US20130022764A1 - Housing with patterns and method for forming patterns on the housing - Google Patents

Housing with patterns and method for forming patterns on the housing Download PDF

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Publication number
US20130022764A1
US20130022764A1 US13/290,133 US201113290133A US2013022764A1 US 20130022764 A1 US20130022764 A1 US 20130022764A1 US 201113290133 A US201113290133 A US 201113290133A US 2013022764 A1 US2013022764 A1 US 2013022764A1
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United States
Prior art keywords
photo
curved surface
mask
patterns
article
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Abandoned
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US13/290,133
Inventor
Ching-Yu Chou
Chang-Chin Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hon Hai Precision Industry Co Ltd
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Hon Hai Precision Industry Co Ltd
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Assigned to HON HAI PRECISION INDUSTRY CO., LTD. reassignment HON HAI PRECISION INDUSTRY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHOU, CHING-YU, WU, CHANG-CHIN
Publication of US20130022764A1 publication Critical patent/US20130022764A1/en
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/24Curved surfaces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60Substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]

Definitions

  • the present disclosure generally relates to a method of forming patterns and housings with patterns formed thereon, and particularly, to a method of forming patterns on curved surface of the housing, and housings with patterns formed on a curved surface thereon.
  • FIG. 1 is a schematic, side cross-sectional view of an exposure process of a method of one embodiment.
  • FIG. 2 is a schematic, side cross-sectional view of a developing process of the method of one embodiment.
  • FIG. 3 is a schematic, side cross-sectional view of a housing with a pattern formed on the housing by the method of the embodiment.
  • FIG. 4 is a schematic, top view of the housing of FIG. 3 .
  • FIG. 5 is a flowchart of a method for forming a plurality of patterns on a housing of an illustrated embodiment.
  • FIG. 1 an illustrated embodiment of a method for forming a plurality of patterns on a curved surface of an article is shown.
  • the method of forming the patterns on a housing 10 is presented.
  • the housing 10 is substantially curved, and includes an inner concave surface 11 and an outer convex surface 13 opposite to the inner concave surface 11 .
  • a photo-resist layer 20 is coated on the inner concave surface 11 .
  • a material of the photo-resist layer 20 can be a negative photo-resist or a positive photo-resist.
  • the housing 10 is made of metal.
  • the housing 10 can be made of glass, ceramic, or plastic, for example.
  • a photo-mask 30 employed in the method of forming the patterns in the illustrated embodiment is substantially curved.
  • a plurality of light holes 31 are defined in the photo-mask 30 .
  • the photo-mask 30 includes an inner concave surface 33 and an outer convex surface 35 opposite to the inner concave surface 33 .
  • the outer convex surface 35 is placed adjacent corresponding to the inner concave surface 11 of the housing 10 , and a profile of the outer convex surface 35 is substantially the same as that of the inner concave surface 11 .
  • a shape of the light holes 31 corresponds to that of a pattern to be formed on the inner concave surface 11 .
  • Each light hole 31 is substantially elliptical when viewed in top view.
  • a shape of the outer convex surface 35 corresponds to that of the pattern to be formed on the inner concave surface 11 .
  • the photo-mask 30 can be planar, and a corresponding relation between the shape of the light holes 31 and that of the pattern should be calculated in that case.
  • a method of forming a plurality of patterns of one embodiment includes the following steps.
  • a photo-resist layer 20 is coated on an inner concave surface 11 of the housing 10 .
  • the photo-resist layer 20 can be coated by an immersion process or a spraying process.
  • the photo-resist layer 20 is coated by the spraying process, and a material of the photo-resist layer 20 is a negative photo-resist.
  • the material of the photo-resist layer 20 can be a positive photo-resist.
  • a photo-mask 30 is provided, and is placed above the inner concave surface 11 of the housing 10 .
  • a plurality of light holes 31 are defined in the photo-mask 30 .
  • the photo-mask 30 includes an inner concave surface 33 and an outer convex surface 35 opposite to the inner concave surface 33 .
  • the outer convex surface 35 of the photo-mask 35 is placed corresponding to the inner concave surface 11 of the housing 10 .
  • a shape of the light holes 31 corresponds to that of a pattern to be formed on the inner concave surface 11 .
  • Each light hole 31 is substantially elliptical when viewed in top view. If the material of the photo-resist layer 20 is a positive photo-resist, a shape of the outer convex surface 35 corresponds to that of the pattern to be formed on the inner concave surface 11 .
  • a light source 40 is provided, and the photo-resist layer 20 is exposed to the light emitted from the light source 40 .
  • the light passes through the light holes 31 toward the photo-resist layer 20 coated on the inner concave surface 11 , and thus the photo-resist layer 20 is exposed to light accordingly, and generates a product, which is undissolvable in a developer.
  • a developer 50 is provided, and the photo-resist layer 20 after being exposed is developed to form a pattern 60 on the inner concave surface 11 of the housing 10 .
  • the developer 50 is sprayed onto the photo-resist layer 20 , and the unexposed photo-resist is dissolved in the developer 50 , and discharged from the housing 10 together with the developer 50 .
  • the method of forming a plurality of patterns can be used to form the patterns on the outer convex surface 13 .
  • a shape of the pattern 60 can be controlled by the shape of the light holes 31 , thereby avoiding forming the pattern 60 on the inner concave surface 11 by directly jetting ink, such that a resolution of the pattern 60 is thereby improved, and the apparatus for forming the pattern 60 has a simpler structure and lower cost.
  • the pattern 60 can be easily formed by the method of the embodiment.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

A method for forming patterns on a curved surface of an article includes of the following steps: a photo-resist layer is coated on the curved surface, in which a material of the photo-resist layer is, for example, a negative photo-resist; a photo-mask is provided, and the photo-mask is placed above the curved surface, in which at least one light hole is defined in the photo-mask; in addition, a shape of the at least one light hole corresponds to a shape of the pattern; a light source is provided, and the photo-resist layer is exposed; and the photo-resist layer is developed after being exposed to form the pattern on the curved surface.

Description

    BACKGROUND
  • 1. Technical Field
  • The present disclosure generally relates to a method of forming patterns and housings with patterns formed thereon, and particularly, to a method of forming patterns on curved surface of the housing, and housings with patterns formed on a curved surface thereon.
  • 2. Description of Related Art
  • To form patterns on a curved surface of various articles, silk screen printing or ink jet printing are usually employed. However, such patterns can only be formed on an outer convex surface by silk screen printing, and if an article structure is too complicated, the patterns cannot be formed. For ink jet printing, because the distances between the to-be-printed points on the curved surface and a printing head of a printer are not the same, the ink jetted on the curved surface is not uniform and thus the resolution of the pattern produced is relatively low, and the pattern may be distorted. To improve the pattern quality, the movement path of the printing head can be controlled according to a profile of the curved surface, such that the distances between the to-be-printed points and the printing head are similar enough. However, a printing apparatus as mentioned above has a relatively complicated structure, and relatively high cost.
  • Therefore, there is room for improvement within the art.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a schematic, side cross-sectional view of an exposure process of a method of one embodiment.
  • FIG. 2 is a schematic, side cross-sectional view of a developing process of the method of one embodiment.
  • FIG. 3 is a schematic, side cross-sectional view of a housing with a pattern formed on the housing by the method of the embodiment.
  • FIG. 4 is a schematic, top view of the housing of FIG. 3.
  • FIG. 5 is a flowchart of a method for forming a plurality of patterns on a housing of an illustrated embodiment.
  • DETAILED DESCRIPTION
  • Referring to FIG. 1, an illustrated embodiment of a method for forming a plurality of patterns on a curved surface of an article is shown. In the illustrated embodiment, the method of forming the patterns on a housing 10 is presented. The housing 10 is substantially curved, and includes an inner concave surface 11 and an outer convex surface 13 opposite to the inner concave surface 11. A photo-resist layer 20 is coated on the inner concave surface 11. A material of the photo-resist layer 20 can be a negative photo-resist or a positive photo-resist. In the illustrated embodiment, the housing 10 is made of metal. The housing 10 can be made of glass, ceramic, or plastic, for example.
  • A photo-mask 30 employed in the method of forming the patterns in the illustrated embodiment is substantially curved. A plurality of light holes 31 are defined in the photo-mask 30. The photo-mask 30 includes an inner concave surface 33 and an outer convex surface 35 opposite to the inner concave surface 33. The outer convex surface 35 is placed adjacent corresponding to the inner concave surface 11 of the housing 10, and a profile of the outer convex surface 35 is substantially the same as that of the inner concave surface 11. In the illustrated embodiment, because the material of the photo-resist layer 20 is the negative photo-resist, a shape of the light holes 31 corresponds to that of a pattern to be formed on the inner concave surface 11. Each light hole 31 is substantially elliptical when viewed in top view.
  • If the material of the photo-resist layer 20 is a positive photo-resist, a shape of the outer convex surface 35 corresponds to that of the pattern to be formed on the inner concave surface 11. The photo-mask 30 can be planar, and a corresponding relation between the shape of the light holes 31 and that of the pattern should be calculated in that case.
  • Referring to FIGS. 2 through 5, a method of forming a plurality of patterns of one embodiment includes the following steps.
  • In a first step S101, a photo-resist layer 20 is coated on an inner concave surface 11 of the housing 10. The photo-resist layer 20 can be coated by an immersion process or a spraying process. In the illustrated embodiment, the photo-resist layer 20 is coated by the spraying process, and a material of the photo-resist layer 20 is a negative photo-resist. The material of the photo-resist layer 20 can be a positive photo-resist.
  • In a second step S102, a photo-mask 30 is provided, and is placed above the inner concave surface 11 of the housing 10. A plurality of light holes 31 are defined in the photo-mask 30. The photo-mask 30 includes an inner concave surface 33 and an outer convex surface 35 opposite to the inner concave surface 33. The outer convex surface 35 of the photo-mask 35 is placed corresponding to the inner concave surface 11 of the housing 10. In the illustrated embodiment, because the material of the photo-resist layer 20 is the negative photo-resist, and a profile of the outer convex surface 35 is substantially the same as that of the inner concave surface 11, a shape of the light holes 31 corresponds to that of a pattern to be formed on the inner concave surface 11. Each light hole 31 is substantially elliptical when viewed in top view. If the material of the photo-resist layer 20 is a positive photo-resist, a shape of the outer convex surface 35 corresponds to that of the pattern to be formed on the inner concave surface 11.
  • In a third step S103, a light source 40 is provided, and the photo-resist layer 20 is exposed to the light emitted from the light source 40. The light passes through the light holes 31 toward the photo-resist layer 20 coated on the inner concave surface 11, and thus the photo-resist layer 20 is exposed to light accordingly, and generates a product, which is undissolvable in a developer.
  • In a fourth step S104, a developer 50 is provided, and the photo-resist layer 20 after being exposed is developed to form a pattern 60 on the inner concave surface 11 of the housing 10. The developer 50 is sprayed onto the photo-resist layer 20, and the unexposed photo-resist is dissolved in the developer 50, and discharged from the housing 10 together with the developer 50.
  • The method of forming a plurality of patterns can be used to form the patterns on the outer convex surface 13.
  • A shape of the pattern 60 can be controlled by the shape of the light holes 31, thereby avoiding forming the pattern 60 on the inner concave surface 11 by directly jetting ink, such that a resolution of the pattern 60 is thereby improved, and the apparatus for forming the pattern 60 has a simpler structure and lower cost. In addition, even though the structure of the housing 10 is relatively complicated, the pattern 60 can be easily formed by the method of the embodiment.
  • It is to be understood, however, that even though numerous characteristics and advantages of the disclosure have been set forth in the foregoing description, together with details of the structure and function of the embodiments, the disclosure is illustrative only, and changes may be made in detail, especially in the matters of shape, size, and arrangement of parts within the principles of the embodiments to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.

Claims (12)

1. A method for forming a plurality of patterns on a curved surface of an article, comprising the steps of :
coating a photo-resist layer on the curved surface, and a material of the photo-resist layer being a negative photo-resist;
providing a photo-mask, and placing the photo-mask above the curved surface, wherein at least one light hole is defined in the photo-mask, and a shape of the at least one light hole is corresponding to a shape of the pattern;
providing a light source, and exposing the photo-resist layer; and
developing the photo-resist layer after being exposed to form the patterns on the curved surface.
2. The method for forming the patterns on the curved surface of the article of claim 1, wherein the photo-mask comprises a curved surface having a profile that is substantially the same as a profile of the curved surface of the article, the curved surface of the photo-mask is placed corresponding to the curved surface of the article, and a shape of the at least one light hole corresponds to the shape of the pattern.
3. The method for forming the patterns on the curved surface of the article of claim 1, wherein the photo-mask is planar, and a corresponding relation between the shape of the pattern and the shape of at least one light hole is calculated to define the at least one light hole in the photo-mask.
4. The method for forming the patterns on the curved surface of the article of claim 1, wherein a material of the article is selected from a group consisting of metal, plastic, glass, and ceramic.
5. The method for forming the patterns on the curved surface of the article of claim 1, wherein the curved surface is an inner concave surface or an outer convex surface opposite to the inner concave surface.
6. A method for forming a plurality of patterns on a curved surface of an article, comprising the steps of :
coating a photo-resist layer on the curved surface, and a material of the photo-resist layer being a positive photo-resist;
providing a photo-mask, and placing the photo-mask above the curved surface, wherein at least one light hole is defined in the photo-mask, and a shape of the photo-mask corresponds to a shape of the pattern;
providing a light source, and exposing the photo-resist layer; and
developing the photo-resist layer after being exposed to form the patterns on the curved surface.
7. The method for forming the patterns on the curved surface of the article of claim 6, wherein the photo-mask comprises a curved surface having a profile the same as a profile of the curved surface of the article, the curved surface of the photo-mask is placed corresponding to the curved surface of the article, and a shape of the curved surface of the photo-mask corresponds to the shape of the pattern.
8. The method for forming the patterns on the curved surface of the article of claim 6, wherein the photo-mask is planar, and a corresponding relation between the shape of the pattern and the shape of the at least one light hole is calculated to define the at least one light hole in the photo-mask.
9. The method for forming the patterns on the curved surface of the article of claim 6, wherein a material of the article is selected from the group consisting of metal, plastic, glass, and ceramic.
10. The method for forming the patterns on the curved surface of the article of claim 6, wherein the curved surface is an inner concave surface or an outer convex surface opposite to the inner concave surface.
11. A housing with a pattern formed on a curved surface thereof, wherein the pattern is formed by exposing and developing a photo-resist layer coated on the curved surface.
12. The housing with the pattern formed on the curved surface thereof of claim 11, wherein the curved surface is an inner concave surface or an outer convex surface.
US13/290,133 2011-07-19 2011-11-07 Housing with patterns and method for forming patterns on the housing Abandoned US20130022764A1 (en)

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TW100125399 2011-07-19
TW100125399A TW201306689A (en) 2011-07-19 2011-07-19 Method of forming pattern and housing with pattern formed by the same

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018074820A1 (en) * 2016-10-19 2018-04-26 최진우 Curved semiconductor producing device and image sensor employing curved semiconductor
US10345705B2 (en) 2013-07-12 2019-07-09 Xerox Corporation Photolithographic patterning of a cylinder
EP4335630A1 (en) * 2022-09-07 2024-03-13 Essilor International Method for patterning a mask, method for producing an insert or a mold, and optical article with surface microstructures

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107561854A (en) * 2016-07-01 2018-01-09 蓝思科技(长沙)有限公司 A kind of processing method of the surface blank pattern of 3D glass
CN106827845B (en) * 2017-02-17 2019-09-10 然斯康波达机电设备(深圳)有限公司 A kind of printing process of 3D bend glass pattern and device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999277A (en) * 1988-02-22 1991-03-12 Trw Inc. Production of precision patterns on curved surfaces
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
US20040130696A1 (en) * 2003-01-07 2004-07-08 Intel Corporation Method and apparatus for reducing focal-plane deviation in lithography

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999277A (en) * 1988-02-22 1991-03-12 Trw Inc. Production of precision patterns on curved surfaces
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
US20040130696A1 (en) * 2003-01-07 2004-07-08 Intel Corporation Method and apparatus for reducing focal-plane deviation in lithography

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10345705B2 (en) 2013-07-12 2019-07-09 Xerox Corporation Photolithographic patterning of a cylinder
WO2018074820A1 (en) * 2016-10-19 2018-04-26 최진우 Curved semiconductor producing device and image sensor employing curved semiconductor
EP4335630A1 (en) * 2022-09-07 2024-03-13 Essilor International Method for patterning a mask, method for producing an insert or a mold, and optical article with surface microstructures
WO2024052033A1 (en) * 2022-09-07 2024-03-14 Essilor International Method for patterning a mask, method for producing an insert or a mold, and optical article with surface microstructures

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AS Assignment

Owner name: HON HAI PRECISION INDUSTRY CO., LTD., TAIWAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHOU, CHING-YU;WU, CHANG-CHIN;REEL/FRAME:027181/0122

Effective date: 20111103

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION