US2047350A - Cathode disintegration - Google Patents
Cathode disintegration Download PDFInfo
- Publication number
- US2047350A US2047350A US751091A US75109134A US2047350A US 2047350 A US2047350 A US 2047350A US 751091 A US751091 A US 751091A US 75109134 A US75109134 A US 75109134A US 2047350 A US2047350 A US 2047350A
- Authority
- US
- United States
- Prior art keywords
- cathode
- disintegration
- gas
- film
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 description 25
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Definitions
- One of the objects of the present invention is to allow of effecting the cathode disintegration of metals in a rapid and economic manner; more particularly, the present invention allows of depositing by cathode disintegration certain metals which could not be deposited at all so far or only in an unsatisfactory manner by the same method.
- the invention applies more particularly to the cathode disintegration of metals belonging to the groups of iron and tungsten (periodic systems), such as Fe, Ni, Co, Cr, W, Mo.
- the invention also allows of effecting the cathode disintegration at a higher pressure than that which was necessary before.
- the liberation of sorbed gas is effected preferably with a highly heated cathode.
- the temperature at which the cathode should be heated v depends on the metal to be deposited. on the chemical nature of the filling gas, and on the nature of the sorbed gas.
- Any suitable means may be used for heating For instance. use may be made of the same current which will afterwards eifect the disintegration of thecathode, or an independent heating of the cathodes may be used.
- the disintegration of the cathode may be prevented by all suitable means, for instance by inserting a'separating surface between the electrodes and the objects to be covered with metal, or by any other means.
- Example 1 Forming the cathode disintegration of cobalt, use is made of cathodes-consisting of bands of cobalt having a width of 4 mm. and a thickness of 2 mm. As a filling gas, hydrogen is used at a pressure of 0.36 mm. of
- sorbed gas oxygen
- cathodes minute The cathode disintegration is afterwards effected under a lower voltage of 2000 volts during about five minutes.
- a metal. layer of about 40 n illimicrons is obtained.
- Example 2 Form effecting the cathode disintemade of molybdenum wire and having a diameter of 0.8 mm.
- hydrogen is used at a pressure of 0.4
- the cathodes are first heated at a temperatureof 1200 C. and-the liberationof sorbed gas is then effected during about 2 minutes. Afterwards the cathodes are disintegrated at a lower voltage of 1900 during about 4 minutes for producing a layer of about 40 millimicrons.
- the present invention applies naturally to all the applications of cathode disintegration for the manufacture of heating units, for the manufacture of electric resistances, of mirrors, etc.
- the temperature at which the cathodes should be heated for producing the escape of the sorbed gas or gases depends on the nature of the metal itself. In the case of certain metals the temperature may reach the white heat. In the case of platinum, tungsten, etc., the tem-.' perature exceeds 1300 C. a
- a process for cathode disintegration in a sorption, in-an atmosphere of a gas capable of reacting with the gas of said film which comprises first ionizing said atmosphere and preheatingthe cathode to atemperature and for a time suflicient to liberate said gas film. and then disintegrating the film-tree cathode.
- a process for cathode disintegration in a gaseous atmosphere of a cathode formed or a metal having a gas film bound thereto by chem osorption or active adsorption which comprises first ionizing said atmosphere and preheating the cathode to a temperature and for a time sumcient to liberate the gas film therefrom by passing a current of electricity thcrethrough, and then disintegrating the film-tree cathode by the same current.
- a process for cathode disintegration in a gaseous a mosphere or a cathode formed or a metal having a gas film bound thereto by chemosorption or active adsorption which comprises aoa'aaso first ionising said atmosphere and preheating thecathodetoatemperature andforatime sufllcient to liberate the gas film therefrom by a source of heat other than the disintegrating current, and then disintegrating the film-tree cathode by passing an electric current therethrough.
- a process of cathode disintegration of a cathode formed or a metal having an oxygen film bound thereto by chemosorption or active adsorptioh, in an atmosphere of hydrogen which comprises first ionizing said hydrogen atmosphere and preheating the cathode to a temperature and for a time sufiicient toliberate said gas film, and then disintegrating the film-tree cathode.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR793014T | 1934-10-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2047350A true US2047350A (en) | 1936-07-14 |
Family
ID=9232535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US751091A Expired - Lifetime US2047350A (en) | 1934-10-16 | 1934-11-01 | Cathode disintegration |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US2047350A (is") |
| BE (1) | BE411781A (is") |
| DE (1) | DE656029C (is") |
| ES (1) | ES137643A1 (is") |
| FR (1) | FR793014A (is") |
| NL (1) | NL46324C (is") |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2815302A (en) * | 1954-03-12 | 1957-12-03 | Ohio Commw Eng Co | Film resistors |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE748506C (de) * | 1939-07-27 | 1944-11-04 | Arbeitsflaechen fuer Ventilkegel von Brennkraftmaschinen und aehnliche metallische Maschinenteile |
-
1934
- 1934-10-16 FR FR793014D patent/FR793014A/fr not_active Expired
- 1934-11-01 US US751091A patent/US2047350A/en not_active Expired - Lifetime
- 1934-11-25 DE DED69214D patent/DE656029C/de not_active Expired
-
1935
- 1935-03-22 ES ES0137643A patent/ES137643A1/es not_active Expired
- 1935-10-15 NL NL75177D patent/NL46324C/xx active
- 1935-10-16 BE BE411781D patent/BE411781A/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2815302A (en) * | 1954-03-12 | 1957-12-03 | Ohio Commw Eng Co | Film resistors |
Also Published As
| Publication number | Publication date |
|---|---|
| FR793014A (fr) | 1936-01-15 |
| BE411781A (is") | 1935-11-30 |
| ES137643A1 (es) | 1935-07-16 |
| DE656029C (de) | 1938-01-27 |
| NL46324C (is") | 1939-03-15 |
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