US20130292584A1 - Optical element for transmitting ultraviolet light and light source device including same - Google Patents
Optical element for transmitting ultraviolet light and light source device including same Download PDFInfo
- Publication number
- US20130292584A1 US20130292584A1 US13/655,665 US201213655665A US2013292584A1 US 20130292584 A1 US20130292584 A1 US 20130292584A1 US 201213655665 A US201213655665 A US 201213655665A US 2013292584 A1 US2013292584 A1 US 2013292584A1
- Authority
- US
- United States
- Prior art keywords
- layer
- refractive index
- optical element
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 229910052594 sapphire Inorganic materials 0.000 claims abstract description 9
- 239000010980 sapphire Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 11
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 4
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229910001751 gemstone Inorganic materials 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
Definitions
- the present disclosure relates to optical elements, and particularly, to an optical element for transmitting ultraviolet light and a light source device including the optical element.
- Sapphires have excellent hardness and wear-resistance, and are used in optics and machinery.
- the sapphire can be used as a cover glass to protect an ultraviolet light source as it transmits ultraviolet light.
- the transmissivity of the sapphire at ultraviolet wavelengths is unsatisfactory.
- FIG. 1 is a cross-sectional schematic view of an optical element in accordance with an exemplary embodiment.
- FIG. 2 is a spectrum chart of the optical element of FIG. 1 .
- FIG. 3 is a cross-sectional schematic view of a light source device using the optical element of FIG. 1 .
- an optical element 100 is configured to transmit ultraviolet light and visible light.
- the optical element 100 includes a substrate 10 and a film 20 formed on the substrate 10 .
- the substrate 10 is plated shaped and is made of sapphire.
- Sapphire is a gemstone variety of the mineral corundum and has a hexagonal crystal structure.
- the main chemical component of sapphire is aluminum oxide (Al 2 O 3 ), and the refractive index of the sapphire is from about 1.762 to about 1.770.
- a transmissivity of the substrate 10 at ultraviolet wavelengths from about 190 nm to about 280 nm (UVC) is lower than 84%
- at ultraviolet wavelengths from about 280 nm to about 315 nm (UVB) is lower than 85%
- at ultraviolet wavelengths from about 315 nm to about 400 nm (UVA) is lower than 86%.
- the substrate 10 includes a first surface 11 and a second surface 12 opposite to the first surface 11 .
- the film 20 is configured to increase the transmissivity of the substrate 10 at the ultraviolet lights and is coated on the substrate 10 by a sputter method or an evaporation method.
- the film 20 includes a number of high refractive index layers and a number of low refractive index layers alternately stacked on the substrate 10 .
- the material of the high refractive index layer can be hafnium oxide (HfO 2 ), and the refractive index of HfO 2 is from about 2.0 to about 2.15.
- the material of the low refractive index layer can magnesium fluoride (MgF 2 ) or silicon dioxide (SiO 2 ), and the refractive index of MgF 2 is 1.38 and the refractive index of SiO 2 is from about 1.46 to about 1.49.
- the film 20 is coated on the first surface 11 of the substrate 10 .
- the high refractive index layer and the low refractive index layer can choose other materials.
- the film 20 is stacked by a first layer and a second layer in an order facing away from the first surface 11 .
- the first layer is the high refractive index layer
- the second layer is the low refractive index layer.
- the thickness of the first layer is about 70 ⁇ 8 nm
- the thickness of the second layer is about 50 ⁇ 8 nm.
- the thickness of the first layer is about 70.98 nm
- the thickness of the second layer is about 50.53 nm. It should be understood that the number of layers and the material of each layer of the film 20 can be changed according to actual requirements.
- the film 20 is stacked by a first layer and a second layer in an order facing away from the first surface 11 .
- the first layer is the high refractive index layer
- the second layer is the low refractive index layer.
- the thickness of the first layer is about 62 ⁇ 8 nm
- the thickness of the second layer is about 42 ⁇ 8 nm.
- the thickness of the first layer is about 62.68 nm
- the thickness of the second layer is about 42.97 nm. It should be understood that the number of layers and the material of each layer of the film 20 can be changed according to actual requirements.
- a graph showing a spectrum of the optical element 100 is illustrated.
- the transmissivity of the optical element 100 at the ultraviolet wavelengths from about 190 nm to about 280 nm (UVC) is greater than 90%.
- the transmissivity of the optical element 100 at the ultraviolet wavelengths from about 280 nm to about 315 nm (UVB) is greater than 98%.
- the transmissivity of the optical element 100 at the ultraviolet wavelengths from about 315 nm to about 400 nm (UVA) is greater than 96%.
- a light source device 200 includes the optical element 100 and an ultraviolet light lamp 110 .
- the ultraviolet light lamp 110 emits ultraviolet lights at wavelengths from about 190 nm to about 400 nm.
- the optical element 100 is substantially cylindrical-shaped, the ultraviolet light lamp 110 is received in the optical element 100 , and thus the ultraviolet light lamp 110 is protected from being damaged by the optical element 100 .
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Abstract
An optical element includes a substrate and a film on the substrate. The substrate made of sapphire. The film is configured for increasing transmission of ultraviolet lights. The film is stacked by a plurality of high refractive index layers and a plurality of low refractive index layers alternately stacked on the substrate.
Description
- 1. Technical Field
- The present disclosure relates to optical elements, and particularly, to an optical element for transmitting ultraviolet light and a light source device including the optical element.
- 2. Description of Related Art
- Sapphires have excellent hardness and wear-resistance, and are used in optics and machinery. The sapphire can be used as a cover glass to protect an ultraviolet light source as it transmits ultraviolet light. However, the transmissivity of the sapphire at ultraviolet wavelengths is unsatisfactory.
- Therefore, it is desirable to provide an optical element and a light source device, which can overcome the limitations described.
-
FIG. 1 is a cross-sectional schematic view of an optical element in accordance with an exemplary embodiment. -
FIG. 2 is a spectrum chart of the optical element ofFIG. 1 . -
FIG. 3 is a cross-sectional schematic view of a light source device using the optical element ofFIG. 1 . - Embodiments of the disclosure will be described with reference to the drawings.
- Referring to
FIG. 1 , anoptical element 100, according to an exemplary embodiment, is configured to transmit ultraviolet light and visible light. Theoptical element 100 includes asubstrate 10 and afilm 20 formed on thesubstrate 10. - The
substrate 10 is plated shaped and is made of sapphire. Sapphire is a gemstone variety of the mineral corundum and has a hexagonal crystal structure. The main chemical component of sapphire is aluminum oxide (Al2O3), and the refractive index of the sapphire is from about 1.762 to about 1.770. A transmissivity of thesubstrate 10 at ultraviolet wavelengths from about 190 nm to about 280 nm (UVC) is lower than 84%, at ultraviolet wavelengths from about 280 nm to about 315 nm (UVB) is lower than 85%, and at ultraviolet wavelengths from about 315 nm to about 400 nm (UVA) is lower than 86%. Thesubstrate 10 includes afirst surface 11 and asecond surface 12 opposite to thefirst surface 11. - The
film 20 is configured to increase the transmissivity of thesubstrate 10 at the ultraviolet lights and is coated on thesubstrate 10 by a sputter method or an evaporation method. Thefilm 20 includes a number of high refractive index layers and a number of low refractive index layers alternately stacked on thesubstrate 10. The material of the high refractive index layer can be hafnium oxide (HfO2), and the refractive index of HfO2 is from about 2.0 to about 2.15. The material of the low refractive index layer can magnesium fluoride (MgF2) or silicon dioxide (SiO2), and the refractive index of MgF2 is 1.38 and the refractive index of SiO2 is from about 1.46 to about 1.49. - In the embodiment, the
film 20 is coated on thefirst surface 11 of thesubstrate 10. - The high refractive index layer and the low refractive index layer can choose other materials.
- If the material of the low refractive index layer is MgF2, the
film 20 is stacked by a first layer and a second layer in an order facing away from thefirst surface 11. The first layer is the high refractive index layer, and the second layer is the low refractive index layer. The thickness of the first layer is about 70±8 nm, and the thickness of the second layer is about 50±8 nm. In the embodiment, the thickness of the first layer is about 70.98 nm, and the thickness of the second layer is about 50.53 nm. It should be understood that the number of layers and the material of each layer of thefilm 20 can be changed according to actual requirements. - When the material of the lower refractive index layer is SiO2, the
film 20 is stacked by a first layer and a second layer in an order facing away from thefirst surface 11. The first layer is the high refractive index layer, and the second layer is the low refractive index layer. The thickness of the first layer is about 62±8 nm, and the thickness of the second layer is about 42±8 nm. In the embodiment, the thickness of the first layer is about 62.68 nm, and the thickness of the second layer is about 42.97 nm. It should be understood that the number of layers and the material of each layer of thefilm 20 can be changed according to actual requirements. - Referring to
FIG. 2 , a graph showing a spectrum of theoptical element 100 is illustrated. The transmissivity of theoptical element 100 at the ultraviolet wavelengths from about 190 nm to about 280 nm (UVC) is greater than 90%. The transmissivity of theoptical element 100 at the ultraviolet wavelengths from about 280 nm to about 315 nm (UVB) is greater than 98%. The transmissivity of theoptical element 100 at the ultraviolet wavelengths from about 315 nm to about 400 nm (UVA) is greater than 96%. - Referring to
FIG. 3 , alight source device 200, according to an exemplary embodiment, includes theoptical element 100 and anultraviolet light lamp 110. Theultraviolet light lamp 110 emits ultraviolet lights at wavelengths from about 190 nm to about 400 nm. In the illustrated embodiment, theoptical element 100 is substantially cylindrical-shaped, theultraviolet light lamp 110 is received in theoptical element 100, and thus theultraviolet light lamp 110 is protected from being damaged by theoptical element 100. - Particular embodiments are shown and described by way of illustration only. The principles and the features of the present disclosure may be employed in various and numerous embodiments thereof without departing from the scope of the disclosure as claimed. The above-described embodiments illustrate the scope of the disclosure but do not restrict the scope of the disclosure.
Claims (6)
1. An optical element, comprising:
a substrate made of sapphire, the substrate comprising a first surface and a second surface opposite to the first surface; and
a film covered on the first surface and configured for increasing transmissivity of ultraviolet lights; the film stacked by a first layer and a second layer in an order facing away from the first surface; the first layer is one high refractive index layer, the second layer is one low refractive index layer, a material of the high refractive index layer being hafnium oxide (HfO2) having a refractive index from about 2.0 to about 2.15, and a material of the low refractive index layer being magnesium fluoride MgF2 having a refractive index of about 1.38, a thickness of the first layer is about 70±8 nm, and a thickness of the second layer is about 50±8 nm.
2-4. (canceled)
5. A light source device, comprising:
an ultraviolet light lamp; and
an optical element holding the ultraviolet light lamp therein, the optical element comprising:
a substrate made of sapphire, the substrate comprising a first surface and a second surface opposite to the first surface; and
a film covered on the first surface and configured for increasing transmissivity of ultraviolet lights; the film stacked by a first layer and a second layer in an order facing away from the first surface; the first layer is one high refractive index layer, the second layer is one low refractive index layer, a material of the high refractive index layer being hafnium oxide (HfO2) having a refractive index from about 2.0 to about 2.15, and a material of the low refractive index layer being magnesium fluoride (MgF2) having a refractive index of about 1.38, a thickness of the first layer is about 70±8 nm, and a thickness of the second layer is about 50±8 nm.
6-8. (canceled)
9. The optical element of claim 1 , wherein the film consists of the first layer and the second layer.
10. The light source device of claim 5 , wherein the film consists of the first layer and the second layer.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101115585 | 2012-05-02 | ||
TW101115585A TWI557422B (en) | 2012-05-02 | 2012-05-02 | Ultravilet rays transmission element and light source |
Publications (2)
Publication Number | Publication Date |
---|---|
US8570647B1 US8570647B1 (en) | 2013-10-29 |
US20130292584A1 true US20130292584A1 (en) | 2013-11-07 |
Family
ID=49448632
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/655,665 Expired - Fee Related US8570647B1 (en) | 2012-05-02 | 2012-10-19 | Optical element for transmitting ultraviolet light and light source device including same |
Country Status (2)
Country | Link |
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US (1) | US8570647B1 (en) |
TW (1) | TWI557422B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024135592A1 (en) * | 2022-12-23 | 2024-06-27 | 日本電気硝子株式会社 | Optical filter, sterilizing device, and uv ray detecting device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113050213B (en) * | 2016-12-26 | 2022-10-21 | Agc株式会社 | Ultraviolet transmission filter |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6686676B2 (en) * | 2001-04-30 | 2004-02-03 | General Electric Company | UV reflectors and UV-based light sources having reduced UV radiation leakage incorporating the same |
US7794831B2 (en) * | 2003-07-28 | 2010-09-14 | Vampire Optical Coating, Inc. | Anti-reflective coating |
US7196835B2 (en) * | 2004-06-01 | 2007-03-27 | The Trustees Of Princeton University | Aperiodic dielectric multilayer stack |
JP4672469B2 (en) * | 2005-07-11 | 2011-04-20 | 富士フイルム株式会社 | Liquid crystal device and projection display device |
CN102197554A (en) * | 2008-09-04 | 2011-09-21 | 3M创新有限公司 | Monochromatic light source |
US8179030B2 (en) * | 2009-11-30 | 2012-05-15 | General Electric Company | Oxide multilayers for high temperature applications and lamps |
-
2012
- 2012-05-02 TW TW101115585A patent/TWI557422B/en not_active IP Right Cessation
- 2012-10-19 US US13/655,665 patent/US8570647B1/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024135592A1 (en) * | 2022-12-23 | 2024-06-27 | 日本電気硝子株式会社 | Optical filter, sterilizing device, and uv ray detecting device |
Also Published As
Publication number | Publication date |
---|---|
US8570647B1 (en) | 2013-10-29 |
TW201346313A (en) | 2013-11-16 |
TWI557422B (en) | 2016-11-11 |
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AS | Assignment |
Owner name: HON HAI PRECISION INDUSTRY CO., LTD., TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:WEI, CHAO-TSANG;REEL/FRAME:029158/0272 Effective date: 20120926 |
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REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees |
Free format text: PATENT EXPIRED FOR FAILURE TO PAY MAINTENANCE FEES (ORIGINAL EVENT CODE: EXP.) |
|
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20171029 |