US20110132768A1 - Method for forming imprinting roller - Google Patents

Method for forming imprinting roller Download PDF

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Publication number
US20110132768A1
US20110132768A1 US12/659,971 US65997110A US2011132768A1 US 20110132768 A1 US20110132768 A1 US 20110132768A1 US 65997110 A US65997110 A US 65997110A US 2011132768 A1 US2011132768 A1 US 2011132768A1
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US
United States
Prior art keywords
roller
photoresist layer
pattern
conductive roller
aluminum
Prior art date
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Abandoned
Application number
US12/659,971
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English (en)
Inventor
Sen-Yeu Yang
Tzu-Chien Huang
Jing-Tang Wu
Hsin-Chun Lai
Ying-Ta Chu
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National Taiwan University NTU
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National Taiwan University NTU
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Filing date
Publication date
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Assigned to NATIONAL TAIWAN UNIVERSITY reassignment NATIONAL TAIWAN UNIVERSITY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: YANG, SEN-YEU, CHU, YING-TA, HUANG, TZU-CHIEN, LAI, HSIN-CHUN, WU, JING-TANG
Publication of US20110132768A1 publication Critical patent/US20110132768A1/en
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/045—Anodisation of aluminium or alloys based thereon for forming AAO templates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F13/00—Common details of rotary presses or machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Definitions

  • the invention relates to a method for forming imprinting roller, particularly to a method for forming nano-imprinting roller.
  • the imprinting technology has been evolved from microimprinting to nano-imprinting.
  • different processes have been developed successively.
  • the structure on the flat motherboard is printed on the photoresist layer of substrate, and then it is cured by ultraviolet radiation.
  • this process is time consuming, and the size of product in limited by the dimension of motherboard.
  • the fast and continuous production is unable to be achieved.
  • the structure is formed on the roller by roller imprinting, or wrapped by thin metal sheet with micro-structure, or formed by the molding process, and then the structure is transferred onto substrate.
  • roller microimprinting has the advantages of fast process, mass and continuous production, its importance is increased day by day, wherein the formation or roller is the key technology. Most rollers with micro-structure need very expensive equipments, and the process is very tedious. However, as for the roller wrapped by thin metal sheet normally, the adherence of thin metal sheet will not be very close and tight. Thus, the problems such as mold displacement, warping and the like during imprinting will be occurred usually. There are problems such as insufficient strength and high-temperature deterioration during imprinting for the flexible roller formed by the molding process.
  • the anodic oxidization treatment is required to be conducted for microimprinting roller.
  • the micropores or nanopores can be formed on the surface of aluminum by the anodic oxidization treatment. But because the anodic oxidization treatment needs a uniform electric field, so the micropores or nanopores will not be easy to be formed on the curved surface of cylinder or roller.
  • the invention provides a method for forming imprinting roller.
  • the anodic oxidization treatment of aluminum is employed to produce the roller mold with tight adherence.
  • the invention provides a method for forming nano-imprinting roller, wherein the micro or sub-micro structure is generated on the surface of aluminum roller. It can solve the problem of flexible roller formed by the molding process, in which the surface structure is easy to be peeled off.
  • an aluminum roller with cylindrical surface is provided, a photoresist layer is coated on the cylindrical surface, then a pattern is transferred onto the photoresist layer; the part of photoresist layer is removed to form the photoresist layer with pattern on the cylindrical surface; and an anodic oxidization treatment is carried on the aluminum roller with patterned photoresist layer. Repeat the above steps to obtain the nano-imprinting roller with nanopore structure.
  • FIG. 1A is a drawing illustrating the cross-section of roller according to an embodiment of the invention.
  • FIG. 1B is a drawing illustrating the cross-section of roller with photoresist layer according to an embodiment of the invention.
  • FIG. 1C is a drawing illustrating the cross-section of roller with photoresist layer, photo mask and ultraviolet source according to an embodiment of the invention.
  • FIG. 1D is a drawing illustrating the cross-section of roller with patterned photoresist layer according to an embodiment of the invention.
  • FIG. 2 is a drawing illustrating the anodic oxidization treatment for roller with patterned photoresist layer according to an embodiment of the invention.
  • FIG. 3 is a drawing illustrating the side view of roller with the anodic oxidization treatment according to an embodiment of the invention.
  • FIG. 4 is a drawing illustrating the side view of finished roller according to an embodiment of the invention.
  • FIG. 1A , FIG. 1B , FIG. 1C and FIG. 1D show the cross-sectional diagram of roller according to the embodiment of the invention. The detail is described as follows.
  • a conductive roller 10 is provided.
  • the geometrical shape is cylindrical, thus the cross-section is circular.
  • the cylinder may be solid cylinder or hollow cylinder.
  • the collected material may be aluminum or the aluminum alloy, the electroplated aluminum materials, the conductive materials, or the other alloy formed on the surface of conductive roller 10 .
  • the aluminum made conductive roller 10 is used for the description, however, the invention is not limited by the above-mentioned.
  • a polishing treatment is conducted on the surface of conductive roller 10 .
  • a photoresist layer 12 is formed on the surface of conductive roller 10 .
  • a photoresist agent is coated on the surface of conductive roller 10 to form a photoresist layer 12 , the coating methods include the immersing coating, electrostatic coating, blade coating, and T-type extrusion coating etc.
  • an ultraviolet source 14 is set near the conductive roller 10 with the photoresist layer 12 on the surface.
  • a photo mask 16 is placed between the conductive roller 10 and the ultraviolet source 14 .
  • the geometrical shape of the photo mask 16 is rectangular, and there is a pattern on it.
  • the ultraviolet is passed through the photo mask 16 from the ultraviolet source 14 , it is irradiated on the photoresist layer 12 of conductive roller 10 .
  • the photoresist layer 12 is exposed, and the pattern on the photo mask 16 is transferred to the photoresist layer 12 .
  • the conductive roller 10 is rotated at constant speed along the axle of cylinder to achieve uniform exposure, but the invention is not limited by the above-mentioned. If required, the ultraviolet source 14 and the photo mask 16 may rotate with respect the conductive roller 10 at the constant speed.
  • the photoresist layer 12 with transferred pattern is treated by suitable way, such as the etching treatment, to remove part of photoresist layer 12 , in order to form the patterned photoresist layer 12 on the conductive roller 10 .
  • the conductive roller 10 with the patterned photoresist layer 12 is placed in the reaction equipment 20 , in order to carry out the anodic oxidization treatment for the conductive roller 10 with the patterned photoresist layer 12 .
  • the anodic oxidization treatment is conducted.
  • the conductive roller 10 is set on the anode of a power supply 22 , and the cathode is a graphite electrode 24 .
  • the reaction equipment 20 is heated by a heating controller 26 , in order to get the acceleration and convection effect. Moreover, during the reacting process, a constant distance is kept between the conductive roller 10 and the graphite electrode 24 .
  • the conductive roller 10 is kept in a self-rotating motion at constant speed (i.e. rotating along the axle of cylinder at constant speed), and the graphite electrode 24 moves up and down at the constant linear speed relative to the conductive roller 10 .
  • the photoresist layer 12 protected by the pattern will not be removed by the chemical reaction of electrolytic solution, thus the nanopore structure 30 is formed.
  • FIG. 1B , FIG. 1C FIG. 1D , FIG. 2 and FIG. 3 can be repeated to obtain more uniform nanopore structure.
  • the patterned photoresist layer 12 on the conductive roller 10 is removed to obtain the setting area of imprinting roller required by the invention. Furthermore, carry out the anodic oxidization treatment to form the micropores or nanopores in local area where the photoresist layer 12 with pattern has been removed. The photoresist layer 12 is removed again, and the coating, development, and partial removal of the photoresist layer 12 are carried on for the second time.
  • the micropores or nanopores are formed in the area without the micropores or nanopores originally. According to the design, the micropores or nanopores can be formed in the designed area on the surface of roller 32 . Several repeated processes may be applied to fully cover the surface of roller by the micropores or nanopores.
  • the invention utilizes a limited area on the surface of roller or a defined local area which is exposed in the anodic treatment tank.
  • the anodic oxidization treatment is carried on for the limited area or the defined local area to form the micropores or nanopores on the surface of roller. Due to it is not easy to control the electric field, thus the area can be divided into several parts for the anodic treatment. After the treatment, all parts with micropores or nanopores are combined to cover the defined area or full area on the surface of roller.
  • the anodic oxidization treatment of aluminum is applied.
  • the large-area nanopore structure can be formed on the surface of cylinder to overcome the loose adherence of traditional thin metal sheet wrapping and the defect of conventional molding process.
  • the roll-to-roll production process can be applied for the fabrication of optical elements, in order to carry out fast and continuous transfer printing production on the flexible board, such as PET, PC or photoresist agent.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
US12/659,971 2009-12-08 2010-03-26 Method for forming imprinting roller Abandoned US20110132768A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW098141823A TWI412459B (zh) 2009-12-08 2009-12-08 The method of forming a roller for embossing
TW098141823 2009-12-08

Publications (1)

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US20110132768A1 true US20110132768A1 (en) 2011-06-09

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TW (1) TWI412459B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10838297B2 (en) * 2016-09-16 2020-11-17 3M Innovative Properties Company Method of making a nanostructured cylindrical roll

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114074473B (zh) * 2020-08-11 2023-03-14 光群雷射科技股份有限公司 转印滚轮的制造方法、及滚轮母膜与其制造方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3385774A (en) * 1964-03-16 1968-05-28 Aluminum Co Of America Method and means of anodizing
US4517059A (en) * 1981-07-31 1985-05-14 The Boeing Company Automated alternating polarity direct current pulse electrolytic processing of metals
JPH0336024A (ja) * 1989-07-04 1991-02-15 Canon Inc ロール型スタンパーの製造方法
US5693210A (en) * 1995-08-31 1997-12-02 President Of Tohoku University Method of manufacturing porous alumina tube
US6303270B1 (en) * 1999-03-01 2001-10-16 The Curators Of The University Of Missouri Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor
US6322689B1 (en) * 1999-04-02 2001-11-27 Japan Techno Co., Ltd. Anodizing method and apparatus for performing the same
US7066234B2 (en) * 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
JP2009216875A (ja) * 2008-03-10 2009-09-24 Fujifilm Corp 円筒外表面の加工方法およびパターンシートの製造方法
JP2009247191A (ja) * 2008-04-01 2009-10-22 Namiki Precision Jewel Co Ltd 円筒状コイル、円筒型マイクロモータ及び円筒状コイルの製造方法
US20100116733A1 (en) * 2008-11-12 2010-05-13 Korea Electrotechnology Research Institute Nanoporous oxide ceramic membranes of tubular and hollow fiber shape and method of making the same
US7833389B1 (en) * 2005-01-21 2010-11-16 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3385774A (en) * 1964-03-16 1968-05-28 Aluminum Co Of America Method and means of anodizing
US4517059A (en) * 1981-07-31 1985-05-14 The Boeing Company Automated alternating polarity direct current pulse electrolytic processing of metals
JPH0336024A (ja) * 1989-07-04 1991-02-15 Canon Inc ロール型スタンパーの製造方法
US5693210A (en) * 1995-08-31 1997-12-02 President Of Tohoku University Method of manufacturing porous alumina tube
US6303270B1 (en) * 1999-03-01 2001-10-16 The Curators Of The University Of Missouri Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor
US6322689B1 (en) * 1999-04-02 2001-11-27 Japan Techno Co., Ltd. Anodizing method and apparatus for performing the same
US7066234B2 (en) * 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
US7833389B1 (en) * 2005-01-21 2010-11-16 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
JP2009216875A (ja) * 2008-03-10 2009-09-24 Fujifilm Corp 円筒外表面の加工方法およびパターンシートの製造方法
JP2009247191A (ja) * 2008-04-01 2009-10-22 Namiki Precision Jewel Co Ltd 円筒状コイル、円筒型マイクロモータ及び円筒状コイルの製造方法
US20100116733A1 (en) * 2008-11-12 2010-05-13 Korea Electrotechnology Research Institute Nanoporous oxide ceramic membranes of tubular and hollow fiber shape and method of making the same

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
Kamitakahara et al., English Abstract, JP H03-036024 (1991). *
Lee et al., Hard Anodization for Nanoporous Aluminum Oxide, Max Planck Institut für Mikrostrukturphysik (2007) *
Nakamura, JP 2009-247191A English Abstract and Machine Translation *
Ogawa et al., English Abstract, JP 2009-216875 (2009). *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10838297B2 (en) * 2016-09-16 2020-11-17 3M Innovative Properties Company Method of making a nanostructured cylindrical roll

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TWI412459B (zh) 2013-10-21
TW201119871A (en) 2011-06-16

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Owner name: NATIONAL TAIWAN UNIVERSITY, TAIWAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:YANG, SEN-YEU;HUANG, TZU-CHIEN;WU, JING-TANG;AND OTHERS;SIGNING DATES FROM 20100319 TO 20100322;REEL/FRAME:024190/0791

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