US20170291189A1 - Method and apparatus for treating components - Google Patents
Method and apparatus for treating components Download PDFInfo
- Publication number
- US20170291189A1 US20170291189A1 US15/632,416 US201715632416A US2017291189A1 US 20170291189 A1 US20170291189 A1 US 20170291189A1 US 201715632416 A US201715632416 A US 201715632416A US 2017291189 A1 US2017291189 A1 US 2017291189A1
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- United States
- Prior art keywords
- splash guard
- components
- dip tank
- liquid
- relative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/02—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid
- B65G49/04—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
- B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
- B05D7/26—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials synthetic lacquers or varnishes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/04—Bulk
- B65G2201/047—Articles manipulated as bulk
Definitions
- the present disclosure relates to a method for treating components with a liquid and to an apparatus for treating components in a liquid, comprising a dip tank, which is fillable with the liquid, an accommodation device, rotatingly drivable around an axis of rotation, for accommodating the components, wherein the accommodation device and the dip tank are movable relative to each other, to dip the components into the dip tank and to lift them out of this, and a splash guard.
- the apparatus has a dip tank, which is fillable with liquid. Above the dip tank a transportation cart is arranged, with which the transportation baskets are movable. On the transportation cart, a basket carrier is provided in a height adjustable and rotatingly drivable manner. For treating mass components, the transportation basket is dipped into the liquid in the dip tank. Then the transportation basket is moved out of the liquid and is lifted within the dip tank into a centrifuging position. In this case, the high side walls of the dip tank serve as splash guard, which captures the liquid centrifuged off during the rotation of the mass components.
- the known apparatus and especially the splash guard have to be regularly cleaned off the centrifuged liquids. Especially with varnishes and other liquids, which can cure quickly, the cleaning has to be carried out regularly and in short intervals, to prevent an encrusting of the apparatus.
- the known apparatus has to be serviced often and incurs high costs, as it has to be cleaned by hand during forced downtimes.
- the liquids, captured by the splash guard cure on the splash guard and can fall back into the liquid in solid state, so that the liquid in the dip tank can become unusable for the further treatment of mass components.
- Disclosed herein is a method that can be easily carried out, and a maintenance-friendly apparatus, for treating components with a liquid.
- An exemplary method for treating components with a liquid comprises the following steps:
- the splash guard is an independent component, which is movable relative to the dip tank or the components.
- the splash guard can be positioned around the components, when these are rotated outside of the liquid, and can regularly be dipped back into the liquid. In this manner, it is prevented, that the liquid, captured by the splash guard, is exposed for a long time to the ambient atmosphere such that it can cure on the splash guard.
- the splash guard in a movable manner relative to the dip tank filled with the liquid.
- the splash guard itself, can be moved by suitable lifting devices relative to the dip tank or the components.
- the dip tank can also be height adjustable.
- the dip tank can be held on a fork-lift similar transportation cart and can be moved up and down in direction of the splash guard.
- the splash guard can be moved during the process relative to the dip tank into a centrifuging position surrounding the components. In this case, when the splash guard is in the centrifuging position it surrounds laterally the components rotating outside the liquid to capture excessive liquid that is centrifuging off due to the rotation. However, it is not necessary to lift also the splash guard completely out of the liquid.
- the splash guard can be again moved into the dipping position after the rotation of the components.
- the splash guard is in the dipping position, when at least the portion of the splash guard, which captures the excessive liquid centrifuging off, during the rotation of the components, is dipped into the liquid.
- the splash guard may be only dipped so far into the liquid that an upper portion, on which the splash guard can be lifted out of the liquid, remains dry.
- the to be treated components are for example mass components like, for example, screws or other small components, which are put into a material basket for carrying out the treatment.
- a to be treated component can also be an individual component, which can also be treated according to the method and apparatus disclosed herein.
- the liquid can be a cleaning, coating, treatment or any varnishing liquid.
- the liquid can be a zinc-containing coating liquid for the corrosion protection of the to be treated components.
- the splash guard is arranged in the centrifuging position such that during rotating the components, centrifuged liquid can drip from the splash guard back into the dip tank. In this manner it is prevented that the excessive liquid contaminates areas outside of the dip tank. Further, the flowing back liquid can be used again for treating components.
- the splash guard can be always arranged such that, when it is not in the dipping position, the liquid adhering to the splash guard can drip back into the dip tank.
- the splash guard is held stationary while rotation of the components.
- the liquid, adhering to the splash guard is centrifuged off and contaminates the apparatus.
- the splash guard can be coupled to a carrier device.
- a signal representing the coupling position and that the splash guard is held on the carrier device, is registered and that the signal is transmitted to a control device.
- the method can be automated.
- the moving of the splash guard relative to the dip tank is carried out such that the carrier device and the dip tank are moved relative to each other.
- the splash guard and the dip tank partially overlap each other in the centrifuging position. This means that a lower portion of the splash guard covers axially an upper portion of the dip tank. In this manner, it is securely prevented that excessive liquid can centrifuge off between the splash guard and the dip tank and that the apparatus can be contaminated.
- the splash guard is moved relative to the dip tank into a turning position surrounding the components, in which position the splash guard is at least partially moved out of the dip tank, the components and the splash guard are pivoted relative to the dip tank, and that the components are turned.
- the components are here turned over in a slow rotation, i.e., with approximately 20 to 30 revolutions per minute, continuously in a pivoted manner across an angle range between 1 and 90 degrees, especially 30, 45, 60 and 90 degrees, relative to the zero position. Due to the slow rotation in combination with the pivoting of the components, the excessive liquid, which could have adhered in spite of the quick rotation of the components in possible present cavities of the components, can be discharged. In the centrifuging position the splash guard can thus be moved partially or completely out of the dip tank.
- a further subject of the present disclosure is an apparatus for treating components in a liquid, in which according to the invention a lifting device is provided for moving the splash guard relative to the dip tank and/or relative to the accommodation device or relative to the components.
- the lifting device is designed such that the splash guard is axially movable along a lifting axis. In this manner, the splash guard can be lifted and/or lowered.
- the lifting device can especially comprise pneumatically or hydraulically driven cylinders and/or a spindle drive and/or a Bowden cable.
- the lifting device is arranged at the outside on the dip tank. Thus, it is prevented that contaminations get into the liquid.
- a carrier device on which the splash guard is detachably mountable, wherein the carrier device is pivotable relative to a stationary frame.
- a controllable coupling device is provided and designed such that the splash guard can be coupled to or can be decoupled from the carrier device. In this manner, the coupling process can be automated.
- the coupling device comprises a toggle lever mechanism to fasten the splash guard in a self-locking manner to the carrier device.
- a secure retaining of the splash guard on the carrier device is ensured.
- the carrier device has guide elements interacting with the splash guard and which are formed such that the splash guard is attachable on the carrier device concentrically to the axis of rotation.
- the splash guard is transferred in a reproducible manner into a holding position provided on the carrier device.
- the splash guard is formed to be tubular and has a larger axial longitudinal extension than at least one of following components, namely the dip tank or the accommodation device.
- a splash guard that can easily be manufactured is provided, which splashguard laterally encloses completely the components.
- accommodation device can be detachably mountable on the carrier device, the splash guard being attachable to the carrier device in a detachable manner.
- a controllable coupling device can be provided and designed such that the accommodation device can be coupled to or decoupled from the same.
- the splash guard is arranged in a dipping position between a circumferentially extending wall of the dip tank and the accommodation device for the components.
- the accommodation device is already in the dipping position within the splash guard, so that, before turning the components within the splash guard, both can be moved together relative to the dip tank, without having to change the relative position of the splash guard and of the accommodation device.
- FIG. 1A is an example apparatus in a partially sectional perspective view in a basic position.
- FIG. 1B is the example apparatus of FIG. 1A in a partially sectional perspective view in an intermediate position.
- FIG. 1C is the example apparatus of FIG. 1A in a partially sectional perspective view in a dipping position.
- FIG. 1D is the example apparatus of FIG. 1A in a partially sectional perspective view in a coupling position.
- FIG. 1E is the example apparatus of FIG. 1A in a partially sectional perspective view in a centrifuging position.
- FIG. 1F is the example apparatus of FIG. 1A in a partially sectional perspective view in a further intermediate position.
- FIG. 1G is the example apparatus of FIG. 1A in a partially sectional perspective view in a first turning position.
- FIG. 1H is the example apparatus of FIG. 1A in a partially sectional perspective view in a second turning position.
- FIG. 1I is the example apparatus of FIG. 1A in a partially sectional perspective view in a third turning position.
- FIG. 1J is the example apparatus of FIG. 1A in a partially sectional perspective view in a fourth turning position.
- FIG. 1K is the example apparatus of FIG. 1A in a partially sectional perspective view in a fifth turning position.
- FIG. 1L is the example apparatus in a partially sectional perspective view in a first decoupling position.
- FIG. 1M is the example apparatus of FIG. 1A in a partially sectional perspective view in a second decoupling position.
- FIG. 1N is the example apparatus of FIG. 1A in a partially sectional perspective view in a third decoupling position.
- FIG. 1O is the example apparatus of FIG. 1A in a partially sectional perspective view in a fourth decoupling position.
- FIG. 2A is an enlarged partial view of a varnish cart of the apparatus of FIGS. 1A through 1O in a partially sectional perspective view with the splash guard being in a dipping position, wherein the apparatus is in the basic position according to FIG. 1A .
- FIG. 2B is an enlarged partial view of a varnish cart of the apparatus of FIGS. 1A through 1O in a perspective view with a retracted lifting cylinder.
- FIG. 2C is an enlarged partial view of a varnish cart of the apparatus of FIGS. 1A through 1O in a perspective view with an extended lifting cylinder.
- FIG. 3 an enlarged partial view of a splash guard of the apparatus of FIG. 1 in a partially sectional perspective view with the splash guard being in the dipping position, wherein the apparatus is in the dipping position according to FIG. 1C );
- FIG. 4A is an enlarged partial view of an example coupling device of the apparatus of FIG. 1A in the opened condition in a partially sectional perspective view;
- FIG. 4B is an enlarged partial view of an example coupling device of the apparatus of FIG. 1A in the closed condition in a partially sectional perspective view.
- the drawings show an apparatus for treating components with a liquid according to an embodiment.
- the apparatus is, in this case, designed as a dip-turning-painting-centrifuge and serves for coating mass components, like, for example, screws or other small components, with a zinc-containing liquid.
- the apparatus has a stationary frame 1 enclosing a working chamber 2 .
- a varnish cart 3 is positioned, which can be moved into or out of the working chamber 2 via a lateral opening 4 with a gate (not shown).
- a lifting device 5 is mounted on the frame 1 .
- the lifting device 5 comprises two vertically extending guide tracks 6 , on which, analogously to a common forklift, a fork 7 with two prongs 8 is guided in a height adjustable manner by an electric motor 9 .
- a material basket 10 is arranged, into which the to be treated components can be placed.
- the material basket 10 is detachably attached in a rotatingly drivable manner on a carrier device around an axis of rotation X, which is formed as a pivot frame 11 .
- a further electric motor 13 is provided and designed to rotate the material basket 10 around the axis of rotation X.
- the pivot frame 11 is pivotably held on a pivot bar 12 of the stationary frame 1 and can hydraulically be pivoted around a pivot axis Y in an angle range of 0 to 90 degrees.
- the work chamber 2 Via a transport unit, which is not shown here, the work chamber 2 can be equipped with the material basket 10 .
- the varnish cart 3 comprises a dip tank 14 , which is mounted on a transportation cart 15 .
- the dip tank 14 is constructed in a stepped manner and has a lower portion 16 and an upper portion 17 .
- the lower portion 16 extends along approximately two-thirds of the height of the dip tank 14 and is filled with the liquid during operation of the apparatus.
- the upper portion 17 of the dip tank 14 has a slightly larger diameter than the lower portion 16 to retain the liquid displaced during the dipping of the material basket 10 in the dip tank 14 .
- a lifting device 18 is arranged opposite to the material basket 10 on the varnish cart 3 on the outside to axially move a splash guard 19 (not shown in FIGS.
- two lifting cylinders 20 which can move the splash guard 19 along a lifting axis H and which are movable synchronously, are provided, arranged diametrically opposite to one another on outer sides of the varnish cart 3 and outside of the dip tank 14 .
- the movably formed splash guard 19 can be seen.
- the splash guard 19 in this example is made from stainless steel, but could also be manufactured from a plastic.
- the splash guard 19 has a tubular or sleeve-like basic shape and is also formed in a stepped manner corresponding to the dip tank 14 .
- a lower portion 21 which extends along approximately two-thirds of the height of the splash guard 19 , has a slightly smaller diameter than an upper portion 22 .
- two annular collars 23 , 24 are formed at the upper end, facing the pivot frame 11 . The lower of the two collars 23 interacts in the dipping position of the splash guard 19 shown in FIG. 2A with the lifting device 18 .
- the two lifting cylinders 20 carry at their free ends respectively a support plate 25 , which corresponds to the outer circumference of the splash guard 19 and the inner radius of which corresponds at least essentially to the outer radius of the splash guard 19 .
- the lower collar 23 of the splash guard 19 rests in portions on the two support plates 25 .
- the splash guard 19 rests in the dipping position further more radially on the plates 25 , whereby the splash guard 19 is guided in the dip tank 14 .
- the splash guard 19 Via the upper collar 24 , the splash guard 19 can be detachably mounted on a controllable coupling device 26 , arranged on the pivot frame 11 . The exact function of the coupling device 26 is described later in detail in connection with FIGS. 4A and 4B .
- FIGS. 1A to 1O the individual method steps are shown in chronological order and are described in detail in the following:
- the varnish cart 3 In the basic position, shown in FIG. 1A , the varnish cart 3 , filled with liquid, rests on a base 27 of the working chamber 2 and is pushed onto the prongs 8 of the fork 7 .
- the splash guard 19 is in the dipping position, i.e., the splash guard 19 is arranged in the dip tank 14 and is dipped with its lower portion 16 in the liquid.
- the material basket 10 is filled with the to be treated components and is in its zero position, in which the pivot frame 11 is not pivoted relative to the stationary frame 1 .
- the coupling device 26 of the pivot frame 11 is released for accommodation of the splash guard 19 , so that in the further process the splash guard 19 can essentially be moved up to the pivot frame 11 .
- FIG. 1B shows an intermediate position in which the varnish cart 3 , resting on the fork 7 , is moved axially upwards in direction to the material basket 10 .
- the splash guard 19 which is still in the dipped position, is moved towards the material basket 10 , without that the relative position of the splash guard 19 is changed relative to the dip tank 14 .
- FIG. 1C the apparatus is shown in its dipping position.
- the varnish cart 3 is moved completely upwards and the splash guard 19 abuts the pivot frame 11 with its end face facing the pivot frame 11 .
- the material basket 10 is dipped into the liquid in the dip tank 8 , whereby the splash guard 19 , which is still in the dipping position, is now positioned between an inner wall of the dip tank 14 and the material basket 10 .
- FIG. 3 it can be seen that the material basket 10 engages in the dipping position in the lower portion 21 of the splash guard 19 and in a transitional portion 28 , whereby the transitional position 28 is arranged between the lower and the upper portion 21 , 22 of the splash guard 19 .
- the inner face of the splash guard 19 will collect mainly in the lower portion 21 and in the transitional portion 28 excess liquid, which has been centrifuged of the components, so that these portions 21 , 28 of the splash guard 19 are designated in the following as capturing face 29 .
- FIG. 1D shows a coupling position, in which the controllable coupling device 26 is closed and the splash guard 19 is fixed to the pivot frame 11 .
- the varnish cart 3 is lowered into the centrifuging position shown in FIG. 1E .
- the material basket 10 and the splash guard 19 are moved out of the liquid.
- the varnish cart 3 is only lowered so far that the splash guard 19 , held stationary on the pivot frame 11 , and the dip tank 14 still partially overlap one another.
- the material basket 10 is rotated within the splash guard 19 by the electric motor 14 with approximately 300 revolutions per minute around the axis of rotation X. Because of the centrifugal force, acting on the components due to the rotation, excess liquid is centrifuged off the components.
- the centrifuged liquid is captured by the stationary held splash guard 19 in the area of the capturing face 29 . Because of the partial overlapping of the splash guard 19 and the dip tank 14 , the centrifuged liquid as well as the liquid adhering also externally because of the dipping of the splash guard 19 thereon, can drip directly back into the dip tank 14 . Furthermore, it is prevented, that the working chamber 2 is soiled by the centrifuged liquid. After a defined time, the rotation of the material basket 10 is again stopped. Due to the positioning of the material basket 10 within the splash guard 19 it also the liquid, dripping downwards from the material basket 10 itself, gets directly into the dip tank 14 .
- the varnish cart 3 is again lowered into its basic position back on the base 27 of the apparatus. It can be seen that the dip tank 14 is arranged as well in this position below the splash guard 19 such that the liquid dripping from the splash guard 19 can directly drip into the dip tank 14 .
- the pivot frame 11 is pivoted around the pivot axis Y starting from the zero position.
- FIGS. 1G to 1I three turning positions are shown by way of example.
- the pivot frame 11 can be pivoted continuously between 0 degree and 90 degrees, wherein during turning of the components only one or selectively also several turning positions can be aimed at.
- the varnish cart 3 is in all turning positions always arranged below the splash guard 19 such that the liquid, captured by the splash guard 19 , can drip directly into the dip tank 14 .
- the pivot frame 11 is arranged pivoted by approximately 30 degrees from the zero position.
- FIGS. 1H or 1O respectively, the pivot frame 11 is pivoted by 60 degrees or 90 degrees, respectively, from the zero position.
- the material basket 10 In the turning positions, the material basket 10 is rotated by the electric motor 13 at approximately 20 to 30 revolutions per minute. In this case, the components are constantly turned within the material basket 10 , wherein, for example, inner ribs in the material basket 10 can further increase the turning process. In this manner, possible excess liquid, which has been held in spite of the centrifuging still in holes, slots or other indentations of the components, can drip off.
- FIG. 1J a fourth turning position is shown, in which the pivot frame 11 transfers the material basket 10 and the splash guard 19 back into the zero position.
- the pivot frame 11 is pivoted by 45 degrees starting from the zero position.
- the material basket 10 can further slowly be rotated or can be stopped.
- the material basket 10 and the splash guard 19 are transferred back into the zero position.
- the material basket 10 can further be slowly rotated or can already be at rest.
- FIG. 1L a first of four decoupling positions is shown, in which the splash guard 19 is moved back into the dip tank 14 .
- the varnish cart 3 is initially positioned at a height corresponding to the centrifuging position.
- the key factor is, in this case, that the material basket 10 is not dipped back into the liquid, to prevent a renewed dipping of the components into the liquid.
- the two pneumatically actuated lifting cylinders 20 are extended synchronously in direction of the splash guard 19 .
- the two cylinders 20 are already completely extended.
- the curved support plates 25 of the lifting cylinders 20 are moved from below up to the lower collar 23 of the splash guard 19 .
- a corresponding signal is transmitted to the control unit.
- the control releases then the coupling device 26 , whereupon the splash guard 19 is decoupled from the pivot frame 11 .
- the splash guard 19 is already lowered via the lifting device 18 of the varnish cart 3 in a direction of the dip tank 14 .
- the splash guard 19 is again guided back into its dipping position.
- the splash guard 19 is again lowered into the dip tank 14 , wherein at least the capturing face 29 and the outer face of the splash guard 19 , which is congruent with the capturing face 29 , are completely dipped in the liquid.
- the material basket 10 and if necessary also the varnish cart 3 can be moved out of the stationary frame 1 , to fill these again or to exchange it with a further material basket 10 already newly filled or a further varnish cart 3 .
- FIG. 4A the coupling device 26 is shown in its open condition, in which the splash guard 19 can be moved up to the pivot frame 11 .
- FIG. 4B the coupling device 26 is closed, so that the splash guard 19 is retained on the pivot frame 11 and the lifting device 18 can again be lowered.
- the coupling device 26 has two hydraulically actuatable toggle lever gripping elements 31 of a toggle lever mechanism, which are arranged laterally on the pivot frame 11 .
- Each toggle lever gripping element 31 comprises two gripping elements 32 , which are rotatably held on the pivot frame 11 via respectively one first pivot point 33 .
- a plate 34 projects laterally from the pivot frame 11 , which carries the further elements of the toggle lever mechanism.
- the gripping elements 32 are rotatably held on the respective plate 34 .
- Each of the gripping elements 32 is rotatably connected via a first leg 36 and a second leg 37 to the second pivot point 35 .
- Each of the first legs 36 is rotationally connected at an end portion 38 to a respective gripping element 32 and is rotatably connected at a further end portion to the respective second leg 37 via a third pivot point 39 .
- FIG. 4A it can be seen that the rotational connection 38 between the first leg 36 and the gripping elements 32 is arranged together with the second pivot point 35 in the coupled position on one alignment line F.
- the third pivot point 39 is arranged on or slightly below this alignment line F, the dead center of the toggle lever mechanism is reached or is exceeded. In this manner, the toggle lever gripping elements 31 are self-inhibitingly locked and can only be opened by acting with a force, acting axially upwards, on the third pivot point 39 .
- one pneumatic cylinder 40 is provided, which piston 41 is rotatably connected to the assigned first and second legs 36 , 37 on the third pivot point 39 .
- the cylinders 40 are respectively mounted on the underside of the plates 41 and engage through an opening 42 through the plate 34 .
- the splash guard 19 is, during the lifting of the dip tank 14 , kept positioned in the dipping position by several centering elements 43 concentrically to the axis of rotation X on the pivot frame 11 .
- the centering elements 43 are respectively arranged on the underside of the plates 34 , on which also components of the coupling device 26 are held.
- the inner faces 44 facing each other, extend straight, i.e., parallel to the axis of rotation X. The distance of the two inner faces 44 to each other corresponds at least approximately to the outer diameter of the upper collar 24 .
- the centering elements 43 are formed inclined, so that their inner faces 44 extend by approximately 30° radially outward. Because of the inclined shape of the free end portions of the centering elements 43 , the splash guard 10 is, during lifting, permanently guided and centered in its predetermined coupling position.
- the straight end portions of the centering elements 43 in addition to their guiding function during the coupling of the splash guard 19 perform a support function in a radial direction. More specifically, the splash guard 19 abuts in the coupling position with its upper collar 24 flush with the centering elements 43 at their straight portions, so that when pivoting the pivot frame 11 , the splash guard 19 is supported on the centering elements 43 .
- the centering elements 43 can also be designated as support elements.
Abstract
A method for treating components with a liquid comprises providing a splash guard in a dip tank filled with the liquid, and dipping components into the liquid. Then the components are moved out of the liquid, the splash guard is moved relative to the dip tank into a centrifuging position surrounding the components, the components are rotated within the splash guard; and the splash guard is moved relative to the dip tank into a dipping position.
Description
- This application is a divisional application of, and claims priority to, U.S. patent application Ser. No. 14/630,199 filed on Feb. 24, 2015, which claims priority to European Application No. EP 14157281.8 filed on Feb. 28, 2014, each of which applications are hereby incorporated by reference in their entireties.
- The present disclosure relates to a method for treating components with a liquid and to an apparatus for treating components in a liquid, comprising a dip tank, which is fillable with the liquid, an accommodation device, rotatingly drivable around an axis of rotation, for accommodating the components, wherein the accommodation device and the dip tank are movable relative to each other, to dip the components into the dip tank and to lift them out of this, and a splash guard.
- It is, for example, known from EP 1 319 444 A2 to treat mass components, contained in transportation baskets, with a cleaning, coating or treatment liquid. For this, the apparatus has a dip tank, which is fillable with liquid. Above the dip tank a transportation cart is arranged, with which the transportation baskets are movable. On the transportation cart, a basket carrier is provided in a height adjustable and rotatingly drivable manner. For treating mass components, the transportation basket is dipped into the liquid in the dip tank. Then the transportation basket is moved out of the liquid and is lifted within the dip tank into a centrifuging position. In this case, the high side walls of the dip tank serve as splash guard, which captures the liquid centrifuged off during the rotation of the mass components.
- Disadvantageously, the known apparatus and especially the splash guard have to be regularly cleaned off the centrifuged liquids. Especially with varnishes and other liquids, which can cure quickly, the cleaning has to be carried out regularly and in short intervals, to prevent an encrusting of the apparatus. Thus, the known apparatus has to be serviced often and incurs high costs, as it has to be cleaned by hand during forced downtimes. Furthermore, it is disadvantageous that the liquids, captured by the splash guard, cure on the splash guard and can fall back into the liquid in solid state, so that the liquid in the dip tank can become unusable for the further treatment of mass components.
- Disclosed herein is a method that can be easily carried out, and a maintenance-friendly apparatus, for treating components with a liquid.
- An exemplary method for treating components with a liquid comprises the following steps:
-
- providing a splash guard in a dip tank filled with the liquid,
- dipping of components into the liquid,
- moving the components out of the liquid,
- moving the splash guard relative to the dip tank into a centrifuging position surrounding the components,
- rotating the components within the splash guard, and
- moving the splash guard relative to the dip tank into a dipping position.
- In other words, the splash guard is an independent component, which is movable relative to the dip tank or the components. Thus, the splash guard can be positioned around the components, when these are rotated outside of the liquid, and can regularly be dipped back into the liquid. In this manner, it is prevented, that the liquid, captured by the splash guard, is exposed for a long time to the ambient atmosphere such that it can cure on the splash guard.
- Thus, it is provided to hold the splash guard in a movable manner relative to the dip tank filled with the liquid. For example, the splash guard itself, can be moved by suitable lifting devices relative to the dip tank or the components. Alternatively or in addition thereto, the dip tank can also be height adjustable. For example the dip tank can be held on a fork-lift similar transportation cart and can be moved up and down in direction of the splash guard. Thus, the splash guard can be moved during the process relative to the dip tank into a centrifuging position surrounding the components. In this case, when the splash guard is in the centrifuging position it surrounds laterally the components rotating outside the liquid to capture excessive liquid that is centrifuging off due to the rotation. However, it is not necessary to lift also the splash guard completely out of the liquid. Furthermore, the splash guard can be again moved into the dipping position after the rotation of the components. The splash guard is in the dipping position, when at least the portion of the splash guard, which captures the excessive liquid centrifuging off, during the rotation of the components, is dipped into the liquid. For example, the splash guard may be only dipped so far into the liquid that an upper portion, on which the splash guard can be lifted out of the liquid, remains dry.
- The to be treated components are for example mass components like, for example, screws or other small components, which are put into a material basket for carrying out the treatment. However, a to be treated component can also be an individual component, which can also be treated according to the method and apparatus disclosed herein. The liquid can be a cleaning, coating, treatment or any varnishing liquid. For example, the liquid can be a zinc-containing coating liquid for the corrosion protection of the to be treated components.
- Advantageously, the splash guard is arranged in the centrifuging position such that during rotating the components, centrifuged liquid can drip from the splash guard back into the dip tank. In this manner it is prevented that the excessive liquid contaminates areas outside of the dip tank. Further, the flowing back liquid can be used again for treating components. The splash guard can be always arranged such that, when it is not in the dipping position, the liquid adhering to the splash guard can drip back into the dip tank.
- Advantageously, the splash guard is held stationary while rotation of the components. Thus, it is prevented, that the liquid, adhering to the splash guard, is centrifuged off and contaminates the apparatus.
- According to an aspect of the disclosure it is provided, as a further method step, before rotating the components, that the splash guard can be coupled to a carrier device. Advantageously, as further method steps, after the coupling of the splash guard, it can be provided that a signal, representing the coupling position and that the splash guard is held on the carrier device, is registered and that the signal is transmitted to a control device. Thus, the method can be automated. Advantageously, the moving of the splash guard relative to the dip tank is carried out such that the carrier device and the dip tank are moved relative to each other.
- It can be provided that the splash guard and the dip tank partially overlap each other in the centrifuging position. This means that a lower portion of the splash guard covers axially an upper portion of the dip tank. In this manner, it is securely prevented that excessive liquid can centrifuge off between the splash guard and the dip tank and that the apparatus can be contaminated.
- According to a further aspect of the present disclosure it is provided as further method steps that the splash guard is moved relative to the dip tank into a turning position surrounding the components, in which position the splash guard is at least partially moved out of the dip tank, the components and the splash guard are pivoted relative to the dip tank, and that the components are turned. In contrast to the method step of turning the components in the centrifuging position, in which the components are rotated quickly, i.e., regularly with 200 up to 300 revolutions per minute in a zero position, i.e., along a vertical axis of rotation, the components are here turned over in a slow rotation, i.e., with approximately 20 to 30 revolutions per minute, continuously in a pivoted manner across an angle range between 1 and 90 degrees, especially 30, 45, 60 and 90 degrees, relative to the zero position. Due to the slow rotation in combination with the pivoting of the components, the excessive liquid, which could have adhered in spite of the quick rotation of the components in possible present cavities of the components, can be discharged. In the centrifuging position the splash guard can thus be moved partially or completely out of the dip tank.
- A further subject of the present disclosure is an apparatus for treating components in a liquid, in which according to the invention a lifting device is provided for moving the splash guard relative to the dip tank and/or relative to the accommodation device or relative to the components. The lifting device is designed such that the splash guard is axially movable along a lifting axis. In this manner, the splash guard can be lifted and/or lowered. The lifting device can especially comprise pneumatically or hydraulically driven cylinders and/or a spindle drive and/or a Bowden cable.
- Advantageously, the lifting device is arranged at the outside on the dip tank. Thus, it is prevented that contaminations get into the liquid.
- Advantageously, a carrier device is provided, on which the splash guard is detachably mountable, wherein the carrier device is pivotable relative to a stationary frame. By coupling the splash guard to the carrier device a possibility, which is easily achievable, is provided, to hold the components during the rotation and the turning within the splash guard.
- According to an aspect of the present disclosure a controllable coupling device is provided and designed such that the splash guard can be coupled to or can be decoupled from the carrier device. In this manner, the coupling process can be automated.
- It can be provided that the coupling device comprises a toggle lever mechanism to fasten the splash guard in a self-locking manner to the carrier device. Thus, a secure retaining of the splash guard on the carrier device is ensured.
- Furthermore, it can be provided that the carrier device has guide elements interacting with the splash guard and which are formed such that the splash guard is attachable on the carrier device concentrically to the axis of rotation. Thus, the splash guard is transferred in a reproducible manner into a holding position provided on the carrier device.
- Advantageously, it is provided that the splash guard is formed to be tubular and has a larger axial longitudinal extension than at least one of following components, namely the dip tank or the accommodation device. Thus, a splash guard that can easily be manufactured is provided, which splashguard laterally encloses completely the components.
- Further, the accommodation device can be detachably mountable on the carrier device, the splash guard being attachable to the carrier device in a detachable manner. A controllable coupling device can be provided and designed such that the accommodation device can be coupled to or decoupled from the same.
- Advantageously, it is provided that the splash guard is arranged in a dipping position between a circumferentially extending wall of the dip tank and the accommodation device for the components. Thus, the accommodation device is already in the dipping position within the splash guard, so that, before turning the components within the splash guard, both can be moved together relative to the dip tank, without having to change the relative position of the splash guard and of the accommodation device.
- An example of the disclosed subject matter is shown in the drawings and described in the following. Here it shows
-
FIG. 1A is an example apparatus in a partially sectional perspective view in a basic position. -
FIG. 1B is the example apparatus ofFIG. 1A in a partially sectional perspective view in an intermediate position. -
FIG. 1C is the example apparatus ofFIG. 1A in a partially sectional perspective view in a dipping position. -
FIG. 1D is the example apparatus ofFIG. 1A in a partially sectional perspective view in a coupling position. -
FIG. 1E is the example apparatus ofFIG. 1A in a partially sectional perspective view in a centrifuging position. -
FIG. 1F is the example apparatus ofFIG. 1A in a partially sectional perspective view in a further intermediate position. -
FIG. 1G is the example apparatus ofFIG. 1A in a partially sectional perspective view in a first turning position. -
FIG. 1H is the example apparatus ofFIG. 1A in a partially sectional perspective view in a second turning position. -
FIG. 1I is the example apparatus ofFIG. 1A in a partially sectional perspective view in a third turning position. -
FIG. 1J is the example apparatus ofFIG. 1A in a partially sectional perspective view in a fourth turning position. -
FIG. 1K is the example apparatus ofFIG. 1A in a partially sectional perspective view in a fifth turning position. -
FIG. 1L is the example apparatus in a partially sectional perspective view in a first decoupling position. -
FIG. 1M is the example apparatus ofFIG. 1A in a partially sectional perspective view in a second decoupling position. -
FIG. 1N is the example apparatus ofFIG. 1A in a partially sectional perspective view in a third decoupling position. -
FIG. 1O is the example apparatus ofFIG. 1A in a partially sectional perspective view in a fourth decoupling position. -
FIG. 2A is an enlarged partial view of a varnish cart of the apparatus ofFIGS. 1A through 1O in a partially sectional perspective view with the splash guard being in a dipping position, wherein the apparatus is in the basic position according toFIG. 1A . -
FIG. 2B is an enlarged partial view of a varnish cart of the apparatus ofFIGS. 1A through 1O in a perspective view with a retracted lifting cylinder. -
FIG. 2C is an enlarged partial view of a varnish cart of the apparatus ofFIGS. 1A through 1O in a perspective view with an extended lifting cylinder. -
FIG. 3 an enlarged partial view of a splash guard of the apparatus ofFIG. 1 in a partially sectional perspective view with the splash guard being in the dipping position, wherein the apparatus is in the dipping position according toFIG. 1C ); -
FIG. 4A is an enlarged partial view of an example coupling device of the apparatus ofFIG. 1A in the opened condition in a partially sectional perspective view; and -
FIG. 4B is an enlarged partial view of an example coupling device of the apparatus ofFIG. 1A in the closed condition in a partially sectional perspective view. - The drawings show an apparatus for treating components with a liquid according to an embodiment. The apparatus is, in this case, designed as a dip-turning-painting-centrifuge and serves for coating mass components, like, for example, screws or other small components, with a zinc-containing liquid.
- In the basic position, shown in
FIG. 1A , it can be seen that the apparatus has a stationary frame 1 enclosing a workingchamber 2. In the workingchamber 2, avarnish cart 3 is positioned, which can be moved into or out of the workingchamber 2 via a lateral opening 4 with a gate (not shown). To be able to lift or lower thevarnish cart 3, alifting device 5 is mounted on the frame 1. Thelifting device 5 comprises two vertically extending guide tracks 6, on which, analogously to a common forklift, afork 7 with two prongs 8 is guided in a height adjustable manner by anelectric motor 9. - Above the
varnish cart 3, amaterial basket 10 is arranged, into which the to be treated components can be placed. Thematerial basket 10 is detachably attached in a rotatingly drivable manner on a carrier device around an axis of rotation X, which is formed as apivot frame 11. A furtherelectric motor 13 is provided and designed to rotate thematerial basket 10 around the axis of rotation X. Thepivot frame 11 is pivotably held on apivot bar 12 of the stationary frame 1 and can hydraulically be pivoted around a pivot axis Y in an angle range of 0 to 90 degrees. Via a transport unit, which is not shown here, thework chamber 2 can be equipped with thematerial basket 10. - The
varnish cart 3 comprises adip tank 14, which is mounted on atransportation cart 15. InFIG. 2A it can be seen that thedip tank 14 is constructed in a stepped manner and has alower portion 16 and anupper portion 17. Thelower portion 16 extends along approximately two-thirds of the height of thedip tank 14 and is filled with the liquid during operation of the apparatus. Theupper portion 17 of thedip tank 14 has a slightly larger diameter than thelower portion 16 to retain the liquid displaced during the dipping of thematerial basket 10 in thedip tank 14. InFIGS. 2A to 2C ) it can be seen that alifting device 18 is arranged opposite to thematerial basket 10 on thevarnish cart 3 on the outside to axially move a splash guard 19 (not shown inFIGS. 2B and 2C . More specifically, two liftingcylinders 20, which can move thesplash guard 19 along a lifting axis H and which are movable synchronously, are provided, arranged diametrically opposite to one another on outer sides of thevarnish cart 3 and outside of thedip tank 14. - In
FIG. 2A , the movably formedsplash guard 19 can be seen. Thesplash guard 19 in this example is made from stainless steel, but could also be manufactured from a plastic. Thesplash guard 19 has a tubular or sleeve-like basic shape and is also formed in a stepped manner corresponding to thedip tank 14. Alower portion 21, which extends along approximately two-thirds of the height of thesplash guard 19, has a slightly smaller diameter than anupper portion 22. At the upper end, facing thepivot frame 11, twoannular collars collars 23 interacts in the dipping position of thesplash guard 19 shown inFIG. 2A with the liftingdevice 18. More specifically, the two liftingcylinders 20 carry at their free ends respectively asupport plate 25, which corresponds to the outer circumference of thesplash guard 19 and the inner radius of which corresponds at least essentially to the outer radius of thesplash guard 19. In the dipping position, thelower collar 23 of thesplash guard 19 rests in portions on the twosupport plates 25. Because of the inner concave design of thesupport plates 25, thesplash guard 19 rests in the dipping position further more radially on theplates 25, whereby thesplash guard 19 is guided in thedip tank 14. Via theupper collar 24, thesplash guard 19 can be detachably mounted on acontrollable coupling device 26, arranged on thepivot frame 11. The exact function of thecoupling device 26 is described later in detail in connection withFIGS. 4A and 4B . - In
FIGS. 1A to 1O the individual method steps are shown in chronological order and are described in detail in the following: - In the basic position, shown in
FIG. 1A , thevarnish cart 3, filled with liquid, rests on abase 27 of the workingchamber 2 and is pushed onto the prongs 8 of thefork 7. Thesplash guard 19 is in the dipping position, i.e., thesplash guard 19 is arranged in thedip tank 14 and is dipped with itslower portion 16 in the liquid. Thematerial basket 10 is filled with the to be treated components and is in its zero position, in which thepivot frame 11 is not pivoted relative to the stationary frame 1. Thecoupling device 26 of thepivot frame 11 is released for accommodation of thesplash guard 19, so that in the further process thesplash guard 19 can essentially be moved up to thepivot frame 11. -
FIG. 1B shows an intermediate position in which thevarnish cart 3, resting on thefork 7, is moved axially upwards in direction to thematerial basket 10. By this movement, thesplash guard 19, which is still in the dipped position, is moved towards thematerial basket 10, without that the relative position of thesplash guard 19 is changed relative to thedip tank 14. - In
FIG. 1C , the apparatus is shown in its dipping position. Thevarnish cart 3 is moved completely upwards and thesplash guard 19 abuts thepivot frame 11 with its end face facing thepivot frame 11. Thematerial basket 10 is dipped into the liquid in the dip tank 8, whereby thesplash guard 19, which is still in the dipping position, is now positioned between an inner wall of thedip tank 14 and thematerial basket 10. InFIG. 3 it can be seen that thematerial basket 10 engages in the dipping position in thelower portion 21 of thesplash guard 19 and in atransitional portion 28, whereby thetransitional position 28 is arranged between the lower and theupper portion splash guard 19. During the following rotation of the components around the axis of rotation X, the inner face of thesplash guard 19 will collect mainly in thelower portion 21 and in thetransitional portion 28 excess liquid, which has been centrifuged of the components, so that theseportions splash guard 19 are designated in the following as capturingface 29. -
FIG. 1D shows a coupling position, in which thecontrollable coupling device 26 is closed and thesplash guard 19 is fixed to thepivot frame 11. When thesplash guard 19 is securely held in the coupling position on thecoupling device 26, a signal, representing the coupling position, is produced by a signaling device, not shown, and which signal is transmitted to a control unit, also not shown. - As soon as the control unit has registered the secure coupling of the
splash guard 19 on thepivot frame 11, thevarnish cart 3 is lowered into the centrifuging position shown inFIG. 1E . In this manner, thematerial basket 10 and thesplash guard 19 are moved out of the liquid. However, thevarnish cart 3 is only lowered so far that thesplash guard 19, held stationary on thepivot frame 11, and thedip tank 14 still partially overlap one another. In the centrifuging position, thematerial basket 10 is rotated within thesplash guard 19 by theelectric motor 14 with approximately 300 revolutions per minute around the axis of rotation X. Because of the centrifugal force, acting on the components due to the rotation, excess liquid is centrifuged off the components. The centrifuged liquid is captured by the stationary heldsplash guard 19 in the area of the capturingface 29. Because of the partial overlapping of thesplash guard 19 and thedip tank 14, the centrifuged liquid as well as the liquid adhering also externally because of the dipping of thesplash guard 19 thereon, can drip directly back into thedip tank 14. Furthermore, it is prevented, that the workingchamber 2 is soiled by the centrifuged liquid. After a defined time, the rotation of thematerial basket 10 is again stopped. Due to the positioning of thematerial basket 10 within thesplash guard 19 it also the liquid, dripping downwards from thematerial basket 10 itself, gets directly into thedip tank 14. - In the further intermediate position, shown in
FIG. 1F , thevarnish cart 3 is again lowered into its basic position back on thebase 27 of the apparatus. It can be seen that thedip tank 14 is arranged as well in this position below thesplash guard 19 such that the liquid dripping from thesplash guard 19 can directly drip into thedip tank 14. - Subsequently, the
pivot frame 11 is pivoted around the pivot axis Y starting from the zero position. InFIGS. 1G to 1I , three turning positions are shown by way of example. Thepivot frame 11 can be pivoted continuously between 0 degree and 90 degrees, wherein during turning of the components only one or selectively also several turning positions can be aimed at. Thevarnish cart 3 is in all turning positions always arranged below thesplash guard 19 such that the liquid, captured by thesplash guard 19, can drip directly into thedip tank 14. InFIG. 1G , thepivot frame 11 is arranged pivoted by approximately 30 degrees from the zero position. InFIGS. 1H or 1O , respectively, thepivot frame 11 is pivoted by 60 degrees or 90 degrees, respectively, from the zero position. In the turning positions, thematerial basket 10 is rotated by theelectric motor 13 at approximately 20 to 30 revolutions per minute. In this case, the components are constantly turned within thematerial basket 10, wherein, for example, inner ribs in thematerial basket 10 can further increase the turning process. In this manner, possible excess liquid, which has been held in spite of the centrifuging still in holes, slots or other indentations of the components, can drip off. By the widening of thesplash guard 19 between the lower and theupper portion outer drip edge 30 is formed in thetransitional portion 28, due to which also in the third turning position, pivoted by 90 degrees, the liquid, adhering also on the outside of thesplash guard 19 because of the dipping of thesplash guard 19 into the liquid, can drip back into thedip tank 14. - In
FIG. 1J a fourth turning position is shown, in which thepivot frame 11 transfers thematerial basket 10 and thesplash guard 19 back into the zero position. In this fourth turning position, thepivot frame 11 is pivoted by 45 degrees starting from the zero position. Thematerial basket 10 can further slowly be rotated or can be stopped. - In the fifth turning position according to
FIG. 1K , thematerial basket 10 and thesplash guard 19 are transferred back into the zero position. In this position, thematerial basket 10 can further be slowly rotated or can already be at rest. - In
FIG. 1L a first of four decoupling positions is shown, in which thesplash guard 19 is moved back into thedip tank 14. Thevarnish cart 3 is initially positioned at a height corresponding to the centrifuging position. The key factor is, in this case, that thematerial basket 10 is not dipped back into the liquid, to prevent a renewed dipping of the components into the liquid. - To be able to move the
splash guard 19 from this position of thevarnish cart 3, distanced from thepivot frame 11, back into thedip tank 14, the two pneumatically actuated liftingcylinders 20 are extended synchronously in direction of thesplash guard 19. In the second decoupling position, shown inFIG. 1 <, the twocylinders 20 are already completely extended. Thecurved support plates 25 of the liftingcylinders 20 are moved from below up to thelower collar 23 of thesplash guard 19. As soon as the two liftingcylinders 20 support thesplash guard 19, a corresponding signal is transmitted to the control unit. The control releases then thecoupling device 26, whereupon thesplash guard 19 is decoupled from thepivot frame 11. - In the third decoupling position, shown in
FIG. 1N , thesplash guard 19 is already lowered via thelifting device 18 of thevarnish cart 3 in a direction of thedip tank 14. - In the fourth decoupling position, shown in
FIG. 1O , thesplash guard 19 is again guided back into its dipping position. Thus, thesplash guard 19 is again lowered into thedip tank 14, wherein at least the capturingface 29 and the outer face of thesplash guard 19, which is congruent with the capturingface 29, are completely dipped in the liquid. - Finally, the
varnish cart 3 is again lowered into the basic position according toFIG. 1A onto thebase 27 of the workingchamber 2. - Then, the
material basket 10 and if necessary also thevarnish cart 3, can be moved out of the stationary frame 1, to fill these again or to exchange it with afurther material basket 10 already newly filled or afurther varnish cart 3. - In the following the function of the
coupling device 26 is described in detail by using the twoFIGS. 4A and 4B : - In
FIG. 4A thecoupling device 26 is shown in its open condition, in which thesplash guard 19 can be moved up to thepivot frame 11. InFIG. 4B thecoupling device 26 is closed, so that thesplash guard 19 is retained on thepivot frame 11 and thelifting device 18 can again be lowered. - More specifically, the
coupling device 26 has two hydraulically actuatable togglelever gripping elements 31 of a toggle lever mechanism, which are arranged laterally on thepivot frame 11. Each togglelever gripping element 31 comprises twogripping elements 32, which are rotatably held on thepivot frame 11 via respectively onefirst pivot point 33. Below thefirst pivot point 33, aplate 34 projects laterally from thepivot frame 11, which carries the further elements of the toggle lever mechanism. Via asecond pivot point 35, thegripping elements 32 are rotatably held on therespective plate 34. Each of thegripping elements 32 is rotatably connected via a first leg 36 and asecond leg 37 to thesecond pivot point 35. Each of the first legs 36 is rotationally connected at anend portion 38 to a respectivegripping element 32 and is rotatably connected at a further end portion to the respectivesecond leg 37 via athird pivot point 39. InFIG. 4A , it can be seen that therotational connection 38 between the first leg 36 and thegripping elements 32 is arranged together with thesecond pivot point 35 in the coupled position on one alignment line F. As soon as thethird pivot point 39 is arranged on or slightly below this alignment line F, the dead center of the toggle lever mechanism is reached or is exceeded. In this manner, the togglelever gripping elements 31 are self-inhibitingly locked and can only be opened by acting with a force, acting axially upwards, on thethird pivot point 39. For this, respectively, onepneumatic cylinder 40 is provided, whichpiston 41 is rotatably connected to the assigned first andsecond legs 36, 37 on thethird pivot point 39. Thecylinders 40 are respectively mounted on the underside of theplates 41 and engage through anopening 42 through theplate 34. When thepiston 41 is extended from the position shown inFIG. 4A , the respective toggle lever mechanism is pushed out of its dead centre and thegripping elements 32 are moved away outward from theupper collar 24 of thesplash guard 19. - So that the
splash guard 19 always exactly reaches the position on thepivot frame 11 that is provided for coupling to thecoupling device 26, thesplash guard 19 is, during the lifting of thedip tank 14, kept positioned in the dipping position by several centeringelements 43 concentrically to the axis of rotation X on thepivot frame 11. More specifically, the centeringelements 43 are respectively arranged on the underside of theplates 34, on which also components of thecoupling device 26 are held. On end portions of the centeringelements 43, facing theplates 34, the inner faces 44, facing each other, extend straight, i.e., parallel to the axis of rotation X. The distance of the twoinner faces 44 to each other corresponds at least approximately to the outer diameter of theupper collar 24. On their free end portions, facing downwards, the centeringelements 43 are formed inclined, so that theirinner faces 44 extend by approximately 30° radially outward. Because of the inclined shape of the free end portions of the centeringelements 43, thesplash guard 10 is, during lifting, permanently guided and centered in its predetermined coupling position. The straight end portions of the centeringelements 43 in addition to their guiding function during the coupling of thesplash guard 19 perform a support function in a radial direction. More specifically, thesplash guard 19 abuts in the coupling position with itsupper collar 24 flush with the centeringelements 43 at their straight portions, so that when pivoting thepivot frame 11, thesplash guard 19 is supported on the centeringelements 43. Insofar, the centeringelements 43 can also be designated as support elements.
Claims (9)
1-16. (canceled)
17. A method for treating components with a liquid, comprising:
providing a splash guard in a dip tank filled with the liquid;
dipping components into the liquid;
moving the components out of the liquid;
moving the splash guard relative to the dip tank into a centrifuging position surrounding the components;
rotating the components within the splash guard; and
moving the splash guard relative to the dip tank into a dipping position.
18. The method of claim 17 , wherein the splash guard is arranged in the centrifuging position such that, while rotating the components, centrifuged liquid can drip from the splash guard back into the dip tank.
19. The method of claim 17 , wherein the splash guard is held stationary when the components rotate.
20. The method of claim 17 , further comprising, before rotating the components, coupling the splash guard to a carrier device.
21. The method of claim 20 , further comprising, after the coupling of the splash guard, recording a signal representing the coupling position that the splash guard is held on the carrier device, and transmitting the signal to a control unit.
22. The method of claim 20 , wherein moving the splash guard relative to the dip tank is carried out such that the carrier device and the dip tank are moved relative to each other.
23. The method of claim 17 , wherein the splash guard and the dip tank partially overlap each other in the centrifuging position.
24. The method of claim 17 , further comprising:
moving the splash guard relative to the dip tank into a turning position surrounding the components in which the splash guard is moved at least partially out of the dip tank;
pivoting the components and the splash guard relative to the dip tank; and
turning the components.
Priority Applications (1)
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US15/632,416 US20170291189A1 (en) | 2014-02-28 | 2017-06-26 | Method and apparatus for treating components |
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EP14157281.8A EP2913284B1 (en) | 2014-02-28 | 2014-02-28 | Method and machine for treating parts |
US14/630,199 US9718079B2 (en) | 2014-02-28 | 2015-02-24 | Method and apparatus for treating components |
US15/632,416 US20170291189A1 (en) | 2014-02-28 | 2017-06-26 | Method and apparatus for treating components |
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US14/630,199 Division US9718079B2 (en) | 2014-02-28 | 2015-02-24 | Method and apparatus for treating components |
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US15/632,416 Abandoned US20170291189A1 (en) | 2014-02-28 | 2017-06-26 | Method and apparatus for treating components |
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CN110681529A (en) * | 2019-09-24 | 2020-01-14 | 常州君合科技股份有限公司 | Coating device for workpieces |
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CN107971284A (en) * | 2017-11-15 | 2018-05-01 | 惠州市世育五金制品有限责任公司 | A kind of metal parts cleaning device |
CN108906479A (en) * | 2018-08-06 | 2018-11-30 | 张家港市双成电工设备有限公司 | Vacuum impregnation tank and vacuum impregnation machine |
CN110860511B (en) * | 2019-11-29 | 2022-01-18 | 哈尔滨医科大学附属第一医院 | Surgical instrument flushing tool |
CN111068976B (en) * | 2019-12-20 | 2021-08-06 | 合肥龙智机电科技有限公司 | Automatic waxing device of metal processing polishing machine |
CN111822226A (en) * | 2020-08-11 | 2020-10-27 | 平湖市高嘉机械有限公司 | Part processing soaking and feeding device with solution recycling function |
DE102021207669B4 (en) | 2021-07-19 | 2023-05-04 | Forplan AG | Coating method, coating device and coating system with such a coating device and drive train |
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US1418412A (en) * | 1918-04-24 | 1922-06-06 | Agnes B Watrous Being | Method of metal coating and apparatus therefor |
US3010847A (en) * | 1958-07-01 | 1961-11-28 | Mc Graw Edison Co | Method and apparatus for batch impregnation of porous articles |
US3659550A (en) * | 1970-11-09 | 1972-05-02 | Spring Tools Corp | Fluid operated coating and drying machine |
US4722295A (en) * | 1985-04-29 | 1988-02-02 | Ultraseal International Limited | Article treating apparatus |
DE4204079A1 (en) * | 1992-02-12 | 1993-08-19 | Hans Henig | Multipurpose station for drying, unloading and loading of charges in dipping drums - with charge key in the same drum for all process stages |
DE19628316B4 (en) * | 1996-07-13 | 2006-07-13 | Crystal Growing Systems Gmbh | Device for lifting, pivoting and rotating the lid of a vacuum kettle of a crystal pulling machine |
US6176928B1 (en) * | 1997-11-20 | 2001-01-23 | The Longaberger Company | Stain machine |
DE10161086B4 (en) | 2001-12-12 | 2005-06-02 | Wmv Apparatebau Gmbh & Co Kg | Plant for treating mass parts |
DE10209908C1 (en) * | 2002-03-07 | 2003-08-14 | Reinhardt Gmbh Ernst | Surface coating system has drums composed of two mirror-symmetrical half-shells which can be moved along horizontal axis |
JP4148057B2 (en) * | 2003-07-22 | 2008-09-10 | 株式会社ジェイテクト | Grinder |
-
2014
- 2014-02-28 EP EP14157281.8A patent/EP2913284B1/en active Active
- 2014-02-28 PL PL14157281T patent/PL2913284T3/en unknown
- 2014-02-28 ES ES14157281.8T patent/ES2608304T3/en active Active
-
2015
- 2015-02-24 US US14/630,199 patent/US9718079B2/en active Active
-
2017
- 2017-06-26 US US15/632,416 patent/US20170291189A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110681529A (en) * | 2019-09-24 | 2020-01-14 | 常州君合科技股份有限公司 | Coating device for workpieces |
Also Published As
Publication number | Publication date |
---|---|
EP2913284B1 (en) | 2016-09-21 |
ES2608304T3 (en) | 2017-04-07 |
US9718079B2 (en) | 2017-08-01 |
US20150375254A1 (en) | 2015-12-31 |
PL2913284T3 (en) | 2017-06-30 |
EP2913284A1 (en) | 2015-09-02 |
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Owner name: WMV APPARATEBAU GMBH, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MULLER, MARTIN;MULLER, JURGEN;JONGEN, HUBERT;REEL/FRAME:042808/0919 Effective date: 20150220 |
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