JP2013097159A5 - - Google Patents
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- JP2013097159A5 JP2013097159A5 JP2011239622A JP2011239622A JP2013097159A5 JP 2013097159 A5 JP2013097159 A5 JP 2013097159A5 JP 2011239622 A JP2011239622 A JP 2011239622A JP 2011239622 A JP2011239622 A JP 2011239622A JP 2013097159 A5 JP2013097159 A5 JP 2013097159A5
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- Prior art keywords
- vapor deposition
- layer
- mainly composed
- source mainly
- thickness
- Prior art date
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- 238000007740 vapor deposition Methods 0.000 claims 28
- GEIAQOFPUVMAGM-UHFFFAOYSA-N oxozirconium Chemical compound [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims 5
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 3
- 150000002500 ions Chemical class 0.000 claims 1
Claims (6)
前記被膜は、SiO2を主成分とする蒸着源を用いる蒸着により形成された第一の蒸着層と、Ta2O5またはZrO2を主成分とする蒸着源を用いる蒸着により形成された第二の蒸着層とが隣接する積層構造を含み、
前記第一の蒸着層のナノインデンテーション硬度は5.0GPa以上、かつ圧縮応力は600MPa以下であり、
前記第二の蒸着層のナノインデンテーション硬度は7.5GPa以上、かつ圧縮応力は350MPa以下である、前記眼鏡レンズ。 A spectacle lens having a coating on a lens substrate through a hard coat layer,
The coating is formed by a first vapor deposition layer formed by vapor deposition using a vapor deposition source mainly composed of SiO 2 and a second vapor deposition formed by vapor deposition using a vapor deposition source mainly composed of Ta 2 O 5 or ZrO 2 . Including a laminated structure adjacent to the vapor deposition layer of
The nanoindentation hardness of the first vapor deposition layer is 5.0 GPa or more, and the compressive stress is 600 MPa or less,
The spectacle lens, wherein the second vapor deposition layer has a nanoindentation hardness of 7.5 GPa or more and a compressive stress of 350 MPa or less.
SiO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚25〜32nmの第一層、
Ta2O5またはZrO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚7〜9nmの第二層、
SiO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚360〜390nmの第三層、
Ta2O5またはZrO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚10〜13nmの第四層、SiO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚34〜38nmの第五層、
Ta2O5またはZrO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚42〜45nmの第六層、
SiO2を主成分とする蒸着源を用いる蒸着により形成された、膜厚110〜115nmの第七層、
をこの順に含む請求項1〜4のいずれか1項に記載の眼鏡レンズ。 The coating is from the lens substrate side,
A first layer having a thickness of 25 to 32 nm formed by vapor deposition using a vapor deposition source mainly composed of SiO 2 ;
A second layer having a thickness of 7 to 9 nm formed by vapor deposition using a vapor deposition source mainly composed of Ta 2 O 5 or ZrO 2 ;
A third layer having a thickness of 360 to 390 nm, formed by vapor deposition using a vapor deposition source mainly composed of SiO 2 ;
A film formed by vapor deposition using a vapor deposition source mainly composed of Ta 2 O 5 or ZrO 2 , a fourth layer having a thickness of 10 to 13 nm, formed by vapor deposition using a vapor deposition source mainly composed of SiO 2 A fifth layer with a thickness of 34-38 nm,
A sixth layer having a thickness of 42 to 45 nm formed by vapor deposition using a vapor deposition source mainly composed of Ta 2 O 5 or ZrO 2 ;
A seventh layer having a thickness of 110 to 115 nm formed by vapor deposition using a vapor deposition source mainly composed of SiO 2 ;
The spectacle lens according to any one of claims 1 to 4 , comprising:
On the object side surface and eyeball side surface of the lens substrate, wherein the first layer to the seventh layer to chromatic respectively a coating comprising in the order of the spectacle lens according to claim 5.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011239622A JP5969194B2 (en) | 2011-10-31 | 2011-10-31 | Manufacturing method of spectacle lens |
EP16180352.3A EP3118672B1 (en) | 2011-10-31 | 2012-10-31 | Eyeglass lens |
PCT/JP2012/078120 WO2013065715A1 (en) | 2011-10-31 | 2012-10-31 | Lens for eyeglasses |
EP12845566.4A EP2775341A4 (en) | 2011-10-31 | 2012-10-31 | Lens for eyeglasses |
EP19180612.4A EP3561580A1 (en) | 2011-10-31 | 2012-10-31 | Eyeglass lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011239622A JP5969194B2 (en) | 2011-10-31 | 2011-10-31 | Manufacturing method of spectacle lens |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013097159A JP2013097159A (en) | 2013-05-20 |
JP2013097159A5 true JP2013097159A5 (en) | 2014-12-18 |
JP5969194B2 JP5969194B2 (en) | 2016-08-17 |
Family
ID=48619151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011239622A Active JP5969194B2 (en) | 2011-10-31 | 2011-10-31 | Manufacturing method of spectacle lens |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5969194B2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120075577A1 (en) | 2006-03-20 | 2012-03-29 | Ishak Andrew W | High performance selective light wavelength filtering providing improved contrast sensitivity |
US8882267B2 (en) | 2006-03-20 | 2014-11-11 | High Performance Optics, Inc. | High energy visible light filter systems with yellowness index values |
JP6253009B2 (en) * | 2013-08-28 | 2017-12-27 | 東海光学株式会社 | Optical products and eyeglass lenses |
JP6313941B2 (en) * | 2013-08-30 | 2018-04-18 | Hoya株式会社 | Eyeglass lenses |
KR20220051261A (en) | 2019-12-27 | 2022-04-26 | 호야 렌즈 타일랜드 리미티드 | eyeglass lenses |
JP2021105692A (en) | 2019-12-27 | 2021-07-26 | ホヤ レンズ タイランド リミテッドHOYA Lens Thailand Ltd | Method of manufacturing spectacle lens |
US20230004024A1 (en) | 2019-12-27 | 2023-01-05 | Hoya Lens Thailand Ltd. | Spectacle lens |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10160930A (en) * | 1996-12-02 | 1998-06-19 | Nikon Corp | Pellicle optical element |
JP3510845B2 (en) * | 2000-08-29 | 2004-03-29 | Hoya株式会社 | Optical member having antireflection film |
JP2004341052A (en) * | 2003-05-13 | 2004-12-02 | Ito Kogaku Kogyo Kk | Optical element |
JP5211289B2 (en) * | 2005-11-01 | 2013-06-12 | 東海光学株式会社 | Visible plastic lens |
JP2009122203A (en) * | 2007-11-12 | 2009-06-04 | Shimadzu Corp | Optical filter, filter set for fluorescence analysis and fluorescence measuring device using this optical filter |
JP2010072636A (en) * | 2008-08-18 | 2010-04-02 | Seiko Epson Corp | Optical article and method for manufacturing the same |
AU2010229849B2 (en) * | 2009-03-25 | 2015-06-11 | High Performance Optics, Inc. | Photochromic ophthalmic systems that selectively filter specific blue light wavelengths |
-
2011
- 2011-10-31 JP JP2011239622A patent/JP5969194B2/en active Active
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