
- Another'object oi thisinvention is xto produc'e: aenickelplating bath from nickel or:nickel salts,-. hydrofluoric acid and a buffering. agent which? has substantially the same throwing power as asulphate-chloride type of nickelplating bath;
- Another object 'of thiseinventionis to expedite the rate of electrod'eposition; of. nickel andzat; the same :time: attain generally improvedioperati- 1 ing characteristics;
- Another; object. of: the presentinvention is. to: produce; heavy deposits: of nickel on metal in; smooth condition; by; employing: a1 process and a bath .7 in. which the; nickel does. not i tree. as: heavily as in the priorart;
- the upper limit oi nickelcontent of the bath- is determined mainly by the solubility of the nickel' or" nickel: salt;
- a hig-11' rii(:le1 content favors the pro duction' of a ductile plate at -high current dem sitiesa-
- a low nickel content sueh as for example about iii-grams per liter, low currentdensities must be employed whichmight be une economical for commercial production How ever, asatiSfactoryplate may be obt'ained at ai slightly lower' nickel content.
- the buffer employed in: the bath is: prefer? ably boric acid 'althoug-he it quite possible that other bufiers; such as the more ex-p'ensive citric acid or tartaric acid, could be employe'di-l
- the boric acid besidesacting: as a buffer: also reacts with the nickelion in the bathito:- producei Sis complex nickel; salt possibly a fluorob'orateit Thus; it is preferable-toadd sonifiexcessgiof (the: boric acid over thatrequiredito react with?the: nickelin the-bath.
- the solubility oithe" nickel-or nickel salt in.:the bath increases as'th'e': pH value is'loweredf
- pH value is'loweredf
- at around a pH 1 ⁇ hydrogen inclusion in' the plating may cause brittleness.
- hydrogemj evolution is; increased at-.lower.:pH:values-.- Atzthevlower: pHl'va'lues one: obtains better: anode corrosion andixaismallert amount of bufferziscnecessaryx
- therhigheitspfie values the: ductility; ofi thezzproduct somewhat;
- the range of current density which can be employed is wide. It is well known that the more intensive the agitation of the solution and/or the' cathode, the higher is the current density which can be employed. Our invention enables us to employ current densities two to three times higher than generally is possible under the same conditions of agitation. (In the art, current density is always referred to the surface area of the cathode unless the anode is specified.) For the best ductility the current densities of from 3-50 amps. per square decimeter are advantageous. High current densities are known in one other type bath, i. e. the high chloride type bath. These baths have the disadvantages of having a very low pH and of being very corrosive and can only be used with special equipment and with special protection for the operation. For these reasons these baths have not gained wide popularity.
- the baths of the present invention do not suffer from these defects.
- wetting agent which minimizes the effect of the evolution of hydrogen on the plate and, therefore, aids in the production of a more ductile and pore-free plate.
- Mechanical vibrations may also be employed to minimize the effect of the evolution of hydrogen.
- a wetting agent which may be used is Duponol ME which is a fatty alcohol sulphate type of wetting agent.
- Other wetting agents of this type or of any type which will stand up in an acid solution with a high salt content may be employed. Examples of such wetting agents are: quaternary ammonium compounds such as lauryl pyradonium chloride, long chain polyethylene oxide compounds such as Carbowax, etc.
- ductility was also determined by making plates .002" thick on copper wire and bending the plated wire over a rod four times the diameter of the wire. The plate at the bend was dipped first in hydrochloric acid and then in sodium polysulphide, and then examined under a microscope. If no cracks were revealed there was considered to be a good ductile plate.
- a diameter steel wire plated according to Example 12 with 5% by weight of nickel and at a current density of 25-30 amperes per square decimeter was drawn from a length of 3 feet to 16,000 feet and in every stage of the drawing could be bent, flexed, twisted or otherwise worked.
- the drawn wire still contained 5% by weight of nickel as determined by chemical analysis.
- the resultant drawn wire was also more resistant to corrosion due to the fact that in the drawing process the nickel plating became denser and at the same time retained its continuity.
- the degree of ductility achieved by the present invention is due to the crystal structure of the nickel deposit. X-ray tests seem to show that the nickel crystals deposited from our bath are not'deposited one alongside the other in the form known as trees but that a sufficient number of the crystals are aligned parallel to the surface of the base material to form brick-like layers and that these layers flow with the base metal when drawn, whereas a normal crystal growth perpendicular to the surface of the base metal separates when the plating is drawn.
- Nickel plating baths in common usage cannot hold-much iron in solution with the result that if any appreciable amount of iron is introduced it will be precipitated.
- Most nickel anodes contain some iron which enters the solution continuously, only to be precipitated. It has heretofore often been found necessary to constantly filter the solution or provide a very deep electroplating tank so that the iron precipitate may settle to such a depth in the bath as to obviate the danger of its being stirred up during the carrying out of the plating process.
- my improved electroplating bath all iron entering into the solution from the anode (assumingthe anode is primarily nickel and contains some iron). will remain in solution, thus obviating the formation of an iron precipitate.
- the iron in solution will be plated out with the nickel and deposited on the cathode.
- iron may, by design, be added to the solution for the purpose of producing a plate consisting of a nickel iron alloy.
- certain of the anodes would be constituted of iron.
- the bath is such in its operation that cobalt may be intentionally introduced in the solution when an electrodeposition of cobalt is desired along with the nickel.
- the baths of the present invention may beemployed for producing bright plating and it is then possible to work with high current densities (up to 2 or more) compared to the commercial brightening baths.
- high current densities up to 2 or more
- This possibility of working with high current densities is the important advantage in baths of the present invention where brightening agents are added since it is well known in the art that the addition of brightening agents to the electroplating baths reduces the ductility of the plating.
- the particular bath employed when plating ac cordingto the present invention depends upon such factors as the ductility required, the rate of deposition required, and the character of the plating operations to be undertaken.
- the exact composition of the bath and the operating characteristics thereof for any particular set of requirements will be apparent to those skilled in theart.
- a method for producing a relatively ductile nickel plating on a metal base which comprises passing a current of less than 250 amperes per square decimeterfrom a nickel anode to themetal base to be plated through a bath formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a.
- said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing at least 30 grams or" nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of f more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of less than 250 amper S per square decimeter from a nickel anode to the metal base to be plated through a bath formed essentially from nickel carbonate, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel carbonate to form a com plex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel carbonate to said complex nickel fluoride, said bath containing at least 30 grains of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprisin-g essentially fluorides and. borates.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of less than 250 amperes per square deoimeter from a nickel anode to the metal base to be plated through a bath formed essentially from nickel, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel to said complex nickel fluoride, said bath contain ing at least 30 grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of less than 250 ampcres per square decimeter from a nickel anode to the metal base tobe plated through a bath formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing at least 30 grams of nickel metal per liter, and 20 60 grams of boric acid per liter, said excess of hydrofluoricacid giving said.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of less than 250 amperes per square decimeter from a nickel anode to the metal base to be plated through a bath formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing from 42 to 60 grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of from to less than 250 amperes per square decimeter from a nickel anode to the metal base to be plated through a bath formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing at least grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath compris- I ing essentially fluorides and borates.
- a method for producing a highly ductile nickel plating on a metal base which comprises passing a current of from 15 to less than 250 amperes per square decimeter from a nickel an ode to the metal base to be plated through a bath formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing from 42 to 60 grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates.
- a bath for the electrodepositicn of a relatively ductile nickel coating on a metal base which is formed essentially from a nickel compound, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing at least 30 grams of nickel metal per liter, said excess of hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates, said bath producing said relatively ductile nickel coating when operated at current densities of less than 250 amperes per square decimeter.
- a bath for the electrodepositicn of a highly ductile nickel coating on a metal base which is formed essentially from nickel carbonate, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel carbonate to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel carbonate to said complex nickel fluoride, said bath containing at least 30 grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6,, the anions of said bath comprising essentially fluorides and borates, said bath producing said highly ductile nickel coating when operated at current densities of less than 250 amperes per square decimeter.
- a bath for the electrodepositicn of a highly ductile nickel coating on a metal base which is formed essentially from nickel, hydrofluoric acid, boric acid and water, said hydrofluoric acid reacting with said nickel to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel to said complex nickel fluoride, said bath containing at least 30 grams of nickel metal per liter, said excess hydrofluoric acid giving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates, said bath producing said highly ductile nickel coating ductile nickel coating on a metal base which is formed essentially from a nickel compound, hydrofluoric acid, boric acid and Water, said hydrofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing at least 30 grams of nickel metal per
- hydrofluoric acid, boric acid and water said hy-- drofluoric acid reacting with said nickel compound to form a complex nickel fluoride, said' hydrofluoric acid being present in a quantity in excess of that required to convert said nickel compound to said complex nickel fluoride, said bath containing from 42 to grams of nickel metal per liter, said excess hydrofluoric acidgiving said bath a pH of more than 1 and less than 6, the anions of said bath comprising essentially fluorides and borates, said bath producing said highly ductile nickel coating when operated at current densities of less than 250 amperes per square decimeter.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE505404D BE505404A (enrdf_load_stackoverflow) | 1946-06-26 | ||
US679558A US2576922A (en) | 1946-06-26 | 1946-06-26 | Electrodeposition with nickel |
CH305430D CH305430A (de) | 1946-06-26 | 1951-08-27 | Verfahren zur Herstellung eines Nickelüberzuges auf einer Metallunterlage. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US679558A US2576922A (en) | 1946-06-26 | 1946-06-26 | Electrodeposition with nickel |
Publications (1)
Publication Number | Publication Date |
---|---|
US2576922A true US2576922A (en) | 1951-12-04 |
Family
ID=24727402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US679558A Expired - Lifetime US2576922A (en) | 1946-06-26 | 1946-06-26 | Electrodeposition with nickel |
Country Status (3)
Country | Link |
---|---|
US (1) | US2576922A (enrdf_load_stackoverflow) |
BE (1) | BE505404A (enrdf_load_stackoverflow) |
CH (1) | CH305430A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3167491A (en) * | 1960-07-29 | 1965-01-26 | Plasitron Corp | Polyfluorinated ethylene polymermetal article and method |
US3214820A (en) * | 1963-02-08 | 1965-11-02 | Nat Steel Corp | Steel foil and manufacture |
US3285159A (en) * | 1965-08-27 | 1966-11-15 | John H Greene | Cooking apparatus |
US20090283316A1 (en) * | 2008-05-16 | 2009-11-19 | Samsung Techwin Co., Ltd. | Circuit board viaholes and method of manufacturing the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2313756A (en) * | 1939-03-01 | 1943-03-16 | Dow Chemical Co | Method of electroplating magnesium |
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0
- BE BE505404D patent/BE505404A/xx unknown
-
1946
- 1946-06-26 US US679558A patent/US2576922A/en not_active Expired - Lifetime
-
1951
- 1951-08-27 CH CH305430D patent/CH305430A/de unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2313756A (en) * | 1939-03-01 | 1943-03-16 | Dow Chemical Co | Method of electroplating magnesium |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3167491A (en) * | 1960-07-29 | 1965-01-26 | Plasitron Corp | Polyfluorinated ethylene polymermetal article and method |
US3214820A (en) * | 1963-02-08 | 1965-11-02 | Nat Steel Corp | Steel foil and manufacture |
US3285159A (en) * | 1965-08-27 | 1966-11-15 | John H Greene | Cooking apparatus |
US20090283316A1 (en) * | 2008-05-16 | 2009-11-19 | Samsung Techwin Co., Ltd. | Circuit board viaholes and method of manufacturing the same |
US8278564B2 (en) * | 2008-05-16 | 2012-10-02 | Samsung Techwin Co., Ltd. | Circuit board viaholes and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
BE505404A (enrdf_load_stackoverflow) | |
CH305430A (de) | 1955-02-28 |
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