US20110024668A1 - Ink Composition for Optoelectronic Device - Google Patents

Ink Composition for Optoelectronic Device Download PDF

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US20110024668A1
US20110024668A1 US12/936,871 US93687109A US2011024668A1 US 20110024668 A1 US20110024668 A1 US 20110024668A1 US 93687109 A US93687109 A US 93687109A US 2011024668 A1 US2011024668 A1 US 2011024668A1
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printing
optoelectronic device
ink composition
bicarbonate
materials
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Kwang Choon Chung
Hyun Nam Cho
Ji Hoon Yoo
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InkTec Co Ltd
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InkTec Co Ltd
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Assigned to INKTEC CO., LTD. reassignment INKTEC CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHO, HYUN NAM, CHUNG, KWANG CHOON, YOO, JI HOON
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/631Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the following disclosure relates to a printing ink composition directly applicable to a patterning process, obtained by forming materials for optoelectronic device into ink, and more particularly, to a printing ink composition for fabricating optoelectronic device obtained by controlling physical properties of key materials for fabricating optoelectronic devices optoelectronic device, including organic light emitting diodes (OLEDs) or organic thin film transistors (OTFTs), to be amenable to a printing process and to allow direct patterning.
  • OLEDs organic light emitting diodes
  • OTFTs organic thin film transistors
  • OLEDs organic electroluminescent devices or organic light emitting diodes
  • Such OLEDs have a simple structure, are obtained by a simple process, and realize high image quality and a broad view angle. Further, they completely realize video images and high color purity, are driven with low power consumption under a low voltage, and thus are suitable for portable electronic appliances.
  • an OLED includes an anode, a hole injection layer, a hole transfer layer, an emitting layer, an electron transfer layer, an electron injection layer and a cathode, stacked successively on a substrate.
  • the anode is frequently formed of indium tin oxide (ITO) having a low surface resistance and high transmittance.
  • ITO indium tin oxide
  • multiple organic thin films are disposed between the two electrodes as described above to increase the light emitting efficiency and lifespan. Since the organic thin films are very weak to moisture and oxygen in the air, an encapsulating film is formed on the uppermost portion of the device to increase the lifespan thereof.
  • an inkjet printing process substituting for a known deposition process is differentiated from the deposition process in that it consumes a low amount of materials, shows high efficiency, and allows scale-up and low-temperature operation. Therefore, flexible substrates, such as plastics, may be used in an inkjet printing process, resulting in significant improvement in cost-efficiency.
  • many Korean and foreign companies and organizations have conducted active research and development of such inkjet printing processes. It is expected that inkjet printing technology is applied to various industrial fields, including electric/electronic, energy, display, bioindustries, etc., and contributes to production of a wide variety of commercial products and improvement in cost-efficiency and eco-friendly characteristics.
  • Inkjet printing is low-noise, low-cost and non-contact printing technology.
  • inkjet printing processes are classified into continuous jet processes and drop-on-demand (DOD) processes.
  • the continuous jet processes performs printing by controlling ink direction through a change in electromagnetic field while ink is sprayed continuously with a pump.
  • the DOD processes spray ink only at a desired moment through electrical signals, and are further classified into piezoelectric inkjet processes generating pressure with a piezoelectric plate that causes dynamic deformation by electricity, and thermal inkjet processes using pressure generated upon the expansion of bubbles produced by heat.
  • Those properties may affect droplet forming systems, droplet sizes and velocities under a constant pressure.
  • an optimal viscosity of ink is 5-15 cps in view of good ejectability.
  • organic materials such as dielectrics, semiconductors and conductors
  • OFT organic thin film transistor
  • Korean Patent Laid-Open No. 2003-0058767 discloses a method for improving the printability of an organic light emitting layer for OLEDs formed by a roll coating process.
  • the method uses, as a solvent, a mixture containing a first solvent having a solubility of 1 wt/v %, a second solvent having a volatility of 0.1 or less and a third solvent having a surface tension of 30 dynes/cm or less, to prevent solvent evaporation before coating a substrate and to improve solubility and surface tension.
  • the above method is merely limited to improvement in solubility characteristics of organic polymer materials used for a specific process, does not allow selection of an adequate combination of solvents depending on different kinds of organic polymer materials, and have difficulty in controlling viscosity suitable for a printing process. Therefore, the method is not applicable to various materials for fabricating optoelectronic device.
  • ink compositions for fabricating optoelectronic device according to the related art have difficulty in controlling viscosity, solubility and film uniformity so that the ink compositions are applicable to printing processes, such as inkjet processes. Therefore, processes for forming films via printing of optoelectronic materials provided as ink have been limited to formation of certain organic light emitting layers. As a result, there has been marked limitation in realizing flexible optoelectronic device, and scale-up and cost-efficient fabrication thereof
  • An embodiment of the present invention is directed to providing an ink composition for printing key materials of optoelectronic device, such as organic light emitting diodes (OLEDs) or organic thin film transistors (OTFTs), in the form of ink, the printing ink composition including a compound with a specific structure to control the viscosity, solubility and film uniformity of ink, wherein the compound is decomposed easily at a sufficiently low temperature and does not adversely affect the characteristics of the resultant optoelectronic device.
  • OLEDs organic light emitting diodes
  • OTFTs organic thin film transistors
  • Another embodiment of the present invention is directed to applying the printing ink composition to various key materials of optoelectronic device, so that it allows fabrication of flexible devices and scale-up of devices, and improves cost-efficiency.
  • ammonium carbamate compound or ammonium carbonate compound is incorporated to a printing ink composition for optoelectronic device, such as organic light emitting device (OLED) or organic thin film transistor (OTFT), it is possible to control the viscosity, solubility and film uniformity of ink with ease.
  • the ammonium carbamate compound or ammonium carbonate compound used herein is decomposed spontaneously at a sufficiently low temperature, and thus does not adversely affect the quality of the resultant device. Therefore, many compounds having excellent efficiency and lifespan, which, otherwise, are not applicable to printing ink, may be formed into ink suitable for a printing process. As a result, it is possible to provide flexible devices, to realize scale-up of devices, and to improve cost-efficiency.
  • a printing ink composition directly applicable to a patterning process, obtained by forming materials for optoelectronic device into ink. More particularly, there is provided a printing ink composition for printing key materials of optoelectronic device, such as OLED or OTFT, in the form of ink, the printing ink composition including: an ammonium carbamate compound represented by Chemical Formula 1, ammonium carbonate compound represented by Chemical Formula 2, ammonium bicarbonate compound represented by Chemical Formula 3, or a mixture thereof.
  • R 1 through R 6 is independently selected from hydrogen, hydroxy, C 1 -C 30 alkoxy, C 1 -C 30 alkyl, C 3 -C 30 cycloalkyl, C 6 -C 20 aryl, (C 6 -C 20 )ar(C 1 -C 30 )alkyl, functional group-substituted C 1 -C 30 alkyl, functional group-substituted C 6 -C 20 aryl, heterocyclic compound, polymeric compound and a derivative thereof, wherein when R 1 through R 6 represents alkyl or aralkyl non-substituted or substituted with a functional group, carbon chain may include a heteroatom selected from N, S and O, and R 1 and R 2 , or R 4 and R 5 may be independently linked to each other via alkylene with or without a heteroatom to form a ring.
  • R 1 through R 6 include but are not limited to hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, amyl, hexyl, ethylhexyl, heptyl, octyl, isooctyl, nonyl, decyl, dodecyl, hexadecyl, octadecyl, docodecyl, cyclopropyl, cyclopentyl, cyclohexyl, cholesteryl, allyl, hydroxy, methoxy, methoxyethyl, methoxypropyl, cyanoethyl, ethoxy, butoxy, hexyloxy, methoxyethoxyethyl, methoxyethoxyethoxyethyl, hexametyleneimine, morpholine, piperidine, piperaz
  • ammonium carbamate compound of Chemical Formula 1 include at least one compound selected from the group consisting of ammonium carbamate, ethylammonium ethylcarbamate, isopropylammonium isopropylcarbamate, n-butylammonium n-butylcarbamate, isobutylammonium isobutylcarbamate, t-butylammonium t-butylcarbamate, 2-ethylhexylammonium 2-ethylhexylcarbamate, octadecylammonium octadecylcarbamate, 2-methoxyethylammonium 2-methoxyethylcarbamate, 2-cyano ethyl ammonium 2-cyanoethylcarbamate, dibutylammonium dibutylcarbamate, dioctadecylammonium dioctadecylcarbamate,
  • ammonium carbonate compound of Chemical Formula 2 include at least one compound selected from the group consisting of ammonium carbonate, ethylammonium ethylcarbonate, isopropylammonium isopropylcarbonate, n-butylammonium n-butylcarbonate, isobutylammonium isobutylcarbonate, t-butylammonium t-butylcarbonate, 2-ethylhexylammonium 2-ethylhexylcarbonate, 2-methoxyethylammonium 2-methoxyethylcarbonate, 2-cyanoethylammonium 2-cyanoethylcarbonate, octadecylammonium octadecylcarbonate, dibutylammonium dibutylcarbonate, dioctadecylammonium dioctadecylcarbonate, methyldecylammonium methyl
  • ammonium bicarbonate compound of Chemical Formula 3 include at least one compound selected from the group consisting of ammonium bicarbonate, isopropylammonium bicarbonate, t-butylammonium bicarbonate, 2-ethylhexylammonium bicarbonate, 2-methoxyethylammonium bicarbonate, 2-cyanoethylammonium bicarbonate, dioctadecylammonium bicarbonate, pyridinium bicarbonate, triethylenediaminium bicarbonate and derivatives thereof, or a mixture thereof.
  • At least one of substituents R 1 through R 6 preferably has 1-20 carbon atoms, and more preferably 3-20 carbon atoms in view of miscibility with organic solvents and decomposition capability at low temperature.
  • ammonium carbamate or ammonium carbonate compounds may be prepared by any one of processes known to those skilled in the art.
  • J. Am. Chem. Soc., 70, p 3865 (1948), J. Am. Chem. Soc., 73, p 1820 (1951), J. Prakt. Chem., 9, p 917 (1959), J. Am. Chem. Soc., 123, p 10393 (2001), Langmuir, 18, 7124 (2002), and U.S. Pat. No. 4,542,214 (1985, 9, 17) disclose that such compounds may be prepared from a primary amine, secondary amine, tertiary amine or a mixture thereof and carbon dioxide.
  • the preparation may be carried out under ambient pressure or increased pressure, without any solvent or in the presence of solvent.
  • solvent that may be used include alcohols such as methanol, ethanol, isopropanol or butanol, glycols such as ethylene glycol or glycerine, acetates such as ethyl acetate, butyl acetate or carbitol acetate, ethers such as diethyl ether, tetrahydrofuran or dioxane, ketones such as methyl ethyl ketone or acetone, aliphatic hydrocarbons such as hexane or heptane, aromatic hydrocarbons such as benzene or toluene, halogenated hydrocarbons such as chloroform, methylene chloride or carbon tetrachloride, or the like.
  • Carbon dioxide may be bubbled in a gas phase or may be provided as solid dry ice. Supercritical carbon dioxide may also be used.
  • any methods for preparing ammonium carbamate or ammonium carbonate derivatives may be used as long as they provide a final product with the same structure as depicted above.
  • the compound represented by Chemical Formulae 1 to 3, or a mixture thereof may be used in the printing ink composition for fabricating optoelectronic device in any amount, as long as it provides the printing ink composition with desired characteristics.
  • the compound may be used in an amount of 0.01-90 wt %, preferably 0.05-90 wt %, more preferably 0.1-70 wt %, based on the total weight of the printing ink composition.
  • the compound is used in an amount less than 0.01 wt %, it is not possible to obtain sufficient effects.
  • the compound is used in an amount greater than 90 wt %, it is not possible to obtain desired physical properties after forming a film, due to an excessive decrease in the amount of other components, including optoelectronic materials and solvent.
  • the printing ink composition for fabricating optoelectronic device disclosed herein may further include other additives, such as a solvent, stabilizer, dispersant, binder resin, reducing agent, surfactant, wetting agent, thixotropic agent or levelling agent, in addition to the compound represented by Chemical Formulae 1 to 3, or a mixture thereof.
  • additives such as a solvent, stabilizer, dispersant, binder resin, reducing agent, surfactant, wetting agent, thixotropic agent or levelling agent, in addition to the compound represented by Chemical Formulae 1 to 3, or a mixture thereof.
  • the solvent used in the printing ink composition there is no particular limitation in the solvent used in the printing ink composition, as long as it provides the printing ink composition with desired characteristics.
  • the solvent that may be used include water, alcohols such as ethanol or methanol, glycols such as ethylene glycol, acetates such as methyl acetate or ethyl acetate, ethers such as diethyl ether, tetrahydrofuran, anisole or methyl anisole, ketones such as acetone, methyl ethyl ketone or acetophenone, aliphatic hydrocarbons such as hexane or heptane, aromatic hydrocarbons such as benzene, toluene, xylene or tetrahydronaphthalene, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride or chlorobenzene, or the like.
  • the printing ink composition disclosed herein includes materials for fabricating optoelectronic device. Any materials for fabricating OLEDs or OTFTs, optoelectronic functional materials, or organic materials, organic-inorganic hybrid materials or organometallic complexes used currently in conventional optoelectronic device may be used herein, as long as they are dissolved in a selected solvent. Particularly, various structural or functional materials, which, otherwise, are not suitable for forming ink applicable to direct pattern printing, may be used in the printing ink composition disclosed herein.
  • the materials for fabricating optoelectronic device include: polymers, such as homopolymers including polythiophene polymers, poly-p-phenylene polymers, poly-p-phenylenevinylene polymers, polyfluorene polymers, polycyano polymers, polyaniline polymers, polyquinoline polymers, polyvinylcarbazole (PVK) polymers, or polypyrrole polymers, and copolymers having two or more repeating units, including polyfluorenevinylene copolymers, polyspirofluorene copolymers, or polyarylaminevinylene copolymers, various polymer derivatives for use in increasing solubility, including PEDOT/PSS, electroluminescence polymers, including green light emitting polymers (SPG-020 available from Merck), or charge transfer polymer materials; and low-molecular weight materials, such as 4,4′,4′′-tris(N-(2-naphthyl)-N-phenylamino)
  • Typical examples of the key materials of OLEDs including light emitting materials, hole injection materials, hole transfer materials, electron transfer materials and electron injection materials, and those of OTFTs, including organic semiconductor materials, conductive polymer materials and dielectric materials are shown in Table 1.
  • organic optoelectronic device may also be provided in the form of ink and applied to fabrication of device with ease.
  • material include photodisk material, phtochromic material, photochemical hole burning (FHB) material, liquid crystal material, laser pigment material, linear or non-linear optical material, resist material, photosensitive material, photographic material, photoconductive material, organic photovoltaic material, electroconductive material, electrochromic material, ion conductive material, pyroelectric material, charge transfer complex material, dielectric material, piezoelectric material, sensor material, magnetic material, photoelectronic functional biomaterial, or other material that are not suitable for forming printing ink.
  • Typical examples of such materials are shown in Table 2 as their structural formulae, which may be substituted with suitable substituents to improve the quality of a device, including adhesion and thin film properties.
  • Photodisk materials Photochromic materials PHB materials Liquid crystal materials Laser pigments Optical materials Resist materials Photosensitive materials Photographic materials Photoconductive materials Charge transfer complexes Ion conductors Superconductors Sensors Electrochromic materials Photovoltaic materials
  • each of n and m represents a positive integer
  • R represents any substituent and particular examples of R include, but are not limited to alkyl, aryl, heteroaryl, alkoxy, alkylcarbonyl, trialkylsilylalkylcarbonyl, imine, ether, ester, nitrile, thioalkoxy, thioester, amino, vinyl, halogen atoms, or the like.
  • materials for OLEDs or OTFTs may be provided as fluorescence materials, phosphorescence materials, charge transfer materials, electron transfer materials, low-molecular weight materials, dendrimers, oligomer, polymers, hybrid materials, etc. In addition, such materials may be used in the form of various mixtures.
  • the printing ink composition disclosed herein may be applied by any one coating process selected from spin coating, roll coating, spray coating, dip coating, flow coating, doctor blade coating, dispensing, or the like. More preferably, the printing ink composition is applied to a printing process capable of patterning as well as coating, and such printing processes include inkjet printing, offset printing, gravure printing, gravure-offset printing, flexographic printing, screen printing, pad printing, microcontact printing, stencil printing, imprinting, or the like. the viscosity, solubility and film uniformity of ink
  • the printing ink composition for optoelectronic device disclosed herein includes an ammonium carbamate compound or ammonium carbonate compound, which controls the viscosity of ink, the solubility of the materials for optoelectronic device, film uniformity, etc., and is decomposed spontaneously at a sufficiently low temperature after printing, and thus does not adversely affect the quality of the resultant device. Therefore, many compounds having excellent efficiency and lifespan, which, otherwise, are not applicable to printing ink, may be formed into ink suitable for a printing process. As a result, it is possible to provide flexible devices, to realize scale-up of devices, and to improve cost-efficiency.
  • FIG. 1 is a thermal gravimetric analysis (TGA) thermogram of the compound obtained from Preparation Example 1.
  • FIG. 2 is an atomic force microscope (AFM) graph showing the surface roughness of a surface formed by printing the composition of Example 1.
  • FIG. 3 is a photographic view taken by light emission of a pattern formed by printing the composition of Example 4.
  • Inkjet printability is determined with DMP-2813 system. Evaluation of inkjet printability includes printing the composition on a glass substrate to a thickness of 80 nm, drying the composition at 150° C. for 10 minutes, and determining the surface roughness. As shown in FIG. 2 , the surface roughness is determined by atomic force microscopy (AFM) after inkjet printing, and it is shown that the surface roughness is high as evidenced by an average Ra value of 1.23 nm.
  • AFM atomic force microscopy
  • Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • the composition is subjected to inkjet printing to form a pattern, and the pattern is shown in the photograph of FIG. 3 taken by light emission. As can be seen from FIG. 3 , the pattern realizes high-quality green light emission.
  • Example 2 When comparing Example 2 with Comparative Example 1 in Table 3, it can be seen that the composition of Example 2 including n-butylammonium n-butylcarbamate has a viscosity suitable for inkjet printing, shows excellent printability, and provides significantly improved surface roughness on the surface formed after printing.
  • Example 7 when comparing Example 7 with Comparative Example 2, the composition of Example 7 has higher viscosity than the composition of Comparative Example 2, shows excellent printability when applied to gravure printing, and provides significantly improved surface roughness.

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Abstract

The present invention relates to an ink composition for printing capable of inking materials for an optoelectronic device and directly applying the inked materials to a patterning process. More particularly, the present invention relates to a printing ink composition for manufacturing an optoelectronic device capable of direct patterning by adjusting the physical property of a core material so as to be suitable for a printing method in the manufacturing of optoelectronic devices, for example, an organic electroluminescent device or an organic thin film transistor.

Description

    TECHNICAL FIELD
  • The following disclosure relates to a printing ink composition directly applicable to a patterning process, obtained by forming materials for optoelectronic device into ink, and more particularly, to a printing ink composition for fabricating optoelectronic device obtained by controlling physical properties of key materials for fabricating optoelectronic devices optoelectronic device, including organic light emitting diodes (OLEDs) or organic thin film transistors (OTFTs), to be amenable to a printing process and to allow direct patterning.
  • BACKGROUND
  • Recently, optoelectronic device has been succeeded in commercialization and studied intensively for their scale-up and cost-efficient fabrication. Typical examples of such optoelectronic device include organic electroluminescent devices or organic light emitting diodes (OLEDs), which are light emitting devices using a spontaneous light emitting phenomenon caused by coupling between electrons and holes upon the application of electric current to a device including a fluorescence- or phosphorescence-based light emitting layer between an anode and a cathode. Such OLEDs have a simple structure, are obtained by a simple process, and realize high image quality and a broad view angle. Further, they completely realize video images and high color purity, are driven with low power consumption under a low voltage, and thus are suitable for portable electronic appliances.
  • More particularly, an OLED includes an anode, a hole injection layer, a hole transfer layer, an emitting layer, an electron transfer layer, an electron injection layer and a cathode, stacked successively on a substrate. Herein, the anode is frequently formed of indium tin oxide (ITO) having a low surface resistance and high transmittance. In addition, multiple organic thin films are disposed between the two electrodes as described above to increase the light emitting efficiency and lifespan. Since the organic thin films are very weak to moisture and oxygen in the air, an encapsulating film is formed on the uppermost portion of the device to increase the lifespan thereof.
  • Many expensive vacuum chambers are required to form such a multilayered OLED with high efficiency and a patterning mask is also required. Moreover, processes for fabricating OLEDs have fundamental limitation in teems of low-temperature operation. For these reasons, it is difficult to scale up OLEDs in their size and to improve cost efficiency. Therefore, there has been a continuous need for developing a novel process to solve the above-mentioned problems.
  • More recently, many attempts have been made to overcome the above-mentioned problems through the use of a printing process. For example, an inkjet printing process substituting for a known deposition process is differentiated from the deposition process in that it consumes a low amount of materials, shows high efficiency, and allows scale-up and low-temperature operation. Therefore, flexible substrates, such as plastics, may be used in an inkjet printing process, resulting in significant improvement in cost-efficiency. As a result, many Korean and foreign companies and organizations have conducted active research and development of such inkjet printing processes. It is expected that inkjet printing technology is applied to various industrial fields, including electric/electronic, energy, display, bioindustries, etc., and contributes to production of a wide variety of commercial products and improvement in cost-efficiency and eco-friendly characteristics.
  • Inkjet printing is low-noise, low-cost and non-contact printing technology. Depending on ink spray modes, inkjet printing processes are classified into continuous jet processes and drop-on-demand (DOD) processes. The continuous jet processes performs printing by controlling ink direction through a change in electromagnetic field while ink is sprayed continuously with a pump. The DOD processes spray ink only at a desired moment through electrical signals, and are further classified into piezoelectric inkjet processes generating pressure with a piezoelectric plate that causes dynamic deformation by electricity, and thermal inkjet processes using pressure generated upon the expansion of bubbles produced by heat.
  • Methods for fabricating OLEDs using such inkjet processes are disclosed in various publications, for example, in T. R. Hebner, C. C. Wu, D. Marcy, M. H. Lu and J. C. Sturm, “Ink-jet Printing of doped Polymers for Organic Light Emitting Devices”, Applied Physics Letters, Vol. 72, No. 5, pp. 519-521, 1998. The known methods frequently use polymeric materials, such as polyvinylcarbazole or polyphenylene vinylene (PPV), but are problematic in that they cause non-uniformity of droplet sizes and degradation of optoelectrical properties as compared to other conventional processes. This may result from the fact that the known processes may not provide an ink composition for inkjet printing that has controllable viscosity, surface tension, solubility, film uniformity after drying, etc., suitable for inkjet processes.
  • It is required for an ink composition for applying key materials, such as organic materials for light emission, electron transfer or hole transfer, of optoelectronic device, including OLEDs, to inkjet printing processes, to have optimized viscosity, surface tension, solubility, film uniformity after drying, etc. Those properties may affect droplet forming systems, droplet sizes and velocities under a constant pressure. For example, when using a general inkjet system for optoelectronic device, an optimal viscosity of ink is 5-15 cps in view of good ejectability. However, most high-efficiency and high-lifespan compounds commercialized and used currently as key materials of OLEDs have low solubility and small molecular weight, and thus have difficulty in controlling their viscosity to be suitable for inkjet printing processes. For this reason, various additives are used to control the viscosity and tested for ejectability. However, some additives are not removed after drying but still remain in ink to serve as foreign materials, thereby adversely affecting electrical and optical properties, or the like. As a result, it is not possible to maintain a unique color coordination, high efficiency and long lifespan. In addition, it is difficult to control the solubility and molecular weights of organic materials, such as dielectrics, semiconductors and conductors, used as key materials of organic thin film transistor (OTFT) in view of physical properties required for inkjet printing. Conventional inkjet processes using various additives result in degradation of dielectric coefficient, charge transfer and conductivity due to the impurities remaining after the fabrication of devices.
  • Korean Patent Laid-Open No. 2003-0058767 discloses a method for improving the printability of an organic light emitting layer for OLEDs formed by a roll coating process. The method uses, as a solvent, a mixture containing a first solvent having a solubility of 1 wt/v %, a second solvent having a volatility of 0.1 or less and a third solvent having a surface tension of 30 dynes/cm or less, to prevent solvent evaporation before coating a substrate and to improve solubility and surface tension. However, the above method is merely limited to improvement in solubility characteristics of organic polymer materials used for a specific process, does not allow selection of an adequate combination of solvents depending on different kinds of organic polymer materials, and have difficulty in controlling viscosity suitable for a printing process. Therefore, the method is not applicable to various materials for fabricating optoelectronic device.
  • As stated above, ink compositions for fabricating optoelectronic device according to the related art have difficulty in controlling viscosity, solubility and film uniformity so that the ink compositions are applicable to printing processes, such as inkjet processes. Therefore, processes for forming films via printing of optoelectronic materials provided as ink have been limited to formation of certain organic light emitting layers. As a result, there has been marked limitation in realizing flexible optoelectronic device, and scale-up and cost-efficient fabrication thereof
  • DETAILED DESCRIPTION
  • Technical Problems
  • An embodiment of the present invention is directed to providing an ink composition for printing key materials of optoelectronic device, such as organic light emitting diodes (OLEDs) or organic thin film transistors (OTFTs), in the form of ink, the printing ink composition including a compound with a specific structure to control the viscosity, solubility and film uniformity of ink, wherein the compound is decomposed easily at a sufficiently low temperature and does not adversely affect the characteristics of the resultant optoelectronic device.
  • Another embodiment of the present invention is directed to applying the printing ink composition to various key materials of optoelectronic device, so that it allows fabrication of flexible devices and scale-up of devices, and improves cost-efficiency.
  • Technical Solutions
  • We have conducted intensive studies to solve the technical problems, and found that when an ammonium carbamate compound or ammonium carbonate compound is incorporated to a printing ink composition for optoelectronic device, such as organic light emitting device (OLED) or organic thin film transistor (OTFT), it is possible to control the viscosity, solubility and film uniformity of ink with ease. In addition, the ammonium carbamate compound or ammonium carbonate compound used herein is decomposed spontaneously at a sufficiently low temperature, and thus does not adversely affect the quality of the resultant device. Therefore, many compounds having excellent efficiency and lifespan, which, otherwise, are not applicable to printing ink, may be formed into ink suitable for a printing process. As a result, it is possible to provide flexible devices, to realize scale-up of devices, and to improve cost-efficiency.
  • In one general aspect, there is provided a printing ink composition directly applicable to a patterning process, obtained by forming materials for optoelectronic device into ink. More particularly, there is provided a printing ink composition for printing key materials of optoelectronic device, such as OLED or OTFT, in the form of ink, the printing ink composition including: an ammonium carbamate compound represented by Chemical Formula 1, ammonium carbonate compound represented by Chemical Formula 2, ammonium bicarbonate compound represented by Chemical Formula 3, or a mixture thereof.
  • Figure US20110024668A1-20110203-C00001
  • In the above Chemical Formulae 1 to 3, R1 through R6 is independently selected from hydrogen, hydroxy, C1-C30 alkoxy, C1-C30 alkyl, C3-C30 cycloalkyl, C6-C20 aryl, (C6-C20)ar(C1-C30)alkyl, functional group-substituted C1-C30 alkyl, functional group-substituted C6-C20 aryl, heterocyclic compound, polymeric compound and a derivative thereof, wherein when R1 through R6 represents alkyl or aralkyl non-substituted or substituted with a functional group, carbon chain may include a heteroatom selected from N, S and O, and R1 and R2, or R4 and R5 may be independently linked to each other via alkylene with or without a heteroatom to form a ring.
  • In Chemical Formulae 1 to 3, particular examples of R1 through R6 include but are not limited to hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, amyl, hexyl, ethylhexyl, heptyl, octyl, isooctyl, nonyl, decyl, dodecyl, hexadecyl, octadecyl, docodecyl, cyclopropyl, cyclopentyl, cyclohexyl, cholesteryl, allyl, hydroxy, methoxy, methoxyethyl, methoxypropyl, cyanoethyl, ethoxy, butoxy, hexyloxy, methoxyethoxyethyl, methoxyethoxyethoxyethyl, hexametyleneimine, morpholine, piperidine, piperazine, ethylenediamine, propylenediamine, hexamethylenediamine, triethylenediamine, pyrrole, imidazole, pyridine, carboxymethyl, trimethoxysilylpropyl, triethoxysilylpropyl, phenyl, methoxyphenyl, cyanophenyl, phenoxy, tolyl, benzyl and derivatives thereof, polymeric compounds such as polyallylamine or polyethyleneimine and derivatives thereof.
  • Particular examples of the ammonium carbamate compound of Chemical Formula 1 include at least one compound selected from the group consisting of ammonium carbamate, ethylammonium ethylcarbamate, isopropylammonium isopropylcarbamate, n-butylammonium n-butylcarbamate, isobutylammonium isobutylcarbamate, t-butylammonium t-butylcarbamate, 2-ethylhexylammonium 2-ethylhexylcarbamate, octadecylammonium octadecylcarbamate, 2-methoxyethylammonium 2-methoxyethylcarbamate, 2-cyano ethyl ammonium 2-cyanoethylcarbamate, dibutylammonium dibutylcarbamate, dioctadecylammonium dioctadecylcarbamate, methyldecylammonium methyldecylcarbamate, hexamethyleneimineammonium hexamethyleneiminecarbamate, morpholinium morpholinecarbamate, pyridinium ethylhexylcarbamate, triethylenediaminium isopropylbicarbamate, benzylammonium benzylcarbamate, triethoxysilylpropylammonium triethoxysilylpropylcarbamate and derivatives thereof, or a mixture thereof. Particular examples of the ammonium carbonate compound of Chemical Formula 2 include at least one compound selected from the group consisting of ammonium carbonate, ethylammonium ethylcarbonate, isopropylammonium isopropylcarbonate, n-butylammonium n-butylcarbonate, isobutylammonium isobutylcarbonate, t-butylammonium t-butylcarbonate, 2-ethylhexylammonium 2-ethylhexylcarbonate, 2-methoxyethylammonium 2-methoxyethylcarbonate, 2-cyanoethylammonium 2-cyanoethylcarbonate, octadecylammonium octadecylcarbonate, dibutylammonium dibutylcarbonate, dioctadecylammonium dioctadecylcarbonate, methyldecylammonium methyldecylcarbonate, hexamethyleneimineammonium hexamethyleneiminecarbonate, morpholineammonium morpholinecarbonate, benzylammonium benzylcarbonate, triethoxysilylpropylammonium triethoxysilylpropylcarbonate, triethylenediaminium isopropylcarbonate and derivatives thereof, or a mixture thereof. Particular examples of the ammonium bicarbonate compound of Chemical Formula 3 include at least one compound selected from the group consisting of ammonium bicarbonate, isopropylammonium bicarbonate, t-butylammonium bicarbonate, 2-ethylhexylammonium bicarbonate, 2-methoxyethylammonium bicarbonate, 2-cyanoethylammonium bicarbonate, dioctadecylammonium bicarbonate, pyridinium bicarbonate, triethylenediaminium bicarbonate and derivatives thereof, or a mixture thereof.
  • In the compounds represented by Chemical Formulae 1 to 3, at least one of substituents R1 through R6 preferably has 1-20 carbon atoms, and more preferably 3-20 carbon atoms in view of miscibility with organic solvents and decomposition capability at low temperature.
  • The ammonium carbamate or ammonium carbonate compounds may be prepared by any one of processes known to those skilled in the art. For example, J. Am. Chem. Soc., 70, p 3865 (1948), J. Am. Chem. Soc., 73, p 1820 (1951), J. Prakt. Chem., 9, p 917 (1959), J. Am. Chem. Soc., 123, p 10393 (2001), Langmuir, 18, 7124 (2002), and U.S. Pat. No. 4,542,214 (1985, 9, 17) disclose that such compounds may be prepared from a primary amine, secondary amine, tertiary amine or a mixture thereof and carbon dioxide. The preparation may be carried out under ambient pressure or increased pressure, without any solvent or in the presence of solvent. Particular examples of the solvent that may be used include alcohols such as methanol, ethanol, isopropanol or butanol, glycols such as ethylene glycol or glycerine, acetates such as ethyl acetate, butyl acetate or carbitol acetate, ethers such as diethyl ether, tetrahydrofuran or dioxane, ketones such as methyl ethyl ketone or acetone, aliphatic hydrocarbons such as hexane or heptane, aromatic hydrocarbons such as benzene or toluene, halogenated hydrocarbons such as chloroform, methylene chloride or carbon tetrachloride, or the like. Carbon dioxide may be bubbled in a gas phase or may be provided as solid dry ice. Supercritical carbon dioxide may also be used.
  • In addition to the above-mentioned method, any methods for preparing ammonium carbamate or ammonium carbonate derivatives may be used as long as they provide a final product with the same structure as depicted above. In other words, there is no particular limitation in solvent, reaction temperature, concentration or catalyst, etc.
  • The compound represented by Chemical Formulae 1 to 3, or a mixture thereof may be used in the printing ink composition for fabricating optoelectronic device in any amount, as long as it provides the printing ink composition with desired characteristics. Typically, the compound may be used in an amount of 0.01-90 wt %, preferably 0.05-90 wt %, more preferably 0.1-70 wt %, based on the total weight of the printing ink composition. When the compound is used in an amount less than 0.01 wt %, it is not possible to obtain sufficient effects. On the other hand, when the compound is used in an amount greater than 90 wt %, it is not possible to obtain desired physical properties after forming a film, due to an excessive decrease in the amount of other components, including optoelectronic materials and solvent.
  • The printing ink composition for fabricating optoelectronic device disclosed herein may further include other additives, such as a solvent, stabilizer, dispersant, binder resin, reducing agent, surfactant, wetting agent, thixotropic agent or levelling agent, in addition to the compound represented by Chemical Formulae 1 to 3, or a mixture thereof.
  • There is no particular limitation in the solvent used in the printing ink composition, as long as it provides the printing ink composition with desired characteristics. Particular examples of the solvent that may be used include water, alcohols such as ethanol or methanol, glycols such as ethylene glycol, acetates such as methyl acetate or ethyl acetate, ethers such as diethyl ether, tetrahydrofuran, anisole or methyl anisole, ketones such as acetone, methyl ethyl ketone or acetophenone, aliphatic hydrocarbons such as hexane or heptane, aromatic hydrocarbons such as benzene, toluene, xylene or tetrahydronaphthalene, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride or chlorobenzene, or the like.
  • The printing ink composition disclosed herein includes materials for fabricating optoelectronic device. Any materials for fabricating OLEDs or OTFTs, optoelectronic functional materials, or organic materials, organic-inorganic hybrid materials or organometallic complexes used currently in conventional optoelectronic device may be used herein, as long as they are dissolved in a selected solvent. Particularly, various structural or functional materials, which, otherwise, are not suitable for forming ink applicable to direct pattern printing, may be used in the printing ink composition disclosed herein.
  • Particular examples of the materials for fabricating optoelectronic device include: polymers, such as homopolymers including polythiophene polymers, poly-p-phenylene polymers, poly-p-phenylenevinylene polymers, polyfluorene polymers, polycyano polymers, polyaniline polymers, polyquinoline polymers, polyvinylcarbazole (PVK) polymers, or polypyrrole polymers, and copolymers having two or more repeating units, including polyfluorenevinylene copolymers, polyspirofluorene copolymers, or polyarylaminevinylene copolymers, various polymer derivatives for use in increasing solubility, including PEDOT/PSS, electroluminescence polymers, including green light emitting polymers (SPG-020 available from Merck), or charge transfer polymer materials; and low-molecular weight materials, such as 4,4′,4″-tris(N-(2-naphthyl)-N-phenylamino)-triphenylamine (2-TNATA) and derivatives thereof, 4,4′,4″-tris(3-methylphenylphenylamino)-triphenylamine (m-MTDATA) and derivatives thereof, N,N′-bis(1-naphthyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPB) and derivatives thereof, tetraphenyldiaminediphenyl (TPD) and derivatives thereof, N,N,N′,N′-tetra(2-naphthylphenyl)(1,1′-biphenyl)-4,4′-diamine (TNB) and derivatives thereof, tris(8-hydroxyquinalinato)aluminum (AlQ3) and derivatives thereof, copper(II)phthalocyanine (CuPC) and derivatives thereof, 9,10-di(2-naphthypanthracene (ADN) and derivatives thereof, 1,4-bis(2,2-diphenylvinyl)biphenyl (DPVBi) and derivatives thereof, 1,3-bis[(p-tert-butyl)phenyl-1,3,4-oxadiazoyl]benzene (OXD-7) and derivatives thereof, 5,12-dihydro-5,12-dimethylquino[2,3-b]acridine-7,14-dione (DMAQ) and derivatives thereof, 4,4′-(bis(9-ethyl-3-carbazovinylene)-1,1′-biphenyl (DczVBi) and derivatives thereof, arylamine-substituted distrylarylene (DAS-amine) and derivatives thereof, 4-(dicyanomethylene)-2-methyl-6-(jurolidine-4-yl-vinyl)-4H-pyrane (DCM2) and derivatives thereof, 5,6,11,12-tetraphenylnaphthacene (Rubrene) and derivatives thereof, 4,4′,4″-tris(carbazole-9-yl)-triphenylamine (TCTA) and derivatives thereof, 4,4′-bis(carbazole-9-yl)biphenyl (CBP) and derivatives thereof, bis-(2-methyl-8-quinolinolato)-4-(phenolato)aluminum(III) (BAlq) and derivatives thereof, 2-(4-biphenylyl)-5-(p-tert-butylphenyl)-1,3,4-oxadiazole (PBD) and derivatives thereof, 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (BCP) and derivatives thereof, 10-(2-benzothiazolyl)-1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H,5H,11H-[1]benzopyrano[6,7,8-ij]quinolizine-11-one (C-545T) and derivatives thereof, 4-(dicyanomethyl)-2-tert-butyl-6-(1,1,7,7-tetramethyljulolidine-4-yl-vinyl)-4H-pyran (DCJTB) and derivatives thereof, 2,2′,2″-(1,3,5-phenylene)tris(1-phenyl-1H-benzimidazole) (TPBI) and derivatives thereof, tris[2-(2-pyridinyl)phenyl-C,N]-iridium (Ir(ppy)3) and derivatives thereof, bis(2-(2′-benzothienyl)-pyridinato-N,C-3′)iridium(acetylacetonate) (btp2Ir[acac]) and derivatives thereof, bis(2-(4,6-difluorophenyl)pyridinato-N,C-2′)iridium(picolinate) (Flrpic) and derivatives thereof, platinum(II)octaethylporphyrine (PtOEP) and derivatives thereof, 2,6-bis(4-carbazolstyryl)ethylhexylanisole and derivatives thereof, and other materials soluble in a selected solvent.
  • Typical examples of the key materials of OLEDs, including light emitting materials, hole injection materials, hole transfer materials, electron transfer materials and electron injection materials, and those of OTFTs, including organic semiconductor materials, conductive polymer materials and dielectric materials are shown in Table 1.
  • In addition to the key material of OLED and OTFT, other important material for use in organic optoelectronic device may also be provided in the form of ink and applied to fabrication of device with ease. Particular example of such material include photodisk material, phtochromic material, photochemical hole burning (FHB) material, liquid crystal material, laser pigment material, linear or non-linear optical material, resist material, photosensitive material, photographic material, photoconductive material, organic photovoltaic material, electroconductive material, electrochromic material, ion conductive material, pyroelectric material, charge transfer complex material, dielectric material, piezoelectric material, sensor material, magnetic material, photoelectronic functional biomaterial, or other material that are not suitable for forming printing ink. Typical examples of such materials are shown in Table 2 as their structural formulae, which may be substituted with suitable substituents to improve the quality of a device, including adhesion and thin film properties.
  • TABLE 1
    Structure
    OLED Fluorescence polymer
    Figure US20110024668A1-20110203-C00002
    Figure US20110024668A1-20110203-C00003
    Figure US20110024668A1-20110203-C00004
    Figure US20110024668A1-20110203-C00005
    Figure US20110024668A1-20110203-C00006
    Figure US20110024668A1-20110203-C00007
    Figure US20110024668A1-20110203-C00008
    Figure US20110024668A1-20110203-C00009
    Phos- phorescence polymer
    Figure US20110024668A1-20110203-C00010
    Figure US20110024668A1-20110203-C00011
    Low- molecular weight host
    Figure US20110024668A1-20110203-C00012
    Figure US20110024668A1-20110203-C00013
    Figure US20110024668A1-20110203-C00014
    Figure US20110024668A1-20110203-C00015
    Low- molecular weight dopant
    Figure US20110024668A1-20110203-C00016
    Figure US20110024668A1-20110203-C00017
    Figure US20110024668A1-20110203-C00018
    Figure US20110024668A1-20110203-C00019
    Figure US20110024668A1-20110203-C00020
    Hole transfer materials
    Figure US20110024668A1-20110203-C00021
    Figure US20110024668A1-20110203-C00022
    Figure US20110024668A1-20110203-C00023
    Figure US20110024668A1-20110203-C00024
    Figure US20110024668A1-20110203-C00025
    Figure US20110024668A1-20110203-C00026
    Figure US20110024668A1-20110203-C00027
    Electron transfer materials
    Figure US20110024668A1-20110203-C00028
    Figure US20110024668A1-20110203-C00029
    OTFT p-Type
    Figure US20110024668A1-20110203-C00030
    Figure US20110024668A1-20110203-C00031
    Figure US20110024668A1-20110203-C00032
    Figure US20110024668A1-20110203-C00033
    Figure US20110024668A1-20110203-C00034
    Figure US20110024668A1-20110203-C00035
    n-Type
    Figure US20110024668A1-20110203-C00036
    Figure US20110024668A1-20110203-C00037
    Figure US20110024668A1-20110203-C00038
    Figure US20110024668A1-20110203-C00039
  • TABLE 2
    Structure
    Optoelectronic functional organic materials Photodisk materials
    Figure US20110024668A1-20110203-C00040
    Photochromic materials
    Figure US20110024668A1-20110203-C00041
    PHB materials
    Figure US20110024668A1-20110203-C00042
    Liquid crystal materials
    Figure US20110024668A1-20110203-C00043
    Laser pigments
    Figure US20110024668A1-20110203-C00044
    Optical materials
    Figure US20110024668A1-20110203-C00045
    Resist materials
    Figure US20110024668A1-20110203-C00046
    Photosensitive materials
    Figure US20110024668A1-20110203-C00047
    Photographic materials
    Figure US20110024668A1-20110203-C00048
    Photoconductive materials
    Figure US20110024668A1-20110203-C00049
    Charge transfer complexes
    Figure US20110024668A1-20110203-C00050
    Ion conductors
    Figure US20110024668A1-20110203-C00051
    Superconductors
    Figure US20110024668A1-20110203-C00052
    Sensors
    Figure US20110024668A1-20110203-C00053
    Electrochromic materials
    Figure US20110024668A1-20110203-C00054
    Photovoltaic materials
    Figure US20110024668A1-20110203-C00055
  • In Table 1 and Table 2, each of n and m represents a positive integer, and R represents any substituent and particular examples of R include, but are not limited to alkyl, aryl, heteroaryl, alkoxy, alkylcarbonyl, trialkylsilylalkylcarbonyl, imine, ether, ester, nitrile, thioalkoxy, thioester, amino, vinyl, halogen atoms, or the like. As can be seen from Tables 1 and 2, materials for OLEDs or OTFTs may be provided as fluorescence materials, phosphorescence materials, charge transfer materials, electron transfer materials, low-molecular weight materials, dendrimers, oligomer, polymers, hybrid materials, etc. In addition, such materials may be used in the form of various mixtures.
  • The printing ink composition disclosed herein may be applied by any one coating process selected from spin coating, roll coating, spray coating, dip coating, flow coating, doctor blade coating, dispensing, or the like. More preferably, the printing ink composition is applied to a printing process capable of patterning as well as coating, and such printing processes include inkjet printing, offset printing, gravure printing, gravure-offset printing, flexographic printing, screen printing, pad printing, microcontact printing, stencil printing, imprinting, or the like. the viscosity, solubility and film uniformity of ink
  • Beneficial Effects
  • The printing ink composition for optoelectronic device disclosed herein includes an ammonium carbamate compound or ammonium carbonate compound, which controls the viscosity of ink, the solubility of the materials for optoelectronic device, film uniformity, etc., and is decomposed spontaneously at a sufficiently low temperature after printing, and thus does not adversely affect the quality of the resultant device. Therefore, many compounds having excellent efficiency and lifespan, which, otherwise, are not applicable to printing ink, may be formed into ink suitable for a printing process. As a result, it is possible to provide flexible devices, to realize scale-up of devices, and to improve cost-efficiency.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a thermal gravimetric analysis (TGA) thermogram of the compound obtained from Preparation Example 1.
  • FIG. 2 is an atomic force microscope (AFM) graph showing the surface roughness of a surface formed by printing the composition of Example 1.
  • FIG. 3 is a photographic view taken by light emission of a pattern formed by printing the composition of Example 4.
  • DETAILED DESCRIPTION OF EMBODIMENTS
  • The examples will now be described. The following examples are for illustrative purposes only and not intended to limit the scope of this disclosure.
  • Preparation of Carbamate and Carbonate Compounds
  • Preparation Example 1 Preparation of n-butylammonium n-butylcarbamate
  • To a sealed and pressurized 250 mL reactor equipped with an agitator and a gas inlet, 100 g (1.367 mol) of n-butylamine is introduced and carbon dioxide gas is introduced gradually thereto at room temperature to perform a reaction. As the reaction proceeds, carbon dioxide consumption decreases and the reaction mixture is allowed to react sufficiently until carbon dioxide is not consumed any longer. In this manner, 128.85 g (yield 99%, 0.677 mol) of n-butylammonium n-butyl carbamate is obtained in the form of white powder. The resultant compound is characterized by thermal gravimetric analysis (TGA) and the thermogram is shown in FIG. 1. As can be seen from FIG. 1, the carbamate compound is thermally decomposed completely at a temperature lower than 120° C.
  • Preparation Example 2 Preparation of n-octylammonium n-octylacarbonate
  • To a 250 mL Schlenk flask equipped with an agitator and a gas inlet, 100 g (0.774 mol) of n-octylamine and 6.97 g (0.387 mol) of purified water are introduced, and 22 g (0.5 mol) of carbon dioxide gas is added gradually thereto while maintaining the temperature at 30° C. or lower by using cooling water. Then, reaction is carried out under agitation for 2 hours. As the reaction proceeds, the viscosity of the reaction mixture increases. Finally, 119.08 g (yield 96%, 0.372 mol) of n-octylammonium n-octylcarbonate is obtained as transparent liquid.
  • Preparation Example 3 Preparation of amylammonium amylbicarbonate
  • To a 250 mL Schlenk flask equipped with an agitator and a gas inlet, 100 g (1.147 mol) of amylamine and 20.65 g (1.147 mol) of purified water are introduced and carbon dioxide gas is introduced gradually thereto at room temperature to perform a reaction. As the reaction proceeds, carbon dioxide consumption decreases and the reaction mixture is allowed to react sufficiently until carbon dioxide is not consumed any longer. In this manner, 148.95 g (yield 99%, 1.136 mol) of amylammonium amylbicarbonate is obtained as transparent liquid.
  • Preparation and Characterization of Printing Ink Composition
  • Example 1
  • To a 10 mL flask equipped with an agitator, 3 g of poly(3,4-ethylenedioxythiophene/poly(styrene sulfonate) (PEDOP/PSS), available from Aldrich Co., 1 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1 and 3 g of ethanol (Aldrich Co.) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system. Evaluation of inkjet printability includes printing the composition on a glass substrate to a thickness of 80 nm, drying the composition at 150° C. for 10 minutes, and determining the surface roughness. As shown in FIG. 2, the surface roughness is determined by atomic force microscopy (AFM) after inkjet printing, and it is shown that the surface roughness is high as evidenced by an average Ra value of 1.23 nm.
  • Example 2
  • To a 20 mL flask equipped with an agitator, 0.1 g of 2,6-bis(4-carbazolestyryl)-ethylhexylanisole (INKTEC Co., Ltd.), 2 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1, 4 g of methylanisole (Aldrich) and 4 g of acetophenone (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3 Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • Example 3
  • To a 20 mL flask equipped with an agitator, 0.1 g of 3,3,5,5-tetrakis(4-t-butylstyryl)-4,4-dimethoxybiphenyl (INKTEC Co., Ltd.), 1.5 g of n-octylammonium n-octylcarbonate obtained from Preparation Example 2, 2.5 g of toluene (Aldrich) and 6 g of tetrahydronaphthalene (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ, membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • Example 4
  • To a 20 mL flask equipped with an agitator, 0.1 g of a green light emitting polymer, SPG-020 (Merck), 3 g of amylammonium amylbicarbonate obtained from Preparation Example 3, 2 g of chlorobenzene (Aldrich) and 5 g of tetrahydronaphthalene (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ, membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1. The composition is subjected to inkjet printing to form a pattern, and the pattern is shown in the photograph of FIG. 3 taken by light emission. As can be seen from FIG. 3, the pattern realizes high-quality green light emission.
  • Example 5
  • To a 20 mL flask equipped with an agitator, 0.2 g of 4,4′,4″-tris(N-(2-naphthyl)-N-phenylamino)triphenylamine, 1.5 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1, 2 g of toluene (Aldrich), 2 g of chlorobenzene (Aldrich) and 3.5 g of acetophenone (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • Example 6
  • To a 20 mL flask equipped with an agitator, 0.1 g of 2,2′,2″-(1,3,5-phenylene)tris(1-phenyl-1H-benzimidazole), 2.5 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1, 2.5. g of toluene (Aldrich) and 5 g of acetophenone (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2 membrane filter to provide a composition for inkjet printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • Example 7
  • To a 200 mL flask equipped with an agitator, 1 g of 2,6-bis(4-carbazolestyryl)-ethylhexylanisole (INKTEC Co., Ltd.), 50 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1, 25 g of methylanisole (Aldrich) and 25 g of acetophenone (Aldrich) are added and the reaction mixture is agitated for 30 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for microgravure printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Evaluation of printability includes printing the composition on a PET substrate to a thickness of 80 nm, drying the composition at 150° C. for 10 minutes, and determining the surface roughness.
  • Example 8
  • To a 200 mL flask equipped with an agitator, 30 g of PEDOT/PSS (Aldrich), 80 g of n-butylammonium n-butylcarbamate obtained from Preparation Example 1 and 30 g of ethanol (Aldrich) are added and the reaction mixture is agitated for 30 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for flexographic printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Evaluation of printability includes printing the composition on a PET substrate to a thickness of 80 nm, drying the composition at 150° C. for 10 minutes, and determining the surface roughness.
  • Comparative Example 1
  • To a 20 mL flask equipped with an agitator, 0.1 g of 2,6-bis(4-carbazolestyryl)ethylhexylanisole (INKTEC Co., Ltd.), 6 g of methylanisole (Aldrich) and 4 g of acetophenone (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Inkjet printability is determined with DMP-2813 system and evaluated in the same manner as described in Example 1.
  • Comparative Example 2
  • To a 20 mL flask equipped with an agitator, 0.1 g of a green light emitting polymer, SPG-020 (Merck), 5 g of chlorobenzene (Aldrich) and 5 g of tetrahydronaphthalene (Aldrich) are added and the reaction mixture is agitated for 10 minutes at room temperature. Next, the reaction mixture is filtered through a 0.2μ membrane filter to provide a composition for microgavure printing. The resultant composition is determined for its viscosity, surface tension, printability and surface roughness, and the results are shown in Table 3. Evaluation of printability includes printing the composition on a PET substrate to a thickness of 80 nm, drying the composition at 150° C. for 10 minutes, and determining the surface roughness.
  • TABLE 3
    Surface
    Viscosity tension Surface
    (cps) (dyne/cm) Printability roughness
    Example 1 8.2 33 Good Ra: 1.23 nm
    Example 2 9.1 32 Good Ra: 1.88 nm
    Comp. Ex. 1 0.9 31 Poor Ra: 4.33 nm
    Example 3 7.5 32 Good Ra: 1.53 nm
    Example 4 10.6 33 Good Ra: 2.13 nm
    Example 5 9.4 32 Good Ra: 2.53 nm
    Example 6 7.9 32 Good Ra: 1.64 nm
    Example 7 53 32 Good Ra: 2.87 nm
    Comp. Ex. 2 4.8 32 Poor Ra: 11.37 nm
    Example 8 212 31 Good Ra: 3.21 nm
  • When comparing Example 2 with Comparative Example 1 in Table 3, it can be seen that the composition of Example 2 including n-butylammonium n-butylcarbamate has a viscosity suitable for inkjet printing, shows excellent printability, and provides significantly improved surface roughness on the surface formed after printing.
  • In addition, when comparing Example 7 with Comparative Example 2, the composition of Example 7 has higher viscosity than the composition of Comparative Example 2, shows excellent printability when applied to gravure printing, and provides significantly improved surface roughness.

Claims (7)

1. A printing ink composition for fabricating optoelectronic device, directly applicable to a patterning process by forming materials for optoelectronic device into ink, the printing ink composition comprising a compound selected from compounds represented by Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3, and a mixture thereof in an amount of 0.01-90 wt % based on the total weight of the composition:
Figure US20110024668A1-20110203-C00056
wherein
R1 through R6 is independently selected from hydrogen, hydroxy, C1-C30 alkoxy, C1-C30 alkyl, C3-C30 cycloalkyl, C6-C20 aryl, (C6-C20)ar(C1-C30)alkyl, functional group-substituted C1-C30 alkyl, functional group-substituted C6-C20 aryl, heterocyclic compound, polymeric compound and a derivative thereof, wherein when R1 through R6 represents alkyl or aralkyl non-substituted or substituted with a functional group, carbon chain may include a heteroatom selected from N, S and O, and R1 and R2, or R4 and R5 may be independently linked to each other via alkylene with or without a heteroatom to form a ring.
2. The printing ink composition for fabricating optoelectronic device according to claim 1, wherein each of R1 through R6 is independently selected from hydrogen, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, amyl, hexyl, ethylhexyl, heptyl, octyl, isooctyl, nonyl, decyl, dodecyl, hexadecyl, octadecyl, docodecyl, cyclopropyl, cyclopentyl, cyclohexyl, allyl, hydroxy, methoxy, methoxyethyl, methoxypropyl, cyanoethyl, ethoxy, butoxy, hexyloxy, methoxyethoxyethyl, methoxyethoxyethoxyethyl, hexametyleneimine, morpholine, piperidine, piperazine, ethylenediamine, propylenediamine, hexamethylenediamine, triethylenediamine, pyrrole, imidazole, pyridine, carboxymethyl, trimethoxysilylpropyl, triethoxysilylpropyl, phenyl, methoxyphenyl, cyanophenyl, phenoxy, tolyl, benzyl, polyallylamine, polyethyleneamine and derivatives thereof.
3. The printing ink composition for fabricating optoelectronic device according to claim 1, wherein the ammonium carbamate compound represented by Chemical Formula 1 is selected from the group consisting of ammonium carbamate, ethylammonium ethylcarbamate, isopropylammonium isopropylcarbamate, n-butylammonium n-butylcarbamate, isobutylammonium isobutylcarbamate, t-butylammonium t-butylcarbamate, 2-ethylhexylammonium 2-ethylhexylcarbamate, octadecylammonium octadecylcarbamate, 2-methoxyethylammonium 2-methoxyethylcarbamate, 2-cyanoethylammonium 2-cyanoethylcarbamate, dibutylammonium dibutylcarbamate, dioctadecylammonium dioctadecylcarbamate, methyldecylammonium methyldecylcarbamate, hexamethyleneimineammonium hexamethyleneiminecarbamate, morpholinium morpholinecarbamate, pyridinium ethylhexylcarbamate, triethylenediaminium isopropylbicarbamate, benzylammonium benzylcarbamate, triethoxysilylpropylammonium triethoxysilylpropylcarbamate and derivatives thereof, or a mixture thereof; the ammonium carbonate compound represented by Chemical Formula 2 is selected from the group consisting of ammonium carbonate, ethylammonium ethylcarbonate, isopropylammonium isopropylcarbonate, n-butylammonium n-butylcarbonate, isobutylammonium isobutylcarbonate, t-butylammonium t-butylcarbonate, 2-ethylhexylammonium 2-ethylhexylcarbonate, 2-methoxyethylammonium 2-methoxyethylcarbonate, 2-cyanoethylammonium 2-cyanoethylcarbonate, octadecylammonium octadecylcarbonate, dibutylammonium dibutylcarbonate, dioctadecylammonium dioctadecylcarbonate, methyldecylammonium methyldecylcarbonate, hexamethyleneimineammonium hexamethyleneiminecarbonate, morpholineammonium morpholinecarbonate, benzylammonium benzylcarbonate, triethoxysilylpropylammonium triethoxysilylpropylcarbonate, triethylenediaminium isopropylcarbonate and derivatives thereof, or a mixture thereof; and the ammonium bicarbonate compound represented by Chemical Formula 3 is selected from the group consisting of ammonium bicarbonate, isopropylammonium bicarbonate, t-butylammonium bicarbonate, 2-ethylhexylammonium bicarbonate, 2-methoxyethylammonium bicarbonate, 2-cyanoethylammonium bicarbonate, dioctadecylammonium bicarbonate, pyridinium bicarbonate, triethylenediaminium bicarbonate and derivatives thereof, or a mixture thereof.
4. The printing ink composition for fabricating optoelectronic device according to claim 1, wherein the optoelectronic device is organic light emitting device (OLED) or organic thin film transistor (OTFT).
5. The printing ink composition for fabricating optoelectronic device according to claim 1, wherein the material for optoelectronic device is selected from fluorescence polymer, phosphorescence polymer, host material, dopant material, hole transfer material, electron transfer material, organic semiconductor material, photodisk material, phtochromic material, photochemical hole burning (PHB) material, liquid crystal material, laser pigment material, optical material, resist material, photosensitive material, photographic material, photoconductive material, charge transfer complexe, ion conductive material, superconductive material, sensor material, electrochromic material, piezoelectric material, magnetic material, photoelectronic functional biomaterial, organic photovoltaic material, and combination thereof.
6. The printing ink composition for fabricating optoelectronic device according to claim 1, which are applied to a printing process selected from inkjet printing, offset printing, screen printing, pad printing, gravure printing, flexographic printing, stencil printing and imprinting,
7. The printing ink composition for fabricating optoelectronic device according to claim 1, which further comprises at least one component selected from a solvent, stabilizer, dispersant, binder resin, reducing agent, surfactant, wetting agent, thixotropic agent and levelling agent.
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