US20150111853A1 - Cephalosporin compositions and methods of manufacture - Google Patents

Cephalosporin compositions and methods of manufacture Download PDF

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US20150111853A1
US20150111853A1 US14/521,421 US201414521421A US2015111853A1 US 20150111853 A1 US20150111853 A1 US 20150111853A1 US 201414521421 A US201414521421 A US 201414521421A US 2015111853 A1 US2015111853 A1 US 2015111853A1
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Jan-Ji Lai
Pradip M. Pathare
Laxma Kolla
Adrien F. Soret
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Merck Sharp and Dohme LLC
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Calixa Therapeutics Inc
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/59Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3 with hetero atoms directly attached in position 3
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/41Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/41Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
    • A61K31/425Thiazoles
    • A61K31/4261,3-Thiazoles
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/41Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
    • A61K31/433Thidiazoles
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/54Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame
    • A61K31/542Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame ortho- or peri-condensed with heterocyclic ring systems
    • A61K31/545Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/54Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame
    • A61K31/542Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame ortho- or peri-condensed with heterocyclic ring systems
    • A61K31/545Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine
    • A61K31/546Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine containing further heterocyclic rings, e.g. cephalothin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/66Phosphorus compounds
    • A61K31/675Phosphorus compounds having nitrogen as a ring hetero atom, e.g. pyridoxal phosphate
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/02Preparation
    • C07D501/04Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/02Preparation
    • C07D501/04Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • C07D501/06Acylation of 7-aminocephalosporanic acid
    • CCHEMISTRY; METALLURGY
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    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/227-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with radicals containing only hydrogen and carbon atoms, attached in position 3
    • CCHEMISTRY; METALLURGY
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    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/26Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
    • C07D501/34Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/36Methylene radicals, substituted by sulfur atoms
    • CCHEMISTRY; METALLURGY
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    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/48Methylene radicals, substituted by hetero rings
    • C07D501/56Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/577-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with a further substituent in position 7, e.g. cephamycines
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    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6561Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing systems of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring or ring system, with or without other non-condensed hetero rings
    • C07F9/65613Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing systems of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring or ring system, with or without other non-condensed hetero rings containing the ring system (X = CH2, O, S, NH) optionally with an additional double bond and/or substituents, e.g. cephalosporins and analogs

Definitions

  • the present disclosure relates to cephalosporin compositions and the manufacture thereof.
  • Cephalosporin compounds containing the chemical substructure of formula (I) are important antibacterial therapeutic agents.
  • the manufacture of these cephalosporin compounds is typically performed in a series of synthetic chemical reactions. Reducing the number of synthetic chemical reactions and associated purification steps can increase product yield and decrease the time for production, thereby increasing efficiency and decreasing production costs.
  • Syntheses of antibiotic cephalosporin compounds containing the substructure of formula (I) typically require two reactions for the formation of a 7-carboxamide moiety: (1) deprotection (i.e., removal of a protecting group) of the 7-amino group, and (2) acylation of the 7-amino group to form the 7-carboxamide moiety.
  • deprotection i.e., removal of a protecting group
  • acylation of the 7-amino group to form the 7-carboxamide moiety.
  • Ceftolozane CXA-101, FR264205
  • Ceftolozane is a cephalosporin antibiotic compound, a synthesis of which is disclosed in U.S. Pat. No. 7,129,232.
  • cephalosporin antibiotic compounds include the compounds of Table 2. There remains an unmet need to identify novel manufacturing processes for synthesizing cephalosporin compounds comprising the chemical substructure of formula (I), including methods for formation of a 7-carboxamide moiety from a protected 7-amino group with fewer chemical synthetic steps.
  • a novel chemical process useful in the manufacture of cephalosporin compounds containing the chemical substructure of Formula (I) can include deprotection (i.e., removal of a nitrogen protecting group) and acylation of the 7-amino group in a single step rather than multiple steps.
  • the invention is based in part on the surprising discovery that salicyladehyde imine derivatives according to formula (Ia) can be reacted with activated carboxylic acid derivatives (Ib) to yield 7-carboxamide compounds according to formula (I) in a single step. This outcome is surprising because the imine derivatives of formula (Ia) are stable to the reaction conditions in the absence of the activated carboxylic acid derivative.
  • a method for transforming a protected 7-amino group into a 7-carboxamide moiety comprising a single step.
  • FIG. 1 depicts a representative 7-carboxamide moiety and 7-amino group.
  • FIG. 2 depicts a prior art procedure (U.S. Pat. No. 5,134,138) comprising the deprotection of a protected 7-amino group followed by conversion of the 7-amino group into a 7-carboxamide moiety.
  • FIG. 3 depicts the full scan mass spectrum of compound (IV-1).
  • FIG. 6 depicts the product ion mass spectrum of compound (III-1).
  • FIG. 7 depicts the full scan mass spectrum of compound (II-1).
  • FIG. 8 depicts the product ion mass spectrum of compound (II-1).
  • FIG. 9 depicts the full scan mass spectrum of ceftolozane trifluoroacetate.
  • FIG. 10 depicts the product ion mass spectrum of ceftolozane trifluoroacetate.
  • FIG. 11 depicts the HPLC chromatograms of Example 2.
  • a method for preparing a compound of formula (II), or a salt thereof comprising the step of reacting a compound of formula (III), or a salt thereof, with a compound of formula (IV), or a salt thereof, under suitable conditions to form a compound of formula (II), or a salt thereof, wherein the compounds of formulas (II), (III) and (IV) are defined according to the variable values below.
  • R 1 is R 1′ —Z; wherein R 1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; wherein Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, carboxamide, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′) 2 ; and wherein Z′ is independently hydrogen or an oxygen protecting group.
  • R 1 is
  • R 2 is selected from the group consisting of hydrogen and alkoxy. In another embodiment of the method, R 2 is hydrogen, and the compound of formula (II) has the structure of formula (IIb).
  • Y is selected from the group consisting of a bond, CH 2 , CH 2 S, SCH 2 , C ⁇ C(H)CH 2 CO 2 R′, CH(OR′), C ⁇ N(OR′), CHNR′′ 2 and C ⁇ NR′′; wherein R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO 2 R 5 ; wherein R′′ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R′′ substituents may combine to form a ring or a single nitrogen protecting group; and wherein R 5 is independently hydrogen or an oxygen protecting group.
  • Y is selected from a bond, CH 2 , CH 2 S and C ⁇ C(H)CH 2 CO 2 R′, and R′ is selected from the group consisting of hydrogen and an oxygen protecting group.
  • Y is C ⁇ N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH 2 CO 2 R 5 and C(CH 3 ) 2 CO 2 R 5 .
  • Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group.
  • Y is CHNR′′ 2 and R′′ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
  • Y is C ⁇ N(OR′) and R′ is C(CH 3 ) 2 CO 2 t Bu, and the compound of formula (II) has the structure of formula (IIc).
  • R 3 is selected from the group consisting of hydrogen and an oxygen protecting group.
  • R 3 is an oxygen protecting group selected from benzyl ethers. Benzyl ethers may be substituted (e.g., with one or more alkoxy substituents) or unsubstituted.
  • R 3 is
  • R 4 and R 4′ are independently selected from the group consisting of halogen, —R 6 -R 7 , —CH 2 —R 6 -R 7 and —CH ⁇ R 7 ; wherein R 6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl; wherein R 7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R 7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NR a R b ; wherein R a and R b are independently selected from the group consisting of hydrogen, alkyl, a nitrogen protecting group and C(O)NHR c ; wherein R c is an alkyl group or a heteroalky
  • R 4 and R 4′ are independently selected from the group consisting of hydrogen, chlorine, methyl, CH ⁇ CH—CH 3 , CH ⁇ CH 2 , CH 2 OC(O)CH 3 , CH 2 OC(O)NH 2 , CH 2 OCH 3 ,
  • a ⁇ for each occurrence, is independently a pharmaceutically acceptable anion.
  • a ⁇ is selected from chloride, acetate, trifluoroacetate and bisulfate. In a particular embodiment, A ⁇ is trifluoroacetate.
  • R 4 is
  • R 4′ is
  • X is selected from the group consisting of halogen, —OC(O)R 8 and —OSO 2 R 8 ; wherein R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • X is —OSO 2 R 8 .
  • X is —OSO 2 CH 3 .
  • R 1 is R 1′ —Z, wherein R 1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; and Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, carboxamido, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′) 2 ; and wherein Z′ is independently hydrogen or an oxygen protecting group;
  • Y is selected from the group consisting of a bond, CH 2 , CH 2 S, SCH 2 , C ⁇ C(H)CH 2 CO 2 R′, CH(OR′), C ⁇ N(OR′), CHNR′′ 2 and C ⁇ NR′′;
  • R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO 2 R 5 , and wherein R 5 is independently hydrogen or an oxygen protecting group;
  • R′′ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R′′ substituents may combine to form a ring or a single nitrogen protecting group;
  • R 2 is selected from the group consisting of hydrogen and alkoxy
  • R 3 is selected from the group consisting of hydrogen and an oxygen protecting group
  • R 4 and R 4′ are each independently selected from the group consisting of halogen, —R 6 -R 7 , —CH 2 —R 6 -R 7 and —CH ⁇ R 7 ; wherein R 4 and R 4′ are optionally, independently substituted one or more times with an oxygen protecting group or a nitrogen protecting group;
  • R 6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl;
  • R 7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R 7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NR a R b ; wherein
  • R a and R b are independently selected from the group consisting of hydrogen, alkyl and C(O)NHR c ;
  • R c is alkyl or heteroalkyl
  • X is selected from the group consisting of halogen, —OC(O)R 8 and —OSO 2 R 8 , wherein R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • R 1 is selected from the group consisting of:
  • R 2 is hydrogen
  • Y is selected from a bond, CH 2 , CH 2 S and C ⁇ C(H)CH 2 CO 2 R′ and R′ is selected from the group consisting of hydrogen and an oxygen protecting group, or wherein Y is C ⁇ N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH 2 CO 2 R 5 and C(CH 3 ) 2 CO 2 R 5 and R 5 is hydrogen or an oxygen protecting group, or wherein Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group, or wherein Y is CHNR′′ 2 and R′′ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
  • R 3 is an oxygen protecting group that is a benzyl ether.
  • R 3 is paramethoxybenzyl (PMB).
  • R 4 and R 4′ are selected from the group consisting of hydrogen, chlorine, methyl, CH ⁇ CH—CH 3 , CH ⁇ CH 2 , CH 2 OC(O)CH 3 , CH 2 OC(O)NH 2 , CH 2 OCH 3 ,
  • each occurrence of A ⁇ is independently an anion.
  • R 1 is selected from the group consisting of:
  • Z′ is independently hydrogen or an oxygen protecting group
  • Y is selected from the group consisting of:
  • R′ is selected from the group consisting of hydrogen and an oxygen protecting group
  • R 2 is hydrogen
  • R 3 is selected from the group consisting of hydrogen and an oxygen protecting group
  • R 4 and R 4′ are each independently selected from the group consisting of:
  • X is —OSO 2 R 8 , wherein R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • the above methods further comprises the step of reacting the compound of formula (II), or a salt thereof, with a strong acid to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2.
  • the strong acid can be a Bronsted acid (e.g., trifluoroacetic acid, hydrochloric acid), or a Lewis acid (e.g., TiCl 4 ). In a particular embodiment, the strong acid is trifluoroacetic acid.
  • composition comprising the compound of formula (V), or salt a thereof, and one or more compound selected from the group consisting of: the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof.
  • the composition comprises the compound of formula (V), or salt a thereof, the compound of formula (I) or salt a thereof, the compound of formula (Ia) or salt a thereof, and the compound of formula (Ib) or salt a thereof.
  • the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof are present, if at all, in an amount that is less than or equal to 0.05% w/w.
  • the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof are present, if at all, in an amount that is less than or equal to 0.05 mol %.
  • a method of treating a bacterial infection in a patient comprising the step of administering a composition as described above.
  • composition comprising a compound of formula (V), or a salt thereof, selected from the compounds of Table 2, or salts thereof, prepared according to a method described herein.
  • composition (i)-(p) wherein:
  • provided herein is a method of treating a bacterial infection in a patient, comprising the step of administering to the patient a composition of embodiments (i)-(p).
  • a composition of embodiments (i)-(p) for use in the treatment of a bacterial infection in a patient.
  • provided herein is the use of a composition of embodiments (i)-(p) for the manufacture of a medicament for the treatment of a bacterial infection in a patient.
  • composition comprising two or more compounds selected from the group consisting of:
  • composition further comprises the compound having the structure:
  • a ⁇ is an anion
  • X is selected from the group consisting of halogen, —OC(O)R 8 and —OSO 2 R 8 , wherein R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • the compound of formula (IV-1) is prepared from the compound of formula (IVa):
  • the suitable conditions comprise reacting in a mixture comprising an organic solvent and water.
  • Organic solvents can be selected from the group consisting of aromatic solvents, aliphatic solvents, halogenated solvents, halogenated aromatic solvents, halogenated aliphatic solvents, ethers, halogenated ethers, esters and amides.
  • the organic solvent is selected from halogenated solvents.
  • the organic solvent is dichloromethane.
  • the suitable conditions comprise reacting in a mixture comprising an organic solvent and about 6-9 percent (w/w) water relative to the compound of formula (III), or salt thereof.
  • the suitable conditions comprise reaction in a mixture comprising an organic solvent and about 6-8 percent (w/w) water relative to the compound of formula (III), or salt thereof.
  • the suitable conditions comprise reacting in a mixture comprising dichloromethane and about 6-9 percent of water relative to the compound of formula (III), or salt thereof.
  • the compound of formula (III) is hydrolytically stable under the reaction conditions, in the absence of the compound of formula (IV).
  • compound (III-1) was combined with dichloromethane and water in the same relative amounts as in Example 1. Upon stirring for four hours, no hydrolysis of (III-1) was observed. In contrast, under the same solvent, temperature and time conditions, but in the presence of compound (IV-1), compound (III-1) reacts to form compound (II-1).
  • the method further comprises the step of reacting the compound of formula (II), or a salt thereof, under suitable conditions to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2, or salts thereof.
  • the suitable conditions comprise reacting the compound of formula (II) with strong acid.
  • the strong acid is trifluoroacetic acid.
  • Oxygen and nitrogen protecting groups are known to those of skill in the art.
  • Oxygen protecting groups include, but are not limited to methyl ethers, substituted methyl ethers (e.g., MOM (methoxymethyl ether), MTM (methylthiomethyl ether), BOM (benzyloxymethyl ether), PMBM or MPM (p-methoxybenzyloxymethyl ether), to name a few), substituted ethyl ethers, substituted benzyl ethers, silyl ethers (e.g., TMS (trimethylsilyl ether), TES (triethylsilylether), TIPS (triisopropylsilyl ether), TBDMS (t-butyldimethylsilyl ether), tribenzyl silyl ether, TBDPS (t-butyldiphenyl silyl ether), to name a few), esters (e.g., formate, acetate, benzoate (Bz), tri
  • Nitrogen protecting groups include, but are not limited to, carbamates (including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
  • carbamates including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
  • Exemplary anions include, but are not limited to, carboxylates (e.g., acetate, benzoate, trifluoroacetate), halides (e.g., chloride, bromide, iodide), sulfate (e.g., monosulfate, bisulfate) and phosphate (e.g., monophosphate).
  • carboxylates e.g., acetate, benzoate, trifluoroacetate
  • halides e.g., chloride, bromide, iodide
  • sulfate e.g., monosulfate, bisulfate
  • phosphate e.g., monophosphate
  • alkyl groups and groups comprising an alkyl group comprise 1-6 carbon atoms.
  • aryl groups and groups comprising aryl groups e.g., aroyl
  • heteroaryl groups and groups comprising heteroaryl groups comprise 1-10 carbon atoms and 1-4 heteroatoms selected from oxygen, nitrogen and sulfur.
  • HRMS high resolution mass spectrometry
  • HR MS/MS high resolution mass spectrometry/mass spectrometry
  • Samples were dissolved in solution and the sample solutions were directly infused into time-of-flight (TOF) mass spectrometer to obtain parent (MS) and product scans (MS/MS) of analyte.
  • TOF time-of-flight
  • MS parent
  • MS/MS product scans
  • Compound (III-1) was prepared by coupling the compound (6R,7R)-4-methoxybenzyl 3-(chloromethyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (purchased from Nippon Chemicals, Japan) with the compound tert-butyl (2-(3-(1-methyl-5-(tritylamino)-1H-pyrazol-4-yl)ureido)ethyl)carbamate (UBT, prepared according to the method disclosed in U.S. Pat. No. 7,129,232).
  • Ceftolozane trifluoroacetate (5 g) was dissolved in water (40 mL) and filtered. The solution was purified by HPLC using a Waters Sunfire C18 (50 ⁇ 100 mm, 5 ⁇ m) column with an eluent comprising Solvent A: acetonitrile+0.08% sulfuric acid (v/v) and Solvent B: water+0.08% sulfuric acid (v/v).
  • a reactor is charged with 4-(2-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)thio)thiazol-4-yl)-1-methylpyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-(phosphonoamino)-1,2,4-thiadiazol-3-yl)-2-(ethoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with (7R)-4-methoxybenzyl-3-((E)-((R)-1′-(tert-butoxycarbonyl)-2-oxo-[1,3′-bipyrrolidin]-3-ylidene)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((4-methoxybenzyl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with 1-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)pyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with 1-(((6R,7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)-1-methylpyrrolidin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-(((5-methyl-1,3,4-thiadiazol-2-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), 2-(1H-tetrazol-1-yl)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-3-vinyl-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-((2-(tert-butoxy)-2-oxoethoxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • a reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-(((2-methyl-5,6-dioxo-1,2,5,6-tetrahydro-1,2,4-triazin-3-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
  • the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
  • the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
  • the filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.

Abstract

Provided herein is a method for the synthesis of cephalosporin antibiotic compounds comprising the conversion of a protected 7-amino group into a 7-carboxamide moiety in a single step.

Description

    RELATED APPLICATIONS
  • This application claims priority to U.S. Provisional Application No. 61/782,365, filed Mar. 14, 2013. The entire content of this application is incorporated herein by reference in its entirety.
  • TECHNICAL FIELD
  • The present disclosure relates to cephalosporin compositions and the manufacture thereof.
  • BACKGROUND
  • Cephalosporin compounds containing the chemical substructure of formula (I) are important antibacterial therapeutic agents. The manufacture of these cephalosporin compounds is typically performed in a series of synthetic chemical reactions. Reducing the number of synthetic chemical reactions and associated purification steps can increase product yield and decrease the time for production, thereby increasing efficiency and decreasing production costs.
  • Figure US20150111853A1-20150423-C00001
  • Syntheses of antibiotic cephalosporin compounds containing the substructure of formula (I) typically require two reactions for the formation of a 7-carboxamide moiety: (1) deprotection (i.e., removal of a protecting group) of the 7-amino group, and (2) acylation of the 7-amino group to form the 7-carboxamide moiety. One example of this two-step procedure is disclosed in U.S. Pat. No. 5,134,138 (see FIG. 2). Most cephalosporin antibiotics can be manufactured in an analogous way. Ceftolozane (CXA-101, FR264205) is a cephalosporin antibiotic compound, a synthesis of which is disclosed in U.S. Pat. No. 7,129,232. Additional cephalosporin antibiotic compounds include the compounds of Table 2. There remains an unmet need to identify novel manufacturing processes for synthesizing cephalosporin compounds comprising the chemical substructure of formula (I), including methods for formation of a 7-carboxamide moiety from a protected 7-amino group with fewer chemical synthetic steps.
  • SUMMARY
  • A novel chemical process useful in the manufacture of cephalosporin compounds containing the chemical substructure of Formula (I) can include deprotection (i.e., removal of a nitrogen protecting group) and acylation of the 7-amino group in a single step rather than multiple steps. The invention is based in part on the surprising discovery that salicyladehyde imine derivatives according to formula (Ia) can be reacted with activated carboxylic acid derivatives (Ib) to yield 7-carboxamide compounds according to formula (I) in a single step. This outcome is surprising because the imine derivatives of formula (Ia) are stable to the reaction conditions in the absence of the activated carboxylic acid derivative.
  • Figure US20150111853A1-20150423-C00002
  • Accordingly, provided herein is a method for transforming a protected 7-amino group into a 7-carboxamide moiety comprising a single step.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 depicts a representative 7-carboxamide moiety and 7-amino group.
  • FIG. 2 depicts a prior art procedure (U.S. Pat. No. 5,134,138) comprising the deprotection of a protected 7-amino group followed by conversion of the 7-amino group into a 7-carboxamide moiety.
  • FIG. 3 depicts the full scan mass spectrum of compound (IV-1).
  • FIG. 4 depicts the product ion mass spectrum of compound (IV-1).
  • FIG. 5 depicts the full scan mass spectrum of compound (III-1).
  • FIG. 6 depicts the product ion mass spectrum of compound (III-1).
  • FIG. 7 depicts the full scan mass spectrum of compound (II-1).
  • FIG. 8 depicts the product ion mass spectrum of compound (II-1).
  • FIG. 9 depicts the full scan mass spectrum of ceftolozane trifluoroacetate.
  • FIG. 10 depicts the product ion mass spectrum of ceftolozane trifluoroacetate.
  • FIG. 11 depicts the HPLC chromatograms of Example 2.
  • DETAILED DESCRIPTION
  • Provided herein is a method for preparing a compound of formula (II), or a salt thereof, comprising the step of reacting a compound of formula (III), or a salt thereof, with a compound of formula (IV), or a salt thereof, under suitable conditions to form a compound of formula (II), or a salt thereof, wherein the compounds of formulas (II), (III) and (IV) are defined according to the variable values below.
  • Figure US20150111853A1-20150423-C00003
  • Variable R1
  • In certain embodiments, R1 is R1′—Z; wherein R1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; wherein Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, carboxamide, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′)2; and wherein Z′ is independently hydrogen or an oxygen protecting group.
  • In one embodiment, R1 is selected from the group consisting of aryl and heteroaryl moieties. In certain embodiments, R1 is a substituted or unsubstituted aryl or heteroaryl moiety selected from the group consisting of: thiophene, furan, thiazole, tetrazole, thiadiazole, pyridyl, phenyl, phenol, cyclohexadiene and dithietane. In a particular embodiment, R1 is selected from the group consisting of the following moieties:
  • Figure US20150111853A1-20150423-C00004
  • and salts thereof, wherein Z′ is defined above.
  • In a particular embodiment, R1 is
  • Figure US20150111853A1-20150423-C00005
  • and the compound of formula (II) has the structure of formula (IIa).
  • Figure US20150111853A1-20150423-C00006
  • Variable R2
  • In certain embodiments, R2 is selected from the group consisting of hydrogen and alkoxy. In another embodiment of the method, R2 is hydrogen, and the compound of formula (II) has the structure of formula (IIb).
  • Figure US20150111853A1-20150423-C00007
  • Variable Y
  • In certain embodiments, Y is selected from the group consisting of a bond, CH2, CH2S, SCH2, C═C(H)CH2CO2R′, CH(OR′), C═N(OR′), CHNR″2 and C═NR″; wherein R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO2R5; wherein R″ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R″ substituents may combine to form a ring or a single nitrogen protecting group; and wherein R5 is independently hydrogen or an oxygen protecting group.
  • In one embodiment of the method, Y is selected from a bond, CH2, CH2S and C═C(H)CH2CO2R′, and R′ is selected from the group consisting of hydrogen and an oxygen protecting group. In another embodiment, Y is C═N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH2CO2R5 and C(CH3)2CO2R5. In yet another embodiment, Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group. In still another embodiment, Y is CHNR″2 and R″ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
  • Figure US20150111853A1-20150423-C00008
  • In a particular embodiment, Y is C═N(OR′) and R′ is C(CH3)2CO2 tBu, and the compound of formula (II) has the structure of formula (IIc).
  • Figure US20150111853A1-20150423-C00009
  • Variable R3
  • In certain embodiments, R3 is selected from the group consisting of hydrogen and an oxygen protecting group. In another embodiment of the method, R3 is an oxygen protecting group selected from benzyl ethers. Benzyl ethers may be substituted (e.g., with one or more alkoxy substituents) or unsubstituted. In a particular embodiment, R3 is
  • Figure US20150111853A1-20150423-C00010
  • (i.e., 4-methoxybenzyl, PMB, MPM).
  • Variables R4 and R4′
  • R4 and R4′ are independently selected from the group consisting of halogen, —R6-R7, —CH2—R6-R7 and —CH═R7; wherein R6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl; wherein R7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NRaRb; wherein Ra and Rb are independently selected from the group consisting of hydrogen, alkyl, a nitrogen protecting group and C(O)NHRc; wherein Rc is an alkyl group or a heteroalkyl group; and wherein R4 and R4′ are optionally, independently substituted one or more times with an oxygen protecting group or a nitrogen protecting group.
  • In another embodiment of the method, R4 and R4′ are independently selected from the group consisting of hydrogen, chlorine, methyl, CH═CH—CH3, CH═CH2, CH2OC(O)CH3, CH2OC(O)NH2, CH2OCH3,
  • Figure US20150111853A1-20150423-C00011
  • wherein A, for each occurrence, is independently a pharmaceutically acceptable anion. In certain embodiments, Ais selected from chloride, acetate, trifluoroacetate and bisulfate. In a particular embodiment, Ais trifluoroacetate.
  • In a particular embodiment, R4 is
  • Figure US20150111853A1-20150423-C00012
  • In another particular embodiment, R4′ is
  • Figure US20150111853A1-20150423-C00013
  • Variable X
  • In certain embodiments, X is selected from the group consisting of halogen, —OC(O)R8 and —OSO2R8; wherein R8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl. In another embodiment of the method, X is —OSO2R8. In a particular embodiment, X is —OSO2CH3.
  • Methods of the Invention
  • In one aspect, provided herein is a method for preparing a compound of formula (II), or a salt thereof,
  • Figure US20150111853A1-20150423-C00014
  • comprising the step of reacting a compound of formula (III), or a salt thereof,
  • Figure US20150111853A1-20150423-C00015
  • with a compound of formula (IV), or a salt thereof,
  • Figure US20150111853A1-20150423-C00016
  • in a mixture comprising an organic solvent and water, to form a compound of formula (II), or a salt thereof; wherein:
  • R1 is R1′ —Z, wherein R1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; and Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, carboxamido, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′)2; and wherein Z′ is independently hydrogen or an oxygen protecting group;
  • Y is selected from the group consisting of a bond, CH2, CH2S, SCH2, C═C(H)CH2CO2R′, CH(OR′), C═N(OR′), CHNR″2 and C═NR″; wherein R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO2R5, and wherein R5 is independently hydrogen or an oxygen protecting group; and wherein R″ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R″ substituents may combine to form a ring or a single nitrogen protecting group;
  • R2 is selected from the group consisting of hydrogen and alkoxy;
  • R3 is selected from the group consisting of hydrogen and an oxygen protecting group; and
  • R4 and R4′ are each independently selected from the group consisting of halogen, —R6-R7, —CH2—R6-R7 and —CH═R7; wherein R4 and R4′ are optionally, independently substituted one or more times with an oxygen protecting group or a nitrogen protecting group;
  • R6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl;
  • R7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NRaRb; wherein
  • Ra and Rb are independently selected from the group consisting of hydrogen, alkyl and C(O)NHRc;
  • Rc is alkyl or heteroalkyl; and wherein
  • X is selected from the group consisting of halogen, —OC(O)R8 and —OSO2R8, wherein R8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • In one embodiment of the method, R1 is selected from the group consisting of:
  • Figure US20150111853A1-20150423-C00017
  • In another embodiment of the method, R2 is hydrogen.
  • In another embodiment of the method, Y is selected from a bond, CH2, CH2S and C═C(H)CH2CO2R′ and R′ is selected from the group consisting of hydrogen and an oxygen protecting group, or wherein Y is C═N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH2CO2R5 and C(CH3)2CO2R5 and R5 is hydrogen or an oxygen protecting group, or wherein Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group, or wherein Y is CHNR″2 and R″ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
  • Figure US20150111853A1-20150423-C00018
  • In another embodiment of the method, R3 is an oxygen protecting group that is a benzyl ether. In a particular embodiment, R3 is paramethoxybenzyl (PMB).
  • In another embodiment of the method, R4 and R4′ are selected from the group consisting of hydrogen, chlorine, methyl, CH═CH—CH3, CH═CH2, CH2OC(O)CH3, CH2OC(O)NH2, CH2OCH3,
  • Figure US20150111853A1-20150423-C00019
  • wherein each occurrence of Ais independently an anion.
  • In another aspect, provided herein is a method for preparing a compound of formula (II), or a salt thereof,
  • Figure US20150111853A1-20150423-C00020
  • comprising the step of reacting a compound of formula (III), or a salt thereof,
  • Figure US20150111853A1-20150423-C00021
  • with a compound of formula (IV), or a salt thereof,
  • Figure US20150111853A1-20150423-C00022
  • in a mixture comprising an organic solvent and water, to form a compound of formula (II), or a salt thereof; wherein:
  • R1 is selected from the group consisting of:
  • Figure US20150111853A1-20150423-C00023
  • wherein Z′ is independently hydrogen or an oxygen protecting group;
  • Y is selected from the group consisting of:
  • —CH2—,
  • Figure US20150111853A1-20150423-C00024
  • wherein R′ is selected from the group consisting of hydrogen and an oxygen protecting group;
  • R2 is hydrogen;
  • R3 is selected from the group consisting of hydrogen and an oxygen protecting group; and
  • R4 and R4′ are each independently selected from the group consisting of:
  • Figure US20150111853A1-20150423-C00025
  • and —CH═CH2,
  • wherein each occurrence of Ais independently an anion, and
  • X is —OSO2R8, wherein R8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • In one embodiment of the above methods, further comprises the step of reacting the compound of formula (II), or a salt thereof, with a strong acid to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2. The strong acid can be a Bronsted acid (e.g., trifluoroacetic acid, hydrochloric acid), or a Lewis acid (e.g., TiCl4). In a particular embodiment, the strong acid is trifluoroacetic acid.
  • Also provided herein are particular embodiments of the method (a)-(h), wherein:
  • (a) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00026
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00027
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00028
  • (b) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00029
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00030
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00031
  • (c) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00032
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00033
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00034
  • (d) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00035
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00036
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00037
  • (e) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00038
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00039
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00040
  • (f) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00041
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00042
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00043
  • (g) wherein the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00044
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00045
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00046
  • and
  • (h) the compound of formula (III) has the structure:
  • Figure US20150111853A1-20150423-C00047
      • the compound of formula (II) has the structure:
  • Figure US20150111853A1-20150423-C00048
  • and
      • the compound of formula (V) has the structure:
  • Figure US20150111853A1-20150423-C00049
  • Compositions
  • In another aspect, provided herein is a composition comprising the compound of formula (V), or salt a thereof, and one or more compound selected from the group consisting of: the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof. In one embodiment, the composition comprises the compound of formula (V), or salt a thereof, the compound of formula (I) or salt a thereof, the compound of formula (Ia) or salt a thereof, and the compound of formula (Ib) or salt a thereof. In another embodiment of the composition, the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof, are present, if at all, in an amount that is less than or equal to 0.05% w/w. In yet another embodiment of the composition, the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof, are present, if at all, in an amount that is less than or equal to 0.05 mol %. In another aspect, provided herein is a method of treating a bacterial infection in a patient, comprising the step of administering a composition as described above.
  • In still another aspect, provided herein is a composition comprising a compound of formula (V), or a salt thereof, selected from the compounds of Table 2, or salts thereof, prepared according to a method described herein. Provided herein are particular embodiments of the composition (i)-(p), wherein:
  • (i) the compound of formula (V-1), or a salt thereof:
  • Figure US20150111853A1-20150423-C00050
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00051
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00052
  • or a salt thereof;
  • (j) the compound of formula (V-2), or a salt thereof:
  • Figure US20150111853A1-20150423-C00053
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00054
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00055
  • or a salt thereof;
  • (k) the compound of formula (V-3), or a salt thereof:
  • Figure US20150111853A1-20150423-C00056
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00057
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00058
  • or a salt thereof;
  • (I) the compound of formula (V-5), or a salt thereof:
  • Figure US20150111853A1-20150423-C00059
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00060
  • , or a salt thereof; and
  • Figure US20150111853A1-20150423-C00061
  • or a salt thereof;
  • (m) the compound of formula (V-6), or a salt thereof:
  • Figure US20150111853A1-20150423-C00062
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00063
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00064
  • or a salt thereof;
  • (n) the compound of formula (V-9), or a salt thereof:
  • Figure US20150111853A1-20150423-C00065
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00066
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00067
  • or a salt thereof;
  • (o) the compound of formula (V-26), or a salt thereof:
  • Figure US20150111853A1-20150423-C00068
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00069
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00070
  • or a salt thereof; and
  • (p) the compound of formula (V-16), or a salt thereof:
  • Figure US20150111853A1-20150423-C00071
  • and
      • 0.3-0.5% of one or more compound selected from:
  • Figure US20150111853A1-20150423-C00072
  • or a salt thereof; and
  • Figure US20150111853A1-20150423-C00073
  • or a salt thereof.
  • Uses and Methods of Treatment
  • In another aspect, provided herein is a method of treating a bacterial infection in a patient, comprising the step of administering to the patient a composition of embodiments (i)-(p). In another aspect, provided herein is a composition of embodiments (i)-(p) for use in the treatment of a bacterial infection in a patient. In another aspect, provided herein is the use of a composition of embodiments (i)-(p) for the manufacture of a medicament for the treatment of a bacterial infection in a patient.
  • In another aspect, provided herein is a composition comprising two or more compounds selected from the group consisting of:
  • (a) the compound of formula (II-1), or a salt thereof
  • Figure US20150111853A1-20150423-C00074
  • (b) the compound of formula (III-1), or a salt thereof
  • Figure US20150111853A1-20150423-C00075
  • (c) the compound of formula (IIIc), or a salt thereof
  • Figure US20150111853A1-20150423-C00076
  • (d) the compound of formula (IV-1), or a salt thereof
  • Figure US20150111853A1-20150423-C00077
  • and
  • (e) the compound of formula (IVb), or a salt thereof
  • Figure US20150111853A1-20150423-C00078
  • In one embodiment, the composition further comprises the compound having the structure:
  • Figure US20150111853A1-20150423-C00079
  • or a salt thereof.
  • Compounds of the Invention
  • Provided herein is a compound having the structure:
  • Figure US20150111853A1-20150423-C00080
  • wherein A is an anion.
  • Also provided herein is a compound having the structure:
  • Figure US20150111853A1-20150423-C00081
  • wherein X is selected from the group consisting of halogen, —OC(O)R8 and —OSO2R8, wherein R8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
  • Particular embodiments of the compounds of formulas (II), (III) and (IV) are listed in Table 1. For example, in the synthesis of the antibiotic compound ceftolozane, the compounds of formulas (II), (III) and (IV) can have the structures of formulas (II-1), (III-1) and (IV-1), respectively.
  • Figure US20150111853A1-20150423-C00082
  • In one embodiment, the compound of formula (IV-1) is prepared from the compound of formula (IVa):
  • Figure US20150111853A1-20150423-C00083
  • by a process comprising the steps of: (a) forming a mixture comprising potassium carbonate and the compound of formula (IVa); and (b) adding methansulfonyl chloride to the mixture of step (a) such that the compound of formula (IV-1) is formed.
  • Synthesis
  • In one embodiment of the method, the suitable conditions comprise reacting in a mixture comprising an organic solvent and water. Organic solvents can be selected from the group consisting of aromatic solvents, aliphatic solvents, halogenated solvents, halogenated aromatic solvents, halogenated aliphatic solvents, ethers, halogenated ethers, esters and amides. In a particular embodiment, the organic solvent is selected from halogenated solvents. In another particular embodiment, the organic solvent is dichloromethane.
  • In another embodiment of the method, the suitable conditions comprise reacting in a mixture comprising an organic solvent and about 6-9 percent (w/w) water relative to the compound of formula (III), or salt thereof. In a particular embodiment, the suitable conditions comprise reaction in a mixture comprising an organic solvent and about 6-8 percent (w/w) water relative to the compound of formula (III), or salt thereof. In still another embodiment, the suitable conditions comprise reacting in a mixture comprising dichloromethane and about 6-9 percent of water relative to the compound of formula (III), or salt thereof.
  • Notably, the compound of formula (III) is hydrolytically stable under the reaction conditions, in the absence of the compound of formula (IV). As shown in FIG. 11 and described in Example 2, compound (III-1) was combined with dichloromethane and water in the same relative amounts as in Example 1. Upon stirring for four hours, no hydrolysis of (III-1) was observed. In contrast, under the same solvent, temperature and time conditions, but in the presence of compound (IV-1), compound (III-1) reacts to form compound (II-1).
  • In some embodiments, the method further comprises the step of reacting the compound of formula (II), or a salt thereof, under suitable conditions to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2, or salts thereof. In some embodiments, the suitable conditions comprise reacting the compound of formula (II) with strong acid. In a particular embodiment, the strong acid is trifluoroacetic acid.
  • DEFINITIONS
  • Pharmaceutically acceptable salts are known to those of skill in the art. In some of the embodiments described herein, the compounds of formulas (II) and (III) are trifluoroacetate salts.
  • Oxygen and nitrogen protecting groups are known to those of skill in the art. Oxygen protecting groups include, but are not limited to methyl ethers, substituted methyl ethers (e.g., MOM (methoxymethyl ether), MTM (methylthiomethyl ether), BOM (benzyloxymethyl ether), PMBM or MPM (p-methoxybenzyloxymethyl ether), to name a few), substituted ethyl ethers, substituted benzyl ethers, silyl ethers (e.g., TMS (trimethylsilyl ether), TES (triethylsilylether), TIPS (triisopropylsilyl ether), TBDMS (t-butyldimethylsilyl ether), tribenzyl silyl ether, TBDPS (t-butyldiphenyl silyl ether), to name a few), esters (e.g., formate, acetate, benzoate (Bz), trifluoroacetate, dichloroacetate, to name a few), carbonates, cyclic acetals and ketals. Nitrogen protecting groups include, but are not limited to, carbamates (including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
  • Exemplary anions include, but are not limited to, carboxylates (e.g., acetate, benzoate, trifluoroacetate), halides (e.g., chloride, bromide, iodide), sulfate (e.g., monosulfate, bisulfate) and phosphate (e.g., monophosphate).
  • In some embodiments, alkyl groups and groups comprising an alkyl group (e.g., alkoxy, alkanoyl, alkylamino, aminoalkyl, heteroalkyl) comprise 1-6 carbon atoms. In some embodiments, aryl groups and groups comprising aryl groups (e.g., aroyl) comprise 6-12 carbon atoms. In some embodiments, heteroaryl groups and groups comprising heteroaryl groups (e.g., heteroaroyl) comprise 1-10 carbon atoms and 1-4 heteroatoms selected from oxygen, nitrogen and sulfur.
  • TABLE 1
    Formula (II) Formula (III) Formula (IV)
     1
    Figure US20150111853A1-20150423-C00084
    Figure US20150111853A1-20150423-C00085
    Figure US20150111853A1-20150423-C00086
     2
    Figure US20150111853A1-20150423-C00087
    Figure US20150111853A1-20150423-C00088
    Figure US20150111853A1-20150423-C00089
     3
    Figure US20150111853A1-20150423-C00090
    Figure US20150111853A1-20150423-C00091
    Figure US20150111853A1-20150423-C00092
     4
    Figure US20150111853A1-20150423-C00093
    Figure US20150111853A1-20150423-C00094
    Figure US20150111853A1-20150423-C00095
     5
    Figure US20150111853A1-20150423-C00096
    Figure US20150111853A1-20150423-C00097
    Figure US20150111853A1-20150423-C00098
     6
    Figure US20150111853A1-20150423-C00099
    Figure US20150111853A1-20150423-C00100
    Figure US20150111853A1-20150423-C00101
     7
    Figure US20150111853A1-20150423-C00102
    Figure US20150111853A1-20150423-C00103
    Figure US20150111853A1-20150423-C00104
     8
    Figure US20150111853A1-20150423-C00105
    Figure US20150111853A1-20150423-C00106
    Figure US20150111853A1-20150423-C00107
     9
    Figure US20150111853A1-20150423-C00108
    Figure US20150111853A1-20150423-C00109
    Figure US20150111853A1-20150423-C00110
    10
    Figure US20150111853A1-20150423-C00111
    Figure US20150111853A1-20150423-C00112
    Figure US20150111853A1-20150423-C00113
    11
    Figure US20150111853A1-20150423-C00114
    Figure US20150111853A1-20150423-C00115
    Figure US20150111853A1-20150423-C00116
    12
    Figure US20150111853A1-20150423-C00117
    Figure US20150111853A1-20150423-C00118
    Figure US20150111853A1-20150423-C00119
    13
    Figure US20150111853A1-20150423-C00120
    Figure US20150111853A1-20150423-C00121
    Figure US20150111853A1-20150423-C00122
    14
    Figure US20150111853A1-20150423-C00123
    Figure US20150111853A1-20150423-C00124
    Figure US20150111853A1-20150423-C00125
    15
    Figure US20150111853A1-20150423-C00126
    Figure US20150111853A1-20150423-C00127
    Figure US20150111853A1-20150423-C00128
    16
    Figure US20150111853A1-20150423-C00129
    Figure US20150111853A1-20150423-C00130
    Figure US20150111853A1-20150423-C00131
    17
    Figure US20150111853A1-20150423-C00132
    Figure US20150111853A1-20150423-C00133
    Figure US20150111853A1-20150423-C00134
    18
    Figure US20150111853A1-20150423-C00135
    Figure US20150111853A1-20150423-C00136
    Figure US20150111853A1-20150423-C00137
    19
    Figure US20150111853A1-20150423-C00138
    Figure US20150111853A1-20150423-C00139
    Figure US20150111853A1-20150423-C00140
    20
    Figure US20150111853A1-20150423-C00141
    Figure US20150111853A1-20150423-C00142
    Figure US20150111853A1-20150423-C00143
    21
    Figure US20150111853A1-20150423-C00144
    Figure US20150111853A1-20150423-C00145
    Figure US20150111853A1-20150423-C00146
    22
    Figure US20150111853A1-20150423-C00147
    Figure US20150111853A1-20150423-C00148
    Figure US20150111853A1-20150423-C00149
    23
    Figure US20150111853A1-20150423-C00150
    Figure US20150111853A1-20150423-C00151
    Figure US20150111853A1-20150423-C00152
    24
    Figure US20150111853A1-20150423-C00153
    Figure US20150111853A1-20150423-C00154
    Figure US20150111853A1-20150423-C00155
    25
    Figure US20150111853A1-20150423-C00156
    Figure US20150111853A1-20150423-C00157
    Figure US20150111853A1-20150423-C00158
    26
    Figure US20150111853A1-20150423-C00159
    Figure US20150111853A1-20150423-C00160
    Figure US20150111853A1-20150423-C00161
    27
    Figure US20150111853A1-20150423-C00162
    Figure US20150111853A1-20150423-C00163
    Figure US20150111853A1-20150423-C00164
    28
    Figure US20150111853A1-20150423-C00165
    Figure US20150111853A1-20150423-C00166
    Figure US20150111853A1-20150423-C00167
    29
    Figure US20150111853A1-20150423-C00168
    Figure US20150111853A1-20150423-C00169
    Figure US20150111853A1-20150423-C00170
    30
    Figure US20150111853A1-20150423-C00171
    Figure US20150111853A1-20150423-C00172
    Figure US20150111853A1-20150423-C00173
    31
    Figure US20150111853A1-20150423-C00174
    Figure US20150111853A1-20150423-C00175
    Figure US20150111853A1-20150423-C00176
    32
    Figure US20150111853A1-20150423-C00177
    Figure US20150111853A1-20150423-C00178
    Figure US20150111853A1-20150423-C00179
  • TABLE 2
    Formula (V)
    V-1 
    Figure US20150111853A1-20150423-C00180
    V-2 
    Figure US20150111853A1-20150423-C00181
    V-3 
    Figure US20150111853A1-20150423-C00182
    V-4 
    Figure US20150111853A1-20150423-C00183
    V-5 
    Figure US20150111853A1-20150423-C00184
    V-6 
    Figure US20150111853A1-20150423-C00185
    V-7 
    Figure US20150111853A1-20150423-C00186
    V-8 
    Figure US20150111853A1-20150423-C00187
    V-9 
    Figure US20150111853A1-20150423-C00188
    V-10
    Figure US20150111853A1-20150423-C00189
    V-11
    Figure US20150111853A1-20150423-C00190
    V-12
    Figure US20150111853A1-20150423-C00191
    V-13
    Figure US20150111853A1-20150423-C00192
    V-14
    Figure US20150111853A1-20150423-C00193
    V-15
    Figure US20150111853A1-20150423-C00194
    V-16
    Figure US20150111853A1-20150423-C00195
    V-17
    Figure US20150111853A1-20150423-C00196
    V-18
    Figure US20150111853A1-20150423-C00197
    V-19
    Figure US20150111853A1-20150423-C00198
    V-20
    Figure US20150111853A1-20150423-C00199
    V-21
    Figure US20150111853A1-20150423-C00200
    V-22
    Figure US20150111853A1-20150423-C00201
    V-23
    Figure US20150111853A1-20150423-C00202
    V-24
    Figure US20150111853A1-20150423-C00203
    V-25
    Figure US20150111853A1-20150423-C00204
    V-26
    Figure US20150111853A1-20150423-C00205
    V-27
    Figure US20150111853A1-20150423-C00206
    V-28
    Figure US20150111853A1-20150423-C00207
    V-29
    Figure US20150111853A1-20150423-C00208
    V-30
    Figure US20150111853A1-20150423-C00209
    V-31
    Figure US20150111853A1-20150423-C00210
    V-32
    Figure US20150111853A1-20150423-C00211
  • EXAMPLES Materials and Instrumentation
  • Compound characterization was obtained by high resolution mass spectrometry (HRMS) and high resolution mass spectrometry/mass spectrometry (HR MS/MS). Samples were dissolved in solution and the sample solutions were directly infused into time-of-flight (TOF) mass spectrometer to obtain parent (MS) and product scans (MS/MS) of analyte. Suitable materials and instrumentation are known to persons of skill in the art.
  • Example 1 Synthesis of Compound (V-1) (1) Synthesis of compound (IV-1): (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic methanesulfonic anhydride
  • Figure US20150111853A1-20150423-C00212
  • A 5.0 liter reactor was charged with N,N-dimethylacetamide (1.4 L). Solid (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic acid (250 g, 1 eq., prepared according to the method disclosed in U.S. Pat. No. 7,129,232) was added to the reactor at ambient temperature and the mixture was stirred until the solid was dissolved. The solution was cooled to about 4° C. (target: 2-5° C.) and stirred for another 10-15 minutes. Potassium carbonate (106.7 g, 184.9 mmol, 1.1 eq.) was added to the reactor in one portion. Methanesulfonyl chloride (118.0 mL, 2.2 eq.) was added to the reactor at a rate of about 5 mL/min while maintaining the batch temperature <10° C. The reaction was stirred for 1-2 hours at about 6° C., then cooled to about 0-5° C. Ethyl acetate (2.5 L, 10 volumes) was added to the reactor while maintaining a temperature of about 0-5° C. 1.6% HCl (aq) (1.35 L) was added to the reactor, maintaining a temperature of about 10-15° C. The biphasic mixture was agitated and the layers were then separated. The organic layer was washed with sodium chloride solution, dried with sodium sulfate and concentrated under reduced pressure to obtain crude material. The crude material was dissolved in ethyl acetate (150 mL) and filtered over silica gel. The filtrate was concentrated under reduced pressure to yield the title compound (299 g, 96.7%) as a colorless solid. Exact Mass: 408.08. HRMS: 409.0846 (M+1).
  • (2) Synthesis of compound (III-1): 5-amino-4-(3-(2-((tert-butoxycarbonyl)amino)ethyl)ureido)-2-(((6R,7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)-1-methyl-1H-pyrazol-2-ium trifluoroacetate
  • Figure US20150111853A1-20150423-C00213
  • Compound (III-1) was prepared by coupling the compound (6R,7R)-4-methoxybenzyl 3-(chloromethyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (purchased from Nippon Chemicals, Japan) with the compound tert-butyl (2-(3-(1-methyl-5-(tritylamino)-1H-pyrazol-4-yl)ureido)ethyl)carbamate (UBT, prepared according to the method disclosed in U.S. Pat. No. 7,129,232).
  • In a reactor, UBT (274 g) was dissolved in 1 L of N-methylpyrrolidone (NMP) at 35-45° C. The solution was cooled to 15-20° C. SCLE (200 g) was added to the solution and stirred until it was completely dissolved. Then added 104 mL of N,O-Bis(trimethylsilyl)acetamide (BSA) dropwise in 30 minutes, followed by addition of 98.2 g potassium iodide (KI) in 6-8 portions, and maintained the temperature between 20-25° C. The resulting mixture was stirred at 15-25° C. for about 45-50 hours. The forgoing solution was then slowly added to 5% sodium triflouro acetate (4 L) at room temperature in 3 hours and precipitates were formed. The slurry was filtered and washed with 2 L deionized water for 4 times, and 4 L of heptanes for 3 times. The wet cake was dried under nitrogen with vacuum until it reached a constant weight. The resulting compound (III-1) was isolated as a light yellow solid (569 g, 86.5%). Exact Mass (-TFA):977.40. HRMS:977.4025 (M+).
  • (3) Synthesis of compound (II-1): 5-amino-2-(((6R,7R)-7-((Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetamido)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)-4-(3-(2-((tert-butoxycarbonyl)amino)ethyl)ureido)-1-methyl-1H-pyrazol-2-ium trifluoroacetate
  • Figure US20150111853A1-20150423-C00214
  • A reactor was charged with compound (III-1) (150 g), water (11.25 mL), compound (IV-1) (60 g), and dichloromethane (265 mL). The mixture was stirred for three hours at room temperature, then added to methyl tertiary butyl ether (1.5 L) over the course of 2-3 hours, resulting in the formation of a solid. The solid was filtered and the filter cake was washed with additional methyl tertiary butyl ether (1.0 L). The solid was dried under vacuum to yield the title compound (142.1 g, 81.2%). Exact Mass: 943.36 (-TFA). HRMS: 943.3555 (M+).
  • (4) Synthesis of Ceftolozane Trifluoroacetate
  • Figure US20150111853A1-20150423-C00215
  • Compound (II-1) was dissolved in dichloromethane. Trifluoroacetic acid and anisole were added and the reaction was stirred for about 3 hours. Methyl tertiary butyl ether was added, causing the formation of a precipitate. The precipitate was collected by filtration and dried under vacuum to yield the title compound. Exact Mass (−TFA): 667.18. HRMS: 667.1810 (M+).
  • (5) Synthesis of Compound (V-1)
  • Figure US20150111853A1-20150423-C00216
  • Ceftolozane trifluoroacetate (5 g) was dissolved in water (40 mL) and filtered. The solution was purified by HPLC using a Waters Sunfire C18 (50×100 mm, 5 μm) column with an eluent comprising Solvent A: acetonitrile+0.08% sulfuric acid (v/v) and Solvent B: water+0.08% sulfuric acid (v/v).
  • Example 2 Compound (III-1) (2.12 g) was dissolved in dichloromethane (3.75 ml). Water (160 μL) was added and the mixture was stirred for four hours, with hourly monitoring by HPLC Example 3 Synthesis of (6R,7R)-7-((Z)-2-(ethoxyimino)-2-(5-(phosphonoamino)-1,2,4-thiadiazol-3-yl)acetamido)-3-((4-(1-methylpyridin-1-ium-4-yl)thiazol-2-yl)thio)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate
  • Figure US20150111853A1-20150423-C00217
  • A reactor is charged with 4-(2-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)thio)thiazol-4-yl)-1-methylpyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-(phosphonoamino)-1,2,4-thiadiazol-3-yl)-2-(ethoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 4 Synthesis of (6R,7R)-7((Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(hydroxyimino)acetamido)-8-oxo-3-((E)-((R)-2-oxo-[1,3′-bipyrrolidin]-3-ylidene)methyl)-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid
  • Figure US20150111853A1-20150423-C00218
  • A reactor is charged with (7R)-4-methoxybenzyl-3-((E)-((R)-1′-(tert-butoxycarbonyl)-2-oxo-[1,3′-bipyrrolidin]-3-ylidene)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((4-methoxybenzyl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 5 Synthesis of (6R,7R)-7-((Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((2-carboxypropan-2-yl)oxy)imino)acetamido)-8-oxo-3-(pyridin-1-ium-1-ylmethyl)-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate
  • Figure US20150111853A1-20150423-C00219
  • A reactor is charged with 1-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)pyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 6 Synthesis of (6R,7R)-7-((Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetamido)-3-((1-methylpyrrolidin-1-ium-1-yl)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate
  • Figure US20150111853A1-20150423-C00220
  • A reactor is charged with 1-(((6R,7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)-1-methylpyrrolidin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 7 Synthesis of (6R,7R)-7-(2-(1H-tetrazol-1-yl)acetamido)-3-(((5-methyl-1,3,4-thiadiazol-2-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid
  • Figure US20150111853A1-20150423-C00221
  • A reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-(((5-methyl-1,3,4-thiadiazol-2-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), 2-(1H-tetrazol-1-yl)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 8 Synthesis of (6R,7R)-7-((Z)-2-(2-aminothiazol-4-yl)-2-((carboxymethoxy)imino)acetamido)-8-oxo-3-vinyl-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid
  • Figure US20150111853A1-20150423-C00222
  • A reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-3-vinyl-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-((2-(tert-butoxy)-2-oxoethoxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.
  • Example 9 Synthesis of (6R,7R)-7-((Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetamido)-3-(((2-methyl-5,6-dioxo-1,2,5,6-tetrahydro-1,2,4-triazin-3-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid
  • Figure US20150111853A1-20150423-C00223
  • A reactor is charged with (6R,7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-(((2-methyl-5,6-dioxo-1,2,5,6-tetrahydro-1,2,4-triazin-3-yl)thio)methyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The filtered solid is deprotected using conventional methods and dried under vacuum to yield the title compound.

Claims (8)

1-13. (canceled)
14. A composition comprising a compound of formula (V), or a salt thereof, selected from the compounds of Table 2, or salts thereof, prepared according to the method of claim 5.
15. The composition of claim 14, comprising:
(a) the compound of formula (V-1), or a salt thereof:
Figure US20150111853A1-20150423-C00224
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00225
or a salt thereof; and
Figure US20150111853A1-20150423-C00226
or a salt thereof; or
(b) the compound of formula (V-2), or a salt thereof:
Figure US20150111853A1-20150423-C00227
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00228
or a salt thereof; and
Figure US20150111853A1-20150423-C00229
or a salt thereof; or
(c) the compound of formula (V-3), or a salt thereof:
Figure US20150111853A1-20150423-C00230
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00231
or a salt thereof; and
Figure US20150111853A1-20150423-C00232
or a salt thereof; or
(d) the compound of formula (V-5), or a salt thereof:
Figure US20150111853A1-20150423-C00233
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00234
or a salt thereof; and
Figure US20150111853A1-20150423-C00235
or a salt thereof; or
(e) the compound of formula (V-6), or a salt thereof:
Figure US20150111853A1-20150423-C00236
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00237
or a salt thereof; and
Figure US20150111853A1-20150423-C00238
or a salt thereof; or
(f) the compound of formula (V-9), or a salt thereof:
Figure US20150111853A1-20150423-C00239
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00240
or a salt thereof; and
Figure US20150111853A1-20150423-C00241
or a salt thereof; or
(g) the compound of formula (V-26), or a salt thereof:
Figure US20150111853A1-20150423-C00242
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00243
or a salt thereof; and
Figure US20150111853A1-20150423-C00244
or a salt thereof; or
(h) the compound of formula (V-16), or a salt thereof:
Figure US20150111853A1-20150423-C00245
and 0.3-0.5% of one or more compound selected from:
Figure US20150111853A1-20150423-C00246
or a salt thereof; and
Figure US20150111853A1-20150423-C00247
or a salt thereof.
16. A method of treating a bacterial infection in a patient, comprising the step of administering to the patient a composition of claim 15.
17. A composition comprising two or more compounds selected from the group consisting of:
the compound of formula (II-1), or a salt thereof
Figure US20150111853A1-20150423-C00248
the compound of formula (III-1), or a salt thereof
Figure US20150111853A1-20150423-C00249
the compound of formula (IIc), or a salt thereof
Figure US20150111853A1-20150423-C00250
the compound of formula (IV-1), or a salt thereof
Figure US20150111853A1-20150423-C00251
and the compound of formula (IVb), or a salt thereof
Figure US20150111853A1-20150423-C00252
18. The composition of claim 17, further comprising the compound having the structure:
Figure US20150111853A1-20150423-C00253
or a salt thereof.
19. A compound selected from formula (III-1) and formula (IV-1):
Figure US20150111853A1-20150423-C00254
20-21. (canceled)
US14/521,421 2013-03-14 2014-10-22 Cephalosporin compositions and methods of manufacture Abandoned US20150111853A1 (en)

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