US20170125529A1 - Electrode Structure of a Transistor, and Pixel Structure and Display Apparatus Comprising the Same - Google Patents

Electrode Structure of a Transistor, and Pixel Structure and Display Apparatus Comprising the Same Download PDF

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US20170125529A1
US20170125529A1 US15/360,931 US201615360931A US2017125529A1 US 20170125529 A1 US20170125529 A1 US 20170125529A1 US 201615360931 A US201615360931 A US 201615360931A US 2017125529 A1 US2017125529 A1 US 2017125529A1
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width
electrode
electrode structure
transistor
end portion
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US15/360,931
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Yu-Min Lin
Kuo-Lung Fang
Feng-Yuan Gan
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AU Optronics Corp
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AU Optronics Corp
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Publication of US20170125529A1 publication Critical patent/US20170125529A1/en
Priority to US15/861,933 priority patent/US10608088B2/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725—Source or drain electrodes for field effect devices
    • H01L29/41733—Source or drain electrodes for field effect devices for thin film transistors with insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel

Definitions

  • the present invention relates to an electrode structure of a thin-film transistor.
  • OLEDs Organic Light-Emitting Diodes Displays
  • PDP Plasma Display Panel
  • LCDs Liquid Crystal Displays
  • FEDs Field Emission Displays
  • TFT thin-film transistor
  • an electrode structure of a thin-film transistor 1 comprises a gate electrode 10 , a source electrode 11 , a drain electrode 12 , and a semiconductor layer 13 .
  • the semiconductor layer 13 is formed above the gate electrode 10 while the source electrode 11 and the drain electrode 12 are formed above a portion of the semiconductor layer 13 and are separated to each other, individually overlapping to a portion of the gate electrode 10 .
  • a width LS of the source electrode and a width LD of the drain electrode are about 4 um. Using this size of the electrode structure in a thin-film transistor so as to control the turn on /off of the pixels is achieved.
  • a current flowing from an arc portion 15 of the drain electrode 12 can flow into a circular portion 14 of the source electrode 11 only.
  • the circular portion 14 of the source electrode 11 has a relatively restricted overlapping area.
  • the circular portion 14 is easily influenced by semiconductor process varieties which further resist normal current flow. This seriously affects the current amount and results in unstable current.
  • the primary objective of the present invention is to provide an electrode structure of a transistor to increase and stabilize an amount of current transmitted between electrodes by changing the related size of the two electrodes among these electrodes.
  • the above-mentioned electrode structure of the present invention comprises a first electrode and a second electrode.
  • the first electrode has at least two first portions and at least one second portion.
  • the first portions are substantially parallel with each other and each of these portions has a first width.
  • the second portion has a second width, and is connected to the substantially parallel first portions to define a space with an opening.
  • the second electrode via the opening is disposed in part of the space.
  • the first width is substantially greater than the second width.
  • an electrode structure of the present invention comprising a first electrode and a second electrode, wherein the first electrode has at least two first portions and at least one second portion.
  • the first portions are substantially parallel with each other and each has a first width.
  • the second portion has a second width, and is connected to the substantially parallel first portions to define a space with an opening.
  • the second portion has a body and an end portion, wherein the end portion via the opening is disposed in part of the space.
  • the width of the end portion is substantially greater than the width of the body.
  • Another objective of the present invention is to provide a pixel structure comprising any of the above-mentioned of the electrode structures of the transistor.
  • Yet a further objective of the present invention is to provide a display apparatus comprising any of the above-mentioned of the electrode structure of the transistor.
  • the present invention can increase and stabilize the current transmitted between electrodes. Furthermore, the channel lengths between electrodes remain constant to follow the original design rules. Consequently, the objective to increase and stabilize the amount of current can be achieved without changing the original design rules.
  • FIG. 1 is a schematic diagram illustrating an electrode structure of a thin film transistor of the prior art
  • FIG. 2A is a schematic diagram illustrating a first embodiment of an electrode structure of the present invention.
  • FIG. 2B is a schematic diagram illustrating the first embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 3A is a schematic diagram illustrating a second embodiment of an electrode structure of the present invention.
  • FIG. 3B is a schematic diagram illustrating the second embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 4A is a schematic diagram illustrating a third embodiment of an electrode structure of the present invention.
  • FIG. 4B is a schematic diagram illustrating the third embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 5 is an experimental curve of a drain electrode current I D versus a drain electrode voltage V D among various transistors
  • FIG. 6 is another experimental curve of the drain electrode current I D versus the drain electrode voltage V D among various transistors.
  • FIG. 7 is a relation schematic illustrating an electrode structure and a display apparatus of the present invention.
  • a first embodiment of the present invention as shown in FIG. 2A and FIG. 2B is an electrode structure 2 of a transistor which comprises a gate electrode 20 , a source electrode 21 , a drain electrode 22 , and a predetermined material layer 23 .
  • the predetermined material layer 23 is formed above the gate electrode 20 while the source electrode 21 and the drain electrode 22 are formed above a portion of the predetermined material layer 23 , and are separated to each other, each individually overlapping a portion of the gate electrode 20 .
  • the drain electrode 22 has two first portions 220 , 221 , a second portion 222 , and a connecting section 223 .
  • the first portions 220 , 221 are substantially parallel with each other, and each first portion has a first width LD 1 .
  • the second portion 222 has a second width LD 2 , and is connected to the first portions 220 , 221 so that the drain electrode 22 can define a space with an opening.
  • the first width LD 1 is substantially greater than the second width LD 2 .
  • FIG. 2A One form of the electrode structure 2 of the transistor from the first embodiment of the present invention is shown in FIG. 2A .
  • the connecting section 223 of the drain electrode 22 is connected to the second portion 222 .
  • FIG. 2B Another form is shown in FIG. 2B , where the connecting section 223 of the drain electrode 22 is connected to at least one of the first portions 220 , 221 .
  • the width LS of the source electrode 21 is substantially equal to the first width LD 1 .
  • the first width LD 1 and the width LS of the source electrode 21 are substantially 4 micrometers (um), and the second width LD 2 substantially range from 2 um to 3.8 um. Consequently, the first width LD 1 and the second width LD 2 have a difference range from about 0.2 um to about 2 um, and the width LS of the source electrode 21 and the second width LD 2 have a difference range from about 0.2 um to about 2 um.
  • a second embodiment of the present invention as shown in FIG. 3A and FIG. 3B is an electrode structure 3 of a transistor which comprises a gate electrode 30 , a source electrode 31 , a drain electrode 32 , and a predetermined material layer 33 .
  • the predetermined material layer 33 is formed above the gate electrode 30 while the source electrode 31 and the drain electrode 32 are formed above a portion of the predetermined material layer 33 , and are separated to each other, each individually overlapping a portion of the gate electrode 30 .
  • the drain electrode 32 has two first portions 320 , 321 , a second portion 322 , and a connecting section 323 .
  • the first portions 320 , 321 are substantially parallel with each other, and each first portion has a first width LD 1 .
  • the second portion 322 has a second width LD 2 , and is connected to the first portions 320 , 321 , so that the drain electrode 32 can define a space with an opening.
  • the source electrode 31 has a body 310 and an end portion 311 , wherein the end portion 311 is substantially disposed in part of the space via the opening defined by the drain electrode 32 .
  • the first width LD 1 is substantially equal to the second width LD 2 .
  • the width LS 1 of the end portion 311 is substantially greater than the width LS 2 of the body 310
  • the width LS 1 of the end portion 311 is substantially greater than the first width LD 1 and the second width LD 2 .
  • FIG. 3A One form of the electrode 3 structure of the transistor mentioned in the second embodiment of the present invention is shown in FIG. 3A .
  • the connecting section 323 of the drain electrode 32 is connected to the second portion 322 .
  • FIG. 3B Another form is shown in FIG. 3B where the connecting section 323 of the drain electrode 32 is connected to at least one of the first portions 320 , 321 .
  • the first width LD 1 and the second width LD 2 are substantially 4 um
  • the width LS 1 of the end portion 311 of the source electrode 31 substantially ranges from 4.2 um to 8 um
  • the width LS 2 of the body 310 of the source electrode 31 substantially ranges from 4 um to 6 um. Consequently, the width LS 1 of the end portion 311 and the width LS 2 of the body 310 have a difference range from about 0.2 um to about 4 um
  • the width LS 1 of the end portion 311 and the first width LD 1 have a difference range from about 0.2 um to about 4 um.
  • the third embodiment of the present invention as shown in FIG. 4A and FIG. 4B is an electrode structure 4 of a transistor which comprises a gate electrode 40 , a source electrode 41 , a drain electrode 42 , and a predetermined material layer 43 .
  • the predetermined material layer 43 is formed above the gate electrode 40 while the source electrode 41 and the drain electrode 42 are formed above a portion of the predetermined material layer 43 , and are separated to each other, each individually overlapping a portion of the gate electrode 40 .
  • the drain electrode 42 has two first portions 420 , 421 , a second portion 422 , and a connecting section 423 .
  • the first portions 420 , 421 are substantially parallel with each other, and each first portion has a first width LD 1 .
  • the second portion 422 has a second width LD 2 , and is connected to the first portions 420 , 421 , so that the drain electrode 42 can define a space with an opening.
  • the source electrode 41 has a body 410 and an end portion 411 , wherein the end portion 411 is disposed in part of the space via the opening defined by the drain electrode 42 .
  • the first width LD 1 is substantially greater than the second width LD 2 .
  • the width LS 1 of the end portion 411 is substantially greater than the width LS 2 of the body 410
  • the width LS 1 of the end portion 411 is substantially greater than the first width LD 1 .
  • FIG. 4A One form of the electrode structure 4 of the transistor mentioned in the third embodiment of the present invention is shown in FIG. 4A .
  • the connecting section 423 of the drain electrode 42 is connected to the second portion 422 .
  • FIG. 4B Another form is shown in FIG. 4B where the connecting section 423 of the drain electrode 42 is connected to at least one of the first portions 420 , 421 .
  • the first width LD 1 is substantially 4 um.
  • the second width LD 2 substantially ranges from 2 um to 3.8 um.
  • the width LS 1 of the end portion 411 of the source electrode 41 substantially ranges from 4.2 um to 8 um, and the width LS 2 of the body 410 of the source electrode 41 substantially ranges from 4 um to 6 um. Consequently, the width LS 1 of the end portion 411 and the width LS 2 of the body 410 have a difference range from about 0.2 um to about 4 um.
  • the width LS 1 of the end portion 411 and the first width LD 1 have a difference range from about 0.2 um to about 4 um and the first width LD 1 and the second width LD 2 have a difference range from about 0.2 um to about 2 um.
  • FIG. 5 and FIG. 6 show the curves of the drain electrode current (I D ) versus the drain electrode voltage (V D ) while controlling on/off states of pixels for various forms of transistors, wherein FIG. 5 shows the curve of I D versus V D while display pixels are all dark, and FIG. 6 shows the curve of I D versus V D while display pixels have an unit luminance strength of 5000 nits.
  • the symbols 510 , 511 , 512 are curves of I D versus V D for various forms of transistors while the gate electrode voltage (V G ) is 10 volts, wherein the symbol 510 represents the transistor of the electrode structure 1 of FIG. 1 , the symbol 511 represents the transistor of the electrode structure 2 of FIG. 2A , and the symbol 512 represents the transistor of the electrode structure 4 of FIG. 4A .
  • Symbols 520 , 521 , 522 are curves of I D versus V D for various forms of transistors while V G is 20 volts, wherein the symbols 520 , 521 , 522 respectively represents the transistor of the electrode structure 1 of FIG. 1 , the electrode structure 2 of FIG. 2A , and the electrode structure 4 of FIG. 4A .
  • the symbols 530 , 531 , 532 represent similar results while V G is 30 volts.
  • symbols 610 , 611 , 612 are curves of I D versus V D for various forms of transistors while the gate electrode voltage (V G ) is 10 volts, wherein the symbol 610 represents the transistor of the electrode structure 1 of FIG. 1 , the symbol 611 represents the transistor of the electrode structure 2 of FIG. 2A , and the symbol 612 represents the transistor of the electrode structure 4 of FIG. 4A .
  • Symbols 620 , 621 , 622 are curves of I D versus V D for various forms of transistors while V G is 20 volts, wherein the symbols 620 , 621 , 622 respectively represent the transistor of the electrode structure 1 of FIG. 1 , the electrode structure 2 of FIG. 2A , and the electrode structure 4 of FIG. 4A .
  • the symbols 630 , 631 , 632 represent similar results while V G is 30 volts.
  • the width LS of the source electrode 11 and the width LD of the drain electrode 12 are both 4 um.
  • the width LS of the source electrode 21 and the first width LD 1 of the drain electrode 22 of are both 4 um, and the second width LD 2 of the drain electrode 22 is 3 um.
  • the transistors of electrode structure 4 in FIG. 1 the width LS of the source electrode 11 and the width LD of the drain electrode 12 are both 4 um.
  • the width LS of the source electrode 21 and the first width LD 1 of the drain electrode 22 of are both 4 um
  • the second width LD 2 of the drain electrode 22 is 3 um.
  • the width LS 2 of the body 410 of the source electrode 41 and the first width LD 1 of the drain electrode 42 are both 4 um
  • the width LS 1 of the end portion 411 of the source electrode 41 is 5 um
  • the second width LD 2 of the drain electrode 42 is 3 um.
  • transistors adopting the electrode structures of the present invention characteristics can significantly increase current amount transmitted between electrodes (i.e. between above mentioned drain electrode and source electrode).
  • all the electrode structures 2 , 3 , 4 of the transistor of the first embodiment, the second embodiment, and the third embodiment as described above can be used in a display apparatus 7 , wherein the display apparatus 7 comprises a pixel structure 71 which further comprises a signal line (not shown) connecting the connecting section 223 , 323 , 423 of the drain electrode 22 , 32 , 42 in the different embodiments.
  • This display apparatus may comprises a screen, a television, a laptop, a touch panel, a display of a portable electronic product (such as a mobile phone, a digital camera, a digital camcorder, a digital audio/video player, a digital assistant (such as a personal digital assistant (PDA), a black berry, or other similar products), a handy game machine (such as GameBoy, Playstation Portable (PSP), Nintendo DS Lite, or other similar game machines), an automotive audio/video apparatus, an outdoor or indoor display.
  • a portable electronic product such as a mobile phone, a digital camera, a digital camcorder, a digital audio/video player, a digital assistant (such as a personal digital assistant (PDA), a black berry, or other similar products)
  • PDA personal digital assistant
  • a handy game machine such as GameBoy, Playstation Portable (PSP), Nintendo DS Lite, or other similar game machines
  • an automotive audio/video apparatus such as GameBoy, Playstation Portable (PSP), Nintendo
  • OLED organic light-emitting diodes display
  • PDP plasma display panel
  • LCD liquid crystal display
  • FED field emission display
  • the above-mentioned figures of embodiments show an almost U-type example for the drain electrode.
  • this type of the drain electrode is not limited to this application. All types that can be covered by the descriptions of the embodiments of the present invention can be replacements, such as C type or the like.
  • the transistor types suitable for the electrode structure comprise bottom-gate (such as back channel etching (BCE), etching-stopper), top-gate, or other similar types.
  • the predetermined material layer of the embodiments of the present invention is explained by a semiconductor layer and is not limited to this type. A dielectric layer or combinations of the above-mentioned materials are also included.
  • the material of the semiconductor layer comprises amorphous silicon, polysilicon, microcrystalline silicon, monocrystalline crystal, or combinations thereof, and the semiconductor layer can be doped by N-type doping, P-type doping, or combinations thereof
  • the doping can be lateral doping or vertical doping on a portion of the semiconductor layer, and the thickness of the doping can be increased or decreased in either lateral or vertical directions.
  • the semiconductor layer can also be divided into several sub-layer and the doping can be doped into at least one sub-layer.
  • the material for the dielectric layer comprises inorganic compounds (such as silicon nitride, silicon oxide, silicon oxynitride, silicon carbide, or the like), organic compounds (such as BCB, photo-resist, polyimide, polyester, polyalcohol, or the like), or combinations thereof.
  • inorganic compounds such as silicon nitride, silicon oxide, silicon oxynitride, silicon carbide, or the like
  • organic compounds such as BCB, photo-resist, polyimide, polyester, polyalcohol, or the like
  • the widths of the gate electrode 20 , 30 , 40 are substantially greater than the widths of the predetermined material layer 23 , 33 , 43 as examples.
  • the widths of the gate electrode 20 , 30 , 40 can be substantially less than or substantially equal to the widths of the predetermined material layer 23 , 33 , 43 .
  • the embodiments show that the areas of the gate electrode 20 , 30 , 40 are substantially greater than the areas of the predetermined material layer 23 , 33 , 43 as examples.
  • the areas of the gate electrode 20 , 30 , 40 can be substantially less than or substantially equal to the areas of the predetermined material layer 23 , 33 , 43 .
  • figures of mentioned embodiments all use 4 um for the first width LD 1 , the width LS of the source electrode 21 , the width LS 2 of the body 310 , 410 of the source electrode 31 , 41 as example and experimental results.
  • the descriptions of the electrode structure such as the first width LD 1 , the width LS of the source electrode 21 , the width LS 2 of the body 310 , 410 of the source electrode 31 , 41 can adopt other sizes such as 3 um, 3.5 um, 2 um, 1 um, 1.25 um, or others.
  • the above-mentioned embodiments of the present invention further comprising a dielectric layer (not shown) formed between the gate electrode 20 , 30 , 40 and the predetermined material layer 23 , 33 , 43 .
  • the fixed electrode width in the original electrode structure of the transistor is changed to increase and stabilize the amount of current transmitted between electrodes (i.e. the drain electrode and the source electrode mentioned above), and further maintains the channel length between electrodes to follow original design rules in industry.
  • the distance between the drain electrode 22 , 32 , 42 and the source electrode 21 , 31 , 41 is maintained at about 4 um. Consequently, an objective in technology breakthrough is achieved without modifying the design rules.

Abstract

An electrode structure of a transistor, and a pixel structure and a display apparatus comprising the electrode structure of the transistor are disclosed. The electrode structure of the transistor comprises a first electrode and a second electrode. The first electrode has at least two first portions and at least one second portion. The first portions are substantially parallel with each other and each has a first width. The second portion has a second width, and connects the substantially parallel first portions to define a space with an opening. The first width is substantially greater than the second width.

Description

    CROSS-REFERENCES TO RELATED APPLICATIONS
  • This application is a division of U.S. application Ser. No. 11/683,131, filed Mar. 7, 2007, which claims priority to Taiwan application No. 95134287, filed Sep. 15, 2006. The contents of these applications are incorporated by reference herein.
    • BACKGROUND OF THE INVENTION
  • Field of the Invention
  • The present invention relates to an electrode structure of a thin-film transistor.
  • Descriptions of the Related Art
  • In recent years, developments for flat panel displays have grown rapidly and traditional cathode radiation tube displays have been gradually replaced. Nowadays, major flat panel displays include: Organic Light-Emitting Diodes Displays (OLEDs), Plasma Display Panel (PDP), Liquid Crystal Displays (LCDs), and Field Emission Displays (FEDs). One of the key components of these flat panel displays includes a thin-film transistor (TFT) so as to control the turn on /off each pixel within these flat panel displays.
  • As shown in FIG. 1, generally, an electrode structure of a thin-film transistor 1 comprises a gate electrode 10, a source electrode 11, a drain electrode 12, and a semiconductor layer 13. The semiconductor layer 13 is formed above the gate electrode 10 while the source electrode 11 and the drain electrode 12 are formed above a portion of the semiconductor layer 13 and are separated to each other, individually overlapping to a portion of the gate electrode 10. Generally, a width LS of the source electrode and a width LD of the drain electrode are about 4 um. Using this size of the electrode structure in a thin-film transistor so as to control the turn on /off of the pixels is achieved.
  • However, while current flows through the drain electrode 12 to the source electrode 11, a current flowing from an arc portion 15 of the drain electrode 12 can flow into a circular portion 14 of the source electrode 11 only. Compared to the arc portion 15 of the drain electrode 12, the circular portion 14 of the source electrode 11 has a relatively restricted overlapping area. The circular portion 14 is easily influenced by semiconductor process varieties which further resist normal current flow. This seriously affects the current amount and results in unstable current.
  • Consequently, increasing and stabilizing the amount of current that flows through the drain electrode 12 to the source electrode 11 without negatively affecting the TFT electrical transmission within displays a necessary objective to endeavor and improve upon.
    • SUMMARY OF THE INVENTION
  • The primary objective of the present invention is to provide an electrode structure of a transistor to increase and stabilize an amount of current transmitted between electrodes by changing the related size of the two electrodes among these electrodes.
  • The above-mentioned electrode structure of the present invention comprises a first electrode and a second electrode. The first electrode has at least two first portions and at least one second portion. The first portions are substantially parallel with each other and each of these portions has a first width. The second portion has a second width, and is connected to the substantially parallel first portions to define a space with an opening. The second electrode via the opening is disposed in part of the space. The first width is substantially greater than the second width.
  • Another embodiment for achieving the said objective is an electrode structure of the present invention comprising a first electrode and a second electrode, wherein the first electrode has at least two first portions and at least one second portion. The first portions are substantially parallel with each other and each has a first width. The second portion has a second width, and is connected to the substantially parallel first portions to define a space with an opening. The second portion has a body and an end portion, wherein the end portion via the opening is disposed in part of the space. The width of the end portion is substantially greater than the width of the body.
  • Another objective of the present invention is to provide a pixel structure comprising any of the above-mentioned of the electrode structures of the transistor.
  • Yet a further objective of the present invention is to provide a display apparatus comprising any of the above-mentioned of the electrode structure of the transistor.
  • By changing the electrode width of the electrode structure of the transistor, the present invention can increase and stabilize the current transmitted between electrodes. Furthermore, the channel lengths between electrodes remain constant to follow the original design rules. Consequently, the objective to increase and stabilize the amount of current can be achieved without changing the original design rules.
  • The detailed technology and preferred embodiments implemented for the subject invention are described in the following paragraphs accompanying the appended figures for those skilled in this field to well appreciate the features of the claimed invention.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a schematic diagram illustrating an electrode structure of a thin film transistor of the prior art;
  • FIG. 2A is a schematic diagram illustrating a first embodiment of an electrode structure of the present invention;
  • FIG. 2B is a schematic diagram illustrating the first embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 3A is a schematic diagram illustrating a second embodiment of an electrode structure of the present invention;
  • FIG. 3B is a schematic diagram illustrating the second embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 4A is a schematic diagram illustrating a third embodiment of an electrode structure of the present invention;
  • FIG. 4B is a schematic diagram illustrating the third embodiment of the electrode structure of the present invention with a connecting section located in another position;
  • FIG. 5 is an experimental curve of a drain electrode current ID versus a drain electrode voltage VD among various transistors;
  • FIG. 6 is another experimental curve of the drain electrode current ID versus the drain electrode voltage VD among various transistors; and
  • FIG. 7 is a relation schematic illustrating an electrode structure and a display apparatus of the present invention.
    •  DESCRIPTION OF THE PREFERRED EMBODIMENT
  • For convenience of understanding, the first electrode and the second electrode described in the claims are explained by common used drain electrode and source electrode.
  • A first embodiment of the present invention as shown in FIG. 2A and FIG. 2B is an electrode structure 2 of a transistor which comprises a gate electrode 20, a source electrode 21, a drain electrode 22, and a predetermined material layer 23. The predetermined material layer 23 is formed above the gate electrode 20 while the source electrode 21 and the drain electrode 22 are formed above a portion of the predetermined material layer 23, and are separated to each other, each individually overlapping a portion of the gate electrode 20. The drain electrode 22 has two first portions 220, 221, a second portion 222, and a connecting section 223. The first portions 220, 221 are substantially parallel with each other, and each first portion has a first width LD1. The second portion 222 has a second width LD2, and is connected to the first portions 220, 221 so that the drain electrode 22 can define a space with an opening. In the present embodiment of the invention, the first width LD1 is substantially greater than the second width LD2.
  • One form of the electrode structure 2 of the transistor from the first embodiment of the present invention is shown in FIG. 2A. The connecting section 223 of the drain electrode 22 is connected to the second portion 222. Another form is shown in FIG. 2B, where the connecting section 223 of the drain electrode 22 is connected to at least one of the first portions 220, 221. In the present embodiment of the invention, the width LS of the source electrode 21 is substantially equal to the first width LD1.
  • Each parameter in the first embodiment of the present invention is explained by the following descriptive example. The first width LD1 and the width LS of the source electrode 21 are substantially 4 micrometers (um), and the second width LD2 substantially range from 2 um to 3.8 um. Consequently, the first width LD1 and the second width LD2 have a difference range from about 0.2 um to about 2 um, and the width LS of the source electrode 21 and the second width LD2 have a difference range from about 0.2 um to about 2 um. In other words, the second width LD2 is substantially equal to the first width LD1 minus a difference of at least about 0.2 um which can be represented by the following equation: LD2=LD1−n, wherein n is a natural number substantially greater than or substantially equal to 0.2. For example, if n=0.2, LD1=4, then LD2=3.8; if n=1, LD1=4, then LD2=3; if n=0.4, LD1=5, then LD2=4.6; if n=1.25, LD1=4, then LD2=2.75; if n=1, LD1=3, then LD2=2, wherein these values can be changed according to design requirements or design rules. Note that the second width LD2 can also be calculated by subtracting the width LS of the source electrode 21 by a difference of at least about 0.2 um which can be represented by the following equation: LD2=LS−n, wherein n is a natural number substantially greater than or substantially equal to 0.2. After calculation, it is known that the ratio of the first width LD1 and the second width LD2 is substantially 1.05 to 2, and the ratio of the width LS of the source electrode 21 and the second width LD2 is substantially 1.05 to 2 as well.
  • A second embodiment of the present invention as shown in FIG. 3A and FIG. 3B is an electrode structure 3 of a transistor which comprises a gate electrode 30, a source electrode 31, a drain electrode 32, and a predetermined material layer 33. The predetermined material layer 33 is formed above the gate electrode 30 while the source electrode 31 and the drain electrode 32 are formed above a portion of the predetermined material layer 33, and are separated to each other, each individually overlapping a portion of the gate electrode 30. The drain electrode 32 has two first portions 320, 321, a second portion 322, and a connecting section 323. The first portions 320, 321 are substantially parallel with each other, and each first portion has a first width LD1. The second portion 322 has a second width LD2, and is connected to the first portions 320, 321, so that the drain electrode 32 can define a space with an opening. The source electrode 31 has a body 310 and an end portion 311, wherein the end portion 311 is substantially disposed in part of the space via the opening defined by the drain electrode 32. In the present embodiment of the invention, the first width LD1 is substantially equal to the second width LD2. The width LS1 of the end portion 311 is substantially greater than the width LS2 of the body 310, and the width LS1 of the end portion 311 is substantially greater than the first width LD1 and the second width LD2.
  • One form of the electrode 3 structure of the transistor mentioned in the second embodiment of the present invention is shown in FIG. 3A. The connecting section 323 of the drain electrode 32 is connected to the second portion 322. Another form is shown in FIG. 3B where the connecting section 323 of the drain electrode 32 is connected to at least one of the first portions 320, 321.
  • Each parameter in the second embodiment is explained by the following descriptive example. The first width LD1 and the second width LD2 are substantially 4 um, the width LS1 of the end portion 311 of the source electrode 31 substantially ranges from 4.2 um to 8 um, and the width LS2 of the body 310 of the source electrode 31 substantially ranges from 4 um to 6 um. Consequently, the width LS1 of the end portion 311 and the width LS2 of the body 310 have a difference range from about 0.2 um to about 4 um, and the width LS1 of the end portion 311 and the first width LD1 have a difference range from about 0.2 um to about 4 um. In other words, the width LS1 of the end portion 311 is substantially equal to the width LS2 of the body 310 plus a difference of at least about 0.2 um which can be represented by the following equation: LS1=LS2+n, wherein n is a natural number substantially greater than or substantially equal to 0.2. For example, if n=0.2, LS2=4, then LS1=4.2; if n=1, LS2=4, then LS1=5; if n=0.2, LS2=6, then LS1=6.2; if n=1.25, LS2=4, then LS1=5.25; if n=1, LS2=3, then LS1=4, wherein these values can be changed according to design requirements or design rules. Note that the width LS1 of the end portion 311 can also be calculated by adding the first width LD1 by a difference of at least about 0.2 um which can be represented by the following equation: LS1=LD1+n, wherein n is a natural number substantially greater than or substantially equal to 0.2. After calculation, it is known that the ratio of the width LS1 of the end portion 311 and the width LS2 of the body 310 is substantially 0.7 to 2 and the ratio of the width LS1 of the end portion 311 and the first width LD1 is substantially 1.05 to 2.
  • The third embodiment of the present invention as shown in FIG. 4A and FIG. 4B is an electrode structure 4 of a transistor which comprises a gate electrode 40, a source electrode 41, a drain electrode 42, and a predetermined material layer 43. The predetermined material layer 43 is formed above the gate electrode 40 while the source electrode 41 and the drain electrode 42 are formed above a portion of the predetermined material layer 43, and are separated to each other, each individually overlapping a portion of the gate electrode 40. The drain electrode 42 has two first portions 420, 421, a second portion 422, and a connecting section 423. The first portions 420, 421 are substantially parallel with each other, and each first portion has a first width LD1. The second portion 422 has a second width LD2, and is connected to the first portions 420, 421, so that the drain electrode 42 can define a space with an opening. The source electrode 41 has a body 410 and an end portion 411, wherein the end portion 411 is disposed in part of the space via the opening defined by the drain electrode 42. In the present embodiment of the invention, the first width LD1 is substantially greater than the second width LD2. The width LS1 of the end portion 411 is substantially greater than the width LS2 of the body 410, and the width LS1 of the end portion 411 is substantially greater than the first width LD1.
  • One form of the electrode structure 4 of the transistor mentioned in the third embodiment of the present invention is shown in FIG. 4A. The connecting section 423 of the drain electrode 42 is connected to the second portion 422. Another form is shown in FIG. 4B where the connecting section 423 of the drain electrode 42 is connected to at least one of the first portions 420, 421.
  • Each parameter in the third embodiment of the present invention is explained by the following descriptive example. The first width LD1 is substantially 4 um. The second width LD2 substantially ranges from 2 um to 3.8 um. The width LS1 of the end portion 411 of the source electrode 41 substantially ranges from 4.2 um to 8 um, and the width LS2 of the body 410 of the source electrode 41 substantially ranges from 4 um to 6 um. Consequently, the width LS1 of the end portion 411 and the width LS2 of the body 410 have a difference range from about 0.2 um to about 4 um. The width LS1 of the end portion 411 and the first width LD1 have a difference range from about 0.2 um to about 4 um and the first width LD1 and the second width LD2 have a difference range from about 0.2 um to about 2 um. In other words, the width LS1 of the end portion 411 is substantially equal to the width LS2 of the body 410 plus a difference of at least about 0.2 um which can be represented by the following equation: LS1=LS2+n, wherein n is a natural number substantially greater than or substantially equal to 0.2. For example, if n=0.2, LS2=4, then LS1=4.2; if n=1, LS2=4, then LS1=5; if n=0.2, LS2=6, then LS1=6.2; if n=1.25, LS2=4, then LS1=5.25; if n=1, LS2=3, then LS1=4, wherein these values can be changed according to design requirements or design rules. Note that the width LS1 of the end portion 411 can also be calculated by adding the first width LD1 by a difference of at least about 0.2 um which can be represented by the following equation: LS1=LD1+n, wherein n is a natural number substantially greater than or equal to 0.2. The second width LD2 is substantially equal to the first width LD1 subtracted by a difference of at least about 0.2 um which can be represented by the following equation: LD2=LD1−n, wherein n is a natural number substantially greater than or substantially equal to 0.2. For example, if n=0.2, LD1=4, then LD2=3.8; if n=1, LD1=4, then LD2=3; if n=0.4, LD1=5, then LD2=4.6; if n=1.25, LD1=4, then LD2=2.75; if n=1, LD1=3, then LD2=2, wherein these values can be changed according to design requirements or design rules. Note that the second width LD2 can also be calculated by subtracting the width LS2 of the body 410 by a difference of at least about 0.2 um which can be represented by the following equation: LD2=LS2−n, wherein n is a natural number substantially greater than or substantially equal to 0.2. After calculation, it is known that the ratio of the width LS1 of the end portion 411 and the width LS2 of the body 410 is substantially 0.7 to 2, the ratio of the width LS1 of the end portion 411 and the first width LD1 is substantially 1.05 to 2, and the ratio of the first width LD1 and the second width LD2 is substantially 1.05 to 2.
  • FIG. 5 and FIG. 6 show the curves of the drain electrode current (ID) versus the drain electrode voltage (VD) while controlling on/off states of pixels for various forms of transistors, wherein FIG. 5 shows the curve of ID versus VD while display pixels are all dark, and FIG. 6 shows the curve of ID versus VD while display pixels have an unit luminance strength of 5000 nits.
  • For a more detailed description, please refer to FIG. 5. The symbols 510, 511, 512 are curves of ID versus VD for various forms of transistors while the gate electrode voltage (VG) is 10 volts, wherein the symbol 510 represents the transistor of the electrode structure 1 of FIG. 1, the symbol 511 represents the transistor of the electrode structure 2 of FIG. 2A, and the symbol 512 represents the transistor of the electrode structure 4 of FIG. 4A. Symbols 520, 521, 522 are curves of ID versus VD for various forms of transistors while VG is 20 volts, wherein the symbols 520, 521, 522 respectively represents the transistor of the electrode structure 1 of FIG. 1, the electrode structure 2 of FIG. 2A, and the electrode structure 4 of FIG. 4A. The symbols 530, 531, 532 represent similar results while VG is 30 volts.
  • Referring to FIG. 6, symbols 610, 611, 612 are curves of ID versus VD for various forms of transistors while the gate electrode voltage (VG) is 10 volts, wherein the symbol 610 represents the transistor of the electrode structure 1 of FIG. 1, the symbol 611 represents the transistor of the electrode structure 2 of FIG. 2A, and the symbol 612 represents the transistor of the electrode structure 4 of FIG. 4A. Symbols 620, 621, 622 are curves of ID versus VD for various forms of transistors while VG is 20 volts, wherein the symbols 620, 621, 622 respectively represent the transistor of the electrode structure 1 of FIG. 1, the electrode structure 2 of FIG. 2A, and the electrode structure 4 of FIG. 4A. The symbols 630, 631, 632 represent similar results while VG is 30 volts.
  • While performing the above mentioned various experiments, referenced sizes of the transistors of the electrode structures are listed as follows. For the transistors of electrode structure 1 in FIG. 1, the width LS of the source electrode 11 and the width LD of the drain electrode 12 are both 4 um. For the transistors of electrode structure 2 in FIG. 2A, the width LS of the source electrode 21 and the first width LD1 of the drain electrode 22 of are both 4 um, and the second width LD2 of the drain electrode 22 is 3 um. For the transistors of electrode structure 4 in FIG. 4A, the width LS2 of the body 410 of the source electrode 41 and the first width LD1 of the drain electrode 42 are both 4 um, the width LS1 of the end portion 411 of the source electrode 41 is 5 um, and the second width LD2 of the drain electrode 42 is 3 um.
  • According to FIG. 5 and FIG. 6 mentioned above as compared to the prior art (FIG. 1), transistors adopting the electrode structures of the present invention characteristics (as shown in FIG. 2A, 4A) can significantly increase current amount transmitted between electrodes (i.e. between above mentioned drain electrode and source electrode).
  • Referring to FIG. 7, all the electrode structures 2, 3, 4 of the transistor of the first embodiment, the second embodiment, and the third embodiment as described above can be used in a display apparatus 7, wherein the display apparatus 7 comprises a pixel structure 71 which further comprises a signal line (not shown) connecting the connecting section 223, 323, 423 of the drain electrode 22, 32, 42 in the different embodiments. This display apparatus may comprises a screen, a television, a laptop, a touch panel, a display of a portable electronic product (such as a mobile phone, a digital camera, a digital camcorder, a digital audio/video player, a digital assistant (such as a personal digital assistant (PDA), a black berry, or other similar products), a handy game machine (such as GameBoy, Playstation Portable (PSP), Nintendo DS Lite, or other similar game machines), an automotive audio/video apparatus, an outdoor or indoor display. Except for the application types of the above mentioned display apparatus, various kinds of display apparatus also included may comprise an organic light-emitting diodes display (OLED), a plasma display panel (PDP), a liquid crystal display (LCD), and a field emission display (FED). The above descriptions explain only the electrode structure of the invention characteristic. For the common architectures of the pixel structure and display apparatus, there are no unnecessary details given here because these are not invention characteristics, and those skilled in the art can understand these technical architectures.
  • Furthermore, the above-mentioned figures of embodiments show an almost U-type example for the drain electrode. However, this type of the drain electrode is not limited to this application. All types that can be covered by the descriptions of the embodiments of the present invention can be replacements, such as C type or the like. In addition, the transistor types suitable for the electrode structure comprise bottom-gate (such as back channel etching (BCE), etching-stopper), top-gate, or other similar types. Furthermore, the predetermined material layer of the embodiments of the present invention is explained by a semiconductor layer and is not limited to this type. A dielectric layer or combinations of the above-mentioned materials are also included. The material of the semiconductor layer comprises amorphous silicon, polysilicon, microcrystalline silicon, monocrystalline crystal, or combinations thereof, and the semiconductor layer can be doped by N-type doping, P-type doping, or combinations thereof When the semiconductor layer is doped, the doping can be lateral doping or vertical doping on a portion of the semiconductor layer, and the thickness of the doping can be increased or decreased in either lateral or vertical directions. However, the semiconductor layer can also be divided into several sub-layer and the doping can be doped into at least one sub-layer. The material for the dielectric layer comprises inorganic compounds (such as silicon nitride, silicon oxide, silicon oxynitride, silicon carbide, or the like), organic compounds (such as BCB, photo-resist, polyimide, polyester, polyalcohol, or the like), or combinations thereof.
  • Furthermore, mentioned figures of embodiments all show that the widths of the gate electrode 20, 30, 40 are substantially greater than the widths of the predetermined material layer 23, 33, 43 as examples. However, the widths of the gate electrode 20, 30, 40 can be substantially less than or substantially equal to the widths of the predetermined material layer 23, 33, 43. In other words, the embodiments show that the areas of the gate electrode 20, 30, 40 are substantially greater than the areas of the predetermined material layer 23, 33, 43 as examples. However, the areas of the gate electrode 20, 30, 40 can be substantially less than or substantially equal to the areas of the predetermined material layer 23, 33, 43.
  • Furthermore, figures of mentioned embodiments all use 4 um for the first width LD1, the width LS of the source electrode 21, the width LS2 of the body 310, 410 of the source electrode 31, 41 as example and experimental results. However, if the design rules said in the present invention can be met and the resolution of the machine can be satisfied, the descriptions of the electrode structure such as the first width LD1, the width LS of the source electrode 21, the width LS2 of the body 310, 410 of the source electrode 31, 41 can adopt other sizes such as 3 um, 3.5 um, 2 um, 1 um, 1.25 um, or others. Moreover, the above-mentioned embodiments of the present invention further comprising a dielectric layer (not shown) formed between the gate electrode 20, 30, 40 and the predetermined material layer 23, 33, 43.
  • According to the above descriptions, while manufacturing transistors in the present invention, the fixed electrode width in the original electrode structure of the transistor is changed to increase and stabilize the amount of current transmitted between electrodes (i.e. the drain electrode and the source electrode mentioned above), and further maintains the channel length between electrodes to follow original design rules in industry. For example, the distance between the drain electrode 22, 32, 42 and the source electrode 21, 31, 41 is maintained at about 4 um. Consequently, an objective in technology breakthrough is achieved without modifying the design rules.
  • The above disclosure is related to the detailed technical contents and inventive features thereof. Those skilled in this field may proceed with a variety of modifications and replacements based on the disclosures and suggestions of the invention as described without departing from the characteristics thereof. Rather, it is intended to cover various modifications and similar arrangements included within the spirit and scope of the appended claims, the scope of which should be accorded the broadest interpretation so as to encompass all such modifications and similar structure.

Claims (16)

What is claimed is:
1. An electrode structure of a transistor, comprising:
a first electrode, having:
at least two first portions substantially parallel with each other and each of the first portions having a first width; and
at least one second portion, having a second width, and connecting the first portions to define a space having an opening; and
a second electrode having a body and an end portion, and the end portion via the opening disposed in part of the space;
wherein the end portion has a width substantially greater than a width of the body.
2. The electrode structure of claim 1, wherein a ratio of the width of the end portion and the width of the body ranges from about 0.7 to about 2.
3. The electrode structure of claim 1, wherein the width of the body ranges from about 4 um to about 6 um.
4. The electrode structure of claim 1, wherein the width of the end portion ranges from about 4.2 um to about 8 um.
5. The electrode structure of claim 1, wherein the first width is substantially greater than the second width.
6. The electrode structure of claim 1, wherein a ratio of the first width and the second width ranges from about 1.05 to about 2.
7. The electrode structure of claim 1, wherein the first width is substantially 4 um.
8. The electrode structure of claim 1, wherein the second width ranges from about 2 um to about 3.8 um.
9. The electrode structure of claim 1, wherein the width of the end portion and the width of the body has a difference ranges from about 0.2 um to about 4 um.
10. The electrode structure of claim 1, wherein the width of the end portion is substantially greater than the first width.
11. The electrode structure of claim 1, wherein a ratio of the width of the end portion and the first width ranges from about 1.05 to about 2.
12. The electrode structure of claim 1, wherein the width of the end portion and the first width has a difference ranges from about 0.2 um to about 4 um.
13. The electrode structure of claim 1, wherein the first electrode has a connecting section connected to at least one of the first portions.
14. The electrode structure of claim 1, wherein the first electrode has a connecting section connected to the second portion.
15. A pixel structure incorporating the electrode structure of the transistor of claim 1.
16. A display apparatus incorporating the electrode structure of the transistor of claim 1.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020140714A1 (en) * 2019-01-02 2020-07-09 京东方科技集团股份有限公司 Array substrate and micro total analysis apparatus

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101614092B1 (en) * 2009-12-24 2016-04-21 삼성디스플레이 주식회사 Photo mask and TFT transistor fabricated by the mask
TWI487111B (en) 2012-05-21 2015-06-01 Au Optronics Corp Transistor structure and driving circuit structure
CN110379849A (en) * 2019-07-22 2019-10-25 深圳市华星光电半导体显示技术有限公司 A kind of thin film transistor (TFT) and display panel
TWI727752B (en) * 2020-04-21 2021-05-11 友達光電股份有限公司 Active device
CN112925137B (en) * 2021-03-29 2023-03-10 绵阳惠科光电科技有限公司 Control switch of drive circuit, array substrate and display panel

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5414283A (en) * 1993-11-19 1995-05-09 Ois Optical Imaging Systems, Inc. TFT with reduced parasitic capacitance
US20010050368A1 (en) * 2000-06-09 2001-12-13 Hong-Man Moon Liquid crystal display device array substrate and method of manufacturing the same
US20050056847A1 (en) * 2003-09-09 2005-03-17 Sharp Kabushiki Kaisha Active matrix substrate and display device comprising same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2593631B1 (en) * 1986-01-27 1989-02-17 Maurice Francois GRID RESISTANT ACTIVE MATRIX DISPLAY SCREEN AND METHODS OF MAKING SAME
US5032883A (en) * 1987-09-09 1991-07-16 Casio Computer Co., Ltd. Thin film transistor and method of manufacturing the same
US5220443A (en) * 1991-04-29 1993-06-15 Nec Corporation Matrix wiring substrate and active matrix display having non-linear resistance elements for electrostatic discharge protection
JP3715996B2 (en) * 1994-07-29 2005-11-16 株式会社日立製作所 Liquid crystal display device
US5737041A (en) * 1995-07-31 1998-04-07 Image Quest Technologies, Inc. TFT, method of making and matrix displays incorporating the TFT
JP4100646B2 (en) 1998-12-28 2008-06-11 エルジー．フィリップス エルシーデー カンパニー，リミテッド Thin film transistor and liquid crystal display device having the same
JP2001296553A (en) * 2000-04-14 2001-10-26 Advanced Display Inc Display device and manufacturing method therefor
JP4211250B2 (en) * 2000-10-12 2009-01-21 セイコーエプソン株式会社 Transistor and display device including the same
JP2004527124A (en) * 2001-04-10 2004-09-02 サーノフ コーポレイション Method and apparatus for providing high performance active matrix pixels using organic thin film transistors
KR100640210B1 (en) * 2002-12-31 2006-10-31 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for fabricating thereof
JP4593094B2 (en) * 2003-08-21 2010-12-08 日本電気株式会社 Liquid crystal display device and manufacturing method thereof
JP4100351B2 (en) * 2004-02-09 2008-06-11 セイコーエプソン株式会社 Thin film transistor manufacturing method
US7285894B1 (en) * 2004-02-13 2007-10-23 University Of Maine System Board Of Trustees Surface acoustic wave devices for high temperature applications
KR100606970B1 (en) * 2004-04-14 2006-08-01 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for fabricating the same
JP4133919B2 (en) * 2004-04-27 2008-08-13 シャープ株式会社 Active matrix substrate and display device
US7719008B2 (en) * 2006-02-03 2010-05-18 Samsung Electronics Co., Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5414283A (en) * 1993-11-19 1995-05-09 Ois Optical Imaging Systems, Inc. TFT with reduced parasitic capacitance
US20010050368A1 (en) * 2000-06-09 2001-12-13 Hong-Man Moon Liquid crystal display device array substrate and method of manufacturing the same
US20050056847A1 (en) * 2003-09-09 2005-03-17 Sharp Kabushiki Kaisha Active matrix substrate and display device comprising same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020140714A1 (en) * 2019-01-02 2020-07-09 京东方科技集团股份有限公司 Array substrate and micro total analysis apparatus
US11493435B2 (en) 2019-01-02 2022-11-08 Beijing Boe Technology Development Co., Ltd. Array substrate and micro total analysis device

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US10608088B2 (en) 2020-03-31
US9536963B2 (en) 2017-01-03

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